JP2014112588A - Cleaning device - Google Patents

Cleaning device Download PDF

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JP2014112588A
JP2014112588A JP2012266185A JP2012266185A JP2014112588A JP 2014112588 A JP2014112588 A JP 2014112588A JP 2012266185 A JP2012266185 A JP 2012266185A JP 2012266185 A JP2012266185 A JP 2012266185A JP 2014112588 A JP2014112588 A JP 2014112588A
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cleaning
plate
bottom plate
holding table
net
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JP2012266185A
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JP6164826B2 (en
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Makoto Maejima
信 前嶋
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Disco Corp
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Disco Abrasive Systems Ltd
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Priority to JP2012266185A priority Critical patent/JP6164826B2/en
Priority to CN201310627856.7A priority patent/CN103846243B/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays

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  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To exhaust spray to the outside with a simple configuration without forcibly exhausting the spray generated during cleaning.SOLUTION: A cleaning device (1) includes: a holding table (4) which holds a plate-shaped work-piece (W); a cleaning nozzle (5) which jets washing water toward the plate-shaped work-piece (W); and a table cover (3) which covers the periphery of the holding table (4). In the table cover (3), a bottom plate (31) having a plurality of holes (33) is arranged around the holding table (4), and a sheet-shaped net (35) is laid on the bottom plate (31).

Description

本発明は、半導体ウェーハ等の板状ワークの表面を洗浄する洗浄装置に関し、特に板状ワークの外周部分に付着する汚れを洗浄する洗浄装置に関する。   The present invention relates to a cleaning device for cleaning the surface of a plate-shaped workpiece such as a semiconductor wafer, and more particularly to a cleaning device for cleaning dirt adhering to an outer peripheral portion of the plate-shaped workpiece.

従来、板状ワークを保持した保持テーブルを回転させつつ、洗浄ノズルから板状ワークに洗浄水を噴出するスピンナー式の洗浄装置が知られている（例えば、特許文献１参照）。特許文献１に記載の洗浄装置は、洗浄水が板状ワークに衝突されると共に、板状ワークに付着した水滴が遠心力により放出されることで、洗浄水が装置周囲に飛散する。このため、洗浄装置には、保持テーブルの側方を囲うカバーが昇降可能に設けられており、洗浄時にはテーブルカバーを上昇させて洗浄水の飛散を防止している。   2. Description of the Related Art Conventionally, a spinner type cleaning device that jets cleaning water from a cleaning nozzle to a plate-like workpiece while rotating a holding table that holds the plate-like workpiece is known (for example, see Patent Document 1). In the cleaning device described in Patent Document 1, the cleaning water collides with the plate-shaped workpiece and the water droplets adhering to the plate-shaped workpiece are released by centrifugal force, so that the cleaning water is scattered around the device. For this reason, the cleaning device is provided with a cover that surrounds the side of the holding table so that it can be raised and lowered, and the table cover is raised during cleaning to prevent scattering of cleaning water.

特開平７−２１１６８５号公報JP 7-2111685 A

ところで、このような洗浄装置の洗浄方法として、高圧の洗浄水を噴射して洗浄効率を高める高圧洗浄や、洗浄水と気体を混合して気体の圧力を利用して洗浄する２流体洗浄が知られている。高圧洗浄や２流体洗浄では、板状ワークに吹き当てられた洗浄水が噴霧となって、板状ワークや保持テーブル周辺に付着するため、洗浄装置の底部に排気ダクトを設けて洗浄装置内の噴霧を強制排気する必要があった。   By the way, as a cleaning method of such a cleaning apparatus, there are known high-pressure cleaning in which high-pressure cleaning water is jetted to increase cleaning efficiency, and two-fluid cleaning in which cleaning water and gas are mixed and cleaned using the pressure of the gas. It has been. In high-pressure cleaning and two-fluid cleaning, the cleaning water sprayed on the plate-like workpiece is sprayed and adheres to the periphery of the plate-like workpiece and the holding table. Therefore, an exhaust duct is provided at the bottom of the cleaning device. The spray had to be forced out.

本発明はかかる点に鑑みてなされたものであり、洗浄時に発生する噴霧を強制排気することなく、簡易な構成により外部に排出することができる洗浄装置を提供することを目的とする。   This invention is made | formed in view of this point, and it aims at providing the washing | cleaning apparatus which can be discharged | emitted by simple structure, without forcedly exhausting the spray which generate | occur | produces at the time of washing | cleaning.

本発明の洗浄装置は、板状ワークを保持する保持テーブルと、該保持テーブルの中心を軸に回転させるモータと、該保持テーブルが保持する板状ワークを洗浄する流体を噴出させる洗浄ノズルと、該保持テーブルの下面を囲繞するテーブルカバーと、を少なくとも備えた洗浄装置であって、該テーブルカバーは、該保持テーブルの下部周囲を囲い複数の穴を備えた底板と、該底板に連結され該底板の外周から垂直方向に立ち上がる側板と、からなる箱形状で形成され、該底板の上に編み目でシート状のネットを敷設させることを特徴にする。   The cleaning apparatus of the present invention includes a holding table that holds a plate-shaped workpiece, a motor that rotates about the center of the holding table, a cleaning nozzle that ejects a fluid that cleans the plate-shaped workpiece held by the holding table, A cleaning device comprising at least a table cover surrounding a lower surface of the holding table, the table cover surrounding a lower portion of the holding table and having a plurality of holes, and connected to the bottom plate, It is formed in the box shape which consists of a side plate which stands | starts up perpendicularly | vertically from the outer periphery of a baseplate, The sheet-like net | network is laid on this baseplate with the stitch | pattern.

この構成によれば、洗浄中に発生した噴霧が底板の上に敷設されたネットの網目に捕捉され、底板とネットとの間に噴霧が溜まって液体の膜（層）が形成される。液体の膜が形成されると、洗浄時に発生した噴霧が液体膜に吸収され、液体の膜の膜厚が大きくなった時点で底板の穴から流れ落ちて外部に排出される。よって、噴霧を強制排気するための設備が不要となり、装置構成を簡略化することが可能となっている。   According to this configuration, the spray generated during the cleaning is captured by the net of the net laid on the bottom plate, and the spray accumulates between the bottom plate and the net to form a liquid film (layer). When the liquid film is formed, the spray generated at the time of cleaning is absorbed by the liquid film, and when the film thickness of the liquid film increases, the liquid film flows down from the hole in the bottom plate and is discharged to the outside. Therefore, a facility for forcibly exhausting the spray is not necessary, and the apparatus configuration can be simplified.

本発明によれば、底板上のネットの網目に洗浄時の噴霧を捕捉させることで、洗浄時に発生する噴霧を強制排気することなく、簡易な構成により外部に排出することができる。   According to the present invention, the spray generated at the time of cleaning is captured by the net of the net on the bottom plate, so that the spray generated at the time of cleaning can be discharged outside with a simple configuration without forcibly exhausting.

本実施の形態に係る洗浄装置の上面模式図である。It is an upper surface schematic diagram of the washing | cleaning apparatus which concerns on this Embodiment. 図１に示す洗浄装置のＡ−Ａ線に沿う断面模式図である。It is a cross-sectional schematic diagram which follows the AA line of the washing | cleaning apparatus shown in FIG. 本実施の形態に係る洗浄装置の洗浄動作の説明図である。It is explanatory drawing of the washing | cleaning operation | movement of the washing | cleaning apparatus which concerns on this Embodiment. 実験例に係る網目サイズの説明図である。It is explanatory drawing of the mesh size which concerns on an experiment example.

以下、添付図面を参照して、本実施の形態について説明する。図１は、本実施の形態に係る洗浄装置の上面模式図である。図２は、図１に示す洗浄装置のＡ−Ａ線に沿う断面模式図である。なお、本実施の形態に係る洗浄装置は、図１に示す構成に限定されず、適宜変更が可能である。また、図１においては、説明の便宜上、洗浄ノズルを省略している。   Hereinafter, the present embodiment will be described with reference to the accompanying drawings. FIG. 1 is a schematic top view of the cleaning apparatus according to the present embodiment. FIG. 2 is a schematic cross-sectional view taken along the line AA of the cleaning device shown in FIG. The cleaning apparatus according to the present embodiment is not limited to the configuration shown in FIG. 1 and can be changed as appropriate. In FIG. 1, the cleaning nozzle is omitted for convenience of explanation.

図１及び図２に示すように、洗浄装置１は、板状ワークＷを保持した保持テーブル４を回転させ、洗浄ノズル５から板状ワークＷの外周部に洗浄用の流体を吹き当てるように構成されている。この洗浄装置１では、特に、エッジトリミング後の板状ワークＷ、外周部だけ残して研削された板状ワークＷ、研磨後の板状ワークＷ等の洗浄が行われる。なお、板状ワークＷは、シリコン、ガリウム砒素等の半導体ウェーハでもよいし、セラミック、ガラス、サファイア（Al2O3）系の無機材料基板等でもよい。 As shown in FIGS. 1 and 2, the cleaning device 1 rotates the holding table 4 that holds the plate-like workpiece W so that the cleaning fluid is sprayed from the cleaning nozzle 5 to the outer periphery of the plate-like workpiece W. It is configured. In the cleaning apparatus 1, in particular, the plate-like workpiece W after edge trimming, the plate-like workpiece W that is ground while leaving only the outer peripheral portion, the plate-like workpiece W after polishing, and the like are cleaned. The plate-like workpiece W may be a semiconductor wafer such as silicon or gallium arsenide, or may be a ceramic, glass, sapphire (Al 2 O 3 ) -based inorganic material substrate, or the like.

洗浄装置１は、保持テーブル４の下方に設けられたケース２に、保持テーブル４の周囲を覆うテーブルカバー３を昇降可能に設けて構成されている。ケース２は、テーブルカバー３の外側を覆う外壁部２１とテーブルカバー３の内側に位置する内壁部２２とを底壁部２３で連ねて環状空間Ａ１を形成している。この環状空間Ａ１は、洗浄ノズル５から噴出されて飛散した噴霧が流れ込むように上面が開放されている。また、環状空間Ａ１は、非洗浄時にテーブルカバー３を収容する収容空間としても機能する。ケース２の底壁部２３は、複数の防振ゴム１１を介してベース１６に固定されている。   The cleaning device 1 is configured by providing a case 2 provided below the holding table 4 with a table cover 3 covering the periphery of the holding table 4 so as to be movable up and down. The case 2 forms an annular space A <b> 1 by connecting an outer wall portion 21 that covers the outside of the table cover 3 and an inner wall portion 22 that is positioned inside the table cover 3 by a bottom wall portion 23. The upper surface of the annular space A1 is opened so that spray sprayed from the cleaning nozzle 5 and scattered. The annular space A1 also functions as an accommodation space for accommodating the table cover 3 when not washed. The bottom wall portion 23 of the case 2 is fixed to the base 16 via a plurality of vibration isolating rubbers 11.

ケース２の内壁部２２は、円筒状に形成されており、内壁部２２の内側は保持テーブル４を回転駆動させるモータ６の設置空間Ａ２になっている。内壁部２２の上端部には、モータ６の設置空間Ａ２を覆うように上蓋部７が複数のボルト１２により固定されている。上蓋部７は、緩い傾斜角の略円錐台状であり、中央に開口７１が形成されている。上蓋部７の開口縁部には、保持テーブル４に向けて突出した環状凸部７２が設けられている。環状凸部７２には、保持テーブル４が回転可能に支持される。上蓋部７の裏面には、複数のボルト１３によりモータ６が固定されている。   The inner wall portion 22 of the case 2 is formed in a cylindrical shape, and the inner side of the inner wall portion 22 is an installation space A2 for the motor 6 that rotationally drives the holding table 4. An upper lid portion 7 is fixed to the upper end portion of the inner wall portion 22 with a plurality of bolts 12 so as to cover the installation space A <b> 2 of the motor 6. The upper lid portion 7 has a substantially truncated cone shape with a gentle inclination angle, and an opening 71 is formed at the center. An annular convex portion 72 that protrudes toward the holding table 4 is provided at the opening edge of the upper lid portion 7. The holding table 4 is rotatably supported by the annular protrusion 72. The motor 6 is fixed to the back surface of the upper lid portion 7 by a plurality of bolts 13.

モータ６は、上蓋部７に懸架されており、回転軸６１を上蓋部７の開口７１内に突出させている。回転軸６１は、開口７１を通じて保持テーブル４の下部に取り付けられ、保持テーブル４にモータ６の回転力を伝達している。また、モータ６の回転軸６１には、不図示の流路が形成されており、シール部１４を介して吸引源１５に接続されている。シール部１４は、磁気シール等で構成されており、回転軸６１を回転可能に支持すると共に回転軸６１内の流路を吸引源１５に接続させている。このような構成により、保持テーブル４の保持面４１に吸引源１５からの吸引力が伝達される。   The motor 6 is suspended from the upper lid portion 7, and the rotating shaft 61 protrudes into the opening 71 of the upper lid portion 7. The rotating shaft 61 is attached to the lower part of the holding table 4 through the opening 71 and transmits the rotational force of the motor 6 to the holding table 4. Further, a flow path (not shown) is formed in the rotating shaft 61 of the motor 6 and is connected to the suction source 15 via the seal portion 14. The seal portion 14 is configured by a magnetic seal or the like, and rotatably supports the rotary shaft 61 and connects the flow path in the rotary shaft 61 to the suction source 15. With such a configuration, the suction force from the suction source 15 is transmitted to the holding surface 41 of the holding table 4.

ケース２の外壁部２１は、多角形の筒状に形成されており、一外側面２４にテーブルカバー３を昇降させるシリンダ８が取り付けられている。シリンダ８内にはロッド８１が収容されており、シリンダ８から突出したロッド８１の先端にはテーブルカバー３が固定されている。ロッド８１には、シリンダ８内を上下に仕切るようにピストン８２が設けられている。シリンダ８の下端側には、ピストン８２の下方空間にエアを取り込む連通口８３が形成され、シリンダ８の上端側には、ピストン８２の上方空間にエアを取り込む連通口８４が形成されている。連通口８３、８４に対する吸排気により、ロッド８１を介してテーブルカバー３が昇降される。   The outer wall portion 21 of the case 2 is formed in a polygonal cylindrical shape, and a cylinder 8 that raises and lowers the table cover 3 is attached to one outer side surface 24. A rod 81 is accommodated in the cylinder 8, and the table cover 3 is fixed to the tip of the rod 81 protruding from the cylinder 8. The rod 81 is provided with a piston 82 so as to partition the inside of the cylinder 8 up and down. A communication port 83 for taking air into the space below the piston 82 is formed on the lower end side of the cylinder 8, and a communication port 84 for taking air into the space above the piston 82 is formed on the upper end side of the cylinder 8. The table cover 3 is moved up and down via the rod 81 by intake and exhaust of the communication ports 83 and 84.

テーブルカバー３は、保持テーブル４の下部周囲を囲う底板３１と、底板３１の外周から垂直に立ち上がる側板３２とからなる箱形状に形成されている。テーブルカバー３の底板３１には、全域にわたって複数の穴３３が等間隔に形成されている。底板３１の上にはシート状のネット３５が敷設されており、ネット３５の網目に洗浄ノズル５から噴出されて飛散した噴霧が捕捉される。ネット３５が噴霧を捕捉すると、ネット３５と底板３１との間に洗浄水が貯水され、底板３１の全面に洗浄水の膜（層）１７が形成される（図３参照）。洗浄時には、この洗浄水の膜１７により環状空間Ａ１の上面が覆われる。   The table cover 3 is formed in a box shape including a bottom plate 31 that surrounds the lower periphery of the holding table 4 and a side plate 32 that rises vertically from the outer periphery of the bottom plate 31. A plurality of holes 33 are formed in the bottom plate 31 of the table cover 3 at equal intervals over the entire area. A sheet-like net 35 is laid on the bottom plate 31, and the spray sprayed and scattered from the cleaning nozzle 5 on the net of the net 35 is captured. When the net 35 captures the spray, cleaning water is stored between the net 35 and the bottom plate 31, and a cleaning water film (layer) 17 is formed on the entire surface of the bottom plate 31 (see FIG. 3). During cleaning, the cleaning water film 17 covers the upper surface of the annular space A1.

テーブルカバー３の側板３２は、ケース２の外壁部２１に沿って多角形の筒状に形成されている。側板３２の一外側面３６の上端部には、シリンダ８から突出したロッド８１が固定されている。非洗浄時には、テーブルカバー３が下降され、側板３２及び底板３１がケース２内に収容される。また洗浄時には、テーブルカバー３が上昇され、保持テーブル４の周囲が側板に囲まれると共に保持テーブル４の下部周囲が底板３１に覆われる。このため、非洗浄時には保持テーブル４を外部に露出させて搬送可能とし、洗浄時には保持テーブル４の周囲を覆って洗浄室Ａ３（図３参照）が形成される。   The side plate 32 of the table cover 3 is formed in a polygonal cylindrical shape along the outer wall portion 21 of the case 2. A rod 81 protruding from the cylinder 8 is fixed to the upper end portion of the one outer side surface 36 of the side plate 32. At the time of non-cleaning, the table cover 3 is lowered, and the side plate 32 and the bottom plate 31 are accommodated in the case 2. At the time of cleaning, the table cover 3 is raised, the periphery of the holding table 4 is surrounded by the side plate, and the lower periphery of the holding table 4 is covered by the bottom plate 31. Therefore, the holding table 4 is exposed to the outside during non-cleaning and can be transported, and the cleaning chamber A3 (see FIG. 3) is formed to cover the periphery of the holding table 4 during cleaning.

保持テーブル４の上面には、ポーラスセラミック材によって板状ワークＷの下面を保持する保持面４１が形成されている。保持面４１の上方には、板状ワークＷに向けて洗浄水を噴出する洗浄ノズル５が配置されている。本実施の形態の洗浄装置１では、高圧の洗浄水を噴射して洗浄効率を高める高圧洗浄や、洗浄水と気体を混合して気体の圧力を利用して洗浄する２流体洗浄が採用されており、洗浄ノズル５からは洗浄水が噴出される。また、洗浄ノズル５の噴出口は、板状ワークＷの外周部に向けられており、特に板状ワークＷの外周部に付着した汚れを洗浄するように構成されている。   A holding surface 41 is formed on the upper surface of the holding table 4 to hold the lower surface of the plate-like workpiece W with a porous ceramic material. Above the holding surface 41, a cleaning nozzle 5 that ejects cleaning water toward the plate-like workpiece W is disposed. In the cleaning apparatus 1 of the present embodiment, high-pressure cleaning that injects high-pressure cleaning water to increase cleaning efficiency and two-fluid cleaning that mixes cleaning water and gas and performs cleaning using the pressure of the gas are employed. The cleaning water is ejected from the cleaning nozzle 5. Further, the jet nozzle of the cleaning nozzle 5 is directed to the outer peripheral portion of the plate-like workpiece W, and is configured to particularly clean dirt adhering to the outer peripheral portion of the plate-like workpiece W.

このように構成された洗浄装置１では、保持テーブル４が回転され、洗浄ノズル５から保持テーブル４上の板状ワークＷの外周部に洗浄水が吹き当てられる。洗浄水は、板状ワークＷの外周部に吹き当てられると、噴霧となって周辺に飛散して環状空間Ａ１に流れ込む。このとき、テーブルカバー３の底板３１上のネット３５に噴霧が捕捉され、底板３１とネット３５との間に洗浄水の膜１７が形成される。そして、以降に発生した噴霧が、この洗浄水の膜１７に吸収されることで洗浄室内の噴霧量が低減される。   In the cleaning apparatus 1 configured as described above, the holding table 4 is rotated, and cleaning water is sprayed from the cleaning nozzle 5 to the outer peripheral portion of the plate-like workpiece W on the holding table 4. When the washing water is sprayed on the outer peripheral portion of the plate-like workpiece W, it is sprayed and scattered around and flows into the annular space A1. At this time, the spray is captured by the net 35 on the bottom plate 31 of the table cover 3, and the cleaning water film 17 is formed between the bottom plate 31 and the net 35. The spray generated thereafter is absorbed by the cleaning water film 17, thereby reducing the amount of spray in the cleaning chamber.

図３を参照して、本実施の形態に係る洗浄装置による洗浄動作について説明する。図３は、本実施の形態に係る洗浄装置の洗浄動作の説明図である。なお、図３に示す洗浄装置による洗浄動作は一例を示すものであり、適宜変更が可能である。   With reference to FIG. 3, the cleaning operation by the cleaning apparatus according to the present embodiment will be described. FIG. 3 is an explanatory diagram of the cleaning operation of the cleaning apparatus according to the present embodiment. Note that the cleaning operation by the cleaning apparatus shown in FIG. 3 is an example, and can be changed as appropriate.

図３Ａに示すように、保持テーブル４の保持面４１に板状ワークＷが吸引保持され、テーブルカバー３が上昇される。これにより、保持テーブル４の周囲がテーブルカバー３の側板３２に覆われて洗浄室Ａ３が形成され、保持テーブル４の下部周囲にテーブルカバー３の底板３１が位置付けられる。そして、洗浄が開始されると、板状ワークＷを保持した状態で保持テーブル４が回転され、板状ワークＷの外周部に向けて洗浄ノズル５から洗浄水が噴出される。洗浄水は板状ワークＷの外周部に衝突して噴霧となり、保持テーブル４の周囲に飛散して洗浄ノズル５の下方からケース２の環状空間Ａ１に向けて流れ込む。   As shown in FIG. 3A, the plate-like workpiece W is sucked and held on the holding surface 41 of the holding table 4, and the table cover 3 is raised. Thus, the periphery of the holding table 4 is covered with the side plate 32 of the table cover 3 to form the cleaning chamber A3, and the bottom plate 31 of the table cover 3 is positioned around the lower portion of the holding table 4. When cleaning is started, the holding table 4 is rotated in a state where the plate-like workpiece W is held, and cleaning water is ejected from the cleaning nozzle 5 toward the outer peripheral portion of the plate-like workpiece W. The washing water collides with the outer peripheral portion of the plate-like workpiece W to be sprayed, scatters around the holding table 4 and flows from below the washing nozzle 5 toward the annular space A1 of the case 2.

このとき、噴霧となった洗浄水がネット３５の網目に捕捉され、ネット３５の網目と底板３１の穴３３が形成されていない箇所との間に貯水され始める。そして、底板３１上に小さな液溜まりが形成され、洗浄水の噴霧が環状空間に流れ込むのにつれて液溜まりが成長する。これにより、洗浄ノズル５の下方において底板３１とネット３５との間に洗浄水の膜１７が形成され、テーブルカバー３の洗浄室Ａ３からケース２の環状空間Ａ１に向う噴霧が洗浄水の膜１７に捕捉される。洗浄水の膜１７は、空気中の噴霧を吸収してネット３５を持ち上げつつ厚みを増していく。   At this time, the sprayed washing water is captured by the mesh of the net 35 and begins to be stored between the mesh of the net 35 and the portion where the hole 33 of the bottom plate 31 is not formed. Then, a small liquid reservoir is formed on the bottom plate 31, and the liquid reservoir grows as the spray of cleaning water flows into the annular space. As a result, a cleaning water film 17 is formed between the bottom plate 31 and the net 35 below the cleaning nozzle 5, and the spray from the cleaning chamber A 3 of the table cover 3 toward the annular space A 1 of the case 2 is sprayed on the cleaning water film 17. Captured. The cleaning water film 17 absorbs spray in the air and increases the thickness while lifting the net 35.

また図３Ｂに示すように、洗浄開始時には洗浄水の噴霧の一部は、ネット３５に捕捉されずにケース２の環状空間Ａ１内に流れ込む。そして、噴霧の一部は環状空間Ａ１内に広がって、洗浄ノズル５の下方以外においても環状空間Ａ１から洗浄室Ａ３に向かって噴霧が上昇する。このとき、洗浄ノズル５の下方以外においても、噴霧がネット３５の網目に捕捉され、ネット３５の網目と底板３１の穴３３が形成されていない箇所との間に貯水され始める。そして、底板３１の全域にわたって液溜まりが形成されて、洗浄室Ａ３と環状空間Ａ１との間が洗浄水の膜１７によって仕切られる。   Further, as shown in FIG. 3B, at the start of cleaning, part of the spray of cleaning water flows into the annular space A <b> 1 of the case 2 without being captured by the net 35. A part of the spray spreads in the annular space A1, and the spray rises from the annular space A1 toward the cleaning chamber A3 even outside the lower part of the cleaning nozzle 5. At this time, the spray is trapped in the mesh of the net 35 except at the lower side of the cleaning nozzle 5 and starts to be stored between the mesh of the net 35 and the portion where the hole 33 of the bottom plate 31 is not formed. Then, a liquid pool is formed over the entire area of the bottom plate 31, and the cleaning water film 17 partitions the cleaning chamber A3 and the annular space A1.

このように、洗浄ノズル５から近い位置では、洗浄室Ａ３から環状空間Ａ１に向う噴霧により洗浄水の膜１７が形成され、洗浄ノズル５から遠い位置では、環状空間Ａ１から洗浄室Ａ３に向う噴霧により洗浄水の膜１７が形成される。底板３１の全域に洗浄水の膜１７が形成されると、洗浄ノズル５付近では環状空間Ａ１に向う前に噴霧の大部分が洗浄水の膜１７に吸収される。また、噴霧の一部はケース２と底板３１の隙間から環状空間Ａ１に入り込むが、環状空間Ａ１の全体に広がり、洗浄ノズル５から離れた場所で再び洗浄室Ａ３に向う間に洗浄水の膜１７に吸収される。   As described above, the cleaning water film 17 is formed by spraying from the cleaning chamber A3 toward the annular space A1 at a position close to the cleaning nozzle 5, and spraying from the annular space A1 toward the cleaning chamber A3 at a position far from the cleaning nozzle 5. As a result, the cleaning water film 17 is formed. When the cleaning water film 17 is formed over the entire area of the bottom plate 31, most of the spray is absorbed by the cleaning water film 17 in the vicinity of the cleaning nozzle 5 before moving toward the annular space A <b> 1. Further, a part of the spray enters the annular space A1 through the gap between the case 2 and the bottom plate 31, but spreads over the entire annular space A1 and forms a film of cleaning water while again going to the cleaning chamber A3 at a location away from the cleaning nozzle 5. 17 is absorbed.

洗浄水の膜１７は、空気中の噴霧を吸収して所定量を超えた時点で底板３１の穴３３から流れ落ち、ケース２の外壁部２１に設けた排水口２５を通じて外部に排水される。よって、洗浄室Ａ３内で発生した洗浄水の噴霧が環状空間Ａ１から再び洗浄室Ａ３に循環することが抑えられ、板状ワークＷ等への洗浄水の付着が防止される。また、ネット３５に捕捉された洗浄水が液体の状態でケース２の排水口２５から外部に排出されるので、ケース２に強制排気の設備を設ける必要がない。よって、穴３３の空いた底板３１にネット３５を敷設するという簡易な構成で、噴霧となった洗浄水を液体に変えて外部に排出することを可能にしている。   When the cleaning water film 17 absorbs the spray in the air and exceeds a predetermined amount, it flows down from the hole 33 of the bottom plate 31 and is drained to the outside through the drain port 25 provided in the outer wall portion 21 of the case 2. Therefore, the spray of the cleaning water generated in the cleaning chamber A3 is prevented from circulating again from the annular space A1 to the cleaning chamber A3, and the adhesion of the cleaning water to the plate-like workpiece W or the like is prevented. Further, since the wash water captured by the net 35 is discharged from the drain port 25 of the case 2 in a liquid state, it is not necessary to provide the case 2 with forced exhaust facilities. Therefore, with a simple configuration in which the net 35 is laid on the bottom plate 31 having the holes 33, the sprayed cleaning water can be changed into a liquid and discharged to the outside.

（実験例）
ここで、異なる大きさの網目を持つネット３５によって洗浄処理を実施したところ、表１に示すような結果が得られた。ここでは、ネット３５の一例として、大日本プラスチックス株式会社製のネトロン（登録商標）とタキロン株式会社製のトリカルネット（登録商標）を使用した。ネトロン及びトリカルネットは、高密度ポリエチレンを主原料とするプラスチック材料を網目状に成形したプラスチックネットである。また実験では、ネトロンは呼称Ｄ６の１種類、トリカルネットは呼称Ｎ−２、Ｎ−３、Ｎ−９の３種類を使用して実験した。 (Experimental example)
Here, when the cleaning process was performed using the nets 35 having different mesh sizes, the results shown in Table 1 were obtained. Here, as an example of the net 35, Netron (registered trademark) manufactured by Dainippon Plastics Co., Ltd. and Tricarnet (registered trademark) manufactured by Takiron Co., Ltd. were used. Netron and Tricarnet are plastic nets in which a plastic material mainly made of high-density polyethylene is formed into a mesh shape. In the experiment, the netron was tested using one type of designation D6, and the tricarnet was used using three types of designations N-2, N-3, and N-9.

また、ネトロン（Ｄ６）は、縦糸ピッチ２ｍｍ、横糸ピッチ２ｍｍ、糸太さ（厚み）１．４ｍｍ、開孔率５０％のものと、縦糸ピッチ３ｍｍ、横糸ピッチ３ｍｍ、糸太さ１．４ｍｍ、開孔率５５％のものがある。トリカルネット（Ｎ−２）は、縦糸ピッチ１．８ｍｍ、横糸ピッチ１．８ｍｍ、糸太さ０．５ｍｍ、開孔率４５％である。トリカルネット（Ｎ−３）は、縦糸ピッチ１．９ｍｍ、横糸ピッチ２．８ｍｍ、糸太さ０．５ｍｍ、開孔率４２％である。トリカルネット（Ｎ−９）は、縦糸ピッチ３．０ｍｍ、横糸ピッチ３．０ｍｍ、糸太さ０．９ｍｍ、開孔率６５％である。   The netron (D6) has a warp pitch of 2 mm, a weft pitch of 2 mm, a thread thickness (thickness) of 1.4 mm, and an aperture ratio of 50%. There are those with an open area ratio of 55%. Tricarnet (N-2) has a warp pitch of 1.8 mm, a weft pitch of 1.8 mm, a yarn thickness of 0.5 mm, and an aperture ratio of 45%. Tricarnet (N-3) has a warp pitch of 1.9 mm, a weft pitch of 2.8 mm, a thread thickness of 0.5 mm, and a hole area ratio of 42%. Tricarnet (N-9) has a warp pitch of 3.0 mm, a weft pitch of 3.0 mm, a yarn thickness of 0.9 mm, and a hole area ratio of 65%.

なお、図４に示すように、縦糸ピッチとは幅方向に離れた縦糸間隔を示し、横糸ピッチとは長さ方向に離れた横糸間隔を示している。また、実験では底板３１として、板厚１．５ｍｍで、穴径φ６．０ｍｍ、穴の縦ピッチ１０．０ｍｍ、横ピッチ１０．０ｍｍのものを使用した。   As shown in FIG. 4, the warp pitch indicates the warp interval separated in the width direction, and the weft pitch indicates the weft interval separated in the length direction. In the experiment, a bottom plate 31 having a plate thickness of 1.5 mm, a hole diameter of 6.0 mm, a hole vertical pitch of 10.0 mm, and a horizontal pitch of 10.0 mm was used.

Figure 2014112588
Figure 2014112588

表１に示すように、呼称Ｄ６のネトロンでは、いずれも２枚重ねで洗浄水の層が形成された。呼称Ｎ−２のトリカルネットでは、１枚でも洗浄水の層が形成され、機能的に問題が見当たらなかった。呼称Ｎ−３のトリカルネットでは、洗浄水の層が形成されず使用することができなかった。呼称Ｎ−９のトリカルネットでは、２枚重ねで洗浄水の層が形成された。この結果、ネット３５として、呼称Ｎ−２のトリカルネット、すなわち、縦糸ピッチ１．８ｍｍ、横糸ピッチ１．８ｍｍ、糸太さ０．５ｍｍ程度のものが優れていることが確認された。   As shown in Table 1, in the netron of the name D6, a washing water layer was formed by stacking two sheets. In the N-2 tricarnet, a single layer of washing water was formed, and no functional problem was found. The tricarnet of the name N-3 could not be used because the washing water layer was not formed. In Tricarnet of the name N-9, a layer of washing water was formed by overlapping two sheets. As a result, it was confirmed that the net 35 is superior in the N-2 triangular net, that is, a warp pitch of 1.8 mm, a weft pitch of 1.8 mm, and a thread thickness of about 0.5 mm.

なお、２枚重ねで使用する場合には、上下のネット３５を４５度ずらして重ねることが好ましい。また、ネット３５は、上記したものに限定されず、材質、縦糸ピッチ、横糸ピッチ、糸太さ、開口率等は特に限定されず、底板の穴径や穴ピッチ等に応じて任意に決定することができる。   In addition, when using it by overlapping two sheets, it is preferable to overlap the upper and lower nets 35 by shifting 45 degrees. The net 35 is not limited to the above-described ones, and the material, warp pitch, weft pitch, thread thickness, aperture ratio, etc. are not particularly limited, and are arbitrarily determined according to the hole diameter, hole pitch, etc. of the bottom plate. be able to.

以上のように、本実施の形態に係る加工装置によれば、洗浄中に発生した噴霧が底板３１の上に敷設されたネット３５の網目に捕捉され、底板３１とネット３５との間に噴霧が溜まって洗浄水の膜１７が形成される。洗浄水の膜１７が形成されると、洗浄時に発生した噴霧が洗浄水の膜１７に吸収され、洗浄水の膜１７の膜厚が大きくなった時点で底板３１の穴から流れ落ちて外部に排出される。よって、噴霧を強制排気するための設備が不要となり、装置構成を簡略化することが可能となっている。   As described above, according to the processing apparatus according to the present embodiment, the spray generated during the cleaning is captured in the mesh of the net 35 laid on the bottom plate 31 and sprayed between the bottom plate 31 and the net 35. Accumulates and a film 17 of cleaning water is formed. When the cleaning water film 17 is formed, the spray generated at the time of cleaning is absorbed by the cleaning water film 17 and flows down from the hole in the bottom plate 31 when the thickness of the cleaning water film 17 increases and is discharged to the outside. Is done. Therefore, a facility for forcibly exhausting the spray is not necessary, and the apparatus configuration can be simplified.

なお、本発明は上記実施の形態に限定されず、種々変更して実施することが可能である。上記実施の形態において、添付図面に図示されている大きさや形状などについては、これに限定されず、本発明の効果を発揮する範囲内で適宜変更することが可能である。その他、本発明の目的の範囲を逸脱しない限りにおいて適宜変更して実施することが可能である。   In addition, this invention is not limited to the said embodiment, It can change and implement variously. In the above-described embodiment, the size, shape, and the like illustrated in the accompanying drawings are not limited to this, and can be appropriately changed within a range in which the effect of the present invention is exhibited. In addition, various modifications can be made without departing from the scope of the object of the present invention.

例えば、上記した実施の形態において、洗浄装置１は、板状ワークＷの外周部に向けて洗浄水を噴出して板状ワークＷを洗浄する構成としたが、この構成に限定されない。洗浄装置１は、板状ワークＷに洗浄水を吹き付けて洗浄する構成であれば、どのように構成されていてもよい。   For example, in the above-described embodiment, the cleaning device 1 is configured to eject the cleaning water toward the outer peripheral portion of the plate-shaped workpiece W to clean the plate-shaped workpiece W, but is not limited to this configuration. The cleaning device 1 may be configured in any way as long as it is configured to spray cleaning water on the plate-like workpiece W to perform cleaning.

また、上記した実施の形態において、洗浄ノズル５として、高圧洗浄又は２流体洗浄に対応したものが使用されたが、この構成に限定されない。洗浄ノズル５は、板状ワークＷに向けて洗浄水を噴射するものであれば特に限定されない。   In the above-described embodiment, the cleaning nozzle 5 is compatible with high-pressure cleaning or two-fluid cleaning, but is not limited to this configuration. The cleaning nozzle 5 is not particularly limited as long as the cleaning water is jetted toward the plate-like workpiece W.

また、上記した実施の形態において、底板３１の全域にわたって多数の穴３３が形成される構成としたが、この構成に限定されない。底板３１には、洗浄水の膜１７が所定量を超えた時点で流れ落ちる程度に穴３３が空けられていればよい。   Further, in the above-described embodiment, the configuration is such that a large number of holes 33 are formed over the entire area of the bottom plate 31, but the present invention is not limited to this configuration. It is only necessary that the bottom plate 31 has a hole 33 to such an extent that the cleaning water film 17 flows down when the amount exceeds a predetermined amount.

また、上記した実施の形態において、底板３１は、保持テーブル４の下部周囲を全体的に囲う構成としたが、この構成に限定されない。底板３１は、保持テーブル４の下部周囲を部分的に囲う構成でもよい。   In the above-described embodiment, the bottom plate 31 is configured to entirely surround the lower periphery of the holding table 4, but is not limited to this configuration. The bottom plate 31 may partially surround the lower periphery of the holding table 4.

また、上記した実施の形態において、底板３１の穴３３やネット３５の網目が等ピッチに形成されたが、この構成に限定されない。底板３１の穴３３やネット３５の網目は、洗浄水の噴霧を捕捉して膜１７を形成できるのであれば、どのように設けられてもよい。   In the above-described embodiment, the holes 33 of the bottom plate 31 and the meshes of the net 35 are formed at an equal pitch. However, the present invention is not limited to this configuration. The holes 33 of the bottom plate 31 and the meshes of the net 35 may be provided in any manner as long as the film 17 can be formed by capturing the spray of cleaning water.

以上説明したように、本発明は、洗浄時に発生する噴霧を強制排気することなく、簡易な構成により外部に排出することができるという効果を有し、特に、板状ワークの外周部分に付着する汚れを洗浄する洗浄装置に有用である。   As described above, the present invention has an effect that the spray generated at the time of cleaning can be discharged to the outside with a simple configuration without forcibly exhausting, and in particular, adheres to the outer peripheral portion of the plate-like workpiece. It is useful for a cleaning device for cleaning dirt.

１ 洗浄装置
２ ケース
３ テーブルカバー
４ 保持テーブル
５ 洗浄ノズル
６ モータ
１７ 洗浄水の膜
２５ 排水口
３１ 底板
３２ 側板
３３ 穴
３５ ネット
Ｗ 板状ワーク DESCRIPTION OF SYMBOLS 1 Cleaning apparatus 2 Case 3 Table cover 4 Holding table 5 Cleaning nozzle 6 Motor 17 Cleaning water film 25 Drain port 31 Bottom plate 32 Side plate 33 Hole 35 Net W Plate-shaped workpiece

Claims (1)

板状ワークを保持する保持テーブルと、該保持テーブルの中心を軸に回転させるモータと、該保持テーブルが保持する板状ワークを洗浄する流体を噴出させる洗浄ノズルと、該保持テーブルの下面を囲繞するテーブルカバーと、を少なくとも備えた洗浄装置であって、
該テーブルカバーは、該保持テーブルの下部周囲を囲い複数の穴を備えた底板と、該底板に連結され該底板の外周から垂直方向に立ち上がる側板と、からなる箱形状で形成され、該底板の上に編み目でシート状のネットを敷設させた洗浄装置。 A holding table for holding a plate-shaped workpiece, a motor that rotates about the center of the holding table, a cleaning nozzle for ejecting a fluid for cleaning the plate-shaped workpiece held by the holding table, and a lower surface of the holding table A cleaning device comprising at least a table cover to perform,
The table cover is formed in a box shape including a bottom plate that surrounds the lower periphery of the holding table and includes a plurality of holes, and a side plate that is connected to the bottom plate and rises vertically from the outer periphery of the bottom plate. A cleaning device with a sheet-like net laid on top.
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CN109622469A (en) * 2018-12-05 2019-04-16 贵州盘江矿山机械有限公司 A kind of platform rinsed for comprehensive mining hydraulic bracket

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60161767A (en) * 1984-01-31 1985-08-23 Nec Corp Automatic rotary coating machine
JP2001068402A (en) * 1999-08-31 2001-03-16 Dainippon Screen Mfg Co Ltd Board treatment equipment
JP2010010251A (en) * 2008-06-25 2010-01-14 Tokyo Electron Ltd Substrate processing device
JP2011181588A (en) * 2010-02-26 2011-09-15 Takata Corp Device for processing semiconductor substrate

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3377121B2 (en) * 1994-01-18 2003-02-17 株式会社ディスコ Spinner cleaning equipment
US20040224524A1 (en) * 2003-05-09 2004-11-11 Applied Materials, Inc. Maintaining the dimensions of features being etched on a lithographic mask
JP4803592B2 (en) * 2006-06-16 2011-10-26 東京エレクトロン株式会社 Liquid processing apparatus and liquid processing method
KR100901495B1 (en) * 2007-10-11 2009-06-08 세메스 주식회사 Substrate processing apparatus and method of cleaning for the same
KR101172591B1 (en) * 2010-05-11 2012-08-08 주식회사 케이씨텍 Rinsing and drying device of chemical mechanical polishing system
CN202238724U (en) * 2011-10-11 2012-05-30 大久制作(大连)有限公司 Automatic substrate cleaning machine with liquid splashing prevention effect

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60161767A (en) * 1984-01-31 1985-08-23 Nec Corp Automatic rotary coating machine
JP2001068402A (en) * 1999-08-31 2001-03-16 Dainippon Screen Mfg Co Ltd Board treatment equipment
JP2010010251A (en) * 2008-06-25 2010-01-14 Tokyo Electron Ltd Substrate processing device
JP2011181588A (en) * 2010-02-26 2011-09-15 Takata Corp Device for processing semiconductor substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109622469A (en) * 2018-12-05 2019-04-16 贵州盘江矿山机械有限公司 A kind of platform rinsed for comprehensive mining hydraulic bracket

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