JP2013543254A5 - - Google Patents
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- Publication number
- JP2013543254A5 JP2013543254A5 JP2013529091A JP2013529091A JP2013543254A5 JP 2013543254 A5 JP2013543254 A5 JP 2013543254A5 JP 2013529091 A JP2013529091 A JP 2013529091A JP 2013529091 A JP2013529091 A JP 2013529091A JP 2013543254 A5 JP2013543254 A5 JP 2013543254A5
- Authority
- JP
- Japan
- Prior art keywords
- base plate
- lithography system
- vacuum chamber
- bottom wall
- lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000001459 lithography Methods 0.000 claims 19
- 238000005259 measurement Methods 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US38469010P | 2010-09-20 | 2010-09-20 | |
| NL2005374A NL2005374C2 (en) | 2010-09-20 | 2010-09-20 | Method for arranging a lithography system on a foundation, and lithography system arranged on said foundation. |
| NL2005374 | 2010-09-20 | ||
| US61/384,690 | 2010-09-20 | ||
| PCT/NL2011/050630 WO2012039606A1 (en) | 2010-09-20 | 2011-09-20 | Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013543254A JP2013543254A (ja) | 2013-11-28 |
| JP2013543254A5 true JP2013543254A5 (cg-RX-API-DMAC7.html) | 2014-11-13 |
Family
ID=43920813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013529091A Withdrawn JP2013543254A (ja) | 2010-09-20 | 2011-09-20 | 基礎上に配置されるリソグラフィシステム、及び基礎上にリソグラフィシステムを配置する方法 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP2619629A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2013543254A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20130132769A (cg-RX-API-DMAC7.html) |
| NL (1) | NL2005374C2 (cg-RX-API-DMAC7.html) |
| TW (1) | TW201217915A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2012039606A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6817621B2 (ja) * | 2016-10-25 | 2021-01-20 | 株式会社マルテー大塚 | 道路鋲と、道路鋲の補修方法 |
| KR102344480B1 (ko) | 2016-12-30 | 2021-12-28 | 에이에스엠엘 네델란즈 비.브이. | 조정 조립체 및 이러한 조정 조립체를 포함하는 기판 노광 시스템 |
| US10048599B2 (en) | 2016-12-30 | 2018-08-14 | Mapper Lithography Ip B.V. | Adjustment assembly and substrate exposure system comprising such an adjustment assembly |
| TWI794964B (zh) * | 2021-09-09 | 2023-03-01 | 協崑股份有限公司 | 極紫外光設備（ｅｕｖ）之高精密度承載基座及其實施方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4805000A (en) * | 1986-01-17 | 1989-02-14 | Matsushita Electric Industrial Co., Ltd. | Exposure apparatus |
| KR100250152B1 (ko) * | 1997-11-15 | 2000-03-15 | 유무성 | 노광장치 |
| WO2000014779A1 (en) * | 1998-09-03 | 2000-03-16 | Nikon Corporation | Exposure apparatus and exposure method, and device and method for producing the same |
| US6999162B1 (en) * | 1998-10-28 | 2006-02-14 | Nikon Corporation | Stage device, exposure system, method of device manufacture, and device |
| JP2001148341A (ja) * | 1999-11-19 | 2001-05-29 | Nikon Corp | 露光装置 |
| JP2004063653A (ja) * | 2002-07-26 | 2004-02-26 | Nikon Corp | 防振装置、ステージ装置及び露光装置 |
| TWI307526B (en) * | 2002-08-06 | 2009-03-11 | Nikon Corp | Supporting device and the mamufacturing method thereof, stage device and exposure device |
| US20040149881A1 (en) * | 2003-01-31 | 2004-08-05 | Allen David S | Adjustable support structure for air conditioner and the like |
| US7460208B2 (en) * | 2005-02-18 | 2008-12-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP2009164307A (ja) * | 2007-12-28 | 2009-07-23 | Canon Inc | 支持構造、露光装置、支持構造の形成方法、及び、デバイス製造方法 |
| US8739383B2 (en) * | 2009-04-20 | 2014-06-03 | Nikon Corporation | Method and apparatus for aligning mirror blocks of a multi-element mirror assembly |
-
2010
- 2010-09-20 NL NL2005374A patent/NL2005374C2/en not_active IP Right Cessation
-
2011
- 2011-09-20 JP JP2013529091A patent/JP2013543254A/ja not_active Withdrawn
- 2011-09-20 EP EP11761728.2A patent/EP2619629A1/en not_active Withdrawn
- 2011-09-20 KR KR1020137006705A patent/KR20130132769A/ko not_active Withdrawn
- 2011-09-20 TW TW100133722A patent/TW201217915A/zh unknown
- 2011-09-20 WO PCT/NL2011/050630 patent/WO2012039606A1/en not_active Ceased