JP2013531861A5 - - Google Patents

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Publication number
JP2013531861A5
JP2013531861A5 JP2012536014A JP2012536014A JP2013531861A5 JP 2013531861 A5 JP2013531861 A5 JP 2013531861A5 JP 2012536014 A JP2012536014 A JP 2012536014A JP 2012536014 A JP2012536014 A JP 2012536014A JP 2013531861 A5 JP2013531861 A5 JP 2013531861A5
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JP
Japan
Prior art keywords
conductive
substrate
film
micrometers
square
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Pending
Application number
JP2012536014A
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English (en)
Japanese (ja)
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JP2013531861A (ja
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Priority claimed from PCT/IL2010/000909 external-priority patent/WO2011051952A2/en
Publication of JP2013531861A publication Critical patent/JP2013531861A/ja
Publication of JP2013531861A5 publication Critical patent/JP2013531861A5/ja
Pending legal-status Critical Current

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JP2012536014A 2009-11-02 2010-11-02 光電子および電子装置のための透明な導電性皮膜 Pending JP2013531861A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US25713909P 2009-11-02 2009-11-02
US61/257,139 2009-11-02
PCT/IL2010/000909 WO2011051952A2 (en) 2009-11-02 2010-11-02 Transparent conductive coatings for optoelectronic and electronic devices

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015016775A Division JP2015146310A (ja) 2009-11-02 2015-01-30 光電子および電子装置のための透明な導電性皮膜

Publications (2)

Publication Number Publication Date
JP2013531861A JP2013531861A (ja) 2013-08-08
JP2013531861A5 true JP2013531861A5 (cg-RX-API-DMAC10.html) 2013-12-19

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Family Applications (2)

Application Number Title Priority Date Filing Date
JP2012536014A Pending JP2013531861A (ja) 2009-11-02 2010-11-02 光電子および電子装置のための透明な導電性皮膜
JP2015016775A Pending JP2015146310A (ja) 2009-11-02 2015-01-30 光電子および電子装置のための透明な導電性皮膜

Family Applications After (1)

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JP2015016775A Pending JP2015146310A (ja) 2009-11-02 2015-01-30 光電子および電子装置のための透明な導電性皮膜

Country Status (6)

Country Link
US (2) US9107275B2 (cg-RX-API-DMAC10.html)
EP (1) EP2496661B1 (cg-RX-API-DMAC10.html)
JP (2) JP2013531861A (cg-RX-API-DMAC10.html)
KR (1) KR20120104565A (cg-RX-API-DMAC10.html)
CN (1) CN102714903B (cg-RX-API-DMAC10.html)
WO (1) WO2011051952A2 (cg-RX-API-DMAC10.html)

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CN106688114B (zh) * 2014-08-06 2020-04-17 Ns材料株式会社 树脂成型品及其制造方法、以及波长变换部件、照明部件
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EP3209734B1 (en) 2014-10-21 2025-09-24 Oreltech Ltd. Composition for forming a patterned metal film on a substrate
KR102290310B1 (ko) * 2014-11-14 2021-08-13 삼성전자주식회사 전도성 박막
KR102266615B1 (ko) 2014-11-17 2021-06-21 삼성전자주식회사 전계 효과 트랜지스터를 포함하는 반도체 소자 및 그 제조 방법
GB201500748D0 (en) * 2015-01-16 2015-03-04 Cambridge Display Tech Ltd Method of forming a light-emitting device
WO2016140284A1 (ja) 2015-03-02 2016-09-09 コニカミノルタ株式会社 パターン形成方法、透明導電膜付き基材、デバイス及び電子機器
WO2016143715A1 (ja) * 2015-03-06 2016-09-15 コニカミノルタ株式会社 透明導電体及び透明導電体の製造方法
JP6413978B2 (ja) 2015-08-21 2018-10-31 コニカミノルタ株式会社 機能性細線パターン前駆体の形成方法、機能性細線パターンの形成方法、透明導電膜の形成方法、デバイスの製造方法及び電子機器の製造方法、並びに、機能性細線パターン、透明導電膜付き基材、デバイス及び電子機器
WO2018043046A1 (ja) 2016-08-31 2018-03-08 コニカミノルタ株式会社 機能性細線付き基材及び機能性細線の形成方法
US10126656B2 (en) 2016-09-08 2018-11-13 Goodrich Corporation Apparatus and methods of electrically conductive optical semiconductor coating
CN108659622B (zh) * 2017-03-28 2021-05-04 京东方科技集团股份有限公司 导电油墨、显示基板及其制造方法和显示装置
CN107556510B (zh) * 2017-08-29 2020-06-05 浙江理工大学 一种柔性传感器电极的制备方法
KR101947164B1 (ko) * 2018-06-05 2019-02-13 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
CN109307897B (zh) * 2018-11-23 2021-04-27 淮阴工学院 一种可绕折的光扩散膜的制备方法
CN109633950A (zh) * 2019-02-20 2019-04-16 福州大学 一种用于集成成像2d/3d可切换显示的液晶透镜及其制备方法
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