JP2014095116A - 樹脂容器用コーティング装置 - Google Patents
樹脂容器用コーティング装置 Download PDFInfo
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- JP2014095116A JP2014095116A JP2012246499A JP2012246499A JP2014095116A JP 2014095116 A JP2014095116 A JP 2014095116A JP 2012246499 A JP2012246499 A JP 2012246499A JP 2012246499 A JP2012246499 A JP 2012246499A JP 2014095116 A JP2014095116 A JP 2014095116A
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- 239000011347 resin Substances 0.000 title claims abstract description 72
- 229920005989 resin Polymers 0.000 title claims abstract description 72
- 239000011248 coating agent Substances 0.000 title claims abstract description 29
- 238000000576 coating method Methods 0.000 title claims abstract description 29
- 239000007789 gas Substances 0.000 abstract description 71
- 239000002994 raw material Substances 0.000 abstract description 9
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000000034 method Methods 0.000 description 15
- 230000008569 process Effects 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000002184 metal Substances 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000003651 drinking water Substances 0.000 description 3
- 235000020188 drinking water Nutrition 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 235000014171 carbonated beverage Nutrition 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 235000015203 fruit juice Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32394—Treating interior parts of workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
Abstract
【解決手段】電気的に独立した複数の外部電極であり、樹脂容器Bを各々格納する複数のチャンバ40A,40B,40C,40Dと、接地電位の筒状の原料ガスのガス導通部51が形成され、チャンバ40A,40B,40C,40Dに格納された複数の樹脂容器Bの内部に挿入される複数の内部電極と、原料ガスを供給するガス供給部70と、複数のチャンバ40A,40B,40C,40Dに高周波電力を供給する高周波電源80と、この高周波電力の供給先を、複数のチャンバ40A,40B,40C,40Dのうちの第1のユニットU1を構成する第1及び第2のチャンバ40A,40Bから第2のユニットU2を構成する第3及び第4のチャンバ40C,40Dに切り替えることが可能な電力切替部85と、を備える。
【選択図】図4
Description
また、例えば複数のチャンバを真空引き、若しくは複数のチャンバに原料ガスを供給する工程などの共通した成膜処置の前工程を、複数のチャンバに対して同時に一括して行うことができるため、生産効率の向上を図ることができる。
まず、図1〜図5を参照しながら、本発明に係る樹脂容器用コーティング装置の第1実施形態について説明する。
なお、樹脂容器としては、例えば、炭酸飲料や果物ジュースなどの飲料水用のボトルや、化粧品や薬品用の容器が挙げられるが、これに限らず他の用途に用いる樹脂容器であっても良い。
なお、真空ポンプ61と内部空間S5との間にはオンオフ弁62が配置されている。
なお、マッチングボックス81とは、高周波電源80と、第1及び第2のユニットU1,U2と、の間とのインピーダンス整合を図るものであり、コイルとコンデンサなどの電気素子の組み合わせによる整合回路から構成されている。
まず、チャンバ40A,40B,40C,40Dのチャンバ蓋体45A,45B,45C,45Dがそれぞれ外された状態で、複数の樹脂容器Bがチャンバ本体41A,41B,41C,41Dの貫通穴42A,42B,42C,42Dに上部から挿入されてそれぞれ格納される。このとき、貫通穴42A,42B,42C,42Dは樹脂容器Bの最大胴径よりわずかに大きい内径になっているため、樹脂容器Bは、貫通穴42A,42B,42C,42D内の所定の位置に保持される(ステップS1)。
なお、このとき、内部電極50は、樹脂容器Bの口部から樹脂容器Bの内部にそれぞれ挿入される。
なお、このとき、排気部60は、順次、格納室S1,S2,S3,S4内に充填され漏れ出てくる原料ガスを逐次排出している。
次に、図6を参照して、本発明に係る樹脂容器用コーティング装置の第2実施形態について説明する。なお、上記第1実施形態と同一又は同等部分については、図面に同一或いは同など符号を付してその説明を省略或いは簡略化する。
次に、図7を参照して、本発明に係る樹脂容器用コーティング装置の第3実施形態について説明する。
なお、上記第1実施形態と同一又は同等部分については、図面に同一或いは同など符号を付してその説明を省略或いは簡略化する。
その他の構成及び作用効果については、上記第1実施形態と同様である。
Claims (2)
- 互いに電気的に独立した複数の外部電極であり、複数の樹脂容器を各々独立した状態で格納する複数のチャンバと、
電気的に接地されるとともに筒状に形成され、内周部に原料ガスが導かれるガス導通部が形成され、前記チャンバに格納された複数の前記樹脂容器の内部にそれぞれ挿入される複数の内部電極と、
前記複数のチャンバに原料ガスを供給するガス供給部と、
前記複数のチャンバに高周波電力を供給する高周波電源と、
前記高周波電源から供給される高周波電力の供給先を、前記複数のチャンバのうちの一部のチャンバから他のチャンバに切り替えることが可能な電力切替部と、
を備えることを特徴とする樹脂容器用コーティング装置。 - 前記ガス供給部から供給される原料ガスの供給先を、前記複数のチャンバのうちの一部のチャンバから他のチャンバに切り替えることが可能なガス切替部を備えることを特徴とする請求項1に記載の樹脂容器用コーティング装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012246499A JP6093552B2 (ja) | 2012-11-08 | 2012-11-08 | 樹脂容器用コーティング装置 |
EP13853061.3A EP2918703B1 (en) | 2012-11-08 | 2013-11-07 | Resin container coating device |
US14/441,290 US10385456B2 (en) | 2012-11-08 | 2013-11-07 | Resin container coating device |
PCT/JP2013/080124 WO2014073609A1 (ja) | 2012-11-08 | 2013-11-07 | 樹脂容器用コーティング装置 |
CN201380058573.3A CN104769157B (zh) | 2012-11-08 | 2013-11-07 | 树脂容器用涂覆装置 |
Applications Claiming Priority (1)
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---|---|---|---|
JP2012246499A JP6093552B2 (ja) | 2012-11-08 | 2012-11-08 | 樹脂容器用コーティング装置 |
Publications (2)
Publication Number | Publication Date |
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JP2014095116A true JP2014095116A (ja) | 2014-05-22 |
JP6093552B2 JP6093552B2 (ja) | 2017-03-08 |
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JP2012246499A Expired - Fee Related JP6093552B2 (ja) | 2012-11-08 | 2012-11-08 | 樹脂容器用コーティング装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US10385456B2 (ja) |
EP (1) | EP2918703B1 (ja) |
JP (1) | JP6093552B2 (ja) |
CN (1) | CN104769157B (ja) |
WO (1) | WO2014073609A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102019130303A1 (de) * | 2019-11-11 | 2021-05-12 | Khs Corpoplast Gmbh | Vorrichtung und Verfahren zur Plasmabehandlung von Behältern |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2788412B2 (ja) * | 1994-08-11 | 1998-08-20 | 麒麟麦酒株式会社 | 炭素膜コーティングプラスチック容器の製造装置および製造方法 |
JP2005350145A (ja) * | 2004-06-11 | 2005-12-22 | Schott Ag | 回転設備内で基材を処理する方法および装置 |
JP2007016300A (ja) * | 2005-07-11 | 2007-01-25 | Mitsubishi Heavy Ind Ltd | プラズマ処理装置及びその運転方法 |
Family Cites Families (9)
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JP3115252B2 (ja) * | 1997-03-14 | 2000-12-04 | 麒麟麦酒株式会社 | 炭素膜コーティングプラスチック容器の製造装置および製造方法 |
US6924001B2 (en) * | 2000-12-25 | 2005-08-02 | Mitsubishi Shoji Plastics Corporation | Production device for DLC film-coated plastic container and production method therefor |
ES2208530T3 (es) * | 2001-04-27 | 2004-06-16 | European Community | Metodo y aparato para el tratamiento secuencial por plasma. |
JP3679067B2 (ja) | 2002-04-17 | 2005-08-03 | 三菱商事プラスチック株式会社 | ロータリー型量産用cvd成膜装置及びプラスチック容器内表面へのcvd膜成膜方法 |
JP4567442B2 (ja) | 2002-05-24 | 2010-10-20 | ショット アクチエンゲゼルシャフト | 複数場所コーティング装置およびプラズマコーティングの方法 |
MXPA04011431A (es) * | 2002-05-24 | 2005-08-15 | Schott Ag | Dispositivo y metodo para el tratamiento de piezas de trabajo. |
JP4149748B2 (ja) * | 2002-06-24 | 2008-09-17 | 三菱商事プラスチック株式会社 | ロータリー型量産用cvd成膜装置及びプラスチック容器内表面へのcvd膜成膜方法 |
EP2427902B1 (en) * | 2009-05-06 | 2017-01-18 | 3M Innovative Properties Company | Apparatus and method for plasma treatment of containers |
US8911826B2 (en) * | 2012-08-02 | 2014-12-16 | Asm Ip Holding B.V. | Method of parallel shift operation of multiple reactors |
-
2012
- 2012-11-08 JP JP2012246499A patent/JP6093552B2/ja not_active Expired - Fee Related
-
2013
- 2013-11-07 EP EP13853061.3A patent/EP2918703B1/en active Active
- 2013-11-07 CN CN201380058573.3A patent/CN104769157B/zh not_active Expired - Fee Related
- 2013-11-07 WO PCT/JP2013/080124 patent/WO2014073609A1/ja active Application Filing
- 2013-11-07 US US14/441,290 patent/US10385456B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2788412B2 (ja) * | 1994-08-11 | 1998-08-20 | 麒麟麦酒株式会社 | 炭素膜コーティングプラスチック容器の製造装置および製造方法 |
JP2005350145A (ja) * | 2004-06-11 | 2005-12-22 | Schott Ag | 回転設備内で基材を処理する方法および装置 |
JP2007016300A (ja) * | 2005-07-11 | 2007-01-25 | Mitsubishi Heavy Ind Ltd | プラズマ処理装置及びその運転方法 |
Also Published As
Publication number | Publication date |
---|---|
EP2918703B1 (en) | 2018-10-24 |
EP2918703A1 (en) | 2015-09-16 |
CN104769157A (zh) | 2015-07-08 |
CN104769157B (zh) | 2017-11-14 |
EP2918703A4 (en) | 2016-05-25 |
JP6093552B2 (ja) | 2017-03-08 |
US10385456B2 (en) | 2019-08-20 |
WO2014073609A1 (ja) | 2014-05-15 |
US20150292089A1 (en) | 2015-10-15 |
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