JP2013064130A5 - - Google Patents

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Publication number
JP2013064130A5
JP2013064130A5 JP2012192514A JP2012192514A JP2013064130A5 JP 2013064130 A5 JP2013064130 A5 JP 2013064130A5 JP 2012192514 A JP2012192514 A JP 2012192514A JP 2012192514 A JP2012192514 A JP 2012192514A JP 2013064130 A5 JP2013064130 A5 JP 2013064130A5
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JP
Japan
Prior art keywords
polybenzoxazole precursor
water
producing
aprotic polar
polybenzoxazole
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Application number
JP2012192514A
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English (en)
Japanese (ja)
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JP2013064130A (ja
JP6022263B2 (ja
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Priority to JP2012192514A priority Critical patent/JP6022263B2/ja
Priority claimed from JP2012192514A external-priority patent/JP6022263B2/ja
Publication of JP2013064130A publication Critical patent/JP2013064130A/ja
Publication of JP2013064130A5 publication Critical patent/JP2013064130A5/ja
Application granted granted Critical
Publication of JP6022263B2 publication Critical patent/JP6022263B2/ja
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JP2012192514A 2011-08-31 2012-08-31 ポリベンゾオキサゾール前駆体の製造方法 Active JP6022263B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012192514A JP6022263B2 (ja) 2011-08-31 2012-08-31 ポリベンゾオキサゾール前駆体の製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011190080 2011-08-31
JP2011190080 2011-08-31
JP2012192514A JP6022263B2 (ja) 2011-08-31 2012-08-31 ポリベンゾオキサゾール前駆体の製造方法

Publications (3)

Publication Number Publication Date
JP2013064130A JP2013064130A (ja) 2013-04-11
JP2013064130A5 true JP2013064130A5 (https=) 2016-04-14
JP6022263B2 JP6022263B2 (ja) 2016-11-09

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ID=47753625

Family Applications (1)

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JP2012192514A Active JP6022263B2 (ja) 2011-08-31 2012-08-31 ポリベンゾオキサゾール前駆体の製造方法

Country Status (2)

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US (1) US8487068B2 (https=)
JP (1) JP6022263B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014111998A1 (ja) * 2013-01-18 2014-07-24 日立化成デュポンマイクロシステムズ株式会社 ポリマ溶液の製造方法及びポリマ溶液
US9695284B2 (en) * 2013-05-17 2017-07-04 Fujifilm Electronic Materials U.S.A., Inc. Polymer and thermosetting composition containing same
TWI634135B (zh) * 2015-12-25 2018-09-01 日商富士軟片股份有限公司 樹脂、組成物、硬化膜、硬化膜的製造方法及半導體元件
JP2020164657A (ja) * 2019-03-29 2020-10-08 住友ベークライト株式会社 ポリベンゾオキサゾールの製造方法および感光性樹脂組成物
JP7454350B2 (ja) 2019-10-01 2024-03-22 太陽ホールディングス株式会社 ポリベンゾオキサゾール前駆体の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6440530A (en) * 1987-08-06 1989-02-10 Prod Dev Res Inst Production of polybenzo-oxy or thio-azole
US4845183A (en) * 1987-11-24 1989-07-04 Hoechst Celanese Corporation Heat resistant polyamide and polybenzoxazole from bis-((amino-hydroxyphenyl)hexafluoroisopropyl)diphenyl ethers
US4939215A (en) * 1987-11-24 1990-07-03 Hoechst Celanese Corporation Heat resistant polybenzoxazole from bis-((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ether
JPH03188128A (ja) * 1989-12-15 1991-08-16 Honda Motor Co Ltd ポリベンゾビスオキサゾールの製造方法
JP2001163975A (ja) * 1999-12-03 2001-06-19 Sumitomo Bakelite Co Ltd ポリベンゾオキサゾール樹脂及びその前駆体
JP2007106786A (ja) 2005-10-11 2007-04-26 Sony Corp 残留ハロゲンを含有しないポリベンゾオキサゾール前駆体、ポリベンゾオキサゾール、及びこれらの製造方法
JP5332326B2 (ja) * 2007-06-18 2013-11-06 住友ベークライト株式会社 半導体装置の製造方法
JP2009074038A (ja) * 2007-08-29 2009-04-09 Sumitomo Bakelite Co Ltd ポリベンゾオキサゾール前駆体の製造方法

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