JP2013112624A - アミド化合物、防カビ剤およびそれを用いる防カビ方法 - Google Patents
アミド化合物、防カビ剤およびそれを用いる防カビ方法 Download PDFInfo
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- JP2013112624A JP2013112624A JP2011258161A JP2011258161A JP2013112624A JP 2013112624 A JP2013112624 A JP 2013112624A JP 2011258161 A JP2011258161 A JP 2011258161A JP 2011258161 A JP2011258161 A JP 2011258161A JP 2013112624 A JP2013112624 A JP 2013112624A
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- JP
- Japan
- Prior art keywords
- amide compound
- general formula
- membered ring
- antifungal agent
- agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 Amide compound Chemical class 0.000 title claims abstract description 140
- 238000000034 method Methods 0.000 title claims abstract description 26
- 230000002265 prevention Effects 0.000 title abstract description 8
- 125000001424 substituent group Chemical group 0.000 claims abstract description 34
- 229920006395 saturated elastomer Polymers 0.000 claims abstract description 30
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 23
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 15
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 13
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 8
- 125000002883 imidazolyl group Chemical group 0.000 claims abstract description 6
- 229940121375 antifungal agent Drugs 0.000 claims description 61
- 239000003429 antifungal agent Substances 0.000 claims description 56
- 239000000126 substance Substances 0.000 claims description 45
- 125000005842 heteroatom Chemical group 0.000 claims description 43
- 125000004432 carbon atom Chemical group C* 0.000 claims description 23
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 13
- 230000000843 anti-fungal effect Effects 0.000 claims description 11
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical group CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 abstract description 58
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract description 44
- 125000003386 piperidinyl group Chemical group 0.000 abstract description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 abstract description 2
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 84
- 150000001412 amines Chemical class 0.000 description 66
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 58
- 238000006243 chemical reaction Methods 0.000 description 38
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 29
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 21
- 239000002904 solvent Substances 0.000 description 20
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 17
- 238000003786 synthesis reaction Methods 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 15
- 239000007810 chemical reaction solvent Substances 0.000 description 15
- 239000012043 crude product Substances 0.000 description 14
- 239000000417 fungicide Substances 0.000 description 14
- 239000007788 liquid Substances 0.000 description 14
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 13
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 12
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 12
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- 125000000217 alkyl group Chemical group 0.000 description 10
- 239000002562 thickening agent Substances 0.000 description 10
- 239000000654 additive Substances 0.000 description 9
- 238000006482 condensation reaction Methods 0.000 description 9
- 230000000855 fungicidal effect Effects 0.000 description 9
- 230000005484 gravity Effects 0.000 description 9
- 125000005843 halogen group Chemical group 0.000 description 9
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- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 7
- 238000000638 solvent extraction Methods 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
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- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
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- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
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- 239000000443 aerosol Substances 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 238000000746 purification Methods 0.000 description 6
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- MZFGYVZYLMNXGL-UHFFFAOYSA-N undec-10-enoyl chloride Chemical compound ClC(=O)CCCCCCCCC=C MZFGYVZYLMNXGL-UHFFFAOYSA-N 0.000 description 5
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N EtOH Substances CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 4
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical group C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 230000002421 anti-septic effect Effects 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- WMPOZLHMGVKUEJ-UHFFFAOYSA-N decanedioyl dichloride Chemical compound ClC(=O)CCCCCCCCC(Cl)=O WMPOZLHMGVKUEJ-UHFFFAOYSA-N 0.000 description 4
- 239000002270 dispersing agent Substances 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 238000002955 isolation Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 150000003335 secondary amines Chemical class 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 4
- GYHSRSBOTLUSOX-UHFFFAOYSA-N 1-(2-methylimidazol-1-yl)undec-10-en-1-one Chemical compound CC1=NC=CN1C(=O)CCCCCCCCC=C GYHSRSBOTLUSOX-UHFFFAOYSA-N 0.000 description 3
- WOFTUTMIDJZEMB-UHFFFAOYSA-N 1-(4-methyl-2-phenylimidazol-1-yl)undec-10-en-1-one Chemical compound CC1=CN(C(=N1)C2=CC=CC=C2)C(=O)CCCCCCCCC=C WOFTUTMIDJZEMB-UHFFFAOYSA-N 0.000 description 3
- IITCDZXAXQNBIR-UHFFFAOYSA-N 1-imidazol-1-ylundec-10-en-1-one Chemical compound C(CCCCCCCCC=C)(=O)N1C=NC=C1 IITCDZXAXQNBIR-UHFFFAOYSA-N 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- GPZYYYGYCRFPBU-UHFFFAOYSA-N 6-Hydroxyflavone Chemical compound C=1C(=O)C2=CC(O)=CC=C2OC=1C1=CC=CC=C1 GPZYYYGYCRFPBU-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- SLLLGISWBAMZFM-UHFFFAOYSA-N C1CCN(CC1)C(=O)CCCCCCCCCCCC(=O)N2CCCCC2 Chemical compound C1CCN(CC1)C(=O)CCCCCCCCCCCC(=O)N2CCCCC2 SLLLGISWBAMZFM-UHFFFAOYSA-N 0.000 description 3
- RSSAKOZODDOSLZ-UHFFFAOYSA-N C=CCCCCCCCCC(=O)N1C=CN=C1C2=CC=CC=C2 Chemical compound C=CCCCCCCCCC(=O)N1C=CN=C1C2=CC=CC=C2 RSSAKOZODDOSLZ-UHFFFAOYSA-N 0.000 description 3
- XBIFLTRCJMEFRA-UHFFFAOYSA-N CC1CCN(CC1)C(CCCCCCCCC(=O)N1CCC(CC1)C)=O Chemical compound CC1CCN(CC1)C(CCCCCCCCC(=O)N1CCC(CC1)C)=O XBIFLTRCJMEFRA-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 3
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
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- 125000001931 aliphatic group Chemical group 0.000 description 3
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- 125000003368 amide group Chemical group 0.000 description 3
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- 239000000194 fatty acid Substances 0.000 description 3
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- XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 description 3
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- DXNCZXXFRKPEPY-UHFFFAOYSA-N tridecanedioic acid Chemical compound OC(=O)CCCCCCCCCCCC(O)=O DXNCZXXFRKPEPY-UHFFFAOYSA-N 0.000 description 3
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- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 2
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Abstract
Description
(1)下記一般式(1)で示されるアミド化合物を含有することを特徴とする、防カビ剤、
一般式(1):
(2)前記不飽和複素5員環が、2個の窒素原子を含むことを特徴とする、前記(1)に記載の防カビ剤、
(3)前記不飽和複素5員環が、イミダゾール基であることを特徴とする、前記(2)に記載の防カビ剤、
(4)前記不飽和複素5員環が、置換基として、メチル基および/またはフェニル基を有していることを特徴とする、前記(1)〜(3)のいずれか一つに記載の防カビ剤、
(5)前記一般式(1)において、Zが、ビニル基であることを特徴とする、前記(1)〜(4)のいずれか一つに記載の防カビ剤、
(6)前記一般式(1)において、Y1が、オクチレン基であることを特徴とする、前記(1)〜(5)のいずれか一つに記載の防カビ剤、
(7)下記一般式(2)で示されるアミド化合物を含有することを特徴とする、防カビ剤、
一般式(2):
(8)前記一般式(2)において、Bで示される置換基を有してもよい飽和または不飽和複素5〜6員環と、Cで示される置換基を有してもよい飽和または不飽和複素5〜6員環とが、同一であることを特徴とする、前記(7)に記載の防カビ剤、
(9)前記一般式(2)において、Bは、置換基を有してもよい飽和複素6員環であることを特徴とする、前記(7)または(8)に記載の防カビ剤、
(10)前記一般式(2)において、Cは、置換基を有してもよい飽和複素6員環であることを特徴とする、前記(7)〜(9)のいずれか一つに記載の防カビ剤、
(11)前記一般式(2)において、Y2が、炭素数8〜11のアルキレン基であることを特徴とする、前記(7)〜(10)のいずれか一つに記載の防カビ剤、
(12)前記(1)〜(11)のいずれか一つに記載の防カビ剤を用いることを特徴とする、防カビ方法、
(13)下記化学式(3)で示されるアミド化合物、
化学式(3):
上記一般式(1)において、Aで示される不飽和複素5員環は、カルボニル基と結合する(アミド基を形成する)窒素原子を含むヘテロ環であり、その他にヘテロ原子を含んでいてもよい。
化学式(3):
反応式(1):
上記反応式(1)において、Xで示されるハロゲン原子としては、例えば、臭素、塩素、フッ素、ヨウ素などが挙げられ、好ましくは、塩素が挙げられる。
上記一般式(2)において、Bで示される飽和または不飽和複素5〜6員環は、カルボニル基と結合する(アミド基を形成する)窒素原子を含むヘテロ環であり、その他にヘテロ原子(例えば、窒素原子、酸素原子、硫黄原子)を含んでもよい。
化学式(7):
反応式(2):
上記反応式(2)において、Xで示されるハロゲン原子としては、例えば、上記反応式(1)において、Xで示されるハロゲン原子と同様のハロゲン原子が挙げられ、好ましくは、塩素が挙げられる。
10−ウンデセン酸クロリド(2.0g、0.01mol)を、テトラヒドロフラン(THF)(10mL)に溶解し、モノカルボン酸クロリド溶液を調製した。
高分解能−イオントラップ−飛行時間型質量分析器(HR−IT−TOFMS) m/z:257.1587[M+Na]+、(Calcd for C14H22N2ONa:257.1630)
合成例2
10−ウンデセン酸クロリド(2.0g、0.01mol)を、THF(10mL)に溶解し、モノカルボン酸クロリド溶液を調製した。
HR−IT−TOFMS m/z:271.2022[M+Na]+、(Calcd for C15H24N2ONa:271.1786)
合成例3
10−ウンデセン酸クロリド(3.2g、0.016mol)を、THF(20mL)に溶解し、モノカルボン酸クロリド溶液を調製した。
HR−IT−TOFMS m/z:333.1953[M+Na]+、(Calcd for C20H26N2ONa:333.1943)
合成例4
10−ウンデセン酸クロリド(2.5g、0.012mol)を、THF(20mL)に溶解し、モノカルボン酸クロリド溶液を調製した。
HR−IT−TOFMS m/z:346.2029[M+Na]+、(Calcd for C21H28N2ONa:347.2099)
合成例5
デカン二酸(デカン−1,10−ジカルボン酸)(2.7g、0.0096mol)に、塩化チオニール(8mL)を加え、水浴上で2時間還流した。その後、過剰の塩化チオニールを減圧下で留去し、デカン二酸ジクロリドを得た。
HR−IT−TOFMS m/z:387.3022[M+Na]+、(Calcd for C22H40N2O2Na:387.2982)
合成例6
トリデカン二酸(2.8g、0.01mol)に、塩化チオニール(8mL)を加え、水浴上で2時間還流した。その後、過剰の塩化チオニールを減圧下で留去し、トリデカン二酸ジクロリドを得た。
HR−IT−TOFMS m/z:379.3368[M+H]+、(Calcd for C23H43N2O2:379.3319)
実施例1
合成例1で合成された1−(1H−イミダゾール−1−イル)ウンデック−10−エン−1−オンを、アセトンで希釈して、濃度が、10mg/mL(10000ppm)となるように調製し、防カビ剤(液剤)を得た。
合成例2で合成された1−(2−メチル−1H−イミダゾール−1−イル)ウンデック−10−エン−1−オンを、アセトンで希釈して、濃度が、10mg/mL(10000ppm)となるように調製し、防カビ剤(液剤)を得た。
合成例3で合成された1−(2−フェニル−1H−イミダゾール−1−イル)ウンデック−10−エン−1−オンを、アセトンで希釈して、濃度が、10mg/mL(10000ppm)となるように調製し、防カビ剤(液剤)を得た。
合成例4で合成された1−(4−メチル−2−フェニル−1H−イミダゾール−1−イル)ウンデック−10−エン−1−オンを、アセトンで希釈して、濃度が、10mg/mL(10000ppm)となるように調製し、防カビ剤(液剤)を得た。
合成例5で合成された1,10−ジ(4−メチルピペリジン−1−イル)デカン−1,10−ジオンを、アセトンで希釈して、濃度が、10mg/mL(10000ppm)となるように調製し、防カビ剤(液剤)を得た。
合成例6で合成された1,13−ジ(ピペリジン−1−イル)トリデカン−1,13−ジオンを、アセトンで希釈して、濃度が、10mg/mL(10000ppm)となるように調製し、防カビ剤(液剤)を得た。
実施例1〜6で調製された防カビ剤を、それぞれ、直径8mmのろ紙(ペーパーディスク抗生物質検定用)に対して、40μLずつ滴下し、風乾させた。
なお、表1には、各カビ剤を含有しないろ紙を用いた結果も、コントロールとして併せて示している。
Claims (18)
- 前記不飽和複素5員環が、2個の窒素原子を含むことを特徴とする、請求項1に記載の防カビ剤。
- 前記不飽和複素5員環が、イミダゾール基であることを特徴とする、請求項2に記載の防カビ剤。
- 前記不飽和複素5員環が、置換基として、メチル基および/またはフェニル基を有していることを特徴とする、請求項1〜3のいずれか一項に記載の防カビ剤。
- 前記一般式(1)において、Zが、ビニル基であることを特徴とする、請求項1〜4のいずれか一項に記載の防カビ剤。
- 前記一般式(1)において、Y1が、オクチレン基であることを特徴とする、請求項1〜5のいずれか一項に記載の防カビ剤。
- 前記一般式(2)において、Bで示される置換基を有してもよい飽和または不飽和複素5〜6員環と、Cで示される置換基を有してもよい飽和または不飽和複素5〜6員環とが、同一であることを特徴とする、請求項7に記載の防カビ剤。
- 前記一般式(2)において、Bは、置換基を有してもよい飽和6員環であることを特徴とする、請求項7または8に記載の防カビ剤。
- 前記一般式(2)において、Cは、置換基を有してもよい飽和6員環であることを特徴とする、請求項7〜9のいずれか一項に記載の防カビ剤。
- 前記一般式(2)において、Y2が、炭素数8〜11のアルキレン基であることを特徴とする、請求項7〜10のいずれか一項に記載の防カビ剤。
- 請求項1〜11のいずれか一項に記載の防カビ剤を用いることを特徴とする、防カビ方法。
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