JP2013531807A5 - - Google Patents
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- Publication number
- JP2013531807A5 JP2013531807A5 JP2013511316A JP2013511316A JP2013531807A5 JP 2013531807 A5 JP2013531807 A5 JP 2013531807A5 JP 2013511316 A JP2013511316 A JP 2013511316A JP 2013511316 A JP2013511316 A JP 2013511316A JP 2013531807 A5 JP2013531807 A5 JP 2013531807A5
- Authority
- JP
- Japan
- Prior art keywords
- thermal stress
- glass
- stress birefringence
- sensitivity
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008646 thermal stress Effects 0.000 claims 17
- 239000011521 glass Substances 0.000 claims 12
- 230000035945 sensitivity Effects 0.000 claims 12
- 238000003384 imaging method Methods 0.000 claims 4
- 230000035882 stress Effects 0.000 claims 4
- 230000003287 optical effect Effects 0.000 claims 3
- 230000031700 light absorption Effects 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000011156 evaluation Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/784,520 US8649094B2 (en) | 2010-05-21 | 2010-05-21 | Low thermal stress birefringence imaging lens |
| US12/784,520 | 2010-05-21 | ||
| PCT/US2011/036925 WO2011146566A1 (en) | 2010-05-21 | 2011-05-18 | Low thermal stress birefringence imaging lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013531807A JP2013531807A (ja) | 2013-08-08 |
| JP2013531807A5 true JP2013531807A5 (OSRAM) | 2014-07-03 |
Family
ID=44121309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013511316A Pending JP2013531807A (ja) | 2010-05-21 | 2011-05-18 | 低熱応力複屈折画像レンズ |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8649094B2 (OSRAM) |
| EP (1) | EP2572223B1 (OSRAM) |
| JP (1) | JP2013531807A (OSRAM) |
| CN (1) | CN102918442B (OSRAM) |
| WO (1) | WO2011146566A1 (OSRAM) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8649094B2 (en) * | 2010-05-21 | 2014-02-11 | Eastman Kodak Company | Low thermal stress birefringence imaging lens |
| US9492969B2 (en) * | 2010-05-28 | 2016-11-15 | Lawrence Livermore National Security, Llc | High resolution projection micro stereolithography system and method |
| GB2488245B (en) * | 2011-02-21 | 2018-12-05 | Zeiss Carl Optronics Gmbh | Optics for thermal imaging cameras |
| US8749796B2 (en) * | 2011-08-09 | 2014-06-10 | Primesense Ltd. | Projectors of structured light |
| CN104868361B (zh) * | 2011-10-11 | 2019-07-16 | 深圳光峰科技股份有限公司 | 光源系统与激光光源 |
| US8830580B2 (en) * | 2011-10-27 | 2014-09-09 | Eastman Kodak Company | Low thermal stress catadioptric imaging optics |
| US10254521B2 (en) | 2011-12-13 | 2019-04-09 | Signify Holding B.V. | Optical collimator for LED lights |
| JP6230222B2 (ja) * | 2012-10-12 | 2017-11-15 | キヤノン株式会社 | レンズアレイ光学系及びレンズアレイの製造方法 |
| JP6471424B2 (ja) * | 2013-11-13 | 2019-02-20 | セイコーエプソン株式会社 | プロジェクター |
| US9392153B2 (en) * | 2013-12-24 | 2016-07-12 | Lytro, Inc. | Plenoptic camera resolution |
| JP2015228015A (ja) * | 2014-05-02 | 2015-12-17 | キヤノン株式会社 | 画像投射装置 |
| JP2015230989A (ja) * | 2014-06-05 | 2015-12-21 | 株式会社リコー | 撮像モジュール及び撮像装置 |
| CN112946974B (zh) | 2014-12-31 | 2022-11-08 | 杜比实验室特许公司 | 用于图像投影仪的高对比度分立输入棱镜 |
| EP4050895A1 (en) | 2015-05-06 | 2022-08-31 | Dolby Laboratories Licensing Corp. | Thermal compensation in image projection |
| CN105511093B (zh) * | 2015-06-18 | 2018-02-09 | 广州优视网络科技有限公司 | 3d成像方法及装置 |
| WO2017127844A1 (en) * | 2016-01-22 | 2017-07-27 | Hera Systems, Inc. | Imaging system optimized for nanosatellites with multiple cameras and image stabilization and pixel shifting |
| US10475171B2 (en) | 2016-01-22 | 2019-11-12 | Hera Systems, Inc. | Multi-camera imaging system for nanosatellites |
| US10670853B2 (en) | 2016-01-22 | 2020-06-02 | Hera Systems, Inc. | Imaging system with an optical path and telescope shape optimized for nanosatellites |
| US10338376B2 (en) | 2016-01-22 | 2019-07-02 | Hera Systems, Inc. | Image stabilization and pixel shifting for a nanosatellite imaging system |
| US20210168352A1 (en) | 2016-01-26 | 2021-06-03 | Imax Corporation | Stereo image projection with high intra-frame contrast |
| DE102016108040B4 (de) * | 2016-04-29 | 2018-05-09 | Sypro Optics Gmbh | Beleuchtungseinrichtung für Gestenerkennungsvorrichtung |
| US10875247B2 (en) | 2016-07-15 | 2020-12-29 | Lawrence Livermore National Securitv. LLC | Multi-beam resin curing system and method for whole-volume additive manufacturing |
| KR102464368B1 (ko) * | 2017-11-07 | 2022-11-07 | 삼성전자주식회사 | 메타 프로젝터 및 이를 포함하는 전자 장치 |
| US11889234B2 (en) | 2017-11-14 | 2024-01-30 | Imax Theatres International Limited | Light conditioning of direct view display for cinema |
| CN111492293B (zh) * | 2017-12-19 | 2022-07-29 | 松下知识产权经营株式会社 | 投影镜头系统以及图像投影装置 |
| TWI687717B (zh) * | 2018-04-11 | 2020-03-11 | 大立光電股份有限公司 | 光學影像鏡頭、取像裝置及電子裝置 |
| DE202019005386U1 (de) * | 2018-04-17 | 2020-06-19 | Saint-Gobain Glass France | Optische Sensoranordnung, insbesondere für ein Kraftfahrzeug |
| CN108801930B (zh) * | 2018-05-30 | 2020-09-08 | 华中科技大学 | 一种高时间分辨率的穆勒矩阵椭偏测量装置与方法 |
| EP3712686A1 (en) * | 2019-03-18 | 2020-09-23 | LIMO Display GmbH | Device for generating a linear intensity distribution in a working plane |
| US12467939B2 (en) * | 2022-07-15 | 2025-11-11 | The George Washington University | Optical probe for measuring wall-shear stress |
| EP4573396A2 (en) * | 2022-08-19 | 2025-06-25 | Nil Technology ApS | Optical lens systems and imaging systems incorporating the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US583336A (en) | 1897-05-25 | Paul rudolph | ||
| US4441791A (en) | 1980-09-02 | 1984-04-10 | Texas Instruments Incorporated | Deformable mirror light modulator |
| GB2153543B (en) * | 1983-12-28 | 1988-09-01 | Canon Kk | A projection exposure apparatus |
| US4704011A (en) | 1985-12-13 | 1987-11-03 | Lockheed Missiles & Space Company, Inc. | Three-glass photographic objective color-corrected at four wavelengths |
| US4770477A (en) * | 1986-12-04 | 1988-09-13 | The Perkin-Elmer Corporation | Lens usable in the ultraviolet |
| US5083857A (en) | 1990-06-29 | 1992-01-28 | Texas Instruments Incorporated | Multi-level deformable mirror device |
| US5172275A (en) | 1990-12-14 | 1992-12-15 | Eastman Kodak Company | Apochromatic relay lens systems suitable for use in a high definition telecine apparatus |
| US5576854A (en) | 1993-11-12 | 1996-11-19 | Hughes-Jvc Technology Corporation | Liquid crystal light valve projector with improved contrast ratio and with 0.27 wavelength compensation for birefringence in the liquid crystal light valve |
| US5625495A (en) * | 1994-12-07 | 1997-04-29 | U.S. Precision Lens Inc. | Telecentric lens systems for forming an image of an object composed of pixels |
| US5535047A (en) | 1995-04-18 | 1996-07-09 | Texas Instruments Incorporated | Active yoke hidden hinge digital micromirror device |
| US6317268B1 (en) | 1999-11-23 | 2001-11-13 | Eastman Kodak Company | Movie projection lens |
| US7187503B2 (en) * | 1999-12-29 | 2007-03-06 | Carl Zeiss Smt Ag | Refractive projection objective for immersion lithography |
| EP1134606B1 (de) | 2000-01-18 | 2002-04-10 | Isco-Optic Gmbh | Projektionsobjektiv |
| DE10123725A1 (de) | 2001-05-15 | 2002-11-21 | Zeiss Carl | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
| US6785051B2 (en) | 2001-07-18 | 2004-08-31 | Corning Incorporated | Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures |
| US6547396B1 (en) | 2001-12-27 | 2003-04-15 | Infocus Corporation | Stereographic projection system |
| US6909473B2 (en) | 2002-01-07 | 2005-06-21 | Eastman Kodak Company | Display apparatus and method |
| US6774983B2 (en) * | 2002-08-12 | 2004-08-10 | Anvik Corporation | Distributed projection system |
| US6958864B2 (en) | 2002-08-22 | 2005-10-25 | Asml Netherlands B.V. | Structures and methods for reducing polarization aberration in integrated circuit fabrication systems |
| US6758565B1 (en) * | 2003-03-20 | 2004-07-06 | Eastman Kodak Company | Projection apparatus using telecentric optics |
| DE10316428A1 (de) | 2003-04-08 | 2004-10-21 | Carl Zeiss Smt Ag | Katadioptrisches Reduktionsobjektiv |
| US6839181B1 (en) * | 2003-06-25 | 2005-01-04 | Eastman Kodak Company | Display apparatus |
| US7832869B2 (en) | 2003-10-21 | 2010-11-16 | Barco N.V. | Method and device for performing stereoscopic image display based on color selective filters |
| US7170574B2 (en) | 2003-12-11 | 2007-01-30 | Jds Uniphase Corporation | Trim retarders incorporating negative birefringence |
| US7466489B2 (en) * | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
| JP4868209B2 (ja) * | 2004-11-10 | 2012-02-01 | 株式会社ニコン | 投影光学系、露光装置、および露光方法 |
| US20060218971A1 (en) * | 2005-02-10 | 2006-10-05 | Rolf Martin | Synthetic quartz glass and process for producing a quartz glass body |
| JP4738879B2 (ja) * | 2005-03-10 | 2011-08-03 | 富士フイルム株式会社 | 画像読取用レンズおよび画像読取装置 |
| US7357511B2 (en) | 2005-03-23 | 2008-04-15 | 3M Innovative Properties Company | Stress birefringence compensation in polarizing beamsplitters and systems using same |
| US7518662B2 (en) | 2005-05-22 | 2009-04-14 | Real D | Contrast enhancement for liquid crystal based projection systems |
| EP2501139A3 (en) | 2005-05-26 | 2014-01-08 | RealD Inc. | Ghost-compensation for improved stereoscopic projection |
| US7528906B2 (en) | 2006-01-23 | 2009-05-05 | Real D | Achromatic polarization switches |
| JP4931628B2 (ja) | 2006-03-09 | 2012-05-16 | セイコーインスツル株式会社 | 照明装置及びこれを備える表示装置 |
| CN101479637B (zh) | 2006-05-05 | 2011-09-21 | 康宁股份有限公司 | 准远心成像透镜的畸变调谐 |
| DE102008051252B4 (de) * | 2008-10-10 | 2016-09-08 | Sypro Optics Gmbh | Projektionsobjektiv und Projektor |
| US8504328B2 (en) * | 2010-05-21 | 2013-08-06 | Eastman Kodak Company | Designing lenses using stress birefringence performance criterion |
| US8649094B2 (en) * | 2010-05-21 | 2014-02-11 | Eastman Kodak Company | Low thermal stress birefringence imaging lens |
| US8287129B2 (en) * | 2010-05-21 | 2012-10-16 | Eastman Kodak Company | Low thermal stress birefringence imaging system |
| US8786943B2 (en) * | 2011-10-27 | 2014-07-22 | Eastman Kodak Company | Low thermal stress catadioptric imaging system |
| US8830580B2 (en) * | 2011-10-27 | 2014-09-09 | Eastman Kodak Company | Low thermal stress catadioptric imaging optics |
-
2010
- 2010-05-21 US US12/784,520 patent/US8649094B2/en active Active
-
2011
- 2011-05-18 EP EP11721626.7A patent/EP2572223B1/en active Active
- 2011-05-18 CN CN201180024845.9A patent/CN102918442B/zh active Active
- 2011-05-18 WO PCT/US2011/036925 patent/WO2011146566A1/en not_active Ceased
- 2011-05-18 JP JP2013511316A patent/JP2013531807A/ja active Pending
-
2013
- 2013-10-01 US US14/042,755 patent/US9069105B2/en active Active
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