JP2013115174A - Manufacturing method of wiring board - Google Patents

Manufacturing method of wiring board Download PDF

Info

Publication number
JP2013115174A
JP2013115174A JP2011258937A JP2011258937A JP2013115174A JP 2013115174 A JP2013115174 A JP 2013115174A JP 2011258937 A JP2011258937 A JP 2011258937A JP 2011258937 A JP2011258937 A JP 2011258937A JP 2013115174 A JP2013115174 A JP 2013115174A
Authority
JP
Japan
Prior art keywords
copper foil
wiring board
prepreg
adhesive layer
laminate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011258937A
Other languages
Japanese (ja)
Inventor
Satoshi Odajima
智 小田嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Polymer Co Ltd, Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Polymer Co Ltd
Priority to JP2011258937A priority Critical patent/JP2013115174A/en
Publication of JP2013115174A publication Critical patent/JP2013115174A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of a wiring board capable of enhancing the reliability and quality of a product by reducing complication and delay during the lamination work of a thin copper foil and a prepreg, and preventing displacement or creasing of the copper foil.SOLUTION: In the method of manufacturing a thin wiring board by laminating a copper foil 3 and a prepreg 4 on a support substrate 1 having a predetermined rigidity, an adhesive layer 2 of frame shape is provided at the peripheral edge on the surface of the support substrate 1, the peripheral edge of the copper foil 3 having a thickness of 18 μm or less is stuck to the adhesive layer 2 removably, a prepreg 4 having a thickness of 100 μm or less and a copper foil 5 for lamination are laminated sequentially on the copper foil 3 and pressed, a predetermined wiring pattern is formed on the copper foil 5 for lamination thus forming a laminate 6, and after separating the laminate 6 from the support substrate 1, a predetermined electrode pattern is formed on the copper foil 3 forming the laminate 6.

Description

本発明は、半導体パッケージ、スイッチ、携帯電話、携帯情報端末等に使用される配線板の製造方法に関するものである。   The present invention relates to a method of manufacturing a wiring board used for a semiconductor package, a switch, a mobile phone, a portable information terminal and the like.

従来、配線板を製造して出荷する場合には、パターン設計工程で電子機器としての性能・仕様を決定した後、図示しない銅箔やプリプレグを必要数用意し、これらをアートワーク工程、内層作成工程、多層積層工程、穴加工工程、メッキ工程、外層パターン作成工程、ソルダーレジスト形成工程、表面処理・外形加工工程で配線板に加工し、この配線板を完成品検査工程で検査して出荷するようにしている(特許文献1、2、3、4、5参照)。   Conventionally, when manufacturing and shipping wiring boards, after determining the performance and specifications as electronic equipment in the pattern design process, prepare the required number of copper foils and prepregs (not shown), and create these as artwork processes and inner layers Processed into a wiring board in the process, multilayer lamination process, hole processing process, plating process, outer layer pattern creation process, solder resist formation process, surface treatment / outline processing process, and this wiring board was inspected and shipped in the finished product inspection process (See Patent Documents 1, 2, 3, 4, and 5).

銅箔とプリプレグとは、様々なタイプがあるが、配線板に軽量化や薄型化が求められる場合には、厚さが18μm以下の銅箔が使用され、厚さ100μm以下のプリプレグが選択される。   There are various types of copper foil and prepreg, but when the wiring board is required to be light and thin, a copper foil with a thickness of 18 μm or less is used, and a prepreg with a thickness of 100 μm or less is selected. The

特開2004‐235323号公報JP 2004-235323 A 特開2007‐324161号公報JP 2007-324161 A 特開2000‐068648号公報JP 2000-068648 A 特開平09‐153661号公報Japanese Patent Laid-Open No. 09-153661 特開平07‐224252号公報Japanese Patent Application Laid-Open No. 07-224252

従来における配線板は、以上のように製造され、薄型化が求められる場合に非常に薄く撓み易い銅箔が使用されるので、扱いにくい銅箔とプリプレグとを積層する際、特に最初の一枚目の銅箔とプリプレグとを積層する際、積層作業の煩雑化や遅延を招くことがある。また、銅箔に位置ずれや皺が発生し、製品の信頼性や品質の向上を図ることのできないおそれがある。   Conventional wiring boards are manufactured as described above, and when thinning is required, very thin and flexible copper foil is used, so when laminating difficult copper foil and prepreg, especially the first one When laminating the copper foil and the prepreg of the eye, the laminating work may be complicated and delayed. Further, the copper foil may be displaced or wrinkled, and the reliability and quality of the product may not be improved.

本発明は上記に鑑みなされたもので、薄い銅箔とプリプレグとを積層する作業時の煩雑化や遅延を招くことが少なく、銅箔の位置ずれや皺の発生を防いで製品の信頼性や品質の向上を図ることのできる配線板の製造方法を提供することを目的としている。   The present invention has been made in view of the above, and causes less complication and delay during the operation of laminating a thin copper foil and a prepreg, preventing the occurrence of misalignment and wrinkles of the copper foil, It is an object of the present invention to provide a method for manufacturing a wiring board capable of improving quality.

本発明においては上記課題を解決するため、サポート基材に銅箔とプリプレグとを積層して配線板を製造する配線板の製造方法であって、
サポート基材の少なくとも表裏いずれか一方の面の略周縁部に枠形の粘着層を備え、この粘着層に厚さが18μm以下の銅箔の略周縁部を着脱自在に粘着し、この銅箔に厚さが100μm以下のプリプレグと積層用の銅箔とを順次積層してプレスするとともに、積層用の銅箔に所定の導体パターンを形成して積層体を形成し、サポート基材から積層体を分離した後、積層体を形成する銅箔に所定の導体パターンを形成することを特徴としている。
In the present invention, in order to solve the above problems, a wiring board is produced by laminating a copper foil and a prepreg on a support base material,
A frame-shaped adhesive layer is provided on a substantially peripheral portion of at least one of the front and back surfaces of the support substrate, and a substantially peripheral portion of a copper foil having a thickness of 18 μm or less is detachably adhered to the adhesive layer. A prepreg having a thickness of 100 μm or less and a copper foil for laminating are sequentially laminated and pressed, and a predetermined conductor pattern is formed on the copper foil for laminating to form a laminated body. After separating the above, a predetermined conductor pattern is formed on the copper foil forming the laminate.

なお、積層体にプリプレグを介し積層用の銅箔を積層プレスし、この積層用の銅箔に所定の導体パターンを形成する処理を繰り返すことにより、積層体を多層化することができる。
また、積層体の周縁部を粘着層の内周部に沿って切断し、積層体の周縁部を粘着層と共に除去することにより、サポート基材から積層体を分離し、その後、積層体を形成する銅箔に所定の導体パターンをエッチング法で形成することができる。
In addition, the laminated body can be multilayered by repeatedly laminating and pressing a laminated copper foil on the laminated body through a prepreg and forming a predetermined conductor pattern on the laminated copper foil.
Moreover, the laminated body is separated from the support substrate by cutting the peripheral part of the laminated body along the inner peripheral part of the adhesive layer and removing the peripheral part of the laminated body together with the adhesive layer, and then forming the laminated body A predetermined conductor pattern can be formed on the copper foil to be etched by an etching method.

ここで、特許請求の範囲におけるサポート基材の略周縁部には、サポート基材の周縁部やその近傍が含まれる。また、銅箔は、サポート基材の表裏面、サポート基材の表面、あるいはサポート基材の裏面に粘着される。銅箔の片面の略周縁部には、銅箔片面の周縁部やその近傍が含まれる。銅箔や積層用の銅箔は、必要に応じ、パターン化することもできるし、一部又は全部を除去することもできる。また、積層体の層間には接続用のビアを形成し、このビアにはメッキを施すことができる。   Here, the substantially peripheral edge portion of the support base material in the claims includes the peripheral edge portion of the support base material and the vicinity thereof. Moreover, copper foil adheres to the front and back of a support base material, the surface of a support base material, or the back surface of a support base material. The substantially peripheral edge portion on one side of the copper foil includes the peripheral edge portion on the one side of the copper foil and the vicinity thereof. The copper foil and the copper foil for lamination can be patterned as necessary, or a part or all of them can be removed. Further, a via for connection is formed between the layers of the laminate, and the via can be plated.

本発明によれば、サポート基材に厚さが18μm以下の薄い銅箔を粘着層により粘着して一体化し、剛性を確保するので、扱いにくい銅箔とプリプレグとを積層する際、特に一枚目の銅箔とプリプレグとを積層する際、作業の煩雑化や遅延を招くことが少ない。   According to the present invention, a thin copper foil having a thickness of 18 μm or less is integrally adhered to the support base material by an adhesive layer, and rigidity is secured. Therefore, when laminating copper foil and prepreg which are difficult to handle, especially one sheet When laminating the copper foil and the prepreg of the eye, the work is less likely to be complicated and delayed.

本発明によれば、薄い銅箔とプリプレグとを積層する作業時の煩雑化や遅延を招くことが少なく、銅箔の位置ずれや皺の発生を防いで製品の信頼性や品質の向上を図ることができるという効果がある。   According to the present invention, there is little inconvenience and delay during the operation of laminating a thin copper foil and a prepreg, and the reliability and quality of the product are improved by preventing the displacement of the copper foil and the occurrence of wrinkles. There is an effect that can be.

また、請求項2記載の発明によれば、積層体を多層化して配線量の増大に対応するので、LSIの高性能化と小型化、部品のリード点数の増加等に対処することができる。
さらに、請求項3記載の発明によれば、粘着層が劣化して積層体のサポート基材からの取り外しに支障をきたしたり、粘着層の粘着性に拘わりなく積層体を取り外したい場合に、積層体を確実に取り外すことができる。
According to the second aspect of the present invention, since the multilayer body is multi-layered to cope with an increase in the amount of wiring, it is possible to cope with high performance and miniaturization of the LSI, an increase in the number of component leads, and the like.
Furthermore, according to the invention described in claim 3, when the adhesive layer is deteriorated so as to hinder the removal of the laminate from the support substrate, or when it is desired to remove the laminate regardless of the adhesiveness of the adhesive layer, The body can be removed reliably.

本発明に係る配線板の製造方法の実施形態を模式的に示す斜視説明図である。It is a perspective explanatory view showing typically an embodiment of a manufacturing method of a wiring board concerning the present invention. 本発明に係る配線板の製造方法の実施形態におけるサポート基材の粘着層に銅箔の周縁部を粘着する状態を模式的に示す斜視説明図である。It is a perspective explanatory view showing typically the state where the peripheral part of copper foil is stuck to the adhesion layer of the support substrate in the embodiment of the manufacturing method of the wiring board concerning the present invention. 本発明に係る配線板の製造方法の実施形態における銅箔の露出面にプリプレグと積層用の銅箔とを順次積層プレスして多層の積層体を形成する状態を模式的に示す部分断面説明図である。Partial cross-sectional explanatory drawing schematically showing a state in which a multilayer laminate is formed by sequentially laminating and pressing a prepreg and a laminating copper foil on the exposed surface of the copper foil in an embodiment of the method for producing a wiring board according to the present invention. It is. 本発明に係る配線板の製造方法の実施形態における積層体の銅箔を所定の電極パターンにパターニングした状態を模式的に示す部分断面説明図である。It is a partial section explanatory view showing typically the state where the copper foil of the layered product in the embodiment of the manufacturing method of the wiring board concerning the present invention was patterned into the predetermined electrode pattern. 本発明に係る配線板の製造方法の実施形態における積層体の周縁部を打ち抜いて除去する状態を模式的に示す部分断面説明図である。It is a fragmentary sectional view showing typically the state where it punches and removes the peripheral part of the layered product in the embodiment of the manufacturing method of the wiring board concerning the present invention.

以下、図面を参照して本発明の実施形態を説明すると、本実施形態における配線板の製造方法は、図1ないし図5に示すように、所定の剛性を有するサポート基材1に銅箔3を粘着層2を介し着脱自在に粘着し、銅箔3にプリプレグ4と積層用の銅箔5とを積層してプレスするとともに、積層用の銅箔5に所定の配線パターンを形成して積層体6を形成し、サポート基材1と積層体6とを分離した後、積層体6の銅箔3に所定の電極パターン9を形成するようにしている。   Hereinafter, an embodiment of the present invention will be described with reference to the drawings. As shown in FIGS. 1 to 5, a method of manufacturing a wiring board according to the present embodiment includes a copper foil 3 on a support base 1 having a predetermined rigidity. Is detachably adhered through the adhesive layer 2, the prepreg 4 and the laminated copper foil 5 are laminated and pressed on the copper foil 3, and a predetermined wiring pattern is formed on the laminated copper foil 5 and laminated. After forming the body 6 and separating the support substrate 1 and the laminated body 6, a predetermined electrode pattern 9 is formed on the copper foil 3 of the laminated body 6.

サポート基材1は、図1や図2に示すように、所定の材料を使用して銅箔3、プリプレグ4、積層用の銅箔5よりも大きい平板に形成され、平坦な表面に弱粘着性を有する銅箔3用の粘着層2が積層される。このサポート基材1は、特に限定されるものではないが、例えば銅や42アロイ等からなる金属シート、アルミニウム、ステンレス、ニッケル、ガラスエポキシ(ガラエポ)等を使用し、剛性、ハンドリング性、取扱性等を確保する観点から25μm〜1mmの厚さに形成される。   As shown in FIG. 1 and FIG. 2, the support base material 1 is formed into a flat plate larger than the copper foil 3, the prepreg 4 and the laminated copper foil 5 using a predetermined material, and is weakly adhered to a flat surface. The adhesive layer 2 for the copper foil 3 having the properties is laminated. Although this support base material 1 is not specifically limited, for example, a metal sheet made of copper, 42 alloy or the like, aluminum, stainless steel, nickel, glass epoxy (glass epoxy) or the like is used, and rigidity, handling property, and handling property are used. From the viewpoint of ensuring the above, etc., it is formed to a thickness of 25 μm to 1 mm.

粘着層2は、厚さ1〜50μm、好ましくは20μm程度の厚さを有するシリコーン系、フッ素系、エポキシ系、ウレタン系の粘着剤からなり、図2や図3に示すように、平面枠形に区画されてサポート基材1の表面周縁部やその付近に粘着される。この粘着層2の材料は特に限定されるものではないが、銅箔3、プリプレグ4、積層用の銅箔5のプレス時に不要なガスが発生拡散するのを防止し、しかも、優れた粘着性や剥離性等を得るため、熱硬化系の粘着剤、すなわち、シリコーン系粘着剤の採用が好ましい。   The adhesive layer 2 is made of a silicone-based, fluorine-based, epoxy-based, or urethane-based adhesive having a thickness of 1 to 50 μm, preferably about 20 μm. As shown in FIG. 2 and FIG. And is adhered to the periphery of the surface of the support substrate 1 or the vicinity thereof. The material of the adhesive layer 2 is not particularly limited, but prevents unnecessary gas from being generated and diffused when the copper foil 3, the prepreg 4 and the laminated copper foil 5 are pressed, and has excellent adhesiveness. In order to obtain, and peelability, it is preferable to employ a thermosetting pressure sensitive adhesive, that is, a silicone pressure sensitive adhesive.

粘着層2は、複数本の粘着剤を枠形に並べて粘着することにより形成しても良いし、予め枠形に形成して粘着しても良い。また、粘着剤をスクリーン印刷法やディスペンサを用いる方法により枠形に塗布し、この塗布した粘着剤を硬化させて形成するようにしても良い。   The adhesive layer 2 may be formed by arranging and adhering a plurality of adhesives in a frame shape, or may be formed in a frame shape and adhered in advance. Alternatively, the adhesive may be applied to the frame shape by a screen printing method or a method using a dispenser, and the applied adhesive may be cured.

銅箔3と積層用の銅箔5とは、配線板の薄型化に資するため、少なくとも銅箔3の厚さが18μm以下、好ましくは12μm以下、例えば9μmのタイプとされる。これら銅箔3や積層用の銅箔5のプリプレグ4と接触する接触面は、強度向上の観点からそれぞれ粗面化処理される。このような銅箔3と積層用の銅箔5とは、ハンダ接続の場合の信頼性を向上させるよう機能する。   The copper foil 3 and the laminated copper foil 5 are of a type in which at least the thickness of the copper foil 3 is 18 μm or less, preferably 12 μm or less, for example 9 μm, in order to contribute to thinning of the wiring board. The contact surfaces that come into contact with the copper foil 3 and the prepreg 4 of the laminated copper foil 5 are each roughened from the viewpoint of improving the strength. The copper foil 3 and the laminated copper foil 5 function to improve reliability in the case of solder connection.

プリプレグ4は、図1や図3に示すように、補強材のガラス布に熱硬化性樹脂を含浸させ、半硬化のB状態にした接着シートであり、配線板の薄型化を図るため、厚さ100μm以下、例えば厚さ30μm程度のタイプが使用される。このプリプレグ4は、銅箔3や積層用の銅箔5と共に加熱加圧されることで、銅張積層板となる。   As shown in FIGS. 1 and 3, the prepreg 4 is an adhesive sheet in which a glass cloth as a reinforcing material is impregnated with a thermosetting resin so as to be in a semi-cured B state. A type having a thickness of 100 μm or less, for example, a thickness of about 30 μm is used. The prepreg 4 is heated and pressed together with the copper foil 3 and the copper foil 5 for lamination to become a copper-clad laminate.

上記において、薄い配線板を製造する場合には、先ず、サポート基材1と銅箔3とを用意し、銅箔3の片面をサポート基材1の表面に対向(図2参照)させ、サポート基材表面の粘着性を有する粘着層2に銅箔3の対向する片面周縁部を着脱自在に粘着する。サポート基材1に銅箔3を粘着してこれらを一体化するので、銅箔3がばたつくことがなく、薄さにかかわらず、銅箔3を容易に取り扱うことができる。   In the above, when manufacturing a thin wiring board, first, the support base material 1 and the copper foil 3 are prepared, and one side of the copper foil 3 is opposed to the surface of the support base material 1 (see FIG. 2). The opposing one-side peripheral part of the copper foil 3 is detachably adhered to the adhesive layer 2 having adhesiveness on the surface of the substrate. Since the copper foil 3 is adhered to the support base material 1 to integrate them, the copper foil 3 does not flutter, and the copper foil 3 can be easily handled regardless of the thickness.

サポート基材1に銅箔3を粘着したら、この銅箔3の露出した表面にプリプレグ4と積層用の銅箔5とを順次積層(図1参照)してプレスし、積層用の銅箔5に所定の配線パターンをパターニングして積層体6を形成する。所定の配線パターンは、例えばエッチングレジストを形成するとともに、レジストをパターニングし、積層用の銅箔5の不要部分をエッチングして除去することにより形成される。   When the copper foil 3 is adhered to the support substrate 1, the prepreg 4 and the laminated copper foil 5 are sequentially laminated on the exposed surface of the copper foil 3 (see FIG. 1) and pressed, and the laminated copper foil 5 is pressed. A laminate 6 is formed by patterning a predetermined wiring pattern. The predetermined wiring pattern is formed, for example, by forming an etching resist, patterning the resist, and etching away unnecessary portions of the laminated copper foil 5.

積層体6に多層化(例えば3層、5層等)が要求される場合には、積層体6を形成する積層用の銅箔5表面にプリプレグ4を介し積層用の銅箔5を新たに積層プレスし、この新たな積層用の銅箔5に所定の配線パターンをパターニングする処理を必要回数繰り返し施すことにより、積層体6を多層化する(図3参照)。積層体6を多層化すると、積層体6の強度が徐々に増大するので、一枚目の銅箔3の場合と異なり、積層用の銅箔5の接着や積層に支障を来たすことが少ない。積層体6には、層間を電気的に接続する複数のビアを形成し、各ビアにメッキを施しても良い。   When the multilayer body 6 is required to have multiple layers (for example, three layers, five layers, etc.), the copper foil 5 for lamination is newly added to the surface of the copper foil 5 for lamination forming the multilayer body 6 via the prepreg 4. Lamination press is performed, and a process of patterning a predetermined wiring pattern on the new copper foil 5 for lamination is repeatedly performed as many times as necessary, so that the laminate 6 is multilayered (see FIG. 3). When the multilayer body 6 is multi-layered, the strength of the multilayer body 6 is gradually increased. Therefore, unlike the case of the first copper foil 3, there is little trouble in the adhesion and lamination of the copper foil 5 for lamination. The stacked body 6 may be formed with a plurality of vias that electrically connect the layers, and each via may be plated.

次いで、サポート基材1の粘着層2から積層体6を徐々に剥離し、この積層体6の露出した裏面、すなわち、積層体6を形成する銅箔3を所定の電極パターン9にパターニング(図4参照)すれば、薄い配線板を製造することができる。この場合、サポート基材1やその粘着層2が何ら損傷しないので、これらを再度使用することが可能となり、部品点数やコストの削減が大いに期待できる。所定の配線パターンは、各種のエッチング法により適宜形成される。   Next, the laminate 6 is gradually peeled off from the adhesive layer 2 of the support substrate 1, and the exposed back surface of the laminate 6, ie, the copper foil 3 forming the laminate 6 is patterned into a predetermined electrode pattern 9 (see FIG. 4), a thin wiring board can be manufactured. In this case, since the support base material 1 and its adhesive layer 2 are not damaged at all, they can be used again, and the number of parts and cost can be greatly reduced. The predetermined wiring pattern is appropriately formed by various etching methods.

粘着層2の特性が低下して積層体6の剥離に支障を来たしたり、粘着層2の粘着性に拘わりなく積層体6を確実に分離したい場合には、図5に示すように、積層体6を粘着層2の内周面に沿って打ち抜き刃7で枠形に打ち抜き、積層体6の不要な周縁部8を粘着層2と共に除去し、その後、不要な周縁部8が取り除かれた積層体6の銅箔3を所定の電極パターン9にエッチングしてパターニングすれば、薄い配線板を製造することができる。   When the properties of the pressure-sensitive adhesive layer 2 are deteriorated to hinder the peeling of the laminated body 6 or when it is desired to reliably separate the laminated body 6 regardless of the adhesiveness of the pressure-sensitive adhesive layer 2, as shown in FIG. 6 is punched into a frame shape with a punching blade 7 along the inner peripheral surface of the adhesive layer 2, the unnecessary peripheral edge 8 of the laminate 6 is removed together with the adhesive layer 2, and then the unnecessary peripheral edge 8 is removed. If the copper foil 3 of the body 6 is etched and patterned into a predetermined electrode pattern 9, a thin wiring board can be manufactured.

打ち抜き刃7で打ち抜く際、サポート基材1の周縁部を打ち抜かないよう調整しても良い。また、必要に応じ、サポート基材1の周縁部を共に打ち抜いて除去しても良い。   When punching with the punching blade 7, adjustment may be made so that the peripheral edge portion of the support substrate 1 is not punched. Moreover, you may punch and remove together the peripheral part of the support base material 1 as needed.

上記製法によれば、サポート基材1に銅箔3を粘着層2により粘着して剛性を確保するので、扱いにくい薄い銅箔3とプリプレグ4とを積層する際、特に最初の一枚目の銅箔3とプリプレグ4とを積層する際、積層作業の煩雑化や遅延を招くことがない。また、銅箔3を粘着してその位置ずれや皺の発生を有効に防止するので、配線むらの発生を抑制し、製品の信頼性や品質を大幅に向上させることができる。   According to the above manufacturing method, the copper foil 3 is adhered to the support base material 1 with the adhesive layer 2 to ensure rigidity. Therefore, when the thin copper foil 3 and the prepreg 4 which are difficult to handle are laminated, When the copper foil 3 and the prepreg 4 are laminated, the laminating work is not complicated or delayed. In addition, since the copper foil 3 is adhered to effectively prevent the positional deviation and wrinkles, the occurrence of wiring unevenness can be suppressed, and the reliability and quality of the product can be greatly improved.

また、サポート基材1の全表面から積層体6を弓なりに反らせて剥離するのではなく、積層体6の不要な周縁部8を粘着層2と共に除去して積層体6をサポート基材1から取り外すこともできるので、積層体6が湾曲により損傷するおそれがなく、安全に取り外すことができる。また、サポート基材1の粘着層2が銅箔3片面の全面ではなく、片面周縁部のみに粘着して粘着領域を狭い範囲に限定するので、粘着層2の粘着材残留に伴い、銅箔3を所定の電極パターン9にパターニングする作業に支障を来たすことがない。   Further, the laminated body 6 is not peeled off from the entire surface of the support base material 1 in a bow shape, but an unnecessary peripheral edge 8 of the laminated body 6 is removed together with the adhesive layer 2 to remove the laminated body 6 from the support base material 1. Since it can also remove, there is no possibility that the laminated body 6 will be damaged by curvature, and it can remove safely. Moreover, since the adhesive layer 2 of the support base material 1 adheres not only to the entire surface of one side of the copper foil 3 but only to the peripheral edge of one side, the adhesive region is limited to a narrow range. The work of patterning 3 into a predetermined electrode pattern 9 is not hindered.

さらに、サポート基材1を25μm〜1mmの範囲の厚さで形成するので、優れた剛性を確保したり、ハンドリング性を向上させて取り扱いを簡易、かつ容易にすることが可能になる。   Furthermore, since the support base material 1 is formed with a thickness in the range of 25 μm to 1 mm, it is possible to ensure excellent rigidity or to improve handling and simplify handling.

なお、上記実施形態ではサポート基材1の表面に銅箔3を粘着層2で粘着したが、サポート基材1の表裏面に銅箔3を粘着層2でそれぞれ着脱自在に粘着し、複数の積層体6を形成しても良い。また、上記実施形態では積層体6を形成する銅箔3を電極パターン9にパターニングしたが、銅箔3を配線パターンにパターニングしても良い。さらに、配線板の配線パターンや電極パターン9には耐食メッキを施し、電極パターン9にはハンダバンプ等を形成しても良い。   In the above embodiment, the copper foil 3 is adhered to the surface of the support base material 1 with the adhesive layer 2, but the copper foil 3 is detachably adhered to the front and back surfaces of the support base material 1 with the adhesive layer 2, respectively. The laminated body 6 may be formed. Moreover, in the said embodiment, although the copper foil 3 which forms the laminated body 6 was patterned to the electrode pattern 9, you may pattern the copper foil 3 to a wiring pattern. Furthermore, the wiring pattern of the wiring board and the electrode pattern 9 may be subjected to corrosion resistance plating, and the electrode pattern 9 may be formed with solder bumps or the like.

本発明に係る配線板の製造方法は、インターポーザ、コアレスビルドアップ基板、半導体パッケージ、プリント配線板の製造分野等で使用することができる。   The method for manufacturing a wiring board according to the present invention can be used in the field of manufacturing interposers, coreless buildup substrates, semiconductor packages, printed wiring boards, and the like.

1 サポート基材
2 粘着層
3 銅箔
4 プリプレグ
5 積層用の銅箔
6 積層体
8 積層体の周縁部
9 電極パターン(導体パターン)
DESCRIPTION OF SYMBOLS 1 Support base material 2 Adhesive layer 3 Copper foil 4 Prepreg 5 Copper foil 6 for lamination | stacking Laminated body 8 Peripheral part 9 of a laminated body Electrode pattern (conductor pattern)

Claims (3)

サポート基材に銅箔とプリプレグとを積層して配線板を製造する配線板の製造方法であって、
サポート基材の少なくとも表裏いずれか一方の面の略周縁部に枠形の粘着層を備え、この粘着層に厚さが18μm以下の銅箔の略周縁部を着脱自在に粘着し、この銅箔に厚さが100μm以下のプリプレグと積層用の銅箔とを順次積層してプレスするとともに、積層用の銅箔に所定の導体パターンを形成して積層体を形成し、サポート基材から積層体を分離した後、積層体を形成する銅箔に所定の導体パターンを形成することを特徴とする配線板の製造方法。
A wiring board manufacturing method for manufacturing a wiring board by laminating a copper foil and a prepreg on a support substrate,
A frame-shaped adhesive layer is provided on a substantially peripheral portion of at least one of the front and back surfaces of the support substrate, and a substantially peripheral portion of a copper foil having a thickness of 18 μm or less is detachably adhered to the adhesive layer. A prepreg having a thickness of 100 μm or less and a copper foil for laminating are sequentially laminated and pressed, and a predetermined conductor pattern is formed on the copper foil for laminating to form a laminated body. A method for manufacturing a wiring board, comprising: forming a predetermined conductor pattern on a copper foil forming a laminated body after separating the substrate.
積層体にプリプレグを介し積層用の銅箔を積層プレスし、この積層用の銅箔に所定の導体パターンを形成する処理を繰り返すことにより、積層体を多層化する請求項1記載の配線板の製造方法。   2. The wiring board according to claim 1, wherein the laminated body is multilayered by pressing a laminated copper foil on the laminated body through a prepreg and repeating a process of forming a predetermined conductor pattern on the laminated copper foil. Production method. 積層体の周縁部を粘着層の内周部に沿って切断し、積層体の周縁部を粘着層と共に除去することにより、サポート基材から積層体を分離し、その後、積層体を形成する銅箔に所定の導体パターンをエッチング法で形成する請求項1又は2記載の配線板の製造方法。   Copper that forms the laminate by separating the laminate from the support substrate by cutting the periphery of the laminate along the inner periphery of the adhesive layer and removing the periphery of the laminate together with the adhesive layer The method for manufacturing a wiring board according to claim 1, wherein a predetermined conductor pattern is formed on the foil by an etching method.
JP2011258937A 2011-11-28 2011-11-28 Manufacturing method of wiring board Pending JP2013115174A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011258937A JP2013115174A (en) 2011-11-28 2011-11-28 Manufacturing method of wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011258937A JP2013115174A (en) 2011-11-28 2011-11-28 Manufacturing method of wiring board

Publications (1)

Publication Number Publication Date
JP2013115174A true JP2013115174A (en) 2013-06-10

Family

ID=48710460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011258937A Pending JP2013115174A (en) 2011-11-28 2011-11-28 Manufacturing method of wiring board

Country Status (1)

Country Link
JP (1) JP2013115174A (en)

Similar Documents

Publication Publication Date Title
US7441330B2 (en) Process for producing circuit board
JP4972189B2 (en) Substrate manufacturing carrier member and substrate manufacturing method using the same
US20130341073A1 (en) Packaging substrate and method for manufacturing same
JP2007335700A (en) Manufacturing method of wiring board
JP2013030603A (en) Method of manufacturing wiring board
JP5464760B2 (en) Multilayer circuit board manufacturing method
US20140036465A1 (en) Packaging substrate, method for manufacturing same, and chip packaging body having same
CN102340933B (en) Manufacturing method of circuit board
JP4617941B2 (en) Method for manufacturing circuit-formed substrate
JP2006049660A (en) Manufacturing method of printed wiring board
KR20090029508A (en) Fabricating method of printed circuit board using the carrier
JP5302920B2 (en) Manufacturing method of multilayer wiring board
EP2958408A1 (en) Substrate with built-in component, and manufacturing method for same
JP2010206124A (en) Method of manufacturing multilayer circuit board, and multilayer circuit board
US20160073505A1 (en) Manufacturing method of multilayer flexible circuit structure
JP2013115315A (en) Manufacturing method of wiring board
JP2013115316A (en) Manufacturing method of wiring board
JP5302927B2 (en) Manufacturing method of multilayer wiring board
JP5057339B2 (en) Wiring board manufacturing method
TWI608778B (en) Multilayer printed wiring board manufacturing method
JP2015063096A (en) Metal foil with carrier and production method of laminated substrate using the metal foil with carrier
JP2013115174A (en) Manufacturing method of wiring board
JP4692317B2 (en) Adhesive substrate, circuit board manufacturing method, and circuit board
KR101055571B1 (en) Carrier member for substrate manufacturing and method for manufacturing substrate using same
KR101119380B1 (en) A carrier member for manufacturing a substrate and a method of manufacturing a substrate using the same