CN105964488A - Spin coater with substrate heating and atmosphere treatment - Google Patents
Spin coater with substrate heating and atmosphere treatment Download PDFInfo
- Publication number
- CN105964488A CN105964488A CN201610370710.2A CN201610370710A CN105964488A CN 105964488 A CN105964488 A CN 105964488A CN 201610370710 A CN201610370710 A CN 201610370710A CN 105964488 A CN105964488 A CN 105964488A
- Authority
- CN
- China
- Prior art keywords
- cylinder
- lifting support
- substrate heating
- vertical shaft
- sol evenning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
- B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
Landscapes
- Coating Apparatus (AREA)
Abstract
Disclosed is a spin coater with substrate heating and atmosphere treatment. The spin coater comprises a cylinder, a vertical shaft, a lifting support, an air inlet pipeline, a movable nozzle, a stand column, a pump and a top cover. The vertical shaft is located in the middle of the cylinder and penetrates the bottom of the cylinder; the lifting support is located on the vertical shaft, an object containing table is arranged at the upper end of the lifting support, and the lifting support can rotate; the air inlet pipeline is led into the cylinder from the outer portion of the cylinder; one end of the movable nozzle is connected with the air inlet pipeline, and the other end of the movable nozzle is aligned with the object containing table at the upper end of the lifting support; the stand column is fixed to one side inside the cylinder, a supporting arm is connected to the upper end of the stand column, the other end of the supporting arm is connected with the movable nozzle, and the supporting arm is adjusted to achieve the aim of controlling the direction of the movable nozzle; the pump is connected with the object containing table at the upper end of the lifting support through the vertical shaft, is used for pumping and exhausting gas and ensures adsorption and desorption of a sample; and the top cover is buckled above the cylinder. According to the spin coater, under the condition of atmosphere treatment, a substrate is spirally coated with a thin film, and therefore the effect that the chemical reaction is carried while spiral coating of the thin film is carried out is achieved.
Description
Technical field
The invention belongs to semiconductor manufacturing equipment, particularly relate to what a kind of band substrate heating and atmosphere processed
Sol evenning machine, this equipment can in the case of atmosphere processes spin-coated thin film such that it is able to realize limit chemistry anti-
Answer the effect of limit spin-coated thin film, therefore add the additional function of sol evenning machine.
Background technology
The principle of traditional sol evenning machine is typically on the substrate of high speed rotating, and instil all kinds of solution, profit
Rotating, with pallet, the centrifugal force produced makes the solution dropping on substrate be uniformly coated on substrate, thickness
Different depending on the coefficient of viscosity difference between different solutions and substrate, also have with rotary speed and time simultaneously
Close.Sol evenning machine has a variety of appellation, also known as photoresist spinner, glue evenning table, photoresist spinner, spin-coating
Machine, spin coating machine, spin coater, rotating thin film machine, rotary coating instrument, spin-coating instrument,
Even film machine, their function and principle are basically identical.
The present invention designs the sol evenning machine equipment that a kind of band atmosphere processes, the feelings that this equipment can process in atmosphere
Spin-coated thin film under condition such that it is able to realize the effect of chemical reaction limit, limit spin-coated thin film, therefore add
The additional function of sol evenning machine.
Common sol evenning machine has a Railway Project: rotating speed that 1, equipment indicates and the actual speed phase of motor
Difference is bigger.If 2, the structure of vacuum suction system is not reasonable, vacuum adsorption force reduces, and can lead
Cause substrate absorption and incessantly produce the situation of " film flying ", a glue also can be allowed accidentally to enter vacuum pipe
System causes completely plugged.3, common sol evenning machine processes sample without atmosphere, thus can only make list
Pure physics spin coating.The present invention can evade above deficiency, and increases substrate heating and the merit of atmosphere process
Energy.
Summary of the invention
It is an object of the invention to, it is provided that the sol evenning machine that a kind of band substrate heating and atmosphere process, this is even
Glue function atmosphere process in the case of on substrate spin-coated thin film such that it is able to realize limit chemical reaction
The effect of limit spin-coated thin film.
The present invention provides the sol evenning machine that a kind of band substrate heating and atmosphere process, including:
One cylinder；
One vertical shaft, this vertical shaft is positioned at the centre of cylinder and passes the bottom of cylinder；
One lifting support, this lifting support is positioned on vertical shaft, and the upper end of this lifting support is articles holding table,
This lifting support can rotate；
One admission line, this admission line is passed through in cylinder from cylindrical outer；
One flap nozzle, one end of this flap nozzle is connected with admission line, and the other end is directed at this lifting
The articles holding table of pedestal upper end；
One column, this column is fixed on the side in cylinder, and the upper end of this column connects a support arm,
The other end of this support arm is connected with flap nozzle, by regulating this support arm and then reaching to control flap nozzle
Direction；
One pump, this pump is connected with the articles holding table of lifting support upper end by vertical shaft, is used for taking out, exitting body,
Ensure absorption and the De contamination of sample；
One top cover, this top cover is buckled on the top of cylinder.
The invention have the characteristics that
1, sol evenning machine band atmosphere processing means.
2, atmosphere processing means locality is adjustable.
3, articles holding table band heating function
Accompanying drawing explanation
For further illustrating the technology contents of the present invention, describe in detail such as below in conjunction with embodiment and accompanying drawing
After, wherein:
Fig. 1 is the structural representation of the present invention.
Detailed description of the invention
Referring to shown in Fig. 1, the present invention provides the sol evenning machine that a kind of band substrate heating and atmosphere process,
Including:
One cylinder type cavity 10, the material of this cylinder 10 is metal material, or politef or
Ceramic material；
One vertical shaft 20, this vertical shaft 20 is positioned at the centre of cylinder 10 and passes the bottom of cylinder 10；
One lifting support 30, this lifting support 30 is positioned on vertical shaft 20, this lifting support 30 upper
End for articles holding table 31, has in articles holding table and closed adds heat pipe.This lifting support 30 can rotate, should
The material of lifting support 30 is metal material, or politef or ceramic material, this this glove
The surface of platform 31 have pore or air drain so as to take out, exitting is used, and this articles holding table 31 has and adds
Hot merit energy；
One admission line 40, this admission line 40 is passed through in cylinder 10 from cylinder 10 outside, and this enters
Feed channel 40 is flexible material；
One flap nozzle 50, one end of this flap nozzle 50 is connected with admission line 40, the other end pair
The articles holding table 31 of this lifting support 30 upper end accurate, the material of this flap nozzle 50 is simple substance or alloy gold
Belong to material, or politef or ceramic material；
One column 60, this column 60 is fixed on the side in cylinder 10, and the upper end of this column 60 is even
Being connected to a support arm 61, the other end of this support arm 61 is connected with flap nozzle 50, by regulating this support arm
61 so reach control flap nozzle 50 direction；
One pump 70, this pump 70 is connected with the articles holding table 31 of lifting support 30 upper end by vertical shaft 20,
For taking out, exit body, this pump 70 is mechanical pump, molecular pump or ionic pump；
One top cover 80 is buckled on the top of cylinder 10.
The work process of the present invention is divided into two kinds: vacuum type and non-real casement two kinds.
Vacuum mode work process: open top cover 80, by print as articles holding table, absorption, adjusts spray
Mouth 50 angles and positions, arrange flow, arrange articles holding table heating-up temperature, arrange rotating speed, time,
Close top cover, be evacuated to required vacuum.Be passed through required atmosphere gas, when temperature reach constant surely
Determine design temperature, operate with the setting speed setting time, after arriving the setting time, stop operating,
Cavity is inflated, is uncapped, and stops print absorption.
Antivacuum pattern work process: open top cover 80, by print as articles holding table, absorption, adjusts
Nozzle 50 angles and positions, arrange flow, arrange articles holding table heating-up temperature, arrange rotating speed, time,
Close top cover, be passed through gas, stablize design temperature when temperature reaches constant, when setting with setting speed
Between operate, arrive after the setting time, stop operating, uncap, stop print absorption.
Embodiment 1
The flap nozzle that 50. band directions adjust, angle adjustment scope-60 ° to 60 °；30. band translations
Lifting support, range of translation 0 to 1031m, range 0-1031m；31. band venthole gloves
Platform, meets fluid mechanical design；Range of speeds 0-6000rpm/s, point two grades of controls: bottom gear
1-500rpm/s, time range 0-30S；Top gear 500-6000rpm/s, time range 0-60S.
Articles holding table heated perimeter is 0-300 DEG C；Articles holding table is rotated by motor simultaneously can up-down vibration 10.
Rustless steel column type cavity 70. oil-less pump forms.
Embodiment 2
The flap nozzle that 50. band directions adjust, angle adjustment scope-80 ° to 80 °；30. band translations
Lifting support, range of translation 0 to 1231m, range 0-1231m；31. band outgassing groove gloves
Platform, the distribution of articles holding table air drain meets fluid mechanical design；Range of speeds 0-8000rpm/s, point two grades of controls
System: bottom gear 1-300rpm/s, time range 0-20S；Top gear 300-8000rpm/s, the time
Scope 0-100S.Articles holding table heated perimeter is 0-300 DEG C；Articles holding table heated perimeter is 0-200 DEG C；
Articles holding table is rotated by motor simultaneously can up-down vibration 10. rustless steel column type cavity 70. oil-free
Pump forms.
Embodiment 3
The flap nozzle that 50. band directions adjust, angle adjustment scope-50 ° to 50 °；30. band translations
Lifting support, range of translation 0 to 831m, range 0-831m；31. band venthole articles holding tables,
Articles holding table gas cell distribution meets fluid mechanical design；Range of speeds 0-10000rpm/s, point two grades of controls:
Bottom gear 1-600rpm/s, time range 0-30S；Top gear 600-10000rpm/s, time range
0-80S.Articles holding table heated perimeter is 0-200 DEG C；Articles holding table is rotated by motor simultaneously can be upper and lower
Vibrate 10. rustless steel column type cavity 70. oil-less pump compositions.
Embodiment 4
The flap nozzle that 50. band directions adjust, angle adjustment scope-60 ° to 60 °；30. band translations
Lifting support, range of translation 0 to 531m, range 0-531m；31. band outgassing groove articles holding tables,
The distribution of articles holding table air drain meets fluid mechanical design；Range of speeds 0-5000rpm/s, point two grades of controls:
Bottom gear 1-200rpm/s, time range 0-20S；Top gear 200-5000rpm/s, time range
0-100S.Articles holding table heated perimeter is 0-300 DEG C；Articles holding table is rotated by motor and can go up simultaneously
Lower vibration 10. rustless steel column type cavity 70. oil-less pump forms.
Particular embodiments described above, is carried out the purpose of the present invention, technical scheme and beneficial effect
Further describe, be it should be understood that the foregoing is only the present invention specific embodiment and
, be not limited to the present invention, all within the spirit and principles in the present invention, that is done any repaiies
Change, equivalent, improvement etc., should be included within the scope of the present invention.
Claims (7)
1. the sol evenning machine that band substrate heating and atmosphere process, including:
One cylinder；
One vertical shaft, this vertical shaft is positioned at the centre of cylinder and passes the bottom of cylinder；
One lifting support, this lifting support is positioned on vertical shaft, and the upper end of this lifting support is articles holding table,
This lifting support can rotate；
One admission line, this admission line is passed through in cylinder from cylindrical outer；
One flap nozzle, one end of this flap nozzle is connected with admission line, and the other end is directed at this lifting
The articles holding table of pedestal upper end；
One column, this column is fixed on the side in cylinder, and the upper end of this column connects a support arm,
The other end of this support arm is connected with flap nozzle, by regulating this support arm and then reaching to control flap nozzle
Direction；
One pump, this pump is connected with the articles holding table of lifting support upper end by vertical shaft, is used for taking out, exitting body,
Ensure absorption and the De contamination of sample；
One top cover, this top cover is buckled on the top of cylinder.
The sol evenning machine that band substrate heating the most according to claim 1 and atmosphere process, wherein movable
The material of nozzle is simple substance or alloying metal material, or politef or ceramic material.
The sol evenning machine that band substrate heating the most according to claim 1 and atmosphere process, wherein lifts
The material of support is metal material, or politef or ceramic material.
The sol evenning machine that band substrate heating the most according to claim 1 and atmosphere process, wherein this is put
Thing platform has heating function, and articles holding table speed is controlled, can continuous frequency conversion or chaos frequency conversion.
The sol evenning machine that band substrate heating the most according to claim 1 and atmosphere process, wherein this circle
The material of cylinder is metal material, or politef or ceramic material.
The sol evenning machine that band substrate heating the most according to claim 1 and atmosphere process, wherein this enters
Feed channel is flexible material.
The sol evenning machine that band substrate heating the most according to claim 1 and atmosphere process, wherein this is lived
The jet mode of dynamic nozzle is controlled, for continuously or discontinuously jet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610370710.2A CN105964488B (en) | 2016-05-30 | 2016-05-30 | Sol evenning machine with substrate heating and atmosphere processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610370710.2A CN105964488B (en) | 2016-05-30 | 2016-05-30 | Sol evenning machine with substrate heating and atmosphere processing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105964488A true CN105964488A (en) | 2016-09-28 |
| CN105964488B CN105964488B (en) | 2019-12-03 |
Family
ID=57009796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610370710.2A Active CN105964488B (en) | 2016-05-30 | 2016-05-30 | Sol evenning machine with substrate heating and atmosphere processing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105964488B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111358128A (en) * | 2020-03-13 | 2020-07-03 | 北京兆旭科技发展有限公司 | Film homogenizing all-in-one machine for diamond sterilization film and preparation method of self-cleaning gem grade diamond |
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| US5254367A (en) * | 1989-07-06 | 1993-10-19 | Tokyo Electron Limited | Coating method and apparatus |
| CN1102505A (en) * | 1993-03-25 | 1995-05-10 | 东京电子株式会社 | Method of forming coating film and apparatus therefor |
| CN1281392A (en) * | 1997-12-16 | 2001-01-24 | 北卡罗来纳-查佩尔山大学 | Spin coating method and apparatus for liquid carbon dioxide systems |
| CN1503929A (en) * | 2001-02-28 | 2004-06-09 | �ź㴫 | Method of uniformly coating substrate |
| CN1541781A (en) * | 2003-05-01 | 2004-11-03 | 精工爱普生株式会社 | Coating device, film forming method and device, making method of semiconductor elements, electric lighting device and electronic apparatus |
| CN101020999A (en) * | 2007-03-23 | 2007-08-22 | 沈阳航空工业学院 | Planar reciprocating process and apparatus for spraying to deposit multilayer composite material |
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| CN102641823A (en) * | 2012-05-14 | 2012-08-22 | 中国科学院微电子研究所 | Microwave glue homogenizing device and glue homogenizing method |
| JP2013000641A (en) * | 2011-06-15 | 2013-01-07 | Tokyo Ohka Kogyo Co Ltd | Substrate container device |
| CN103182359A (en) * | 2011-12-28 | 2013-07-03 | 中国科学院微电子研究所 | Microwave glue homogenizing equipment and method thereof |
| CN104001633A (en) * | 2013-02-25 | 2014-08-27 | 东京应化工业株式会社 | Coating apparatus and coating method |
-
2016
- 2016-05-30 CN CN201610370710.2A patent/CN105964488B/en active Active
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5254367A (en) * | 1989-07-06 | 1993-10-19 | Tokyo Electron Limited | Coating method and apparatus |
| CN1102505A (en) * | 1993-03-25 | 1995-05-10 | 东京电子株式会社 | Method of forming coating film and apparatus therefor |
| CN1281392A (en) * | 1997-12-16 | 2001-01-24 | 北卡罗来纳-查佩尔山大学 | Spin coating method and apparatus for liquid carbon dioxide systems |
| CN1503929A (en) * | 2001-02-28 | 2004-06-09 | �ź㴫 | Method of uniformly coating substrate |
| CN1541781A (en) * | 2003-05-01 | 2004-11-03 | 精工爱普生株式会社 | Coating device, film forming method and device, making method of semiconductor elements, electric lighting device and electronic apparatus |
| CN101912833A (en) * | 2006-02-27 | 2010-12-15 | 大日本网目版制造株式会社 | Apparatus for coating |
| CN101020999A (en) * | 2007-03-23 | 2007-08-22 | 沈阳航空工业学院 | Planar reciprocating process and apparatus for spraying to deposit multilayer composite material |
| JP2013000641A (en) * | 2011-06-15 | 2013-01-07 | Tokyo Ohka Kogyo Co Ltd | Substrate container device |
| CN103182359A (en) * | 2011-12-28 | 2013-07-03 | 中国科学院微电子研究所 | Microwave glue homogenizing equipment and method thereof |
| CN102641823A (en) * | 2012-05-14 | 2012-08-22 | 中国科学院微电子研究所 | Microwave glue homogenizing device and glue homogenizing method |
| CN104001633A (en) * | 2013-02-25 | 2014-08-27 | 东京应化工业株式会社 | Coating apparatus and coating method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111358128A (en) * | 2020-03-13 | 2020-07-03 | 北京兆旭科技发展有限公司 | Film homogenizing all-in-one machine for diamond sterilization film and preparation method of self-cleaning gem grade diamond |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105964488B (en) | 2019-12-03 |
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