JP2013120793A - Wiring board manufacturing method - Google Patents

Wiring board manufacturing method Download PDF

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JP2013120793A
JP2013120793A JP2011267053A JP2011267053A JP2013120793A JP 2013120793 A JP2013120793 A JP 2013120793A JP 2011267053 A JP2011267053 A JP 2011267053A JP 2011267053 A JP2011267053 A JP 2011267053A JP 2013120793 A JP2013120793 A JP 2013120793A
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copper foil
prepreg
wiring board
adhesive layer
laminated
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Satoshi Odajima
智 小田嶋
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a wiring board manufacturing method capable of resolving inconvenience by aligning a pre-preg and a conductor pattern almost flush with each other.SOLUTION: A support substrate 1 is opposed to a copper foil 2 with thickness of 12 μm or less, and they are adhered by a frame-shaped viscosity layer 4. Peripheral edges of the viscosity layer 4 and the copper foil 2 are made attachable and detachable to constitute an intermediate body. A predetermined electrode pattern 9 is formed on the copper foil 2 of the intermediate body by a semi-additive method, and a pre-preg 10 and a copper foil 11 for lamination are laminate-pressed to the predetermined electrode pattern 9 of the intermediate body to form a predetermined wiring pattern on the copper foil 11 for lamination and constitute a laminate body 12. After the support substrate 1 is removed from the laminate body 12 together with the viscosity layer 4, the copper foil 2 is removed from the pre-preg 10 of the laminate body 12 so as to align the predetermined electrode pattern 9 and the pre-preg 10 flush with each other.

Description

本発明は、半導体パッケージ、携帯電話、携帯情報端末等に使用される配線板の製造方法に関するものである。   The present invention relates to a method of manufacturing a wiring board used for a semiconductor package, a mobile phone, a portable information terminal and the like.

従来における配線板は、例えば図10に示すように、複数枚の銅箔2Aとプリプレグ10とが交互に積層してプレスされ、最上層の銅箔2Aが配線パターンに形成されるとともに、最下層の銅箔2Aが電極パターン9に形成される(特許文献1、2、3、4、5、6、7参照)。   For example, as shown in FIG. 10, the conventional wiring board is formed by alternately laminating and pressing a plurality of copper foils 2A and prepregs 10 so that the uppermost copper foil 2A is formed in a wiring pattern and the lowermost layer. The copper foil 2A is formed on the electrode pattern 9 (see Patent Documents 1, 2, 3, 4, 5, 6, and 7).

銅箔2Aとプリプレグ10とは、様々なタイプがあるが、配線板に軽量化や薄型化が求められる場合には、厚さが18μm以下の銅箔2Aが使用され、厚さ100μm以下のプリプレグ10が選択される。また、電極パターン9は、各種のエッチング法により形成され、プリプレグ10の下面よりも厚さ分だけ下方に突出して凹凸を形成し、プリプレグ10の下面とは面一ではない不揃いの関係を形成する。   There are various types of copper foil 2A and prepreg 10, but when the wiring board is required to be lighter or thinner, copper foil 2A having a thickness of 18 μm or less is used, and prepreg having a thickness of 100 μm or less. 10 is selected. The electrode pattern 9 is formed by various etching methods, protrudes downward by a thickness from the lower surface of the prepreg 10 to form irregularities, and forms an uneven relationship with the lower surface of the prepreg 10. .

特開2004‐235323号公報JP 2004-235323 A 特開2006‐324541号公報JP 2006-324541 A 特開2002‐76621号公報JP 2002-76621 A 特開2007‐324161号公報JP 2007-324161 A 特開2000‐068648号公報JP 2000-068648 A 特開2010‐153628号公報JP 2010-153628 A 特開2009‐71132号公報JP 2009-71132 A

従来における配線板は、以上のように構成され、プリプレグ10と電極パターン9とが面一ではない不揃いの関係なので、配線板の薄型化に支障を来たしたり、配線板が表面実装型半導体パッケージ(例えば、BGA、PBGA、FBGA等)のサブストレートとして用いられる場合に、半田ボールの搭載等が困難になるおそれがある。   The conventional wiring board is configured as described above, and the prepreg 10 and the electrode pattern 9 are not flush with each other. Therefore, the wiring board is hindered from being thinned, or the wiring board is a surface-mounted semiconductor package ( For example, when it is used as a substrate of BGA, PBGA, FBGA, etc., it may be difficult to mount solder balls.

本発明は上記に鑑みなされたもので、プリプレグと導体パターンとを略面一に揃えて不都合を解消することのできる配線板の製造方法を提供することを目的としている。   The present invention has been made in view of the above, and an object of the present invention is to provide a method of manufacturing a wiring board capable of eliminating the inconvenience by aligning the prepreg and the conductor pattern substantially flush with each other.

本発明においては上記課題を解決するため、少なくともサポート基材と銅箔とを使用して薄い配線板を製造する配線板の製造方法であって、
サポート基材と厚さ12μm以下の銅箔とを対向させてこれらを略枠形の粘着層により粘着するとともに、この粘着層と銅箔の略周縁部とを着脱自在として中間体を構成し、この中間体の銅箔に所定の導体パターンをセミアディティブ法により形成し、中間体の所定の導体パターンにプリプレグと積層用の銅箔とを積層プレスして積層用の銅箔に所定の配線パターンを形成することにより積層体を構成し、この積層体からサポート基材を粘着層と共に除去した後、積層体のプリプレグから銅箔を除去して所定の導体パターンとプリプレグとを略面一に揃えることを特徴としている。
In the present invention, in order to solve the above-mentioned problem, it is a method for manufacturing a wiring board for manufacturing a thin wiring board using at least a support base material and copper foil,
The support substrate and a copper foil having a thickness of 12 μm or less are opposed to each other and adhered by a substantially frame-shaped adhesive layer, and the intermediate body is configured by making this adhesive layer and the substantially peripheral edge of the copper foil detachable, A predetermined conductor pattern is formed on the intermediate copper foil by a semi-additive method, and a predetermined wiring pattern is formed on the laminated copper foil by laminating and pressing a prepreg and a laminated copper foil on the intermediate predetermined conductor pattern. After forming the laminated body by removing the support substrate and the adhesive layer from the laminated body, the copper foil is removed from the prepreg of the laminated body so that the predetermined conductor pattern and the prepreg are substantially flush with each other. It is characterized by that.

なお、キャリア基材に銅箔を着脱自在に積層保持させてその露出した面の略周縁部に略枠形の粘着層を粘着した後、銅箔からキャリア基材を取り外すことができる。
また、銅箔の表裏いずれか一方の面の略周縁部に粘着層を着脱自在に粘着し、銅箔をサポート基材に対向させて粘着層で粘着することができる。
また、中間体を構成する銅箔にレジスト層を積層して露光現像することにより、レジスト層に所定の導体パターン用の形成パターンをパターニングし、中間体をメッキ処理することにより、レジスト層の形成パターンに所定の導体パターンを形成することもできる。
The carrier base material can be detached from the copper foil after the copper base material is detachably laminated and held on the carrier base material and the substantially frame-shaped adhesive layer is adhered to the substantially peripheral portion of the exposed surface.
Further, the adhesive layer can be detachably adhered to the substantially peripheral portion of either one of the front and back surfaces of the copper foil, and the copper foil can be adhered to the support base material and adhered with the adhesive layer.
In addition, a resist layer is laminated on the copper foil constituting the intermediate and exposed and developed, so that a pattern for a predetermined conductor pattern is patterned on the resist layer, and the intermediate is plated to form a resist layer. A predetermined conductor pattern can also be formed on the pattern.

また、積層体の積層用の銅箔にプリプレグを介し積層用の銅箔を積層プレスし、この新たな積層用の銅箔に所定の配線パターンを形成する処理を繰り返すことにより、積層体を多層化することが可能である。
さらに、積層体を粘着層の内周部に沿って分割して積層体の周縁部を粘着層と共に除去した後、積層体のプリプレグから銅箔を除去して所定の導体パターンとプリプレグとを略面一に揃えることも可能である。
In addition, by laminating the laminated copper foil on the laminated copper foil of the laminated body via a prepreg and repeating the process of forming a predetermined wiring pattern on this new laminated copper foil, the laminated body is multilayered. It is possible to
Furthermore, after the laminate is divided along the inner peripheral portion of the adhesive layer and the peripheral portion of the laminate is removed together with the adhesive layer, the copper foil is removed from the prepreg of the laminate and the predetermined conductor pattern and the prepreg are substantially omitted. It is also possible to make it flush.

ここで、特許請求の範囲における銅箔は、サポート基材の表裏面、サポート基材の表面、あるいはサポート基材の裏面に粘着される。この銅箔の略周縁部には、周縁部やその近傍が含まれる。所定の導体パターンには、所定の配線パターンや電極パターン等が含まれる。また、積層体の層間には接続用のビアを形成し、このビアにはメッキを施すことができる。   Here, the copper foil in a claim is adhere | attached on the front and back of a support base material, the surface of a support base material, or the back surface of a support base material. The substantially peripheral portion of the copper foil includes a peripheral portion and its vicinity. The predetermined conductor pattern includes a predetermined wiring pattern, an electrode pattern, and the like. Further, a via for connection is formed between the layers of the laminate, and the via can be plated.

本発明によれば、中間体の所定の導体パターンにプリプレグを加熱加圧して一体化するので、所定の導体パターンとプリプレグとが凸凹になることが少なく、これらを略面一に揃えることができる。   According to the present invention, since the prepreg is integrated by heating and pressing to the predetermined conductor pattern of the intermediate body, the predetermined conductor pattern and the prepreg are less likely to be uneven, and these can be substantially flush. .

本発明によれば、プリプレグと導体パターンとを略面一に揃えて不都合を解消することができるという効果がある。また、中間体の銅箔に所定の導体パターンをセミアディティブ法により形成するので、微細なパターンを高精度に形成することができる。
また、請求項2記載の発明によれば、サポート基材に薄い銅箔を粘着層により粘着して強度や剛性を確保するので、扱いにくい銅箔を取り扱う際、作業の煩雑化や遅延を招くことが少ない。また、銅箔を粘着してその位置ずれや皺の発生を防ぐので、配線むらの発生を抑制し、製品の信頼性や品質を向上させることができる。
According to the present invention, there is an effect that the inconvenience can be solved by aligning the prepreg and the conductor pattern substantially flush with each other. In addition, since a predetermined conductor pattern is formed on the intermediate copper foil by a semi-additive method, a fine pattern can be formed with high accuracy.
In addition, according to the second aspect of the present invention, since a thin copper foil is adhered to the support base material by the adhesive layer to ensure strength and rigidity, the handling of the difficult-to-handle copper foil is complicated and delayed. There are few things. In addition, since the copper foil is adhered to prevent the occurrence of displacement and wrinkles, the occurrence of wiring unevenness can be suppressed and the reliability and quality of the product can be improved.

また、請求項3記載の発明によれば、積層体の多層化により、積層体の強度が徐々に増大するので、積層用の銅箔の接着や積層に支障を来たすことが少ない。また、積層体を多層化すれば、配線量の増大に容易に対応することができるので、LSIの高性能化と小型化、部品点数の増加等に対処することが可能になる。
さらに、請求項4記載の発明によれば、粘着層が劣化して積層体の取り外しに困難を来たしたり、粘着層の粘着性に拘わりなく積層体を分離したい場合に、積層体を確実に取り外すことが可能になる。
According to the invention described in claim 3, since the strength of the laminated body gradually increases due to the multi-layered laminated body, there is little trouble in adhesion and lamination of the copper foil for lamination. Further, if the multilayer body is made multi-layered, it is possible to easily cope with an increase in the amount of wiring, so that it becomes possible to cope with high performance and miniaturization of the LSI, an increase in the number of parts, and the like.
Furthermore, according to the invention described in claim 4, when it is difficult to remove the laminated body due to deterioration of the adhesive layer, or when it is desired to separate the laminated body regardless of the adhesiveness of the adhesive layer, the laminated body is surely removed. It becomes possible.

本発明に係る配線板の製造方法の実施形態における銅箔と粘着層とを模式的に示す斜視説明図である。It is a perspective explanatory view showing typically the copper foil and adhesion layer in the embodiment of the manufacturing method of the wiring board concerning the present invention. 本発明に係る配線板の製造方法の実施形態における銅箔の片面をサポート基材に対向させ、粘着する状態を模式的に示す部分断面説明図である。It is a partial cross section explanatory view showing typically the state where one side of copper foil in the embodiment of the manufacturing method of the wiring board concerning the present invention is made to oppose to a support substrate, and it adheres. 本発明に係る配線板の製造方法の実施形態における中間体の銅箔にレジスト層を貼着した状態を模式的に示す部分断面説明図である。It is a partial section explanatory view showing typically the state where the resist layer was stuck on the copper foil of the intermediate in the embodiment of the manufacturing method of the wiring board concerning the present invention. 本発明に係る配線板の製造方法の実施形態における中間体の周囲に銅テープを貼着した状態を模式的に示す部分断面説明図である。It is a fragmentary sectional view showing typically the state where the copper tape was stuck around the intermediate in the embodiment of the manufacturing method of the wiring board concerning the present invention. 本発明に係る配線板の製造方法の実施形態における中間体からレジスト層を除去する状態を模式的に示す部分断面説明図である。It is a fragmentary sectional view showing typically the state of removing a resist layer from an intermediate in an embodiment of a method for manufacturing a wiring board according to the present invention. 本発明に係る配線板の製造方法の実施形態における中間体の所定の電極パターンにプリプレグと積層用の銅箔とを順に積層する状態を模式的に示す部分断面説明図である。It is a fragmentary sectional view showing typically the state where a prepreg and a copper foil for lamination are laminated in order on a predetermined electrode pattern of an intermediate in an embodiment of a manufacturing method of a wiring board concerning the present invention. 本発明に係る配線板の製造方法の実施形態における積層体を模式的に示す部分断面説明図である。It is a partial section explanatory view showing typically a layered product in an embodiment of a manufacturing method of a wiring board concerning the present invention. 本発明に係る配線板の製造方法の実施形態における積層体のプリプレグから銅箔を除去した状態を模式的に示す部分断面説明図である。It is a partial section explanatory view showing typically the state where copper foil was removed from the prepreg of the layered product in the embodiment of the manufacturing method of the wiring board concerning the present invention. 本発明に係る配線板の製造方法の実施形態における積層体の周縁部を粘着層の内周面に沿って打ち抜く状態を模式的に示す部分断面説明図である。It is a fragmentary sectional view showing typically the state where a peripheral part of a layered product in an embodiment of a manufacturing method of a wiring board concerning the present invention is pierced along an inner peripheral surface of an adhesion layer. 従来の配線板を模式的に示す断面説明図である。It is sectional explanatory drawing which shows the conventional wiring board typically.

以下、図面を参照して本発明の実施形態を説明すると、本実施形態における配線板の製造方法は、図1ないし図9に示すように、サポート基材1に銅箔2を粘着層4で粘着して中間体5を構成し、この中間体5の銅箔2に所定の電極パターン9をセミアディティブ法により形成するとともに、所定の電極パターン9にプリプレグ10と積層用の銅箔11とをプレスして積層体12を構成し、この積層体12からサポート基材1を粘着層4と共に除去し、積層体12のプリプレグ10から銅箔2を除去して所定の電極パターン9とプリプレグ10とを面一に揃えるようにしている。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. A method for manufacturing a wiring board in the present embodiment includes a support substrate 1 and a copper foil 2 on an adhesive layer 4 as shown in FIGS. The intermediate body 5 is formed by adhering, and a predetermined electrode pattern 9 is formed on the copper foil 2 of the intermediate body 5 by a semi-additive method, and the prepreg 10 and the laminated copper foil 11 are formed on the predetermined electrode pattern 9. The laminated body 12 is formed by pressing, the support base material 1 is removed from the laminated body 12 together with the adhesive layer 4, the copper foil 2 is removed from the prepreg 10 of the laminated body 12, and the predetermined electrode pattern 9 and prepreg 10 Are aligned.

サポート基材1は、図2や図3等に示すように、所定の材料を使用して銅箔2、プリプレグ10、積層用の銅箔11よりも大きい平面矩形の平板に形成され、平坦な表面の周縁部付近に銅箔2用の粘着層4が粘着保持される。このサポート基材1は、特に限定されるものではないが、例えば銅や42アロイ等からなる金属シート、アルミニウム、ステンレス、ニッケル、ガラスエポキシ(ガラエポ)等を使用し、剛性、ハンドリング性、取扱性等を確保する観点から25μm〜1mmの厚さに形成される。   As shown in FIG. 2 and FIG. 3, the support base material 1 is formed into a flat rectangular plate that is larger than the copper foil 2, the prepreg 10, and the copper foil 11 for lamination using a predetermined material, and is flat. The adhesive layer 4 for the copper foil 2 is adhesively held near the periphery of the surface. Although this support base material 1 is not specifically limited, for example, a metal sheet made of copper, 42 alloy or the like, aluminum, stainless steel, nickel, glass epoxy (glass epoxy) or the like is used, and rigidity, handling property, and handling property are used. From the viewpoint of ensuring the above, etc., it is formed to a thickness of 25 μm to 1 mm.

銅箔2は、除去作業や配線板の薄型化に資するため、厚さ12μm以下、例えば厚さ6μmや9μmタイプが使用される。この銅箔2は、そのまま使用しても良いが、作業の便宜を図りたい場合には図1や図2に示すように、平面矩形のキャリア基材3の粘着性を有する表面に着脱自在に積層保持されることが好ましい。このキャリア基材3としては、特に限定されるものではないが、例えば粘着フィルムと一体化された再剥離フィルムや所定の強度を有する板(例えば、厚さ35〜40μm程度の銅箔等)等があげられる。   The copper foil 2 has a thickness of 12 μm or less, for example, a thickness of 6 μm or 9 μm, in order to contribute to the removal work and thinning of the wiring board. The copper foil 2 may be used as it is. However, for convenience of work, as shown in FIGS. 1 and 2, the copper foil 2 can be detachably attached to the adhesive surface of the planar rectangular carrier substrate 3. It is preferable to be laminated and held. Although it does not specifically limit as this carrier base material 3, For example, the re-peeling film integrated with the adhesive film, the board (for example, copper foil of about 35-40 micrometers in thickness, etc.) which has predetermined | prescribed intensity | strength, etc. Can be given.

粘着層4は、厚さ1〜50μm、好ましくは20μm程度の厚さを有するシリコーン系、フッ素系、エポキシ系、ウレタン系の粘着剤からなり、図1や図2等に示すように、枠形に区画されて銅箔2の片面周縁部に着脱自在に粘着される。この粘着層4の材料は特に制限されるものではないが、銅箔2、プリプレグ10、積層用の銅箔11のプレス時に不要なガスが発生拡散するのを防止し、しかも、優れた粘着性や剥離性等を得るため、熱硬化系の粘着剤、すなわち、シリコーン系粘着剤の採用が好ましい。   The adhesive layer 4 is made of a silicone-based, fluorine-based, epoxy-based, or urethane-based adhesive having a thickness of 1 to 50 μm, preferably about 20 μm, and has a frame shape as shown in FIG. 1 and FIG. And is detachably adhered to the peripheral edge of one side of the copper foil 2. The material of the adhesive layer 4 is not particularly limited, but prevents unnecessary gas from being generated and diffused when the copper foil 2, the prepreg 10 and the laminated copper foil 11 are pressed, and has excellent adhesiveness. In order to obtain, and peelability, it is preferable to employ a thermosetting pressure-sensitive adhesive, that is, a silicone pressure-sensitive adhesive.

プリプレグ10は、図6等に示すように、補強材のガラス布に熱硬化性樹脂を含浸させ、半硬化のB状態にした接着シートであり、配線板の薄型化を図るため、厚さ100μm以下、例えば厚さ30μm程度のタイプが使用される。このプリプレグ10は、サポート基材1や銅箔2よりも小さく形成され、積層用の銅箔11と共に加熱加圧されることで、銅張積層板となる。   As shown in FIG. 6 and the like, the prepreg 10 is an adhesive sheet in which a glass cloth as a reinforcing material is impregnated with a thermosetting resin to form a semi-cured B state, and has a thickness of 100 μm in order to reduce the thickness of the wiring board. Hereinafter, for example, a type having a thickness of about 30 μm is used. The prepreg 10 is formed to be smaller than the support base 1 and the copper foil 2, and is heated and pressed together with the copper foil 11 for lamination to become a copper-clad laminate.

積層用の銅箔11は、特に限定されるものではないが、配線板の薄型化に資するため、厚さ18μm以下、好ましくは厚さ12μm以下、例えば9μmのタイプが使用される。この積層用の銅箔11は、プリプレグ10と略同じ大きさに形成され、プリプレグ10と接触する接触面が選択的に粗面化処理されて強度の向上が図られる。   The laminated copper foil 11 is not particularly limited, but a type having a thickness of 18 μm or less, preferably a thickness of 12 μm or less, for example, 9 μm is used in order to contribute to thinning of the wiring board. The laminated copper foil 11 is formed to be approximately the same size as the prepreg 10, and the contact surface that contacts the prepreg 10 is selectively roughened to improve the strength.

上記において薄い配線板を製造する場合には、先ず、用意したキャリア基材3の表面に薄い銅箔2を着脱自在に積層粘着(図1参照)してハンドリング性を確保し、この銅箔2の露出した片面周縁部に枠形の粘着層4を着脱自在に粘着(同図参照)し、銅箔2の片面をサポート基材1の表面に対向(図2参照)させるとともに、粘着層4で着脱自在に粘着して中間体5を構成し、その後、銅箔2から不要となったキャリア基材3を剥離して取り外す。   In the case of manufacturing a thin wiring board in the above, first, a thin copper foil 2 is detachably laminated and adhered to the surface of the prepared carrier base 3 (see FIG. 1) to ensure handling properties. The frame-shaped adhesive layer 4 is detachably adhered to the peripheral edge of the exposed one side (see the same figure), the one surface of the copper foil 2 is opposed to the surface of the support base 1 (see FIG. 2), and the adhesive layer 4 Then, the intermediate body 5 is formed by adhering detachably, and then the carrier base material 3 that is no longer necessary is peeled off from the copper foil 2 and removed.

粘着層4は、複数の線条化した粘着剤を枠形に並べて粘着しても良いし、予め枠形に形成して粘着しても良い。また、ディスペンサ法やスクリーン印刷法により接着剤を枠形に塗布し、乾燥、硬化させて形成することもできる。また、銅箔2の粘着に際しては、銅箔2をローラで端部から徐々に圧接しながら粘着し、サポート基材1と銅箔2との間にエアが介在しないようにすることが好ましい。サポート基材1に銅箔2を粘着してこれらを一体化するので、薄い銅箔2がばたつくことがなく、薄さにかかわらず、銅箔2を容易に取り扱うことができる。   The adhesive layer 4 may be adhered by arranging a plurality of linear adhesives in a frame shape, or may be formed in advance in a frame shape and adhered. Further, it can be formed by applying an adhesive in a frame shape by a dispenser method or a screen printing method, followed by drying and curing. Further, when the copper foil 2 is adhered, it is preferable that the copper foil 2 is adhered while being gradually pressed from the end with a roller so that air is not interposed between the support base 1 and the copper foil 2. Since the copper foil 2 is adhered to the support substrate 1 and integrated, the thin copper foil 2 does not flutter, and the copper foil 2 can be easily handled regardless of the thickness.

次いで、中間体5を構成する銅箔2の露出面に感光性のレジスト層6を積層貼着(図3参照)して露光現像することにより、レジスト層6に所定の電極パターン9用の形成パターン7を部分的にパターニングし、中間体5の周囲の少なくとも一部に、メッキ電極用あるいは保護用の銅テープ8を貼着する(図4参照)。レジスト層6としては、例えばドライフィルム等を使用することができる。また、銅テープ8は、中間体5周囲の全部あるいは一部に貼着することができる。   Next, a photosensitive resist layer 6 is laminated and adhered to the exposed surface of the copper foil 2 constituting the intermediate body 5 (see FIG. 3) and exposed and developed to form a predetermined electrode pattern 9 on the resist layer 6. The pattern 7 is partially patterned, and a plating electrode or protective copper tape 8 is adhered to at least a part of the periphery of the intermediate body 5 (see FIG. 4). As the resist layer 6, for example, a dry film or the like can be used. Further, the copper tape 8 can be attached to all or part of the periphery of the intermediate body 5.

中間体5の周囲に銅テープ8を貼着したら、図示しないメッキ槽のメッキ液(例えば、無電解銅メッキ液等)中に中間体5を浸漬してメッキ処理することにより、レジスト層6の形成パターン7に所定の電極パターン9を形成し、メッキ槽から中間体5を取り出して不要となったレジスト層6を除去する(図5参照)。   After the copper tape 8 is adhered around the intermediate body 5, the intermediate layer 5 is immersed in a plating solution (for example, an electroless copper plating solution) in a plating tank (not shown) to perform plating. A predetermined electrode pattern 9 is formed on the formation pattern 7, the intermediate body 5 is taken out from the plating tank, and the resist layer 6 that is no longer needed is removed (see FIG. 5).

所定の電極パターン9は、アディティブ法により形成されることが好ましく、特に微細配線化に有利な上記セミアディティブ法が最適である。このセミアディティブ法によれば、材料選択の自由度が大きく、しかも、任意の導体厚で矩形のパターン形状を容易に得ることができる。また、感光性メッキレジストの解像度に応じたピッチで電極パターン9を形成することができるので、厚い金属箔をエッチングして回路を形成するサブトラクティブ法よりも、微細な回路を高精度に形成することが可能になる。また、レジスト層6を除去する場合には、特に制限されるものではないが、例えば弱アルカリ液中に浸漬して剥離することができる。   The predetermined electrode pattern 9 is preferably formed by an additive method, and the semi-additive method described above, which is particularly advantageous for miniaturization, is optimal. According to this semi-additive method, the degree of freedom of material selection is large, and a rectangular pattern shape can be easily obtained with an arbitrary conductor thickness. In addition, since the electrode pattern 9 can be formed at a pitch according to the resolution of the photosensitive plating resist, a fine circuit can be formed with higher accuracy than the subtractive method in which a circuit is formed by etching a thick metal foil. It becomes possible. Moreover, when removing the resist layer 6, although it does not restrict | limit in particular, For example, it can immerse and peel in a weak alkaline liquid.

次いで、中間体5表面の所定の電極パターン9にプリプレグ10と積層用の銅箔11とを順次積層(図6参照)して連続プレスすることにより積層体12を構成(図7参照)し、露出した積層用の銅箔11に所定の配線パターンをエッチング法等により形成する。中間体5の表面にプリプレグ10を加熱加圧するので、所定の電極パターン9がプリプレグ10内に埋没する。したがって、所定の電極パターン9の下面とプリプレグ10の下面とが凸凹になることがなく、面一に揃って整合することとなる。   Subsequently, the prepreg 10 and the copper foil 11 for lamination are sequentially laminated on the predetermined electrode pattern 9 on the surface of the intermediate body 5 (see FIG. 6), and the laminated body 12 is configured by continuously pressing (see FIG. 7). A predetermined wiring pattern is formed on the exposed laminated copper foil 11 by an etching method or the like. Since the prepreg 10 is heated and pressurized on the surface of the intermediate body 5, the predetermined electrode pattern 9 is buried in the prepreg 10. Therefore, the lower surface of the predetermined electrode pattern 9 and the lower surface of the prepreg 10 do not become uneven, and are aligned and aligned.

積層体12に多層化(例えば3層、5層等)が要求される場合には、積層体12を形成する積層用の銅箔11表面に別のプリプレグ(図示せず)を介し積層用の銅箔(図示せず)を新たに積層プレスし、この新たな積層用の銅箔に所定の配線パターンをパターニングする処理を必要回数繰り返し施すことにより、積層体12を多層化する。   When the multilayer body 12 is required to have multiple layers (for example, three layers, five layers, etc.), the surface of the laminated copper foil 11 forming the multilayer body 12 is laminated on the surface via another prepreg (not shown). The laminated body 12 is multi-layered by newly laminating and pressing a copper foil (not shown) and repeatedly performing a process of patterning a predetermined wiring pattern on the new laminated copper foil as many times as necessary.

積層体12を多層化すると、積層体12の強度が徐々に増大するので、一枚目の銅箔2の場合と異なり、積層用の銅箔の接着や積層に支障を来たすことが少ない。また、積層体12を多層化すれば、配線量の増大に対応することができるので、LSIの高性能化と小型化、部品点数の増加等に対処することができる。積層体12には、層間を電気的に接続する複数のビアを形成し、各ビアにメッキを施すことができる。   When the multilayer body 12 is multi-layered, the strength of the multilayer body 12 is gradually increased. Therefore, unlike the case of the first copper foil 2, there is little trouble in the adhesion and lamination of the copper foil for lamination. Further, if the multilayer body 12 is multi-layered, it is possible to cope with an increase in the amount of wiring, so that it is possible to cope with high performance and miniaturization of the LSI, an increase in the number of parts, and the like. In the laminated body 12, a plurality of vias that electrically connect the layers can be formed, and each via can be plated.

次いで、サポート基材1の粘着層4から積層体12を徐々に剥離して取り外し、積層体12のプリプレグ10下面から不要となった銅箔2をエッチング法により溶解除去(図8参照)すれば、所定の電極パターン9とプリプレグ10の下面とが面一に整合した薄い配線板を製造することができる。この場合、サポート基材1やその粘着層4の損傷することが少ないので、これらを再度使用することが可能となり、部品点数やコストの削減が期待できる。また、銅箔2の厚さが12μm以下と非常に薄いので、エッチングしてプリプレグ10の下面から除去する作業が実に容易となる。   Next, if the laminated body 12 is gradually peeled and removed from the adhesive layer 4 of the support base material 1 and the unnecessary copper foil 2 is dissolved and removed from the lower surface of the prepreg 10 of the laminated body 12 by an etching method (see FIG. 8). A thin wiring board in which the predetermined electrode pattern 9 and the lower surface of the prepreg 10 are flush with each other can be manufactured. In this case, since the support base material 1 and its adhesive layer 4 are less likely to be damaged, they can be used again, and reduction of the number of parts and cost can be expected. Moreover, since the thickness of the copper foil 2 is as very thin as 12 μm or less, the work of etching and removing from the lower surface of the prepreg 10 becomes really easy.

粘着層4が劣化して積層体12の剥離に支障を来たしたり、粘着層4の粘着性に拘わりなく積層体12を確実に分離したい場合には、図9に示すように、積層体12を粘着層4の内周面に沿って分割することにより、積層体12の不要な周縁部13を粘着層4や銅テープ8と共に除去し、その後、周縁部13が除去された積層体12のプリプレグ10下面から銅箔2をエッチング法で除去すれば、所定の電極パターン9とプリプレグ10の下面とが面一に整合した薄い配線板を製造することができる。積層体12を分割して周縁部13を除去する場合、例えば打ち抜き刃14で枠形に打ち抜くと良い。   When the pressure-sensitive adhesive layer 4 is deteriorated to hinder the peeling of the laminated body 12 or the laminated body 12 is surely separated regardless of the adhesiveness of the pressure-sensitive adhesive layer 4, as shown in FIG. By dividing along the inner peripheral surface of the adhesive layer 4, the unnecessary peripheral portion 13 of the laminate 12 is removed together with the adhesive layer 4 and the copper tape 8, and then the prepreg of the laminate 12 from which the peripheral portion 13 has been removed. If the copper foil 2 is removed from the lower surface of the substrate 10 by an etching method, a thin wiring board in which the predetermined electrode pattern 9 and the lower surface of the prepreg 10 are aligned with each other can be manufactured. When the laminated body 12 is divided and the peripheral portion 13 is removed, for example, it is preferable to punch into a frame shape with a punching blade 14.

上記製法によれば、プリプレグ10と電極パターン9とが面一に揃う関係になるので、配線板の薄型化に支障を来たすのを防止することができる。また、プリプレグ10と電極パターン9との間に段差が生じないので、配線板が表面実装型半導体パッケージのサブストレートとして用いられる場合、半田ボールの搭載等の各種作業が困難になるおそれを有効に排除することができる。   According to the above manufacturing method, since the prepreg 10 and the electrode pattern 9 are in a flush relationship, it is possible to prevent the thinning of the wiring board from being hindered. In addition, since no step is generated between the prepreg 10 and the electrode pattern 9, it is effective that various operations such as mounting of solder balls may be difficult when the wiring board is used as a substrate of a surface mount semiconductor package. Can be eliminated.

また、サポート基材1に薄い銅箔2を粘着層4により粘着して強度や剛性を確保するので、扱いにくい銅箔2を取り扱う際、作業の煩雑化や遅延を招くことがない。また、銅箔2を粘着してその位置ずれや皺の発生を有効に防止するので、配線むらの発生を抑制し、製品の信頼性や品質を大幅に向上させることができる。   In addition, since the thin copper foil 2 is adhered to the support base material 1 by the adhesive layer 4 to ensure strength and rigidity, there is no complication or delay in handling the difficult-to-handle copper foil 2. In addition, since the copper foil 2 is adhered to effectively prevent the displacement and wrinkles, the occurrence of wiring unevenness can be suppressed and the reliability and quality of the product can be greatly improved.

また、サポート基材1の全表面から積層体12を弓なりに反らせて剥離するのではなく、積層体12の不要な周縁部13を粘着層4と共に除去して積層体12をサポート基材1から取り外すことができるので、積層体12が湾曲により損傷するおそれがなく、安全に取り外すことが可能となる。さらに、サポート基材1を25μm〜1mmの範囲の厚さで形成するので、優れた剛性を確保したり、ハンドリング性を向上させて取り扱いを簡易、かつ容易にすることが可能になる。   Further, the laminated body 12 is not peeled off from the entire surface of the support base material 1 in a bowed state, but an unnecessary peripheral portion 13 of the laminated body 12 is removed together with the adhesive layer 4 to remove the laminated body 12 from the support base material 1. Since it can be removed, there is no possibility that the laminated body 12 will be damaged by bending, and it can be safely removed. Furthermore, since the support base material 1 is formed with a thickness in the range of 25 μm to 1 mm, it is possible to ensure excellent rigidity or to improve handling and simplify handling.

なお、上記実施形態ではサポート基材1の表面に銅箔2を粘着層4で粘着したが、サポート基材1の表裏面に銅箔2を粘着層4でそれぞれ粘着し、複数の中間体5や積層体12を形成しても良い。また、サポート基材1の表面に枠形の粘着層4を粘着し、この粘着層4に銅箔2の対向面の周縁部を着脱自在に粘着しても良い。また、上記実施形態では中間体5を構成した後、銅箔2からキャリア基材3を取り外したが、銅箔2の片面周縁部に粘着層4を粘着した後、銅箔2からキャリア基材3を剥離して取り外しても良い。   In the above embodiment, the copper foil 2 is adhered to the surface of the support base material 1 with the adhesive layer 4. However, the copper foil 2 is adhered to the front and back surfaces of the support base material 1 with the adhesive layer 4, and a plurality of intermediate bodies 5 are adhered. Alternatively, the laminated body 12 may be formed. Alternatively, the frame-shaped adhesive layer 4 may be adhered to the surface of the support substrate 1, and the peripheral edge portion of the opposing surface of the copper foil 2 may be detachably adhered to the adhesive layer 4. In the above embodiment, the carrier 5 is removed from the copper foil 2 after the intermediate body 5 is formed. After the adhesive layer 4 is adhered to the peripheral edge of the copper foil 2, the carrier base 3 is removed from the copper foil 2. 3 may be peeled off and removed.

本発明に係る配線板の製造方法は、インターポーザ、コアレスビルドアップ基板、半導体パッケージ、プリント配線板の製造分野等で使用することができる。   The method for manufacturing a wiring board according to the present invention can be used in the field of manufacturing interposers, coreless buildup substrates, semiconductor packages, printed wiring boards, and the like.

1 サポート基材
2 銅箔
2A 銅箔
3 キャリア基材
4 粘着層
5 中間体
6 レジスト層
7 形成パターン
9 電極パターン(導体パターン)
10 プリプレグ
11 積層用の銅箔
12 積層体
13 積層体の周縁部
DESCRIPTION OF SYMBOLS 1 Support base material 2 Copper foil 2A Copper foil 3 Carrier base material 4 Adhesive layer 5 Intermediate body 6 Resist layer 7 Formation pattern 9 Electrode pattern (conductor pattern)
DESCRIPTION OF SYMBOLS 10 Prepreg 11 Copper foil 12 for laminated | stacked Laminated body 13 The peripheral part of a laminated body

Claims (4)

少なくともサポート基材と銅箔とを使用して薄い配線板を製造する配線板の製造方法であって、
サポート基材と厚さ12μm以下の銅箔とを対向させてこれらを略枠形の粘着層により粘着するとともに、この粘着層と銅箔の略周縁部とを着脱自在として中間体を構成し、この中間体の銅箔に所定の導体パターンをセミアディティブ法により形成し、中間体の所定の導体パターンにプリプレグと積層用の銅箔とを積層プレスして積層用の銅箔に所定の配線パターンを形成することにより積層体を構成し、この積層体からサポート基材を粘着層と共に除去した後、積層体のプリプレグから銅箔を除去して所定の導体パターンとプリプレグとを略面一に揃えることを特徴とする配線板の製造方法。
A method of manufacturing a wiring board that manufactures a thin wiring board using at least a support substrate and copper foil,
The support substrate and a copper foil having a thickness of 12 μm or less are opposed to each other and adhered by a substantially frame-shaped adhesive layer, and the intermediate body is configured by making this adhesive layer and the substantially peripheral edge of the copper foil detachable, A predetermined conductor pattern is formed on the intermediate copper foil by a semi-additive method, and a predetermined wiring pattern is formed on the laminated copper foil by laminating and pressing a prepreg and a laminated copper foil on the intermediate predetermined conductor pattern. After forming the laminated body by removing the support substrate and the adhesive layer from the laminated body, the copper foil is removed from the prepreg of the laminated body so that the predetermined conductor pattern and the prepreg are substantially flush with each other. A method for manufacturing a wiring board.
銅箔の表裏いずれか一方の面の略周縁部に粘着層を着脱自在に粘着し、銅箔をサポート基材に対向させて粘着層で粘着する請求項1記載の配線板の製造方法。   The method for producing a wiring board according to claim 1, wherein the adhesive layer is detachably adhered to a substantially peripheral portion of either one of the front and back surfaces of the copper foil, and the copper foil is opposed to the support base material and adhered with the adhesive layer. 積層体の積層用の銅箔にプリプレグを介し積層用の銅箔を積層プレスし、この新たな積層用の銅箔に所定の配線パターンを形成する処理を繰り返すことにより、積層体を多層化する請求項1又は2記載の配線板の製造方法。   A laminated copper foil is laminated and pressed on the laminated copper foil through a prepreg, and a process of forming a predetermined wiring pattern on this new laminated copper foil is repeated to make the laminated body multilayer. The manufacturing method of the wiring board of Claim 1 or 2. 積層体を粘着層の内周部に沿って分割して積層体の周縁部を粘着層と共に除去した後、積層体のプリプレグから銅箔を除去して所定の導体パターンとプリプレグとを略面一に揃える請求項1、2、又は3記載の配線板の製造方法。   After the laminate is divided along the inner peripheral portion of the adhesive layer and the peripheral portion of the laminate is removed together with the adhesive layer, the copper foil is removed from the prepreg of the laminate and the predetermined conductor pattern and the prepreg are substantially flush with each other. The method for manufacturing a wiring board according to claim 1, 2, or 3.
JP2011267053A 2011-12-06 2011-12-06 Wiring board manufacturing method Pending JP2013120793A (en)

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