JP2013098514A5 - - Google Patents
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- JP2013098514A5 JP2013098514A5 JP2011243132A JP2011243132A JP2013098514A5 JP 2013098514 A5 JP2013098514 A5 JP 2013098514A5 JP 2011243132 A JP2011243132 A JP 2011243132A JP 2011243132 A JP2011243132 A JP 2011243132A JP 2013098514 A5 JP2013098514 A5 JP 2013098514A5
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- JP
- Japan
- Prior art keywords
- substrate
- electrode
- bump
- semiconductor device
- conductive portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 239000000758 substrate Substances 0.000 claims 16
- 239000004065 semiconductor Substances 0.000 claims 7
- 239000000463 material Substances 0.000 claims 3
- 230000002093 peripheral effect Effects 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000000149 penetrating effect Effects 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011243132A JP2013098514A (ja) | 2011-11-07 | 2011-11-07 | 半導体装置の製造方法及び半導体装置、電子機器 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011243132A JP2013098514A (ja) | 2011-11-07 | 2011-11-07 | 半導体装置の製造方法及び半導体装置、電子機器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013098514A JP2013098514A (ja) | 2013-05-20 |
JP2013098514A5 true JP2013098514A5 (enrdf_load_stackoverflow) | 2014-12-11 |
Family
ID=48620122
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011243132A Withdrawn JP2013098514A (ja) | 2011-11-07 | 2011-11-07 | 半導体装置の製造方法及び半導体装置、電子機器 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2013098514A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150171039A1 (en) * | 2013-12-13 | 2015-06-18 | Chipmos Technologies Inc. | Redistribution layer alloy structure and manufacturing method thereof |
TW201838094A (zh) * | 2017-02-16 | 2018-10-16 | 學校法人慶應義塾 | 層疊半導體積體電路裝置 |
US11688840B2 (en) * | 2019-12-28 | 2023-06-27 | Seoul Viosys Co., Ltd. | Light emitting device and led display apparatus having the same |
KR20230147601A (ko) * | 2021-02-19 | 2023-10-23 | 소니 세미컨덕터 솔루션즈 가부시키가이샤 | 전자 기기 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4000045B2 (ja) * | 2002-10-30 | 2007-10-31 | 京セラ株式会社 | 弾性表面波装置及びその製造方法 |
US6835589B2 (en) * | 2002-11-14 | 2004-12-28 | International Business Machines Corporation | Three-dimensional integrated CMOS-MEMS device and process for making the same |
EP1573799B1 (en) * | 2002-12-20 | 2010-01-27 | International Business Machines Corporation | Three-dimensional device fabrication method |
JP4744213B2 (ja) * | 2005-07-11 | 2011-08-10 | 日本電波工業株式会社 | 電子部品の製造方法 |
JP2007318143A (ja) * | 2006-05-22 | 2007-12-06 | Samsung Electronics Co Ltd | 半導体構造体及びその製造方法 |
KR20100020718A (ko) * | 2008-08-13 | 2010-02-23 | 삼성전자주식회사 | 반도체 칩, 그 스택 구조 및 이들의 제조 방법 |
US8618670B2 (en) * | 2008-08-15 | 2013-12-31 | Qualcomm Incorporated | Corrosion control of stacked integrated circuits |
US8749027B2 (en) * | 2009-01-07 | 2014-06-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Robust TSV structure |
-
2011
- 2011-11-07 JP JP2011243132A patent/JP2013098514A/ja not_active Withdrawn
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