JP2014056255A5

JP2014056255A5 -

Info

Publication number: JP2014056255A5
Application number: JP2013223545A
Authority: JP
Filing date: 2013-10-28
Publication date: 2014-06-26
Anticipated expiration: 2023-10-24

Description

本発明の第１形態は、第１面に配置され光で照明されるパターンの縮小像を、液体を介して第２面に投影する投影光学系であって、前記パターンからの前記光により前記パターンの第１中間像を形成する第１光学系と、前記第１中間像からの前記光により前記パターンの第２中間像を形成する第２光学系と、前記第２中間像からの前記光により前記パターンの前記縮小像を形成する第３光学系とを備え、   A first aspect of the present invention is a projection optical system that projects a reduced image of a pattern disposed on a first surface and illuminated with light onto a second surface via a liquid, and the light from the pattern causes the A first optical system for forming a first intermediate image of the pattern; a second optical system for forming a second intermediate image of the pattern by the light from the first intermediate image; and the light from the second intermediate image. And a third optical system for forming the reduced image of the pattern by
前記第１、第２及び第３光学系に含まれる各光学素子の光軸は、単一光軸上に設けられ、  The optical axes of the optical elements included in the first, second, and third optical systems are provided on a single optical axis,
前記第２光学系は、透過型光学素子を介さずに前記第２中間像を形成し、  The second optical system forms the second intermediate image without passing through a transmissive optical element;
前記第３光学系は、前記第２面のうち前記単一光軸を含まない領域に前記縮小像を形成することを特徴とする投影光学系を提供する。  The third optical system provides a projection optical system, wherein the reduced image is formed in a region of the second surface that does not include the single optical axis.

また、本発明の第２形態は、マスク上のパターンからの光により液体を介して基板を露光する露光装置であって、前記基板を支持するステージと、前記パターンからの前記光により前記パターンの縮小像を、前記ステージに支持された前記基板に前記液体を介して投影する第１形態の投影光学系と、を備えることを特徴とする露光装置を提供する。 According to a second aspect of the present invention, there is provided an exposure apparatus that exposes a substrate through a liquid by light from a pattern on a mask, the stage supporting the substrate, and the pattern from the pattern by the light from the pattern. An exposure apparatus comprising: a projection optical system of a first form that projects a reduced image onto the substrate supported by the stage via the liquid.

また、本発明の第３形態は、マスク上のパターンからの光により液体を介して基板を露光する露光方法であって、前記基板をステージにより支持することと、第１形態の投影光学系を用いて、前記パターンからの前記光により前記パターンの縮小像を、前記ステージに支持された前記基板に前記液体を介して投影することと、を含むことを特徴とする露光方法を提供する。According to a third aspect of the present invention, there is provided an exposure method for exposing a substrate through a liquid by light from a pattern on a mask, wherein the substrate is supported by a stage, and the projection optical system according to the first aspect is provided. And using the light from the pattern to project a reduced image of the pattern onto the substrate supported by the stage via the liquid.

また、本発明の第４形態は、第１形態の投影光学系を用いて、マスク上のパターンからの光により液体を介して基板を露光することと、前記光により露光された前記基板を現像することと、を含むことを特徴とするデバイス製造方法を提供する。In the fourth embodiment of the present invention, the projection optical system of the first embodiment is used to expose the substrate through the liquid with light from the pattern on the mask, and to develop the substrate exposed with the light. And a device manufacturing method characterized by comprising:

Claims

A projection optical system for projecting a reduced image of a pattern arranged on a first surface and illuminated with light onto a second surface via a liquid,
A first optical system that forms a first intermediate image of the pattern with the light from the pattern;
A second optical system that forms a second intermediate image of the pattern with the light from the first intermediate image;
A third optical system that forms the reduced image of the pattern with the light from the second intermediate image;
With
The optical axes of the optical elements included in the first, second, and third optical systems are provided on a single optical axis,
The second optical system forms the second intermediate image without passing through a transmissive optical element;
The projection optical system, wherein the third optical system forms the reduced image in a region not including the single optical axis in the second surface.

The projection optical system according to claim 1,
The third optical system is composed of a transmissive optical element, and has a first lens group having a positive refractive power and a negative refractive power arranged on the second surface side with respect to the first lens group. A second lens group, a third lens group having a positive refractive power disposed on the second surface side with respect to the second lens group, and a second surface side with respect to the third lens group. A projection optical system comprising: an aperture stop disposed; and a fourth lens group having a positive refractive power disposed on the second surface side with respect to the aperture stop.

The projection optical system according to claim 2,
The projection optical system, wherein the second lens group includes a biconcave lens.

The projection optical system according to claim 3,
The biconcave lens has a diameter necessary for passing a light beam defined by the aperture stop in the light from the second intermediate image, the first surface of the third optical system than the aperture stop. A projection optical system characterized by being the smallest of the optical elements arranged on the side.

The projection optical system according to claim 3 or 4,
The projection optical system, wherein the third optical system includes a negative meniscus lens disposed adjacent to the biconcave lens on the first surface side with respect to the biconcave lens.

The projection optical system according to claim 5, wherein
Projection characterized in that a distance on the single optical axis between the biconcave lens and the negative meniscus lens is shorter than a distance on the single optical axis between the biconcave lens and the aperture stop. Optical system.

In the projection optical system according to any one of claims 2 to 6,
The projection optical system, wherein the fourth lens group comprises only a positive lens.

The projection optical system according to claim 7,
Each positive lens constituting the fourth lens group is disposed with a convex surface facing the first surface, and a projection optical system characterized in that:

In the projection optical system according to any one of claims 2 to 8,
The projection optical system characterized in that the number of lenses constituting the fourth lens group is smaller than the total number of lenses constituting the first, second and third lens groups.

In the projection optical system according to any one of claims 2 to 9,
The projection lens system, wherein the fourth lens group includes a plano-convex lens including a plane disposed so as to be in contact with the liquid.

In the projection optical system according to any one of claims 2 to 9,
The projection lens system, wherein the fourth lens group includes a plano-convex lens disposed closest to the second surface of the fourth lens group and having a convex surface facing the first surface.

The projection optical system according to claim 1,
The projection optical system, wherein the third optical system includes an aperture stop, and a positive lens group that includes only a positive lens and is disposed closer to the second surface than the aperture stop.

The projection optical system according to claim 12,
A projection optical system, wherein each positive lens constituting the positive lens group is disposed with a convex surface facing the first surface.

The projection optical system according to claim 12 or 13,
The projection optical system, wherein the number of lenses constituting the positive lens group is smaller than the number of lenses arranged on the first surface side of the aperture stop in the third optical system.

The projection optical system according to any one of claims 12 to 14,
The projection optical system according to claim 1, wherein the positive lens group includes a plano-convex lens including a plane disposed so as to contact the liquid.

The projection optical system according to any one of claims 12 to 14,
2. The projection optical system according to claim 1, wherein the positive lens group includes a plano-convex lens that is disposed closest to the second surface side of the positive lens group and has a convex surface facing the first surface side.

The projection optical system according to any one of claims 1 to 16,
The projection optical system according to claim 1, wherein a center of a projection area on which the reduced image is projected is separated from the single optical axis.

The projection optical system according to any one of claims 1 to 17,
The projection optical system according to claim 1, wherein the first intermediate image and the second intermediate image are formed in a region away from the single optical axis.

An exposure apparatus that exposes a substrate through a liquid by light from a pattern on a mask,
A stage for supporting the substrate;
The projection optical system according to any one of claims 1 to 18 , wherein a reduced image of the pattern is projected via the liquid onto the substrate supported by the stage by the light from the pattern.
An exposure apparatus comprising:

The exposure apparatus according to claim 19 ,
An exposure apparatus comprising an illumination optical system that illuminates the pattern with S-polarized light.

The exposure apparatus according to claim 19 or 20 ,
An exposure apparatus comprising: a liquid supply device that supplies the liquid to an optical path between the projection optical system and the substrate supported by the stage.

An exposure method for exposing a substrate through a liquid by light from a pattern on a mask,
Supporting the substrate by a stage;
A reduced image of the pattern is projected onto the substrate supported by the stage via the liquid using the projection optical system according to any one of claims 1 to 18. And
An exposure method comprising:

The exposure method according to claim 22 ,
An exposure method comprising illuminating the pattern with S-polarized light.

24. The exposure method according to claim 22 or 23 .
An exposure method comprising: supplying the liquid to an optical path between the projection optical system and the substrate supported by the stage.

Using the projection optical system according to any one of claims 1 to 18 , exposing a substrate through a liquid with light from a pattern on a mask;
Developing the substrate exposed by the light;
A device manufacturing method comprising:

The device manufacturing method according to claim 25,
Illuminating the pattern with S-polarized light.

In the device manufacturing method according to claim 25 or 26,
Supporting the substrate by a stage;
Supplying the liquid to an optical path between the projection optical system and the substrate supported by the stage;
A device manufacturing method comprising: