JP2013160637A5 - - Google Patents

Download PDF

Info

Publication number
JP2013160637A5
JP2013160637A5 JP2012022976A JP2012022976A JP2013160637A5 JP 2013160637 A5 JP2013160637 A5 JP 2013160637A5 JP 2012022976 A JP2012022976 A JP 2012022976A JP 2012022976 A JP2012022976 A JP 2012022976A JP 2013160637 A5 JP2013160637 A5 JP 2013160637A5
Authority
JP
Japan
Prior art keywords
target layer
diamond
target
mendea
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012022976A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013160637A (ja
JP5911323B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2012022976A priority Critical patent/JP5911323B2/ja
Priority claimed from JP2012022976A external-priority patent/JP5911323B2/ja
Priority to PCT/JP2013/051683 priority patent/WO2013118593A1/en
Publication of JP2013160637A publication Critical patent/JP2013160637A/ja
Publication of JP2013160637A5 publication Critical patent/JP2013160637A5/ja
Application granted granted Critical
Publication of JP5911323B2 publication Critical patent/JP5911323B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2012022976A 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム Active JP5911323B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012022976A JP5911323B2 (ja) 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム
PCT/JP2013/051683 WO2013118593A1 (en) 2012-02-06 2013-01-21 Target structure and radiation generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012022976A JP5911323B2 (ja) 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム

Publications (3)

Publication Number Publication Date
JP2013160637A JP2013160637A (ja) 2013-08-19
JP2013160637A5 true JP2013160637A5 (zh) 2015-03-19
JP5911323B2 JP5911323B2 (ja) 2016-04-27

Family

ID=47846104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012022976A Active JP5911323B2 (ja) 2012-02-06 2012-02-06 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム

Country Status (2)

Country Link
JP (1) JP5911323B2 (zh)
WO (1) WO2013118593A1 (zh)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US9448190B2 (en) 2014-06-06 2016-09-20 Sigray, Inc. High brightness X-ray absorption spectroscopy system
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
US9570265B1 (en) 2013-12-05 2017-02-14 Sigray, Inc. X-ray fluorescence system with high flux and high flux density
FR3012663B1 (fr) * 2013-10-25 2015-12-04 Thales Sa Generateur de rayons x a capteur de flux integre
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6335729B2 (ja) * 2013-12-06 2018-05-30 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備えるｘ線発生管
JP6594479B2 (ja) * 2013-12-06 2019-10-23 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備えるｘ線発生管
US9594036B2 (en) 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9823203B2 (en) 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
JP6381269B2 (ja) * 2014-04-21 2018-08-29 キヤノン株式会社 ターゲットおよび前記ターゲットを備えるｘ線発生管、ｘ線発生装置、ｘ線撮影システム
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
WO2018175570A1 (en) 2017-03-22 2018-09-27 Sigray, Inc. Method of performing x-ray spectroscopy and x-ray absorption spectrometer system
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
GB2591630B (en) 2018-07-26 2023-05-24 Sigray Inc High brightness x-ray reflection source
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
CN112638261A (zh) 2018-09-04 2021-04-09 斯格瑞公司 利用滤波的x射线荧光的系统和方法
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
WO2021011209A1 (en) 2019-07-15 2021-01-21 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
JP7097480B1 (ja) 2021-06-24 2022-07-07 浜松ホトニクス株式会社 Ｘ線管、ｘ線発生装置、及び窓部材の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997000756A2 (en) * 1995-06-20 1997-01-09 Valentinas Snitka A diamond polishing method and apparatus
JP2000306533A (ja) * 1999-02-19 2000-11-02 Toshiba Corp 透過放射型ｘ線管およびその製造方法
DE19934987B4 (de) * 1999-07-26 2004-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Röntgenanode und ihre Verwendung
US20080075229A1 (en) * 2006-09-27 2008-03-27 Nanometrics Incorporated Generation of Monochromatic and Collimated X-Ray Beams
JP5645449B2 (ja) * 2010-04-14 2014-12-24 キヤノン株式会社 Ｘ線源及びｘ線撮影装置

Similar Documents

Publication Publication Date Title
JP2013160637A5 (zh)
JP2014096359A5 (ja) 電極材料
JP2014508329A5 (zh)
SG164353A1 (en) Single-sided perpendicular magnetic recording medium
JP2014523389A5 (zh)
JP2015060159A5 (zh)
WO2011099831A3 (ko) 그래핀을 이용한 유연성 투명 발열체 및 이의 제조 방법
JP2011205089A5 (ja) 半導体膜の作製方法
JP2012522259A5 (zh)
JP2011233545A5 (zh)
JP2012209251A5 (ja) 発光素子および発光装置
WO2013019021A3 (ko) 도펀트 포함 그래핀 적층체 및 그 제조방법
JP2012227137A5 (ja) 発光装置
JP2012182447A5 (ja) 半導体膜の作製方法
WO2013009030A3 (en) Touch panel and method for electrode
JP2012515773A5 (zh)
JP2013500200A5 (zh)
WO2015177748A3 (en) Fabricating thin-film optoelectronic devices with modified surface
JP2013145628A5 (zh)
JP2013023736A5 (zh)
JP2015115404A5 (zh)
JP2011234359A5 (zh)
JP2011173937A5 (zh)
JP2014515311A5 (zh)
WO2013025473A3 (en) Functionalization of thermal management materials