JP2013209702A - 蒸着装置及び蒸着方法 - Google Patents

蒸着装置及び蒸着方法 Download PDF

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Publication number
JP2013209702A
JP2013209702A JP2012080035A JP2012080035A JP2013209702A JP 2013209702 A JP2013209702 A JP 2013209702A JP 2012080035 A JP2012080035 A JP 2012080035A JP 2012080035 A JP2012080035 A JP 2012080035A JP 2013209702 A JP2013209702 A JP 2013209702A
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JP
Japan
Prior art keywords
vapor deposition
substrate
crucible
processed
interval
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012080035A
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English (en)
Japanese (ja)
Inventor
Kanako Hida
加奈子 肥田
Ryohei Kakiuchi
良平 垣内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP2012080035A priority Critical patent/JP2013209702A/ja
Priority to PCT/JP2012/083432 priority patent/WO2013145483A1/fr
Priority to TW102100260A priority patent/TW201339334A/zh
Publication of JP2013209702A publication Critical patent/JP2013209702A/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
JP2012080035A 2012-03-30 2012-03-30 蒸着装置及び蒸着方法 Pending JP2013209702A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012080035A JP2013209702A (ja) 2012-03-30 2012-03-30 蒸着装置及び蒸着方法
PCT/JP2012/083432 WO2013145483A1 (fr) 2012-03-30 2012-12-25 Appareil de dépôt et procédé de dépôt
TW102100260A TW201339334A (zh) 2012-03-30 2013-01-04 蒸鍍裝置及蒸鍍方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012080035A JP2013209702A (ja) 2012-03-30 2012-03-30 蒸着装置及び蒸着方法

Publications (1)

Publication Number Publication Date
JP2013209702A true JP2013209702A (ja) 2013-10-10

Family

ID=49258812

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012080035A Pending JP2013209702A (ja) 2012-03-30 2012-03-30 蒸着装置及び蒸着方法

Country Status (3)

Country Link
JP (1) JP2013209702A (fr)
TW (1) TW201339334A (fr)
WO (1) WO2013145483A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107663626A (zh) * 2017-10-20 2018-02-06 爱发科豪威光电薄膜科技(深圳)有限公司 蒸发源装置以及溅射镀膜设备

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56160964U (fr) * 1980-05-02 1981-11-30
JPH06212424A (ja) * 1993-01-13 1994-08-02 Ishikawajima Harima Heavy Ind Co Ltd 連続真空蒸着装置
JPH09143726A (ja) * 1995-11-28 1997-06-03 Ishikawajima Harima Heavy Ind Co Ltd 連続真空蒸着装置
JPH09143697A (ja) * 1995-11-20 1997-06-03 Ishikawajima Harima Heavy Ind Co Ltd 真空蒸着装置の成膜方法および真空蒸着装置
JP2004288463A (ja) * 2003-03-20 2004-10-14 Semiconductor Energy Lab Co Ltd 製造装置
JP2005281808A (ja) * 2004-03-30 2005-10-13 Tohoku Pioneer Corp 成膜源、成膜装置、成膜方法、有機ｅｌパネルの製造方法、有機ｅｌパネル
JP2005325391A (ja) * 2004-05-13 2005-11-24 Ulvac Japan Ltd 有機薄膜の成膜装置
JP2006274370A (ja) * 2005-03-30 2006-10-12 Hitachi Zosen Corp 蒸着装置
JP2008088490A (ja) * 2006-09-29 2008-04-17 Tokyo Electron Ltd 蒸着装置、蒸着装置の制御装置、蒸着装置の制御方法、蒸着装置の使用方法および吹き出し口の製造方法
JP2008169456A (ja) * 2007-01-15 2008-07-24 Matsushita Electric Works Ltd 真空蒸着装置

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56160964U (fr) * 1980-05-02 1981-11-30
JPH06212424A (ja) * 1993-01-13 1994-08-02 Ishikawajima Harima Heavy Ind Co Ltd 連続真空蒸着装置
JPH09143697A (ja) * 1995-11-20 1997-06-03 Ishikawajima Harima Heavy Ind Co Ltd 真空蒸着装置の成膜方法および真空蒸着装置
JPH09143726A (ja) * 1995-11-28 1997-06-03 Ishikawajima Harima Heavy Ind Co Ltd 連続真空蒸着装置
JP2004288463A (ja) * 2003-03-20 2004-10-14 Semiconductor Energy Lab Co Ltd 製造装置
JP2005281808A (ja) * 2004-03-30 2005-10-13 Tohoku Pioneer Corp 成膜源、成膜装置、成膜方法、有機ｅｌパネルの製造方法、有機ｅｌパネル
JP2005325391A (ja) * 2004-05-13 2005-11-24 Ulvac Japan Ltd 有機薄膜の成膜装置
JP2006274370A (ja) * 2005-03-30 2006-10-12 Hitachi Zosen Corp 蒸着装置
JP2008088490A (ja) * 2006-09-29 2008-04-17 Tokyo Electron Ltd 蒸着装置、蒸着装置の制御装置、蒸着装置の制御方法、蒸着装置の使用方法および吹き出し口の製造方法
JP2008169456A (ja) * 2007-01-15 2008-07-24 Matsushita Electric Works Ltd 真空蒸着装置

Also Published As

Publication number Publication date
WO2013145483A1 (fr) 2013-10-03
TW201339334A (zh) 2013-10-01

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