JP2014135305A5 - - Google Patents
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- JP2014135305A5 JP2014135305A5 JP2013000778A JP2013000778A JP2014135305A5 JP 2014135305 A5 JP2014135305 A5 JP 2014135305A5 JP 2013000778 A JP2013000778 A JP 2013000778A JP 2013000778 A JP2013000778 A JP 2013000778A JP 2014135305 A5 JP2014135305 A5 JP 2014135305A5
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- JP
- Japan
- Prior art keywords
- frequency power
- detected
- plasma processing
- detection means
- frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 210000002381 Plasma Anatomy 0.000 claims description 29
- 238000001514 detection method Methods 0.000 claims description 25
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013000778A JP6078347B2 (ja) | 2013-01-08 | 2013-01-08 | プラズマ処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013000778A JP6078347B2 (ja) | 2013-01-08 | 2013-01-08 | プラズマ処理装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2014135305A JP2014135305A (ja) | 2014-07-24 |
JP2014135305A5 true JP2014135305A5 (zh) | 2015-08-27 |
JP6078347B2 JP6078347B2 (ja) | 2017-02-08 |
Family
ID=51413403
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013000778A Active JP6078347B2 (ja) | 2013-01-08 | 2013-01-08 | プラズマ処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6078347B2 (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10395895B2 (en) | 2015-08-27 | 2019-08-27 | Mks Instruments, Inc. | Feedback control by RF waveform tailoring for ion energy distribution |
JP6675260B2 (ja) * | 2016-04-27 | 2020-04-01 | 東京エレクトロン株式会社 | 変圧器、プラズマ処理装置、及び、プラズマ処理方法 |
JP7111299B2 (ja) * | 2016-11-14 | 2022-08-02 | 国立研究開発法人産業技術総合研究所 | ダイヤモンドを合成する方法及びプラズマ処理装置 |
CN113169026B (zh) * | 2019-01-22 | 2024-04-26 | 应用材料公司 | 用于控制脉冲电压波形的反馈回路 |
US20230103714A1 (en) * | 2019-12-17 | 2023-04-06 | Hitachi High-Tech Corporation | Plasma processing apparatus and operating method of plasma processing apparatus |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3157605B2 (ja) * | 1992-04-28 | 2001-04-16 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JPH07258853A (ja) * | 1993-04-14 | 1995-10-09 | Texas Instr Inc <Ti> | プロセスの状態を識別する方法および装置 |
JP2001007089A (ja) * | 1999-06-25 | 2001-01-12 | Matsushita Electric Ind Co Ltd | プラズマ処理方法及び装置 |
JP3976480B2 (ja) * | 2000-07-18 | 2007-09-19 | 株式会社日立製作所 | プラズマ処理装置 |
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2013
- 2013-01-08 JP JP2013000778A patent/JP6078347B2/ja active Active
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