JP2013542591A5 - - Google Patents
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- Publication number
- JP2013542591A5 JP2013542591A5 JP2013528296A JP2013528296A JP2013542591A5 JP 2013542591 A5 JP2013542591 A5 JP 2013542591A5 JP 2013528296 A JP2013528296 A JP 2013528296A JP 2013528296 A JP2013528296 A JP 2013528296A JP 2013542591 A5 JP2013542591 A5 JP 2013542591A5
- Authority
- JP
- Japan
- Prior art keywords
- adhesive material
- supply system
- steam supply
- line
- reservoir
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims 13
- 239000000853 adhesive Substances 0.000 claims 12
- 230000001070 adhesive effect Effects 0.000 claims 12
- 239000012530 fluid Substances 0.000 claims 8
- 238000000034 method Methods 0.000 claims 7
- 239000006200 vaporizer Substances 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 5
- 238000010438 heat treatment Methods 0.000 claims 3
- 239000007788 liquid Substances 0.000 claims 3
- 238000001459 lithography Methods 0.000 claims 3
- 230000014759 maintenance of location Effects 0.000 claims 2
- 238000010926 purge Methods 0.000 claims 2
- 125000000524 functional group Chemical group 0.000 claims 1
- 230000007062 hydrolysis Effects 0.000 claims 1
- 238000006460 hydrolysis reaction Methods 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
- -1 silane compound Chemical class 0.000 claims 1
- JPPHEZSCZWYTOP-UHFFFAOYSA-N trimethoxysilylmethyl prop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C=C JPPHEZSCZWYTOP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US38076010P | 2010-09-08 | 2010-09-08 | |
| US61/380,760 | 2010-09-08 | ||
| PCT/US2011/050874 WO2012033943A2 (en) | 2010-09-08 | 2011-09-08 | Vapor delivery system for use in imprint lithography |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013542591A JP2013542591A (ja) | 2013-11-21 |
| JP2013542591A5 true JP2013542591A5 (cg-RX-API-DMAC7.html) | 2014-10-02 |
Family
ID=45811164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013528296A Pending JP2013542591A (ja) | 2010-09-08 | 2011-09-08 | インプリント・リソフラフィで用いる蒸気供給システム |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20120070572A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2013542591A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20130105648A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2012033943A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013115208A (ja) * | 2011-11-28 | 2013-06-10 | Tokyo Electron Ltd | 気化原料供給装置、これを備える基板処理装置、及び気化原料供給方法 |
| JP6343937B2 (ja) * | 2014-01-10 | 2018-06-20 | デクセリアルズ株式会社 | 反射防止構造体及びその設計方法 |
| US10921706B2 (en) * | 2018-06-07 | 2021-02-16 | Canon Kabushiki Kaisha | Systems and methods for modifying mesa sidewalls |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5554077A (en) * | 1978-10-16 | 1980-04-21 | Tokuyama Soda Co Ltd | Vaporizing of high boiling point residue discharged from vinyl chloride monomer production process |
| JPS6452731A (en) * | 1987-08-24 | 1989-02-28 | Mitsubishi Chem Ind | Thermal decomposition of dichloroethane |
| JPH0612801Y2 (ja) * | 1989-12-28 | 1994-04-06 | 大日本スクリーン製造株式会社 | 気相表面処理装置 |
| JP3118493B2 (ja) * | 1993-04-27 | 2000-12-18 | 菱電セミコンダクタシステムエンジニアリング株式会社 | 液体原料用ｃｖｄ装置 |
| DE19600630A1 (de) * | 1996-01-10 | 1997-07-17 | Bayer Ag | Verfahren und Vorrichtung zum kontinuierlichen Eindampfen von zähflüssigen, zum Haften neigenden Lösungen und Suspensionen bis zur Trockenmasse |
| US6409839B1 (en) * | 1997-06-02 | 2002-06-25 | Msp Corporation | Method and apparatus for vapor generation and film deposition |
| JPH11269653A (ja) * | 1998-03-26 | 1999-10-05 | Shimadzu Corp | 液体材料気化装置 |
| US20030101938A1 (en) * | 1998-10-27 | 2003-06-05 | Applied Materials, Inc. | Apparatus for the deposition of high dielectric constant films |
| US6178925B1 (en) * | 1999-09-29 | 2001-01-30 | Advanced Technology Materials, Inc. | Burst pulse cleaning method and apparatus for liquid delivery system |
| US6501052B2 (en) * | 2000-12-22 | 2002-12-31 | Chrysalis Technologies Incorporated | Aerosol generator having multiple heating zones and methods of use thereof |
| US20030021595A1 (en) * | 2001-07-16 | 2003-01-30 | Mindi Xu | Apparatus and method for vaporizing a liquid chemical |
| US20030049933A1 (en) * | 2001-09-07 | 2003-03-13 | Applied Materials, Inc. | Apparatus for handling liquid precursor material for semiconductor processing |
| US20060207503A1 (en) * | 2005-03-18 | 2006-09-21 | Paul Meneghini | Vaporizer and method of vaporizing a liquid for thin film delivery |
| US8808808B2 (en) * | 2005-07-22 | 2014-08-19 | Molecular Imprints, Inc. | Method for imprint lithography utilizing an adhesion primer layer |
| US8557351B2 (en) * | 2005-07-22 | 2013-10-15 | Molecular Imprints, Inc. | Method for adhering materials together |
| JP2009108387A (ja) * | 2007-10-31 | 2009-05-21 | Omron Corp | 気化装置 |
| JP5461786B2 (ja) * | 2008-04-01 | 2014-04-02 | 株式会社フジキン | 気化器を備えたガス供給装置 |
| US8697189B2 (en) * | 2008-10-21 | 2014-04-15 | Intevac, Inc. | Method and apparatus for precision surface modification in nano-imprint lithography |
| US8361546B2 (en) * | 2008-10-30 | 2013-01-29 | Molecular Imprints, Inc. | Facilitating adhesion between substrate and patterned layer |
| US8529778B2 (en) * | 2008-11-13 | 2013-09-10 | Molecular Imprints, Inc. | Large area patterning of nano-sized shapes |
-
2011
- 2011-09-08 JP JP2013528296A patent/JP2013542591A/ja active Pending
- 2011-09-08 KR KR1020137008766A patent/KR20130105648A/ko not_active Withdrawn
- 2011-09-08 US US13/228,298 patent/US20120070572A1/en not_active Abandoned
- 2011-09-08 WO PCT/US2011/050874 patent/WO2012033943A2/en not_active Ceased
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