JP2014135305A5 - - Google Patents

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Publication number
JP2014135305A5
JP2014135305A5 JP2013000778A JP2013000778A JP2014135305A5 JP 2014135305 A5 JP2014135305 A5 JP 2014135305A5 JP 2013000778 A JP2013000778 A JP 2013000778A JP 2013000778 A JP2013000778 A JP 2013000778A JP 2014135305 A5 JP2014135305 A5 JP 2014135305A5
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Japan
Prior art keywords
frequency power
detected
plasma processing
detection means
frequency
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JP2013000778A
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English (en)
Japanese (ja)
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JP6078347B2 (ja
JP2014135305A (ja
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Priority to JP2013000778A priority Critical patent/JP6078347B2/ja
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Publication of JP2014135305A5 publication Critical patent/JP2014135305A5/ja
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JP2013000778A 2013-01-08 2013-01-08 プラズマ処理装置 Active JP6078347B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013000778A JP6078347B2 (ja) 2013-01-08 2013-01-08 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013000778A JP6078347B2 (ja) 2013-01-08 2013-01-08 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2014135305A JP2014135305A (ja) 2014-07-24
JP2014135305A5 true JP2014135305A5 (enrdf_load_stackoverflow) 2015-08-27
JP6078347B2 JP6078347B2 (ja) 2017-02-08

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ID=51413403

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JP2013000778A Active JP6078347B2 (ja) 2013-01-08 2013-01-08 プラズマ処理装置

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JP (1) JP6078347B2 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10395895B2 (en) 2015-08-27 2019-08-27 Mks Instruments, Inc. Feedback control by RF waveform tailoring for ion energy distribution
JP6675260B2 (ja) * 2016-04-27 2020-04-01 東京エレクトロン株式会社 変圧器、プラズマ処理装置、及び、プラズマ処理方法
JP7111299B2 (ja) * 2016-11-14 2022-08-02 国立研究開発法人産業技術総合研究所 ダイヤモンドを合成する方法及びプラズマ処理装置
JP7134695B2 (ja) * 2018-04-27 2022-09-12 東京エレクトロン株式会社 プラズマ処理装置、及び電源制御方法
CN118315254A (zh) * 2019-01-22 2024-07-09 应用材料公司 用于控制脉冲电压波形的反馈回路
US20230103714A1 (en) * 2019-12-17 2023-04-06 Hitachi High-Tech Corporation Plasma processing apparatus and operating method of plasma processing apparatus
JP7454971B2 (ja) * 2020-03-17 2024-03-25 東京エレクトロン株式会社 検出方法及びプラズマ処理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3157605B2 (ja) * 1992-04-28 2001-04-16 東京エレクトロン株式会社 プラズマ処理装置
JPH07258853A (ja) * 1993-04-14 1995-10-09 Texas Instr Inc <Ti> プロセスの状態を識別する方法および装置
JP2001007089A (ja) * 1999-06-25 2001-01-12 Matsushita Electric Ind Co Ltd プラズマ処理方法及び装置
JP3976480B2 (ja) * 2000-07-18 2007-09-19 株式会社日立製作所 プラズマ処理装置

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