JP5816468B2 - Substrate storage device - Google Patents

Description

  The present invention relates to a substrate housing apparatus.

  As a coating technique for applying a liquid material to a substrate, for example, a configuration is known in which a substrate is accommodated in a substrate accommodating device provided with a cup, and the liquid material is discharged from a nozzle onto the substrate while being accommodated in the substrate accommodating device. (For example, refer to Patent Document 1).

Japanese Patent Laid-Open No. 03-026370

  However, in the above configuration, there are cases where the coating liquid scatters in the form of mist when performing the coating operation. If the coating liquid scattered in a mist form adheres to a portion other than the substrate in the apparatus, there is a problem that the apparatus is soiled.

  In view of the circumstances as described above, an object of the present invention is to provide a substrate housing apparatus that can clean the environment in the apparatus.

  A substrate housing apparatus according to a first aspect of the present invention includes a substrate holding portion that holds a substrate, a cup portion that surrounds the substrate held by the substrate holding portion, and a gap between the substrate and the cup portion. And a recovery liquid supply unit that supplies a recovery liquid for recovering foreign matter.

  According to the present invention, since the recovery liquid from the recovery liquid supply unit is supplied between the substrate and the cup unit, foreign matter between the substrate and the cup can be recovered. Thereby, the environment of an apparatus can be cleaned.

The substrate accommodation apparatus further includes a recovery liquid storage section that stores the recovery liquid supplied from the recovery liquid supply section.
According to the present invention, since the recovery liquid storage unit that stores the recovery liquid supplied from the recovery liquid supply unit is further provided, the supplied recovery liquid can be stored. Can be recovered.

In the substrate accommodation apparatus, the cup portion includes a wall portion that surrounds a side portion of the substrate, and a bottom portion that supports the wall portion, and the recovered liquid storage portion includes a part of the wall portion and the wall portion. It is provided in the part containing a bottom part.
According to the present invention, the cup portion has a wall portion that surrounds the side portion of the substrate and a bottom portion that supports the wall portion, and the recovered liquid storage portion is provided in a portion that includes a part of the wall portion and the bottom portion. Therefore, foreign matter can be collected at the wall and bottom.

In the substrate housing apparatus, the recovery liquid supply unit includes a first nozzle that discharges the recovery liquid toward the recovery liquid storage unit.
According to the present invention, since the recovery liquid is discharged from the first nozzle toward the recovery liquid reservoir, a flow of the recovery liquid by discharge can be formed. Thereby, the foreign material adhering to a collection | recovery liquid storage part can be washed away.

In the substrate accommodation apparatus, the first nozzle is provided in the substrate holding unit.
According to the present invention, since the first nozzle is provided in the substrate holding part, the recovery liquid is discharged from the substrate holding part to the recovery liquid storage part. Thereby, foreign substances can be washed away between the substrate holding part and the collected liquid storage part.

In the substrate storage device, the recovery liquid storage section is formed in an annular shape along the outer periphery of the substrate, and the recovery liquid supply section supplies the recovery liquid toward the circumferential direction of the recovery liquid storage section. A second nozzle for discharging;
According to the present invention, the recovery liquid storage part is formed in an annular shape along the outer periphery of the substrate, and the recovery liquid supply part has the second nozzle that discharges the recovery liquid toward the circumferential direction of the recovery liquid storage part. The flow of the recovery liquid can be formed in the circumferential direction of the recovery liquid storage part. Thereby, it can prevent that the collect | recovered foreign material settles and accumulates.

In the substrate accommodation apparatus, a plurality of the second nozzles are provided, and the plurality of second nozzles are arranged at a pitch equal to the circumferential direction of the recovered liquid storage unit.
According to the present invention, a plurality of second nozzles are provided, and the plurality of second nozzles are arranged at a pitch equal to the circumferential direction of the recovered liquid storage part, so that the flow of recovered liquid is uniform in the circumferential direction of the recovered liquid storage part Can be formed.

In the substrate storage apparatus, the recovery liquid storage unit includes a discharge unit that discharges the recovery liquid.
According to the present invention, since the recovery liquid containing foreign matter can be discharged from the discharge portion, the foreign matter can be removed from the inside of the apparatus.

Said board | substrate accommodation apparatus is further provided with the suction part which attracts | sucks the space enclosed by the said cup part.
According to the present invention, since the space surrounded by the cup portion can be sucked, gas, recovered liquid, foreign matter, and the like can be removed by suction from the space surrounded by the cup portion.

In the substrate accommodation apparatus, the suction part has a suction path connected to the outside via the cup part.
According to the present invention, since the suction part has a suction path connected to the outside via the cup part, it is possible to remove the collected liquid, foreign matters, and the like via the suction path.

In the substrate accommodation apparatus, the suction part includes a gas-liquid separation part provided in the suction path.
According to the present invention, since the gas-liquid separator is provided in the suction path, the recovered liquid can be separated from the sucked substance.

Said board | substrate accommodation apparatus is further provided with the sending part which sends the said collection | recovery liquid which arrived at the said gas-liquid separation part and was isolate | separated to the said collection | recovery liquid supply part.
According to the present invention, since the recovered liquid separated after reaching the gas-liquid separator can be sent to the recovered liquid supply, the recovered liquid can be reused.

In the above-described substrate housing apparatus, the cup portion further includes a cleaning liquid nozzle that discharges a cleaning liquid toward the wall portion, having a wall portion surrounding the side portion of the substrate.
According to the present invention, since the cup portion has the wall portion surrounding the side portion of the substrate and the cleaning liquid nozzle that discharges the cleaning liquid toward the wall portion is provided, the wall portion can be cleaned.

In the above substrate storage device, the same type of liquid as the recovered liquid is used as the cleaning liquid.
According to the present invention, since the same type of liquid as the recovery liquid is used as the cleaning liquid, foreign substances can be recovered using the cleaning liquid. Further, the supply source of the cleaning liquid and the recovery liquid can be shared.

In the substrate accommodation apparatus, the substrate holding unit includes an adsorption unit that adsorbs the back surface of the substrate, and the adsorption unit includes a gas injection unit that injects gas toward the periphery of the substrate.
According to the present invention, since an air flow can be formed from the suction portion toward the periphery of the substrate, it is possible to prevent foreign matter from scattering toward the substrate.

In the substrate accommodation apparatus, the substrate holding unit includes a temperature adjustment unit that adjusts the temperature of the substrate.
According to the present invention, since the temperature of the substrate can be adjusted by the substrate holding part, the temperature of the substrate can be set to a temperature according to the accommodation purpose.

  According to the present invention, the environment in the apparatus can be cleaned.

Sectional drawing which shows the structure of the coating device which concerns on embodiment of this invention. The top view which shows the structure of the coating device which concerns on this embodiment. The figure which shows the one part structure of the coating device which concerns on this embodiment. The figure which shows operation | movement of the coating device which concerns on this embodiment. The figure which shows operation | movement of the coating device which concerns on this embodiment. The figure which shows the other operation example of the coating device which concerns on this embodiment. The figure which shows the other operation example of the coating device which concerns on this embodiment. The figure which shows the other structure of the coating device which concerns on this embodiment, and another operation example.

Embodiments of the present invention will be described below with reference to the drawings.
FIG. 1 is a diagram illustrating a configuration of a coating apparatus CTR according to the present embodiment.
As shown in FIG. 1, the coating apparatus CTR includes a substrate container ACM and a coating nozzle CNZ. The coating apparatus CTR is an apparatus that applies a liquid material to the substrate S accommodated in the substrate accommodation apparatus ACM using the application nozzle CNZ. The coating device CTR is used by being placed on a floor surface parallel to a horizontal plane. As the coating nozzle CNZ, for example, various nozzles such as a spray nozzle, a slit nozzle, and a spin coating dropping nozzle can be used.

  Hereinafter, when the configuration of the coating apparatus CTR according to the present embodiment is described, an XYZ orthogonal coordinate system is used. Here, one direction on the horizontal plane is defined as an X direction, a direction parallel to the horizontal plane and perpendicular to the X direction is defined as a Y direction, and a vertical direction is defined as a Z direction. In addition, the directions around the X axis, the Y axis, and the Z axis may be described as the θX direction, the θY direction, and the θZ direction.

  The substrate storage device ACM includes a substrate holding unit 10, a cup unit 20, a recovery liquid supply unit 30, a recovery liquid storage unit 40, a suction unit 50, an elevating unit 60, and a control unit CONT. FIG. 2 is a diagram illustrating a configuration when the coating apparatus CTR is viewed from the + Z side. In FIG. 2, the configuration of the elevating unit 60 is indicated by a one-dot chain line in order to make it easy to distinguish the figure.

  As shown in FIGS. 1 and 2, the substrate holding unit 10 includes an adsorption unit 11, a temperature control unit 12, and a gas injection unit 13. The suction part 11 is disposed in the center part of the cup part 20 as viewed in the Z direction. The suction part 11 is configured to perform a suction operation by a suction mechanism.

  A surface 11 a on the + Z side of the suction unit 11 is a holding surface that holds the substrate S. The holding surface 11a is formed flat so as to be parallel to the XY plane. The adsorption part 11 is disposed on the base 10a.

  The temperature adjustment unit 12 adjusts the temperature of the substrate S adsorbed by the adsorption unit 11. The temperature control unit 12 has a heating mechanism and a cooling mechanism (not shown). The operations of the heating mechanism and the cooling mechanism can be controlled by the control unit CONT. The temperature control part 12 is attached to the surface on the −Z side of the adsorption part 11 via a fixing member (not shown).

  The gas injection unit 13 injects a gas (for example, nitrogen gas) toward the periphery of the substrate S in a state of being adsorbed by the adsorption unit 11. The gas injection unit 13 has an injection port 13 a formed on the side surface of the adsorption unit 11. The injection port 13 a is opened toward the outside in the radial direction of the suction portion 11. The injection port is connected to a gas supply source (not shown) via a gas flow path 13b.

  The gas flow path 13b is inclined toward the + Z side with respect to the horizontal direction toward the outer side in the radial direction of the adsorption portion 11. For this reason, the gas injection unit 13 forms an air flow around the substrate S toward the outside in the radial direction and toward the + Z side. This airflow can prevent foreign matter from approaching the back surface of the substrate S.

  The cup unit 20 is disposed so as to surround the substrate S held by the substrate holding unit 10. The cup part 20 has a bottom part 21 and a wall part 22. The cup portion 20 is formed in a circular shape when viewed in the Z direction. An inclined portion 21a is formed on the bottom portion 21 toward the -Z side. As shown in FIG. 2, the inclined portion 21a is formed in an annular shape along the outer peripheral surface of the base 10a.

  As shown in FIGS. 1 and 2, the wall portion 22 is formed in a cylindrical shape so as to surround the periphery of the substrate holding portion 10. As shown in FIG. 1, a folded portion 22 a is formed at the + Z side end of the wall portion 22. The folded portion 22a is formed toward the center portion when the cup portion 20 is viewed in the Z direction.

  The recovered liquid supply unit 30 includes a first nozzle 31, a second nozzle 32, a cleaning liquid nozzle 33, and a supply source 34. The recovery liquid supply unit 30 supplies a recovery liquid that recovers foreign matter between the substrate S and the cup unit 20. Examples of the recovery liquid include pure water and a liquid solvent supplied from a coating nozzle.

  The first nozzle 31 is attached to the base 10a. The first nozzle 31 is directed outward with respect to the base 10a. Specifically, the first nozzle 31 is directed to the bottom portion 21 of the cup portion 20. The first nozzle 31 cleans a liquid receiving surface 61 a (described later) of the plate 61 provided in the elevating unit 60. The first nozzle 31 discharges the collected liquid toward the bottom 21. The first nozzles 31 are arranged at substantially the same pitch in the circumferential direction of the base 10a. For this reason, the recovered liquid is supplied evenly over the entire circumference of the liquid receiving surface 61a. It should be noted that air may be ejected from the first nozzle 31.

  The second nozzle 32 is formed on the outer peripheral surface of the base 10a. The second nozzle 32 is directed to the bottom portion 21 of the cup portion 20. The second nozzle 32 discharges the collected liquid to the bottom portion 21. The 2nd nozzle 32 is orient | assigned to the circumferential direction of the outer peripheral surface of the base 10a. Specifically, as shown in FIG. 2, it is directed in the counterclockwise direction. For this reason, the recovered liquid discharged from the second nozzle 32 forms a flow of the recovered liquid counterclockwise at the bottom 21. The second nozzles 32 are arranged at an equal pitch in the circumferential direction of the bottom portion 21. For this reason, the flow of the recovered liquid is formed at substantially the same speed over the circumference of the bottom portion 21.

  The cleaning liquid nozzle 33 is disposed on the inclined portion 21 a of the bottom portion 21. The cleaning liquid nozzle 33 is directed to the wall portion 22 of the cup portion 20. The cleaning liquid nozzle 33 discharges the cleaning liquid toward the wall portion 22. As the cleaning liquid, in addition to pure water and a liquid solvent supplied from a coating nozzle, for example, ozone water or the like can be used.

  The cleaning liquid nozzle 33 is provided such that the angle can be adjusted in a direction inclined with respect to the XY plane. For this reason, the direction of the cleaning liquid nozzle 33 can be adjusted in the range from the folded portion 22 a to the −Z side of the wall portion 22. In addition, by adjusting the angle of the cleaning liquid nozzle 33, it is possible to supply the cleaning liquid to an airflow adjusting member 62 (described later) provided in the elevating unit 60 and clean the airflow adjusting member 62. The cleaning liquid nozzles 33 are arranged at substantially the same pitch in the circumferential direction of the bottom portion 21. Therefore, the cleaning liquid is uniformly supplied to the wall portion 22 over one circumference in the circumferential direction.

  The supply source 34 is arrange | positioned outside the cup part 20, for example. The supply source 34 supplies the recovered liquid to the first nozzle 31 and the second nozzle 32. Thus, by making the supply source of the recovered liquid common to the first nozzle 31 and the second nozzle 32, it is possible to save space as compared with the case where the supply source is provided separately. In addition, maintenance labor is reduced. In addition, the supply source 34 supplies the cleaning liquid to the cleaning liquid nozzle 33. When the same kind of liquid is used as the recovery liquid and the cleaning liquid, the supply source can be made common to the cleaning liquid nozzle 33 as well.

  Further, the supply source 34 supplies clean dry air to the air ejection port 35. A plurality of air outlets 35 are provided on the + Z side of the first nozzle 31 in the base 10a. The plurality of air outlets 35 are arranged at an equal pitch in the circumferential direction of the base 10a. Each air jet 35 dries a liquid receiving surface 61 a (described later) of a plate 61 provided in the elevating unit 60. Each air jet 35 is directed to the bottom 21. Note that the recovered liquid may be ejected from the air ejection port 35.

  The collected liquid storage unit 40 includes a liquid receiving unit 41 and a discharge unit 42. The liquid receiving part 41 is formed in a part including the bottom part 21 of the cup part 20 and the -Z side part of the wall part 22. The liquid receiver 41 is a part that receives the recovered liquid discharged from the first nozzle 31, the recovered liquid discharged from the second nozzle 32, and the like. By maintaining the state in which the liquid receiver 41 receives the recovered liquid, the recovered liquid is stored in the recovered liquid storage section 40. The + Z side end 41 a of the outer peripheral portion of the liquid receiving part 41 is disposed on the −Z side with respect to the second nozzle 32.

The discharge part 42 is an opening formed in the bottom part 21 of the cup part 20. The discharge part 42 discharges the collected liquid stored in the liquid receiving part 41 to the outside of the cup part 20. The discharge part 42 is formed on the bottom surface of the inclined part 21a. For this reason, the collected liquid received by the liquid receiving part 41 is easily discharged through the inclined part 21a. A discharge path (not shown) is connected to the discharge unit 42. The discharge part 42 is provided with an open / close valve (not shown). The recovered liquid is stored in the recovered liquid storage section 40 by closing the open / close valve. Further, the recovered liquid is discharged from the discharge portion 42 by opening the on-off valve.
Further, an exhaust portion 24 is provided on the outer peripheral side of the wall portion 22. The exhaust part 24 serves to discharge the gas in the space K surrounded by the cup part 20 and to flow out the coating liquid adhering to the surface of the wall part 22. Note that the exhaust part 24 may not be provided. The exhaust part 24 is provided with trap parts 24a and 24b. By the trap parts 24a and 24b, at least a part of the gas component among the components discharged to the exhaust part 24 is sent to the opening part 24c, and the liquid component is sent to the opening part 24d. The trap parts 24a and 24b also have a function of liquefying a part of the gas component. In this case, the liquefied component is sent to the opening 24d. The opening 24 c of the exhaust part 24 is connected to the suction part 50. Further, the opening 24 d of the exhaust unit 24 is sent to a waste liquid recovery unit (not shown) or a supply source 34.

The suction part 50 sucks the space K surrounded by the cup part 20 through the exhaust part 24. The suction part 50 is connected to the opening 24 c of the exhaust part 24. The suction unit 50 is connected to the space K through the opening 24c and the traps 24a and 24b. FIG. 3 is a diagram illustrating a configuration of the suction unit 50.
As shown in FIG. 5, the suction unit 50 includes piping units 50 a to 50 f, a gas-liquid separation unit 51, and an ozone cleaning unit 52.

  The piping part 50 a is connected to the cup part 20. The piping part 50a is connected to the wall part 22 from the outside. The suction object existing inside the cup part 20 is sucked to the outside of the cup part 20 through the piping part 50a. The piping part 50 a is connected to the gas-liquid separation part 51.

  The gas-liquid separation part 51 has a trap part 51a. The gas-liquid separation part 51 sends out the liquid component of the sucked object in the cup part 20 to the pipe part 50b by the trap part 51a and sends the gas component to the pipe part 50c. The trap part 51a also has a function of liquefying a part of the gas component, and the liquefied component may be sent out to the pipe part 50b. A fan is provided in the piping part 50c, and the gas component sent to the piping part 50c is exhausted to the outside by factory exhaust or the like.

  The piping part 50 b is connected to the ozone cleaning part 52. The ozone cleaning unit 52 includes an ozone generator 52a and a cleaning tank 52b. The ozone gas generated in the ozone generator 52a comes into contact with the liquid component through a diffusion tube (not shown) provided in the cleaning tank 52b. By this ozone gas, the liquid component is decomposed into a solvent and a resist. Note that the ozone cleaning unit 52 is not necessarily provided.

  The cleaning tank 52b sends the cleaned liquid component to the piping part 50e. The piping part 50e is connected to the supply source 34 described above. The liquid component sent out to the piping part 50e is sent to said supply source 34 via the said piping part 50e. Further, the ozone gas used for the cleaning is exhausted through the piping part 50f. In addition, the piping part 50d is branched and connected to the piping part 50b. The piping part 50d is connected to a waste liquid recovery part (not shown). A part of the liquid component sent to the pipe part 50b is discharged through the pipe part 50d.

Returning to FIG. 1, the elevating unit 60 includes a plate 61, an airflow adjusting member 62, a connecting member 63, an elevating guide 64, and a driving unit 65.
As shown in FIGS. 1 and 2, the plate 61 is formed in an annular shape so as to surround the periphery of the substrate S. The plate 61 has a liquid receiving surface 61a formed flat. In the state shown in FIG. 1, the plate 61 is disposed at the first position PS1 where the + Z side first surface Sa and the liquid receiving surface 61a of the substrate S held by the substrate holder 10 are flush with each other. Yes. The plate 61 is disposed with a gap between the plate 61 and the outer periphery of the substrate S held by the substrate holding unit 10. The ejection port 13a of the gas ejection unit 13 is directed to the gap from the −Z side second surface Sb side of the substrate S.

  The airflow adjusting member 62 adjusts the flow of gas that has passed through the outer periphery of the substrate S. The airflow adjusting member 62 is formed in an annular shape so as to surround the periphery of the substrate S. The airflow adjusting member 62 is disposed outside the plate 61 so as to surround the plate 61. The airflow adjusting member 62 is integrally connected to the plate 61 by a connecting member 63. The airflow adjusting member 62 is curved so that the gas that has passed through the outer periphery of the substrate S flows toward the suction unit 50.

  The raising / lowering guide 64 is provided in parallel with the Z direction. The plate 61 is provided so as to be movable in the Z direction along the lifting guide 64 by the driving operation of the driving unit 65. When the plate 61 moves in the Z direction, the air flow adjusting unit integrally connected to the plate 61 can also move in the Z direction.

  The plate 61 is movable to the second position PS2 and the third position PS3 in the Z direction, for example. The second position P2 is provided on the trajectory of the recovered liquid ejected from the first nozzle 31. Therefore, when the plate 61 is disposed at the second position PS2, it is possible to clean the plate 61 by ejecting the recovery liquid from the first nozzle 31. The third position PS3 is a standby position of the plate 61.

The operation of the coating apparatus CTR configured as described above will be described.
First, the substrate S is accommodated in the substrate accommodation apparatus ACM by a transport mechanism (not shown). The accommodated substrate S is placed on the suction unit 11. Thereafter, the control unit CONT adsorbs the substrate S on the adsorption unit 11.

  After adsorbing the substrate S, the control unit CONT jets gas from the gas jetting unit 13 while adjusting the temperature of the substrate S by the temperature control unit 12. Further, the control unit CONT starts the operation of the suction unit 50. In addition, the control part CONT arranges the elevating part 60 at the first position PS1. By arranging the lifting / lowering unit 60 at the first position PS <b> 1, the gas from the gas injection unit 13 passes through the side of the substrate S and flows to the suction unit 50 via the airflow adjustment member 62. Further, the liquid receiving surface 61a of the plate 61 is flush with the first surface Sa of the substrate S.

  In this state, the control part CONT discharges the recovery liquid Q from the first nozzle 31 as shown in FIG. The recovered liquid Q is filled in the recovered liquid storage part 40 provided between the substrate S and the wall part 22 of the cup part 20 as viewed in the Z direction. In this state, the control unit CONT forms a liquid coating film R on the first surface Sa of the substrate S using the coating nozzle CNZ.

  When the coating film R is formed using the coating nozzle CNZ, the liquid material may scatter in a mist form. When such a mist-like liquid adheres to the cup part 20, the cup part 20 becomes dirty. On the other hand, according to the present embodiment, the recovered liquid from the first nozzle 31 is supplied between the substrate S and the wall portion 22 of the cup portion 20, and therefore, between the substrate S and the cup portion 20. Even when the mist-like liquid material is scattered, the liquid material can be recovered. Moreover, it is not limited to a liquid material, and dust and dust can also be collected. Thereby, an apparatus environment can be cleaned.

The technical scope of the present invention is not limited to the above-described embodiment, and appropriate modifications can be made without departing from the spirit of the present invention.
For example, when the recovery liquid is discharged from the first nozzle 31, the controller CONT may discharge the recovery liquid Q from the second nozzle 32 as shown in FIG. In this case, since the second nozzle 32 discharges the recovery liquid Q toward the circumferential direction of the recovery liquid storage section 40, the flow of the recovery liquid Q is formed in the circumferential direction (counterclockwise direction) of the recovery liquid storage section 40. can do. Thereby, it can prevent that the collect | recovered foreign material settles and accumulates.

  It should be noted that the recovery liquid discharge operation from the first nozzle 31 and the recovery liquid discharge operation from the second nozzle 32 may be performed simultaneously or at different timings.

Moreover, in the said embodiment, although the structure which collect | recovers the liquid bodies Q in the cup part 20 with the collection | recovery liquid Q was mentioned as an example and demonstrated, it is not restricted to this.
FIG. 6 is a diagram illustrating another operation example of the coating apparatus CTR. As shown in FIG. 6, the control unit CONT may dispose the plate 61 provided in the elevating unit 60 at the second position PS <b> 2 and discharge the recovered liquid Q from the first nozzle 31. In this case, the recovered liquid Q is supplied to the liquid receiving surface 61a of the plate 61, and the liquid receiving surface 61a is washed with the recovered liquid Q.

  Further, the controller CONT may inject air from the air outlet 35 after cleaning the liquid receiving surface 61a. In this case, the air flows on the liquid receiving surface 61a and removes the recovered liquid Q remaining on the liquid receiving surface 61a. Further, part of the recovered liquid Q is evaporated by the air flow. Thus, the liquid receiving surface 61a can be dried.

  FIG. 7 is a diagram illustrating another operation example of the coating apparatus CTR. When cleaning the plate 61, as shown in FIG. 7, the control unit CONT moves the plate 61 to the third position PS3 in a state where the recovered liquid storage unit 40 stores the recovered liquid Q. By this operation, the plate 61 is immersed in the recovery liquid Q, and the liquid receiving surface 61a is cleaned with the recovery liquid Q.

  When the plate 61 is immersed, the liquid level of the recovery liquid Q moves to the + Z side according to the volume in which the plate 61 is immersed, and passes to the suction part 50 beyond the + Z side end 41a of the outer wall of the recovery liquid storage part 40. It will overflow. In the present embodiment, the + Z side end portion 41 a of the outer peripheral portion of the liquid receiving portion 41 is disposed on the −Z side with respect to the second nozzle 32, so that the recovered liquid Q fills the second nozzle 32. Can be avoided.

In addition, the operation using the cleaning nozzle 33 in the coating apparatus CTR of the above embodiment will be described. FIG. 8 is a diagram illustrating the operation of the cleaning nozzle 33.
As shown in FIG. 8, the control unit CONT uses the cleaning nozzle 33 to inject the cleaning liquid QR toward the wall portion 22 and the folded portion 22 a of the cup portion 20. By this operation, the wall portion 22 and the folded portion 22a are cleaned with the cleaning liquid QR.

In FIG. 8, an opening 22 b is provided in the wall portion 22 in addition to the configuration of the above embodiment. A cleaning liquid supply unit 23 is connected to the opening 22b. The control part CONT supplies the cleaning liquid QR from the cleaning liquid supply part 23, whereby the cleaning liquid QR hangs down from the opening 22b to the wall part 22. By this operation, the wall portion 22 is cleaned.
In addition, for example, the wall 22 may be coated with a material that makes the cleaning liquid easily wet and spread so that the cleaning liquid flows in a wide range. Further, the wall portion 22 may be provided with unevenness so that the cleaning liquid flows in the inner peripheral direction of the wall portion 22. Moreover, it is good also as a structure which arrange | positions a brush etc. in the vicinity of the wall part 22, and applies a washing | cleaning liquid using the said brush. Alternatively, a configuration may be adopted in which paper or cloth is disposed on the wall portion 22 and the cleaning liquid is soaked into the paper or cloth so that the cleaning liquid is wetted and spread over a wide range.

  CTR: coating device ACM: substrate housing device CNZ: coating nozzle S ... substrate CONT ... control unit K ... space Q ... recovered liquid R ... coating film 10 ... substrate holding unit 10a ... base 11 ... adsorption unit 11a ... holding surface 12 ... Temperature control part 13 ... Gas injection part 13a ... Injection port 13b ... Gas flow path 20 ... Cup part 21 ... Bottom part 21a ... Inclination part 22 ... Wall part 30 ... Recovery liquid supply part 31 ... First nozzle 32 ... Second nozzle 33 ... Cleaning liquid nozzle 34 ... Supply source 35 ... Air jet 40 ... Recovered liquid storage part 41 ... Liquid receiving part 42 ... Discharge part 50 ... Suction part 50a-50f ... Piping part 51 ... Gas liquid separating part

Claims (16)

A substrate holder for holding the substrate;
A cup portion surrounding the substrate in a state of being held by the substrate holding portion;
A recovery liquid supply section for supplying a recovery liquid for recovering foreign matter between the substrate and the cup section ;
A plate having a liquid receiving surface formed flat and provided around the substrate so that the first surface of the substrate and the liquid receiving surface held by the substrate holding part are flush with each other. With
Substrate accommodation device. The substrate storage apparatus according to claim 1, further comprising a recovery liquid storage unit that stores the recovery liquid supplied from the recovery liquid supply unit. The cup portion has a wall portion that surrounds a side portion of the substrate, and a bottom portion that supports the wall portion,
The substrate storage device according to claim 2, wherein the recovery liquid storage section is provided in a portion including a part of the wall section and the bottom section. The substrate storage device according to claim 2, wherein the recovery liquid supply unit includes a first nozzle that discharges the recovery liquid toward the recovery liquid storage unit. The substrate accommodation apparatus according to claim 4, wherein the first nozzle is provided in the substrate holding unit. The recovered liquid storage part is formed in an annular shape along the outer periphery of the substrate,
The substrate storage apparatus according to claim 2, wherein the recovery liquid supply unit includes a second nozzle that discharges the recovery liquid toward a circumferential direction of the recovery liquid storage unit. A plurality of the second nozzles are provided,
The substrate storage device according to claim 6, wherein the plurality of second nozzles are arranged at an equal pitch in a circumferential direction of the recovery liquid storage unit. The substrate storage apparatus according to claim 2, wherein the recovery liquid storage unit includes a discharge unit that discharges the recovery liquid. The board | substrate accommodating apparatus as described in any one of Claims 1-8 further equipped with the suction part which attracts | sucks the space enclosed by the said cup part. The board | substrate accommodating apparatus of Claim 9. The said suction part has a suction path | route connected outside via the said cup part. The board | substrate accommodating apparatus of Claim 10. The said suction part has a gas-liquid separation part provided in the said suction path. The substrate storage device according to claim 11, further comprising: a feeding unit configured to send the collected liquid separated by reaching the gas-liquid separation unit to the collected liquid supply unit. The cup portion has a wall portion surrounding a side portion of the substrate,
The substrate storage apparatus according to claim 1, further comprising a cleaning liquid nozzle that discharges a cleaning liquid toward the wall portion. The substrate storage device according to claim 13, wherein the same type of liquid as the recovery liquid is used as the cleaning liquid. The substrate holding unit has an adsorption unit that adsorbs the back surface of the substrate,
The substrate holding apparatus according to claim 1, wherein the suction unit includes a gas injection unit that injects a gas toward the periphery of the substrate. The board | substrate accommodating apparatus as described in any one of Claims 1-15 in which the said board | substrate holding part has a temperature control part which adjusts the temperature of the said board | substrate.

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