JP2013113782A5 - - Google Patents
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- JP2013113782A5 JP2013113782A5 JP2011262147A JP2011262147A JP2013113782A5 JP 2013113782 A5 JP2013113782 A5 JP 2013113782A5 JP 2011262147 A JP2011262147 A JP 2011262147A JP 2011262147 A JP2011262147 A JP 2011262147A JP 2013113782 A5 JP2013113782 A5 JP 2013113782A5
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- ray
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- fluorescent
- detector
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011262147A JP5990734B2 (ja) | 2011-11-30 | 2011-11-30 | 蛍光x線分析装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011262147A JP5990734B2 (ja) | 2011-11-30 | 2011-11-30 | 蛍光x線分析装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2013113782A JP2013113782A (ja) | 2013-06-10 |
JP2013113782A5 true JP2013113782A5 (enrdf_load_stackoverflow) | 2014-12-04 |
JP5990734B2 JP5990734B2 (ja) | 2016-09-14 |
Family
ID=48709433
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011262147A Active JP5990734B2 (ja) | 2011-11-30 | 2011-11-30 | 蛍光x線分析装置 |
Country Status (1)
Country | Link |
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JP (1) | JP5990734B2 (enrdf_load_stackoverflow) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016017759A (ja) * | 2014-07-04 | 2016-02-01 | 株式会社リガク | X線測定モジュールおよびそれを複数備える蛍光x線分析装置 |
CN104264228A (zh) * | 2014-10-09 | 2015-01-07 | 北京安科慧生科技有限公司 | 双曲面弯晶、组合式双曲面弯晶及单波长色散 x 射线荧光光谱仪 |
CN105115999B (zh) * | 2015-09-08 | 2019-07-19 | 北京安科慧生科技有限公司 | 一种高灵敏度单色激发多元素x射线荧光光谱仪 |
KR102056556B1 (ko) * | 2016-09-30 | 2019-12-16 | 가부시키가이샤 리가쿠 | 파장 분산형 형광 x선 분석 장치, 및 그것을 사용하는 형광 x선 분석 방법 |
US10989822B2 (en) * | 2018-06-04 | 2021-04-27 | Sigray, Inc. | Wavelength dispersive x-ray spectrometer |
CN115667896B (zh) | 2020-05-18 | 2024-06-21 | 斯格瑞公司 | 使用晶体分析器和多个检测元件的x射线吸收光谱的系统和方法 |
DE112021004828T5 (de) | 2020-09-17 | 2023-08-03 | Sigray, Inc. | System und verfahren unter verwendung von röntgenstrahlen für tiefenauflösende messtechnik und analyse |
US11686692B2 (en) | 2020-12-07 | 2023-06-27 | Sigray, Inc. | High throughput 3D x-ray imaging system using a transmission x-ray source |
US11796491B2 (en) | 2021-01-05 | 2023-10-24 | Shimadzu Corporation | X-ray spectroscopic analysis apparatus and elemental analysis method |
WO2023168204A1 (en) | 2022-03-02 | 2023-09-07 | Sigray, Inc. | X-ray fluorescence system and x-ray source with electrically insulative target material |
US11992350B2 (en) | 2022-03-15 | 2024-05-28 | Sigray, Inc. | System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector |
WO2023215204A1 (en) | 2022-05-02 | 2023-11-09 | Sigray, Inc. | X-ray sequential array wavelength dispersive spectrometer |
WO2024173256A1 (en) | 2023-02-16 | 2024-08-22 | Sigray, Inc. | X-ray detector system with at least two stacked flat bragg diffractors |
CN116067998B (zh) * | 2023-02-23 | 2025-05-09 | 中国工程物理研究院激光聚变研究中心 | 双通道多支路门控晶体谱仪 |
US12181423B1 (en) | 2023-09-07 | 2024-12-31 | Sigray, Inc. | Secondary image removal using high resolution x-ray transmission sources |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002156343A (ja) * | 2000-11-17 | 2002-05-31 | Rigaku Industrial Co | 蛍光x線分析装置 |
EP1402541B1 (en) * | 2001-06-19 | 2006-08-16 | X-Ray Optical Systems, Inc. | Wavelength dispersive xrf system using focusing optic for excitation and a focusing monochromator for collection |
JP4330981B2 (ja) * | 2003-11-21 | 2009-09-16 | 株式会社リガク | 蛍光x線分析装置 |
US8058621B2 (en) * | 2009-10-26 | 2011-11-15 | General Electric Company | Elemental composition detection system and method |
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2011
- 2011-11-30 JP JP2011262147A patent/JP5990734B2/ja active Active
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