JP2013522806A5 - - Google Patents

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Publication number
JP2013522806A5
JP2013522806A5 JP2012557176A JP2012557176A JP2013522806A5 JP 2013522806 A5 JP2013522806 A5 JP 2013522806A5 JP 2012557176 A JP2012557176 A JP 2012557176A JP 2012557176 A JP2012557176 A JP 2012557176A JP 2013522806 A5 JP2013522806 A5 JP 2013522806A5
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JP
Japan
Prior art keywords
region
write
compensation values
writing
features
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2012557176A
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English (en)
Japanese (ja)
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JP2013522806A (ja
JP5615386B2 (ja
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Application filed filed Critical
Priority claimed from PCT/US2011/027590 external-priority patent/WO2011112610A1/en
Publication of JP2013522806A publication Critical patent/JP2013522806A/ja
Publication of JP2013522806A5 publication Critical patent/JP2013522806A5/ja
Application granted granted Critical
Publication of JP5615386B2 publication Critical patent/JP5615386B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012557176A 2010-03-08 2011-03-08 基板への繰返しパターンの特徴の書込み Expired - Fee Related JP5615386B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US31159710P 2010-03-08 2010-03-08
US61/311,597 2010-03-08
PCT/US2011/027590 WO2011112610A1 (en) 2010-03-08 2011-03-08 Writing repeating patterns of features to a substrate

Publications (3)

Publication Number Publication Date
JP2013522806A JP2013522806A (ja) 2013-06-13
JP2013522806A5 true JP2013522806A5 (cg-RX-API-DMAC7.html) 2014-04-24
JP5615386B2 JP5615386B2 (ja) 2014-10-29

Family

ID=44531142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012557176A Expired - Fee Related JP5615386B2 (ja) 2010-03-08 2011-03-08 基板への繰返しパターンの特徴の書込み

Country Status (5)

Country Link
US (1) US8300505B2 (cg-RX-API-DMAC7.html)
JP (1) JP5615386B2 (cg-RX-API-DMAC7.html)
CN (1) CN102859594A (cg-RX-API-DMAC7.html)
SG (1) SG184003A1 (cg-RX-API-DMAC7.html)
WO (1) WO2011112610A1 (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090118745A (ko) * 2008-05-14 2009-11-18 삼성전자주식회사 서보 패턴 오버헤드 최적화 방법 및 이를 이용한 디스크드라이브

Family Cites Families (24)

* Cited by examiner, † Cited by third party
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US5450383A (en) * 1994-05-26 1995-09-12 International Business Machines Corporation Monitoring and adjusting laser write power in an optical disk recorder using pulse-width modulated power level checking signals
JP3469422B2 (ja) * 1996-02-23 2003-11-25 株式会社東芝 荷電ビーム描画方法及び描画装置
JP3729920B2 (ja) * 1996-03-18 2005-12-21 パイオニア株式会社 情報記録媒体並びにその記録装置及び再生装置
US20010028620A1 (en) * 1997-12-24 2001-10-11 Guerra John M. Information storage systems utilizing media with optically-differentiated data sites
US6014200A (en) * 1998-02-24 2000-01-11 Nikon Corporation High throughput electron beam lithography system
US6313476B1 (en) * 1998-12-14 2001-11-06 Kabushiki Kaisha Toshiba Charged beam lithography system
JP3783909B2 (ja) * 1999-05-20 2006-06-07 パイオニア株式会社 カッティング装置、情報記録媒体、情報記録装置及び情報記録方法並びに、カッティング方法
US6639177B2 (en) * 2001-03-29 2003-10-28 Gsi Lumonics Corporation Method and system for processing one or more microstructures of a multi-material device
US6738396B2 (en) * 2001-07-24 2004-05-18 Gsi Lumonics Ltd. Laser based material processing methods and scalable architecture for material processing
TW497138B (en) * 2001-08-28 2002-08-01 Winbond Electronics Corp Method for improving consistency of critical dimension
US6977791B2 (en) * 2002-03-23 2005-12-20 Kla-Tencor Technologies Corporation Media servowriting system
JP2004177783A (ja) * 2002-11-28 2004-06-24 Fuji Photo Film Co Ltd 電子ビーム描画方法
US7149043B2 (en) * 2002-12-27 2006-12-12 Matsushita Electric Industrial Co., Ltd. Methods for self-servowriting using write-current variation
JP2006512758A (ja) * 2002-12-30 2006-04-13 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ プロセス窓を最適化するリソグラフィ・パラメータの決定方法
JP2005004906A (ja) * 2003-06-13 2005-01-06 Ricoh Co Ltd 情報記録方法及び情報記録装置
US6995940B2 (en) * 2003-07-22 2006-02-07 Matsushita Electric Industrial Co., Ltd. Systems for WORF improvement in conditional servowriting
US7526357B2 (en) * 2004-12-13 2009-04-28 The Aerospace Corporation Pulse modulation laser writing system
US20070177433A1 (en) * 2005-09-07 2007-08-02 Jean-Francois Poirier Method and system for data security of recording media
JP4476975B2 (ja) * 2005-10-25 2010-06-09 株式会社ニューフレアテクノロジー 荷電粒子ビーム照射量演算方法、荷電粒子ビーム描画方法、プログラム及び荷電粒子ビーム描画装置
JP4843425B2 (ja) * 2006-09-06 2011-12-21 エルピーダメモリ株式会社 可変成形型電子ビーム描画装置
JP5133087B2 (ja) * 2007-02-23 2013-01-30 株式会社ニューフレアテクノロジー 半導体装置の製造方法
JP2009237001A (ja) * 2008-03-26 2009-10-15 Fujifilm Corp 電子ビーム描画方法、微細パターン描画システム、凹凸パターン担持体の製造方法および磁気ディスク媒体の製造方法
JP2009245534A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp インプリント用モールド構造体、並びに磁気記録媒体及びその製造方法
US8320690B2 (en) * 2010-06-10 2012-11-27 Ceva D.S.P. Ltd. System, data structure, and method for simultaneously retrieving multi-dimensional data with zero contention

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