JP2014092694A - 電気光学装置、及び電子機器 - Google Patents
電気光学装置、及び電子機器 Download PDFInfo
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- JP2014092694A JP2014092694A JP2012243332A JP2012243332A JP2014092694A JP 2014092694 A JP2014092694 A JP 2014092694A JP 2012243332 A JP2012243332 A JP 2012243332A JP 2012243332 A JP2012243332 A JP 2012243332A JP 2014092694 A JP2014092694 A JP 2014092694A
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- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
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- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
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- 239000001301 oxygen Substances 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
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- RFBSXFWTSAJAEJ-UHFFFAOYSA-N silane dihydrochloride Chemical compound [SiH4].Cl.Cl RFBSXFWTSAJAEJ-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- WNUPENMBHHEARK-UHFFFAOYSA-N silicon tungsten Chemical compound [Si].[W] WNUPENMBHHEARK-UHFFFAOYSA-N 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
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- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WQJQOUPTWCFRMM-UHFFFAOYSA-N tungsten disilicide Chemical compound [Si]#[W]#[Si] WQJQOUPTWCFRMM-UHFFFAOYSA-N 0.000 description 1
- 229910021342 tungsten silicide Inorganic materials 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012243332A JP2014092694A (ja) | 2012-11-05 | 2012-11-05 | 電気光学装置、及び電子機器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012243332A JP2014092694A (ja) | 2012-11-05 | 2012-11-05 | 電気光学装置、及び電子機器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014092694A true JP2014092694A (ja) | 2014-05-19 |
| JP2014092694A5 JP2014092694A5 (enrdf_load_stackoverflow) | 2015-12-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012243332A Withdrawn JP2014092694A (ja) | 2012-11-05 | 2012-11-05 | 電気光学装置、及び電子機器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2014092694A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016035485A (ja) * | 2014-08-01 | 2016-03-17 | セイコーエプソン株式会社 | 電気光学装置、電気光学装置の製造方法、及び電子機器 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001119028A (ja) * | 1999-10-15 | 2001-04-27 | Seiko Epson Corp | 電極基板及び電気光学装置、電極基板の製造方法及び電気光学装置の製造方法並びにこれらの製造方法により製造された電極基板及び電気光学装置 |
| JP2001135640A (ja) * | 1999-11-09 | 2001-05-18 | Seiko Epson Corp | 電極基板及び電気光学装置並びに電極基板の製造方法及び電気光学装置の製造方法 |
| JP2005338746A (ja) * | 2003-11-13 | 2005-12-08 | Seiko Epson Corp | 電気光学装置の製造方法及び電気光学装置、並びにこれを備えた電子機器 |
| JP2011133603A (ja) * | 2009-12-24 | 2011-07-07 | Seiko Epson Corp | 電気光学装置、電気光学装置の製造方法および電子機器 |
| JP2012108169A (ja) * | 2010-11-15 | 2012-06-07 | Seiko Epson Corp | 電気光学装置および投射型表示装置 |
| JP2012173470A (ja) * | 2011-02-21 | 2012-09-10 | Fujitsu Semiconductor Ltd | アクティブマトリクス基板、その製造方法、及び反射型液晶表示装置 |
-
2012
- 2012-11-05 JP JP2012243332A patent/JP2014092694A/ja not_active Withdrawn
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001119028A (ja) * | 1999-10-15 | 2001-04-27 | Seiko Epson Corp | 電極基板及び電気光学装置、電極基板の製造方法及び電気光学装置の製造方法並びにこれらの製造方法により製造された電極基板及び電気光学装置 |
| JP2001135640A (ja) * | 1999-11-09 | 2001-05-18 | Seiko Epson Corp | 電極基板及び電気光学装置並びに電極基板の製造方法及び電気光学装置の製造方法 |
| JP2005338746A (ja) * | 2003-11-13 | 2005-12-08 | Seiko Epson Corp | 電気光学装置の製造方法及び電気光学装置、並びにこれを備えた電子機器 |
| JP2011133603A (ja) * | 2009-12-24 | 2011-07-07 | Seiko Epson Corp | 電気光学装置、電気光学装置の製造方法および電子機器 |
| JP2012108169A (ja) * | 2010-11-15 | 2012-06-07 | Seiko Epson Corp | 電気光学装置および投射型表示装置 |
| JP2012173470A (ja) * | 2011-02-21 | 2012-09-10 | Fujitsu Semiconductor Ltd | アクティブマトリクス基板、その製造方法、及び反射型液晶表示装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016035485A (ja) * | 2014-08-01 | 2016-03-17 | セイコーエプソン株式会社 | 電気光学装置、電気光学装置の製造方法、及び電子機器 |
| US10444493B2 (en) | 2014-08-01 | 2019-10-15 | Seiko Epson Corporation | Electro-optical device, manufacturing method for electro-optical device, and electronic apparatus |
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