JP2013055281A - 電流センサ - Google Patents
電流センサ Download PDFInfo
- Publication number
- JP2013055281A JP2013055281A JP2011193709A JP2011193709A JP2013055281A JP 2013055281 A JP2013055281 A JP 2013055281A JP 2011193709 A JP2011193709 A JP 2011193709A JP 2011193709 A JP2011193709 A JP 2011193709A JP 2013055281 A JP2013055281 A JP 2013055281A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- layer
- current sensor
- permanent magnet
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
- G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
- G01R15/20—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices
- G01R15/205—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices using magneto-resistance devices, e.g. field plates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Hall/Mr Elements (AREA)
- Measuring Magnetic Variables (AREA)
- Measuring Instrument Details And Bridges, And Automatic Balancing Devices (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011193709A JP2013055281A (ja) | 2011-09-06 | 2011-09-06 | 電流センサ |
| US13/587,786 US20130057274A1 (en) | 2011-09-06 | 2012-08-16 | Current sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011193709A JP2013055281A (ja) | 2011-09-06 | 2011-09-06 | 電流センサ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013055281A true JP2013055281A (ja) | 2013-03-21 |
| JP2013055281A5 JP2013055281A5 (enExample) | 2014-02-13 |
Family
ID=47752659
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011193709A Withdrawn JP2013055281A (ja) | 2011-09-06 | 2011-09-06 | 電流センサ |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20130057274A1 (enExample) |
| JP (1) | JP2013055281A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021221096A1 (ja) * | 2020-05-01 | 2021-11-04 | 田中貴金属工業株式会社 | 面内磁化膜、面内磁化膜多層構造、ハードバイアス層、磁気抵抗効果素子、およびスパッタリングターゲット |
| US11810700B2 (en) | 2018-10-30 | 2023-11-07 | Tanaka Kikinzoku Kogyo K.K. | In-plane magnetized film, in-plane magnetized film multilayer structure, hard bias layer, magnetoresistive element, and sputtering target |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6199730B2 (ja) * | 2013-12-25 | 2017-09-20 | 株式会社東芝 | 電流センサ及び電流センサモジュール |
| JP2015125019A (ja) * | 2013-12-25 | 2015-07-06 | 株式会社東芝 | 電流センサ、電流測定モジュール及びスマートメータ |
| JP6724459B2 (ja) * | 2016-03-23 | 2020-07-15 | Tdk株式会社 | 磁気センサ |
| JP6390728B2 (ja) * | 2017-02-22 | 2018-09-19 | Tdk株式会社 | 磁気センサとその製造方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009084435A1 (ja) * | 2007-12-28 | 2009-07-09 | Alps Electric Co., Ltd. | 磁気センサ及び磁気センサモジュール |
| WO2009084433A1 (ja) * | 2007-12-28 | 2009-07-09 | Alps Electric Co., Ltd. | 磁気センサ及び磁気センサモジュール |
| WO2009151024A1 (ja) * | 2008-06-11 | 2009-12-17 | アルプス電気株式会社 | 磁気センサ及び磁気センサモジュール |
| WO2010010872A1 (ja) * | 2008-07-22 | 2010-01-28 | アルプス電気株式会社 | 磁気センサ及び磁気センサモジュール |
| JP2011007673A (ja) * | 2009-06-26 | 2011-01-13 | Alps Electric Co Ltd | 地磁気センサ |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7259545B2 (en) * | 2003-02-11 | 2007-08-21 | Allegro Microsystems, Inc. | Integrated sensor |
-
2011
- 2011-09-06 JP JP2011193709A patent/JP2013055281A/ja not_active Withdrawn
-
2012
- 2012-08-16 US US13/587,786 patent/US20130057274A1/en not_active Abandoned
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009084435A1 (ja) * | 2007-12-28 | 2009-07-09 | Alps Electric Co., Ltd. | 磁気センサ及び磁気センサモジュール |
| WO2009084433A1 (ja) * | 2007-12-28 | 2009-07-09 | Alps Electric Co., Ltd. | 磁気センサ及び磁気センサモジュール |
| WO2009151024A1 (ja) * | 2008-06-11 | 2009-12-17 | アルプス電気株式会社 | 磁気センサ及び磁気センサモジュール |
| WO2010010872A1 (ja) * | 2008-07-22 | 2010-01-28 | アルプス電気株式会社 | 磁気センサ及び磁気センサモジュール |
| JP2011007673A (ja) * | 2009-06-26 | 2011-01-13 | Alps Electric Co Ltd | 地磁気センサ |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11810700B2 (en) | 2018-10-30 | 2023-11-07 | Tanaka Kikinzoku Kogyo K.K. | In-plane magnetized film, in-plane magnetized film multilayer structure, hard bias layer, magnetoresistive element, and sputtering target |
| WO2021221096A1 (ja) * | 2020-05-01 | 2021-11-04 | 田中貴金属工業株式会社 | 面内磁化膜、面内磁化膜多層構造、ハードバイアス層、磁気抵抗効果素子、およびスパッタリングターゲット |
| JP7529433B2 (ja) | 2020-05-01 | 2024-08-06 | 田中貴金属工業株式会社 | 面内磁化膜、面内磁化膜多層構造、ハードバイアス層、磁気抵抗効果素子、およびスパッタリングターゲット |
Also Published As
| Publication number | Publication date |
|---|---|
| US20130057274A1 (en) | 2013-03-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20130620 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20131115 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20131126 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20131217 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20131217 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140115 |
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| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140603 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20140703 |