JP2013062378A - Positioning device and positioning method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a positioning device and a positioning method which shorten the positioning time of an object and enables positioning to be reliably conducted.SOLUTION: A positioning apparatus of this invention includes: a placement stage where an object is placed; an imaging part capturing an image of the object; a storage part storing a reference pattern; a pattern matching part performing pattern matching between image data and the reference pattern and calculating a matching rate; a position calculation part which compares the matching rate with a preset threshold value to detect a position of a future part; a drive part moving the placement stage on which the object is placed or the imaging part; and a control part determining a new imaging region on the basis of the size of the reference pattern and the threshold value when the position calculation part determines that the matching rate is smaller than the threshold value.

Description

  The present invention relates to a positioning apparatus and a positioning method used for an inspection apparatus for inspecting a glass substrate, a semiconductor substrate, a printed board, and the like for a flat panel display, for example.

  Conventionally, in the production of various substrates such as liquid crystal displays (LCDs), PDPs (Plasma Display Panels) and organic EL (ElectroLuminescence) displays, semiconductor wafers, printed circuit boards, etc. In order to improve the above, after each patterning process, it is sequentially inspected whether or not there is a defect such as a short circuit, a connection failure, a disconnection or a pattern failure. When performing such an inspection, a so-called transmission illumination type substrate inspection apparatus is used that performs substrate inspection by imaging the substrate while illuminating the substrate from below the stage on which the substrate to be inspected is placed. Also, depending on the substrate to be inspected, an epi-illumination type substrate inspection device that illuminates from the image sensor side that images the substrate is also used.

  In a substrate inspection apparatus that performs processing such as inspection and measurement on a substrate having a wide inspection target surface such as a glass substrate that is a member of an FPD substrate, it is registered in a recipe when inspecting a specific position of the inspection target surface A reference pattern registered based on the coordinates is referred to, and pattern matching is performed on a characteristic part such as a recognition mark on the inspection target substrate by image processing to perform alignment. However, the coordinates of the reference pattern registered in the recipe do not necessarily match the coordinates of the actual feature part on the stage. In some cases, the pattern matching is repeated multiple times by moving the imaging unit or the substrate. Positioning.

  As a positioning method for recognizing feature parts in a short time, two large and small search areas are set, pattern matching is performed in a small search area, and if the feature part cannot be recognized by this pattern matching, a large search area A method of performing pattern matching is disclosed (for example, see Patent Document 1).

Japanese Patent Laid-Open No. 10-261898

  However, the conventional positioning method disclosed in Patent Document 1 does not consider the comparison pattern (region) in the search area or the designation of the imaging region by the imaging unit when performing pattern matching. Specifically, for example, when the comparison pattern (region) in the search area is designated so as not to overlap or arbitrarily moved, the feature may span a plurality of comparison patterns (regions). In some cases, the feature portion may fail to be recognized even though the feature portion is within the search area.

  The present invention has been made in view of the above, and an object of the present invention is to provide a positioning device and a positioning method capable of reliably positioning an object.

  In order to solve the above-described problems and achieve the object, a positioning device according to the present invention is a positioning device that positions an object mounted on a mounting stage, and images the object to capture the object. An image capturing unit that generates image data of an object, a storage unit that stores a reference pattern to be compared with a feature portion included in image data captured and generated by the image capturing unit, and pattern matching between the image data and the reference pattern The pattern matching unit that calculates the matching rate between the two and the matching rate calculated by the pattern matching unit and a preset threshold value are compared. If the matching rate is greater than the threshold value, the imaged region is characterized. A position calculator that estimates the position of the part, a drive unit that moves the mounting stage or the imaging unit, and the position calculator If the etching rate is determined to be smaller than the threshold value, characterized in that it comprises a control unit for determining a new imaging region based on said information relating to the size of the reference pattern threshold.

  In the positioning device according to the present invention as set forth in the invention described above, the control unit determines the new imaging area based on a multiplication value of a long side of a rectangle circumscribed by the reference pattern and the threshold value. It is characterized by that.

  Further, in the positioning device according to the present invention, in the above invention, the control unit sets the new imaging area by the length of a multiplication value of a square diagonal line circumscribed by the reference pattern and the threshold value. It is characterized by determining so that it may overlap with an imaging region.

  The positioning device according to the present invention further includes an imaging position information storage unit that stores position information of a characteristic part of the object in the above invention, and the control unit is configured to generate a new imaging region based on the position information. The imaging order is determined.

  Further, the positioning method according to the present invention is a positioning method for recognizing the feature portion by pattern matching based on image data obtained by imaging the feature portion of the target, and positioning the target based on the recognition result, A transport step of placing the object on a placement stage and transporting the object to an imaging region; an imaging step of capturing an image of the object by an imaging unit to generate image data of the object; A calculation step for pattern matching between the feature portion included in the image data captured and generated in the imaging step and the reference pattern acquired from the storage unit to calculate the matching rate between them, and the matching rate calculated in the calculation step are set in advance. Compared with a threshold value, if the matching rate is greater than the threshold value, the captured area is estimated as the position of the feature portion And a position calculation step that determines a new imaging region based on the information related to the size of the reference pattern and the threshold value when the matching ratio is determined to be smaller than the threshold value in the position calculation step. An area determining step; and a moving step of moving the mounting stage or the imaging unit to a new imaging area determined in the imaging area determining step.

  The positioning method according to the present invention is characterized in that, in the above-mentioned invention, the new imaging area is determined based on a multiplication value of a long side of a rectangle circumscribed by the reference pattern and the threshold value.

  In the positioning method according to the present invention, in the above invention, the new imaging area overlaps the previous imaging area by the length of the product of the square diagonal line circumscribed by the feature and the threshold value. It is characterized by determining as follows.

  In the positioning method according to the present invention, in the above invention, the positioning method includes an acquisition step of acquiring the position information of the characteristic part of the target object from the imaging position information storage unit, and the moving step includes a new imaging The imaging order of the areas is determined.

  In the positioning apparatus and positioning method according to the present invention, when the feature portion cannot be recognized in the pattern matching of the first imaging region, the next imaging is performed by the length obtained by multiplying the reference pattern size by the matching rate threshold. Since the imaging position is determined so that the region overlaps the current imaging region, the feature portion can be reliably recognized even when the feature portion does not completely enter the first imaging region. Play.

FIG. 1 is a block diagram showing a schematic configuration of the positioning device according to the first embodiment of the present invention. FIG. 2 is a diagram illustrating an imaging region of the positioning device according to the first embodiment of the present invention. FIG. 3 is an enlarged view of the vicinity of the imaging region shown in FIG. FIG. 4 is a diagram for explaining a conventional imaging region. FIG. 5 shows a reference pattern. FIG. 6 is a diagram for explaining a newly set imaging region. FIG. 7 is a diagram illustrating another imaging region set around the imaging region. FIG. 8 is a flowchart of the substrate positioning process according to the first embodiment. FIG. 9 is a diagram illustrating an example of setting of the imaging region. FIG. 10 is a diagram illustrating an example of setting of the imaging region. FIG. 11 is a block diagram showing a schematic configuration of the positioning apparatus according to the second embodiment of the present invention. FIG. 12 is a flowchart of a substrate positioning process according to the second embodiment.

  DESCRIPTION OF EMBODIMENTS Hereinafter, embodiments for carrying out the present invention will be described in detail with reference to the drawings. In addition, this invention is not limited by the following embodiment. The drawings referred to in the following description only schematically show the shape, size, and positional relationship so that the contents of the present invention can be understood. That is, the present invention is not limited only to the shape, size, and positional relationship illustrated in each drawing.

  First, a positioning device according to an embodiment of the present invention will be described in detail with reference to the drawings. In the following description, a positioning device of a type that moves a substrate with respect to an imaging unit that is an optical unit will be described. However, the present embodiment is not limited to this, and may be a type in which the optical unit is moved with respect to the substrate to be inspected. Any configuration that relatively moves the optical unit and the substrate is possible. Including.

(Embodiment 1)
FIG. 1 is a block diagram illustrating a schematic configuration of a positioning apparatus 100 according to the first embodiment. As shown in FIG. 1, a positioning device 100 includes an XY stage 2 on which a substrate 1 that is a positioning target is placed, an imaging unit 3 that images a target, an image recording unit 4 that records an image, and a characteristic part. A pattern collating unit 5 for collating patterns, a pattern recording unit 6 for recording a reference pattern, a pattern position calculating unit 7 for detecting the position of a characteristic part, a stage driving unit 8 for driving the XY stage 2, and each unit And a control unit 9 for controlling.

  The substrate 1 that is a positioning object includes not only a glass substrate for a liquid crystal display but also characteristic portions such as a recognition mark for positioning such as a semiconductor wafer and a printed circuit board as well as an FPD substrate such as a color filter for a liquid crystal display. If it is a thing, it can become a positioning target object of the positioning apparatus 100 concerning this Embodiment 1. FIG.

  The XY stage 2 mounts the substrate 1 as an object and is moved in the XY direction by the stage drive unit 8.

  The imaging unit 3 images the substrate 1 and is disposed above the XY stage 2. The imaging unit 3 includes, for example, an illumination unit such as an LED, an optical system such as a condenser lens, and an imaging element such as a CMOS image sensor or a CCD sensor. The image data is transmitted to the image storage unit 4. The image storage unit 4 records the received image data.

  The reference pattern storage unit 6 stores a reference pattern serving as a reference for comparison with a recognition mark on the substrate 1 in pattern matching.

  The pattern matching unit 5 collates the image data obtained from the image storage unit 4 and the reference pattern obtained from the reference pattern storage unit 6 by pattern matching, and calculates a matching rate between them.

  The pattern position calculation unit 7 compares the matching rate calculated by the pattern matching unit 5 with a preset threshold value. When the matching rate is larger than the threshold value, the imaging region is estimated as the position of a characteristic part such as a recognition mark. When the matching rate is smaller than the threshold value, it is determined that no characteristic part such as a recognition mark exists in the imaging region. The pattern position calculation unit 7 transmits the comparison result to the control unit 9.

  The control unit 9 receives pattern matching result information obtained from the pattern position calculation unit 7. When the position of the recognition mark is detected, positioning data for positioning the substrate 1 by the subsequent movement of the XY stage 2 is created based on the position of the recognition mark. If the position of the recognition mark cannot be detected, a new imaging area (imaging coordinates) is determined based on the size of the recognition mark and the threshold value. The stage drive unit 8 moves the XY stage 2 based on the imaging area information from the control unit 9.

  Next, setting of a new imaging region in the positioning device 100 according to the first embodiment will be described with reference to FIGS. FIG. 2 is a diagram illustrating an imaging region of the positioning device according to the first embodiment of the invention. FIG. 3 is an enlarged view of the vicinity of the imaging region shown in FIG. FIG. 4 is a diagram for explaining a conventional imaging region. FIG. 5 is a diagram showing the reference pattern 12. FIG. 6 is a diagram illustrating the setting of the imaging region 11. FIG. 7 is a diagram illustrating another imaging area set around the imaging area 11.

  As shown in FIG. 2, a recognition mark 10 exists on the substrate 1. The positioning device 100 according to the first embodiment detects the position of the recognition mark 10 by pattern matching the image data and the reference pattern when the imaging unit 3 images the imaging region 11.

  As shown in FIG. 3, when about half of the recognition mark 10 exists in the imaging region 11 and the threshold of the matching rate is set to 80%, for example, in pattern matching of image data in the imaging region 11, The pattern position calculation unit 7 transmits to the control unit 9 that the recognition mark 10 does not exist in the imaging region 11. As a result, the control unit 9 controls to newly set the imaging region 11 and continue the pattern matching.

  In the prior art, for example, as shown in FIG. 4, image data for pattern matching is obtained so that the imaging region 11, the imaging region 11 a, the imaging region 11 b, and the imaging region 11 c do not overlap with the imaging region. However, in this case, although the recognition mark 10 exists in the vicinity of the imaging regions 11 to 11c, the matching rate is equal to or less than the threshold value in all the imaging regions 11 to 11c, so that the position of the recognition mark is detected. I could not.

  As shown in FIG. 5, the new imaging region is obtained by multiplying the length L of the long side (one side in the case of a square) L of the rectangle 13 circumscribed by the reference pattern 12 by the threshold value t (L × t). It is preferable to determine based on the original. Alternatively, as shown in FIG. 4, when there is a possibility that the recognition mark 10 may be inclined, the new imaging area is a product of the length of the diagonal line of the rectangle 13 circumscribed by the reference pattern 12 and the threshold value (h). It is preferable to determine based on

  The control unit 9 sets a new imaging area so as to overlap the previous imaging area 11 by the length of the multiplication value h of the diagonal length of the rectangle 13 circumscribed by the reference pattern 12 and the threshold value. The imaging region 11A, which is one new imaging region candidate shown in FIG. 6, shows a case where it moves upward so as to overlap the imaging region 11 by the length of the multiplication value h.

  Similarly, the imaging area 11B moves to the upper left so that it overlaps with the imaging area 11 by the length of the multiplication value h, and the imaging area 11C overlaps with the imaging area 11 by the length of the multiplication value h. So that it is moving to the left. Further, the imaging area 11D moves to the lower left so as to overlap the imaging area 11 by the length of the multiplication value h, and the imaging area 11E overlaps the imaging area 11 by the length of the multiplication value h. It is moving downward. Further, the imaging area 11F moves to the lower right so that the imaging area 11 overlaps the imaging area 11 by the length of the multiplication value h, and the imaging area 11G overlaps the imaging area 11 by the length of the multiplication value h. In this way, the imaging area 11H moves to the upper right so that the imaging area 11H overlaps the imaging area 11 by the length of the multiplication value h (see FIG. 7).

  Next, positioning of the substrate 1 in the positioning device 100 according to the first embodiment will be described with reference to FIG. FIG. 8 is a flowchart of the positioning process of the substrate 1 according to the present embodiment.

  In the positioning apparatus 100 according to the first embodiment, the reference pattern storage unit 6 stores the reference pattern 12, and the pattern position calculation unit 7 stores a threshold value, for example, 80%. Although the recognition mark 10 is stored as the reference pattern 12, the reference pattern 12 can be used if it has a characteristic portion that can be used for pattern matching. The threshold value can be arbitrarily set depending on the accuracy of pattern matching.

  First, after the substrate 1 is placed on the XY stage 2, the substrate 1 is moved to a predetermined position by driving the stage drive unit 8 (step S101). Based on the known design coordinates of the recognition mark 10 on the substrate 1, the control unit 9 sets the movement of the substrate 1 to the stage driving unit 8. With this setting, the stage drive unit 8 moves the XY stage 2 to the design coordinates of the recognition mark 10.

  After the movement of the XY stage 2, the imaging unit 3 images the imaging range (imaging area 11) at the design coordinates of the recognition mark 10 (step S102). Image data captured by the imaging unit 3 is transmitted to the image storage unit 4.

  The pattern matching unit 5 acquires the reference pattern 12 from the reference pattern storage unit 6, performs pattern matching with the image data obtained from the image storage unit 4, and calculates a matching rate between them (step S103). When 80% or more of the recognition mark 10 corresponding to the reference pattern 12 is included in the imaging region 11, the matching rate is 80% or more.

  The pattern position calculation unit 7 compares the matching rate calculated by the pattern matching unit 5 with the threshold value to be stored, and determines whether or not the matching rate is 80% or more (step S104). If the pattern position calculation unit 7 determines that the matching rate is equal to or higher than the threshold (step S104: Yes), the pattern matching is successful, and the imaging region 11 is estimated as the position of the recognition mark (step S105).

  The pattern position calculation unit 7 transmits the position information of the recognition mark 10 to the control unit 9. The control unit 9 creates positioning data used for the subsequent movement of the XY stage 2 from the position of the recognition mark 10 and controls to position the substrate 1 (step S106).

  When the pattern position calculation unit 7 determines that the matching rate is smaller than the threshold (step S104: No), the pattern matching fails. The pattern position calculation unit 7 transmits to the control unit 9 that the position of the recognition mark 10 is not detected.

  When the control unit 9 receives that the position of the recognition mark 10 is not detected, the control unit 9 determines whether a new imaging region is set (step S107). When a new imaging region is not set (step S107: No), the control unit 9 makes the previous value of the multiplication value h by the length of the diagonal line of the rectangle 13 circumscribing the reference pattern 12 and the threshold value 80%. New imaging areas 11A to 11H that overlap the imaging area 11 are set (step S108). Further, the control unit 9 selects one imaging region among the set new imaging regions 11A to 11H, sets movement information of the selected imaging region, and transmits it to the stage driving unit 8 (step S109).

  The stage drive unit 8 moves the XY stage 2 based on the set movement information (step S110), the imaging unit 3 images a new imaging region, and pattern matching of the image data generated by imaging is repeated (step S102). -Step S104).

  When a new imaging area is set (step S107: Yes), the control unit 9 selects one imaging area that has not yet been imaged among the already set imaging areas 11A to 11H, and selects the selected imaging area. By setting region movement information and transmitting it to the stage drive unit 8 (step S109), pattern matching is repeated (steps S102 to S104).

  As described above, in the positioning apparatus 100 according to the first embodiment, the recognition mark exists in the vicinity of the imaging area obtained from the known design coordinates, and only a part of the recognition mark (below the threshold value) exists in the imaging area. Even if it does not exist, the new imaging area is set based on the size of the reference pattern and the threshold so that it overlaps the previous imaging area, so that the recognition mark can be set without being overlooked. Therefore, it is possible to prevent a recognition mark detection failure.

  In Embodiment 1 described above, when the recognition mark cannot be detected in the imaging region 11, the control unit sets a total of eight new imaging regions 11A to 11H in the vertical and horizontal directions and the licking direction. However, the number of imaging areas to be newly set is not limited as long as it is set so as to overlap with the previous imaging area 11 based on the size of the reference pattern and the threshold value. FIG. 9 and FIG. 10 show examples of imaging areas to be newly set. 9 and 10, six imaging areas 11I to 11N are set. For example, when it is determined that the recognition mark is easily shifted to the left and right from the known design coordinates, pattern matching may be performed in the imaging region as shown in FIG. In addition, when it is known that it is likely to be shifted up and down from the known design coordinates, pattern matching may be performed in an imaging region as shown in FIG. However, when the threshold value is set high and it is desired to detect the position of the recognition mark with certainty, it is preferable to set the eight imaging regions shown in FIG. 7 and perform pattern matching.

(Embodiment 2)
The positioning apparatus 200 according to the second embodiment sets a new imaging area in the same manner as in the first embodiment when the recognition mark 10 cannot be detected in the imaging area 11, but a newly provided imaging position information storage unit The position information of the recognition mark 10 is acquired from the above, and the imaging order of a plurality of newly set imaging areas is determined based on the acquired position information. Only the configuration different from the positioning device 100 of the first embodiment will be described below.

  FIG. 11 is a block diagram illustrating a schematic configuration of the positioning apparatus 200 according to the second embodiment. The positioning apparatus 200 according to the second embodiment includes a position information storage unit 14 that stores position information of the recognition mark 10 on the substrate 1. The information of the recognition mark 10 is information regarding the position of the recognition mark 10 on the substrate 1 where the positioning and the subsequent processes have been completed.

  Next, the positioning of the substrate 1 in the positioning device 200 according to the second embodiment will be described with reference to FIG. FIG. 12 is a flowchart of the positioning process of the substrate 1 according to the second embodiment.

  First, after the substrate 1 is placed on the XY stage 2, the substrate 1 is moved to a predetermined position by driving the stage drive unit 8 (step S <b> 201), and the imaging range (at the design coordinates of the recognition mark 10) ( The imaging area 11) is imaged (step S202). Image data imaged and generated by the imaging unit 3 is transmitted to the image storage unit 4.

  The pattern matching unit 5 acquires the reference pattern 12 from the reference pattern storage unit 6, performs pattern matching with the image data obtained from the image storage unit 4, calculates the matching rate between them (step S 203), and the pattern position calculation unit 7 compares the matching rate calculated by the pattern matching unit 5 with the threshold value to be stored, and determines whether the matching rate is 80% or more (step S204). When the pattern position calculation unit 7 determines that the matching rate is equal to or higher than the threshold (step S204: Yes), the pattern matching is successful and the imaging region 11 is estimated as the position of the recognition mark 10 (step S205).

  The pattern position calculation unit 7 transmits the position information of the recognition mark 10 to the control unit 9, and the position information of the detected recognition mark 10 transmitted via the control unit 9 is stored in the imaging position information storage unit 14. (Step S206).

  Further, the control unit 9 creates positioning data to be used for the subsequent movement of the XY stage 2 from the position of the recognition mark 10 and performs control to perform positioning of the substrate 1 (step S207). It is determined whether or not positioning has been completed (S208).

  If completed (step S208: Yes), this process is terminated. If not completed (step S208: No), the process is repeated from step S201.

  When the pattern position calculation unit 7 determines that the matching rate is smaller than the threshold value (step S204: No), the pattern position calculation unit 7 transmits to the control unit 9 that the position of the recognition mark 10 is not detected.

  When receiving that the position of the recognition mark 10 is not detected, the control unit 9 determines whether a new imaging region is set (step S209). When a new imaging area is not set (step S209: No), the control unit 9 performs the previous imaging for the length of the multiplication value h of the length of the diagonal line of the rectangle 13 circumscribing the reference pattern 12 and the threshold value. A new imaging area overlapping with the area 11 is set (step S210).

  The control unit 9 further acquires the position information of the recognition mark 10 from the imaging position information storage unit 14 (step S211), and determines the imaging order of the new imaging area set in step S210 based on the position information. (Step S212).

  The stage drive unit 8 moves the XY stage 2 to the first imaging region in the determined imaging order (step S213), and the imaging unit 3 images a new imaging region, and pattern matching of the image data generated by imaging is performed. It repeats (step S202-step S204).

  If a new imaging area is set (step S209: Yes), the stage drive unit 8 moves the XY stage to the next imaging area (step S213), and pattern matching is repeated (steps S202 to S204). .

  The position information of the recognition mark used for determining the imaging order of the new imaging area in the second embodiment is a position (selected from the newly set imaging area) that succeeded in the latest pattern matching. In addition to using with priority, a method of giving priority to a position having a high success frequency in the conventional pattern matching may be used. Alternatively, only the first time of a newly set imaging area may be set by the above method, and the subsequent order may be an order in which the movement amount of the XY stage 2 is shortened.

  As described above, in the positioning device 200 according to the second embodiment, the recognition mark is present in the vicinity of the imaging region obtained from the known design coordinates, as in the positioning device 100 according to the first embodiment. Even when only a part of the recognition mark (below the threshold value) exists in the imaging area, the new imaging area is set to overlap with the previous imaging area based on the size of the reference pattern and the threshold value. As a result, since the recognition mark enters one of the imaging regions set without being overlooked, it is possible to prevent the recognition mark from failing to be detected.

  Furthermore, since the positioning apparatus 200 according to the second embodiment determines the imaging order of the new imaging region based on the position information of the recognition mark 10 when the pattern matching is successful, the detection time of the recognition mark 10 is further shortened. There is an effect that can be done.

  As described above, the positioning device and positioning method according to the present invention are useful for efficiently performing pattern matching and shortening the positioning time.

DESCRIPTION OF SYMBOLS 1 Board | substrate 2 XY stage 3 Imaging part 4 Image memory | storage part 5 Pattern collation part 6 Reference pattern memory | storage part 7 Pattern position calculating part 8 Stage drive part 9 Control part 10 Recognition mark 11 Imaging area 12 Reference pattern 14 Imaging position information memory | storage part

Claims (8)

A positioning device for positioning an object mounted on a mounting stage,
An imaging unit that images the object and generates image data of the object;
A storage unit that stores a reference pattern to be compared with a feature portion included in image data generated by the imaging unit;
A pattern matching unit that pattern-matches the image data and the reference pattern and calculates a matching rate of both,
A position calculation unit that compares the matching rate calculated by the pattern matching unit with a preset threshold value, and estimates the captured region as the position of the feature portion when the matching rate is greater than the threshold value;
A driving unit that moves the mounting stage or the imaging unit;
When the position calculation unit determines that the matching rate is smaller than the threshold value, a control unit that determines a new imaging region based on the information related to the size of the reference pattern and the threshold value;
A positioning device comprising:   The positioning device according to claim 1, wherein the control unit determines the new imaging region based on a product of a length of a long side of a rectangle circumscribed by the reference pattern and the threshold value.   The control unit determines the new imaging area so as to overlap the previous imaging area by a length of a product of a square diagonal line circumscribed by the reference pattern and the threshold value. The positioning device according to claim 2. An imaging position information storage unit that stores position information of a characteristic part of the object;
The positioning device according to claim 1, wherein the control unit determines an imaging order of a new imaging region based on the position information. A positioning method for recognizing the feature portion by pattern matching based on image data obtained by imaging the feature portion of the object, and positioning the object based on the recognition result,
A transport step of placing the object on a placement stage and transporting the object to an imaging region;
The imaging step of imaging the object by an imaging unit and generating image data of the object;
A calculation step of pattern matching the feature part included in the image data imaged and generated in the imaging step and the reference pattern acquired from the storage unit, and calculating the matching rate of both;
A position calculation step of comparing the matching rate calculated in the calculation step with a preset threshold value, and in the case where the matching rate is greater than the threshold value, estimating the captured region as the position of the feature portion;
An imaging region determination step for determining a new imaging region based on the information related to the size of the reference pattern and the threshold value when it is determined in the position calculation step that the matching rate is smaller than the threshold value;
A moving step of moving the mounting stage or the imaging unit to a new imaging area determined in the imaging area determination step;
A positioning method comprising:   6. The positioning method according to claim 5, wherein the new imaging area is determined based on a multiplication value of a long side of a rectangle circumscribing the reference pattern and the threshold value.   The new imaging area is determined so as to overlap with the previous imaging area by a length of a product of a square diagonal line circumscribed by the characteristic portion and the threshold value. Positioning method. Including an acquisition step of acquiring position information of a characteristic part of the object from an imaging position information storage unit;
The positioning method according to claim 5, wherein the moving step determines an imaging order of a new imaging area based on the position information.

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