JP2013184256A - Polishing surface plate, and lapping device - Google Patents

Polishing surface plate, and lapping device Download PDF

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JP2013184256A
JP2013184256A JP2012051628A JP2012051628A JP2013184256A JP 2013184256 A JP2013184256 A JP 2013184256A JP 2012051628 A JP2012051628 A JP 2012051628A JP 2012051628 A JP2012051628 A JP 2012051628A JP 2013184256 A JP2013184256 A JP 2013184256A
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polishing
workpiece
polishing surface
surface plate
plate
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JP5848640B2 (en
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Hideji Hotta
秀児 堀田
Hisaya Iwata
尚也 岩田
Kazuo Kobayashi
一雄 小林
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Disco Corp
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Disco Corp
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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a polishing surface plate and a lapping device, capable of improving a polishing efficiency by vibrating a polishing surface of the polishing surface plate without forming the device in a massive configuration and allowing abrasive grains to easily intrude between the polishing surface and a workpiece.SOLUTION: Polishing is performed by inserting vibration bodies 300 equipped with ultrasonic vibrators 333 in a plurality of through holes 220 formed in a polishing surface plate 20 and by rotating the polishing surface plate 20 while vibrating polishing action members 310 arranged on upper parts of the vibration bodies 300 by the vibration bodies 300. A polishing surface of the polishing surface plate 20 is in a vibrating state by vibrating the plurality of small polishing action members 310 without vibrating the entire polishing surface plate 20, so that burden required for vibration is reduced.

Description

本発明は、半導体ウェーハ、磁気ヘッド、電子部品、光学部品等の各種被加工物の研磨に使用される研磨定盤およびそれを具備するラッピング装置に関する。   The present invention relates to a polishing surface plate used for polishing various workpieces such as a semiconductor wafer, a magnetic head, an electronic component, and an optical component, and a lapping apparatus including the same.

半導体デバイス、電子部品、光学部品等の製造工程においては、被加工物の表面をラッピング装置によって研磨し、研磨された被加工物の表面にLSI等のデバイスが形成されたり、当該表面が光学面として使用されたりする。ラッピング装置においては、一般的には、回転する研磨定盤上に砥液を供給しながら、当該研磨定盤に被加工物を接触させて研磨加工を実施している。   In the manufacturing process of semiconductor devices, electronic components, optical components, etc., the surface of the workpiece is polished by a lapping device, and a device such as LSI is formed on the polished workpiece surface, or the surface is an optical surface. Or used as In a lapping apparatus, generally, polishing is performed by bringing a workpiece into contact with the polishing surface plate while supplying an abrasive liquid onto the rotating polishing surface plate.

このような研磨加工においては、研磨効率がより高い方が、加工時間が短縮され製造コストの低減のためには望ましい。研磨効率を上げるためには、研磨圧力や研磨速度を増加させるといった手法が考えられるが、研磨圧力や研磨速度を増加させると砥液中の砥粒が被加工物と研磨定盤の間に十分に供給されにくくなることから、研磨が不均一になり、研磨効率を増加させることができないという問題がある。このような問題を解消するために、研磨定盤またはCMPパッドに振動を付加する研磨装置が提案されている(例えば特許文献1、2参照)。   In such a polishing process, higher polishing efficiency is desirable for shortening the processing time and reducing the manufacturing cost. In order to increase the polishing efficiency, a method such as increasing the polishing pressure or the polishing rate can be considered, but if the polishing pressure or the polishing rate is increased, the abrasive grains in the abrasive liquid are sufficiently between the workpiece and the polishing platen. Accordingly, there is a problem in that polishing becomes non-uniform and polishing efficiency cannot be increased. In order to solve such a problem, a polishing apparatus that applies vibration to a polishing surface plate or a CMP pad has been proposed (see, for example, Patent Documents 1 and 2).

特開平10−156706号公報JP-A-10-156706 特開平11−129155号公報JP-A-11-129155

一般的に被加工物を研磨するための研磨定盤は、研磨効率を上げるためと、一度に加工できる枚数を増加させるためにその外径が大きくなる傾向にあり、研磨定盤全体を振動させることは難しい。また、研磨定盤全体を振動させようとすると振動を付加する電源を含む装置が大規模になり、高価なものになってしまう。   In general, a polishing surface plate for polishing a workpiece tends to increase its outer diameter in order to increase polishing efficiency and increase the number of sheets that can be processed at once, and vibrates the entire polishing surface plate. It ’s difficult. Further, if the entire polishing platen is vibrated, an apparatus including a power source for applying vibration becomes large and expensive.

本発明は上記事情に鑑みてなされたものであり、その主たる技術的課題は、装置を大規模な構成にすることなく、研磨定盤の研磨面を振動させることによって、研磨面と被加工物の間に砥粒が侵入しやすくして研磨効率を向上させることが可能な研磨定盤およびラッピング装置を提供することにある。   The present invention has been made in view of the above circumstances, and the main technical problem thereof is to vibrate the polishing surface and the workpiece by vibrating the polishing surface of the polishing platen without making the apparatus large-scale configuration. It is an object of the present invention to provide a polishing surface plate and a lapping apparatus capable of improving the polishing efficiency by making it easy for abrasive grains to enter between the two.

本発明の研磨定盤は、被加工物を研磨する研磨面を有し、被加工物を該研磨面に当接させて研磨する研磨定盤であって、該研磨定盤の前記研磨面には該研磨定盤を貫通する複数の貫通孔が形成され、該複数の貫通孔には超音波振動子を備えた振動体が挿入されており、該振動体の上部には、該振動体が前記貫通孔に挿入された状態で、該貫通孔を該研磨定盤の前記研磨面との段差が生じない状態で塞ぐ研磨作用部材が配設され、前記超音波振動子に電力を供給する電力供給手段を備え、該電力供給手段から前記超音波振動子に電力が供給され、該超音波振動子の駆動に伴って前記研磨作用部材が振動することを特徴とする(請求項1)。   The polishing surface plate of the present invention is a polishing surface plate that has a polishing surface for polishing a workpiece and polishes the workpiece by bringing the workpiece into contact with the polishing surface. Is formed with a plurality of through holes penetrating the polishing surface plate, and a vibrating body including an ultrasonic vibrator is inserted into the plurality of through holes, and the vibrating body is disposed above the vibrating body. A power for supplying power to the ultrasonic transducer is provided, wherein a polishing member is installed to close the through hole without being stepped from the polishing surface of the polishing platen while being inserted into the through hole. Supply means is provided, and electric power is supplied from the power supply means to the ultrasonic transducer, and the polishing member vibrates as the ultrasonic transducer is driven (Claim 1).

また、本発明の研磨定盤は、前記貫通孔は、前記研磨面に形成された所定の深さを有する第1の円形孔と、該第1の円形孔の底部に該第1の円形孔と同心円状に形成され、該第1の円形孔よりも小さい直径を有するとともに前記研磨定盤を貫通する第2の円形孔と、から構成され、前記振動体は、前記第1の円形孔と同じ直径を有する円板状に形成された前記研磨作用部材と、上面に該研磨作用部材が同心状に装着され該研磨作用部材と同じ直径を有する研磨作用部材装着部と、該研磨作用部材装着部の下面に前記第2の円形孔より小さい直径を有する円柱状に形成されているとともに前記超音波振動子が装着された振動部と、から少なくとも構成され、前記振動部からフランジ状に拡幅した前記研磨作用部材装着部の下面の外周縁部にはリング状の弾性部材が装着され、前記振動体を前記貫通孔に挿入した際に、前記研磨作用部材装着部の下面の外周縁部に装着された前記リング状の弾性部材が前記第1の円形孔の底部に載置されるとともに、前記振動部が前記第2の円形孔に挿入されることを特徴とする(請求項2)。   In the polishing platen of the present invention, the through hole has a first circular hole having a predetermined depth formed in the polishing surface, and the first circular hole at the bottom of the first circular hole. And a second circular hole having a diameter smaller than that of the first circular hole and penetrating through the polishing surface plate, and the vibrating body includes the first circular hole and the second circular hole. The polishing member formed in the shape of a disk having the same diameter, the polishing member mounted concentrically on the upper surface, and a polishing member mounting portion having the same diameter as the polishing member, and the polishing member mounting And a vibrating portion having a diameter smaller than that of the second circular hole on the lower surface of the portion and having the ultrasonic transducer attached thereto, and having a flange-like width from the vibrating portion. The outer peripheral edge of the lower surface of the polishing member mounting portion is not When the vibrating body is inserted into the through hole, the ring-shaped elastic member mounted on the outer peripheral edge of the lower surface of the polishing action member mounting portion is attached to the first circular shape. It is mounted on the bottom of the hole, and the vibration part is inserted into the second circular hole (claim 2).

次に、本発明のラッピング装置は、被加工物を研磨する研磨面を有し回転可能に支持された研磨定盤と、該研磨定盤を回転させる回転駆動手段と、被加工物を保持する保持面を有し被加工物を該研磨定盤に当接させた状態に保持する被加工物保持手段と、該研磨定盤の表面に砥液を供給する砥液供給手段と、を備え、該被加工物保持手段と該研磨定盤とを摺動させて被加工物保持手段に保持された被加工物を研磨するラッピング装置であって、前記研磨定盤は請求項1または2に記載の研磨定盤であり、被加工物を研磨する際には前記電力供給手段から前記超音波振動子に電力が供給され、該超音波振動子の駆動に伴って前記研磨作用部材が振動した状態で研磨が行われることを特徴とする(請求項3)。   Next, a lapping apparatus according to the present invention holds a polishing surface plate having a polishing surface for polishing a workpiece, and is rotatably supported, rotation driving means for rotating the polishing surface plate, and the workpiece. A workpiece holding means for holding the workpiece in a state of contacting the polishing surface plate with a holding surface; and an abrasive liquid supply means for supplying an abrasive liquid to the surface of the polishing surface plate, 3. A lapping apparatus for polishing a workpiece held by the workpiece holding means by sliding the workpiece holding means and the polishing platen, wherein the polishing platen is defined in claim 1 or 2. When polishing a workpiece, power is supplied from the power supply means to the ultrasonic vibrator, and the polishing member is vibrated as the ultrasonic vibrator is driven. Polishing is performed by (Claim 3).

上記の請求項1〜3に係る発明によれば、研磨定盤全体を振動させるのではなく、研磨定盤に配設した複数の研磨作用部材を振動体によって振動状態として研磨が行われる。被加工物は研磨定盤の研磨面および研磨作用部材の上面で研磨される。研磨定盤全体を振動させず複数の研磨作用部材を振動させるため、装置を大規模な構成にすることなく研磨定盤の研磨面を振動させることができる。また、研磨作用部材を振動させることで研磨面と被加工物の間に砥粒が侵入しやすくして研磨効率を向上させることができる。   According to the first to third aspects of the present invention, the polishing is not performed on the entire polishing surface plate, but is polished with the plurality of polishing members disposed on the polishing surface plate in a vibrating state by the vibrating body. The workpiece is polished on the polishing surface of the polishing platen and the upper surface of the polishing member. Since the plurality of polishing members are vibrated without vibrating the entire polishing platen, the polishing surface of the polishing platen can be vibrated without having a large-scale apparatus. Further, by vibrating the polishing member, it is easy for the abrasive grains to enter between the polishing surface and the workpiece, and the polishing efficiency can be improved.

また、本発明の研磨定盤は、 被加工物を研磨する研磨面を有し、被加工物を該研磨面に当接させて研磨する研磨定盤であって、前記研磨定盤は、被加工物を研磨する研磨面を有する板状の研磨材部と、該研磨材部を支持する支持部とを有し、該支持部には該支持部を貫通する複数の貫通孔が形成され、該複数の貫通孔の開口の外周縁には該開口を囲繞するリング状の弾性部材が配設され、該リング状の弾性部材の上面は前記支持部の上面より所定量上方に位置し、前記板状の研磨材部は、前記弾性部材の上面に載置されることで該弾性部材を介して前記支持部に支持され、該支持部に支持された前記板状の研磨材部の前記研磨面の裏面側の前記複数の貫通孔に対応する位置には、それぞれ超音波振動子を有する円柱状の振動体の一端が接着され、該振動体の他端は該貫通孔に挿入されており、該超音波振動子に電力を供給する電力供給手段を備え、該電力供給手段から前記超音波振動子に電力が供給され、該超音波振動子の駆動に伴って前記研磨材部が振動した状態で研磨が行われることを特徴とする(請求項4)。   The polishing surface plate of the present invention has a polishing surface for polishing a workpiece, and polishes the workpiece by contacting the workpiece with the polishing surface. A plate-shaped abrasive part having a polishing surface for polishing a workpiece, and a support part for supporting the abrasive part, and a plurality of through holes penetrating the support part are formed in the support part; A ring-shaped elastic member surrounding the openings is disposed on the outer peripheral edge of the openings of the plurality of through holes, and the upper surface of the ring-shaped elastic member is located a predetermined amount above the upper surface of the support portion, The plate-like abrasive part is placed on the upper surface of the elastic member, and is supported by the support part via the elastic member, and the polishing of the plate-like abrasive part supported by the support part is performed. One end of a columnar vibrator having an ultrasonic transducer is bonded to a position corresponding to the plurality of through holes on the back side of the surface. The other end of the vibrator is inserted into the through-hole, and includes power supply means for supplying power to the ultrasonic vibrator, and power is supplied to the ultrasonic vibrator from the power supply means. Polishing is performed in a state where the abrasive portion vibrates with the driving of the ultrasonic vibrator (claim 4).

また、本発明のラッピング装置は、被加工物を研磨する研磨面を有し回転可能に支持された研磨定盤と、該研磨定盤を回転させる回転駆動手段と、被加工物を保持する保持面を有し被加工物を該研磨定盤に当接させた状態に保持する被加工物保持手段と、該研磨定盤の表面に砥液を供給する砥液供給手段と、を備え、該被加工物保持手段と該研磨定盤とを摺動させて被加工物保持手段に保持された被加工物を研磨するラッピング装置であって、前記研磨定盤は請求項4に記載の研磨定盤であり、被加工物を研磨する際には前記電力供給手段から前記超音波振動子に電力が供給され、該超音波振動子の駆動に伴って前記研磨材部が振動した状態で研磨が行われることを特徴とするラッピング装置(請求項5)。   Further, the lapping apparatus of the present invention comprises a polishing surface plate having a polishing surface for polishing a workpiece and rotatably supported, a rotation driving means for rotating the polishing surface plate, and a holding for holding the workpiece. A workpiece holding means for holding the workpiece in contact with the polishing surface plate, and an abrasive liquid supply means for supplying an abrasive liquid to the surface of the polishing surface plate, A lapping apparatus for sliding a workpiece held by the workpiece holding means by sliding the workpiece holding means and the polishing platen, wherein the polishing platen is a polishing plate according to claim 4. When polishing the workpiece, power is supplied from the power supply means to the ultrasonic vibrator, and polishing is performed in a state where the abrasive material part vibrates as the ultrasonic vibrator is driven. A wrapping device characterized in that it is performed (claim 5).

上記の請求項4,5に係る発明によれば、研磨定盤全体を振動させるのではなく、研磨定盤の一部を構成する研磨材部を複数の振動体を介して振動させて研磨が行われる。被加工物は研磨材部の研磨面で研磨される。研磨定盤全体を振動させず複数の振動体を介して研磨材部を振動させるため、装置を大規模な構成にすることなく研磨定盤の研磨面を振動させることができる。また、研磨材部を振動させることで研磨面と被加工物の間に砥粒が侵入しやすくして研磨効率を向上させることができる。   According to the inventions according to claims 4 and 5 described above, the entire polishing surface plate is not vibrated, but the polishing material portion constituting a part of the polishing surface plate is vibrated via the plurality of vibrating bodies. Done. The workpiece is polished on the polishing surface of the abrasive part. Since the polishing material part is vibrated through a plurality of vibrators without vibrating the entire polishing platen, the polishing surface of the polishing platen can be vibrated without having a large-scale apparatus. Further, by vibrating the abrasive part, abrasive grains can easily enter between the polishing surface and the workpiece, and the polishing efficiency can be improved.

本発明によれば、装置を大規模な構成にすることなく、研磨定盤の研磨面を振動させるとともに、研磨面と被加工物の間に砥粒が侵入しやすくして研磨効率を向上させることが可能な研磨定盤およびラッピング装置が提供されるといった効果を奏する。   According to the present invention, the polishing surface of the polishing platen is vibrated without making the apparatus large-scale, and the abrasive grains easily enter between the polishing surface and the workpiece to improve the polishing efficiency. Thus, there is an effect that a polishing surface plate and a lapping device that can be provided are provided.

本発明の一実施形態に係るラッピング装置の斜視図である。It is a perspective view of the lapping apparatus concerning one embodiment of the present invention. 一実施形態のラッピング装置の平面図である。It is a top view of the lapping apparatus of one embodiment. 一実施形態のラッピング装置の被加工物保持手段を支持する部分を示す斜視図である。It is a perspective view which shows the part which supports the workpiece holding means of the lapping apparatus of one Embodiment. 同被加工物保持手段で被加工物を保持した状態を示す側面図である。It is a side view which shows the state which hold | maintained the workpiece by the workpiece holding means. 一実施形態のラッピング装置の研磨定盤を示す斜視図である。It is a perspective view which shows the polishing surface plate of the lapping apparatus of one Embodiment. 一実施形態の研磨定盤の貫通孔に対応する部分の断面図である。It is sectional drawing of the part corresponding to the through-hole of the polishing surface plate of one Embodiment. 同振動体の分解斜視図である。It is a disassembled perspective view of the same vibrating body. 本発明の他の実施形態に係る研磨定盤の斜視図である。It is a perspective view of the polishing platen concerning other embodiments of the present invention. 他の実施形態の研磨定盤の貫通孔に対応する部分の断面図である。It is sectional drawing of the part corresponding to the through-hole of the polishing surface plate of other embodiment.

以下、図面を参照して本発明の一実施形態を説明する。
図1および図2は、一実施形態に係る研磨定盤を具備したラッピング装置1のそれぞれ斜視図、平面図である。このラッピング装置1は、被加工物保持手段40で保持した被加工物Wを研磨定盤20で研磨するものである。被加工物Wは、この場合、円板状のものであって、例えば半導体ウェーハ等であるが、この他には、シリコンカーバイドやサファイア等からなる硬質の円板状部材が適用可能である。
Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
1 and 2 are a perspective view and a plan view, respectively, of a lapping apparatus 1 provided with a polishing surface plate according to one embodiment. The lapping apparatus 1 polishes the workpiece W held by the workpiece holding means 40 with the polishing platen 20. In this case, the workpiece W is disk-shaped and is, for example, a semiconductor wafer, but a hard disk-shaped member made of silicon carbide, sapphire, or the like is also applicable.

図1および図2で符号10は、加工台11を備えた装置基台である。加工台11は水平な上面を有し、その上面に、円板状の研磨定盤20が回転軸21を介して、水平、かつ回転可能に支持されている。研磨定盤20の回転軸21は、装置基台10内に配設されたモータ等の回転駆動手段22によって、矢印A方向に回転駆動される。研磨定盤20は、直径が例えば13〜20インチ程度の寸法を有している。   In FIG. 1 and FIG. 2, reference numeral 10 denotes an apparatus base including a processing table 11. The processing table 11 has a horizontal upper surface, and a disk-shaped polishing surface plate 20 is supported on the upper surface via a rotating shaft 21 so as to be horizontal and rotatable. The rotating shaft 21 of the polishing surface plate 20 is rotationally driven in the direction of arrow A by a rotational driving means 22 such as a motor disposed in the apparatus base 10. The polishing platen 20 has a diameter of about 13 to 20 inches, for example.

加工台11の上面には、研磨定盤20の表面の研磨面に砥液を供給する砥液供給手段30が配設されている。砥液供給手段30は、砥液を貯留する円筒状のタンク31と、タンク31に接続されたノズル32と、タンク31内の砥液をノズル32に圧送するポンプ33とを備えており、ポンプ33の駆動によってタンク31内の砥液がノズル32から研磨定盤20の研磨面210上に吐出される。砥液は、被加工物Wに応じて、あるいは研磨工程の状況に応じて、砥粒を含むもの、または含まないものが用いられる。   On the upper surface of the processing table 11, an abrasive liquid supply means 30 for supplying an abrasive liquid to the polishing surface on the surface of the polishing surface plate 20 is disposed. The abrasive liquid supply means 30 includes a cylindrical tank 31 that stores the abrasive liquid, a nozzle 32 connected to the tank 31, and a pump 33 that pumps the abrasive liquid in the tank 31 to the nozzle 32. By driving 33, the abrasive liquid in the tank 31 is discharged from the nozzle 32 onto the polishing surface 210 of the polishing surface plate 20. As the abrasive liquid, one containing or not containing abrasive grains is used depending on the workpiece W or depending on the situation of the polishing process.

装置基台10の、図1において加工台11の奥側(図2で上側)には、被加工物保持手段40を支持し、かつ矢印X方向に往復移動させる駆動部50が設けられている。駆動部50には、矢印X方向に直交して加工台11上に水平に延びるアーム51が設けられている。アーム51は、駆動部50内に収容されている図示せぬ駆動手段によって矢印X方向に往復移動する。   A drive unit 50 that supports the workpiece holding means 40 and reciprocates in the direction of the arrow X is provided on the back side (upper side in FIG. 2) of the processing base 11 in FIG. . The drive unit 50 is provided with an arm 51 that extends perpendicularly to the arrow X direction and extends horizontally on the processing table 11. The arm 51 reciprocates in the direction of the arrow X by driving means (not shown) accommodated in the driving unit 50.

図2および図3に示すように、アーム51の先端は横方向に二股に分岐しており、それら分岐部511,512の先端に、鉛直方向を回転軸としてローラ52,53がそれぞれ回転自在に支持されている。図3に示すように、アーム51の下面には、駆動プーリ54が回転自在に支持されており、この駆動プーリ54は、アーム51の上面に固定されたモータ55で回転駆動される。駆動プーリ54と一方のローラ(駆動ローラ)53にはベルト56が巻回されており、モータ55が作動することにより、駆動プーリ54の回転がベルト56を介して駆動ローラ53に伝わるようになっている。この場合、駆動ローラ53は図1および図2に示すように矢印C方向に回転駆動され、ベルト56が巻回されないローラ52は従動ローラとされる。   As shown in FIGS. 2 and 3, the tip of the arm 51 is bifurcated in the lateral direction, and the rollers 52 and 53 are rotatable at the tips of the branch portions 511 and 512, respectively, with the vertical direction as the rotation axis. It is supported. As shown in FIG. 3, a drive pulley 54 is rotatably supported on the lower surface of the arm 51, and the drive pulley 54 is rotationally driven by a motor 55 fixed to the upper surface of the arm 51. A belt 56 is wound around the drive pulley 54 and one roller (drive roller) 53, and the rotation of the drive pulley 54 is transmitted to the drive roller 53 via the belt 56 by operating the motor 55. ing. In this case, the drive roller 53 is rotationally driven in the direction of arrow C as shown in FIGS. 1 and 2, and the roller 52 around which the belt 56 is not wound is a driven roller.

被加工物保持手段40は、被加工物Wよりもやや大径の円筒状部材であって所定の重量を有しており、図2に示すように、上記一対のローラ52,53に周壁42を接触させて、研磨定盤20上に載置される。図4に示すように、被加工物Wは、被加工物保持手段40の下面である保持面41に、ワックス等の保持材を介して貼着され保持される。   The workpiece holding means 40 is a cylindrical member having a diameter slightly larger than that of the workpiece W, and has a predetermined weight. As shown in FIG. Is placed on the polishing surface plate 20. As shown in FIG. 4, the workpiece W is stuck and held on a holding surface 41 which is the lower surface of the workpiece holding means 40 via a holding material such as wax.

本装置によれば、図1および図2に示すように、研磨定盤20が矢印A方向に回転し、駆動ローラ53が矢印C方向に回転した状態で、保持面41に被加工物Wを保持した被加工物保持手段40が研磨定盤20上に載置され、かつ周壁42がローラ52,53に接触した状態にセットされる。この状態で、被加工物Wは研磨定盤20に当接させられる。研磨定盤20は、例えば10〜100rpm程度で回転する。   According to this apparatus, as shown in FIGS. 1 and 2, the workpiece W is placed on the holding surface 41 in a state where the polishing surface plate 20 rotates in the direction of arrow A and the driving roller 53 rotates in the direction of arrow C. The held workpiece holding means 40 is placed on the polishing surface plate 20 and the peripheral wall 42 is set in contact with the rollers 52 and 53. In this state, the workpiece W is brought into contact with the polishing surface plate 20. The polishing surface plate 20 rotates at, for example, about 10 to 100 rpm.

このようにセットされた被加工物保持手段40は、回転する研磨定盤20によってローラ52,53に押し付けられて加工位置に保持され、駆動ローラ53によって矢印B方向に回転させられて研磨定盤20と摺動する。被加工物保持手段40の保持面41に保持された被加工物Wは自転し、その下面が、回転する研磨定盤20によって研磨される。研磨の際には砥液供給手段30から適宜に砥液が研磨定盤20の表面に供給され、供給された砥液は、被加工物Wと研磨定盤20の間に供給される。研磨中においては、アーム51を介して被加工物保持手段40を矢印方向Xに移動させて研磨定盤20に対する被加工物の当接部分を変え、研磨定盤20の磨耗の偏りを防ぐといった動作が適宜に行われる。   The workpiece holding means 40 set in this way is pressed against the rollers 52 and 53 by the rotating polishing surface plate 20 and held at the processing position, and is rotated in the direction of arrow B by the driving roller 53 to be polished. 20 and slide. The workpiece W held on the holding surface 41 of the workpiece holding means 40 rotates and its lower surface is polished by the rotating polishing platen 20. At the time of polishing, an abrasive liquid is appropriately supplied from the abrasive liquid supply means 30 to the surface of the polishing surface plate 20, and the supplied abrasive liquid is supplied between the workpiece W and the polishing surface plate 20. During polishing, the workpiece holding means 40 is moved in the direction of the arrow X via the arm 51 to change the contact portion of the workpiece with respect to the polishing platen 20 to prevent uneven wear of the polishing platen 20. The operation is performed appropriately.

さて、本実施形態の研磨定盤20は、図5および図6に示すように、上面の研磨面210に研磨定盤20を貫通する複数の円形状の貫通孔220が形成されている。研磨定盤20は、図6に示すように主体をなす支持部201の上面に、支持部201よりも薄い板状の研磨材部202が接着により固着されて構成されたもので、研磨材部202の上面が研磨面210となっている。研磨材部202の中心には円形孔203が形成されており、したがって研磨定盤20の上面の中心は凹部となっている。   As shown in FIGS. 5 and 6, the polishing surface plate 20 of the present embodiment has a plurality of circular through holes 220 penetrating the polishing surface plate 20 on the upper polishing surface 210. The polishing surface plate 20 is configured by adhering a plate-shaped abrasive material portion 202 thinner than the support portion 201 to the upper surface of the main support portion 201 as shown in FIG. The upper surface of 202 is a polishing surface 210. A circular hole 203 is formed at the center of the abrasive part 202, and thus the center of the upper surface of the polishing surface plate 20 is a recess.

支持部201は、例えばアルミニウムやステンレス等から構成され、研磨材部202は、被加工物Wに応じた材料(例えば、銅または銅合金、錫または錫合金、鋳鉄等)で構成されている。貫通孔220は、研磨材部202の表面から支持部201の下面にわたって貫通している。   The support part 201 is made of, for example, aluminum or stainless steel, and the abrasive part 202 is made of a material (for example, copper or copper alloy, tin or tin alloy, or cast iron) according to the workpiece W. The through hole 220 penetrates from the surface of the abrasive part 202 to the lower surface of the support part 201.

図6に示すように、貫通孔220には、超音波振動子333を備えた振動体300が挿入されている。貫通孔220は、研磨定盤20の研磨面210に形成された所定の深さを有する表面側の第1の円形孔221と、第1の円形孔221の底部225に第1の円形孔221と同心円状に形成され、第1の円形孔221よりも小さい直径を有するとともに研磨定盤20を貫通する第2の円形孔222とを備えている。   As shown in FIG. 6, a vibrating body 300 including an ultrasonic transducer 333 is inserted into the through hole 220. The through hole 220 includes a first circular hole 221 having a predetermined depth formed on the polishing surface 210 of the polishing surface plate 20, and a first circular hole 221 at the bottom 225 of the first circular hole 221. And a second circular hole 222 having a smaller diameter than the first circular hole 221 and penetrating the polishing surface plate 20.

振動体300は、第1の円形孔221と同じ直径を有する円板状に形成された研磨作用部材310と、上面に研磨作用部材310が同心状に装着され研磨作用部材310と同じ直径を有する円板状の研磨作用部材装着部320と、研磨作用部材装着部320の下面に第2の円形孔222より小さい直径を有する円柱状に形成されているとともに超音波振動子333が装着された振動部330とから構成されるものである。研磨作用部材装着部320は、その上面が研磨作用部材310の下面に接着されることにより装着されている。   The vibrating body 300 has a polishing member 310 formed in a disk shape having the same diameter as the first circular hole 221 and a polishing member 310 concentrically mounted on the upper surface and has the same diameter as the polishing member 310. A disc-shaped polishing member mounting portion 320 and a vibration formed on the lower surface of the polishing member mounting portion 320 in a cylindrical shape having a diameter smaller than that of the second circular hole 222 and mounted with the ultrasonic transducer 333. The unit 330 is configured. The polishing member mounting portion 320 is mounted by bonding its upper surface to the lower surface of the polishing member 310.

振動部330は三層構造となっていて、上側の第1の振動部材331と、下側の第2の振動部材332の間に、超音波振動子333が挟まれて構成されている。図7に示すように、第1の振動部材331の下面の中心には、軸方向に沿って下方に延びるねじ部335が設けられている。超音波振動子333と第2の振動部材332の軸心には挿通孔333a,332aがそれぞれ形成されており、これら挿通孔333a,332aにねじ部335を挿通し、下方の突出するねじ部335の先端にナット336をねじ込んで締結することで、第1の振動部材331と第2の振動部材332との間に超音波振動子333を挟んだ振動部330が構成される。   The vibration unit 330 has a three-layer structure, and is configured such that an ultrasonic transducer 333 is sandwiched between an upper first vibration member 331 and a lower second vibration member 332. As shown in FIG. 7, a screw portion 335 extending downward along the axial direction is provided at the center of the lower surface of the first vibration member 331. Insertion holes 333a and 332a are formed in the shaft centers of the ultrasonic vibrator 333 and the second vibration member 332, respectively, and a screw part 335 is inserted through the insertion holes 333a and 332a, and a protruding screw part 335 is projected downward. By screwing and fastening the nut 336 to the tip of the vibration member 330, the vibration unit 330 is configured in which the ultrasonic vibrator 333 is sandwiched between the first vibration member 331 and the second vibration member 332.

研磨作用部材310の下面に接着されて装着された研磨作用部材装着部320は、振動部330からフランジ状に拡幅しており、その下面の外周縁部には、リング状のゴム等からなる弾性部材340が装着されている。研磨作用部材310および研磨作用部材装着部320の下面に振動部330が装着された振動体300は、振動部330側から貫通孔220に挿入され、挿入した際に、研磨作用部材装着部320の下面の外周縁部に装着された弾性部材340は、第1の円形孔221の底部225に載置されるとともに、振動部330が第2の円形孔222に挿入される。振動体300の研磨作用部材310は、直径が例えば20〜80mm程度の寸法に設定される。   The polishing member mounting portion 320 that is attached to the lower surface of the polishing member 310 is widened in a flange shape from the vibration portion 330, and the outer peripheral edge of the lower surface has an elastic made of a ring-shaped rubber or the like. A member 340 is attached. The vibrating body 300 having the vibration member 330 mounted on the lower surface of the polishing member 310 and the polishing member mounting portion 320 is inserted into the through hole 220 from the vibration portion 330 side. The elastic member 340 attached to the outer peripheral edge portion of the lower surface is placed on the bottom portion 225 of the first circular hole 221, and the vibrating portion 330 is inserted into the second circular hole 222. The polishing member 310 of the vibrating body 300 is set to have a diameter of about 20 to 80 mm, for example.

弾性部材340は外径が第1の貫通孔220の内径と同程度で、内径が第2の円形孔222の内径と同程度の断面矩形状のリング状のものであり、研磨作用部材装着部320の下面に接着により装着されている。また、弾性部材340は、第1の円形孔221の底部225に載置されたままの状態でもよく、また、底部225に接着されてもよい。このように貫通孔220に挿入された振動体300においては、研磨作用部材310が第1の貫通孔220を研磨定盤20の研磨面210との間に段差が生じない状態で嵌合され、貫通孔220を塞いでいる。   The elastic member 340 is a ring-shaped member having a rectangular cross section whose outer diameter is approximately the same as the inner diameter of the first through-hole 220 and whose inner diameter is approximately the same as the inner diameter of the second circular hole 222. It is attached to the lower surface of 320 by adhesion. Further, the elastic member 340 may be placed on the bottom portion 225 of the first circular hole 221 or may be adhered to the bottom portion 225. In the vibrating body 300 inserted into the through hole 220 in this way, the polishing member 310 is fitted in a state where no step is generated between the first through hole 220 and the polishing surface 210 of the polishing surface plate 20, The through hole 220 is blocked.

振動部330の超音波振動子333には、装置基台10内に収容されている図示せぬ電力供給源に接続され、その電力供給源から超音波振動子333に電力を供給する電線からなる電力供給手段350が接続されている。超音波振動子333には、例えば20〜200V程度の電圧が印可され、これにより振動体300は例えば10〜100kHz程度の振動数で振動するものとなっている。電力供給手段350は各貫通孔220に挿入された各振動体300に対して配線されているが、研磨定盤20が一方向に回転するため、上記電力供給源と各電力供給手段350とは、研磨定盤20を回転可能とする接点としてスリップリング等が適宜に用いられる。   The ultrasonic vibrator 333 of the vibration unit 330 includes an electric wire that is connected to a power supply source (not shown) housed in the apparatus base 10 and supplies power to the ultrasonic vibrator 333 from the power supply source. A power supply means 350 is connected. A voltage of, for example, about 20 to 200 V is applied to the ultrasonic vibrator 333, whereby the vibrating body 300 vibrates at a frequency of, for example, about 10 to 100 kHz. The power supply means 350 is wired to each vibrator 300 inserted in each through-hole 220. However, since the polishing surface plate 20 rotates in one direction, the power supply source and each power supply means 350 are different from each other. A slip ring or the like is appropriately used as a contact for enabling the polishing platen 20 to rotate.

本実施形態の研磨定盤20は上記の構成になっており、上記のようにして研磨定盤20を回転させながら、かつ、被加工物保持手段40を回転させながら被加工物Wを研磨する際には、電力供給手段350から超音波振動子333に電力を供給して超音波振動子333を駆動する。超音波振動子333の駆動に伴い振動部330は振動し、振動部330の振動が振動体300全体に伝わって研磨作用部材310も振動する。すなわち、被加工物の研磨中は、研磨定盤20の表面に点在する複数の研磨作用部材310が振動し、被加工物Wは、研磨定盤20の研磨面210と、振動する研磨作用部材310の上面とによって研磨される。   The polishing surface plate 20 of the present embodiment has the above-described configuration, and the workpiece W is polished while rotating the polishing surface plate 20 and rotating the workpiece holding means 40 as described above. At this time, power is supplied from the power supply means 350 to the ultrasonic transducer 333 to drive the ultrasonic transducer 333. As the ultrasonic vibrator 333 is driven, the vibration section 330 vibrates, and the vibration of the vibration section 330 is transmitted to the entire vibration body 300 and the polishing member 310 also vibrates. In other words, during polishing of the workpiece, the plurality of polishing action members 310 scattered on the surface of the polishing surface plate 20 vibrate, and the workpiece W is polished with the polishing surface 210 of the polishing surface plate 20 and vibrating. It is ground by the upper surface of the member 310.

本実施形態によれば、研磨定盤20全体を振動させるのではなく、研磨定盤20に配設した複数の研磨作用部材310を振動状態として研磨が行われる。被加工物Wは研磨定盤20の研磨面210と、研磨作用部材310の上面とによって研磨される。研磨定盤20全体を振動させずに、研磨定盤20よりもかなり小型の複数の研磨作用部材310を振動させるため、装置を大規模な構成にすることなく、研磨定盤20の研磨面を振動状態とすることができる。また、研磨作用部材310を振動させることで研磨面と被加工物Wの間に砥粒が侵入しやすくなり、研磨効率を向上させることができる。   According to the present embodiment, the polishing platen 20 is not vibrated, but the polishing is performed with the plurality of polishing members 310 arranged on the polishing platen 20 in a vibrating state. The workpiece W is polished by the polishing surface 210 of the polishing surface plate 20 and the upper surface of the polishing member 310. Since the plurality of polishing action members 310 that are considerably smaller than the polishing surface plate 20 are vibrated without vibrating the entire polishing surface plate 20, the polishing surface of the polishing surface plate 20 can be formed without using a large-scale apparatus. It can be in a vibrating state. Further, by vibrating the polishing member 310, the abrasive grains can easily enter between the polishing surface and the workpiece W, and the polishing efficiency can be improved.

本発明は、上記一実施形態の研磨定盤20に代えて、図8に示す研磨定盤20を備えたラッピング装置も含む。すなわち他の実施形態であるこの研磨定盤20は、図9に示すように、上面が被加工物Wを研磨する研磨面202aである板状の研磨材部202と、この研磨材部202の下側に配設された支持部201とを有している。研磨材部202は支持部201よりも薄く形成されており、両者は隙間を空けて同心状に配設された状態となって研磨定盤20を構成している。   The present invention includes a lapping apparatus including the polishing surface plate 20 shown in FIG. 8 instead of the polishing surface plate 20 of the above-described embodiment. That is, as shown in FIG. 9, the polishing surface plate 20 as another embodiment includes a plate-like abrasive portion 202 whose upper surface is a polishing surface 202 a for polishing the workpiece W, and the abrasive portion 202. And a support portion 201 disposed on the lower side. The abrasive material part 202 is formed thinner than the support part 201, and the two parts are arranged concentrically with a gap therebetween to constitute the polishing surface plate 20.

支持部201には、支持部201を貫通する複数の貫通孔220が形成されており、これら貫通孔220は、研磨材部202で覆われている。各貫通孔220には、図9に示すように、振動体400が挿入されている。   The support portion 201 is formed with a plurality of through holes 220 penetrating the support portion 201, and these through holes 220 are covered with the abrasive material portion 202. As shown in FIG. 9, the vibrating body 400 is inserted into each through hole 220.

この実施形態では、貫通孔220の開口の外周縁には環状の凹部229が形成され、この凹部229に、開口を囲繞するリング状の弾性部材340が配設されている。弾性部材340の厚さは凹部229の深さよりも厚く、したがって弾性部材340の上面は支持部201の上面より所定量上方に位置しており、弾性部材340の上面に研磨材部202が載置されている。すなわち研磨材部202は弾性部材340を介して支持部201に支持されており、弾性部材340の上面が支持部201の上面より所定量上方に位置していることにより、研磨材部202の下面と支持部201の上面との間に隙間が空いている。この場合、弾性部材340は、研磨材部202の裏面および支持部201の凹部229の底面に接着されている。   In this embodiment, an annular recess 229 is formed on the outer peripheral edge of the opening of the through hole 220, and a ring-shaped elastic member 340 surrounding the opening is disposed in the recess 229. The thickness of the elastic member 340 is thicker than the depth of the recess 229. Therefore, the upper surface of the elastic member 340 is positioned a predetermined amount above the upper surface of the support portion 201, and the abrasive portion 202 is placed on the upper surface of the elastic member 340. Has been. That is, the abrasive material part 202 is supported by the support part 201 via the elastic member 340, and the upper surface of the elastic member 340 is positioned above the upper surface of the support part 201 by a predetermined amount. There is a gap between the upper surface of the support portion 201 and the upper surface of the support portion 201. In this case, the elastic member 340 is bonded to the back surface of the abrasive material portion 202 and the bottom surface of the concave portion 229 of the support portion 201.

研磨材部202の裏面側における貫通孔220に対応する位置に、振動体400の一端が接着されている。ここでの振動体400は、上記一実施形態での振動部330と同じ構成、すなわち、第1の振動部材331と第2の振動部材332によって超音波振動子333が挟まれ、超音波振動子333に電力供給手段350が接続された構成のものとされる。そして、第1の振動部材331の端部が弾性部材340を貫通し、第1の振動部材331の上端面が研磨材部202の裏面に接着されている。第1の振動部材331と弾性部材340とは、特に接着されてはおらず、また、互いに離間する寸法設定であってもよい。   One end of the vibrating body 400 is bonded to a position corresponding to the through hole 220 on the back surface side of the abrasive material portion 202. The vibrating body 400 here has the same configuration as that of the vibrating section 330 in the above-described embodiment, that is, the ultrasonic vibrator 333 is sandwiched between the first vibrating member 331 and the second vibrating member 332, and the ultrasonic vibrator The power supply means 350 is connected to 333. The end portion of the first vibration member 331 passes through the elastic member 340, and the upper end surface of the first vibration member 331 is bonded to the back surface of the abrasive material portion 202. The first vibration member 331 and the elastic member 340 are not particularly bonded, and may be dimensioned so as to be separated from each other.

この実施形態では、被加工物Wを研磨する際には電力供給手段350から振動体400の超音波振動子333に電力が供給され、超音波振動子333の駆動に伴い、振動体400の振動が研磨材部202に伝わり、研磨材部202が振動した状態で研磨が行われる。   In this embodiment, when the workpiece W is polished, power is supplied from the power supply means 350 to the ultrasonic vibrator 333 of the vibrating body 400, and the vibration of the vibrating body 400 is driven as the ultrasonic vibrator 333 is driven. Is transmitted to the abrasive part 202 and polishing is performed in a state where the abrasive part 202 vibrates.

この実施形態では、研磨定盤20全体を振動させるのではなく、研磨定盤20の一部である上面の部分を構成する研磨材部202を複数の振動体400を介して振動させて研磨が行われ、被加工物Wは、研磨材部202の研磨面202aで研磨される。この実施形態によれば、研磨定盤20全体を振動させず複数の振動体400を介して研磨定盤20の上面を構成する研磨材部202を振動させるために、装置を大規模な構成にすることなく研磨定盤20の研磨面を振動させることができる。また、研磨材部202を振動させることで研磨面202aと被加工物Wの間に砥粒が侵入しやすくなり、研磨効率を向上させることができる。   In this embodiment, the polishing surface plate 20 is not vibrated as a whole, but the polishing member 202 constituting the upper surface portion which is a part of the polishing surface plate 20 is vibrated via the plurality of vibrating bodies 400 to perform polishing. As a result, the workpiece W is polished by the polishing surface 202a of the abrasive part 202. According to this embodiment, in order to vibrate the abrasive member 202 that constitutes the upper surface of the polishing surface plate 20 via the plurality of vibrating bodies 400 without vibrating the entire polishing surface plate 20, the apparatus is configured in a large scale. The polishing surface of the polishing surface plate 20 can be vibrated without doing so. Further, by vibrating the abrasive portion 202, it becomes easy for the abrasive grains to enter between the polishing surface 202a and the workpiece W, and the polishing efficiency can be improved.

上記のラッピング装置1および該装置1に具備された各研磨定盤20は、本発明の実施形態であるが、本発明は上記研磨定盤20のようにして振動可能な研磨定盤のみを発明品とするものでもある。すなわちこのような本発明の研磨定盤を汎用性のあるものとし、他のラッピング装置に組み込んでも使用することが可能である。   The lapping apparatus 1 and each polishing platen 20 provided in the apparatus 1 are embodiments of the present invention, but the present invention only invents a polishing platen that can vibrate like the polishing platen 20. It is also a product. That is, such a polishing surface plate of the present invention is versatile and can be used even if incorporated in another lapping apparatus.

1…ラッピング装置
20…研磨定盤
22…回転駆動手段
30…砥液供給手段
40…被加工物保持手段
41…保持面
201…支持部
202…研磨材部
210,202a…研磨面
220…貫通孔
221…第1の円形孔
222…第2の円形孔
225…第1の円形孔の底部
300,400…振動体
310…研磨作用部材
320…研磨作用部材装着部
330…振動部
333…超音波振動子
340…弾性部材
350…電力供給手段
W…被加工物
DESCRIPTION OF SYMBOLS 1 ... Lapping apparatus 20 ... Polishing surface plate 22 ... Rotation drive means 30 ... Abrasive liquid supply means 40 ... Workpiece holding means 41 ... Holding surface 201 ... Support part 202 ... Abrasive material part 210, 202a ... Polishing surface 220 ... Through-hole 221 ... 1st circular hole 222 ... 2nd circular hole 225 ... Bottom 300, 400 of 1st circular hole ... Vibration body 310 ... Polishing action member 320 ... Polishing action member mounting part 330 ... Vibration part 333 ... Ultrasonic vibration Child 340 ... Elastic member 350 ... Electric power supply means W ... Workpiece

Claims (5)

被加工物を研磨する研磨面を有し、被加工物を該研磨面に当接させて研磨する研磨定盤であって、
該研磨定盤の前記研磨面には該研磨定盤を貫通する複数の貫通孔が形成され、
該複数の貫通孔には超音波振動子を備えた振動体が挿入されており、
該振動体の上部には、該振動体が前記貫通孔に挿入された状態で、該貫通孔を該研磨定盤の前記研磨面との段差が生じない状態で塞ぐ研磨作用部材が配設され、
前記超音波振動子に電力を供給する電力供給手段を備え、
該電力供給手段から前記超音波振動子に電力が供給され、該超音波振動子の駆動に伴って前記研磨作用部材が振動すること
を特徴とする研磨定盤。
A polishing surface plate having a polishing surface for polishing a workpiece and polishing the workpiece by contacting the workpiece with the polishing surface,
A plurality of through holes penetrating the polishing surface plate are formed on the polishing surface of the polishing surface plate,
A vibrating body including an ultrasonic vibrator is inserted into the plurality of through holes,
A polishing member that closes the through hole in a state where the vibration body is inserted into the through hole and does not cause a step with the polishing surface of the polishing surface plate is disposed on the upper part of the vibration body. ,
Power supply means for supplying power to the ultrasonic transducer,
A polishing surface plate, wherein power is supplied from the power supply means to the ultrasonic vibrator, and the polishing member vibrates as the ultrasonic vibrator is driven.
前記貫通孔は、前記研磨面に形成された所定の深さを有する第1の円形孔と、該第1の円形孔の底部に該第1の円形孔と同心円状に形成され、該第1の円形孔よりも小さい直径を有するとともに前記研磨定盤を貫通する第2の円形孔と、から構成され、
前記振動体は、前記第1の円形孔と同じ直径を有する円板状に形成された前記研磨作用部材と、上面に該研磨作用部材が同心状に装着され該研磨作用部材と同じ直径を有する研磨作用部材装着部と、該研磨作用部材装着部の下面に前記第2の円形孔より小さい直径を有する円柱状に形成されているとともに前記超音波振動子が装着された振動部と、から少なくとも構成され、
前記振動部からフランジ状に拡幅した前記研磨作用部材装着部の下面の外周縁部にはリング状の弾性部材が装着され、前記振動体を前記貫通孔に挿入した際に、前記研磨作用部材装着部の下面の外周縁部に装着された前記リング状の弾性部材が前記第1の円形孔の底部に載置されるとともに、前記振動部が前記第2の円形孔に挿入されること
を特徴とする請求項1に記載の研磨定盤。
The through-hole is formed in the first circular hole having a predetermined depth formed in the polishing surface, and is formed concentrically with the first circular hole at the bottom of the first circular hole. A second circular hole having a diameter smaller than that of the circular hole and penetrating the polishing surface plate,
The vibrating body has the same diameter as the polishing member, the polishing member formed in a disc shape having the same diameter as the first circular hole, and the polishing member mounted concentrically on the upper surface. And at least a polishing member mounting portion, and a vibrating portion formed on a lower surface of the polishing member mounting portion in a cylindrical shape having a diameter smaller than that of the second circular hole and mounted with the ultrasonic transducer. Configured,
A ring-shaped elastic member is mounted on the outer peripheral edge of the lower surface of the polishing member mounting portion widened in a flange shape from the vibrating portion, and the polishing member is mounted when the vibrator is inserted into the through hole. The ring-shaped elastic member mounted on the outer peripheral edge of the lower surface of the part is placed on the bottom of the first circular hole, and the vibration part is inserted into the second circular hole. The polishing surface plate according to claim 1.
被加工物を研磨する研磨面を有し回転可能に支持された研磨定盤と、該研磨定盤を回転させる回転駆動手段と、被加工物を保持する保持面を有し被加工物を該研磨定盤に当接させた状態に保持する被加工物保持手段と、該研磨定盤の表面に砥液を供給する砥液供給手段と、を備え、該被加工物保持手段と該研磨定盤とを摺動させて被加工物保持手段に保持された被加工物を研磨するラッピング装置であって、
前記研磨定盤は請求項1または2に記載の研磨定盤であり、
被加工物を研磨する際には前記電力供給手段から前記超音波振動子に電力が供給され、該超音波振動子の駆動に伴って前記研磨作用部材が振動した状態で研磨が行われること
を特徴とするラッピング装置。
A polishing surface plate having a polishing surface for polishing a workpiece and rotatably supported; a rotation driving means for rotating the polishing surface plate; and a holding surface for holding a workpiece. A workpiece holding means for holding the workpiece in contact with the polishing platen; and an abrasive liquid supply means for supplying an abrasive liquid to the surface of the polishing platen. The workpiece holding means and the polishing plate. A lapping apparatus for polishing a workpiece held by a workpiece holding means by sliding a board,
The polishing platen is the polishing platen according to claim 1 or 2,
When polishing the workpiece, power is supplied from the power supply means to the ultrasonic vibrator, and polishing is performed in a state where the polishing member vibrates as the ultrasonic vibrator is driven. Characteristic wrapping device.
被加工物を研磨する研磨面を有し、被加工物を該研磨面に当接させて研磨する研磨定盤であって、
前記研磨定盤は、被加工物を研磨する研磨面を有する板状の研磨材部と、該研磨材部を支持する支持部とを有し、
該支持部には該支持部を貫通する複数の貫通孔が形成され、
該複数の貫通孔の開口の外周縁には該開口を囲繞するリング状の弾性部材が配設され、
該リング状の弾性部材の上面は前記支持部の上面より所定量上方に位置し、
前記板状の研磨材部は、前記弾性部材の上面に載置されることで該弾性部材を介して前記支持部に支持され、
該支持部に支持された前記板状の研磨材部の前記研磨面の裏面側の前記複数の貫通孔に対応する位置には、それぞれ超音波振動子を有する円柱状の振動体の一端が接着され、該振動体の他端は該貫通孔に挿入されており、該超音波振動子に電力を供給する電力供給手段を備え、
該電力供給手段から前記超音波振動子に電力が供給され、該超音波振動子の駆動に伴って前記研磨材部が振動した状態で研磨が行われること
を特徴とする研磨定盤。
A polishing surface plate having a polishing surface for polishing a workpiece and polishing the workpiece by contacting the workpiece with the polishing surface,
The polishing platen has a plate-like abrasive part having a polishing surface for polishing a workpiece, and a support part for supporting the abrasive part,
The support part is formed with a plurality of through holes penetrating the support part.
A ring-shaped elastic member surrounding the openings is disposed on the outer peripheral edge of the openings of the plurality of through holes,
The upper surface of the ring-shaped elastic member is located a predetermined amount above the upper surface of the support part,
The plate-like abrasive part is supported on the support part via the elastic member by being placed on the upper surface of the elastic member,
One end of a columnar vibrator having an ultrasonic transducer is bonded to a position corresponding to the plurality of through holes on the back surface side of the polishing surface of the plate-like abrasive material portion supported by the support portion. The other end of the vibrator is inserted into the through-hole, and includes power supply means for supplying power to the ultrasonic transducer,
A polishing surface plate, wherein power is supplied from the power supply means to the ultrasonic vibrator, and polishing is performed in a state where the abrasive portion vibrates as the ultrasonic vibrator is driven.
被加工物を研磨する研磨面を有し回転可能に支持された研磨定盤と、該研磨定盤を回転させる回転駆動手段と、被加工物を保持する保持面を有し被加工物を該研磨定盤に当接させた状態に保持する被加工物保持手段と、該研磨定盤の表面に砥液を供給する砥液供給手段と、を備え、該被加工物保持手段と該研磨定盤とを摺動させて被加工物保持手段に保持された被加工物を研磨するラッピング装置であって、
前記研磨定盤は請求項4に記載の研磨定盤であり、
被加工物を研磨する際には前記電力供給手段から前記超音波振動子に電力が供給され、該超音波振動子の駆動に伴って前記研磨材部が振動した状態で研磨が行われること
を特徴とするラッピング装置。
A polishing surface plate having a polishing surface for polishing a workpiece and rotatably supported; a rotation driving means for rotating the polishing surface plate; and a holding surface for holding a workpiece. A workpiece holding means for holding the workpiece in contact with the polishing platen; and an abrasive liquid supply means for supplying an abrasive liquid to the surface of the polishing platen. The workpiece holding means and the polishing plate. A lapping apparatus for polishing a workpiece held by a workpiece holding means by sliding a board,
The polishing surface plate is a polishing surface plate according to claim 4,
When polishing the workpiece, power is supplied from the power supply means to the ultrasonic vibrator, and polishing is performed in a state where the abrasive portion vibrates as the ultrasonic vibrator is driven. Characteristic wrapping device.
JP2012051628A 2012-03-08 2012-03-08 Polishing surface plate and lapping equipment Active JP5848640B2 (en)

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Publication number Priority date Publication date Assignee Title
CN106826413A (en) * 2017-01-03 2017-06-13 山东理工大学 A kind of non-straight special-shaped blind hole polishing processing method and its device
KR102116510B1 (en) * 2019-03-08 2020-05-28 에스케이실트론 주식회사 Wafer Lapping Apparatus
KR102285219B1 (en) * 2021-01-21 2021-08-03 주식회사 에이씨엘 Mobile Terminal Glass Polishing Apparatus

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JPH05200659A (en) * 1992-01-24 1993-08-10 Olympus Optical Co Ltd Ultrasonic polishing device
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106826413A (en) * 2017-01-03 2017-06-13 山东理工大学 A kind of non-straight special-shaped blind hole polishing processing method and its device
KR102116510B1 (en) * 2019-03-08 2020-05-28 에스케이실트론 주식회사 Wafer Lapping Apparatus
KR102285219B1 (en) * 2021-01-21 2021-08-03 주식회사 에이씨엘 Mobile Terminal Glass Polishing Apparatus

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