JP2009291911A - Lapping apparatus - Google Patents

Lapping apparatus Download PDF

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Publication number
JP2009291911A
JP2009291911A JP2008149675A JP2008149675A JP2009291911A JP 2009291911 A JP2009291911 A JP 2009291911A JP 2008149675 A JP2008149675 A JP 2008149675A JP 2008149675 A JP2008149675 A JP 2008149675A JP 2009291911 A JP2009291911 A JP 2009291911A
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abrasive
surface plate
support
embedding
pressing
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JP5209378B2 (en
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Fumiteru Tashino
文照 田篠
Toshiaki Oka
暁明 邱
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Disco Corp
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Disco Abrasive Systems Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a lapping apparatus having an abrasive particle embedding means for efficiently embedding abrasive particles in a surface plate forming a polishing face. <P>SOLUTION: The abrasive particle embedding means 6 includes an abrasive particle embedding mechanism 60 consisting of a thrust member 61 having a circular thrust face opposite to the surface of the surface plate and a mounting face on the opposite side to the thrust face, a supporting member 62 having a supporting portion on which the mounting face of the thrust member is mounted and a supporting shaft portion erected from the supporting portion, an ultrasonic vibrator 65 arranged on the supporting shaft portion of the supporting member 62, and a spindle member arranged on the supporting member 62, and an AC power supply means for applying AC power to the ultrasonic vibrator 65 of the abrasive particle embedding mechanism 60 to generate ultrasonic vibration. The thrust member 61 is formed so that its whole circular thrust face contacts the surface of the surface plate. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、半導体ウエーハ等の被加工物を研磨するためのラップ装置に関する。   The present invention relates to a lapping apparatus for polishing a workpiece such as a semiconductor wafer.

半導体デバイス製造工程においては、略円板形状であるウエーハの表面をラップ装置によって研磨し、研磨されたウエーハの表面にIC、LSI等のデバイスが形成される。ウエーハ等の被加工物を研磨するためのラップ装置は、回転可能に支持された定盤と、該定盤の表面に砥粒を含む砥液を供給する砥液供給手段と、該砥液供給手段によって供給された砥液に含まれる砥粒を該定盤の表面に埋設する砥粒埋設手段と、被加工物を保持し該定盤の表面に接触せしめる被加工物保持部材とからなっている。   In the semiconductor device manufacturing process, the surface of a substantially disk-shaped wafer is polished by a lapping apparatus, and devices such as IC and LSI are formed on the polished wafer surface. A lapping apparatus for polishing a workpiece such as a wafer includes a surface plate that is rotatably supported, an abrasive liquid supply means that supplies an abrasive liquid containing abrasive grains to the surface of the surface plate, and the abrasive liquid supply Abrasive embedding means for embedding abrasive grains contained in the abrasive liquid supplied by the means on the surface of the surface plate, and a work holding member for holding the work and contacting the surface of the surface plate Yes.

このようなラップ装置においては、砥粒埋設手段によって定盤の表面に供給された砥液に含まれる砥粒を埋設して研磨面を形成した後、被加工物保持部材によって保持された被加工物を研磨面に接触させて研磨加工を実施する。このようにして研磨加工を実施すると、定盤に埋設された砥粒が徐々に磨耗して研磨機能が低下するため、定盤に砥粒を埋設する作業を定期的に実施する必要がある。   In such a lapping apparatus, a workpiece held by a workpiece holding member is formed after a polishing surface is formed by embedding abrasive grains contained in the abrasive liquid supplied to the surface of the surface plate by the abrasive grain embedding means. Polishing is performed by bringing an object into contact with the polishing surface. When the polishing process is performed in this manner, the abrasive grains embedded in the surface plate are gradually worn out and the polishing function is deteriorated. Therefore, it is necessary to periodically perform the operation of embedding the abrasive grains in the surface plate.

定盤に砥粒を埋設する方法としては、砥粒を含む砥液を定盤の表面に供給しつつ砥粒埋設用の治具を定盤の表面上を摺動させる方法が一般に実施されている。しかるに、このような砥粒埋設方法においては、砥粒の埋設効率が低く、定盤の表面に十分な量の砥粒を埋設するには長時間を要するという問題がある。   As a method of embedding abrasive grains on the surface plate, a method of sliding an abrasive embedding jig on the surface of the surface plate while supplying an abrasive liquid containing abrasive grains to the surface of the surface plate is generally performed. Yes. However, such an abrasive grain embedding method has a problem that the efficiency of embedding abrasive grains is low, and it takes a long time to embed a sufficient amount of abrasive grains on the surface of the surface plate.

上述した問題を解消するために、砥粒埋設用の治具に超音波振動を付与しつつ砥粒埋設作業を行うようにしたラップ装置が提案されている。(例えば、特許文献1参照)
特許第3848643号公報
In order to solve the above-described problems, a lapping apparatus has been proposed in which an abrasive grain embedding operation is performed while applying ultrasonic vibration to an abrasive grain embedding jig. (For example, see Patent Document 1)
Japanese Patent No. 3848643

而して、上記特許文献1に開示された砥粒埋設用の治具はドーナツ状の振動体からなっており、砥粒を押圧する押圧面の面積が少ないため、砥粒埋設効率の面で必ずしも満足し得るものではない。   Therefore, the jig for embedding abrasive grains disclosed in Patent Document 1 is composed of a donut-shaped vibrating body, and the area of the pressing surface that presses the abrasive grains is small. It is not always satisfactory.

本発明は上記事実に鑑みてなされたものであり、その主たる技術課題は、研磨面を形成する定盤に砥粒を効率よく埋設することができる砥粒埋設手段を備えたラップ装置を提供することにある。   The present invention has been made in view of the above-described facts, and a main technical problem thereof is to provide a lapping apparatus provided with abrasive grain embedding means capable of efficiently embedding abrasive grains on a surface plate that forms a polishing surface. There is.

上記主たる技術課題を解決するため、本発明によれば、回転可能に支持された定盤と、該定盤を回転せしめる回転駆動手段と、該定盤の表面に砥粒を含む砥液を供給する砥液供給手段と、該砥液供給手段によって供給された砥液に含まれる砥粒を該定盤の表面に埋設する砥粒埋設手段と、被加工物を保持し該定盤の表面に接触せしめる被加工物保持部材と、を具備するラップ装置において、
該砥粒埋設手段は、該定盤の表面と対向する円形の押圧面と該押圧面と反対側の取付面を有する押圧部材と、該押圧部材の該取付面が装着される支持部と該支持部から立設して設けられた支持軸部とを有する支持部材と、該支持部材の支持軸部に配設された超音波振動子と、該支持部材に配設される錘部材とを備えた砥粒埋設機構と、該砥粒埋設機構の該超音波振動子に超音波振動を発生させるための交流電力を印加する交流電力供給手段とを具備し、
該押圧部材は、該円形の押圧面全面を該定盤の表面に接触するように形成されている、
ことを特徴とするラップ装置が提供される。
In order to solve the main technical problem, according to the present invention, a surface plate that is rotatably supported, rotation driving means for rotating the surface plate, and a polishing liquid containing abrasive grains on the surface of the surface plate are supplied. An abrasive liquid supplying means, an abrasive embedding means for embedding abrasive grains contained in the abrasive liquid supplied by the abrasive liquid supplying means on the surface of the surface plate, and a workpiece to be held on the surface of the surface plate A workpiece holding member that is brought into contact with the lapping apparatus,
The abrasive grain embedding means includes a pressing member having a circular pressing surface facing the surface of the surface plate, a mounting surface opposite to the pressing surface, a support portion on which the mounting surface of the pressing member is mounted, A support member having a support shaft portion provided upright from the support portion; an ultrasonic vibrator disposed on the support shaft portion of the support member; and a weight member disposed on the support member. Provided with an abrasive embedding mechanism, and AC power supply means for applying AC power for generating ultrasonic vibration in the ultrasonic vibrator of the abrasive embedding mechanism,
The pressing member is formed so that the entire surface of the circular pressing surface is in contact with the surface of the surface plate.
A lapping apparatus is provided.

上記押圧部材の円形の押圧面には、複数の溝が形成されていることが望ましい。   It is desirable that a plurality of grooves be formed on the circular pressing surface of the pressing member.

本発明によるラップ装置は、砥液供給手段によって供給された砥液に含まれる砥粒を定盤の表面に埋設する砥粒埋設手段を構成する砥粒埋設機構が、定盤の表面と対向する円形の押圧面と該押圧面と反対側の取付面を有する押圧部材と、押圧部材の取付面が装着される支持部と該支持部から立設して設けられた支持軸部とを有する支持部材と、支持部材の支持軸部に配設された超音波振動子と、支持部材に配設される錘部材とを備え、押圧部材は円形の押圧面全面を定盤の表面に接触するように形成されているので、定盤の表面に砥粒を効率よく埋設することができる。   In the lapping apparatus according to the present invention, the abrasive grain embedding mechanism constituting the abrasive grain embedding means for embedding abrasive grains contained in the abrasive liquid supplied by the abrasive liquid supplying means on the surface of the surface plate faces the surface of the surface plate. A support having a pressing member having a circular pressing surface, a mounting surface opposite to the pressing surface, a support portion on which the mounting surface of the pressing member is mounted, and a support shaft portion provided upright from the support portion A member, an ultrasonic transducer disposed on the support shaft portion of the support member, and a weight member disposed on the support member, the pressing member contacting the entire surface of the circular pressing surface to the surface of the surface plate Therefore, abrasive grains can be embedded efficiently on the surface of the surface plate.

以下、本発明に従って構成されたラップ装置の好適な実施形態について、添付図面を参照して更に詳細に説明する。
図1には、本発明に従って構成されたラップ装置の斜視図が示されている。図1に示すラップ装置は、全体を番号2で示す装置ハウジングを具備している。この装置ハウジング2を構成するテーブルプレート21には、円盤状の定盤3が回転可能に支持されている。この定盤3は錫等の金属材料によって形成されており、その下面には回転軸31が設けられている。このように構成された定盤3は、回転軸31に伝動連結された回転駆動手段としての電動モータ32によって回転せしめられるようになっている。
Preferred embodiments of a lap device constructed according to the present invention will be described below in more detail with reference to the accompanying drawings.
FIG. 1 shows a perspective view of a lapping apparatus constructed in accordance with the present invention. The lap device shown in FIG. 1 includes a device housing generally indicated by numeral 2. A disk-shaped surface plate 3 is rotatably supported on the table plate 21 constituting the device housing 2. The surface plate 3 is made of a metal material such as tin, and a rotating shaft 31 is provided on the lower surface thereof. The surface plate 3 configured as described above is rotated by an electric motor 32 serving as a rotation driving means connected to the rotation shaft 31 by transmission.

上記装置ハウジング2を構成するテーブルプレート21には、定盤3の表面(上面)30に砥粒を含む砥液を供給する砥液供給手段4が配設されている。この砥液供給手段4は、例えば粒径が0.05〜1μmのダイヤモンド砥粒を含む砥液を収容する砥液タンク41と、該砥液タンク41に収容された砥液を送給するポンプ42と、該ポンプ42から送給された砥液を定盤3の表面(上面)30に噴出するノズル43とからなっている。   The table plate 21 constituting the apparatus housing 2 is provided with a polishing liquid supply means 4 for supplying a polishing liquid containing abrasive grains to the surface (upper surface) 30 of the surface plate 3. The abrasive liquid supply means 4 includes, for example, an abrasive liquid tank 41 that contains an abrasive liquid containing diamond abrasive grains having a particle diameter of 0.05 to 1 μm, and a pump that feeds the abrasive liquid contained in the abrasive liquid tank 41. 42 and a nozzle 43 that ejects the abrasive liquid fed from the pump 42 onto the surface (upper surface) 30 of the surface plate 3.

図示の実施形態におけるラップ装置は、砥液供給手段4によって供給された砥液に含まれる砥粒を定盤3の表面(上面)30に埋設するための後述する砥粒埋設手段および被加工物を保持し定盤3の表面(上面)30に接触せしめるための後述する被加工物保持部材を回転可能に支持するロータリー支持手段5を具備している。このロータリー支持手段5は、定盤3の表面(上面)30と平行に移動可能に配設された支持レバー51を備えている。この支持レバー51は、図示しない作動手段によって図1において矢印Xで示す方向に移動せしめられるようになっている。支持レバー51の先端には互いに所定の間隔を持って形成された第1にローラ支持部511と第2のローラ支持部512が設けられている。第1にローラ支持部511には駆動ローラ52が回転可能に支持されており、第2のローラ支持部512には従動ローラ53が回転可能に支持されている。また、支持レバー51には、上記駆動ローラ52を回転するための回転駆動手段54が配設されている。回転駆動手段54は、電動モータ541と、該電動モータ541の駆動軸と駆動ローラ52の回転軸を伝動連結する伝動ベルト等を含む伝動連結手段542とからなっている。   The lapping apparatus in the illustrated embodiment includes an abrasive grain embedding means and a workpiece to be described later for embedding abrasive grains contained in the abrasive liquid supplied by the abrasive liquid supply means 4 in the surface (upper surface) 30 of the surface plate 3. And a rotary support means 5 for rotatably supporting a workpiece holding member, which will be described later, for holding the workpiece and bringing it into contact with the surface (upper surface) 30 of the surface plate 3. The rotary support means 5 includes a support lever 51 disposed so as to be movable in parallel with the surface (upper surface) 30 of the surface plate 3. The support lever 51 can be moved in a direction indicated by an arrow X in FIG. 1 by operating means (not shown). A first roller support portion 511 and a second roller support portion 512 are provided at the tip of the support lever 51 so as to be spaced apart from each other. First, the driving roller 52 is rotatably supported by the roller support portion 511, and the driven roller 53 is rotatably supported by the second roller support portion 512. The support lever 51 is provided with a rotation driving means 54 for rotating the driving roller 52. The rotation drive unit 54 includes an electric motor 541 and a transmission connection unit 542 including a transmission belt that transmits and connects the drive shaft of the electric motor 541 and the rotation shaft of the drive roller 52.

次に、上記砥液供給手段4によって供給された砥液に含まれる砥粒を定盤3の表面(上面)30に埋設するための砥粒埋設手段について、図2および図3を参照して説明する。図2および図3には、砥粒埋設手段6を構成する砥粒埋設機構60が示されている。図2および図3に示す砥粒埋設機構60は、上記定盤3の表面(上面)30 に供給された砥液に含まれる砥粒を押圧するための押圧部材61と、該押圧部材61を支持する支持部材62を具備している。押圧部材61は、図示の実施形態においてはセラミックスによって直径が例えば40mmの円形に形成されており、その下面に押圧面611を有し、該押圧面611と反対側の上面に取付面612を有している。上記押圧面611には、上記砥液供給手段4によって供給された砥粒を含む砥液を貯留するための複数の溝が形成されていることが望ましい。押圧面611に形成される複数の溝としては、例えば図4に示すように複数の放射状の溝611a、図5の(a)および(b)に示すように複数の環状の溝611b、図6に示すように複数の放射状の溝611aと複数の環状の溝611b、図7に示すように格子状の複数の溝611cをあげることができる。なお、放射状の溝611aや環状の溝611b或いは格子状の複数の溝611cの幅は、1〜2mmでよい。   Next, with reference to FIG. 2 and FIG. 3, an abrasive grain embedding means for embedding abrasive grains contained in the abrasive liquid supplied by the abrasive liquid supply means 4 in the surface (upper surface) 30 of the surface plate 3 will be described with reference to FIGS. explain. 2 and 3 show an abrasive grain embedding mechanism 60 constituting the abrasive grain embedding means 6. The abrasive grain embedding mechanism 60 shown in FIGS. 2 and 3 includes a pressing member 61 for pressing abrasive grains contained in the abrasive liquid supplied to the surface (upper surface) 30 of the surface plate 3, and the pressing member 61. A support member 62 is provided for support. In the illustrated embodiment, the pressing member 61 is formed in a circular shape having a diameter of, for example, 40 mm using ceramics, and has a pressing surface 611 on the lower surface thereof and an attachment surface 612 on the upper surface opposite to the pressing surface 611. is doing. The pressing surface 611 is preferably formed with a plurality of grooves for storing the abrasive liquid containing the abrasive grains supplied by the abrasive liquid supply means 4. Examples of the plurality of grooves formed on the pressing surface 611 include a plurality of radial grooves 611a as shown in FIG. 4, a plurality of annular grooves 611b as shown in FIGS. 5A and 5B, and FIG. As shown in FIG. 7, a plurality of radial grooves 611a and a plurality of annular grooves 611b, and a plurality of lattice-like grooves 611c as shown in FIG. The width of the radial grooves 611a, the annular grooves 611b, or the plurality of lattice-shaped grooves 611c may be 1 to 2 mm.

図2および図3を参照して説明を続けると、上記支持部材62は、上記押圧部材61の取付面612が接着剤によって装着される支持部621と、該支持部621から立設して設けられた支持軸部622とを有している。支持部621は上記押圧部材61より大きい外径を有する円形に形成されており、外周部には互いに等角度の位置に4個のボルト挿通穴621aが設けられている。この支持部621の下面に上記押圧部材61の取付面612が適宜の接着剤によって固着される。支持部材62を構成する支持軸部622は、支持部621の上面から上方に延びる大径の錘部材遊嵌部622aと、該錘部材遊嵌部622aの上端から上方に延びる錘部材遊嵌部622aより小径の振動子取付部622bと、該振動子取付部622bの上端から上方に延びる振動子取付部622bより小径の電極端子取付部622cを備えている。   2 and 3, the support member 62 includes a support portion 621 on which the mounting surface 612 of the pressing member 61 is attached by an adhesive, and a support portion 621 that is erected from the support portion 621. The support shaft portion 622 is provided. The support part 621 is formed in a circular shape having an outer diameter larger than that of the pressing member 61, and four bolt insertion holes 621 a are provided at equiangular positions on the outer peripheral part. The mounting surface 612 of the pressing member 61 is fixed to the lower surface of the support portion 621 with an appropriate adhesive. The support shaft portion 622 constituting the support member 62 includes a large-diameter weight member loose fitting portion 622a extending upward from the upper surface of the support portion 621 and a weight member loose fitting portion extending upward from the upper end of the weight member loose fit portion 622a. A vibrator mounting portion 622b having a smaller diameter than 622a and an electrode terminal mounting portion 622c having a smaller diameter than the vibrator mounting portion 622b extending upward from the upper end of the vibrator mounting portion 622b are provided.

上述したように構成された支持部材62には、錘部材63が配設される。錘部材63は、ステンレス鋼等の金属材によって環状に形成されている。この錘部材63は、中央部に上記支持部材62を構成する支持軸部622の錘部材遊嵌部622aに遊嵌する遊嵌穴631が形成されているとともに、その下面には上記支持部材62の支持部621に設けられた4個のボルト挿通穴621aと対応する位置に4個の雌ネジ穴632が形成されている。このように構成された錘部材63は、遊嵌穴631を上記支持部材62を構成する支持軸部622の錘部材遊嵌部622aに遊嵌して支持部621の上面に載置し、支持部621の下側からボルト挿通穴621aに締結ボルト64を挿通して雌ネジ穴632に螺合することにより、支持部材62の支持部621に装着される。なお、錘部材63の重量は、5Kg程度でよい。   A weight member 63 is disposed on the support member 62 configured as described above. The weight member 63 is formed in an annular shape from a metal material such as stainless steel. The weight member 63 is formed with a loosely fitting hole 631 loosely fitted in the weight member loosely fitting portion 622a of the support shaft portion 622 constituting the support member 62 in the center portion, and on the lower surface thereof the support member 62. Four female screw holes 632 are formed at positions corresponding to the four bolt insertion holes 621 a provided in the support portion 621. The weight member 63 configured in this manner is loosely fitted to the weight member loosely fitting portion 622a of the support shaft portion 622 constituting the support member 62 and placed on the upper surface of the support portion 621. The fastening bolt 64 is inserted into the bolt insertion hole 621 a from the lower side of the portion 621 and screwed into the female screw hole 632, so that the mounting portion 621 of the support member 62 is mounted. The weight member 63 may have a weight of about 5 kg.

また、支持部材62の振動子取付部622bには、超音波振動子65が配設される。超音波振動子65は、環状の圧電体651と、該圧電体651の両側分極面にそれぞれ装着された環状の電極652a、652bとからなっている。圧電体651は、チタン酸バリウム(BaTiO3)、チタン酸ジルコン酸鉛(PB(Zi,Ti)O3)、リチウムナイオベート(LiNbO3)、リチウムタンタレート(LiTaO3)等の圧電セラミックスによって形成されている。このように構成された超音波振動子65は、上記支持部材62を構成する支持軸部622の振動子取付部622bに嵌合され、上記錘部材遊嵌部622aの上面に載置される。このようにして錘部材遊嵌部622aの上面に載置された超音波振動子65の上には振動子取付部622bに嵌合された環状のスペーサー66が載置される。そして、振動子取付部622bの上端部に形成された雄ネジ部622dに締結ナット67を螺合することにより、超音波振動子65は振動子取付部622bに装着される。   An ultrasonic transducer 65 is disposed on the transducer mounting portion 622b of the support member 62. The ultrasonic vibrator 65 includes an annular piezoelectric body 651 and annular electrodes 652a and 652b mounted on both side polarization surfaces of the piezoelectric body 651, respectively. The piezoelectric body 651 is formed of piezoelectric ceramics such as barium titanate (BaTiO3), lead zirconate titanate (PB (Zi, Ti) O3), lithium niobate (LiNbO3), lithium tantalate (LiTaO3), and the like. The ultrasonic transducer 65 configured as described above is fitted into the transducer mounting portion 622b of the support shaft portion 622 constituting the support member 62, and is placed on the upper surface of the weight member loose fitting portion 622a. In this manner, the annular spacer 66 fitted to the vibrator mounting portion 622b is placed on the ultrasonic vibrator 65 placed on the upper surface of the weight member loosely fitting portion 622a. The ultrasonic vibrator 65 is attached to the vibrator mounting portion 622b by screwing the fastening nut 67 into the male screw portion 622d formed at the upper end portion of the vibrator mounting portion 622b.

上記支持部材62の電極端子取付部622cには外周に2個のスリップリング681aと681bが配設されている。このスリップリング681aと681bは上記超音波振動子65を構成する電極652a、652bに配線682aと682bを介して接続されるようになっている。   Two slip rings 681a and 681b are disposed on the outer periphery of the electrode terminal mounting portion 622c of the support member 62. The slip rings 681a and 681b are connected to the electrodes 652a and 652b constituting the ultrasonic transducer 65 via wirings 682a and 682b.

図1に戻って説明を続けると、図示の実施形態における砥粒埋設手段6は、上記砥粒埋設機構60を構成する超音波振動子65の電極652a、652bに交流電力を供給する交流電力供給手段69を具備している。交流電力供給手段69は、例えば周波数が10〜50kHzで電圧が20〜100Vの交流電力を出力する。この交流電力供給手段69から出力される交流電力は、フレキシブルパイプ691内に配設された配線(図示せず)およびフレキシブルパイプ691の先端に配設されたロータリーコネクター692を介して上記スリップリング681aと681bから配線682aと682bを介して超音波振動子65に供給される。なお、ロータリーコネクター692は上記支持部材62の電極端子取付部622cに嵌合するように構成されており、その内周面には上記スリップリング681aと681bと摺接するブラシが配設されている。従って、ロータリーコネクター692を上記支持部材62の電極端子取付部622cに嵌合することにより、交流電力供給手段69と超音波振動子65の電極652a、652bが電気的に接続される。   Returning to FIG. 1 and continuing the description, the abrasive grain embedding means 6 in the illustrated embodiment supplies AC power to the electrodes 652a and 652b of the ultrasonic vibrator 65 constituting the abrasive grain embedding mechanism 60. Means 69 are provided. The AC power supply means 69 outputs AC power having a frequency of 10 to 50 kHz and a voltage of 20 to 100 V, for example. The AC power output from the AC power supply means 69 is supplied to the slip ring 681a via a wiring (not shown) provided in the flexible pipe 691 and a rotary connector 692 provided at the tip of the flexible pipe 691. And 681b are supplied to the ultrasonic transducer 65 via wirings 682a and 682b. The rotary connector 692 is configured to fit into the electrode terminal mounting portion 622c of the support member 62, and brushes that are in sliding contact with the slip rings 681a and 681b are disposed on the inner peripheral surface thereof. Accordingly, by fitting the rotary connector 692 to the electrode terminal mounting portion 622c of the support member 62, the AC power supply means 69 and the electrodes 652a and 652b of the ultrasonic transducer 65 are electrically connected.

次に、被加工物を保持し定盤3の表面(上面)30に接触せしめるための被加工物保持部材について、図8を参照して説明する。図8に示す被加工物保持部材7は、ステンレス鋼等の金属材によって円柱状に形成されており、その下面に被加工物としてのウエーハWがワックスによって取り付けられる。   Next, a workpiece holding member for holding the workpiece and bringing it into contact with the surface (upper surface) 30 of the surface plate 3 will be described with reference to FIG. A workpiece holding member 7 shown in FIG. 8 is formed in a cylindrical shape from a metal material such as stainless steel, and a wafer W as a workpiece is attached to the lower surface of the workpiece holding member 7 by wax.

図示の実施形態におけるラップ装置は以上のように構成されており、以下その作用について説明する。
先ず、定盤3の表面(上面)30に砥粒を埋設する砥粒埋設作業について、図9を参照して説明する。砥粒埋設作業を実施するには、砥粒埋設手段6を構成する砥粒埋設機構60を定盤3の表面(上面)に載置し、錘部材63の外周面をロータリー支持手段5の駆動ローラ52と従動ローラ53に接触させる。このようにして砥粒埋設機構60をロータリー支持手段5の駆動ローラ52と従動ローラ53によって支持したならば、砥粒埋設機構60を構成する支持部材62の電極端子取付部622cに交流電力供給手段69のロータリーコネクター692を嵌合する。次に、定盤3の回転駆動手段としての電動モータ32を作動して定盤3を矢印3aで示す方向に例えば10rpmの回転速度で回転するとともに、砥液供給手段4を作動して砥粒40aを含む砥液40を定盤3の表面(上面)30に供給する。そして、ロータリー支持手段5の電動モータ541を作動して駆動ローラ52を矢印52aで示す方向に回転する。この結果、駆動ローラ52と錘部材63の外周面が接触している砥粒埋設機構60は、矢印60aで示す方向に回転せしめられる。このように砥液供給手段4を作動し定盤3を回転するとともに砥粒埋設機構60を回転することにより、定盤3の表面(上面)30に供給された砥粒40aを含む砥液40は砥粒埋設機構60を構成する押圧部材61の押圧面611と定盤3の表面(上面)との間に侵入する。
The lap device in the illustrated embodiment is configured as described above, and the operation thereof will be described below.
First, an abrasive embedding operation for embedding abrasive grains on the surface (upper surface) 30 of the surface plate 3 will be described with reference to FIG. In order to carry out the abrasive grain embedding work, the abrasive grain embedding mechanism 60 constituting the abrasive grain embedding means 6 is placed on the surface (upper surface) of the surface plate 3, and the outer peripheral surface of the weight member 63 is driven by the rotary support means 5. The roller 52 and the driven roller 53 are brought into contact with each other. If the abrasive burying mechanism 60 is supported by the driving roller 52 and the driven roller 53 of the rotary support means 5 in this way, the AC power supply means is applied to the electrode terminal mounting portion 622c of the support member 62 constituting the abrasive burying mechanism 60. 69 rotary connectors 692 are fitted. Next, the electric motor 32 as the rotation driving means of the surface plate 3 is operated to rotate the surface plate 3 in the direction indicated by the arrow 3a at a rotation speed of, for example, 10 rpm, and the abrasive liquid supply means 4 is operated to turn the abrasive grains. A polishing liquid 40 containing 40 a is supplied to the surface (upper surface) 30 of the surface plate 3. Then, the electric motor 541 of the rotary support means 5 is operated to rotate the drive roller 52 in the direction indicated by the arrow 52a. As a result, the abrasive embedding mechanism 60 in which the driving roller 52 and the outer peripheral surface of the weight member 63 are in contact is rotated in the direction indicated by the arrow 60a. The abrasive liquid 40 including the abrasive grains 40a supplied to the surface (upper surface) 30 of the surface plate 3 is obtained by operating the abrasive liquid supply means 4 and rotating the surface plate 3 and rotating the abrasive grain embedding mechanism 60 in this manner. Enters between the pressing surface 611 of the pressing member 61 constituting the abrasive grain embedding mechanism 60 and the surface (upper surface) of the surface plate 3.

次に、交流電力供給手段69を作動し、上述したように超音波振動子65を構成する電極652a、652bに交流電力を印加する。この結果、圧電体651が超音波振動し、この超音波振動は砥粒埋設機構60の支持部材62を介して押圧部材61に伝達され、押圧部材61が上下方向に超音波振動せしめられる。本発明者等の実験によると、超音波振動子65を構成する電極652a、652bに周波数が10〜50kHzで電圧が20〜100Vの交流電力を印加すると、押圧部材61は10〜50kHzの周波数で上下方向に0.5〜5μmの振幅で振動した。   Next, the AC power supply means 69 is operated, and AC power is applied to the electrodes 652a and 652b constituting the ultrasonic vibrator 65 as described above. As a result, the piezoelectric body 651 vibrates ultrasonically, and the ultrasonic vibration is transmitted to the pressing member 61 via the support member 62 of the abrasive grain embedding mechanism 60, and the pressing member 61 is ultrasonically vibrated in the vertical direction. According to experiments by the present inventors, when AC power having a frequency of 10 to 50 kHz and a voltage of 20 to 100 V is applied to the electrodes 652a and 652b constituting the ultrasonic vibrator 65, the pressing member 61 has a frequency of 10 to 50 kHz. Vibrated in the vertical direction with an amplitude of 0.5 to 5 μm.

このようにして超音波振動する押圧部材61の押圧面611と定盤3の表面(上面)との間には上述したように砥粒40aを含む砥液40が侵入しているので、図10に示すように砥粒40aが押圧部材61の押圧面611によって定盤3の表面(上面)30に押圧され埋設される。このとき、砥粒埋設機構60を回転可能に支持するロータリー支持手段5の図示しない作動手段を作動して支持レバー51を矢印Xで示す方向に移動することにより、定盤3の全表面(上面)30に砥粒40aを埋設することができる。なお、押圧部材61は、円形の押圧面611の全面で砥粒40aを押圧するので、定盤3の表面(上面)30に砥粒40aを効率よく埋設することができる。また、図示の実施形態においては押圧部材61の押圧面611には図4乃至図7に示すように複数の放射状の溝611aや複数の環状の溝611b或いは格子状の複数の溝611cが形成されているので、該複数の放射状の溝611aまたは複数の環状の溝611bに砥粒40aを含む砥液40が貯留されるため、押圧面611と定盤3の表面(上面)30との間に常に砥粒40aを含む砥液40を保持することができる。本発明者等の実験によると、直径が40mmの押圧面611を有する押圧部材61を用いて直径が600mmの定盤3の表面(上面)30に上述したように砥粒40aを埋設したところ、10分程度で定盤3の表面(上面)30に必要量の砥粒40aを埋設することができた。   As described above, the abrasive liquid 40 including the abrasive grains 40a enters between the pressing surface 611 of the pressing member 61 that vibrates ultrasonically and the surface (upper surface) of the surface plate 3, as described above. As shown, the abrasive grains 40 a are pressed and embedded in the surface (upper surface) 30 of the surface plate 3 by the pressing surface 611 of the pressing member 61. At this time, the operating means (not shown) of the rotary support means 5 that rotatably supports the abrasive grain embedding mechanism 60 is operated to move the support lever 51 in the direction indicated by the arrow X, so ) 30 can be embedded with abrasive grains 40a. In addition, since the pressing member 61 presses the abrasive grains 40a over the entire surface of the circular pressing surface 611, the abrasive grains 40a can be efficiently embedded in the surface (upper surface) 30 of the surface plate 3. In the illustrated embodiment, the pressing surface 611 of the pressing member 61 is formed with a plurality of radial grooves 611a, a plurality of annular grooves 611b, or a plurality of lattice-shaped grooves 611c as shown in FIGS. Therefore, the abrasive liquid 40 containing the abrasive grains 40a is stored in the plurality of radial grooves 611a or the plurality of annular grooves 611b, and therefore, between the pressing surface 611 and the surface (upper surface) 30 of the surface plate 3. The abrasive liquid 40 containing the abrasive grains 40a can always be held. According to the experiments by the inventors, when the abrasive grains 40a are embedded in the surface (upper surface) 30 of the surface plate 3 having a diameter of 600 mm using the pressing member 61 having the pressing surface 611 having a diameter of 40 mm, as described above, The required amount of abrasive grains 40a could be embedded in the surface (upper surface) 30 of the surface plate 3 in about 10 minutes.

次に、上述したように砥粒40aが埋設された定盤3を用いて実施するラッピング作業について、図11を参照して説明する。
ラッピング作業を実施するには、図11に示すように上記砥粒埋設作業に用いた砥液供給手段4と砥粒埋設機構60および交流電力供給手段69を取り除き、上記図8に示すように被加工物としてのウエーハWが装着された被加工物保持部材7を定盤3の表面(上面)にウエーハW側を載置し、被加工物保持部材7の外周面をロータリー支持手段5の駆動ローラ52と従動ローラ53に接触させる。このようにして被加工物保持部材7をロータリー支持手段5の駆動ローラ52と従動ローラ53によって支持したならば、定盤3の回転駆動手段としての電動モータ32を作動して定盤3を矢印3aで示す方向に例えば10rpmの回転速度で回転するとともに、ロータリー支持手段5の電動モータ531を作動して駆動ローラ52を矢印52aで示す方向に回転し被加工物保持部材7を矢印7aで示す方向に回転せしめる。このとき、被加工物保持部材7を回転可能に支持するロータリー支持手段5の図示しない作動手段を作動して支持レバー51を矢印Xで示す方向に移動する。この結果、被加工物保持部材7の下面に装着された被加工物としてのウエーハWは、被研磨面が定盤3の表面(上面)30に埋設された砥粒40aで研磨される。
Next, the lapping work performed using the surface plate 3 in which the abrasive grains 40a are embedded as described above will be described with reference to FIG.
To perform the lapping work, the abrasive liquid supply means 4, the abrasive grain embedding mechanism 60 and the AC power supply means 69 used for the abrasive grain embedding work are removed as shown in FIG. A workpiece holding member 7 on which a wafer W as a workpiece is mounted is placed on the surface (upper surface) of the surface plate 3 on the wafer W side, and the outer peripheral surface of the workpiece holding member 7 is driven by the rotary support means 5. The roller 52 and the driven roller 53 are brought into contact with each other. When the workpiece holding member 7 is supported by the drive roller 52 and the driven roller 53 of the rotary support means 5 in this way, the electric motor 32 as the rotation drive means of the surface plate 3 is operated to move the surface plate 3 to the arrow. For example, while rotating at a rotational speed of 10 rpm in the direction indicated by 3a, the electric motor 531 of the rotary support means 5 is operated to rotate the drive roller 52 in the direction indicated by the arrow 52a, and the workpiece holding member 7 is indicated by the arrow 7a. Rotate in the direction. At this time, the operating means (not shown) of the rotary support means 5 that rotatably supports the workpiece holding member 7 is operated to move the support lever 51 in the direction indicated by the arrow X. As a result, the wafer W as the workpiece mounted on the lower surface of the workpiece holding member 7 is polished by the abrasive grains 40a having the polished surface embedded in the surface (upper surface) 30 of the surface plate 3.

次に、上記砥粒埋設機構60の他の実施形態について、図12および図13を参照して説明する。
図12および図13に示す砥粒埋設機構60は、押圧部材61をそれぞれ装着した複数(図示の実施形態においては3個)の支持部材62を錘部材63に装着して構成したものである。押圧部材61および支持部材62は、上記図2および図3に示す押圧部材61および支持部材62に比して径は小さいが実質的に同様の構成であり、従って同一部材には同一符号を付してその説明は省略する。なお、図12および図13に示す支持部材62の支持部621には、上記図2および図3に示す支持部材62の支持部621に形成されているボルト挿通穴621aは設けられていない。一方、錘部材63には、上記3個の支持部材62をそれぞれ配設するための3個の嵌合穴633が設けられている。また、錘部材63の上面中心部には、共通の電極端子取付部634が突出して設けられており、この共通の電極端子取付部634の外周面に2個のスリップリング635aと635bが配設されている。このように構成された共通の電極端子取付部634に上記交流電力供給手段69のロータリーコネクター692が嵌合するようになっている。このように構成された錘部材63の嵌合穴633に図13に示すように下面側から砥粒埋設機構60の支持部材62を嵌合し、支持部材62を構成する支持部621上面と錘部材63の下面との間にウレタンゴムリング8を介在させて適宜の接着剤によって支持部621を錘部材63の下面に装着する。そして、上記共通の電極端子取付部634に配設されたスリップリング635aと635bと、3個の支持部材62にそれぞれ配設された各超音波振動子65を構成する電極652a、652bを電気的に接続する。
Next, another embodiment of the abrasive grain embedding mechanism 60 will be described with reference to FIGS. 12 and 13.
The abrasive embedding mechanism 60 shown in FIGS. 12 and 13 is configured by mounting a plurality of (three in the illustrated embodiment) support members 62 each having a pressing member 61 mounted on a weight member 63. The pressing member 61 and the supporting member 62 have substantially the same configuration although the diameter is smaller than that of the pressing member 61 and the supporting member 62 shown in FIG. 2 and FIG. The description is omitted. In addition, the bolt insertion hole 621a formed in the support part 621 of the support member 62 shown in FIGS. 2 and 3 is not provided in the support part 621 of the support member 62 shown in FIGS. On the other hand, the weight member 63 is provided with three fitting holes 633 for disposing the three support members 62, respectively. A common electrode terminal mounting portion 634 protrudes from the center of the upper surface of the weight member 63, and two slip rings 635 a and 635 b are disposed on the outer peripheral surface of the common electrode terminal mounting portion 634. Has been. The rotary connector 692 of the AC power supply means 69 is fitted to the common electrode terminal mounting portion 634 configured as described above. As shown in FIG. 13, the support member 62 of the abrasive grain embedding mechanism 60 is fitted into the fitting hole 633 of the weight member 63 configured as described above from the lower surface side, and the upper surface of the support portion 621 constituting the support member 62 and the weight The urethane rubber ring 8 is interposed between the lower surface of the member 63 and the support portion 621 is attached to the lower surface of the weight member 63 with an appropriate adhesive. The slip rings 635a and 635b disposed on the common electrode terminal mounting portion 634 and the electrodes 652a and 652b constituting the ultrasonic transducers 65 disposed on the three support members 62 are electrically connected. Connect to.

本発明に従って構成されたラップ装置の斜視図。1 is a perspective view of a lap device constructed in accordance with the present invention. 図1に示すラップ装置に装備される砥粒埋設手段を構成する砥粒埋設機構を分解して示す斜視図。The perspective view which decomposes | disassembles and shows the abrasive grain embedding mechanism which comprises the abrasive grain embedding means with which the lapping apparatus shown in FIG. 1 is equipped. 図1に示すラップ装置に装備される砥粒埋設手段を構成する砥粒埋設機構の断面図。Sectional drawing of the abrasive grain embedding mechanism which comprises the abrasive grain embedding means with which the lapping apparatus shown in FIG. 1 is equipped. 図2および図3に示すに示す砥粒埋設機構を構成する押圧部材の第1に実施形態を示す底面図。FIG. 4 is a bottom view showing a first embodiment of a pressing member constituting the abrasive grain embedding mechanism shown in FIGS. 2 and 3. 図2および図3に示すに示す砥粒埋設機構を構成する押圧部材の第2に実施形態を示す底面図。The bottom view which shows 2nd embodiment of the press member which comprises the abrasive grain embedding mechanism shown in FIG. 2 and FIG. 図2および図3に示すに示す砥粒埋設機構を構成する押圧部材の第3に実施形態を示す底面図。The bottom view which shows 3rd embodiment of the press member which comprises the abrasive grain embedding mechanism shown in FIG. 2 and FIG. 図2および図3に示すに示す砥粒埋設機構を構成する押圧部材の第4に実施形態を示す底面図。The bottom view which shows 4th embodiment of the press member which comprises the abrasive grain embedding mechanism shown in FIG. 2 and FIG. 図1に示すラップ装置に装備される被加工物保持部材の斜視図。The perspective view of the workpiece holding member with which the lapping apparatus shown in FIG. 1 is equipped. 図1に示すラップ装置を用いて実施する砥粒埋設作業の説明図。Explanatory drawing of the abrasive grain embedding operation implemented using the lapping apparatus shown in FIG. 図9に示す砥粒埋設作業によって定盤の表面に砥粒が埋設される状態を示す説明図。Explanatory drawing which shows the state by which an abrasive grain is embed | buried on the surface of a surface plate by the abrasive grain embedment work shown in FIG. 図1に示すラップ装置を用いて実施するラッピング作業の説明図。Explanatory drawing of the lapping operation implemented using the lap | wrap apparatus shown in FIG. 図1に示すラップ装置に装備される砥粒埋設手段を構成する砥粒埋設機構の他の実施形態を示す分解斜視図。The disassembled perspective view which shows other embodiment of the abrasive grain embedding mechanism which comprises the abrasive grain embedding means with which the lapping apparatus shown in FIG. 1 is equipped. 図12に砥粒埋設機構の断面図。FIG. 12 is a cross-sectional view of the abrasive grain embedding mechanism.

符号の説明Explanation of symbols

2:装置ハウジング
21:テーブルプレート
3:定盤
4:砥液供給手段
41:砥液タンク
42:ポンプ
43:ポンプ
5:ロータリー支持手段
51:支持レバー
52:駆動ローラ
53:従動ローラ
54:回転駆動手段
6:砥粒埋設手段
60:砥粒埋設機構
61:押圧部材
62:支持部材
63:錘部材
65:超音波振動子
66:スペーサー
69:交流電力供給手段
692:ロータリーコネクター
8:被加工物保持部材
W:ウエーハ
2: Device housing 21: Table plate 3: Surface plate 4: Abrasive liquid supply means 41: Abrasive liquid tank 42: Pump 43: Pump 5: Rotary support means 51: Support lever 52: Drive roller 53: Drive roller 54: Rotation drive Means 6: Abrasive embedding means 60: Abrasive embedding mechanism 61: Press member 62: Support member 63: Weight member 65: Ultrasonic vibrator 66: Spacer 69: AC power supply means 692: Rotary connector 8: Workpiece holding Element
W: Wafer

Claims (2)

回転可能に支持された定盤と、該定盤を回転せしめる回転駆動手段と、該定盤の表面に砥粒を含む砥液を供給する砥液供給手段と、該砥液供給手段によって供給された砥液に含まれる砥粒を該定盤の表面に埋設する砥粒埋設手段と、被加工物を保持し該定盤の表面に接触せしめる被加工物保持部材と、を具備するラップ装置において、
該砥粒埋設手段は、該定盤の表面と対向する円形の押圧面と該押圧面と反対側の取付面を有する押圧部材と、該押圧部材の該取付面が装着される支持部と該支持部から立設して設けられた支持軸部とを有する支持部材と、該支持部材の支持軸部に配設された超音波振動子と、該支持部材に配設される錘部材とを備えた砥粒埋設機構と、該砥粒埋設機構の該超音波振動子に超音波振動を発生させるための交流電力を印加する交流電力供給手段とを具備し、
該押圧部材は、該円形の押圧面全面を該定盤の表面に接触するように形成されている、
ことを特徴とするラップ装置。
A surface plate supported rotatably, a rotation driving means for rotating the surface plate, an abrasive liquid supply means for supplying an abrasive liquid containing abrasive grains to the surface of the surface plate, and an abrasive liquid supply means. In a lapping apparatus comprising: an abrasive grain embedding means for embedding abrasive grains contained in an abrasive liquid on the surface of the surface plate; and a workpiece holding member that holds the workpiece and contacts the surface of the surface plate. ,
The abrasive grain embedding means includes a pressing member having a circular pressing surface facing the surface of the surface plate, a mounting surface opposite to the pressing surface, a support portion on which the mounting surface of the pressing member is mounted, A support member having a support shaft portion provided upright from the support portion; an ultrasonic vibrator disposed on the support shaft portion of the support member; and a weight member disposed on the support member. Provided with an abrasive embedding mechanism, and AC power supply means for applying AC power for generating ultrasonic vibration in the ultrasonic vibrator of the abrasive embedding mechanism,
The pressing member is formed so that the entire surface of the circular pressing surface is in contact with the surface of the surface plate.
A lap device characterized by that.
該押圧部材の円形の押圧面には、複数の溝が形成されている、請求項1記載のラップ装置。   The lapping apparatus according to claim 1, wherein a plurality of grooves are formed on a circular pressing surface of the pressing member.
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JP2013052455A (en) * 2011-09-01 2013-03-21 Disco Corp Abrasive grain embedding device, lapping device, and lapping method
JP2013184256A (en) * 2012-03-08 2013-09-19 Disco Corp Polishing surface plate, and lapping device
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JP2015112683A (en) * 2013-12-12 2015-06-22 株式会社ディスコ Charging device
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JP2015074041A (en) * 2013-10-08 2015-04-20 株式会社ディスコ Charging device
JP2015112683A (en) * 2013-12-12 2015-06-22 株式会社ディスコ Charging device
CN104786153A (en) * 2015-02-03 2015-07-22 浙江工业大学 Reverse ultrasonic assisted gas-liquid-solid three-phase abrasive particle flow polishing processing method and device

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