CN105964488B - Sol evenning machine with substrate heating and atmosphere processing - Google Patents
Sol evenning machine with substrate heating and atmosphere processing Download PDFInfo
- Publication number
- CN105964488B CN105964488B CN201610370710.2A CN201610370710A CN105964488B CN 105964488 B CN105964488 B CN 105964488B CN 201610370710 A CN201610370710 A CN 201610370710A CN 105964488 B CN105964488 B CN 105964488B
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- CN
- China
- Prior art keywords
- cylinder
- lifting support
- holding table
- articles holding
- sol evenning
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
- B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
Landscapes
- Coating Apparatus (AREA)
Abstract
A kind of sol evenning machine with substrate heating and atmosphere processing a, comprising: cylinder；One vertical shaft is located at the centre of cylinder and passes through the bottom of cylinder；One lifting support is located on vertical shaft, and the upper end of the lifting support is articles holding table, which can rotate；One admission line is passed through in cylinder from cylindrical outer；One end of one flap nozzle is connected with admission line, and the other end is directed at the articles holding table of the lifting support upper end；One column is fixed on the side in cylinder, and the upper end of the column is connected with a support arm, and the other end of the support arm is connected with flap nozzle, and the direction of control flap nozzle is reached and then adjusting the support arm；One pump, the pump are connect by vertical shaft with the articles holding table of lifting support upper end, for taking out, deflation body, guarantee absorption and the De contamination of sample；One top cover is buckled on the top of cylinder.The present invention can atmosphere processing in the case where on substrate spin-coated thin film, so as to realize while chemical reaction while spin-coated thin film effect.
Description
Technical field
The invention belongs to semiconductor manufacturing equipments, particularly relate to a kind of sol evenning machine with substrate heating and atmosphere processing, should
Equipment can atmosphere processing in the case where spin-coated thin film, so as to realize while chemical reaction while spin-coated thin film effect, therefore
Increase the additional function of sol evenning machine.
Background technique
The principle of traditional sol evenning machine is usually on high-speed rotating substrate, and instil all kinds of solution, is rotated using pallet
The solution that the centrifugal force of generation makes to drip on substrate is uniformly coated on substrate, and thickness regards viscous between different solutions and substrate
Difference of coefficients and it is different while also related with rotation speed and time.There are many kinds of appellations, also known as photoresist spinner, spin coating for sol evenning machine
Platform, photoresist spinner, whirler, spin coating machine, spin coater, rotating thin film machine, rotary coating instrument, spin-coating
Instrument, even film machine, their function and principle are almost the same.
The present invention design it is a kind of with atmosphere processing spin coating machine equipment, the equipment can atmosphere processing in the case where spin coating it is thin
Film so as to realize the effect of the spin-coated thin film in chemical reaction, therefore increases the additional function of sol evenning machine.
Common sol evenning machine has Railway Project: 1, the actual speed difference of the revolving speed and motor of equipment mark is larger.2, true
If the construction of empty adsorption system is not reasonable, vacuum adsorption force is reduced, and be will lead to substrate absorption and is incessantly generated " film flying "
Situation, can also allow drop glue enter accidentally vacuum pipe system cause it is completely plugged.3, common sol evenning machine is without atmosphere processing
Sample, so that simple physics spin coating can only be made.The present invention can evade the above deficiency, and increase substrate heating and atmosphere processing
Function.
Summary of the invention
The object of the present invention is to provide a kind of sol evenning machines handled with substrate heating and atmosphere, and the spin coating function is in gas
Atmosphere processing in the case where on substrate spin-coated thin film, so as to realize while chemical reaction while spin-coated thin film effect.
The present invention provides a kind of sol evenning machine with substrate heating and atmosphere processing, comprising:
One cylinder；
One vertical shaft, the vertical shaft are located at the centre of cylinder and pass through the bottom of cylinder；
One lifting support, the lifting support are located on vertical shaft, and the upper end of the lifting support is articles holding table, which can
With rotation；
One admission line, the admission line are passed through in cylinder from cylindrical outer；
One end of one flap nozzle, the flap nozzle is connected with admission line, and the other end is directed at the lifting support upper end
Articles holding table；
One column, the column are fixed on the side in cylinder, and the upper end of the column is connected with a support arm, the support arm it is another
End is connected with flap nozzle, and the direction of control flap nozzle is reached and then adjusting the support arm；
One pump, the pump are connect by vertical shaft with the articles holding table of lifting support upper end, for taking out, deflation body, guarantee sample
Absorption and De contamination；
One top cover, the top cover are buckled on the top of cylinder.
The invention has the characteristics that
1, sol evenning machine band atmosphere processing unit.
2, atmosphere processing unit locality is adjustable.
3, articles holding table band heating function
Detailed description of the invention
To further illustrate technology contents of the invention, with reference to embodiments and attached drawing detailed description is as follows, in which:
Fig. 1 is the structural diagram of the present invention.
Specific embodiment
Refering to Figure 1, the present invention provides a kind of sol evenning machine with substrate heating and atmosphere processing, comprising:
One cylinder cavity 10, the material of the cylinder 10 are metal material or polytetrafluoroethylene (PTFE) or ceramic material；
One vertical shaft 20, the vertical shaft 20 are located at the centre of cylinder 10 and pass through the bottom of cylinder 10；
One lifting support 30, the lifting support 30 are located on vertical shaft 20, and the upper end of the lifting support 30 is articles holding table 31, set
There is closed heating tube in object platform.The lifting support 30 can rotate, and the material of the lifting support 30 is metal material, or poly-
Tetrafluoroethene or ceramic material, the surface of the articles holding table 31 are provided with stomata or air drain and are used to take out, to deflate, and the glove
Platform 31 has heating function；
One admission line 40, the admission line 40 are passed through in cylinder 10 outside cylinder 10, which is flexibility
Material；
One end of one flap nozzle 50, the flap nozzle 50 is connected with admission line 40, and the other end is directed at the lifting support
The articles holding table 31 of 30 upper ends, the material of the flap nozzle 50 are simple substance or alloying metal material or polytetrafluoroethylene (PTFE) or ceramics
Material；
One column 60, the column 60 are fixed on the side in cylinder 10, and the upper end of the column 60 is connected with a support arm 61, should
The other end of support arm 61 is connected with flap nozzle 50, and the direction of control flap nozzle 50 is reached and then adjusting support arm 61；
One pump 70, the pump 70 are connect by vertical shaft 20 with the articles holding table 31 of 30 upper end of lifting support, for taking out, deflation body,
The pump 70 is mechanical pump, molecular pump or ionic pump；
One top cover 80 is buckled on the top of cylinder 10.
The course of work of the invention is divided into two kinds: vacuum type and two kinds of non-real casement.
The vacuum mode course of work: opening top cover 80, and by print as articles holding table, absorption adjusts 50 angle of nozzle and position
It sets, flow is set, articles holding table heating temperature is set, revolving speed, time are set, close top cover, be evacuated to required vacuum degree.It is passed through
Required atmosphere gas is operated with setting speed setting time when temperature reaches constant stable set temperature, when reaching setting
Between after, stop operating, cavity inflation, uncap, stop print absorption.
The antivacuum mode course of work: opening top cover 80, by print as articles holding table, absorption, adjustment 50 angle of nozzle and
Flow is arranged in position, and articles holding table heating temperature is arranged, and revolving speed, time is arranged, and closes top cover, is passed through gas, when temperature reaches permanent
Surely stable set temperature, is operated with setting speed setting time, after reaching setting time, is stopped operating, is uncapped, and sample is stopped
Piece absorption.
Embodiment 1
50. the flap nozzle with direction adjustment, -60 ° to 60 ° of angle adjusting range；30. the lifting support with translation is put down
Range 0 is moved to 1031m, range 0-1031m；31. band venthole articles holding table, meets fluid mechanical design；Range of speeds 0-
6000rpm/s is divided to two grades of controls: bottom gear 1-500rpm/s, time range 0-30S；Top gear 500-6000rpm/s, time
Range 0-60S.Articles holding table heated perimeter is 0-300 DEG C；Articles holding table drives rotation that can vibrate up and down 10. not simultaneously by motor
Become rusty 70. oil-less pump of steel cylinder cavity composition.
Embodiment 2
50. the flap nozzle with direction adjustment, -80 ° to 80 ° of angle adjusting range；30. the lifting support with translation is put down
Range 0 is moved to 1231m, range 0-1231m；31. band outgassing groove articles holding table, the distribution of articles holding table air drain meets hydrodynamics and sets
Meter；Range of speeds 0-8000rpm/s is divided to two grades of controls: bottom gear 1-300rpm/s, time range 0-20S；Top gear 300-
8000rpm/s, time range 0-100S.Articles holding table heated perimeter is 0-300 DEG C；Articles holding table heated perimeter is 0-200 DEG C；Glove
Platform, which drives rotation simultaneously by motor, can vibrate up and down 10. stainless steel cylinder cavity, 70. oil-less pump composition.
Embodiment 3
50. the flap nozzle with direction adjustment, -50 ° to 50 ° of angle adjusting range；30. the lifting support with translation is put down
Range 0 is moved to 831m, range 0-831m；31. band venthole articles holding table, articles holding table gas cell distribution meet hydrodynamics and set
Meter；Range of speeds 0-10000rpm/s is divided to two grades of controls: bottom gear 1-600rpm/s, time range 0-30S；Top gear 600-
10000rpm/s, time range 0-80S.Articles holding table heated perimeter is 0-200 DEG C；Articles holding table drives rotation simultaneously can by motor
Vibrate up and down 10. stainless steel cylinder cavity, 70. oil-less pump composition.
Embodiment 4
50. the flap nozzle with direction adjustment, -60 ° to 60 ° of angle adjusting range；30. the lifting support with translation is put down
Range 0 is moved to 531m, range 0-531m；31. band outgassing groove articles holding table, the distribution of articles holding table air drain meets hydrodynamics and sets
Meter；Range of speeds 0-5000rpm/s is divided to two grades of controls: bottom gear 1-200rpm/s, time range 0-20S；Top gear 200-
5000rpm/s, time range 0-100S.Articles holding table heated perimeter is 0-300 DEG C；Articles holding table drives rotation simultaneously can by motor
Vibrate up and down 10. stainless steel cylinder cavity, 70. oil-less pump composition.
Particular embodiments described above has carried out further in detail the purpose of the present invention, technical scheme and beneficial effects
It describes in detail bright, it should be understood that the above is only a specific embodiment of the present invention, is not intended to restrict the invention, it is all
Within the spirit and principles in the present invention, any modification, equivalent substitution, improvement and etc. done should be included in guarantor of the invention
Within the scope of shield.
Claims (6)
1. a kind of sol evenning machine with substrate heating and atmosphere processing, comprising:
One cylinder；
One vertical shaft, the vertical shaft are located at the centre of cylinder and pass through the bottom of cylinder；
One lifting support, the lifting support are located on vertical shaft, and the upper end of the lifting support is articles holding table, which can revolve
Turn；Wherein the articles holding table has heating function, and articles holding table speed is controllable, can continuous frequency conversion or chaos frequency conversion；
One admission line, the admission line are passed through in cylinder from cylindrical outer；
One end of one flap nozzle, the flap nozzle is connected with admission line, and the other end is directed at the glove of the lifting support upper end
Platform；
One column, the column are fixed on the side in cylinder, and the upper end of the column is connected with a support arm, the other end of the support arm with
Flap nozzle is connected, and the direction of control flap nozzle is reached and then adjusting the support arm；
One pump, the pump are connect by vertical shaft with the articles holding table of lifting support upper end, for taking out, deflation body, guarantee the absorption of sample
And De contamination；
One top cover, the top cover are buckled on the top of cylinder.
2. the sol evenning machine according to claim 1 with substrate heating and atmosphere processing, wherein the material of flap nozzle is single
Matter or alloying metal material or polytetrafluoroethylene (PTFE) or ceramic material.
3. the sol evenning machine according to claim 1 with substrate heating and atmosphere processing, wherein the material of lifting support is gold
Belong to material or polytetrafluoroethylene (PTFE) or ceramic material.
4. the sol evenning machine according to claim 1 with substrate heating and atmosphere processing, wherein the material of the cylinder is metal
Material or polytetrafluoroethylene (PTFE) or ceramic material.
5. the sol evenning machine according to claim 1 with substrate heating and atmosphere processing, wherein the admission line is flexible material
Material.
6. according to claim 1 heat the sol evenning machine handled with atmosphere with substrate, wherein the jet side of the flap nozzle
Formula is controllable, for continuously or discontinuously jet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610370710.2A CN105964488B (en) | 2016-05-30 | 2016-05-30 | Sol evenning machine with substrate heating and atmosphere processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610370710.2A CN105964488B (en) | 2016-05-30 | 2016-05-30 | Sol evenning machine with substrate heating and atmosphere processing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105964488A CN105964488A (en) | 2016-09-28 |
| CN105964488B true CN105964488B (en) | 2019-12-03 |
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ID=57009796
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610370710.2A Active CN105964488B (en) | 2016-05-30 | 2016-05-30 | Sol evenning machine with substrate heating and atmosphere processing |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111358128B (en) * | 2020-03-13 | 2022-08-26 | 河南机电职业学院 | Film homogenizing all-in-one machine for diamond sterilization film and preparation method of self-cleaning gem grade diamond |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5254367A (en) * | 1989-07-06 | 1993-10-19 | Tokyo Electron Limited | Coating method and apparatus |
| CN1102505A (en) * | 1993-03-25 | 1995-05-10 | 东京电子株式会社 | Method of forming coating film and apparatus therefor |
| CN1281392A (en) * | 1997-12-16 | 2001-01-24 | 北卡罗来纳-查佩尔山大学 | Spin coating method and apparatus for liquid carbon dioxide systems |
| CN1503929A (en) * | 2001-02-28 | 2004-06-09 | �ź㴫 | Method of uniformly coating substrate |
| CN1541781A (en) * | 2003-05-01 | 2004-11-03 | 精工爱普生株式会社 | Coating device, film forming method and device, making method of semiconductor elements, electric lighting device and electronic apparatus |
| CN101020999A (en) * | 2007-03-23 | 2007-08-22 | 沈阳航空工业学院 | Planar reciprocating process and apparatus for spraying to deposit multilayer composite material |
| CN101912833A (en) * | 2006-02-27 | 2010-12-15 | 大日本网目版制造株式会社 | Apparatus for coating |
| CN102641823A (en) * | 2012-05-14 | 2012-08-22 | 中国科学院微电子研究所 | Microwave photoresist uniformizing device and photoresist uniformizing method |
| CN103182359A (en) * | 2011-12-28 | 2013-07-03 | 中国科学院微电子研究所 | Microwave glue homogenizing equipment and method thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5816468B2 (en) * | 2011-06-15 | 2015-11-18 | 東京応化工業株式会社 | Substrate storage device |
| JP6126867B2 (en) * | 2013-02-25 | 2017-05-10 | 東京応化工業株式会社 | Coating apparatus and coating method |
-
2016
- 2016-05-30 CN CN201610370710.2A patent/CN105964488B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5254367A (en) * | 1989-07-06 | 1993-10-19 | Tokyo Electron Limited | Coating method and apparatus |
| CN1102505A (en) * | 1993-03-25 | 1995-05-10 | 东京电子株式会社 | Method of forming coating film and apparatus therefor |
| CN1281392A (en) * | 1997-12-16 | 2001-01-24 | 北卡罗来纳-查佩尔山大学 | Spin coating method and apparatus for liquid carbon dioxide systems |
| CN1503929A (en) * | 2001-02-28 | 2004-06-09 | �ź㴫 | Method of uniformly coating substrate |
| CN1541781A (en) * | 2003-05-01 | 2004-11-03 | 精工爱普生株式会社 | Coating device, film forming method and device, making method of semiconductor elements, electric lighting device and electronic apparatus |
| CN101912833A (en) * | 2006-02-27 | 2010-12-15 | 大日本网目版制造株式会社 | Apparatus for coating |
| CN101020999A (en) * | 2007-03-23 | 2007-08-22 | 沈阳航空工业学院 | Planar reciprocating process and apparatus for spraying to deposit multilayer composite material |
| CN103182359A (en) * | 2011-12-28 | 2013-07-03 | 中国科学院微电子研究所 | Microwave glue homogenizing equipment and method thereof |
| CN102641823A (en) * | 2012-05-14 | 2012-08-22 | 中国科学院微电子研究所 | Microwave photoresist uniformizing device and photoresist uniformizing method |
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| Publication number | Publication date |
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| CN105964488A (en) | 2016-09-28 |
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