JP2013178961A5 - - Google Patents

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Publication number
JP2013178961A5
JP2013178961A5 JP2012042386A JP2012042386A JP2013178961A5 JP 2013178961 A5 JP2013178961 A5 JP 2013178961A5 JP 2012042386 A JP2012042386 A JP 2012042386A JP 2012042386 A JP2012042386 A JP 2012042386A JP 2013178961 A5 JP2013178961 A5 JP 2013178961A5
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JP
Japan
Prior art keywords
particle beam
charged particle
detector
detection surface
incident
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012042386A
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English (en)
Japanese (ja)
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JP2013178961A (ja
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Publication date
Application filed filed Critical
Priority to JP2012042386A priority Critical patent/JP2013178961A/ja
Priority claimed from JP2012042386A external-priority patent/JP2013178961A/ja
Priority to US13/772,419 priority patent/US8847180B2/en
Publication of JP2013178961A publication Critical patent/JP2013178961A/ja
Publication of JP2013178961A5 publication Critical patent/JP2013178961A5/ja
Pending legal-status Critical Current

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JP2012042386A 2012-02-28 2012-02-28 荷電粒子線装置及び物品製造方法 Pending JP2013178961A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012042386A JP2013178961A (ja) 2012-02-28 2012-02-28 荷電粒子線装置及び物品製造方法
US13/772,419 US8847180B2 (en) 2012-02-28 2013-02-21 Charged particle beam apparatus, drawing apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012042386A JP2013178961A (ja) 2012-02-28 2012-02-28 荷電粒子線装置及び物品製造方法

Publications (2)

Publication Number Publication Date
JP2013178961A JP2013178961A (ja) 2013-09-09
JP2013178961A5 true JP2013178961A5 (https=) 2015-04-09

Family

ID=49003240

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012042386A Pending JP2013178961A (ja) 2012-02-28 2012-02-28 荷電粒子線装置及び物品製造方法

Country Status (2)

Country Link
US (1) US8847180B2 (https=)
JP (1) JP2013178961A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014216631A (ja) * 2013-04-30 2014-11-17 キヤノン株式会社 描画装置、及び物品の製造方法
KR102395588B1 (ko) * 2017-09-18 2022-05-09 에이에스엠엘 네델란즈 비.브이. 필드 프로그램 가능한 검출기 어레이

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2957516B2 (ja) * 1997-04-14 1999-10-04 山形日本電気株式会社 イオンビーム電流検出機構
US6855929B2 (en) * 2000-12-01 2005-02-15 Ebara Corporation Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
JP2004055933A (ja) * 2002-07-22 2004-02-19 Advantest Corp 電子ビーム露光装置、及び電子ビーム計測モジュール
JP4048925B2 (ja) * 2002-11-18 2008-02-20 株式会社日立製作所 電子顕微鏡
JP4184782B2 (ja) * 2002-12-20 2008-11-19 株式会社日立製作所 マルチ電子ビーム装置およびそれに用いられるマルチ電子ビーム電流の計測・表示方法
JP4738723B2 (ja) 2003-08-06 2011-08-03 キヤノン株式会社 マルチ荷電粒子線描画装置、荷電粒子線の電流の測定方法及びデバイス製造方法

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