JP2013093503A - Exposure device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure device capable of shortening the tact time of an exposure process.SOLUTION: The exposure device comprises: a stage 1 on which a substrate P being exposed during conveyance is mounted; an exposure means 2 provided in the middle of the stage 1 and exposing the substrate P; and conveyance means 3 reciprocating between a stage 12 on the front side and a stage 13 on the back side of the exposure means 2 in the conveyance direction of the substrate 1, and conveying the substrate P mounted on the stage 12 on the front side onto the stage 13 on the back side. A plurality of substrates P are mounted on the stage 12 on the front side in the conveyance direction while forming an array in parallel with the conveyance direction. The conveyance means 3 conveys the plurality of substrates P mounted on the stage 12 on the front side simultaneously, and the exposure means 2 exposes the substrate P being conveyed by the conveyance means 3.

Description

  The present invention relates to an exposure apparatus that exposes a substrate, and more particularly, to an exposure apparatus that can shorten the tact time of an exposure process by exposing a plurality of substrates while carrying them simultaneously.

  A conventional exposure apparatus is an exposure apparatus that exposes a substrate by arranging a photomask on the surface to be exposed of the substrate and irradiating the substrate with light through the photomask. An unloading exposure area, a loading means for loading the substrate to the exposure area in a horizontal state, a substrate standing means for raising the substrate in the exposure area, and a substrate standing in the exposure area On the other hand, exposure processing means for irradiating light through a photomask, substrate laying means for returning the exposed substrate from a standing state to a horizontal state, and carrying out the substrate returned to the horizontal state from the exposure region There was a thing provided with the carrying-out means for doing (for example, refer to patent documents 1).

JP-A-9-244257

  The conventional exposure apparatus performs exposure while transporting the substrates one by one, and it is necessary to increase the exposure speed in order to shorten the tact time of the exposure process. However, in order to increase the exposure speed, an expensive exposure light source with high output is required. In addition, there is an upper limit in the output of the exposure light source due to the limitation of the exposure amount to the substrate. For this reason, it has been difficult to shorten the tact time by increasing the exposure speed.

  Therefore, a problem to be solved by the present invention that addresses such problems is to provide an exposure apparatus that shortens the tact time of the exposure process without increasing the exposure speed.

  In order to solve the above-described problems, an exposure apparatus according to the present invention includes a stage on which a substrate to be exposed during transportation is placed, an exposure unit that is provided at the center of the stage, and that exposes the substrate, and the exposure Conveying means for reciprocating between the stage on the near side and the stage on the far side of the substrate in the conveyance direction of the means, and conveying the substrate placed on the stage on the near side to the stage on the far side, It is comprised including. A plurality of substrates are placed in a row parallel to the transport direction on the stage on the near side in the transport direction, and the transport means is a plurality of sheets placed on the stage on the near side The substrate is transported simultaneously, and the exposure unit exposes the substrate being transported by the transport unit.

  According to the exposure apparatus of the present invention, it is possible to reduce the tact time of the exposure process by exposing the plurality of substrates being simultaneously conveyed by the conveying means by the exposing means. Therefore, the tact time of the exposure process can be shortened without increasing the exposure speed.

It is a top view which shows embodiment of the exposure apparatus by this invention. It is a principal part enlarged view of FIG. It is a flowchart of the exposure process by the said exposure apparatus. It is a top view which shows operation | movement of the exposure apparatus in each step of the said flowchart.

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings.
FIG. 1 is a plan view showing an embodiment of an exposure apparatus according to the present invention. This exposure apparatus exposes a substrate P (see FIG. 4) to be exposed, such as a semiconductor element, a display panel, and a printed circuit board, while carrying a stage 1, an exposure unit 2, and a transfer unit 3. And robot arms 4a and 4b. The exposure apparatus in the present embodiment performs exposure while simultaneously transporting two substrates P at a time. However, the number of substrates P that are transported simultaneously may be a plurality, for example, three, four, and five or more. But you can.

The stage 1 on which a substrate P to be exposed during conveyance is placed, and includes an LD (loading) stage 11, a near-side stage 12, and a back-side stage 13. The LD stage 11 is a portion of the stage 1 on the front side (hereinafter simply referred to as “front side”) of the transport direction of the substrate P (hereinafter simply referred to as “transport direction”). The substrate P carried into the stage 1 from the storage means for the substrate P provided outside the stage 1 is first placed on the LD stage 11. Positions A ₁ and A ₂ on which the substrates P ₁ and P ₂ to be exposed simultaneously are placed are set on the LD stage 11.

The positions A ₁ and A ₂ are set on the LD stage 11 so as to form a row parallel to the transport direction. Therefore, the substrates P ₁ and P ₂ placed on the positions A ₁ and A ₂ are placed on the LD stage 11 so as to form a row parallel to the transport direction. The positions, sizes and intervals of the positions A ₁ and A ₂ are set according to the types, sizes and shapes of the substrates P ₁ and P ₂ . When the exposure apparatus exposes more than two substrates P simultaneously, it is preferable that the position A on which the substrates P are placed is set to the same number as the number of substrates P to be exposed simultaneously.

The LD stage 11 is provided with alignment means (not shown). The alignment means is for aligning the substrate P in the position A _1, is provided on the position A _1. The alignment means may be any substrate P capable aligned on position A _1, for example, pins or mechanically aligning the position A ₁ and the substrate P in contact with the substrate P those, optical Means for aligning are used. Since the high-precision alignment of the substrate P is performed again on the front stage 12, it is preferable that an inexpensive mechanical alignment means is used as the alignment means of the LD stage 11. The alignment means may be provided at the positions A ₁ and A ₂ , respectively.

  Further, the LD stage 11 is provided with transfer means (not shown). This transfer means transfers the substrate P placed on the LD stage 11 from the stage 1 to the back side in the transport direction (hereinafter simply referred to as “back side”). Support means for the substrate P that can reciprocate between the front side and the back side is used. A vacuum chuck or the like may be used as the support means. One transfer means may be provided, or a plurality of transfer means may be provided.

A front stage 12 is formed on the back side from the LD stage 11. This near-side stage 12 is a part of the stage 1 formed between the LD stage 11 and the back-side stage 13. The two substrates P ₁ and P ₂ placed on the LD stage 11 are transferred onto the front stage 12 by the transfer means. Positions A ₃ and A _{4 on} which the substrates P ₁ and P ₂ are respectively placed are set on the near-side stage 12.

The positions A ₃ and A ₄ are set on the front stage 12 so as to form a row parallel to the transport direction. Accordingly, the substrates P ₁ and P ₂ respectively placed at the positions A ₃ and A ₄ are placed on the front stage 12 so as to form a row parallel to the transport direction. The positions, sizes, intervals, etc. of the positions A ₃ , A ₄ are set according to the types, sizes, shapes, etc. of the substrates P ₁ , P ₂ . When the exposure apparatus exposes more than two substrates P at the same time, the position A on which the substrates P are placed is preferably set to the same number as the number of substrates P to be exposed at the same time. The positions A ₃ and A _{4 of the} front stage 12 and the positions A ₁ and A _{2 of the} LD stage 11 are preferably set so as to form a row parallel to the transport direction.

The front stage 12 is provided with alignment means (not shown). The alignment means is for aligning the substrate _P 1, _{P 2} to the position _A 3, _{A 4,} is provided on the position _A 3, _{A 4.} The alignment means may be any substrate _P 1, _{P 2} capable aligned on position _A 3, _{A 4,} for example, the position of the substrate _P 1, _{P 2} in contact with the substrate _P 1, _{P 2} equivalents A pin for mechanically aligning A ₃ and A ₄ and a means for optically aligning are used. Since the substrates P ₁ and P ₂ are exposed after the alignment by the alignment means, it is preferable to use an optical alignment means capable of highly accurate alignment.

A back stage 13 is formed on the back side from the front stage 12. The back stage 13 is a back side portion of the stage 1. The two substrates P ₁ and P ₂ placed on the near-side stage 12 are transported onto the back-side stage 13 by the transport means 3 described later. Positions A ₅ and A _{6 on} which the substrates P ₁ and P ₂ are placed are set on the back stage 13.

The positions A ₅ and A ₆ are set on the back stage 13 so as to form a row parallel to the transport direction. Accordingly, the substrates P ₁ and P ₂ respectively placed at the positions A ₅ and A ₆ are placed on the back stage 13 so as to form a row parallel to the transport direction. The positions, sizes, intervals, etc. of the positions A ₅ , A ₆ are set according to the types, sizes, shapes, etc. of the substrates P ₁ , P ₂ . When the exposure apparatus exposes more than two substrates P simultaneously, it is preferable that the position A on which the substrates P are placed is set to the same number as the number of substrates P to be exposed simultaneously.

Further, the back stage 13 is provided with transfer means (not shown). This transport means is a substrate placed P to the position A ₅ on the rear side stage 13, there is to transfer to the position A _6, for example, those having a belt conveyor or a vacuum chuck is used.

An exposure means 2 is provided in the middle of the stage 1. The exposure unit 2 exposes the substrates P ₁ and P ₂ being transferred by the transfer unit 3, and is provided between the near side stage 12 and the back side stage 13. The exposure means 2 includes one or a plurality of exposure light sources (not shown), and the exposure light source is selected according to the type of the substrate P and the purpose of exposure.

A transport unit 3 is provided on the front stage 12 of the stage 1. This transport means 3 reciprocates between the near side stage 12 and the far side stage 13 to simultaneously transport the substrates P ₁ and P ₂ placed on the near side stage 12 onto the far side stage 13. It is. This transport means 3 includes one vacuum chuck as a support means for supporting the substrate P, which supports the substrate P with a negative gauge pressure due to vacuum. The vacuum chuck simultaneously supports the substrates P ₁ and P ₂ placed on the positions A ₃ and A ₄ of the near-side stage 12 and conveys them onto the back-side stage 13.

In addition, this conveyance means 3 is not restricted to the thing provided with the vacuum chuck, For example, you may be provided with support means other than a belt conveyor and a vacuum chuck. Further, the transport unit 3 may include _two support units that support the substrates P ₁ and P ₂ , respectively, and the two support units may transport the substrates P ₁ and P ₂ at the same time. Further, when the exposure apparatus exposes more than two substrates P at the same time, the transport means 3 is provided with one support means for simultaneously supporting the plurality of substrates P exposed at the same time. Alternatively, the same number of support means as the number of the substrates P may be provided, and the plurality of support means may transport the plurality of substrates P at the same time.

Robot arms 4 a and 4 b are provided in the vicinity of the front end and the rear end of the stage 1. The robot arm 4 a carries the substrate P into the position A ₁ of the LD stage 11 from the substrate P storage means provided outside the stage 1. Further, the robot arm 4 b carries out the substrate P placed at the position A ₆ of the back stage 13 to the substrate P storage means provided outside the stage 1. Note that the substrate P may be carried onto the stage 1 by means other than the robot arms 4a and 4b. Further, the stage 1 may be directly connected to another apparatus and receive the substrate P.

Here, in this embodiment, as shown in FIG. 2, the distance d ₁ between the position A ₃ and the position A ₄ of the front stage 12 is narrower than the distance d ₂ between the position A ₄ and the position A _5. (D ₁ <d ₂ ). With such a configuration, the distance between the substrates P ₁ and P ₂ placed at the positions A ₃ and A ₄ is such that the substrate P placed at the position A ₄ adjacent to the front side of the exposure means 2 and the exposure means. and the substrate P to be placed in a position a ₅ adjacent the second back side, it is narrower than the interval.

Next, the operation of the exposure apparatus configured as described above will be described with reference to FIGS.
In step S1, the robot arm 4a is, as shown in FIG. 4 (a), the substrate P ₁ that is stored in the storage means provided outside the stage 1 is carried into the upper position A ₁ of the LD stage 11. The substrate P ₁ is aligned with the position A ₁ by the alignment means of the LD stage 11.

In step S2, the substrate _{P 1} placed in the position _{A 1,} as shown in FIG. 4 (b), is transferred to the position _{A 2} by the transfer means of LD stage 11. Since the substrate P ₁ is aligned at the position A ₁ , the positional deviation at the position A ₂ can be reduced.

In step S3, the robot arm 4a is, as shown in FIG. 4 (c), the substrate P ₂ which is stored in the storage means of the substrate P provided outside the stage 1, to the upper position A ₁ of the LD stage 11 Carry in. The substrate P ₂ is aligned with the position A ₁ by the alignment means of the LD stage 11. Robotic arm 4a is, the operation to go get the substrate P ₂ to the storage means, preferably be initiated during transfer of the substrate P ₁ in step S2. This allows the substrate P ₁ from being transferred to the position A _2, to shorten the waiting time until the substrate P ₂ is transferred to position A _1.

In step S <b> 4, as shown in FIG. 4D, the substrates P ₁ and P ₂ are transferred to the front stage 12 by the transfer means of the LD stage 11. The substrates P ₁ and P ₂ are transferred while maintaining the relative positional relationship, the substrate P ₁ is transferred to the position A ₄ , and the substrate P ₂ is transferred to the position A ₃ . When the transfer of the substrates P ₁ and P ₂ is completed, the substrates P ₁ and P ₂ are aligned by the alignment means of the front stage 12. Since the substrates P ₁ and P ₂ are already aligned in the LD stage 11, the positional deviation on the near side stage 12 is small. Therefore, alignment with the front stage 12 can be easily performed. Further, the exposure accuracy can be improved by performing alignment again on the front stage 12.

In step S5, as shown in FIG. 4 (e), the transport means 3 starts transporting the substrates P ₁ and P ₂ . Since the substrates P ₁ and P ₂ are supported by the vacuum chuck, the positional deviation can be reduced. Furthermore, for supporting a substrate P _1, P ₂ by one of the vacuum chuck, as in the case of supporting a plurality of substrates P _1, P ₂ by the vacuum chuck, is necessary to synchronize the transport between a plurality of vacuum chucks Absent. Therefore, the positional deviation between the substrates P ₁ and P ₂ can be reduced.

In step S6, as shown in FIG. 4F, the exposure means 2 exposes the substrates P ₁ and P ₂ being transferred by the transfer means 3.

In step S7, as shown in FIG. 4G, the transport unit 3 finishes transporting the substrates P ₁ and P ₂ . Substrate _{P 1} to position _{A 6} on the rear side stage 13, the substrate _{P 2} is conveyed to the position _{A 5.} When the transport unit 3 finishes transporting the substrates P ₁ and P ₂ , the transport unit 3 moves to the original position of the near-side stage 12. In the present embodiment, the next steps S1 to S4 are completed before the transport unit 3 returns to the original position, that is, the substrates P ₃ and P ₄ transported next by the transport unit 3 are in front. It is preferable that the side stage 12 is transported to positions A ₃ and A ₄ . In particular, it is preferable that the substrates P ₃ and P ₄ are completely aligned with the positions A ₃ and A ₄ . Thereby, the waiting time of the conveying means 3 can be shortened, and the tact time of the exposure process can be shortened.

Here, in the present embodiment, two substrates P ₁ and P ₂ are transported by the transport unit 3, exposed by the exposure unit 2, and time from when the transport unit 3 finishes transporting, that is, steps S 5 to S 7. 2, as shown in FIG. 2, T = (2L + d ₁ + d ₂ ) from the distances d ₁ and d ₂ , the length L in the transport direction of the substrate P, and the transport speed V (average speed) of the transport means 3. / V.

On the other hand, the time t required for the conventional exposure apparatus that transports and exposes the substrates P one by one to start transporting the two substrates P, expose them, and finish the transport is the interval d _2. , Length L and transport speed V are equal, t = (2L + 2d ₂ ) / V. As described above, since d ₁ <d ₂ , T <t, and the time T from the start to the end of the conveyance of the two substrates P can be shortened. Therefore, the tact time of the exposure process of the substrate P can be shortened. At this time, it is not necessary to change the conveyance speed V (exposure speed) or the output of the exposure light source.

  Further, when the exposure apparatus simultaneously exposes more than two substrates P, the interval between the plurality of substrates P placed on the near-side stage 12 is set in the exposure means 2 as in the present embodiment. The substrate P is set to be narrower than the distance between the substrate P placed adjacent to the front stage 12 and the substrate P placed adjacent to the exposure means 2 on the back stage 13. It is preferable to set the mounting position. With such a configuration, the tact time of the exposure process of the substrate P can be shortened.

In step S8, as shown in FIG. 4 (h), the robot arm 4b is a substrate P ₁ placed in position A ₆ on the rear side stage 13, storage means of the substrate P that is provided outside the stage 1 To be taken out.

In step 9, as shown in FIG. 4 (i), the substrate P ₂ placed at the position A ₅ of the back stage 13 is transferred to the position A ₆ by the transfer means of the back stage 13. Transfer of the substrate P ₂ is preferably started during unloading of the substrate P ₁ by a robot arm 4b. Thereby, the waiting time of the robot arm 4b can be shortened.

In step 10, as shown in FIG. 4 (j), the robot arm 4 b stores the substrate P ₂ placed on the position A ₆ of the back stage 13 and stores the substrate P provided outside the stage 1. To be taken out.

1 ... stage 11 ... position P ... substrate LD stage 12 ... front side stage 13 ... rear-side stage 2 ... exposing means 3 ... transporting means 4a, which 4b ... substrate by the robot arm _A 1 to A 6 _... on the stage is placed

Claims (5)

A stage on which a substrate to be exposed during transport is placed;
An exposure means provided in the middle of the stage for exposing the substrate;
A transport unit that reciprocates between a front stage and a back stage in the transport direction of the substrate from the exposure unit, and transports the substrate placed on the front stage onto the back stage; ,
Comprising
A plurality of substrates are placed in a row parallel to the transport direction on the stage on the near side in the transport direction,
The transport means simultaneously transports a plurality of substrates placed on the front stage,
The exposure apparatus exposes a substrate being transported by a transport means.   The interval between the plurality of substrates placed on the front stage is such that the substrate placed on the front stage adjacent to the exposure means and the back stage adjacent to the exposure means The exposure apparatus according to claim 1, wherein the exposure apparatus is narrower than an interval between the substrate placed thereon.   A plurality of substrates to be transported next are placed on the stage on the near side after the transport means starts transporting the plurality of substrates and returns to the original position. The exposure apparatus according to claim 1 or 2.   The exposure apparatus according to claim 1, wherein the transport unit includes one vacuum chuck.   The exposure apparatus according to claim 1, wherein the transport unit transports the substrates two by two simultaneously.