JP2014003284A - Composition for photocurable nanoimprint and patterning method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a composition for photocurable nanoimprint having excellent etching resistance of chlorine gas, facilitating transfer of a pattern, and ensuring excellent adhesion of the pattern to a substrate, excellent releasability from a die, good dispersibility, and excellent productivity.SOLUTION: The composition for photocurable nanoimprint contains (A) a hydrolysis mixture containing a hydrolysate of fluorination organic silane compound, a hydrolysate of an organic silicon compound having a (meth)acryl group, and a hydrolysate of a specific metal alkoxide, (B) a polymerizable monomer having a (meth)acryl group, and (C) a photopolymerization initiator. A hydrolysate of an organic silicon compound may be added to the hydrolysis mixture of (A).

Description

  The present invention relates to a novel photocurable nanoimprint composition, and further relates to a novel pattern forming method for forming a pattern on a substrate using the photocurable nanoimprint composition. The present invention also relates to a novel nanoimprint replica mold comprising a cured product of the composition.

  In recent years, semiconductor integrated circuits are required to be miniaturized and have high precision, but such microfabrication is not only for high precision semiconductor integrated circuits but also for providing light reflection prevention and light on LED substrates. In various applications such as optical / illumination applications such as taking-out efficiency improvement, energy development of secondary batteries, solar cells, fuel cells, biotechnology, etc., microfabrication by imprint technology has been actively studied.

The imprint technology is a method in which a desired pattern is formed on the surface of a substrate by embossing and peeling a mold having a concavo-convex pattern corresponding to the pattern to be formed on the substrate onto the coating film formed on the substrate surface. It consists of a transfer process and is expected as a fine processing technology that can be mass-produced at low cost.
By using this technique, a nano-order fine pattern can be formed. Among the imprint techniques, a technique for forming an ultrafine pattern of several nanometers to several hundred nanometers (nm) is called a nanoimprint technique.

  The nanoimprint technology is roughly classified into two types depending on the properties of the coating material formed on the substrate surface. One of them is a thermal nanoimprint method in which the pattern is transferred by heating and plastically deforming the coating material to which the pattern is transferred, then pressing the mold, cooling, and curing the coating material. is there. In addition, the other one uses a mold or a substrate in which at least one of the substrates is light transmissive, and forms a coating film by applying a liquid photocurable composition as a coating material on the substrate, In this method, the mold is pressed and brought into contact with the coating film, and then the pattern material is transferred by irradiating light through the mold or the substrate to cure the coating material. Among these, the optical nanoimprint method for transferring a pattern by light irradiation is capable of forming a high-precision pattern, and thus is widely used in nanoimprint technology, and is suitable for use in the method. Development of curable compositions is underway.

In the nanoimprint technology, the adhesion between the substrate surface and the pattern obtained by curing the coating film and the releasability between the pattern and the mold are important. For mold release from the mold, the mold surface is surface treated with a fluorine treatment agent to provide mold release, or fluorine such as pentafluoropropane gas is provided at the interface between the photocurable composition and the mold. A technique for imprinting with a system gas interposed is generally known. On the other hand, the adhesion to the substrate has been attempted to improve by subjecting the surface of the substrate to surface treatment, providing an easy-adhesion layer, or changing the composition of the photocurable composition. Adhesion with the substrate and mold release from the mold are contradictory properties, but further improvement is desired to increase productivity.
In order to give the coating material itself the contradictory characteristics, a proposal has been made to add a fluorine-based surfactant or a silicone compound to the coating material (see Patent Document 1). However, there are problems such as a decrease in adhesion to the substrate and bleeding out of the additive on the surface, and there is still room for improvement in terms of both adhesion to the substrate and releasability from the mold. It was.

  The nanoimprint technique is to form a desired pattern on a substrate based on a coating material (hereinafter sometimes referred to as a cured film) obtained by transferring a pattern with a mold and photocuring. In order to form a pattern on the substrate, dry etching of the cured film and the substrate is performed with oxygen gas, fluorine-based gas, chlorine-based gas, or the like. In such a dry etching process, the patterned cured film that protects the substrate is also etched, so that the etching rate ratio between the substrate and the cured film is important. Therefore, many photocurable compositions have been developed to form a cured film that is difficult to be etched by the above-described gas when performing various patterning. (Hereafter, this characteristic may be regarded as etching resistance).

  In order to improve the light extraction efficiency in the LED substrate, it is considered to suppress the total reflection of light from the element or reduce the crystal defects of the GaN layer stacked on the sapphire substrate by processing the unevenness on the surface of the sapphire substrate. Has been. As a method of processing irregularities on the surface of the sapphire substrate, silica is vapor-deposited using a mask, a resist pattern is formed by photolithography using a silica vapor deposition pattern as a mask, and then by hard mask deposition and lift-off. A method of performing a dry etching process by forming a metal mask is generally used. The substrate obtained by these methods is called Patterned Sapphire Substrates (PSS), and has a micron-order concavo-convex pattern on the sapphire surface. In recent years, for the purpose of further improving the luminous efficiency of LED light sources, it has been studied to provide a concavo-convex pattern of about 100 to 500 nm below the wavelength of visible light on the surface of sapphire to suppress lateral propagation due to total reflection. As such a method, a method of forming a pattern of a cured film on the surface of the sapphire substrate by nanoimprinting and using the mask as a mask to give a concavo-convex pattern to the surface of sapphire by dry etching treatment can be mentioned.

  As a gas used for dry etching of sapphire, a chlorine-based gas is generally used, and a cured film resin of a photocurable composition used for pattern formation is required to have high chlorine etching resistance. Aromatic compounds are considered effective for improving chlorine etching resistance because free carbon sources can be minimized. Thermal nanoimprint method using aromatic polymer is effective, but after the process, the coating material to which the pattern is transferred is heated and plastically deformed, then the mold is pressed, cooled, and the coating film Since the pattern was transferred by curing the material, there was a problem in productivity. From the viewpoint of productivity, photocurable compositions containing a polymerizable monomer or resin having an aryl substituent and an alicyclic compound have been proposed (see Patent Documents 2 to 4). However, in order to improve chlorine etching resistance, it is considered effective to include a monomer having a rigid skeleton such as a polymerizable monomer having an aryl substituent or a resin and an alicyclic compound. In addition, there was room for improvement in terms of adhesion to the sapphire substrate and transferability of the nanoimprint pattern at low pressure because of increased viscosity.

JP 2008-19292 A JP 2009-218550 A JP 2011-157482 A JP 2008-246876 A

  An object of the present invention is to transfer nanoimprint patterns such as excellent etching resistance and productivity of chlorine gas, easy pattern transfer, good adhesion to the substrate of the pattern, and good releasability from the mold. It is in providing the photocurable nanoimprinting composition with favorable property.

  The present inventor is excellent in etching resistance and productivity of chlorine-based gas, can easily transfer a pattern, has good nanoimprint pattern transfer properties such as adhesion of the pattern to a substrate, and good releasability from a mold. Various studies were conducted to improve the above. As a result, a hydrolyzate obtained by hydrolyzing a mixture containing a fluorinated organosilane compound having a specific structure, an organosilicon compound having a (meth) acryl group, and a mixture comprising a hydrolyzate of a specific metal alkoxide. It has been found that the blended photocurable composition has both nanoimprint pattern transferability and etching resistance, particularly etching resistance to chlorine-based gas, and has completed the present invention.

That is, the present invention
(A) General formula (1)

(Where
R ¹ and R ³ are each an alkyl group having 1 to 10 carbon atoms or a cycloalkyl group having 3 to 10 carbon atoms; R ² is a fluorine-containing alkyl group having 1 to 100 carbon atoms or a fluorine-containing cyclohexane. An alkyl group or a fluorine-containing alkoxy ether group; a is an integer of 1 to 3, b is an integer of 0 to 2, provided that a + b = 1 to 3; R ¹ , R ² and R ^{When a} plurality of ³ are present, the plurality of R ¹ , R ² and R ³ may be the same or different. )
Hydrolyzate of fluorinated organosilane compound represented by general formula (2)

Wherein R ⁴ is a hydrogen atom or a methyl group; R ⁵ is an alkylene group having 1 to 20 carbon atoms, a cycloalkylene group having 3 to 10 carbon atoms or an alkylene ether group having 2 to 20 carbon atoms; R ⁶ is an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 4 carbon atoms, or an aryl group having 6 to 12 carbon atoms; R ⁷ is an alkyl group having 1 to 4 carbon atoms or a carbon number R ⁵ or R ⁶ may be modified with an alkyl group, an aryl group, a halogen, or a hydroxyl group; l is an integer of 0 to 2 and m is 1 to 3; is an integer, however, be a ^{l + m = 1~3; R 4} , R 5, R 6 and R ^7, respectively, when there are a plurality, the plurality of R ^4, R ^5, R ⁶ and R ⁷ May be the same or different groups. ) Hydrolyzate of an organic silicon compound having an acrylic group, and the general formula (3)

(In the formula, M is tungsten, tin, indium, antimony, molybdenum, niobium, or hafnium; R ⁸ is an alkyl group having 1 to 10 carbon atoms; When M is tungsten, p is 6 or 5; when M is molybdenum or niobium, p is 5; when M is tin or hafnium, p is 4; In the case of antimony, p is 3.) A hydrolysis mixture comprising a hydrolyzate of a metal alkoxide represented by
(B) A photocurable nanoimprinting composition containing a polymerizable monomer having a (meth) acrylic group and (C) a photopolymerization initiator.

The second invention is
Applying the photocurable nanoimprint composition onto a substrate to form a coating film comprising the composition;
Contacting the pattern forming surface of the mold on which the pattern is formed with the coating film, and irradiating light in that state to cure the coating film;
Separating the mold from the cured coating film, and forming a pattern corresponding to the pattern formed on the pattern forming surface of the mold on the substrate. is there.

The third invention is
A method for producing a surface-processed sapphire substrate, wherein the substrate is a sapphire substrate, and the substrate surface is processed by dry etching with a chlorine-based gas using the pattern formed on the substrate by the pattern formation method as a mask. is there.

  In the present invention, the (meth) acryl group means a methacryl group or an acryl group.

  The photocurable nanoimprint composition of the present invention has good dispersibility, excellent adhesion to the substrate of the cured film after curing the composition as a coating film, and excellent releasability from the mold. . It is also excellent in nanoimprint pattern transferability and productivity at low pressure. In addition, in the conventional photocurable nanoimprint composition, there is room for improvement in adhesion of the cured film to the substrate, mold release from the mold, etching resistance, particularly etching resistance to chlorine-based gas, The photocurable nanoimprint composition of the present invention is excellent in adhesion to a substrate and release from a mold, and is suitable for forming a cured film having etching resistance, particularly chlorine-based gas etching resistance. It is a composition.

The present invention relates to a photocurable nanoimprint composition,
A photocurable nanoimprinting composition comprising:
(A) General formula (1)

(Where
R ¹ and R ³ are each an alkyl group having 1 to 10 carbon atoms or a cycloalkyl group having 3 to 10 carbon atoms; R ² is a fluorine-containing alkyl group having 1 to 100 carbon atoms or a fluorine-containing cyclohexane. An alkyl group or a fluorine-containing alkoxy ether group; a is an integer of 1 to 3, b is an integer of 0 to 2, provided that a + b = 1 to 3; R ¹ , R ² and R ^{When a} plurality of ³ are present, the plurality of R ¹ , R ² and R ³ may be the same or different. )
Hydrolyzate of fluorinated organosilane compound represented by general formula (2)

Wherein R ⁴ is a hydrogen atom or a methyl group; R ⁵ is an alkylene group having 1 to 20 carbon atoms, a cycloalkylene group having 3 to 10 carbon atoms or an alkylene ether group having 2 to 20 carbon atoms; R ⁶ is an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 4 carbon atoms, or an aryl group having 6 to 12 carbon atoms; R ⁷ is an alkyl group having 1 to 4 carbon atoms or a carbon number R ⁵ or R ⁶ may be modified with an alkyl group, an aryl group, a halogen, or a hydroxyl group; l is an integer of 0 to 2 and m is 1 to 3; is an integer, however, be a ^{l + m = 1~3; R 4} , R 5, R 6 and R ^7, respectively, when there are a plurality, the plurality of R ^4, R ^5, R ⁶ and R ⁷ May be the same or different groups. ) Hydrolyzate of an organic silicon compound having an acrylic group, and the general formula (3)

(In the formula, M is tungsten, tin, indium, antimony, molybdenum, niobium, or hafnium; R ⁸ is an alkyl group having 1 to 10 carbon atoms; When M is tungsten, p is 6 or 5; when M is molybdenum or niobium, p is 5; when M is tin or hafnium, p is 4; In the case of antimony, p is 3.) A hydrolysis mixture containing a hydrolysis product of a metal alkoxide represented by the following formula (hereinafter, also simply referred to as a hydrolysis mixture (A)), (B) a (meth) acrylic group: And a polymerizable monomer (hereinafter also referred to simply as a polysynthetic monomer), and (C) a photopolymerization initiator.

  In the present invention, nanoimprint refers to a pattern that can favorably form a pattern of 5 nm to 100 μm, and a fine pattern of 5 nm to 500 nm. However, as a matter of course, the photocurable nanoimprinting composition of the present invention can be used to form a pattern exceeding 100 μm.

  In the following, description will be given in order. First, the hydrolysis mixture (A) will be described.

(Hydrolysis mixture (A))
In the present invention, the hydrolysis mixture (A) is a hydrolyzate of a fluorinated organosilane compound represented by the above formula (1), and a hydrolyzate of an organosilicon compound having a (meth) acrylic group represented by the above formula (2). It is a hydrolysis mixture comprising a decomposition product and a hydrolysis product of a metal alkoxide represented by the formula (3). A hydrolyzate of the fluorinated organosilane compound represented by the formula (1), a hydrolyzate of an organosilicon compound having a (meth) acryl group represented by the formula (2), and the formula (3) As for the degree of hydrolysis of the hydrolyzate of the metal alkoxide shown, all of the alkoxy groups may be hydrolyzed, or a part of the alkoxy groups may be hydrolyzed. The hydrolysis mixture (A) is a hydrolysis product comprising a mixture of a fluorinated organosilane compound represented by the formula (1) and an organosilicon compound having a (meth) acryl group represented by the formula (2); A hydrolysis mixture comprising a hydrolyzate of the metal alkoxide represented by the formula (3) may be used, and the fluorinated organosilane compound represented by the formula (1) and the (meth) acrylic represented by the formula (2). A hydrolysis mixture containing a hydrolysis product composed of a mixture of an organosilicon compound having a group and a metal alkoxide represented by the above formula (3) may also be used.

(Fluorinated organosilane compound)
In the present invention, the following formula (1)

(Where
R ¹ and R ³ are each an alkyl group having 1 to 10 carbon atoms or a cycloalkyl group having 3 to 10 carbon atoms; R ² is a fluorine-containing alkyl group, a fluorine-containing cycloalkyl group, or a fluorine-containing group. An alkoxy ether group; a is an integer of 1 to 3, b is an integer of 0 to 2, provided that a + b = 1 to 3; and a plurality of R ¹ , R ² and R ³ are present. When doing so, the plurality of R ¹ , R ² and R ³ may be the same or different. ) Is used (hereinafter sometimes referred to simply as “fluorinated organosilane compound”). By using this fluorinated organosilane compound, the releasability from the mold can be improved without impairing the adhesion of the pattern to the substrate.

In the formula (1), R ¹ and R ³ are an alkyl group having 1 to 10 carbon atoms or a cycloalkyl group having 3 to 10 carbon atoms, preferably a methyl group, an ethyl group, a propyl group, or an isopropyl group. Butyl group, sec-butyl group, isobutyl group, and ter-butyl group. The alkoxy group consisting of —OR ^{1 of the} formula (1) generates an alcohol derived from R ¹ upon hydrolysis, but the photocurable nanoimprinting composition of the present invention may contain this alcohol. Therefore, considering that it becomes an alcohol that can be easily mixed with other components and that it becomes an alcohol that can be easily removed after forming a coating film on the substrate, specifically, R ¹ is a methyl group, an ethyl group, And more preferably a propyl group.

R ² is a fluorine-containing alkyl group, a fluorine-containing cycloalkyl group, or a fluorine-containing alkoxy ether group. Here, the fluorine-containing alkyl group means one in which one or more hydrogen atoms of the alkyl group are substituted with fluorine atoms, and other fluorine-containing cycloalkyl groups or fluorine-containing alkoxy ether groups are each similarly cycloalkyl. Group, an alkoxy ether group in which one or more hydrogen atoms are substituted with fluorine atoms. The fluorine-containing alkyl group and the fluorine-containing alkoxy group preferably have 1 to 10 carbon atoms, and the fluorine-containing cycloalkyl group preferably has 3 to 10 carbon atoms. Moreover, the fluorine-containing alkoxy ether group in this invention substitutes the fluorine atom for 1 or 2 or more hydrogen atoms in the alkoxy ether group represented by the following formula (5).

(In the formula, X is an integer of 1 or more, and Y is an integer of 2 or more)
In the above formula (5), X is preferably 1-6, and Y is preferably 5-50.
^Further, when R 1, ^{R 2,} and ^{where R 3} is present in plural, the plurality of ^R 1, ^{R 2,} and ^{R 3} are identical or may be different groups.

Specific examples of these fluorinated organosilane compounds are (heptadecafluoro-1,1,2,2-tetrahydrodecyl) -triethoxysilane, (heptadecafluoro-1,1,2,2-tetrahydrodecyl). ) -Trimethoxysilane, nonafluorohexyltriethoxysilane, nonafluorohexyltrimethoxysilane, (tridecafluoro-1,1,2,2-tetrahydrooctyl) -triethoxysilane, (tridecafluoro-1,1, 2,2-tetrahydrooctyl) -trimethoxysilane, pentafluoro-1,1,2,2-tetrahydropentyltriethoxysilane, pentafluoro-1,1,2,2-tetrahydropentyltrimethoxysilane, (3,3 , 3-trifluoropropyl) dimethylethoxysilane, (3,3, -Trifluoropropyl) dimethylmethoxysilane, (3,3,3-trifluoropropyl) methyldiethoxysilane, (3,3,3-trifluoropropyl) methyldimethoxysilane, (3,3,3-trifluoropropyl) ) Triethoxysilane, (3,3,3-trifluoropropyl) trimethoxysilane, perfluoropropyltriethoxysilane, perfluoropropyltrimethoxysilane, 5,5,6,6,7,7,8,8, 9,9,10,10,10-tridecafluoro-2- (tridecafluorohexyl) decyltriethoxysilane, 5,5,6,6,7,7,8,8,9,9,10,10 , 10-tridecafluoro-2- (tridecafluorohexyl) decyltrimethoxysilane, perfluorododecyl-1H, 1H, 2 , 2H-triethoxysilane, perfluorododecyl-1H, 1H, 2H, 2H-trimethoxysilane, perfluorotetradecyl-1H, 1H, 2H, 2H-triethoxysilane, perfluorotetradecyl-1H, 1H, 2H , 2H-trimethoxysilane, 3- (perfluorocyclohexyloxy) propyltrimethoxysilane and the like, and examples of the fluorinated organosilane compound having a fluorine-containing alkoxy ether group of the above formula (5) Is, for example, OPTOOL HD-1100TH manufactured by Daikin Industries, Ltd. Among these, the interaction between molecules is relatively weak, and the disorder of the molecular arrangement structure seems to be advantageous for surface releasability, and the ease of hydrolysis of the alkoxy group consisting of —OR ^{1 in the} above formula (1). In consideration, (tridecafluoro-1,1,2,2-tetrahydrooctyl) -trimethoxysilane and (3,3,3-trifluoropropyl) trimethoxysilane are preferable.

(Organic silicon compound having (meth) acrylic group)
In the present invention, the following formula (2)
(A) The following formula (2)

Wherein R ⁴ is a hydrogen atom or a methyl group; R ⁵ is an alkylene group having 1 to 20 carbon atoms, a cycloalkylene group having 3 to 10 carbon atoms or an alkylene ether group having 2 to 20 carbon atoms; R ⁶ is an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 4 carbon atoms, or an aryl group having 6 to 12 carbon atoms; R ⁷ is an alkyl group having 1 to 4 carbon atoms or a carbon number R ⁵ or R ⁶ may be modified with an alkyl group, an aryl group, a halogen, or a hydroxyl group; l is an integer of 0 to 2 and m is 1 to 3; is an integer, however, be a ^{l + m = 1~3; R 4} , R 5, R 6 and R ^7, respectively, when there are a plurality, the plurality of R ^4, R ^5, R ⁶ and R ⁷ May be the same or different groups. ) Organosilicon compound having an acrylic group (hereinafter, simply using the hydrolyzate also referred to as "(meth) organosilicon compound having an acryl group").

  By using the hydrolyzate of an organosilicon compound having this (meth) acrylic group, a photocurable nanoimprinting composition with good dispersibility can be obtained, and purification by filtration is facilitated and productivity is improved. Moreover, in the fine structure of the cured film obtained by photocuring, the inorganic component and the organic component are dispersed in a relatively homogeneous state (the dispersed state is not such that the inorganic component is extremely aggregated). As a result, it is estimated that a uniform transfer pattern and a uniform residual film can be formed.

In the formula (2), R ⁴ is a hydrogen atom or a methyl group. Among these, a hydrogen atom is preferable because the photocuring speed when curing the photocurable nanoimprinting composition is high.

R ⁵ is an alkylene group having 1 to 20 carbon atoms, a cycloalkylene group having 3 to 10 carbon atoms, or an alkylene ether group having 2 to 20 carbon atoms. The alkylene ether group is represented by —R _X —O—R _Y — (R _X and R _Y represent an alkylene group), and refers to a group in which two alkylene groups are bonded to an oxygen atom. The carbon number of represents the total number of carbon atoms of the two alkylene groups. Specific examples of R ⁵ include methylene group, ethylene group, propylene group, isopropylene group, butylene group, isobutylene group, sec-butylene group, tert-butylene group, 2,2-dimethylpropylene group, and 2-methylbutylene group. 2-methyl-2-butylene group, 3-methylbutylene group, 3-methyl-2-butylene group, pentylene group, 2-pentylene group, 3-pentylene group, 3-dimethyl-2-butylene group, 3, 3 -Dimethylbutylene group, 3,3-dimethyl-2-butylene group, 2-ethylbutylene group, hexylene group, 2-hexylene group, 3-hexylene group, 2-methylpentylene group, 2-methyl-2-pentylene group 2-methyl-3-pentylene group, 3-methylpentylene group, 3-methyl-2-pentylene group, 3-methyl-3-pentylene group, 4-methyl Tylpentylene group, 4-methyl-2-pentylene group, 2,2-dimethyl-3-pentylene group, 2,3-dimethyl-3-pentylene group, 2,4-dimethyl-3-pentylene group, 4,4-dimethyl 2-pentylene group, 3-ethyl-3-pentylene group, heptylene group, 2-heptylene group, 3-heptylene group, 2-methyl-2-hexylene group, 2-methyl-3-hexylene group, 5-methylhexene Xylene group, 5-methyl-2-hexylene group, 2-ethylhexylene group, 6-methyl-2-heptylene group, 4-methyl-3-heptylene group, octylene group, 2-octylene group, 3-octylene group, Alkylene groups such as 2-propylpentylene group, 2,4,4-trimethylpentylene group, decaoctylene group; cyclopropylene group, cyclobutylene group, cyclopropylene Cycloalkylene groups such as methylene group, cyclopentylylene group, cyclohexylene group, cyclooctylene group; dimethylene ether group, trimethylene ether group, diethylene ether group, triethylene ether group, dipropylene ether group, diisopropylene ether And alkylene ether groups such as a group, a dibutylene ether group and a dioctylene ether group.

  Among these, C1-C4 alkylene groups, such as a methylene group, ethylene group, propylene group, isopropylene group, butylene group, and C3-C4 cycloalkylene groups, such as a cyclopropylene group and a cyclobutylene group, are preferable. .

R ⁶ is an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 4 carbon atoms, or an aryl group having 6 to 12 carbon atoms. Specifically, alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, tert-butyl group; cyclopropyl group, cyclobutyl group, cyclopropylmethyl group, etc. Cycloalkyl group; aryl groups such as phenyl group, benzyl group, 1-naphthyl group, 2-naphthyl group and o-methylnaphthyl group can be exemplified. Of these, a methyl group and an ethyl group are preferable.

R ⁷ is an alkyl group having 1 to 4 carbon atoms or a cycloalkyl group having 3 to 4 carbon atoms. Specifically, alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, tert-butyl group; cyclopropyl group, cyclobutyl group, cyclopropylmethyl group, etc. A cycloalkyl group is mentioned.

The alkoxy group represented by -OR ⁷ produces an alcohol derived from R ⁷ upon hydrolysis, but the photocurable nanoimprinting composition of the present invention may contain this alcohol. Therefore, considering that it becomes an alcohol that can be easily mixed with other components, and that it becomes an alcohol that can be easily removed after forming a coating film on a substrate, specifically, R ⁷ is a methyl group, an ethyl group, It is preferably an alkyl group having 1 to 4 carbon atoms such as a group, a propyl group, an isopropyl group, or a butyl group.

  Moreover, l is an integer of 0-2, m is an integer of 1-3. However, the sum of l and m, that is, l + m is 1 to 3. Of these, l + m is preferably 3.

  Specific examples of such (meth) acrylic group-containing silicon compounds include trimethoxysilylmethylene (meth) acrylate, trimethoxysilyldimethylene (meth) acrylate, trimethoxysilyltrimethylene (meth) acrylate, triethoxy Silylmethylene (meth) acrylate, triethoxysilyldimethylene (meth) acrylate, triethoxysilyltrimethylene (meth) acrylate, tripropoxysilylmethylene (meth) acrylate, tripropoxysilylethylene (meth) acrylate, tripropoxysilyl trimethylene (Meth) acrylate, Tributoxysilylmethylene (meth) acrylate, Tributoxysilyldimethylene (meth) acrylate, Tributoxysilyltrimethylene (meth) acrylate Triisopropoxysilylmethylene (meth) acrylate, triisopropoxysilyldimethylene (meth) acrylate, triisopropoxysilyltrimethylene (meth) acrylate, dimethoxymethylsilylmethylene (meth) acrylate, dimethoxymethylsilyldimethylene (meth) acrylate , Dimethoxymethylsilyltrimethylene (meth) acrylate, diethoxymethylsilylmethylene (meth) acrylate, diethoxymethylsilyldimethylene (meth) acrylate, diethoxymethylsilyltrimethylene (meth) acrylate, dimethoxyethylsilylmethylene (meth) Acrylate, dimethoxyethylsilyldimethylene (meth) acrylate, dimethoxyethylsilyltrimethylene (meth) acrylate, diethoxy Tylsilylmethylene (meth) acrylate, diethoxyethylsilyldimethylene (meth) acrylate, diethoxyethylsilyltrimethylene (meth) acrylate, methoxydimethylsilylmethylene (meth) acrylate, methoxydimethylsilyldimethylene (meth) acrylate, methoxy Dimethylsilyltrimethylene (meth) acrylate, ethoxydimethylsilylmethylene (meth) acrylate, ethoxydimethylsilyldimethylene (meth) acrylate, ethoxydimethylsilyltrimethylene (meth) acrylate, methoxydiethylsilylmethylene (meth) acrylate, methoxydiethylsilyl Dimethylene (meth) acrylate, methoxydiethylsilyltrimethylene (meth) acrylate, ethoxydiethylsilylmethylene (Meth) acrylate, ethoxydiethylsilyldimethylene (meth) acrylate, ethoxydiethylsilyltrimethylene (meth) acrylate and the like can be mentioned. Of these, trimethoxysilyltrimethylene (meth) acrylate and triethoxysilyltrimethylene (meth) acrylate are preferable.

(Metal alkoxide)
In the present invention, the following formula (3)

(In the formula, M is tungsten, tin, indium, antimony, molybdenum, niobium, or hafnium; R ⁸ is an alkyl group having 1 to 10 carbon atoms; When M is tungsten, p is 6 or 5; when M is molybdenum or niobium, p is 5; when M is tin or hafnium, p is 4; In the case of antimony, p is 3.) A hydrolyzate of a metal alkoxide (hereinafter also simply referred to as “metal alkoxide”) is used. The metal alkoxide may be used alone or a mixture of the metal alkoxides.

  By using the hydrolyzate of the metal alkoxide, etching resistance to chlorine-based gas, oxygen-based gas, fluorine-based gas and the like can be improved, and a cured film having particularly excellent etching resistance to chlorine-based gas can be formed. . And the etching rate of chlorine gas can also be adjusted with the usage-amount of the hydrolyzate of a metal alkoxide.

  In the above formula (3), M is preferably tungsten in order to further improve the etching resistance against chlorine gas.

  Further, tungsten oxide alkoxides such as tungsten oxide alkoxide (IV) may be included within a range not impairing the effects of the present invention.

In the formula (3), R ⁸ is preferably an alkyl group having 1 to 4 carbon atoms from the viewpoint of an appropriate hydrolysis rate. The alkoxy group represented by -OR ⁸ also produces an alcohol derived from R ⁸ upon hydrolysis, like the organosilicon compound having the (meth) acryl group, but the photocurable nanoimprint composition of the present invention. May contain this alcohol. Therefore, considering that —OR ⁸ becomes an alcohol that can be easily mixed with other components, and that it becomes an alcohol that can be easily removed after forming a coating film on the substrate, specifically, R ⁸ is: An alkyl group having 1 to 4 carbon atoms such as a methyl group, an ethyl group, a propyl group, an isopropyl group, and a butyl group is preferable.

  Examples of suitable metal alkoxides include hexamethyl tungsten alkoxide, hexaethyl tungsten alkoxide, hexaisopropyl tungsten alkoxide, hexapropyl tungsten alkoxide, hexaisobutyl tungsten alkoxide, hexabutyl tungsten alkoxide, hexapentyl tungsten alkoxide, hexahexyl tungsten alkoxide, hexa Heptyl tungsten alkoxide, hexaoctyl tungsten alkoxide, hexanonyl tungsten alkoxide, hexadecyl tungsten alkoxide, pentamethyl tungsten alkoxide, pentaethyl tungsten alkoxide, pentaisopropyl tungsten alkoxide, pentapropyl tungsten alkoxide Pentapentyl tungsten alkoxide, pentabutyl tungsten alkoxide, pentapentyl tungsten alkoxide, pentahexyl tungsten alkoxide, pentaheptyl tungsten alkoxide, pentaoctyl tungsten alkoxide, pentanonyl tungsten alkoxide, pentadecyl tungsten alkoxide; pentamethyl molybdenum alkoxide, pentaethyl molybdenum Alkoxide, pentaisopropyl molybdenum alkoxide, pentapropyl molybdenum alkoxide, pentaisobutyl molybdenum alkoxide, pentabutyl molybdenum alkoxide, pentapentyl molybdenum alkoxide, pentahexyl molybdenum alkoxide, pentaheptyl molybdenum alkoxide, Taoctyl molybdenum alkoxide, pentanonyl molybdenum alkoxide, pentadecyl molybdenum alkoxide; pentamethyl niobium alkoxide, pentaethyl niobium alkoxide, pentaisopropyl niobium alkoxide, pentapropyl niobium alkoxide, pentaisobutyl niobium alkoxide, pentabutyl niobium alkoxide, pentapentyl niobium alkoxide, Pentahexyl niobium alkoxide, pentaheptyl niobium alkoxide, pentaoctyl niobium alkoxide, pentanonyl niobium alkoxide, pentadecyl niobium alkoxide; tetramethyltin alkoxide, tetraethyltin alkoxide, tetraisopropyltin alkoxide, tetrapropyltin alkoxide, tetraisobutyltin alkoxide Sid, tetrabutyltin alkoxide, tetrapentyltin alkoxide, tetraheptyltin alkoxide, tetrahexyltin alkoxide, tetraheptyltin alkoxide, tetraoctyltin alkoxide, tetranonyltin alkoxide, tetradecyltin alkoxide; tetramethylhafnium alkoxide, tetraethylhafnium alkoxide , Tetraisopropyl hafnium alkoxide, tetrapropyl hafnium alkoxide, tetraisobutyl hafnium alkoxide, tetrabutyl hafnium alkoxide, tetrapentyl hafnium alkoxide, tetraheptyl hafnium alkoxide, tetrahexyl hafnium alkoxide, tetraheptyl hafnium alkoxide, tetraoctyl hafnium alkoxy , Tetranonyl hafnium alkoxide, tetradecyl hafnium alkoxide; tetramethyl zirconium alkoxide, tetraethyl zirconium alkoxide, tetraisopropyl zirconium alkoxide, tetrapropyl zirconium alkoxide, tetraisobutyl zirconium alkoxide, tetrabutyl zirconium alkoxide, tetrapentyl zirconium alkoxide, tetraheptyl zirconium alkoxide, Tetrahexyl zirconium alkoxide, tetraheptyl zirconium alkoxide, tetraoctyl zirconium alkoxide, tetranonyl zirconium alkoxide, tetradecyl zirconium alkoxide; trimethylindium alkoxide, triethylindium alkoxide, triiso Propyl indium alkoxide, tripropyl indium alkoxide, triisobutyl indium alkoxide, tributyl indium alkoxide, tripentyl indium alkoxide, trihexyl indium alkoxide, triheptyl indium alkoxide, trioctyl indium alkoxide, trinonyl indium alkoxide, tridecyl indium alkoxide; trimethyl Antimony alkoxide, triethylantimony alkoxide, triisopropylantimony alkoxide, tripropylantimony alkoxide, triisobutylantimony alkoxide, tributylantimony alkoxide, tripentylantimony alkoxide, trihexylantimony alkoxide, triheptylantimony alcohol Examples thereof include xoxide, trioctyl antimony alkoxide, trinonyl antimony alkoxide, and tridecyl antimony alkoxide. Among these, pentaethyl tungsten alkoxide, pentaisopropyl tungsten alkoxide, pentapropyl tungsten alkoxide, pentaisobutyl tungsten alkoxide, and pentabutyl tungsten alkoxide are preferable.

(Organic silicon compound)
The hydrolysis mixture (A) is further represented by the following formula (4):

(In the formula, R ⁹ and R ¹⁰ are the same or different alkyl group having 1 to 4 carbon atoms or hydrogen; R ¹¹ is an aryl group, and R ¹² is an aryl group or an alkoxy group having 1 to 4 carbon atoms. And n is an integer of 1 to 10.) A hydrolyzate of an organosilicon compound (hereinafter, also simply referred to as “organosilicon compound”) can be further included. By using this organosilicon compound, etching resistance to fluorine, oxygen and chlorine can be improved, and in particular, etching resistance to chlorine-based gas can be effectively improved. In particular, the organosilicon compound has a structure having an aromatic ring as shown in Formula (4). In order to further improve the dispersibility of the photocurable nanoimprinting composition of the present invention, in the polymerizable monomer (B) described later, in combination with a (meth) acrylate having an aromatic ring and an organosilicon compound It is preferable to use it. Such a combination is preferable because etching resistance and transferability are further improved.

In the formula (4), R ⁹ and R ¹⁰ may be hydrogen, methyl group, ethyl group, propyl group, isopropyl group, butyl group, sec-butyl group, isobutyl group, or tert-butyl group. Group, ethyl group, propyl group, isopropyl group and butyl group are preferred. -OR ^9, an alkoxy group represented by ^{-OR 10} is ^-OR 9 upon hydrolysis, but produces an alcohol derived from ^{-OR 10,} photocurable composition for imprints of the invention, contain the alcohol Also good. Therefore, considering that alcohol can be easily mixed with other components, and alcohol that can be easily removed after forming a coating film on a substrate, specifically, R ⁹ and R ¹⁰ are methyl. It is preferably an alkyl group having 1 to 4 carbon atoms such as a group, an ethyl group, a propyl group, an isopropyl group, or a butyl group.

In R ¹¹ and R ¹² , the aryl group is preferably an aryl group having 6 to 20 carbon atoms, and examples thereof include a phenyl group, a biphenyl group, and a naphthyl group, and among them, a phenyl group is preferable.

R ¹² represents an alkoxy group such as methyl alkoxy group, ethyl alkoxy group, propyl alkoxy group, isopropyl alkoxy group, butyl alkoxy group, sec-butyl alkoxy group, isobutyl alkoxy group, tert-butyl alkoxy group and the like. Can do. As the alkoxy group, a methyl alkoxy group, an ethyl alkoxy group, a propyl alkoxy group, an isopropyl alkoxy group, and a butyl alkoxy group are particularly preferable. Alkoxy group represented by the R ¹² is to produce an alcohol derived from R ¹² at the time of hydrolysis, the photocurable composition for imprints of the invention may contain the alcohol. Therefore, considering that it becomes an alcohol that can be easily mixed with other components, and that it becomes an alcohol that can be easily removed after forming a coating film on the substrate, specifically, a methyl alkoxy group, an ethyl alkoxy group, An alkoxy group having 1 to 4 carbon atoms such as propylalkoxy group, isopropylalkoxy group, butylalkoxy group, sec-butylalkoxy group, isobutylalkoxy group, tert-butylalkoxy group and the like is preferable. The aryl group and alkoxy group may have a substituent such as an alkyl group, an ether group, a glycol ether group, a hydroxyl group, or a halogen.

Among these, R ¹¹ and R ¹² are preferably aryl groups having 6 to 20 carbon atoms from the viewpoint of forming a cured film having good etching resistance, particularly chlorine gas etching resistance.

  The organosilicon compound may be a single compound or a plurality of organosilicons having different values of n as long as n satisfies an integer of 1 to 10 in the formula (4). It may be a mixture of compounds. In the case of using a single compound, the value of n is preferably 1 or more and 7 or less in consideration of transferability of a pattern at a relatively low pressure and transfer of a fine pattern such as 100 nm or less. Further, when a mixture of a plurality of organosilicon compounds is used, the average value of n is preferably 1 or more and 10 or less, and further, the pattern transferability at a relatively lower pressure, 100 nm or less, etc. Considering the transfer of the fine pattern, it is more preferably 1 or more and 7 or less.

  Specific examples of these organosilicon compounds include phenyltrimethoxysilane, phenyltriethoxysilane, phenyltripropoxysilane, phenyltributoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, diphenyldipropoxysilane, diphenyldibutoxysilane. And polycondensates thereof. Among them, the alcohol produced during hydrolysis is an alcohol that can be easily removed after forming a coating film, and for reasons such as reactivity, phenyltrimethoxysilane, phenyltriethoxysilane, diphenyldimethoxysilane, diphenyldioxydioxide. Ethoxysilanes and their polycondensates are preferred.

(Production method of hydrolysis mixture (A))
In the present invention, the hydrolyzate (A) is obtained by, for example, adding the metal alkoxide to a hydrolyzed mixture containing the fluorinated organosilane compound and the organosilicon compound having the (meth) acryl group, And a hydrolyzed mixture containing the fluorinated organosilane compound, the organosilicon compound having the (meth) acrylic group, and the metal alkoxide. The hydrolyzate may contain a hydrolyzate of the organosilicon compound in addition to the hydrolyzate of the fluorinated organosilane compound, the organosilicon compound having the (meth) acrylic group, and the metal alkoxide.

  The photocurable nanoimprint composition of the present invention comprises a first mixture comprising a hydrolyzate obtained by hydrolyzing a mixture of the fluorinated organosilane compound, the (meth) acrylic organosilicon compound, and the metal alkoxide. And the first mixture may further include a second mixture further containing a hydrolyzate of the organosilicon compound.

  In addition, the aspect of the 2nd mixture containing the hydrolyzate of the said organosilicon compound in what hydrolyzed the mixture containing the said fluorinated organosilane compound, the said organosilicon compound which has the said (meth) acryl group, and the said metal alkoxide As, for example, a mixture of a hydrolyzed mixture of the fluorinated organosilane compound, the organosilicon compound having the (meth) acrylic group, and the metal alkoxide and a hydrolyzate of the organosilicon compound, A hydrolyzed mixture containing a fluorinated organosilane compound and an organosilicon compound having a (meth) acrylic group, a hydrolyzed mixture of the metal alkoxide and the organosilicon compound, or the fluorinated organic A mixture containing a silane compound, an organosilicon compound having a (meth) acrylic group, and the metal alkoxide. The organosilicon compound is mixed with the hydrolyzed product mixed with the organosilicon compound, or the mixture containing the fluorinated organosilane compound, the organosilicon compound having the (meth) acrylic group, and the metal alkoxide. Are mixed and hydrolyzed.

(Preferred blending amount when using the first mixture)
In the present invention, the fluorinated organosilane compound constituting the hydrolysis mixture (A), the organosilicon compound having a (meth) acrylic group, and the metal alkoxide achieve both adhesion to the substrate and releasability from the mold. In view of the above, the following blending amounts are preferable. That is, the hydrolysis mixture (A) has 0.001 to 4 parts by mass of a fluorinated organosilane compound and a (meth) acryl group with respect to 100 parts by mass of the polymerizable monomer (B) described in detail below. A hydrolyzed mixture (first mixture) containing 3 to 300 parts by mass of an organosilicon compound and 0.1 to 150 parts by mass of a metal alkoxide is preferable. All the alkoxy groups may be hydrolyzed by hydrolysis, or a part of the alkoxy group may be partially hydrolyzed. The amount of water used for the hydrolysis is not particularly limited, but considering the wettability of the coating film and better nanoimprint pattern transferability, it is 0.1 times the number of moles of all alkoxy groups in the mixture. It can be preferably selected from a mole of 2.0 or more and 2.0 moles or less.

  In the case of using the first mixture, when the blending amount of the fluorinated organosilane compound, the organosilicon compound having a (meth) acryl group, and the metal alkoxide satisfies the above range, the pattern can be easily transferred, It can be set as the composition for photocurable nanoimprint with the adhesiveness with the board | substrate of this pattern, and the mold release property with a favorable mold | type. Considering the adhesion of the pattern to the substrate and the releasability from the mold, the amount of the fluorinated organosilane compound used relative to 100 parts by mass of the polymerizable monomer (B) described in detail below is: It is more preferable that it is 0.01-3 mass parts, it is more preferable that the usage-amount of the organosilicon compound which has a (meth) acryl group is 5-250 mass parts, and the usage-amount of a metal alkoxide is 0.00. It is preferable that it is 5-100 mass parts. Furthermore, it is preferable that the usage-amount of a fluorinated organosilane compound is 0.03-2 mass parts, and the usage-amount of the organosilicon compound which has a (meth) acryl group is 10-200 mass parts. Preferably, the metal alkoxide is used in an amount of 1 to 80 parts by mass. In particular, the use amount of the fluorinated organosilane compound is preferably 0.05 to 1 part by mass, and the use amount of the organosilicon compound having a (meth) acryl group is particularly preferably 15 to 180 parts by mass. The amount of metal alkoxide used is particularly preferably 3 to 50 parts by mass.

  Moreover, it is preferable that a metal alkoxide is 0.2-50 mass parts with respect to 100 mass parts of organosilicon compounds which have a (meth) acryl group. By setting the amount of metal alkoxide used within the above range, the etching resistance due to the chlorine-based gas is particularly improved. Therefore, the usage-amount of a metal alkoxide becomes like this. More preferably, it is 1-40 mass parts, More preferably, it is 2-30 mass parts.

(Preferred blending amount when using the second mixture)
In the present invention, the hydrolysis mixture (A) can further contain a hydrolyzate of an organosilicon compound. By including the hydrolyzate of the organosilicon compound, the etching resistance, particularly the etching resistance against chlorine gas can be improved, and the nanoimprint pattern transferability at a lower pressure can be improved. The organosilicon compound is preferably blended in an amount of 10 to 400 parts by weight with respect to 100 parts by weight of the polymerizable monomer (B) described in detail below, and the hydrolysis mixture (A) is preferably adjusted. For example, a mixture containing the hydrolyzate of the fluorinated organosilane, the hydrolyzate of an organosilicon compound having a (meth) acryl group, and the hydrolyzate of a metal alkoxide is used as a polymerizable monomer (B) 100 parts by mass. In contrast, a mixture containing 10 to 400 parts by mass of an organosilicon compound may be used, and the mixture may be further hydrolyzed to obtain a hydrolysis mixture (A).

  All the alkoxy groups may be hydrolyzed by hydrolysis, or a part of the alkoxy group may be partially hydrolyzed. The amount of water used for the hydrolysis is not particularly limited, but considering the wettability of the coating film and better nanoimprint pattern transferability, it is 0.1 times the number of moles of all alkoxy groups in the mixture. It can be preferably selected from a mole of 2.0 or more and a mole of 2.0 or less.

  Even in the case of using the second mixture, when the blending amount of the fluorinated organosilane compound, the organosilicon compound having a (meth) acrylic group, the metal alkoxide, and the organosilicon compound satisfies the above range, the pattern can be transferred. The composition for photocurable nanoimprinting can be easily made and has good adhesion to the substrate of the pattern and good releasability from the mold. Furthermore, by using an organosilicon compound, the composition for photocurable nanoimprinting with good dispersibility of the hydrolysis mixture (A) can be obtained, and purification by filtration is easy and productivity can be improved. The nanoimprint pattern transferability can be improved.

  In consideration of the adhesion of the pattern to the substrate, the mold releasability from the mold, and the nanoimprint pattern transferability at a lower pressure, the fluorine is contained in 100 parts by mass of the polymerizable monomer (B) described in detail below. The amount of the organoorganosilane compound used is more preferably 0.01 to 3 parts by mass, and the amount of the organosilicon compound having a (meth) acryl group is more preferably 5 to 250 parts by mass, The use amount of the metal alkoxide is preferably 0.5 to 100 parts by mass, and the use amount of the organosilicon compound is more preferably 30 to 300 parts by mass. Furthermore, it is preferable that the usage-amount of a fluorinated organosilane compound is 0.03-2 mass parts, and the usage-amount of the organosilicon compound which has a (meth) acryl group is 10-200 mass parts. Preferably, the metal alkoxide is used in an amount of 1 to 80 parts by mass, and the organosilicon compound is preferably used in an amount of 50 to 250 parts by mass. In particular, the use amount of the fluorinated organosilane compound is preferably 0.05 to 1 part by mass, and the use amount of the organosilicon compound having a (meth) acryl group is particularly preferably 15 to 180 parts by mass. The amount of the metal alkoxide used is particularly preferably 3 to 50 parts by mass, and the amount of the organosilicon compound used is particularly preferably 80 to 200 parts by mass.

  Further, when the metal alkoxide contains a hydrolyzate of an organosilicon compound, the metal alkoxide is 0.2 to 50 with respect to 100 parts by mass in total of the organosilicon compound and the organosilicon compound having a (meth) acryl group. It is preferable that it is a mass part. By setting the amount of metal alkoxide used within the above range, the etching resistance due to the chlorine-based gas is particularly improved. Therefore, the usage-amount of a metal alkoxide becomes like this. More preferably, it is 1-40 mass parts, More preferably, it is 2-30 mass parts.

(Production method of hydrolysis mixture (A): water used for hydrolysis and its amount)
In the present invention, the amount of water used to obtain the hydrolysis mixture (A) is not particularly limited, but is an amount of 0.1 to 2.0 times the mole of the total number of alkoxide groups. It is preferable from the viewpoint of wettability of the coating film and better nanoimprint pattern transferability.

  The number of moles of all alkoxy groups means the product of the number of moles of the fluorinated organic silane compound used and the number of alkoxy groups present in one molecule of the fluorinated organic silane compound, and the organic having a (meth) acryl group. The product of the number of moles of silicon compound used and the number of alkoxy groups present in one molecule of the organosilicon compound having the (meth) acryl group, the number of moles of metal alkoxide used and the alkoxy present in one molecule of the metal alkoxide The product of the number of groups, and when an organosilicon compound is used, the product of the number of moles of the organosilicon compound used and the number of alkoxy groups present in one molecule of the organosilicon compound is added.

  When the amount of water is less than 0.1 times mol, the wettability to the substrate may be lowered although it is at a practical level when a coating film is formed. On the other hand, when the amount is 2.0 times or more, the nanoimprint pattern transferability at a relatively low pressure is lowered, which may cause damage to the mold. In consideration of the degree of condensation and pattern formation at a relatively low pressure, the amount of water is preferably 0.2 to 1.5 times the mole of the total number of alkoxide groups in the mixture, It is preferable that they are 0.5 times mole or more and 1.2 times mole or less.

  The water used to obtain the hydrolysis mixture (A) in the present invention slows down the hydrolysis reaction rate of the hydrolysis mixture in the resulting photocurable nanoimprinting composition. Water may be removed by vacuum drying, distillation, vacuum distillation, heating or the like in any step for obtaining the photocurable nanoimprint composition of the invention. At that time, in the case where the solvent is also removed at the same time, a necessary amount of the solvent may be appropriately added after the water removal.

  In the present invention, the water may contain an acid. Acids used include inorganic acids such as hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, polyphosphoric acid, organic phosphoric acid, formic acid, acetic acid, acetic anhydride, chloroacetic acid, propionic acid, butyric acid, valeric acid, citric acid, gluconic acid, Examples thereof include organic acids such as succinic acid, tartaric acid, lactic acid, fumaric acid, malic acid, itaconic acid, oxalic acid, mucinic acid, uric acid, barbituric acid, and p-toluenesulfonic acid, and acidic cation exchange resins. When an acid is used, it is not particularly limited, but the amount used is an amount such that the amount of hydrogen ions is 0.0001 times to 0.01 times mol relative to the number of moles of all alkoxy groups. It is preferable that The acid can be used as it is, but it is preferable to use an acid aqueous solution or a solution dispersed in water. In this case, it is preferable to use one having a concentration of 0.1 to 6N. In this case, the used water is included in the amount of water used.

  In the present invention, the hydrolysis mixture (A) includes components to be hydrolyzed (a fluorinated organic silane compound, an organosilicon compound having a (meth) acryl group, and a metal alkoxide (an organosilicon compound when an organosilicon compound is used). )) Is mixed with said amount of water. The method of mixing with water is not particularly limited, but in order to produce a uniform photocurable nanoimprint composition, it is preferable to mix the mixture of the components to be hydrolyzed with water. That is, it is preferable that the components to be hydrolyzed are first mixed to form a mixture, and then water is added to the mixture to perform hydrolysis.

  Moreover, what is necessary is just to implement mixing of the component to hydrolyze and water at the temperature of 5 to 60 degreeC. At this time, a diluting solvent may be used to facilitate the hydrolysis. As a dilution solvent, a C1-C4 alcohol is preferable and it is preferable to use ethanol especially. Although the usage-amount of a dilution solvent should just be suitably determined with the kind of component to hydrolyze, it is preferable that it is 50-400 mass parts with respect to 100 mass parts of mixtures of the component to hydrolyze.

(Production method of hydrolysis mixture (A): hydrolysis conditions)
In the present invention, the reaction temperature in the hydrolysis is not particularly limited, but is usually selected from the range of 5 ° C to 60 ° C. The reaction time may be appropriately selected in consideration of the reaction temperature, and is usually selected from the range of 10 minutes to 12 hours.

(Use method and physical properties of hydrolysis mixture (A))
According to said method, a hydrolysis mixture (A) can be prepared. An alcohol derived from an alkoxy group is produced during hydrolysis. The photocurable nanoimprinting composition of the present invention can also contain, in addition to the hydrolysis mixture (A), alcohol used as a by-product during hydrolysis and water used for hydrolysis. Furthermore, the diluent solvent used in order to advance a hydrolysis easily can also be included.

  The hydrolysis mixture (A) may have a viscosity at 25 ° C. of 0.1 to 100 mPa · sec in consideration of ease of mixing with other components, productivity of the photocurable nanoimprinting composition, and the like. preferable. This viscosity value is a value measured with a tuning fork viscometer: AND VIBRO VISCOMETER SV-1A. When used in a condition containing by-produced alcohol, water used, and dilution solvent used for dilution. Is a value obtained by measuring those including these.

  Moreover, it is preferable that a hydrolysis mixture (A) is mixed with another component immediately after manufacture, and it is set as the composition for photocurable nanoimprint. However, if this is not possible, it is preferably stored at a temperature of −30 ° C. to 15 ° C. or lower in order not to change with time after production. Also in this case, it is preferable that the viscosity of the hydrolysis mixture (A) satisfies the above range.

Next, the polymerizable monomer (B) having a (meth) acryl group used in combination with the hydrolysis mixture (A) obtained by the above method will be described.
(Polymerizable monomer having (meth) acrylic group (B))
In the present invention, the polymerizable monomer (B) having a (meth) acryl group (hereinafter, also simply referred to as “polymerizable monomer (B)”) is not particularly limited, and is used for photopolymerization. A known polymerizable monomer having a (meth) acryl group can be used. In addition, in the composition for photocurable nanoimprints of the present invention, in addition to the polymerizable monomer (B) having a (meth) acryl group, other than the (meth) acryl group, as long as the effects of the present invention are not impaired. A polymerizable monomer having a polymerizable functional group may be included. This polymerizable monomer (B) does not contain the (meth) acryl group-containing silicon compound represented by the formula (2). A preferable compound includes a polymerizable monomer having a (meth) acryl group and containing no silicon atom in the molecule. These polymerizable monomers (B) may be monofunctional polymerizable monomers having one (meth) acrylic group in one molecule, or two or more (meth) acrylic in one molecule. It may be a polyfunctional polymerizable monomer having a group. Furthermore, these monofunctional polymerizable monomers and polyfunctional polymerizable monomers can also be used in combination.

  If the example of a polymerizable monomer (B) is specifically illustrated, as a monofunctional polymerizable monomer which has one (meth) acryl group in 1 molecule, for example, methyl (meth) acrylate, ethyl (Meth) acrylate, propyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isodecyl (meth) acrylate, isoamyl (meth) ) Acrylate, isomyristyl (meth) acrylate, n-lauryl (meth) acrylate, n-stearyl (meth) acrylate, isostearyl (meth) acrylate, long chain alkyl (meth) acrylate, n-butoxyethyl (meth) acrylate, Butoxydiethylene glycol (meth) Chrylate, cyclohexyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, butoxyethyl (meth) acrylate, 2-ethylhexyl-diglycol (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentenyloxyethyl (meth) Acrylate, dicyclopentanyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, hydroxyethyl (meth) acrylamide, 2- (2- Vinyloxyethoxy) ethyl (meth) acrylate, glycidyl (meth) acrylate, methoxyethylene glycol modified (meth) acrylate, ethoxyethylene glycol modified (meth) acrylate Relate, propoxyethylene glycol modified (meth) acrylate, methoxypropylene glycol modified (meth) acrylate, ethoxypropylene glycol modified (meth) acrylate, propoxypropylene glycol modified (meth) acrylate, isobornyl (meth) acrylate, adamantane (meth) acrylate derivative Aliphatic acrylates such as acryloylmorpholine; benzyl (meth) acrylate, phenoxymethyl (meth) acrylate, phenoxyethyl (meth) acrylate, phenoxyethylene glycol modified (meth) acrylate, phenoxypropylene glycol modified (meth) acrylate, hydroxyphenoxyethyl (Meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate Hydro phenolate Kishikishi ethylene glycol-modified (meth) acrylate, hydroxyphenoxy propylene glycol-modified (meth) acrylate, alkyl phenol ethylene glycol-modified (meth) acrylate, alkyl phenol propylene glycol-modified (meth) acrylate, the following formula (6)

(Where
R ¹³ is a hydrogen atom or a methyl group,
R ¹⁴ is an alkylene group having 1 to 10 carbon atoms or a hydroxyalkylene group having 1 to 10 carbon atoms, and q is an integer of 1 to 6. And (meth) acrylate having an aromatic ring such as a monomer having an o-phenylphenol group in the molecule.

  As a polyfunctional polymerizable monomer (bifunctional polymerizable monomer) having two (meth) acryl groups in one molecule, for example, ethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, Polyolefin glycol di (meth) acrylate, ethoxylated polypropylene glycol di (meth) acrylate, 2-hydroxy-3-acryloyloxypropyl methacrylate, 2-hydroxy-1,3-dimethacryloxypropane, dioxane glycol di (meth) acrylate , Tricyclodecane dimethanol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, glycerin di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol di (Meth) acrylate, 1,10-decanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, 2-methyl-1,8-octanediol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, butyl Aliphatic di (meth) acrylates such as ethylpropanediol di (meth) acrylate and 3-methyl-1,5-pentanediol di (meth) acrylate; ethoxylated bisphenol A di (meth) acrylate, propoxylated ethoxylated bisphenol A Di (meth) acrylate, ethoxylated bisphenol F di (meth) acrylate, formula (7)

(Where
R ¹⁵ and R ¹⁶ are each independently a hydrogen atom or a methyl group,
R ¹⁷ and R ¹⁸ are an alkylene group having 1 to 10 carbon atoms, a hydroxyalkylene group having 1 to 10 carbon atoms, or a group represented by the following formula (8), and each of them is the same or different group. May be. )

(In the formula, R ¹⁹ and R ²⁰ are an ethylene group or a propylene group, and n is an integer of 1 to 3).

And di (meth) acrylate having an aromatic ring such as di (meth) acrylate having a fluorene structure represented by

  Furthermore, in this polyfunctional polymerizable monomer, as the polymerizable monomer having three or more (meth) acrylate groups in one molecule, ethoxylated glycerin tri (meth) acrylate, trimethylolpropane tri (meta) ) Acrylate, ethoxylated trimethylolpropane tri (meth) acrylate, propoxylated trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, Examples thereof include ethoxylated pentaerythritol tetra (meth) acrylate and dipentaerythritol polyacrylate.

  Among the polymerizable monomers (B), a monomer having a ο-phenylphenol group in the molecule and a monomer having a fluorene structure in the molecule from the point that the etching resistance of chlorine gas can be improved. Preferred is a (meth) acrylate having an o-phenylphenol group in the molecule as represented by the formula (6), and a (meth) acrylate having a fluorene structure as represented by the formula (7). A monofunctional polymerizable monomer or a polyfunctional polymerizable monomer may be used.

  In addition, the polymerizable monomer (B) may be used alone or in combination of a plurality of types depending on the intended use and the shape of the pattern to be formed.

  The (meth) acrylate having an o-phenylphenol group in the molecule represented by the formula (6) will be described.

  Following formula (6)

(Where
R ¹³ is a hydrogen atom or a methyl group,
R ¹⁴ is an alkylene group having 1 to 10 carbon atoms or a hydroxyalkylene group having 1 to 10 carbon atoms, and q is an integer of 1 to 6. )
In the formula, R ¹³ is a hydrogen atom or a methyl group. Among these, a hydrogen atom is preferable because the photocuring speed when curing the photocurable nanoimprinting composition is high.
R ¹⁴ is an alkylene group having 1 to 10 carbon atoms or a hydroxyalkylene group having 1 to 10 carbon atoms. Specifically, methylene group, ethylene group, propylene group, isopropylene group, butylene group, isobutylene group, sec-butylene group, tert-butylene group, 2,2-dimethylpropylene group, 2-methylbutylene group, 2- Methyl-2-butylene group, 3-methylbutylene group, 3-methyl-2-butylene group, pentylene group, 2-pentylene group, 3-pentylene group, 3-dimethyl-2-butylene group, 3,3-dimethylbutylene Group, 3,3-dimethyl-2-butylene group, 2-ethylbutylene group, hexylene group, 2-hexylene group, 3-hexylene group, 2-methylpentylene group, 2-methyl-2-pentylene group, 2- Methyl-3-pentylene group, 3-methylpentylene group, 3-methyl-2-pentylene group, 3-methyl-3-pentylene group, 4-methylpentylene Group, 4-methyl-2-pentylene group, 2,2-dimethyl-3-pentylene group, 2,3-dimethyl-3-pentylene group, 2,4-dimethyl-3-pentylene group, 4,4-dimethyl 2-pentylene group, 3-ethyl-3-pentylene group, heptylene group, 2-heptylene group, 3-heptylene group, 2-methyl-2-hexylene group, 2-methyl-3-hexylene group, 5-methylhexene Xylene group, 5-methyl-2-hexylene group, 2-ethylhexylene group, 6-methyl-2-heptylene group, 4-methyl-3-heptylene group, octylene group, 2-octylene group, 3-octylene group, Alkylene groups such as 2-propylpentylene group and 2,4,4-trimethylpentylene group; 1-hydroxyethylene group, 2-hydroxyethylene group, 1-hydroxypropylene group 2-hydroxypropylene group, 3-hydroxypropylene group, 1-hydroxyisopropylene group, 2-hydroxyisopropylene group, 3-hydroxyisopropylene group, 1-hydroxybutylene group, 2-hydroxybutylene group, 3-hydroxybutylene group 4-hydroxybutylene group, 1-hydroxyisobutylene group, 2-hydroxyisobutylene group, 3-hydroxyisobutylene group, 1-hydroxysec-butylene group, 2-hydroxysec-butylene group, 3-hydroxysec-butylene group, 4 -Hydroxy sec-butylene group, 1-hydroxy-2,2-dimethylpropylene group, 3-hydroxy-2,2-dimethylpropylene group, 1-hydroxy-2-methylbutylene group, 2-hydroxy-2-methylbutylene group , 3-hydroxy- 2-methylbutylene group, 4-hydroxy-2-methylbutylene group, 1-hydroxy-2-methyl-2-butylene group, 3-hydroxy-2-methyl-2-butylene group, 4-hydroxy-2-methyl-2-butylene Group, 1-hydroxy-3-methylbutylene group, 2-hydroxy-3-methylbutylene group, 3-hydroxy-3-methylbutylene group, 4-hydroxy-3-methylbutylene group, 1-hydroxy-3-methyl- 2-butylene group, 2-hydroxy-3-methyl-2-butylene group, 3-hydroxy-3-methyl-2-butylene group, 4-hydroxy-3-methyl-2-butylene group, 1-hydroxypentylene group 2-hydroxypentylene group, 3-hydroxypentylene group, 4-hydroxypentylene group, 5-hydroxypentylene group, 1-hydroxy 2-pentylene group, 2-hydroxy-2-pentylene group, 3-hydroxy-2-pentylene group, 4-hydroxy-2-pentylene group, 5-hydroxy-2-pentylene group, 1-hydroxy-3-pentylene group 2-hydroxy-3-pentylene group, 3-hydroxy-3-pentylene group, 4-hydroxy-3-pentylene group, 5-hydroxy-3-pentylene group, 1-hydroxy-3-dimethyl-2-butylene group, 2-hydroxy-3-dimethyl-2-butylene group, 3-hydroxy-3-dimethyl-2-butylene group, 4-hydroxy-3-dimethyl-2-butylene group, 1-hydroxy-3,3-dimethylbutylene group 2-hydroxy-3,3-dimethylbutylene group, 4-hydroxy-3,3-dimethylbutylene group, 1-hydroxy-3,3 Dimethyl-2-butylene group, 2-hydroxy-3,3-dimethyl-2-butylene group, 4-hydroxy-3,3-dimethyl-2-butylene group, 1-hydroxy-2-ethylbutylene group, 2-hydroxy 2-ethylbutylene group, 3-hydroxy-2-ethylbutylene group, 4-hydroxy-2-ethylbutylene group, 1-hydroxy-hexylene group, 2-hydroxy-hexylene group, 3-hydroxy-hexylene group, 4- Hydroxy-hexylene group, 5-hydroxy-hexylene group, 6-hydroxy-hexylene group, 1-hydroxy-2-hexylene group, 2-hydroxy-2-hexylene group, 3-hydroxy-2-hexylene group, 4-hydroxy- 2-hexylene group, 5-hydroxy-2-hexylene group, 6-hydroxy-2-hexylene group, 1- Hydroxy-3-hexylene group, 2-hydroxy-3-hexylene group, 3-hydroxy-3-hexylene group, 4-hydroxy-3-hexylene group, 5-hydroxy-3-hexylene group, 6-hydroxy-3-hexylene Group, 1-hydroxy-2-methylpentylene group, 2-hydroxy-2-methylpentylene group, 3-hydroxy-2-methylpentylene group, 4-hydroxy-2-methylpentylene group, 5-hydroxy- 2-methylpentylene group, 1-hydroxy-2-methyl-2-pentylene group, 2-hydroxy-2-methyl-2-pentylene group, 3-hydroxy-2-methyl-2-pentylene group, 4-hydroxy- 2-methyl-2-pentylene group, 5-hydroxy-2-methyl-2-pentylene group, 1-hydroxy-2-methyl-3-pen Len group, 2-hydroxy-2-methyl-3-pentylene group, 3-hydroxy-2-methyl-3-pentylene group, 4-hydroxy-2-methyl-3-pentylene group, 5-hydroxy-2-methyl- 3-pentylene group, 1-hydroxy-3-methylpentylene group, 2-hydroxy-3-methylpentylene group, 3-hydroxy-3-methylpentylene group, 4-hydroxy-3-methylpentylene group, 5 -Hydroxy-3-methylpentylene group, 1-hydroxy-3-methyl-2-pentylene group, 2-hydroxy-3-methyl-2-pentylene group, 3-hydroxy-3-methyl-2-pentylene group, 4 -Hydroxy-3-methyl-2-pentylene group, 5-hydroxy-3-methyl-2-pentylene group, 1-hydroxy-3-methyl-3-pentylene 2-hydroxy-3-methyl-3-pentylene group, 3-hydroxy-3-methyl-3-pentylene group, 4-hydroxy-3-methyl-3-pentylene group, 5-hydroxy-3-methyl-3- Pentylene group, 1-hydroxy-4-methylpentylene group, 2-hydroxy-4-methylpentylene group, 3-hydroxy-4-methylpentylene group, 4-hydroxy-4-methylpentylene group, 5-hydroxy -4-methylpentylene group, 1-hydroxy-4-methyl-2-pentylene group, 2-hydroxy-4-methyl-2-pentylene group, 3-hydroxy-4-methyl-2-pentylene group, 4-hydroxy -4-methyl-2-pentylene group, 5-hydroxy-4-methyl-2-pentylene group, 1-hydroxy-2,2-dimethyl-3-pentylene group 3-hydroxy-2,2-dimethyl-3-pentylene group, 4-hydroxy-2,2-dimethyl-3-pentylene group, 5-hydroxy-2,2-dimethyl-3-pentylene group, 1-hydroxy- 2,3-dimethyl-3-pentylene group, 2-hydroxy-2,3-dimethyl-3-pentylene group, 4-hydroxy-2,3-dimethyl-3-pentylene group, 5-hydroxy-2,3-dimethyl -3-pentylene group, 1-hydroxy-2,4-dimethyl-3-pentylene group, 2-hydroxy-2,4-dimethyl-3-pentylene group, 3-hydroxy-2,4-dimethyl-3-pentylene group 4-hydroxy-2,4-dimethyl-3-pentylene group, 5-hydroxy-2,4-dimethyl-3-pentylene group, 1-hydroxy-4,4-dimethyl-2-pe Tylene group, 2-hydroxy-4,4-dimethyl-2-pentylene group, 3-hydroxy-4,4-dimethyl-2-pentylene group, 5-hydroxy-4,4-dimethyl-2-pentylene group, 1- Hydroxy-3-ethyl-3-pentylene group, 2-hydroxy-3-ethyl-3-pentylene group, 4-hydroxy-3-ethyl-3-pentylene group, 5-hydroxy-3-ethyl-3-pentylene group, 1-hydroxyheptylene group, 2-hydroxyheptylene group, 3-hydroxyheptylene group, 4-hydroxyheptylene group, 5-hydroxyheptylene group, 6-hydroxyheptylene group, 7- Hydroxyheptylene group, 1-hydroxy-2-heptylene group, 2-hydroxy-2-heptylene group, 3-hydroxy-2-heptylene group, 4-hydroxy- -Heptylene group, 5-hydroxy-2-heptylene group, 6-hydroxy-2-heptylene group, 7-hydroxy-2-heptylene group, 1-hydroxy-3-heptylene group, 2-hydroxy-3-heptylene group, 3 -Hydroxy-3-heptylene group, 4-hydroxy-3-heptylene group, 5-hydroxy-3-heptylene group, 6-hydroxy-3-heptylene group, 7-hydroxy-3-heptylene group, 1-hydroxy-2- Methyl-2-hexylene group, 3-hydroxy-2-methyl-2-hexylene group, 4-hydroxy-2-methyl-2-hexylene group, 5-hydroxy-2-methyl-2-hexylene group, 6-hydroxy- 2-methyl-2-hexylene group, 1-hydroxy-2-methyl-3-hexylene group, 2-hydroxy-2-methyl-3-he Xylene group, 3-hydroxy-2-methyl-3-hexylene group, 4-hydroxy-2-methyl-3-hexylene group, 5-hydroxy-2-methyl-3-hexylene group, 6-hydroxy-2-methyl- 3-hexylene group, 1-hydroxy-5-methylhexylene group, 2-hydroxy-5-methylhexylene group, 3-hydroxy-5-methylhexylene group, 4-hydroxy-5-methylhexylene group, 5 -Hydroxy-5-methylhexylene group, 6-hydroxy-5-methylhexylene group, 1-hydroxy-5-methyl-2-hexylene group, 2-hydroxy-5-methyl-2-hexylene group, 3-hydroxy -5-methyl-2-hexylene group, 4-hydroxy-5-methyl-2-hexylene group, 5-hydroxy-5-methyl-2-hexylene group, -Hydroxy-5-methyl-2-hexylene group, 1-hydroxy-2-ethylhexylene group, 2-hydroxy-2-ethylhexylene group, 3-hydroxy-2-ethylhexylene group, 4-hydroxy-2 -Ethylhexylene group, 5-hydroxy-2-ethylhexylene group, 6-hydroxy-2-ethylhexylene group, 1-hydroxy-6-methyl-2-heptylene group, 2-hydroxy-6-methyl-2 -Heptylene group, 3-hydroxy-6-methyl-2-heptylene group, 4-hydroxy-6-methyl-2-heptylene group, 5-hydroxy-6-methyl-2-heptylene group, 6-hydroxy-6-methyl 2-heptylene group, 7-hydroxy-6-methyl-2-heptylene group, 1-hydroxy-4-methyl-3-heptylene group, 2-hydroxyl -4-methyl-3-heptylene group, 3-hydroxy-4-methyl-3-heptylene group, 4-hydroxy-4-methyl-3-heptylene group, 5-hydroxy-4-methyl-3-heptylene group, 6 -Hydroxy-4-methyl-3-heptylene group, 1-hydroxyoctylene group, 2-hydroxyoctylene group, 3-hydroxyoctylene group, 4-hydroxyoctylene group, 5-hydroxyoctylene group, 6-hydroxy Octylene group, 7-hydroxyoctylene group, 8-hydroxyoctylene group, 1-hydroxy-2-octylene group, 2-hydroxy-2-octylene group, 3-hydroxy-2-octylene group, 4-hydroxy-2 -Octylene group, 5-hydroxy-2-octylene group, 6-hydroxy-2-octylene group, 7-hydroxy-2-o Cutylene group, 8-hydroxy-2-octylene group, 1-hydroxy-3-octylene group, 2-hydroxy-3-octylene group, 3-hydroxy-3-octylene group, 4-hydroxy-3-octylene group, 5- Hydroxy-3-octylene group, 6-hydroxy-3-octylene group, 7-hydroxy-3-octylene group, 8-hydroxy-3-octylene group, 1-hydroxy-2-propylpentylene group, 2-hydroxy-2 -Propylpentylene group, 3-hydroxy-2-propylpentylene group, 4-hydroxy-2-propylpentylene group, 5-hydroxy-2-propylpentylene group, 1-hydroxy-2,4,4-trimethyl Pentylene group, 2-hydroxy-2,4,4-trimethylpentylene group, 3-hydroxy-2,4,4-trime Rupenchiren groups include hydroxy alkylene groups such as 5-hydroxy-2,4,4-trimethyl pentylene group.

  Among these, an alkylene group having 1 to 4 carbon atoms such as a methylene group, an ethylene group, a propylene group, an isopropylene group, and a butylene group, or a 1-hydroxymethylene group, a 2-hydroxymethylene group, a 1-hydroxypropylene group, 2- Hydroxypropylene group, 3-hydroxypropylene group, 1-hydroxyisopropylene group, 2-hydroxyisopropylene group, 3-hydroxyisopropylene group, 1-hydroxybutylene group, 2-hydroxybutylene group, 3-hydroxybutylene group, 4 A hydroxyalkylene group having 1 to 4 carbon atoms such as a hydroxybutylene group is preferred.

  Examples of the (meth) acrylate having a ο-phenylphenol group in the molecule represented by the formula (6) include, for example, 3-ο-phenylphenolmethyl (meth) acrylate, 3-ο-phenylphenolethyl (meth) acrylate, 3 -Ο-phenylphenol propyl (meth) acrylate, 3-ο-phenylphenol butyl (meth) acrylate, 3-ο-phenylphenol diethoxy (meth) acrylate, 3-ο-phenylphenol triethoxy (meth) acrylate, 3 -Ο-phenylphenol tetraethoxy (meth) acrylate, 2-hydroxy-3-ο-phenylphenolpropyl (meth) acrylate, 2-hydroxy-3-ο-phenylphenolbutyl (meth) acrylate, 3-hydroxy-3- ο-Phenylpheno And rupropyl (meth) acrylate.

  The di (meth) acrylate having a fluorene structure in the molecule represented by the formula (7) will be described.

  Following formula (7)

(Where
R ¹⁵ and R ¹⁶ are each independently a hydrogen atom or a methyl group,
R ¹⁷ and R ¹⁸ are an alkylene group having 1 to 10 carbon atoms, a hydroxyalkylene group having 1 to 10 carbon atoms, and a group represented by the following formula (8), and may be the same or different groups, respectively. Good. )

(In the formula, R ¹⁹ and R ²⁰ are an ethylene group or a propylene group, and n is an integer of 1 to 3).
In the formula, R ¹⁵ and R ¹⁶ are each independently a hydrogen atom or a methyl group. Among these, a hydrogen atom is preferable because the photocuring speed when curing the photocurable nanoimprinting composition is high.

R ¹⁷ and R ¹⁸ are an alkylene group having 1 to 10 carbon atoms, a hydroxyalkylene group having 1 to 10 carbon atoms, or a group represented by the formula (8). Specifically, methylene group, ethylene group, propylene group, isopropylene group, butylene group, isobutylene group, sec-butylene group, tert-butylene group, 2,2-dimethylpropylene group, 2-methylbutylene group, 2- Methyl-2-butylene group, 3-methylbutylene group, 3-methyl-2-butylene group, pentylene group, 2-pentylene group, 3-pentylene group, 3-dimethyl-2-butylene group, 3,3-dimethylbutylene Group, 3,3-dimethyl-2-butylene group, 2-ethylbutylene group, hexylene group, 2-hexylene group, 3-hexylene group, 2-methylpentylene group, 2-methyl-2-pentylene group, 2- Methyl-3-pentylene group, 3-methylpentylene group, 3-methyl-2-pentylene group, 3-methyl-3-pentylene group, 4-methylpentylene Group, 4-methyl-2-pentylene group, 2,2-dimethyl-3-pentylene group, 2,3-dimethyl-3-pentylene group, 2,4-dimethyl-3-pentylene group, 4,4-dimethyl 2-pentylene group, 3-ethyl-3-pentylene group, heptylene group, 2-heptylene group, 3-heptylene group, 2-methyl-2-hexylene group, 2-methyl-3-hexylene group, 5-methylhexene Xylene group, 5-methyl-2-hexylene group, 2-ethylhexylene group, 6-methyl-2-heptylene group, 4-methyl-3-heptylene group, octylene group, 2-octylene group, 3-octylene group, Alkylene groups such as 2-propylpentylene, 2,4,4-trimethylpentylene; trimethylene, tetramethylene, pentamethylene, hexamethylene, heptam Alkylene group such as len group, octamethylene group, nonamethylene group, decamethylene group, 1-hydroxyethylene group, 2-hydroxyethylene group, 1-hydroxypropylene group, 2-hydroxypropylene group, 3-hydroxypropylene group, 1-hydroxy Isopropylene group, 2-hydroxyisopropylene group, 3-hydroxyisopropylene group, 1-hydroxybutylene group, 2-hydroxybutylene group, 3-hydroxybutylene group, 4-hydroxybutylene group, 1-hydroxyisobutylene group, 2- Hydroxyisobutylene group, 3-hydroxyisobutylene group, 1-hydroxysec-butylene group, 2-hydroxysec-butylene group, 3-hydroxysec-butylene group, 4-hydroxysec-butylene group, 1-hydroxy-2,2- Zimechi Rupropylene group, 3-hydroxy-2,2-dimethylpropylene group, 1-hydroxy-2-methylbutylene group, 2-hydroxy-2-methylbutylene group, 3-hydroxy-2-methylbutylene group, 4-hydroxy- 2-methylbutylene group, 1-hydroxy 2-methyl-2-butylene group, 3-hydroxy 2-methyl-2-butylene group, 4-hydroxy 2-methyl-2-butylene group, 1-hydroxy-3-methylbutylene Group, 2-hydroxy-3-methylbutylene group, 3-hydroxy-3-methylbutylene group, 4-hydroxy-3-methylbutylene group, 1-hydroxy-3-methyl-2-butylene group, 2-hydroxy-3 -Methyl-2-butylene group, 3-hydroxy-3-methyl-2-butylene group, 4-hydroxy-3-methyl-2-butylene group 1-hydroxypentylene group, 2-hydroxypentylene group, 3-hydroxypentylene group, 4-hydroxypentylene group, 5-hydroxypentylene group, 1-hydroxy-2-pentylene group, 2-hydroxy-2- Pentylene group, 3-hydroxy-2-pentylene group, 4-hydroxy-2-pentylene group, 5-hydroxy-2-pentylene group, 1-hydroxy-3-pentylene group, 2-hydroxy-3-pentylene group, 3- Hydroxy-3-pentylene group, 4-hydroxy-3-pentylene group, 5-hydroxy-3-pentylene group, 1-hydroxy-3-dimethyl-2-butylene group, 2-hydroxy-3-dimethyl-2-butylene group 3-hydroxy-3-dimethyl-2-butylene group, 4-hydroxy-3-dimethyl-2-butylene group, -Hydroxy-3,3-dimethylbutylene group, 2-hydroxy-3,3-dimethylbutylene group, 4-hydroxy-3,3-dimethylbutylene group, 1-hydroxy-3,3-dimethyl-2-butylene group, 2-hydroxy-3,3-dimethyl-2-butylene group, 4-hydroxy-3,3-dimethyl-2-butylene group, 1-hydroxy-2-ethylbutylene group, 2-hydroxy-2-ethylbutylene group, 3-hydroxy-2-ethylbutylene group, 4-hydroxy-2-ethylbutylene group, 1-hydroxy-hexylene group, 2-hydroxy-hexylene group, 3-hydroxy-hexylene group, 4-hydroxy-hexylene group, 5- Hydroxy-hexylene group, 6-hydroxy-hexylene group, 1-hydroxy-2-hexylene group, 2-hydroxy-2- Hexylene group, 3-hydroxy-2-hexylene group, 4-hydroxy-2-hexylene group, 5-hydroxy-2-hexylene group, 6-hydroxy-2-hexylene group, 1-hydroxy-3-hexylene group, 2- Hydroxy-3-hexylene group, 3-hydroxy-3-hexylene group, 4-hydroxy-3-hexylene group, 5-hydroxy-3-hexylene group, 6-hydroxy-3-hexylene group, 1-hydroxy-2-methyl Pentylene group, 2-hydroxy-2-methylpentylene group, 3-hydroxy-2-methylpentylene group, 4-hydroxy-2-methylpentylene group, 5-hydroxy-2-methylpentylene group, 1- Hydroxy-2-methyl-2-pentylene group, 2-hydroxy-2-methyl-2-pentylene group, 3-hydroxy-2- Tyl-2-pentylene group, 4-hydroxy-2-methyl-2-pentylene group, 5-hydroxy-2-methyl-2-pentylene group, 1-hydroxy-2-methyl-3-pentylene group, 2-hydroxy- 2-methyl-3-pentylene group, 3-hydroxy-2-methyl-3-pentylene group, 4-hydroxy-2-methyl-3-pentylene group, 5-hydroxy-2-methyl-3-pentylene group, 1- Hydroxy-3-methylpentylene group, 2-hydroxy-3-methylpentylene group, 3-hydroxy-3-methylpentylene group, 4-hydroxy-3-methylpentylene group, 5-hydroxy-3-methylpentylene Len group, 1-hydroxy-3-methyl-2-pentylene group, 2-hydroxy-3-methyl-2-pentylene group, 3-hydroxy-3-methyl 2-pentylene group, 4-hydroxy-3-methyl-2-pentylene group, 5-hydroxy-3-methyl-2-pentylene group, 1-hydroxy-3-methyl-3-pentylene group, 2-hydroxy-3- Methyl-3-pentylene group, 3-hydroxy-3-methyl-3-pentylene group, 4-hydroxy-3-methyl-3-pentylene group, 5-hydroxy-3-methyl-3-pentylene group, 1-hydroxy- 4-methylpentylene group, 2-hydroxy-4-methylpentylene group, 3-hydroxy-4-methylpentylene group, 4-hydroxy-4-methylpentylene group, 5-hydroxy-4-methylpentylene group 1-hydroxy-4-methyl-2-pentylene group, 2-hydroxy-4-methyl-2-pentylene group, 3-hydroxy-4-methyl-2-pe N-tylene group, 4-hydroxy-4-methyl-2-pentylene group, 5-hydroxy-4-methyl-2-pentylene group, 1-hydroxy-2,2-dimethyl-3-pentylene group, 3-hydroxy-2, 2-dimethyl-3-pentylene group, 4-hydroxy-2,2-dimethyl-3-pentylene group, 5-hydroxy-2,2-dimethyl-3-pentylene group, 1-hydroxy-2,3-dimethyl-3 -Pentylene group, 2-hydroxy-2,3-dimethyl-3-pentylene group, 4-hydroxy-2,3-dimethyl-3-pentylene group, 5-hydroxy-2,3-dimethyl-3-pentylene group, 1 -Hydroxy-2,4-dimethyl-3-pentylene group, 2-hydroxy-2,4-dimethyl-3-pentylene group, 3-hydroxy-2,4-dimethyl-3-pen Len group, 4-hydroxy-2,4-dimethyl-3-pentylene group, 5-hydroxy-2,4-dimethyl-3-pentylene group, 1-hydroxy-4,4-dimethyl-2-pentylene group, 2- Hydroxy-4,4-dimethyl-2-pentylene group, 3-hydroxy-4,4-dimethyl-2-pentylene group, 5-hydroxy-4,4-dimethyl-2-pentylene group, 1-hydroxy-3-ethyl -3-pentylene group, 2-hydroxy-3-ethyl-3-pentylene group, 4-hydroxy-3-ethyl-3-pentylene group, 5-hydroxy-3-ethyl-3-pentylene group, 1-hydroxyheptyl Len group, 2-hydroxyheptylene group, 3-hydroxyheptylene group, 4-hydroxyheptylene group, 5-hydroxyheptylene group, 6-hydroxyheptylene group Group, 7-hydroxyheptylene group, 1-hydroxy-2-heptylene group, 2-hydroxy-2-heptylene group, 3-hydroxy-2-heptylene group, 4-hydroxy-2-heptylene group, 5-hydroxy 2-heptylene group, 6-hydroxy-2-heptylene group, 7-hydroxy-2-heptylene group, 1-hydroxy-3-heptylene group, 2-hydroxy-3-heptylene group, 3-hydroxy-3-heptylene group 4-hydroxy-3-heptylene group, 5-hydroxy-3-heptylene group, 6-hydroxy-3-heptylene group, 7-hydroxy-3-heptylene group, 1-hydroxy-2-methyl-2-hexylene group, 3-hydroxy-2-methyl-2-hexylene group, 4-hydroxy-2-methyl-2-hexylene group, 5-hydroxy-2 -Methyl-2-hexylene group, 6-hydroxy-2-methyl-2-hexylene group, 1-hydroxy-2-methyl-3-hexylene group, 2-hydroxy-2-methyl-3-hexylene group, 3-hydroxy 2-methyl-3-hexylene group, 4-hydroxy-2-methyl-3-hexylene group, 5-hydroxy-2-methyl-3-hexylene group, 6-hydroxy-2-methyl-3-hexylene group, 1 -Hydroxy-5-methylhexylene group, 2-hydroxy-5-methylhexylene group, 3-hydroxy-5-methylhexylene group, 4-hydroxy-5-methylhexylene group, 5-hydroxy-5-methyl Hexylene group, 6-hydroxy-5-methylhexylene group, 1-hydroxy-5-methyl-2-hexylene group, 2-hydroxy-5-methyl-2 Hexylene group, 3-hydroxy-5-methyl-2-hexylene group, 4-hydroxy-5-methyl-2-hexylene group, 5-hydroxy-5-methyl-2-hexylene group, 6-hydroxy-5-methyl- 2-hexylene group, 1-hydroxy-2-ethylhexylene group, 2-hydroxy-2-ethylhexylene group, 3-hydroxy-2-ethylhexylene group, 4-hydroxy-2-ethylhexylene group, 5 -Hydroxy-2-ethylhexylene group, 6-hydroxy-2-ethylhexylene group, 1-hydroxy-6-methyl-2-heptylene group, 2-hydroxy-6-methyl-2-heptylene group, 3-hydroxy -6-methyl-2-heptylene group, 4-hydroxy-6-methyl-2-heptylene group, 5-hydroxy-6-methyl-2-heptylene 6-hydroxy-6-methyl-2-heptylene group, 7-hydroxy-6-methyl-2-heptylene group, 1-hydroxy-4-methyl-3-heptylene group, 2-hydroxy-4-methyl-3- Heptylene group, 3-hydroxy-4-methyl-3-heptylene group, 4-hydroxy-4-methyl-3-heptylene group, 5-hydroxy-4-methyl-3-heptylene group, 6-hydroxy-4-methyl- 3-heptylene group, 1-hydroxyoctylene group, 2-hydroxyoctylene group, 3-hydroxyoctylene group, 4-hydroxyoctylene group, 5-hydroxyoctylene group, 6-hydroxyoctylene group, 7-hydroxy Octylene group, 8-hydroxyoctylene group, 1-hydroxy-2-octylene group, 2-hydroxy-2-octylene group, 3- Hydroxy-2-octylene group, 4-hydroxy-2-octylene group, 5-hydroxy-2-octylene group,
6-hydroxy-2-octylene group, 7-hydroxy-2-octylene group, 8-hydroxy-2-octylene group, 1-hydroxy-3-octylene group, 2-hydroxy-3-octylene group, 3-hydroxy-3 -Octylene group, 4-hydroxy-3-octylene group, 5-hydroxy-3-octylene group, 6-hydroxy-3-octylene group, 7-hydroxy-3-octylene group, 8-hydroxy-3-octylene group, 1 -Hydroxy-2-propylpentylene group, 2-hydroxy-2-propylpentylene group, 3-hydroxy-2-propylpentylene group, 4-hydroxy-2-propylpentylene group, 5-hydroxy-2-propyl Pentylene group, 1-hydroxy-2,4,4-trimethylpentylene group, 2-hydroxy-2,4,4-to Methyl pentylene group, 3-hydroxy-2,4,4-trimethyl pentylene group, and a hydroxyalkylene group such as 5-hydroxy-2,4,4-trimethyl pentylene group.

Among these, an alkylene group having 1 to 4 carbon atoms such as methylene group, ethylene group, propylene group, isopropylene group, butylene group, 1-hydroxyethylene group, 2-hydroxyethylene group, 1-hydroxypropylene group, 2 -Hydroxypropylene group, 3-hydroxypropylene group, 1-hydroxyisopropylene group, 2-hydroxyisopropylene group, 3-hydroxyisopropylene group, 1-hydroxybutylene group, 2-hydroxybutylene group, 3-hydroxybutylene group, A hydroxyalkylene group having 1 to 4 carbon atoms such as 4-hydroxybutylene group and 1-hydroxyisobutylene group, or a group of formula (8), wherein R ¹⁹ and R ²⁰ are ethylene groups, and n is 1 to 2 or R ¹⁹ and R ²⁰ are propylene groups, and n is preferably 1 or 2 groups. Good.

  Examples of the di (meth) acrylate having a fluorene structure in the molecule represented by the formula (7) include 9,9-bis [4- (2- (meth) acryloyloxymethoxy) phenyl] fluorene, 9,9-bis. [4- (2- (meth) acryloyloxyethoxy) phenyl] fluorene, 9,9-bis [4- (2- (meth) acryloyloxypropyloxy) phenyl] fluorene, 9,9-bis [4- (2 -(Meth) acryloyloxyisopropyloxy) phenyl] fluorene, 9,9-bis [4- (2- (meth) acryloyloxybutyloxy) phenyl] fluorene, 9,9-bis [4- (2- (meth)) Acryloyloxyhydroxyethylethoxy) phenyl] fluorene, 9,9-bis [4- (2- (meth) acryloyloxy) Roxypropyloxy) phenyl] fluorene, 9,9-bis [4- (2- (meth) acryloyloxyhydroxyisopropyloxy) phenyl] fluorene, 9,9-bis [4- (2- (meth) acryloyloxyhydroxybutyl) Oxy) phenyl] fluorene, 9,9-bis [4- (2- (meth) acryloyloxyethyleneglycoxy) phenyl] fluorene, 9,9-bis [4- (2- (meth) acryloyloxypropyleneglycoxy) Phenyl] fluorene and the like.

  Next, the photopolymerization initiator (C) will be described.

(Photopolymerization initiator (C))
In the present invention, the photopolymerization initiator (C) is not particularly limited, and any photopolymerization initiator can be used as long as it can photopolymerize the polymerizable monomer (B).

  Specific examples of the photopolymerization initiator include 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropane-1- ON, 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1- {4- [4- (2-hydroxy- 2-methylpropionyl) -benzyl] -phenyl} -2-methyl-propan-1-one, phenylglyoxylic acid methyl ester, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane -1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1,2-dimethylamino-2- (4-methylben) Acetophenone derivatives such as (zyl) -1- (4-morpholin-4-yl-phenyl) butan-1-one; 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,6-dimethoxybenzoyldiphenylphosphine oxide, 2, 6-dichlorobenzoyldiphenylphosphine oxide, 2,6-trimethylbenzoylphenylphosphinic acid methyl ester, 2-methylbenzoyldiphenylphosphine oxide, pivaloylphenylphosphinic acid isopropyl ester, bis- (2,6-dichlorobenzoyl) phenylphosphine oxide Bis- (2,6-dichlorobenzoyl) -2,5-dimethylphenylphosphine oxide, bis- (2,6-dichlorobenzoyl) -4-propylphenylphosphine oxide, bis (2,6-dichlorobenzoyl) -1-naphthylphosphine oxide, bis- (2,6-dimethoxybenzoyl) phenylphosphine oxide, bis- (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentylphosphine oxide Bis- (2,6-dimethoxybenzoyl) -2,5-dimethylphenylphosphine oxide, bis- (2,4,6-trimethylbenzoyl) phenylphosphine oxide, bis- (2,5,6-trimethylbenzoyl)- Acylphosphine oxide derivatives such as 2,4,4-trimethylpentylphosphine oxide; 1,2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)], ethanone, 1- [9 -Ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, O-acyloxime derivatives such as 1- (O-acetyloxime); diacetyl, acetylbenzoyl, benzyl, 2,3-pentadione, 2,3-octadione, 4,4′-dimethoxybenzyl, 4,4′-oxybenzyl Α-diketones such as camphorquinone, 9,10-phenanthrenequinone, and acenaphthenequinone; benzoin alkyl ethers such as benzoin methyl ether, benzoin ethyl ether, and benzoin propyl ether; 2,4-diethoxythioxanthone, 2 -Thioxanthone derivatives such as chlorothioxanthone and methylthioxanthone; benzophenone derivatives such as benzophenone, p, p'-dimethylaminobenzophenone and p, p'-methoxybenzophenone; bis (η5-2,4-cyclopentadiene-1- Il) -bis (2,6 A titanocene derivative such as -difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium is preferably used.

  These photopolymerization initiators are used alone or in combination of two or more.

  When α-diketone is used, it is preferably used in combination with a tertiary amine compound. Tertiary amine compounds that can be used in combination with α-diketone include N, N-dimethylaniline, N, N-diethylaniline, N, N-di-n-butylaniline, N, N-dibenzylaniline. N, N-dimethyl-p-toluidine, N, N-diethyl-p-toluidine, N, N-dimethyl-m-toluidine, p-bromo-N, N-dimethylaniline, m-chloro-N, N- Dimethylaniline, p-dimethylaminobenzaldehyde, p-dimethylaminoacetophenone, p-dimethylaminobenzoic acid, p-dimethylaminobenzoic acid ethyl ester, p-dimethylaminobenzoic acid amyl ester, N, N-dimethylanthranic acid methyl Ester, N, N-dihydroxyethylaniline, N, N-dihydroxyethyl-p-toluidine, p Dimethylaminophenethyl alcohol, p-dimethylaminostilbene, N, N-dimethyl-3,5-xylidine, 4-dimethylaminopyridine, N, N-dimethyl-α-naphthylamine, N, N-dimethyl-β-naphthylamine, tri Butylamine, tripropylamine, triethylamine, N-methyldiethanolamine, N-ethyldiethanolamine, N, N-dimethylhexylamine, N, N-dimethyldodecylamine, N, N-dimethylstearylamine, N, N-dimethylaminoethyl methacrylate N, N-diethylaminoethyl methacrylate, 2,2 ′-(n-butylimino) diethanol, and the like.

  In the present invention, it is preferable to use an acetophenone derivative, an acylphosphine oxide derivative, an O-acyloxime derivative, or an α-diketone.

  In this invention, it is preferable that the usage-amount of the said photoinitiator is 0.1-10 mass parts with respect to 100 mass parts of said polymerizable monomers (B), and 0.1-5 mass parts It is more preferable from the viewpoint of etching resistance.

(Other additive components in photocurable nanoimprint composition)
The photocurable nanoimprint composition of the present invention may contain other components within a range that does not impair the effects of the present invention.

  In use of the photocurable nanoimprint composition of the present invention, the photocurable nanoimprint composition is used by being applied onto a substrate. In this case, the photocurable nanoimprint composition is diluted with a solvent and used. You can also Moreover, a solvent, a stabilizer, and other well-known additives can also be mix | blended for the objective of stabilizing the composition for photocurable nanoimprint of this invention, or the other objective. As the solvent used, any solvent that can dissolve the composition for photocurable nanoimprinting of the present invention can be used without any limitation. For example, acetonitrile, tetrahydrofuran, toluene, chloroform, acetic acid ethyl ester, methyl ethyl ketone, dimethylformamide, Cyclohexanone, ethylene glycol, ethylene glycol isopropyl ether, propylene glycol, propylene glycol methyl ether, propylene glycol monomethyl ether acetate, methyl-3-methoxypropionate, ethylene glycol monoethyl ether acetate, ethyl lactate, ethyl-3-ethoxypropio Nate, butyl acetate, 2-heptanone, methyl isobutyl ketone, acetylacetone, diacetone alcohol, t- Chill alcohol, polyethylene glycol, water, may be mentioned other alcohols. In addition, water and alcohol can also be mix | blended newly, The water used when manufacturing the hydrolysis mixture (A) and the alcohol byproduced may be sufficient. Moreover, the solvent used as a dilution solvent when manufacturing a hydrolysis mixture (A) may be contained in the said solvent.

  When using a solvent, the amount used is not particularly limited and is appropriately selected according to the thickness of the target coating film. In particular, when the total amount of the solvent and the photocurable nanoimprint composition is 100% by mass, the concentration of the solvent is preferably in the range of 10 to 99% by mass.

  Any stabilizer can be used without limitation as long as it is generally known as a stabilizer for sol-gel components. For example, α-hydroxycarboxylic acid alkyl ethers such as methoxyacetic acid; glycolic acid Α-hydroxycarboxylic acids such as lactic acid, oxalic acid, mandelic acid and 2-hydroxyisobutyric acid; ethanolamines such as diethanolamine; diketones such as diacetyl, 2,5-hexanedione, acetylacetone, methylpropyl diketone and dimedone Can be mentioned. When a stabilizer is used, the amount used is not particularly limited, but it is preferable to adjust the amount used according to the amount of the sol-gel component.

  Other well-known additives can be mix | blended with the composition for photocurable nanoimprint of this invention. Specifically, a surfactant, a polymerization inhibitor, a reactive diluent and the like can be blended. From the viewpoint of the uniformity of the coating film, the surfactant is added to stabilize the polymerization inhibitor so that it does not polymerize during storage.

  When the surfactant is blended, it is blended at a ratio of 0.0001 to 1 part by mass, preferably 0.001 to 0.1 part by mass with respect to 100 parts by mass of the polymerizable monomer (B). can do.

  As the surfactant, a fluorine-containing surfactant, a silicone-containing surfactant, and an aliphatic surfactant can be used. Among these, in the case where the photocurable nanoimprint composition is applied to a substrate such as a silicon wafer, an aliphatic surfactant may be used from the viewpoint that the composition can be uniformly applied without causing repelling. More preferred.

  Examples of surfactants include metal salts of higher alcohol sulfates such as sodium decyl sulfate and sodium lauryl sulfate, aliphatic carboxylic acid metal salts such as sodium laurate, sodium stearate and sodium oleate, lauryl alcohol and ethylene oxide. Anionic activity such as metal salts of higher alkyl ether sulfates such as sodium lauryl ether sulfate esterified with adducts with sodium, sulfosuccinic diesters such as sodium sulfosuccinate, phosphate esters of higher alcohol ethylene oxide adducts, etc. Agents; Cationic surfactants such as alkylamine salts such as dodecylammonium chloride and quaternary ammonium salts such as trimethyldodecylammonium bromide; such as dodecyldimethylamine oxide Zwitterionic surfactants such as alkyl dimethyl betaines such as alkyl dimethyl amine oxides, alkyl carboxy betaines such as dodecyl carboxy betaine, alkyl sulfo betaines such as dodecyl sulfo betaine, and amide amino acid salts such as lauramido propyl amine oxide; polyoxyethylene lauryl ether, etc. Polyoxyethylene alkyl ethers, polyoxyalkylene alkyl ethers, polyoxyethylene distyrenated phenyl ethers, polyoxyethylene alkyl phenyl ethers such as polyoxyethylene lauryl phenyl ether, polyoxyethylene tribenzylphenyl ethers, Fatty acid polyoxyethylene esters such as fatty acid polyoxyethylene lauryl ester, polio such as polyoxyethylene sorbitan lauryl ester It can be mentioned non-ionic surfactants such as polyoxyethylene sorbitan esters. Surfactants can be used not only independently but also in combination of a plurality of types as required.

  When blending a polymerization inhibitor, it is 0.01 to 1.0 part by weight, preferably 0.1 to 0.5 part by weight with respect to 100 parts by weight of the polymerizable monomer (B). Can be blended.

  Examples of the polymerization inhibitor include known ones. For example, the most typical ones include hydroquinone monomethyl ether, hydroquinone, butylhydroxytoluene and the like.

  Examples of the reactive diluent include known ones such as N-vinylpyrrolidone.

  The addition amount of the reactive diluent is not particularly limited and is appropriately selected within a range not affecting the formation of the pattern from the mold, and is usually 1 to 100 parts by mass of the polymerizable monomer (B). It is suitably selected from the range of 100 parts by mass. Among these, it is preferable that it is 5-50 mass parts, when the viscosity reduction of the composition for photocurable nanoimprint, the mechanical strength of a pattern, etc. are taken into consideration.

  In addition, as another additive component, the releasability from the mold (pattern forming surface) is improved, and thus a pattern having a shape with excellent reproducibility can be formed on the substrate. Spherical fine particles can also be added. In this case, it is preferable to blend a spherical hyperbranched polymer having a diameter of 1 to 10 nm and a molecular weight of 10,000 to 100,000. The blending amount is preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the polymerizable monomer (B).

  The composition for photocurable nanoimprint of the present invention mixes the hydrolysis mixture (A), the polymerizable monomer (B), the photopolymerization initiator (C), and other additive components to be blended as necessary. It is prepared by. The order of addition of these components is not particularly limited.

  Next, a method for forming a pattern on a substrate using this photocurable nanoimprint composition will be described.

(Pattern formation method using photocurable imprinting composition)
A pattern forming method using the photocurable nanoimprinting composition of the present invention will be described.

  First, the coating film is formed by apply | coating the composition for photocurable nanoimprint prepared according to the said method on a base material according to a well-known method.

  The form and material of the substrate are not particularly limited, and substrates, sheets, and films can be used. Specifically, silicon wafer, quartz, glass, sapphire, various metal materials, ceramics such as alumina / aluminum nitride / silicon carbide / silicon nitride, polyethylene terephthalate film, polypropylene film, polycarbonate film, triacetyl cellulose film, cycloolefin resin A known substrate such as a film, a sheet, or a film can be used. In addition, these base materials can also surface-treat in order to improve adhesiveness with the cured film which consists of a composition for photocurable nanoimprint of this invention more.

  On these substrates, the photocurable nanoimprint composition of the present invention is applied by a known method such as a spin coating method, a dipping method, a dispensing method, an ink jet method, a spray coating method, or a roll-to-roll method, followed by drying. By doing so, a coating film may be formed. The thickness of the coating film is not particularly limited, and may be appropriately determined according to the intended use, but is usually 0.1 to 5 μm, and the photocurable nanoimprint composition of the present invention is 0. The present invention can also be suitably applied to the formation of a coating film having a thickness of 0.01 to 0.1 μm.

  The drying temperature is not particularly limited as long as the coating film is dried. Usually, the drying temperature can be selected from a range of 40 ° C to 150 ° C.

  In order to apply thinly, it is also possible to apply the photocurable nanoimprinting composition of the present invention diluted with an organic solvent, in which case the drying temperature depends on the boiling point and volatility of the organic solvent used. May be determined as appropriate.

  Next, the pattern forming surface of the mold on which a desired pattern is formed is brought into contact with the coating film. At this time, the mold may be formed of a transparent material such as quartz or a transparent resin film so that a cured film can be formed by curing the applied composition through light irradiation. preferable. The photocurable nanoimprinting composition of the present invention can transfer a pattern at a relatively low pressure when pressing a mold. The pressure at this time is not particularly limited, but the pattern can be transferred at a pressure of 0.01 MPa to 1 MPa. As a matter of course, the pattern can be transferred even at a pressure higher than the upper limit of the pressure.

  Thereafter, the coating film is cured by irradiating light while keeping the pattern forming surface of the mold in contact with the coating film. The light to be irradiated has a wavelength of 500 nm or less, and the light irradiation time is selected from the range of 0.1 to 300 seconds. Although it depends on the thickness of the coating film, etc., it is usually 1 to 60 seconds.

  The atmosphere during photopolymerization can be polymerized even in the air, but in order to promote the photopolymerization reaction, photopolymerization in an atmosphere with little oxygen inhibition is preferred. For example, a nitrogen gas atmosphere, an inert gas atmosphere, a fluorine gas atmosphere, a vacuum atmosphere, or the like is preferable.

  After photocuring, a laminate in which a pattern is formed by a cured coating film (cured film) on the substrate is obtained by separating the mold from the cured coating film.

(Pattern formation on the substrate: Etching of the laminate with the pattern formed by the cured film)
In the photocurable nanoimprint composition of the present invention, the formed cured film exhibits excellent etching resistance. Therefore, the pattern formed from the cured film has very good etching resistance with oxygen gas, fluorine-based gas, chlorine-based gas, etc., and nanoscale irregularities are formed by etching with oxygen gas, fluorine-based gas, chlorine-based gas, etc. It can be suitably used as a mask for producing a substrate having a structure. In particular, the cured film obtained from the photocurable nanoimprinting composition of the present invention is excellent in etching resistance to chlorine-based gas for processing a sapphire substrate, and is therefore used as a mask for surface processing of a sapphire substrate. Suitable for As the chlorine-based gas, a known gas used for reactive ion etching can be used. Specific examples include chlorine, boron trichloride, and carbon tetrachloride. If necessary, oxygen gas, fluorine-based gas, and the like can be mixed and used.

As a method of forming a pattern based on the pattern of the cured film on the substrate (laminate formed with the pattern by the cured film) having a cured film having a pattern transferred by a mold on the surface obtained as described above, First, the thin part (residual film) of the cured film is removed by dry etching to expose the substrate surface. Further, dry etching is performed on the substrate from which the residual film has been removed. The substrate covered with the thick part of the cured film is not dry-etched entirely using the thick part of the cured film as a mask. By removing the thick part of the cured film remaining at the end, a substrate obtained by dry etching the substrate surface can be obtained. As a method for removing the thick portion of the cured film, it can be removed by dry etching or wet etching. In particular, in the case of pattern formation on a sapphire substrate, dry etching with a fluorine-based gas is preferably used.
After the thin part (residual film) of the cured film is removed by dry etching, metal can be deposited on the substrate surface where the residual film has been removed.

  By processing the surface of the sapphire substrate, improvement of LED light extraction efficiency, homogeneous GaN growth with little crystal transition, and prevention of cracks in the GaN layer are expected.

(Use of laminates with patterns formed from cured films (used as replica molds))
Although a pattern can be formed on a substrate by etching by the above method, the photocurable nanoimprint composition of the present invention has excellent performance and can be used for other applications. For example, a cured film made of the photocurable nanoimprint composition has excellent hardness because the inorganic component is well dispersed. Therefore, the laminated body in which the pattern which consists of a cured film was formed on the board | substrate can also be used as a replica metal mold | die for nanoimprint.

  When used as this nanoimprint replica mold, it is preferable to react a fluorine-containing silane coupling agent on the surface of the laminate. By reacting the silane coupling agent, the releasability between the laminate surface and another substance can be improved. It is considered that alkoxy groups remain in the cured film and can be chemically bonded to the silane coupling agent. Therefore, the laminate obtained by reacting the silane coupling agent is further excellent in releasability.

  As the silane coupling agent, a known silane coupling agent can be used as long as it is a silane coupling agent containing a fluorine atom capable of improving releasability. Specific examples include those in which part or all of hydrogen in the alkyl chain of a trihalogenated organosilane molecule or trialkoxyorganosilane molecule is substituted with fluorine.

  The reaction between the silane coupling agent and the laminate is not particularly limited, but is preferably performed under humidified conditions. Specifically, the reaction is preferably performed under conditions of a relative humidity of 40 to 100%. Both can be made to react by making a silane coupling agent and a laminated body contact under the said humidity. Although the temperature at the time of making it react is not restrict | limited in particular, It is preferable that it is 40-80 degreeC. In addition, in the case of a liquid silane coupling agent, the surface on which the pattern is formed may be immersed in the liquid, or applied to the surface by a known method such as dip coating, spin coating, or splatte. . The time for the reaction can be appropriately selected depending on the temperature and relative humidity.

  The laminated body reacted with the silane coupling agent by such a method may be dried after washing with a fluorine-based solvent such as hydrofluoroether or alcohol. The obtained laminate has excellent mold release performance and can be used as a replica mold for nanoimprint.

  Hereinafter, the present invention will be described with reference to examples and comparative examples, but the present invention is not limited to these examples.

(1) Evaluation of substrate adhesion of cured film The obtained photocurable nanoimprinting composition was diluted with 1-methoxy-2-propanol to obtain a sapphire substrate (single mirror surface, thickness 430 μm, surface roughness Ra ≦ Spin coated at 3000 rpm for 30 seconds on a surface of 0.1 nm and plane orientation C), dried at 110 ° C. for 2 minutes, and then irradiated with UV to form a cured film of a photocurable nanoimprint composition having a thickness of about 1 μm. Prepared using Nichiban Co., Ltd. 15mm width cellophane tape 405 (length 5cm), and after making three reciprocal contact with finger pressure, peel off,
The cured film was not removed at all: 5
The peeled area is less than 10%: 4
Exfoliation area of 10% or more and less than 50%: 3
Exfoliation area 50% or more and less than 100%: 2
With peeling area of 100% (full peeling): 1
As evaluated.

(2) Evaluation of releasability from the mold A photocurable nanoimprinting composition was spin-coated on a silicon wafer (P-type, single mirror surface, no oxide film), and dried at 110 ° C. for 1 minute to be photocurable. A silicon wafer coated with a coating film of the composition for nanoimprinting was obtained. Using a 20 mm long and 20 mm wide planar quartz plate as a mold, in a nanoimprinting device (ImpFlex Essntial, manufactured by Sanmei Electronics Co., Ltd.), the silicon wafer obtained above is subjected to a pressure of 0.25 MPa and an LED 365 nm light source Was irradiated with light for 10 seconds to perform imprinting. The stress (release force) at the time of peeling the quartz plate from the cured film was measured, and the release property from the mold was evaluated.

(3) Evaluation of transferability (application of photocurable nanoimprint composition)
The obtained composition for photocurable nanoimprint was diluted with 1-methoxy-2-propanol to 60 wt%. The diluted photocurable nanoimprint composition is spin-coated on a silicon wafer (P-type, single mirror surface, no oxide film) at 3000 rpm for 30 seconds, and dried at 110 ° C. for 2 minutes, for photocurable nanoimprint. A silicon wafer having a coating film of the composition coated to a thickness of about 1 μm was obtained.

(Pattern formation: Manufacture of laminate)
Using a 200 nm line / space quartz mold, in a nanoimprint apparatus (ImpFlex-Essential, manufactured by Sanmei Electronics Co., Ltd.), a silicon wafer having a coating film of the photocurable nanoimprint composition obtained as described above Then, light nanoimprinting was performed by irradiating light from an LED 365 nm light source for 10 seconds under a pressure of 0.5 MPa. The quartz mold used was previously subjected to a mold release treatment by a fluorine-based surface treatment (manufactured by Daikin Industries, Ltd., OPTOOL HD-1100TH).

  The shape transferability of the pattern formed on the sapphire substrate using the photocurable nanoimprint composition was evaluated by observation with a scanning electron microscope (SEM). In the evaluation of transferability, “100” indicates that all 100 lines with a width of 200 nm have been transferred, and “△” indicates that some of the pattern shapes are defective, and all patterns cannot be transferred. Was evaluated as “×”.

(4) Evaluation of etching resistance (etching of sapphire substrate)
A sapphire substrate (single mirror surface, thickness 430 μm, surface roughness Ra ≦ 0.1 nm, plane orientation C plane) is dry-etched with chlorine gas under the following conditions using a reactive ion etching apparatus, and is performed for a certain period of time. The etching amount (reduced thickness of the sapphire substrate) was measured with a level difference measuring instrument.
<Dry etching conditions with chlorine gas>
Chlorine gas flow rate: 20sccm
Antenna power: 400W
Bias power: 80W
Substrate cooling temperature: 5 ° C
(Etching cured film)
The obtained photocurable nanoimprinting composition was diluted with 1-methoxy-2-propanol and spin-coated on a silicon wafer (P-type, one mirror surface, no oxide film) at 3000 rpm for 30 seconds, 110 After drying for 2 minutes at ° C., UV irradiation was performed to obtain a silicon wafer coated with a cured film of a photocurable nanoimprint composition having a thickness of about 1 μm. The silicon wafer coated with the obtained cured film was subjected to dry etching under the same conditions as dry etching with chlorine gas on a sapphire substrate, and the thickness of the coating film with the reduced cured film in a certain time was measured with a level difference measuring instrument.

(Calculation of sapphire selectivity)
Ratio of etching amount of sapphire substrate only for sapphire substrate in a certain time (reduced thickness of sapphire substrate) and reduced coating thickness of cured film in a certain time of cured film of photocurable nanoimprint composition (sapphire Calculate the etching amount of the substrate in a certain time (reduced thickness of the sapphire substrate) / the cured film thickness of the cured film of the composition for photocurable nanoimprinting that has decreased in a certain time), and calculate this photocurable nanoimprint It was set as the sapphire selectivity of the cured film of the composition for use. The higher the sapphire selectivity value, the harder the cured film of the photocurable nanoimprinting composition is to be less susceptible to etching by chlorine gas than the sapphire substrate, and the better the chlorine etching resistance when using a sapphire substrate. .

Example 1
(Production of hydrolysis mixture (A))
0.28 g of a solution obtained by diluting (3,3,3, -trifluoropropyl) trimethoxysilane with ethanol to a solid content of 5% as a fluorinated organosilane compound, 6.9 g of ethanol, and having a (meth) acrylic group 7.5 g of trimethoxysilyl trimethylene acrylate (KBM-5103 manufactured by Shin-Etsu Chemical Co., Ltd.) as an organosilicon compound and 0.8 g of tungsten (V) ethoxide (Alfa Aesar) as a metal alkoxide are mixed. While stirring and mixing, a 2N-HCl / ethanol mixed aqueous solution of ethanol 2.2 g / water 0.8 g / 2N-HCl 0.07 g was gradually added dropwise at room temperature. Further, an ethanol aqueous solution of 0.5 g of ethanol / 0.5 g of water was gradually added dropwise and stirred at room temperature for 1 hour to hydrolyze a hydrolyzate of a fluorinated organosilane compound and an organosilicon compound having a (meth) acryl group. And a hydrolysis mixture (A) containing a hydrolyzate of metal alkoxide.

(Production of photocurable nanoimprint composition)
As a polymerizable monomer (B) having a (meth) acryl group, hydroxyethylated o-phenylphenol acrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., NK ester A-LEN-10) 5.0 g, 9,9 5.0 g of -bis [4- (2-acryloyloxyethoxy) phenyl] fluorene (manufactured by Shin-Nakamura Chemical Co., Ltd., NK ester A-BPEF) was used.

  As a photopolymerization initiator (C), 2-dimethylamino-2- (4-methyl-benzyl) -1- (4-morpholin-4-yl-phenyl) -butan-1-one (BASF Japan Ltd.) 0.2 g of IRGACURE (registered trademark) 379 EG).

  As the polymerization inhibitor, 0.015 g of hydroquinone monomethyl ether and 0.002 g of butylhydroxytoluene were used.

  The polymerizable monomer (B) having the (meth) acryl group, the photopolymerization initiator (C), and the polymerization inhibitor were uniformly mixed, and 2.0 g of the mixture was collected. 8.6 g of the hydrolysis mixture (A) was added to 2.0 g of the mixture, and the mixture was stirred at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Example 2
(Production of hydrolysis mixture (A))
0.13 g of a solution obtained by diluting (3,3,3, -trifluoropropyl) trimethoxysilane with ethanol to a solid content of 1% as a fluorinated organosilane compound, 6.5 g of ethanol, and having a (meth) acrylic group As an organosilicon compound, 1.5 g of trimethoxysilyl trimethylene acrylate (KBM-5103 manufactured by Shin-Etsu Chemical Co., Ltd.) is mixed, and while stirring and mixing the mixture, ethanol 2.0 g / water 0.2 g / 2N-HCl. 0.03 g of a 2N-HCl / ethanol mixed aqueous solution was gradually added dropwise at room temperature. Further, 0.8 g of tungsten (V) ethoxide (manufactured by Alfa Aesar) as a metal alkoxide and 5.8 g of diphenyldimethoxysilane (manufactured by Tokyo Chemical Industry Co., Ltd.) as an organic silicon compound are mixed, and this mixture is stirred and mixed. Ethanol 2.0 g / water 0.4 g / 2N-HCl 0.09 g of a 2N-HCl / ethanol mixed aqueous solution was gradually added dropwise at room temperature. Further, an ethanol aqueous solution of 0.5 g of ethanol / 0.2 g of water was gradually added dropwise and stirred at room temperature for 1 hour to hydrolyze a hydrolyzate of a fluorinated organosilane compound and an organosilicon compound having a (meth) acryl group. The hydrolysis mixture (A) containing the hydrolyzate of the product, the metal alkoxide, and the hydrolyzate of the organosilicon compound was obtained.

(Production of photocurable nanoimprint composition)
After mixing the same type, the same amount of the polymerizable monomer (B), the photopolymerization initiator (C), and the polymerization inhibitor as used in Example 1, the same amount of the mixture (2.0 g) After adding 9.8 g of the hydrolysis mixture (A) to the mixture, the mixture was stirred and mixed at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Example 3
(Production of hydrolysis mixture (A))
The same operation as in Example 2 was performed to obtain a hydrolysis mixture (A).

(Production of photocurable nanoimprint composition)
As the polymerizable monomer (B) having a (meth) acrylic group, 2.5 g of polyethylene glycol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., NK ester A-200), ethoxylated bisphenol A diacrylate (Shin-Nakamura) Chemical Industry Co., Ltd., NK Ester A-BPE-10 7.5g, Phenoxy Polyethylene Glycol Acrylate (Shin Nakamura Chemical Co., Ltd., NK Ester AMP-10G) 5.0g, Ethoxylated o-Phenylphenol Acrylate (Shin Nakamura Chemical Co., Ltd., NK Ester A-LEN-10) 5.0 g, Tricyclodecane dimethanol diacrylate (Shin Nakamura Chemical Co., Ltd., NK Ester A-DCP) 5.0 g are used. did.

  As a photopolymerization initiator (C), 2-dimethylamino-2- (4-methyl-benzyl) -1- (4-morpholin-4-yl-phenyl) -butan-1-one (manufactured by BASF Japan Ltd.) , IRGACURE® 379 EG) 1.0 g was used.

  As a polymerization inhibitor, hydroquinone monomethyl ether 0.0375 g and butylhydroxytoluene 0.005 g were used.

  Said (B) and (C) and the polymerization inhibitor were mixed uniformly, and 2.0g of the mixture was fractionated. 9.8 g of the obtained hydrolyzate (A) was added to 2.0 g of the mixture, and the mixture was stirred at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Example 4
(Production of hydrolysis mixture (A))
As a fluorinated organic silane compound, 0.30 g of a solution obtained by diluting (tridecafluoro-1,1,2,2-tetrahydrooctyl) -trimethoxysilane with ethanol to a solid content of 1%, 8.4 g of ethanol, (meta ) 1.5 g of trimethoxysilyl trimethylene acrylate (KBM-5103 manufactured by Shin-Etsu Chemical Co., Ltd.) as an organosilicon compound having an acrylic group, 1.6 g of tungsten (V) ethoxide (produced by Alfa Aesar) as a metal alkoxide, organosilicon As a compound, 5.4 g of diphenyldimethoxysilane (manufactured by Tokyo Chemical Industry Co., Ltd.) was mixed, and while stirring and mixing this mixture, ethanol 2.6 g / water 0.6 g / 2N-HCl 0.10 g of 2N-HCl / An ethanol mixed aqueous solution was gradually added dropwise at room temperature. Further, an ethanol aqueous solution of 0.6 g of ethanol / 0.3 g of water was gradually added dropwise and stirred at room temperature for 1 hour to hydrolyze a hydrolyzate of a fluorinated organosilane compound and an organosilicon compound having a (meth) acryl group. The hydrolysis mixture (A) containing the hydrolyzate of the product, the metal alkoxide, and the hydrolyzate of the organosilicon compound was obtained.

(Production of photocurable nanoimprint composition)
After mixing the same type, the same amount of the polymerizable monomer (B), the photopolymerization initiator (C), and the polymerization inhibitor as used in Example 1, the same amount of the mixture (2.0 g) After adding 10.6 g of the hydrolysis mixture (A), the mixture was stirred and mixed at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Example 5
(Production of hydrolysis mixture (A))
The same operation as in Example 2 was performed to obtain a hydrolysis mixture (A).

(Production of photocurable nanoimprint composition)
As a polymerizable monomer (B) having a (meth) acryl group, hydroxyethylated o-phenylphenol acrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., NK ester A-LEN-10) 5.0 g, 9,9 5.0 g of -bis [4- (2-acryloyloxyethoxy) phenyl] fluorene (manufactured by Shin-Nakamura Chemical Co., Ltd., NK ester A-BPEF) was used.

  As a photopolymerization initiator (C), 2-dimethylamino-2- (4-methyl-benzyl) -1- (4-morpholin-4-yl-phenyl) -butan-1-one (BASF Japan Ltd.) Manufactured by IRGACURE (registered trademark) 379 EG) 0.05 g was used.

  As the polymerization inhibitor, 0.015 g of hydroquinone monomethyl ether and 0.002 g of butylhydroxytoluene were used.

  The polymerizable monomer (B) having the (meth) acryl group, the photopolymerization initiator (C), and the polymerization inhibitor were uniformly mixed, and 2.0 g of the mixture was collected. 9.8 g of the hydrolysis mixture (A) was added to 2.0 g of the mixture, followed by stirring at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Example 6
(Production of hydrolysis mixture (A))
In Example 2, the same operation as Example 2 was performed except having changed the addition amount of water as shown in Table 1, and the hydrolysis mixture (A) was obtained.

(Production of photocurable nanoimprint composition)
After mixing the same type, the same amount of the polymerizable monomer (B), the photopolymerization initiator (C), and the polymerization inhibitor as used in Example 1, the same amount of the mixture (2.0 g) After adding 10.7 g of the hydrolysis mixture (A) to the mixture, the mixture was stirred and mixed at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Example 7
(Production of hydrolysis mixture (A))
0.17 g of a solution obtained by diluting (3,3,3, -trifluoropropyl) trimethoxysilane with ethanol to a solid content of 1% as a fluorinated organosilane compound, 6.5 g of ethanol, and having a (meth) acrylic group As an organosilicon compound, 1.8 g of trimethoxysilyl trimethylene acrylate (KBM-5103 manufactured by Shin-Etsu Chemical Co., Ltd.) is mixed, and while stirring and mixing the mixture, ethanol 2.0 g / water 0.2 g / 2N-HCl. 0.03 g of a 2N-HCl / ethanol mixed aqueous solution was gradually added dropwise at room temperature. Furthermore, 0.26 g of tungsten (V) ethoxide (manufactured by Alfa Aesar) as a metal alkoxide and 5.8 g of diphenyldimethoxysilane (manufactured by Tokyo Chemical Industry Co., Ltd.) as an organosilicon compound are mixed, and this mixture is stirred and mixed. Ethanol 2.0 g / water 0.4 g / 2N-HCl 0.09 g of a 2N-HCl / ethanol mixed aqueous solution was gradually added dropwise at room temperature. Further, an ethanol aqueous solution of 0.5 g of ethanol / 0.2 g of water was gradually added dropwise and stirred at room temperature for 1 hour to hydrolyze a hydrolyzate of a fluorinated organosilane compound and an organosilicon compound having a (meth) acryl group. The hydrolysis mixture (A) containing the hydrolyzate of the product, the metal alkoxide, and the hydrolyzate of the organosilicon compound was obtained.

(Production of photocurable nanoimprint composition)
After mixing the same type, the same amount of the polymerizable monomer (B), the photopolymerization initiator (C), and the polymerization inhibitor as used in Example 1, the same amount of the mixture (2.0 g) After adding 9.5 g of the hydrolysis mixture (A), the mixture was stirred and mixed at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Example 8
(Production of hydrolysis mixture (A))
The same operation as in Example 1 was performed to obtain a hydrolysis mixture (A).

(Production of photocurable nanoimprint composition)
After mixing the same type, the same amount of the polymerizable monomer (B), the photopolymerization initiator (C), and the polymerization inhibitor as used in Example 1, the same amount of the mixture (2.0 g) After adding 11.4 g of the hydrolysis mixture (A) to the mixture, the mixture was stirred and mixed at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Example 9
(Production of hydrolysis mixture (A))
The same operation as in Example 2 was performed to obtain a hydrolysis mixture (A).

(Production of photocurable nanoimprint composition)
After mixing the same type, the same amount of the polymerizable monomer (B), the photopolymerization initiator (C), and the polymerization inhibitor as used in Example 1, the same amount of the mixture (2.0 g) After adding 13.1 g of the hydrolysis mixture (A), the mixture was stirred and mixed at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.
Example 10
(Production of hydrolysis mixture (A))
The same operation as in Example 2 was performed to obtain a hydrolysis mixture (A).

(Production of photocurable nanoimprint composition)
As the polymerizable monomer (B) having a (meth) acrylic group, 5.0 g of polyethylene glycol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., NK ester A-200), ethoxylated bisphenol A diacrylate (Shin-Nakamura) Chemical Industry Co., Ltd., NK Ester A-BPE-10 10.0 g, Phenoxy Polyethylene Glycol Acrylate (Shin Nakamura Chemical Co., Ltd., NK Ester AMP-10G) 5.0 g, Tricyclodecane Dimethanol Diacrylate 5.0 g (manufactured by Shin-Nakamura Chemical Co., Ltd., NK ester A-DCP) was used.

  As a photopolymerization initiator (C), 2-dimethylamino-2- (4-methyl-benzyl) -1- (4-morpholin-4-yl-phenyl) -butan-1-one (manufactured by BASF Japan Ltd.) , IRGACURE® 379 EG) 1.0 g was used.

  As a polymerization inhibitor, hydroquinone monomethyl ether 0.0375 g and butylhydroxytoluene 0.005 g were used.

  Said (B) and (C) and the polymerization inhibitor were mixed uniformly, and 2.0g of the mixture was fractionated. 9.8 g of the obtained hydrolyzate (A) was added to 2.0 g of the mixture, and the mixture was stirred at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Comparative Example 1
(Production of hydrolysis mixture)
6.9 g of ethanol, 7.5 g of trimethoxysilyl trimethylene acrylate (KBM-5103 manufactured by Shin-Etsu Chemical Co., Ltd.) as an organosilicon compound having a (meth) acrylic group, tungsten (V) ethoxide (manufactured by Alfa Aesar) as a metal alkoxide And 0.8 g of ethanol, and 0.02 g of 2N-HCl / ethanol mixed aqueous solution of 0.07 g of ethanol was gradually added dropwise at room temperature while stirring and mixing the mixture. Further, an ethanol aqueous solution of 0.5 g of ethanol / 0.5 g of water is gradually added dropwise and stirred at room temperature for 1 hour, and contains a hydrolyzate of an organosilicon compound having a (meth) acryl group and a hydrolyzate of a metal alkoxide. A hydrolysis mixture was obtained.

(Production of photocurable nanoimprint composition)
After mixing the same type, the same amount of the polymerizable monomer (B), the photopolymerization initiator (C), and the polymerization inhibitor as used in Example 1, the same amount of the mixture (2.0 g) After adding 8.6 g of the hydrolysis mixture, the mixture was stirred and mixed at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Comparative Example 2
(Production of hydrolysis mixture)
0.28 g of a solution obtained by diluting (3,3,3, -trifluoropropyl) trimethoxysilane with ethanol to a solid content of 5% as a fluorinated organosilane compound, 6.9 g of ethanol, and having a (meth) acrylic group 7.5 g of trimethoxysilyl trimethylene acrylate (KBM-5103 manufactured by Shin-Etsu Chemical Co., Ltd.) as an organosilicon compound was mixed, and while stirring and mixing the mixture, ethanol 2.2 g / water 0.8 g / 2N- HCl 0.07 g of 2N-HCl / ethanol mixed aqueous solution was gradually added dropwise at room temperature. Further, an ethanol aqueous solution of 0.5 g of ethanol / 0.5 g of water was gradually dropped and stirred at room temperature for 1 hour to hydrolyze the hydrolyzate of the fluorinated organosilane compound and the organosilicon compound having a (meth) acryl group A hydrolysis mixture containing the product was obtained.

(Production of photocurable nanoimprint composition)
After mixing the same type, the same amount of the polymerizable monomer (B), the photopolymerization initiator (C), and the polymerization inhibitor as used in Example 1, the same amount of the mixture (2.0 g) After adding 5.6 g of the hydrolysis mixture, the mixture was stirred and mixed at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Comparative Example 3
(Production of hydrolysis mixture)
As a fluorinated organosilane compound, 0.14 g of a solution obtained by diluting (3,3,3, -trifluoropropyl) trimethoxysilane with ethanol to a solid content of 1% and 6.5 g of ethanol were mixed, and this mixture was stirred. While mixing, a 2N-HCl / ethanol mixed aqueous solution of ethanol 2.0 g / water 0.2 g / 2N-HCl 0.03 g was gradually added dropwise at room temperature. Further, 0.8 g of tungsten (V) ethoxide (manufactured by Alfa Aesar) as a metal alkoxide and 5.8 g of diphenyldimethoxysilane (manufactured by Tokyo Chemical Industry Co., Ltd.) as an organic silicon compound are mixed, and this mixture is stirred and mixed. Ethanol 2.0 g / water 0.4 g / 2N-HCl 0.05 g of a 2N-HCl / ethanol mixed aqueous solution was gradually added dropwise at room temperature. Further, an ethanol aqueous solution of 0.5 g of ethanol / 0.2 g of water was gradually added dropwise and stirred at room temperature for 1 hour to hydrolyze the hydrolyzate of fluorinated organosilane compound, hydrolyzate of metal alkoxide, and organosilicon compound. A hydrolysis mixture containing the product was obtained.

(Production of photocurable nanoimprint composition)
After mixing the same type, the same amount of the polymerizable monomer (B), the photopolymerization initiator (C), and the polymerization inhibitor as used in Example 1, the same amount of the mixture (2.0 g) After adding 8.0 g of the hydrolysis mixture, the mixture was stirred and mixed at room temperature for 15 minutes to obtain a photocurable nanoimprinting composition. The obtained composition for photocurable nanoimprint was filtered with a syringe filter having a 0.2 μmφ hole diameter. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3. The photocurable nanoimprint composition of Comparative Example 3 was insufficient in photocurability and could not form a pattern. Moreover, since photocurability was inadequate, the sapphire selectivity was not calculated.

Comparative Example 4
(Production of photocurable nanoimprint composition)
The same kind and the same amount of polymerizable monomer (B), photopolymerization initiator (C), and polymerization inhibitor as used in Example 1 were mixed and stirred at room temperature for 15 minutes to hydrolyze. A photocurable nanoimprinting composition containing no mixture was obtained. The blending ratio of this photocurable nanoimprint composition is shown in Table 1.

  Using the obtained photocurable nanoimprint composition, the substrate adhesion, release property, transferability, and sapphire selectivity of the cured film were evaluated. The results are shown in Tables 2 and 3.

Example 11
(Manufacture of surface processed sapphire substrates)
The photocurable nanoimprinting composition obtained in Example 2 was diluted with 1-methoxy-2-propanol to 10 wt%. The diluted photocurable nanoimprint composition was spin-coated on a sapphire substrate (single mirror surface, thickness 430 μm, surface roughness Ra ≦ 0.1 nm, plane orientation C plane) at 3000 rpm for 30 seconds, and at 110 ° C. It dried for 2 minutes and the sapphire board | substrate with which the coating film of the composition for photocurable nanoimprint was coated with the thickness of about 100 nm was obtained.

  A photocurable nanoimprint obtained as described above using a resin mold having a hole pattern with a diameter of 230 nm and a depth of 200 nm and a vacuum pressure UV curing apparatus (VS005-200C-UV) manufactured by Mikado Technos Co., Ltd. An optical nanoimprint was performed by applying a pressure of 1 MPa to a sapphire substrate having a coating film of the composition for irradiation and irradiating light with a metal halide lamp for 60 seconds. The resin mold was peeled off to obtain a sample in which the pillar pattern was transferred onto the sapphire substrate.

Using a reactive ion etching apparatus, surface treatment of the sapphire substrate was performed by dry etching of the sapphire substrate, using the above sample as a mask under dry etching conditions using chlorine gas. When the obtained sample was observed by SEM, it was confirmed that the surface of the sapphire substrate was etched and the surface was processed.
Example 12
(Replica mold for Nanon print)
0.5 ml of the photocurable nanoimprinting composition obtained in Example 2 was dropped on a 188 μm-thick polyethylene terephthalate film subjected to easy adhesion surface treatment, and dried at 120 ° C. for 3 minutes to evaporate volatile components. On a polyethylene terephthalate film having the obtained photocurable nanoimprint composition, a quartz mold (NTT-AT nano) with a minimum pattern of 80 nm was used in a vacuum pressure UV curing apparatus (VS005-200C-UV) manufactured by Mikado Technos. Fabrication Co., Ltd., 80L RESO), polyethylene terephthalate film (laminate) on which a pattern made of a cured film is formed by irradiating light with a metal halide lamp for 30 seconds under a pressure of 1 MPa and performing light nanoimprinting Got. The used quartz mold was previously subjected to mold release treatment by fluorine-based surface treatment (Daikin Industries, Ltd., OPTOOL HD-1100TH). In order to use a polyethylene terephthalate film (laminated body) on which a pattern made of a cured film was formed as a replica mold for nanoimprinting, it was cut into a size of 20 mm × 20 mm around the pattern. Next, as a pretreatment for performing the mold release treatment, the pattern surface was hydrolyzed under humidified conditions. In the hydrolysis treatment, the cut polyethylene terephthalate film (laminate) is placed in an oven, a container containing water is present in the oven, and the oven is covered and heated at 70 ° C. for 2 hours. Was carried out. Thereafter, the patterned surface of the treated laminate was brought into contact with a fluorine-based surface treatment agent (manufactured by Daikin Industries, Ltd., OPTOOL HD-1100TH) to perform a mold release treatment, thereby producing a replica mold.

A mixture of (B) and (C) produced in Example 1 and a polymerization inhibitor was dropped onto the transfer pattern surface treated with fluorine, and sandwiched between quartz plates. -4200), light imprinting was performed by applying light at a pressure of 0.3 MPa for 60 seconds from the quartz plate side with an LED 375 nm light source. After peeling off the quartz plate, the obtained pattern surface was observed with an SEM, and it was confirmed that it was transferred to the same pattern as the mold used.

Claims (8)

A photocurable nanoimprinting composition comprising:
(A) General formula (1)

(Where
R ¹ and R ³ are each an alkyl group having 1 to 10 carbon atoms or a cycloalkyl group having 3 to 10 carbon atoms; R ² is a fluorine-containing alkyl group having 1 to 100 carbon atoms or a fluorine-containing cyclohexane. An alkyl group or a fluorine-containing alkoxy ether group; a is an integer of 1 to 3, b is an integer of 0 to 2, provided that a + b = 1 to 3; R ¹ , R ² and R ^{When a} plurality of ³ are present, the plurality of R ¹ , R ² and R ³ may be the same or different. )
Hydrolyzate of fluorinated organosilane compound represented by general formula (2)

Wherein R ⁴ is a hydrogen atom or a methyl group; R ⁵ is an alkylene group having 1 to 20 carbon atoms, a cycloalkylene group having 3 to 10 carbon atoms or an alkylene ether group having 2 to 20 carbon atoms; R ⁶ is an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 4 carbon atoms, or an aryl group having 6 to 12 carbon atoms; R ⁷ is an alkyl group having 1 to 4 carbon atoms or a carbon number R ⁵ or R ⁶ may be substituted with an alkyl group, an aryl group, a halogen, or a hydroxyl group; l is an integer of 0 to 2, and m is 1 to 3. is an integer, however, be a ^{l + m = 1~3; R 4} , R 5, R 6 and R ^7, respectively, when there are a plurality, the plurality of R ^4, R ^5, R ⁶ and R ⁷ May be the same or different groups.)
A hydrolyzate of an organosilicon compound having a (meth) acryl group represented by formula (3), and

(In the formula, M is tungsten, tin, indium, antimony, molybdenum, niobium, or hafnium; R ⁸ is an alkyl group having 1 to 10 carbon atoms; When M is tungsten, p is 6 or 5; when M is molybdenum or niobium, p is 5; when M is tin or hafnium, p is 4; In the case of antimony, p is 3.) A hydrolysis mixture comprising a hydrolyzate of a metal alkoxide represented by
(B) A photocurable nanoimprinting composition comprising a polymerizable monomer having a (meth) acrylic group, and (C) a photopolymerization initiator. The mixture (A) is further represented by the general formula (4)

(In the formula, R ⁹ and R ¹⁰ are the same or different alkyl group having 1 to 4 carbon atoms or hydrogen; R ¹¹ is an aryl group, and R ¹² is an aryl group or an alkoxy group having 1 to 4 carbon atoms. And n is an integer of 1 to 10.) The photocurable nanoimprinting composition according to claim 1, further comprising a hydrolyzate of an organosilicon compound represented by:   0.001 to 4 parts by mass of the fluorinated organosilane compound and 100 parts by mass of the polymerizable monomer (B) having the (meth) acryl group and the organosilicon compound 3 having the (meth) acryl group To 300 parts by mass, and a hydrolysis mixture (A) containing a compound obtained by hydrolyzing 0.1 to 150 parts by mass of the metal alkoxide, and 0.1 to 10 parts by mass of the photopolymerization initiator (C). The composition for photocurable nanoimprints according to claim 1, comprising:   0.001 to 4 parts by mass of the fluorinated organosilane compound and 100 parts by mass of the polymerizable monomer (B) having the (meth) acryl group and the organosilicon compound 3 having the (meth) acryl group -300 parts by mass, 0.1 to 150 parts by mass of the metal alkoxide, and a hydrolysis mixture (A) containing a compound obtained by hydrolyzing 10 to 400 parts by mass of the organosilicon compound, and the photopolymerization initiator (C The composition for photocurable nanoimprints of Claim 2 characterized by including 0.1-10 mass parts.   5. The light according to claim 4, comprising 0.2 to 50 parts by mass of a metal alkoxide with respect to 100 parts by mass in total of the organosilicon compound and the organosilicon compound having the (meth) acrylic group. A curable nanoimprint composition. The process of apply | coating the composition for photocurable nanoimprint in any one of Claims 1-5 on a board | substrate, and forming the coating film which consists of this composition,
Contacting the pattern forming surface of the mold on which the pattern is formed with the coating film, and irradiating light in that state to cure the coating film;
A method for forming a pattern, comprising: separating the mold from a cured coating film, and forming a pattern corresponding to a pattern formed on a pattern forming surface of the mold on a substrate.   7. A surface-processed sapphire substrate, wherein the substrate is a sapphire substrate, and the substrate surface is processed by dry etching with a chlorine-based gas using the pattern formed on the substrate by the pattern forming method according to claim 6 as a mask Manufacturing method.   A replica mold for nanoimprinting, comprising a cured product of the photocurable nanoimprinting composition according to claim 1.