JP2013506300A5 - - Google Patents

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Publication number
JP2013506300A5
JP2013506300A5 JP2012531072A JP2012531072A JP2013506300A5 JP 2013506300 A5 JP2013506300 A5 JP 2013506300A5 JP 2012531072 A JP2012531072 A JP 2012531072A JP 2012531072 A JP2012531072 A JP 2012531072A JP 2013506300 A5 JP2013506300 A5 JP 2013506300A5
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JP
Japan
Prior art keywords
gas injector
tubular straw
lumen
tubular
connector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012531072A
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English (en)
Japanese (ja)
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JP2013506300A (ja
JP5802672B2 (ja
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Publication date
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Priority claimed from PCT/US2010/050217 external-priority patent/WO2011038242A2/en
Publication of JP2013506300A publication Critical patent/JP2013506300A/ja
Publication of JP2013506300A5 publication Critical patent/JP2013506300A5/ja
Application granted granted Critical
Publication of JP5802672B2 publication Critical patent/JP5802672B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012531072A 2009-09-25 2010-09-24 ハイブリッドガスインジェクタ Active JP5802672B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US27736109P 2009-09-25 2009-09-25
US61/277,361 2009-09-25
PCT/US2010/050217 WO2011038242A2 (en) 2009-09-25 2010-09-24 Hybrid gas injector

Publications (3)

Publication Number Publication Date
JP2013506300A JP2013506300A (ja) 2013-02-21
JP2013506300A5 true JP2013506300A5 (enExample) 2013-11-14
JP5802672B2 JP5802672B2 (ja) 2015-10-28

Family

ID=43796508

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012531072A Active JP5802672B2 (ja) 2009-09-25 2010-09-24 ハイブリッドガスインジェクタ

Country Status (6)

Country Link
US (1) US20110232568A1 (enExample)
EP (1) EP2481082B1 (enExample)
JP (1) JP5802672B2 (enExample)
KR (1) KR20120085745A (enExample)
CN (1) CN102656666B (enExample)
WO (1) WO2011038242A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150013139A (ko) * 2012-04-27 2015-02-04 알케마 인코포레이티드 금속-산화물 증기 코팅 유리 용기를 위한 후드
JP6176732B2 (ja) * 2014-03-20 2017-08-09 株式会社日立国際電気 ガス供給部、基板処理装置及び半導体装置の製造方法
US20170167023A1 (en) * 2015-12-09 2017-06-15 Lam Research Corporation Silicon or silicon carbide gas injector for substrate processing systems
AT518081B1 (de) * 2015-12-22 2017-07-15 Sico Tech Gmbh Injektor aus Silizium für die Halbleiterindustrie
US11993847B2 (en) * 2020-01-08 2024-05-28 Asm Ip Holding B.V. Injector
KR20230026148A (ko) * 2021-08-17 2023-02-24 삼성전자주식회사 기판 처리 장치 및 이를 이용한 반도체 소자 제조 방법
CN115386861B (zh) * 2022-10-27 2023-04-07 盛吉盛(宁波)半导体科技有限公司 一种化学气相沉积设备的导气管及其制备方法

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3761114A (en) * 1971-08-30 1973-09-25 Victaulic Co Ltd Pipe to flange couplings
US3942141A (en) * 1972-05-26 1976-03-02 Licentia Patent-Verwaltungs-G.M.B.H. Flange
FR2490246A1 (fr) * 1980-09-17 1982-03-19 Cit Alcatel Dispositif de deposition chimique activee sous plasma
US4448448A (en) * 1982-03-22 1984-05-15 Raphael Theresa Pollia Coupling system
JPH0719143Y2 (ja) * 1990-04-26 1995-05-01 日本エー・エス・エム株式会社 ガス導入装置を有するｃｖｄ装置
US5318633A (en) * 1991-03-07 1994-06-07 Tokyo Electron Sagami Limited Heat treating apparatus
JPH04280420A (ja) * 1991-03-07 1992-10-06 Toshiba Corp 熱処理装置
JPH05243161A (ja) * 1992-01-29 1993-09-21 Nec Corp 気相成長装置及びエピタキシャル膜の成長方法
US5441570A (en) * 1993-06-22 1995-08-15 Jein Technics Co., Ltd. Apparatus for low pressure chemical vapor deposition
US5578132A (en) * 1993-07-07 1996-11-26 Tokyo Electron Kabushiki Kaisha Apparatus for heat treating semiconductors at normal pressure and low pressure
JPH09260298A (ja) * 1996-03-18 1997-10-03 Kokusai Electric Co Ltd 半導体製造装置の反応ガス導入ノズル支持構造
JPH10284426A (ja) * 1997-04-10 1998-10-23 Kokusai Electric Co Ltd ノズル
JP2001230212A (ja) * 2000-02-16 2001-08-24 Tokyo Electron Ltd 縦型熱処理装置
JP2001267255A (ja) * 2000-03-21 2001-09-28 Nec Corp 気相成長装置及び気相成長方法
JP2001351871A (ja) * 2000-06-09 2001-12-21 Asm Japan Kk 半導体製造装置
US6455395B1 (en) * 2000-06-30 2002-09-24 Integrated Materials, Inc. Method of fabricating silicon structures including fixtures for supporting wafers
US6450346B1 (en) 2000-06-30 2002-09-17 Integrated Materials, Inc. Silicon fixtures for supporting wafers during thermal processing
JP3572247B2 (ja) * 2000-10-06 2004-09-29 東芝セラミックス株式会社 半導体熱処理炉用ガス導入管
JP2002334868A (ja) * 2001-05-10 2002-11-22 Hitachi Kokusai Electric Inc 基板処理装置および半導体装置の製造方法
US20020170487A1 (en) * 2001-05-18 2002-11-21 Raanan Zehavi Pre-coated silicon fixtures used in a high temperature process
US7083694B2 (en) * 2003-04-23 2006-08-01 Integrated Materials, Inc. Adhesive of a silicon and silica composite particularly useful for joining silicon parts
US6830449B1 (en) * 2004-02-02 2004-12-14 Sis Microelectronics Corporation Injector robot for replacing a gas injector in a furnace
JP2006080256A (ja) * 2004-09-09 2006-03-23 Hitachi Kokusai Electric Inc 基板処理装置
WO2006030857A1 (ja) * 2004-09-16 2006-03-23 Hitachi Kokusai Electric Inc. 熱処理装置及び基板の製造方法
US20060185589A1 (en) * 2005-02-23 2006-08-24 Raanan Zehavi Silicon gas injector and method of making
US7972703B2 (en) * 2005-03-03 2011-07-05 Ferrotec (Usa) Corporation Baffle wafers and randomly oriented polycrystalline silicon used therefor
US7910494B2 (en) * 2006-03-29 2011-03-22 Tokyo Electron Limited Thermal processing furnace, gas delivery system therefor, and methods for delivering a process gas thereto
US8070880B2 (en) * 2007-10-22 2011-12-06 Hitachi Kokusai Electric, Inc. Substrate processing apparatus
JP5237133B2 (ja) * 2008-02-20 2013-07-17 株式会社日立国際電気 基板処理装置

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