JP2013041470A - Touch panel member, display device with touch panel, and touch panel - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a touch panel member in which a sufficiently adhered state of an insulating layer can be obtained.SOLUTION: A touch panel member 1 includes a layered structure 5 comprising a transparent electrode layer 3 formed into a predetermined pattern and an insulating layer 4 formed into a predetermined pattern and containing a cured product of a photosensitive resin composition having a siloxane skeleton, on a surface of a glass substrate 2, and the touch panel member includes a position detection region R capable of detecting a touch position, formed in a predetermined region overlapping at least partially the region where the transparent electrode layer 3 is formed. The layered structure 5 is configured in such a manner that at least one transparent electrode layer 3 is formed on the surface of the glass substrate 2 and that the insulating layer 4 is formed on the surface of the glass substrate 2 to cover at least partially the transparent electrode layer 3 in a plan view of the touch panel member 1. A sufficiently adhered state of the insulating layer 4 is obtained by controlling the area of a contact region 18 with the glass substrate to 1% or more and 15% or less of the area of a surface 14 of the insulating layer opposing to the glass substrate in a plan view of the touch panel member 1.

Description

  The present invention relates to a touch panel member, a display device with a touch panel, and a touch panel.

  A display device with a touch panel is used alone, or incorporated in various articles and used for various purposes. For example, a display device with a touch panel is used for a device incorporated as a display unit of a mobile terminal such as a mobile phone or a display unit of a personal computer. As a display device with a touch panel, a display device such as a liquid crystal display device or an organic EL (Electro-Luminescence) display device provided with a touch panel is known. Known forms of providing a touch panel on the display device include a form in which the touch panel is incorporated in a part of the display device, and a form in which the touch panel is pasted on the display surface of the display device.

  As a touch panel, a panel screen having a scanable area capable of detecting a touch position with a touch panel member is formed, and a position detection device for detecting a coordinate position in a predetermined area in the panel screen is electrically connected to the panel screen. What is made is known. The touch panel detects the touch position by specifying the position touched on the panel screen with the position detection device. There are various types of touch panels depending on the touch position detection method, and among them, capacitive touch panels that detect touch positions based on changes in capacitance are used in various industrial fields. Has been.

  In a capacitive touch panel, a touch panel member used for a panel screen has a substrate such as a glass substrate, and is provided with a transparent electrode portion for detecting a coordinate position in a predetermined area on the substrate surface. Configured. About a transparent electrode part, it comprises the 1st electrode and 2nd electrode which mutually cross | intersect on the planar view of a touch panel member. In many cases, the first electrode and the second electrode are each configured to have a patterned transparent electrode layer.

  In the touch panel member, an insulating layer is formed at least at the intersection of the first electrode and the second electrode in plan view of the touch panel member, and the insulating layer ensures the insulation between the first electrode and the second electrode. Demonstrate the function to do. Moreover, an insulating layer is formed also on the surface of a transparent electrode part, and exhibits the function to ensure the insulation of a transparent electrode part with respect to the touch-panel member exterior. The insulating layer formed on the surface of the transparent electrode portion also functions as a surface protective layer that protects the transparent electrode portion by suppressing exposure of the transparent electrode portion. Here, since the first electrode and / or the second electrode is composed of a patterned transparent electrode layer, at least a partial region of the insulating layer is formed on the transparent electrode layer.

  In touch panel members, the insulating layer is a layer made of a cured product of a siloxane-based composition capable of forming a siloxane bond such as a siloxane-based photoresist, or a silicon-free photoresist such as an acrylic or epoxy-based photoresist. It has been proposed to employ an organic resin layer made of a material (Patent Document 1). A layer made of a cured product of a siloxane-based composition has an advantage in that it has excellent heat resistance as compared with an organic resin layer. This advantage is particularly advantageous when a touch panel member is incorporated as a member constituting the display device. This is because high temperature processing is often performed in the process of manufacturing a display device, and when a layer made of a cured product of a siloxane composition is employed as an insulating layer, an insulating layer that can withstand such high temperature processing is obtained. Because it can.

  SOG (Spin On Glass) is known as a siloxane-based composition capable of forming a cured product having a siloxane bond. As SOG, photosensitive SOG is known which has photosensitivity as a siloxane-based photoresist. Therefore, it is considered to form a surface protective layer and / or an insulating layer using photosensitive SOG.

  Photosensitive SOG is a photosensitive resin composition containing a photosensitive compound having a siloxane skeleton. SOG has the following advantages. SOG can be used to form a coating film efficiently by appropriately applying a coating method such as spin coating. Among them, photosensitive SOG is easily cured by heating and light irradiation, and the cured product is excellent in heat resistance and fastness, and easily forms a finely patterned layer. It is something that can be done. Because of these advantages, forming a layer containing a cured product of photosensitive SOG as an insulating layer is to efficiently make the insulating layer a layer excellent in heat resistance and robustness and finely patterned. It is effective in that it can be manufactured, and is effective in improving the manufacturing efficiency, heat resistance, and robustness of the touch panel member.

JP 2010-165333 A

  However, the layer containing the cured product of the photosensitive SOG is weaker in adhesion to the transparent electrode layer than the organic resin layer made of the above-described silicon-free photoresist, and the layer containing the cured product of SOG is from the transparent electrode layer. There is a problem of peeling. This means that when the layer containing a cured product of photosensitive SOG is configured as an insulating layer, the insulating layer is easily peeled off from the transparent electrode layer, and peeled off from the first electrode and / or the second electrode. It shows that it causes the problem of becoming easy.

  An object of the present invention is to provide a touch panel member capable of forming a state in which an insulating layer is sufficiently adhered to a transparent electrode layer even when a layer containing a cured product of photosensitive SOG is configured as an insulating layer. And it aims at providing the touchscreen provided with such a touchscreen member, and a display apparatus with a touchscreen.

The present invention includes (1) a glass substrate and a cured product of a photosensitive resin composition having a transparent electrode layer and a siloxane skeleton formed in a predetermined pattern on the glass substrate surface. A touch panel having a laminated structure formed by forming an insulating layer and forming a position detection region capable of detecting a touch position in a predetermined region overlapping at least a part of the region where the transparent electrode layer is formed. A member,
In the laminated structure, at least one transparent electrode layer is formed on the glass substrate surface, and at least one insulating layer is provided so as to cover at least a part of the transparent electrode layer in a plan view of the touch panel member. It is formed on the glass substrate surface,
In the position detection area,
At least one insulating layer forms a counter-transparent electrode layer contact region in which a part of the surface of the insulating layer on the facing surface facing the glass substrate surface directly contacts the transparent electrode layer. And at least a part of the region excluding the counter transparent electrode layer contact region on the facing surface is patterned so as to form a counter glass substrate contact region in direct contact with the glass substrate surface, and A touch panel member, wherein an area of the contact region with respect to the glass substrate is 1% or more and 15% or less of the area of the facing surface in a plan view of the touch panel member;
(2) The laminated structure includes a first insulating layer and a second insulating layer as insulating layers,
In the position detection area,
At least one of the first insulating layer and the second insulating layer is in contact with at least a part of the transparent electrode layer to form a counter transparent electrode layer contact region, and is in direct contact with the glass substrate surface. A glass-to-glass substrate contact area is formed, and the area of the glass-to-glass substrate contact area is configured to be 1% to 15% of the area of the facing surface in a plan view of the touch panel member. The touch panel member according to (1),
(3) A laminated structure formed by forming a transparent electrode layer and an insulating layer on one side of a glass substrate, and a pixel group composed of a plurality of pixel pieces is formed on the other side of the glass substrate. (1) or the touch panel member according to (2),
(4) A display panel having a display surface capable of displaying an image is provided. In the display panel, the first panel substrate and the second panel substrate are bonded to each other with a sealant interposed therebetween. A display device in which a display medium is provided between the panel substrates, and a display surface is formed on the first panel substrate,
A display device with a touch panel, wherein the touch panel member according to any one of (1) to (3) is incorporated in a first panel substrate;
(5) A touch panel comprising a panel screen and electrically connecting a position detection device for detecting a coordinate position in a predetermined area in the panel screen to the panel screen,
The gist of the touch panel is characterized in that the panel screen is formed by further laminating a light-transmitting cover substrate on the laminated structure of the touch panel member according to any one of (1) to (3). To do.

  According to the present invention, even when a layer containing a cured product of a photosensitive resin composition having a siloxane skeleton such as photosensitive SOG is configured as an insulating layer, the insulating layer is sufficiently adhered to the transparent electrode layer. A touch panel member that can be formed can be provided, and a touch panel provided with such a touch panel member and a display device with a touch panel can be provided.

(1A) It is a schematic plan view schematically showing one embodiment of the touch panel member of the present invention. (1B) It is a schematic plan view for schematically illustrating one example of the formation pattern of the insulating layer and explaining the contact area with the glass substrate. (1C) It is a schematic cross-sectional schematic diagram schematically showing the state of the vertical cross section taken along the line II of FIG. 1A. (2A) It is a schematic partial enlarged view schematically showing an enlarged portion of a region S1 in FIG. 1A. (2B) It is a schematic longitudinal cross-sectional schematic diagram which shows typically the state of the AA vertical cross section of FIG. 2A. (2C) It is a schematic longitudinal cross-sectional schematic diagram which shows typically the state of the BB longitudinal cross-section of FIG. 2A. (3A) In the other Example of the touch-panel member of this invention, it is a general | schematic partial enlarged view which expands and shows typically the part corresponding to the part of area | region S1 of FIG. 1A. (3B) It is a schematic longitudinal cross-sectional schematic diagram which shows typically the state of the CC cross section of FIG. 3A. (3C) It is a schematic longitudinal cross-sectional schematic diagram which shows typically the state of the DD sectional view of FIG. 3A. (3D) It is drawing which expands and shows typically the part of the area | region T of FIG. 3A, and is a schematic partial expansion model for demonstrating the formation pattern of the 1st insulating layer 4a and the 1st transparent electrode layer 3a. FIG. (4A) In the other Example of the touch-panel member of this invention, it is a general | schematic partial enlarged view which expands and shows typically the part corresponding to the part of area | region S1 of FIG. 1A. (4B) It is a schematic longitudinal cross-sectional schematic diagram which shows typically the state of the EE line vertical cross section of FIG. 4A. (4C) It is a schematic longitudinal cross-sectional schematic diagram which shows typically the state of the FF line vertical cross section of FIG. 4A. (5A) It is a schematic partial enlarged view schematically showing an enlarged portion of a region S2 in FIG. 1B. (5B) In the other Example of the touch-panel member of this invention, it is a general | schematic partial enlarged view which expands and shows typically the part corresponding to the part of area | region S2 of FIG. 1B. It is a schematic cross-sectional schematic diagram for demonstrating the other Example of the touchscreen member of this invention. (7A) It is a schematic partial enlarged view schematically showing an enlarged portion of a region S3 in FIG. 1A. (7B) In the other Example of the touch-panel member of this invention, it is a general | schematic partial enlarged view which expands and shows typically the part corresponding to the part of area | region S3 of FIG. 1A. It is a schematic cross-sectional schematic diagram for demonstrating the other Example of the touchscreen member of this invention. It is a schematic cross-sectional schematic diagram for demonstrating the other Example of the touchscreen member of this invention. It is a schematic perspective view schematically showing one embodiment of a touch panel using a touch panel member. (11A) It is a schematic perspective view for showing one embodiment of the display device with a touch panel of the present invention. (11B) It is a schematic cross-sectional schematic diagram schematically showing the state of the vertical cross section taken along the line II-II in FIG. 11A. FIG. 3 is a schematic plan view schematically showing a formation pattern of extraction electrode portions for the touch panel member produced in Example 1. It is a schematic plan view schematically showing a state in which the first transparent electrode layer is formed by patterning the touch panel member produced in Example 1. FIG. 14 is a partial enlarged plan view schematically showing a part of a region SE1 in FIG. It is a schematic plan view schematically showing a state in which a first insulating layer is formed by patterning the touch panel member produced in Example 1. It is a schematic plane schematic diagram which shows typically the state which patterned the 2nd transparent electrode layer about the touch panel member produced in Example 1. FIG. FIG. 17 is a partial enlarged plan view schematically showing a part of a region SE2 in FIG. It is a schematic plan view which shows typically the formation pattern of an extraction electrode part, a 1st connection part, and a 1st insulating layer about the touchscreen member produced in Example 4. FIG. It is a figure which shows the state which patterned the transparent electrode layer about the touchscreen member produced in Example 4, Comprising: It is the partial expansion plane schematic diagram which shows typically the part corresponding to the part of area | region SE1 of FIG. 5 is a schematic plan view schematically showing a state in which a second insulating layer is formed by patterning the touch panel member produced in Example 1. FIG.

  The touch panel member 1 will be described in detail with reference to the drawings. Here, the case where the touch panel member 1 is a touch panel member used for a projected capacitive touch panel will be described as an example.

[Touch panel member 1]
As shown in FIGS. 1A, 1C, and 2A to 2C, the touch panel member 1 includes a glass substrate 2, and a laminated structure 5 in which a transparent electrode layer 3 and an insulating layer 4 are formed on the surface of the glass substrate 2. It has. In FIG. 1A, the description of a part of the insulating layer 4 is omitted for convenience of explanation.

(Glass substrate 2)
The glass substrate 2 may be appropriately selected without particular limitation as long as it has optical transparency. For example, examples of the glass substrate 2 include alkali-free glass, quartz glass, and soda lime glass.

  The thickness of the glass substrate 2 can be selected as appropriate. From the viewpoint of maintaining ease of handling of the glass substrate 2 during the manufacturing process of the touch panel member 1, a glass substrate 2 having a thickness of about 0.3 mm to 1.5 mm is often used preferably.

[Laminated structure 5]
The laminated structure 5 is formed by laminating at least one transparent electrode layer 3 and at least one insulating layer 4 on at least one surface 56 a side of the surface 56 of the glass substrate 2. In the laminated structure 5, at least one transparent electrode layer 3 and at least one insulating layer 4 are formed on the same surface side of the glass substrate 2 in this order. At this time, the laminated structure 5 is formed by forming at least one transparent electrode layer 3 so that at least a part of the transparent electrode layer 3 is in direct contact with the one surface 56a side of the glass substrate 2, and further touch panel member 1 In the plan view, the insulating layer 4 is formed on the surface of the glass substrate 2 so as to cover at least a part of one layer of the transparent electrode layer 3. The plan view of the touch panel member 1 indicates a state in which the touch panel member 1 is viewed with the direction along the thickness direction of the touch panel member 1 as a viewing direction.

  As an example of the laminated structure 5, a specific description will be given using the laminated structure 5a shown in FIGS. 2A to 2C. For convenience of explanation, the description of the extraction electrode unit 30 is omitted in FIGS. 2A to 2C. In the example of the laminated structure 5 a, the first transparent electrode layer 3 a and the second transparent electrode layer 3 b are formed as the transparent electrode layer 3 on the one surface 56 a side of the glass substrate 2. In the laminated structure 5 a, the first transparent electrode layer 3 a is directly formed on the one surface 56 a side of the glass substrate 2, and at least one of the first transparent electrode layers 3 a in plan view of the touch panel member 1. An insulating layer 4 is formed on the surface of the glass substrate 2 so as to cover the portion. Furthermore, in the laminated structure 5a, the second transparent electrode layer 3b is formed, and the second transparent electrode layer is formed on at least a part of the surface of the laminate of the first transparent electrode layer 3a and the insulating layer 4. At least a part of 3b is laminated, and a structure in which the first transparent electrode layer 3a and the insulating layer 4 are laminated in this order is formed in at least a part.

(Transparent electrode layer 3)
The transparent electrode layer 3 is a layer made of a transparent conductive material. Examples of the transparent conductive material include transparent conductive metal oxides such as indium tin oxide (ITO), indium oxide, indium zinc oxide (IZO), tin oxide (SnO ₂ ), and zinc oxide (ZnO), polyaniline, and polyacetylene. And the like, and the like. A transparent conductive material is preferably used in terms of making the transparent electrode layer 3 excellent in heat resistance, and ITO is preferably used among the transparent conductive materials in terms of high transparency.

  The thickness of the transparent electrode layer 3 can be selected as appropriate. When a plurality of layers are formed as the transparent electrode layer 3 such as the first transparent electrode layer 3a and the second transparent electrode layer 3b, the thickness can be appropriately selected individually. In many cases, the thickness is about 15 nm or more and 500 nm or less from the viewpoint of securing the film forming property and film forming property.

(Formation region of transparent electrode layer 3)
The transparent electrode layer 3 is set as a predetermined region in the plane of the glass substrate 2 in a plan view of the touch panel member 1 and is a position detection region used for detecting a touch position. In the example of FIG. Is formed at least in the position detection area forming portion 6 which is a portion partitioned by a region R specified by a predetermined portion surrounded by. The position detection area R is designated as an area where the coordinate position of the touch position can be detected by the position detection mechanism, and is a predetermined area that overlaps at least a part of the area where the transparent electrode layer is formed. The position detection area forming unit 6 is set as a portion that divides the area where the touch position can be detected in the touch panel member 1 as described above. In the example of FIG. 1, the position detection region R is formed as a rectangular region in the touch panel member 1, but can be appropriately set according to design specifications. In addition, when the coordinate position is assumed to be a plane along the surface of the portion of the surface of the touch panel member 1 that is partitioned by the position detection region R, the coordinate position is stretched between the X axis and the Y axis that are orthogonal to each other. A position specified by combining the X coordinate and the Y coordinate when an XY two-dimensional plane coordinate is assumed is shown.

(Formation pattern of transparent electrode layer 3)
About the formation pattern of the transparent electrode layer 3, it sets suitably according to the content of the position detection mechanism of the touch panel which incorporates the touch panel member 1, and the specification of the touch panel member 1. FIG. When the laminated structure 5a includes two layers of the first transparent electrode layer 3a and the second transparent electrode layer 3b as the transparent electrode layer 3 as in the examples of FIGS. The first transparent electrode layer 3a and the second transparent electrode layer 3b are formed with the formation pattern of the transparent electrode layer 3 required according to the above.

  The formation pattern of the 1st transparent electrode layer 3a is the 1st electrode pattern 7, and the pattern except the 2nd connection part 12b among the 2nd electrode patterns 8 which cross | intersect the 1st electrode pattern 7 It is a combined pattern.

  The first electrode pattern 7 is a pattern formed by arranging the first electrode unit patterns 9 in a first direction which is a predetermined direction along the surface of the glass substrate 2 with a predetermined interval. In the example of FIG. 1, the first direction is the direction along the arrow Y direction in FIG. 1A and the longitudinal direction of the position detection region R. The first electrode unit pattern 9 has triangular electrode pads 11 (11a) at both ends, rhombus electrode pads 11 (11b) arranged in a row between the triangular electrode pads 11a, and As shown in FIG. 2A, the pattern corresponds to a structure formed by forming a first connecting portion 12 a that is a connecting portion 12 that connects adjacent electrode pads 11.

  The second electrode pattern 8 is a second direction in which the second electrode unit pattern 10 is a predetermined direction along the surface of the glass substrate 2 and intersects the first direction in plan view of the touch panel member 1. It is a pattern formed side by side with a predetermined interval in the direction. In the example of FIG. 1, the second direction is the direction along the arrow X direction in FIG. 1A and the short direction of the position detection region R. The arrow X direction and the arrow Y direction are orthogonal. The second electrode unit pattern 10 has triangular electrode pads 11 (11c) arranged at both ends, rhombus electrode pads 11 (11d) arranged in a row between the triangular electrode pads 11c, and As shown in FIG. 2A, the pattern corresponds to a structure formed by forming a second connecting portion 12 b that is a connecting portion 12 that connects adjacent electrode pads 11. The pattern excluding the second connecting portion 12b in the second electrode pattern 8 is a pattern corresponding to the structure in which the electrode pads 11 (11c, 11d) are arranged.

  The second transparent electrode layer 3b is laminated on the insulating layer 4 and is also formed in a hole 15 of the insulating layer 4 described later. At this time, the second transparent electrode layer 3b is a second connecting portion 12 that directly contacts the electrode pads 11 of the second electrode pattern 8 and connects the adjacent electrode pads 11 as shown in FIG. 2B. The connecting portion 12b is configured.

  Accordingly, the formation pattern of the second transparent electrode layer 3b is a pattern corresponding to the arrangement structure of the second connecting portions 12b, that is, the electrode pads 11 constituting the second electrode pattern 8 in plan view of the touch panel member 1. , 11 are connected to each other.

  By the way, the formation pattern of the 1st transparent electrode layer 3a is used for the 1st connection part 12 used as the element which forms the 1st electrode pattern 7, and the adjacent electrode pad used as the element which forms the 2nd electrode pattern 8 11 and 11. In addition, as shown in FIG. 2A, the first connecting portion 12a and the second connecting portion 12b intersect each other so as to at least partially overlap each other in the plan view of the touch panel member 1 to form the first electrode pattern. And the second electrode pattern intersect. However, as for the first connecting portion 12a and the second connecting portion 12b, the insulating layer 4 is interposed between them, so that insulation is maintained between them. 2A, the arrangement pattern of the electrode pads 11 constituting the first electrode pattern 8 and the arrangement pattern of the electrode pads 11 constituting the second electrode pattern 7 do not overlap each other, and the gap 13 Exists. Therefore, insulation is maintained between the electrode pad constituting the first electrode pattern and the electrode pad constituting the second electrode pattern. Thus, the first transparent electrode layer 3a and the second transparent electrode layer 3b are patterned so as to maintain the insulation between the first electrode pattern 7 and the second electrode pattern 8 while forming the pattern. Is done.

(Method for preparing transparent electrode layer 3)
The transparent electrode layer 3 can be formed as follows.

  A conductive film is obtained by sputtering a transparent conductive material constituting the transparent electrode layer 3 on the base surface. The transparent electrode layer 3 is prepared on an appropriately determined base surface. For example, in the first transparent electrode layer 3 a, the base surface is one surface of the glass substrate 2. Thereby, one surface of the conductive film is formed on one surface of the glass substrate 2.

  Next, a photosensitive material is applied onto the conductive film to form a photosensitive film, thereby obtaining a laminate (a laminate with a photosensitive film). As the photosensitive material, a positive resist material, a negative resist material, or the like that can be used when performing a photolithography method may be appropriately selected.

  As a photomask, a photomask having a predetermined pattern corresponding to the formation pattern of the transparent electrode layer 3 is prepared. A photomask is arranged at a predetermined position on the photosensitive film of the laminate with the photosensitive film, and exposure processing is performed by irradiating light of a predetermined wavelength from the outer position of the photomask toward the laminated body with the photosensitive film. Irradiation light is appropriately determined according to the characteristics of the photosensitive material such as ultraviolet light. After the exposure processing, the photomask is removed and development processing is performed. Thus, by using a so-called photolithography method, the photosensitive film is patterned according to the formation pattern of the transparent electrode layer.

  Thereafter, the laminate with the photosensitive film is etched. The etching solution used in the etching is appropriately selected according to the type of the transparent conductive material constituting the conductive film. For example, when the transparent conductive material is ITO, an oxalic acid-based solution can be used. Specifically, ITO-07N (trademark) (manufactured by Kanto Chemical Co., Inc.) or ITO-Echant (trademark) (Wako Pure Chemical Industries, Ltd.) (Manufactured by Yakuhin Kogyo Co., Ltd.). Thereby, the conductive film is removed by etching according to the formation pattern of the transparent electrode layer, and the patterning of the conductive film is realized. After carrying out the etching, a peeling process for peeling the photosensitive film of the laminate with the photosensitive film is further performed to remove the photosensitive film from the laminate with the photosensitive film. For the stripping treatment, a known method such as washing the laminate with a photosensitive film with a stripping solution of a known photosensitive resin such as a strong alkali solution or an organic solvent can be appropriately used. Thus, a conductive film patterned in a predetermined pattern is formed on one surface of the glass substrate 2 to form the transparent electrode layer 3.

  In addition, the formation method of the transparent electrode layer 3 is not limited to the method using the above photolithography methods, The printing method, especially the screen printing method can also be employ | adopted effectively. In general, the screen printing method does not require exposure processing or development processing and does not require preparation of a photomask, and can be formed at low cost. In addition, since the printing method is a method that can eliminate the development process, it is a method that can eliminate the processing of the developer used in the development process, and has a great environmental advantage. is there.

(Insulating layer 4)
The insulating layer 4 is a layer having a siloxane skeleton. The insulating layer 4 includes a cured product of a photosensitive resin composition capable of forming a siloxane skeleton. More specifically, the insulating layer 4 is a photosensitive siloxane resin layer formed using a photosensitive siloxane resin composition containing a photosensitive siloxane resin as the photosensitive resin composition.

  The photosensitive siloxane resin composition is a resin composition containing a siloxane resin as described above, and is photosensitive, that is, has ionizing radiation curability. Furthermore, the photosensitive siloxane resin composition preferably includes a siloxane resin capable of forming a layer structure patterned into a predetermined pattern by a photolithography method. If it is such a photosensitive siloxane resin, a conventionally well-known material can be selected suitably and it can be used in order to prepare the photosensitive siloxane resin layer which comprises the insulating layer 4. FIG.

  For example, the photosensitive siloxane resin composition is a radiation curable resin composition disclosed in Japanese Patent No. 3821165, that is, a siloxane resin (excluding an aqueous base-soluble silicon-containing polymer having a phenol group), photoacid generation. An aprotic solvent (i.e., diethyl ether, methyl ethyl ether, methyl-n-di-n-propyl ether, di-iso-propyl ether, A radiation curable composition comprising an aprotic solvent containing one or more ether solvents such as methyltetrahydrofuran and dimethyldioxane, which is cured by irradiation with radiation, can be suitably used.

  The photosensitive siloxane resin composition is a radiation curable resin composition disclosed in Japanese Patent No. 3758669, that is, a siloxane resin, an acidic active substance by irradiating with radiation of a specific wavelength used in the exposure step. A photoacid generator that emits a photoacid generator, a photobase generator that releases a basic active substance, a solvent capable of dissolving the siloxane resin component, and an acidic active substance and a basic activity even when irradiated with radiation of the specific wavelength A radiation curable composition containing a curing accelerating catalyst that does not release a substance can be suitably used.

  Furthermore, as an example of a siloxane resin capable of forming a layer structure patterned by a photolithography method, it is obtained by dehydrating and condensing silanol obtained after hydrolyzing a compound represented by the following general formula (1). Examples thereof include resins.

In the general formula (1), R ¹ is a hydrogen (H) atom or a fluorine (F) atom, or a boron (B) atom, a nitrogen (N) atom, an aluminum (Al) atom, a phosphorus (P) atom, silicon A group containing (Si) atom, germanium (Ge) atom or titanium (Ti) atom, or an organic group having 1 to 20 carbon atoms, X represents a hydrolyzable group, and n is an integer of 0 to 2 And when n is 2, each R ¹ may be the same or different, and when n is 0 or more and 2 or less, each X may be the same or different.

  This photosensitive siloxane resin layer may be formed from one type of photosensitive siloxane resin, or may be formed from any combination of two or more types of photosensitive siloxane resins represented by different structural formulas. For example, the photosensitive siloxane resin layer represented by the above general formula (1) may be formed by arbitrarily combining two or more types of photosensitive siloxane resins having different side chains.

(Formation position and formation pattern of insulating layer 4)
The insulating layer 4 is formed in a predetermined pattern on the surface of the glass substrate 2 on the same side as the surface on which the transparent electrode layer 3 is laminated.

  The formation pattern of the insulating layer 4 is appropriately set according to the standard of the touch panel member 1. In the example of FIG. 2A, the formation pattern of the insulating layer 4 is formed by forming a plurality of holes 15 in a part of the transparent electrode layer 3a facing the formation region of the electrode pad 11 constituting the second electrode pattern. Pattern. The holes 15 are formed so as to penetrate the insulating layer 4 in the thickness direction, and two holes 15 are provided at positions facing one portion of the rhomboid electrode pad 11d in the second electrode pattern 8, One is provided at a position facing one portion of the triangular electrode pad 11c.

(Contact between insulating layer 4 and other layers)
In the touch panel member 1, the portion in the position detection region R indicates the position detection area forming unit 6 that is a portion partitioned by the position detection region R. In the portion in the position detection region R, at least one layer is included. The insulating layer 4 has a part of the surface of the insulating layer 4 on the facing surface 14 facing the glass substrate 2 side in direct contact with the transparent electrode layer 3a, and at least a part of the insulating layer 4 Covers at least a part of the transparent electrode layer 3a. At this time, as shown also in FIG. 5A, the position detection region R is formed in direct contact with the transparent electrode layer 3 in the region 17 of the facing surface 14 of the insulating layer 4 in a plan view of the touch panel member 1. This region is referred to as a counter transparent electrode layer contact region 16.

  Further, regarding the position detection area forming portion 6, at least one insulating layer 4 has at least a part of the area of the facing surface 14 excluding the counter transparent electrode layer contact area 16 in the position detection area R. It is formed so as to be in direct contact with the surface. At this time, as shown in FIG. 1B and FIG. 5A, in the position detection region R, the touch panel member 1 is formed in direct contact with the surface of the glass substrate 2 of the facing surface 14 of the insulating layer 4 in plan view. The region is a glass substrate contact region 18. In FIG. 1B, the hatched area corresponds to the glass substrate contact area 18. In the position detection region R, the region 17 of the facing surface 14 is a region obtained by combining the counter transparent electrode layer contact region 16 and the counter glass substrate contact region 18 as shown in FIG. 5A. When the formation region 19 of the metal wiring 32 enters the position detection region R and the entry region 19a is formed, the entry region 19a is not included in the glass substrate contact region 18.

  The insulating layer 4 may be formed so that at least a part of the region extends to the outside of the position detection region R. Even when the insulating layer 4 is formed so as to cover the metal wiring provided on the outer periphery of the position detection area forming portion 6 of the touch panel as shown in the example of FIG. Is defined by a region inside the position detection region R.

  In the touch panel member 1, at least one insulating layer 4 is formed so that the area of the contact area 18 for the glass substrate satisfies the following conditions.

(Area of glass substrate contact region 18 of insulating layer 4)
In the position detection region R, the area of the glass substrate contact region 18 is 1% or more and 15% or less of the area of the facing surface 14 in a plan view of the touch panel member 1.

  In the position detection area | region R, the effect that the possibility that the insulating layer 4 peels from the touch panel member 1 can be suppressed because the to-glass substrate contact area 18 is 1% or more of the area of the facing surface 14. In addition, since the contact area 18 with respect to the glass substrate is 15% or less of the area of the facing surface 14, it is possible to obtain an effect that the possibility of distortion of the glass substrate 2 can be reduced. .

  The area of the glass substrate contact region 18 is an area specified in the position detection region R, and indicates the area of the glass substrate contact region 18 specified in a plan view of the touch panel member 1, specifically, In the position detection region R, an area of a parallel projection image obtained by parallel projecting the glass substrate contact region 18 onto a plane parallel to the surface of the glass substrate 2 is shown.

  Further, the area of the facing surface 14 is an area specified in the position detection region R, and indicates the area of the facing surface 14 specified in plan view of the touch panel member 1. Specifically, In the position detection region R, an area of a parallel projection image obtained by parallel projecting the facing surface 14 onto a plane parallel to the surface of the glass substrate 2 is shown. When the entire insulating layer 4 is formed in the same shape as the position detection region R or inside the position detection region R, the contour of the facing surface 14 corresponds to the contour of the insulating layer 4. When the insulating layer 4 is formed not only on the inner side but also on the outer side, the contour of the facing surface 14 corresponds to the contour of the position detection region R.

  The area of the glass-to-glass substrate contact region 18 and the area of the facing surface 14 can be changed according to the width of the gap 13 between the adjacent electrode pads 11, 11, the shape of the electrode pad, the formation pattern of the insulating layer 4, etc. .

(Method for specifying area of glass substrate contact region 18 and area of facing surface 14)
The areas of the glass-to-glass substrate contact region 18 and the facing surface 14 can be specified as follows. That is, the touch panel member 1 can be identified by taking an image of the state in plan view and calculating the areas of the glass substrate contact region 18 and the facing surface 14 based on the obtained plan view image. In calculating the areas of the glass-to-glass substrate contact area 18 and the facing surface 14, an image processing apparatus may be used as appropriate. Specifically, an image in a state in which the touch panel member 1 is viewed in plan is photographed by a photographing device such as a digital camera, and image data regarding the planar view image of the touch panel member 1 is obtained. Image data is input to an image processing system (manufactured by Nireco Corporation: LUZEX (registered trademark) AP, etc.), and image processing based on the image data is performed. Desired.

(Relationship between formation pattern of insulating layer 4 and area of glass substrate contact region 18)
The fact that the area of the glass-to-glass substrate contact region 18 satisfies the above-described conditions satisfies the above-described conditions in the touch panel member 1 in which the insulating layer 4 is patterned while forming an integral layer at least in the position detection region R as shown in FIG. Will contribute to solving particularly large challenges. That is, in the touch panel member 1, when at least one insulating layer 4 is patterned as an integral layer, the insulating layer 4 formed as an integral layer is partially peeled off. When this occurs, peeling is likely to occur over the entire surface, and therefore, suppression of peeling is a particularly significant issue as compared to the case where the insulating layer 4 is formed on the flying surface. This big problem is effectively solved when the area of the contact area 18 to the glass substrate satisfies the above-described conditions.

(Other examples of the number of laminated insulating layers 4)
The insulating layer 4 only needs to be formed at least one layer. In the example of the touch panel member 1 of FIGS. 1 and 2, the insulating layer 4 is one layer, but two or more layers may be formed. That is, for example, as shown in FIG. 6, a first insulating layer 4 a and a second insulating layer 4 b may be formed as the insulating layer 4.

  In this case, in the touch panel member 1, the area of the glass substrate contact region 18 in the position detection region R of the insulating layer 4 is at least the first insulating layer 4 a facing the touch panel member 1 in plan view. What is necessary is just to form so that it may be 1% or more and 15% or less of the area of the surface 14. In the touch panel member 1 shown in the example of FIG. 6, the reason why it is bonded to both the glass substrate 2 and the first transparent electrode layer 3 a is that it is the first insulating layer 4 a among the plurality of insulating layers 4. .

  In this case, the first insulating layer 4 a is formed on the surface of the glass substrate 2 so as to cover at least a part of one layer of the transparent electrode layer 3 in a plan view of the touch panel member 1. Furthermore, in the laminated structure 5, the second transparent electrode layer 3b is formed so as to cover at least a part of the first insulating layer 4a and the first transparent electrode layer 3a. A second insulating layer 4b is formed so as to cover at least the second transparent electrode layer 3b. When there is a part of the first transparent electrode layer 3b that is not covered with the first insulating layer, the second insulating layer 4b covers the part and the second transparent electrode layer 3b. It is formed. As shown in FIG. 6, the laminated structure 5 includes a first transparent electrode layer 3a, a first insulating layer 4a, a second transparent electrode layer 3b, and a second insulating layer 4b from the side closer to the glass substrate 2 surface. It is comprised so that it may have in at least one part the structure laminated | stacked in this order.

(Function of the second insulating layer 4b)
The second insulating layer 4 b exhibits a function of ensuring the insulating property of the transparent electrode layer 3 with respect to the outside of the touch panel member 1. The second insulating layer 4 b also functions as a surface protective layer that protects the transparent electrode layer 3 by suppressing external exposure of the transparent electrode layer 3.

(Preparation method of insulating layer 4)
The insulating layer 4 can be prepared, for example, by forming a photosensitive siloxane resin layer on the surface forming the base of the insulating layer 4 as shown below. The surface forming the base is composed of the substrate 2 surface, the transparent electrode layer 3 and the like.

  A photosensitive resin composition containing a photosensitive compound constituting the photosensitive siloxane resin layer is prepared.

(Preparation of photosensitive resin composition)
As the photosensitive resin composition, a material composition including a photosensitive compound and a sol-gel reaction catalyst that accelerates polymerization and curing of the photosensitive siloxane resin corresponding to the photosensitive compound may be used. For example, a photosensitive SOG (Spin On Glass). More specifically, for example, a photosensitive siloxane resin composition as described above may be used as the photosensitive resin composition. The photosensitive resin composition is usually prepared as a liquid composition obtained by mixing a siloxane resin, a sol-gel reaction catalyst, and a solvent.

  Examples of the siloxane resin that forms the photosensitive compound include resins as shown in the general formula (1).

  Examples of the sol-gel reaction catalyst include a thermal acid generator and a photoacid generator. The thermal acid generator and the photo acid generator are those which generate an acid by receiving heat and those which generate an acid by receiving light, respectively, and those conventionally known can be used as appropriate. Further, as the sol-gel reaction catalyst contained in the photosensitive resin composition, at least a photoacid generator may be used, but it is preferable to use both in combination. By using a thermal acid generator and a photoacid generator in combination, the cured film of the photosensitive resin composition can be made more excellent in heat resistance. In the photosensitive resin composition, a compound having both properties of a thermal acid generator and a photoacid generator may be used as a sol-gel reaction catalyst.

  Examples of the sol-gel reaction catalyst include various onium salt compounds such as aromatic diazonium salts, diaryliodonium salts, triarylsulfonium salts, and triarylselenium salts, sulfonate esters, and halogen compounds.

  The solvent is not particularly limited as long as it is a solvent capable of dissolving a solid component such as a photosensitive compound, and specific examples include benzene, toluene, xylene, n-butylbenzene, and diethylbenzene.

As the photosensitive resin composition, a negative type and a positive type can be appropriately prepared. Here, in the negative photosensitive resin composition, when the coating film of the photosensitive resin composition is irradiated with light, an efficient progress of the sol-gel reaction of the photosensitive compound is recognized in the light irradiated portion. Of the type The negative photosensitive resin composition includes, for example, a photosensitive compound in which R ^{1 in the} general formula (1) is a functional group having 2 or less carbon atoms, and a strong acid such as bis (p-toluenesulfonyl) diazomethane. It can be specifically prepared as a composition containing a photoacid generator that generates water.

The positive type photosensitive resin composition is such that, when the coating film of the photosensitive resin composition is irradiated with light, the portion irradiated with the light can be removed by developing the photosensitive compound. The positive photosensitive resin composition is, for example, a photoacid generator that generates a photosensitive compound in which R ^{1 in the} general formula (1) is a functional group having 3 or more carbon atoms and a weak acid such as naphthoquinonediazide. As a composition containing an agent, it can be specifically prepared.

(Additive of photosensitive resin composition)
Additives may be appropriately added to the photosensitive resin composition as long as the function of the insulating layer 4 and the gist of the present invention are not lost. Examples of the additive include a viscosity modifier, a surfactant, a colorant, and a glassy forming agent.

  Using the photosensitive resin composition prepared as described above, the insulating layer 4 can be formed as follows. First, the case where the photosensitive resin composition is a negative type will be described.

(Application of photosensitive resin composition)
The photosensitive resin composition is applied onto the base surface to form a non-cured coating film. For forming the coating film, a coating method such as a spin coating method can be appropriately used.

(Depressurized drying of coating film)
The coating film formed by coating the photosensitive resin composition on the base surface is dried under reduced pressure in the range of 20 Pa to 100 Pa, and the unnecessary solvent in the insulating layer 4 is at least partially removed to form a dry film. Is done. In the vacuum drying, the lower the pressure around the coating film, the higher the drying speed of the coating film. Therefore, the pressure at the reduced pressure drying is preferably 100 Pa or less. It is preferable that the pressure at the time of drying under reduced pressure is 20 Pa or more in terms of suppressing the generation.

(Baking of dried film (first baking) and light irradiation)
In the first firing, the dried film is fired under conditions where the firing temperature is 70 ° C. or higher and 120 ° C. or lower and the time is 30 seconds or longer and 3 minutes or shorter. The first baking is a process for improving the adhesion of the dry film to the base surface, and the baking temperature and time are scheduled to be a portion of the dry film that is not patterned (non-patterned portion) in the insulating layer 4. As long as the sol-gel reaction does not occur in the portion to be formed, it is appropriately adjusted. After the first baking, the dried film is further irradiated with light at a irradiation energy of 50 mJ / cm ² or more and 500 mJ / cm ² or less through a photomask to make the dried film a curing preparation film. If the irradiation energy is less than 10 mJ / cm ^{2, the} photoacid generator may be insufficient, and the amount of acid generated to catalyze the sol-gel reaction may not be sufficient. On the other hand, when the irradiation energy exceeds 500 mJ / cm ² , the pattern thickness increases, and it may be difficult to form a layer patterned with sufficient accuracy.

  The light irradiation performed subsequent to the first baking is a treatment for generating an acid catalyst that accelerates the curing reaction of the dry film when the insulating layer 4 is formed using a negative photosensitive resin composition. Yes, the irradiation energy is appropriately adjusted within a range in which the acid catalyst is generated.

  Further, the light irradiation performed subsequent to the first baking is performed by irradiating the dry film with light through a photomask having a predetermined pattern. At this time, for example, when forming the insulating layer 4 as shown in the example of FIGS. 1 and 2 and using a negative photosensitive resin composition, the photomask corresponds to the hole 15. A photomask having a pattern formed so as to shield the portion is specifically prepared.

(Second firing)
Next, the curing preparation film is preferably subjected to the second baking. The second baking is a step of baking the curing preparation film under conditions where the baking temperature is 70 ° C. or higher and 120 ° C. or lower and the time is 1 minute or longer and 10 minutes or shorter. At this time, the curing preparation film is a temporarily cured film. The second baking is a step in which the sol-gel reaction sufficiently proceeds at a portion of the curing preparation film that is supposed to be a patterning portion (patterning portion) in the insulating layer 4. That is, the sol-gel reaction is started in the portion of the insulating layer 4 that is supposed to become the patterning portion by the light irradiation performed before the second baking, and the reaction is performed in the second baking. It will go further. It should be noted that the sol-gel reaction is not started in the portion that is supposed to be a non-patterned portion, and curing is suppressed. In the second firing, the firing temperature and time are such that the sol-gel reaction does not proceed in the portion that is supposed to be the non-patterning portion, and the sol-gel reaction is the portion that is expected to be the patterning portion. In order to promote this, it is appropriately adjusted within the range shown above. After appropriately performing the second baking, the development step described below is performed on the temporarily cured film.

(Development process)
In the development step, the temporarily cured film is developed, whereby a patterned film is formed. The developer used for the development can be appropriately selected according to the photosensitive resin composition. However, for example, an inorganic alkaline developer or a hydroxide is used because the waste liquid generated during the development process can be easily treated. An organic amine developer such as tetramethylammonium (TMAH) is preferably selected.

(Post-baking process)
After the development step, the patterned film is further baked to prepare a photosensitive siloxane resin layer that is patterned and sufficiently cured. The photosensitive siloxane resin layer forms the insulating layer 4. About a post-baking process, baking temperature is set in the range of 200 to 500 degreeC. The firing time is set in the range of 30 minutes to 60 minutes. In addition, when baking temperature is less than 200 degreeC, there exists a possibility that the hardening reaction of the photosensitive compound contained in a patterned film may become inadequate. Even in the case where the firing time is less than 30 minutes, the same fear as when the firing temperature is less than 200 ° C. arises. If the firing temperature exceeds 500 ° C., there is a risk that cracks or cracks, so-called cracks, may occur in the patterned film during firing. When the firing time exceeds 1 hour, the same concern as when the firing temperature exceeds 500 ° C. arises.

  When a positive photosensitive resin composition is used, the steps of applying the photosensitive resin composition, first baking, and light irradiation are performed in the same manner as in the case of using the negative photosensitive resin composition. . However, in the case where the insulating layer 4 is formed using a positive photosensitive resin composition, the light irradiation described above is a treatment for generating a developable reactive group, and the irradiation energy is developable. It adjusts suitably in the range which generates a reactive group. In the case of forming the insulating layer 4 as shown in the examples of FIGS. 1 and 2 and using a positive photosensitive resin composition for the photomask used when performing light irradiation, As a photomask, a photomask having a pattern formed so that a portion corresponding to the hole 15 is an opening and a predetermined region around the portion is shielded is prepared. Thereafter, when a positive photosensitive resin composition is used, the second baking in the case of using a negative photosensitive resin composition is omitted, and the development process and post-baking are performed on the cured preparation film. A process is performed. The development step and the post-baking step may be the same steps as the development step and the post-baking step when the negative photosensitive resin composition is used. However, in the development step, an organic amine developer such as tetramethylammonium hydroxide is preferably selected as the developer.

[Function of laminated structure 5]
The laminated structure 5 functions as the transparent electrode part 20 in the touch panel member 1. Here, as shown in FIG. 1, the transparent electrode portion 20 includes a first electrode 22 composed of a plurality of first electrode pieces 21 arranged at intervals in a first direction along the surface of the glass substrate 2, and The second electrode 24 is composed of a plurality of second electrode pieces 23 arranged at intervals in a second direction different from the first direction, which is a direction along the surface of the glass substrate 2. The first electrode 22 and the second electrode 24 are insulated from each other.

  The first electrode 22 is composed of the electrode pads 11 (11 a, 11 b) that form the first electrode pattern 7 in the multilayer structure 5 and the first connecting portion 12 a, and the second electrode 24 is the second electrode pattern 8. The electrode pad 11 (11c, 11d) and the second connecting portion 12b are formed. And the insulating layer 4 is formed so that the 2nd connection part 12b can be formed so that the 1st connection part 12a may be straddled, and the 1st electrode 22 and the 2nd electrode 24 were mutually insulated To maintain. In addition, the 1st electrode piece 21 is comprised by the electrode pad 11 (11a, 11b) which forms the 1st electrode unit pattern 9, and the 1st connection part 12a, and the 2nd electrode piece 23 is the 2nd electrode unit. The electrode pad 11 (11c, 11d) that forms the pattern 10 and the second connecting portion 12b are configured.

  The transparent electrode portion 20 is formed so that the second connecting portion 12b straddles the first connecting portion 12a in the first electrode piece 21 and the second electrode piece 23, but this is an example. The first connecting part 12a may be formed so as to straddle the second connecting part 12b. In that case, the touch panel member 1 is configured such that the first connecting portion 12a is formed by the second transparent electrode layer, and the pattern of the second connecting portion 12b is incorporated in the pattern of the first transparent electrode layer. Will be.

[Method for Manufacturing Touch Panel Member 1]
The touch panel member 1 is manufactured by forming the laminated structure 5.

(Preparation of laminated structure 5)
The laminated structure 5 can be prepared as follows. That is, the first transparent electrode layer 3a is patterned in a predetermined region of the glass substrate 2, the insulating layer 4 is then patterned, and the second transparent electrode layer 3b is further patterned to form a laminated structure. 5 can be prepared, and the touch panel member 1 is prepared. In addition, the formation method of the above-mentioned transparent electrode layer 3 is used suitably for formation of the 1st transparent electrode layer 3a and the 2nd transparent electrode layer 3b, and formation of the above-mentioned insulation layer 4 is used for formation of the insulation layer 4. A preparation method may be used as appropriate.

[Other Forms of Laminated Structure 5 in Touch Panel Member 1]
The touch panel member 1 is not limited to the case where the laminated structure 5 includes the laminated structure 5a configured as shown in FIG. For example, the touch panel member 1 may include the laminated structure 5 as described in other forms 1 to 3 described below.

(Other form 1)
The touch panel member 1 may include a laminated structure 5c as shown in FIG. The multilayer structure 5c is configured by changing the second transparent electrode layer 3b in the multilayer structure 5a to a metal layer 25 made of a metal material different from the transparent conductive material. The metal layer 25 is formed in the same formation pattern at the same position as the second transparent electrode layer 3b in the multilayer structure 5a. At this time, as a metal material constituting the metal layer 25, a material used for metal wiring of an extraction electrode portion described later can be used. In this case, the touch panel member 1 is configured by providing one transparent electrode layer 3 and one insulating layer 4 on the surface of the glass substrate 2, so that the transparent electrode layer 3 can be formed in one layer. The number of manufacturing processes of the touch panel member 1 can be reduced.

(Other form 2)
The touch panel member 1 is not limited to the one provided with the laminated structure 5a configured as shown in FIGS. 2A to 2C, and may include the laminated structure 5b configured as shown in FIGS. 3A to 3D. Good. FIG. 3A is a partially enlarged view of the laminated structure 5b. In this figure, the enlarged portion of the laminated structure 5b corresponds to the portion shown in FIG. 2A in the laminated structure 5a.

(Laminated structure 5b)
As shown in FIGS. 3A to 3D, the laminated structure 5 b includes a first transparent electrode layer 3 a and a second transparent electrode layer 3 b as the transparent electrode layer 3 on the one surface 56 a side of the surface 56 of the glass substrate 2. The first insulating layer 4a and the second insulating layer 4b are formed as the insulating layer 4. In the laminated structure 5 b, the first transparent electrode layer 3 a is directly formed on the one surface 56 a side of the glass substrate 2, and at least one of the first transparent electrode layers 3 a in plan view of the touch panel member 1. The first insulating layer 4a is formed on the one surface 56a side of the glass substrate 2 so as to cover the portion. The second transparent electrode layer 3b is formed on the one surface 56a side of the surface of the glass substrate 2 so as to cover at least a part of the first insulating layer 4a in a plan view of the touch panel member 1, The second insulating layer 4b is formed so as to cover at least the second transparent electrode layer 3b. The laminated structure 5b has a structure in which the first transparent electrode layer 3a, the first insulating layer 4a, the second transparent electrode layer 3b, and the second insulating layer 4b are laminated in this order from the side closer to the glass substrate 2 surface. It is comprised so that it may have at least one part. For convenience of explanation, the description of the extraction electrode portion 30 is omitted in FIGS. 3A to 3C, and the description of the second transparent electrode layer 3b and the second insulating layer 4b is omitted in FIG. 3D.

  As for the laminated structure 5b, the material and the preparation method for forming the transparent electrode layer 3 and the insulating layer 4 may be the same as those for the laminated structure 5a.

  In the laminated structure 5b, the formation pattern of the first transparent electrode layer 3a, the second transparent electrode layer 3b, the first insulating layer 4a, and the second insulating layer 4b is as follows.

(Formation pattern of transparent electrode layer 3)
The formation pattern of the first transparent electrode layer 3 a is composed of the first electrode pattern 26. Here, the first electrode pattern 26 is the same pattern as the first electrode pattern 7 in the first transparent electrode layer 3a of the laminated structure 5a. Therefore, the 1st transparent electrode layer 3a in the laminated structure 5b forms the electrode pad 11 (11a, 11b) and the 1st connection part 12a which makes the connection part 12 which connects the electrode pad 11 adjacent. .

  In the laminated structure 5 b, the formation pattern of the second transparent electrode layer 3 b is composed of the second electrode pattern 27. Here, the second electrode pattern 27 in the stacked structure 5b is similar to the pattern obtained by removing the second connecting portion 12b from the second electrode pattern 8 in the first transparent electrode layer 3a of the stacked structure 5a, It is a pattern configured in combination with the formation pattern of the second connecting portion 28 that forms the connecting portion 12 that connects the adjacent electrode pads 11. The formation pattern of the second connecting portion 28 is a pattern formed so as to connect the apexes of the adjacent electrode pads 11 facing each other. Therefore, the 2nd transparent electrode layer 3b in the laminated structure 5b forms the electrode pad 11 (11c, 11d) and the 2nd connection part 28 which makes the connection part 12 which connects the adjacent electrode pad 11. FIG. .

(Formation pattern of insulating layer 4)
The first insulating layer 4a includes a first connecting portion 12a of the first transparent insulating layer 3a and a second connecting portion 28 of the second transparent electrode layer 3b in plan view of the touch panel member 1. The first insulating layer 4 a is formed in an enclave shape in plan view of the touch panel member 1. In addition, the 1st insulating layer 4a may be formed to the outer side which protrudes the cross | intersection part. In this case, the first insulating layer 4a further ensures the insulation between the first transparent electrode layer 3a and the second transparent insulating layer 3b.

  The second insulating layer 4b is formed by laminating the first transparent insulating layer 3a, the first insulating layer 4a, and the second transparent insulating layer 3b on one side of the glass substrate 2 in a plan view of the touch panel member 1. It forms so that the surface of the one surface side of the glass substrate 2 in a laminated body may be covered. The second insulating layer 4b is formed as a single layer, that is, an integrated layer, at least in the position detection region R. The second insulating layer 4 b exhibits a function of ensuring the insulating property of the transparent electrode layer 3 with respect to the outside of the touch panel member 1. The second insulating layer 4 b also functions as a surface protective layer that protects the transparent electrode layer 3 by suppressing external exposure of the transparent electrode layer 3.

(Area of contact area of insulating layer 4 to glass substrate)
By the way, in the position detection region R of the touch panel member 1 having the laminated structure 5b, the insulating layer 4 formed as an integral layer has an area of the glass-to-glass substrate contact region 18 in the direction of the touch panel member 1 in plan view. It is preferably formed so as to satisfy the condition that it is 1% or more and 15% or less of the area of the mating surface 14. Therefore, in the touch panel member 1 having the laminated structure 5b, since at least the second insulating layer 4b of the insulating layer 4 is formed as an integral layer in the position detection region R, the second insulating layer 4b is It is preferable to be configured to satisfy the above conditions.

  In the touch panel member 1, in the position detection region R, the second insulating layer 4 b is a part of the surface of the second insulating layer 4 on the facing surface 14 facing the glass substrate 2 surface side. The transparent electrode layer 3 is in direct contact, and at least part of the second insulating layer 4 b covers at least part of one layer of the transparent electrode layer 3. At this time, as shown in FIG. 5B, the position detection region R is formed in direct contact with the transparent electrode layer 3 in the region 17 of the facing surface 14 of the insulating layer 4 in the plan view of the touch panel member 1. The region is a counter transparent electrode layer contact region 16.

  The second insulating layer 4b may be formed so that at least a part of the region extends to the outside of the position detection region R. Even in the case where the insulating layer 4 is formed so as to cover the metal wiring provided on the outer periphery of the position detection area forming portion 6 of the touch panel, in the region inside the position detection region R, the glass substrate contact region 18 is formed.

  In the laminated structure 5b, as described above, the first insulating layer 4a is formed to the outside by protruding the portion where the first connecting portion 12a and the second connecting portion 28 intersect to form the protruding region 29. There may be. In this case, the protruding area 29 is not included in the glass-to-glass substrate contact area 18. This also applies to the case where the metal wiring formation region 19 enters the position detection region R and the entry region 19a is formed, and the glass contact region 18 does not include the entry region 19a. When the second insulating layer 4b is in contact with both the first transparent electrode layer 3a and the second transparent electrode layer 3b on the same surface side as in the laminated structure 5b, contact with each of them The regions are the transparent electrode layer contact regions 16a and 16b. And about the laminated structure 5b, the area | region removed as the counter-transparent electrode layer contact area | region 16 in the case of specification of the said glass substrate contact area | region 18 is made into the counter-transparent electrode layer contact area | region 16a and the counter-transparent electrode layer contact area | region 16b. . 5B is a diagram schematically showing a part corresponding to the part of the region S2 in FIG. 1B and an enlarged schematic partial enlarged plan view when the laminated structure 5 of the touch panel member 1 is the laminated structure 5b. It is.

(Other form 3)
The touch panel member 1 is not limited to the laminated structure 5 provided with the laminated structure 5a or the laminated structure 5b, but may include a laminated structure 5d as shown in FIGS. 4A to 4C. FIG. 4A is a partially enlarged view of the laminated structure 5d. In this figure, the enlarged portion of the laminated structure 5b corresponds to the portion shown in FIG. 2A in the laminated structure 5a.

(Laminated structure 5d)
As shown in FIGS. 4A to 4C, the laminated structure 5 d has a conductive metal layer 57 formed on one surface 56 a side of the surface 56 of the glass substrate 2, and the insulating layer 4 is a first insulating layer. 4a and a second insulating layer 4b are formed. In addition, one layer of the transparent electrode layer 3 is patterned in the laminated structure 5d.

  More specifically, in the laminated structure 5b, the conductive metal layer 57 is patterned on the one surface 56a side of the glass substrate 2, and further, at least a part of the conductive metal layer 57 is formed in a plan view of the touch panel member 1. The first insulating layer 4a is formed on the one surface 56a side of the glass substrate 2 so as to cover it. Further, the transparent electrode layer 3 is formed on the one surface 56a side of the glass substrate 2 so as to cover at least a part of the first insulating layer 4a in a plan view of the touch panel member 1. At least a part of the transparent electrode layer 3 is in direct contact with the surface of the glass substrate 2. The second insulating layer 4 b is formed so as to cover at least the transparent electrode layer 3. The laminated structure 5b has at least a part of a structure in which the conductive metal layer 57, the first insulating layer 4a, the transparent electrode layer 3, and the second insulating layer 4b are laminated in this order from the side closer to the glass substrate 2 surface. It is configured as follows. For convenience of description, the description of the extraction electrode unit 30 is omitted in FIGS. 4A to 4C.

  The conductive metal layer 57 forms a first connecting portion 59 as the connecting portion 12 that connects the electrode pads 11 constituting the first electrode pattern 58. The conductive metal layer 57 is formed of a conductive material different from that of the transparent electrode layer 3, and can be formed of a metal material excluding the transparent conductive material used for forming the transparent electrode layer 3. The formation pattern of the 1st connection part 59 is the same pattern as the 1st connection part 12a of the laminated structure 5a.

  As for the laminated structure 5d, the material and the preparation method for forming the transparent electrode layer 3 and the insulating layer 4 may be the same as those for the laminated structures 5a and 5b.

  In the laminated structure 5d, the formation pattern of the transparent electrode layer 3, the first insulating layer 4a, and the second insulating layer 4b is as follows.

(Formation pattern of transparent electrode layer 3)
The formation pattern of the transparent electrode layer 3 is a pattern in which the pattern excluding the pattern of the first connecting portion 59 from the first electrode pattern 58 and the second electrode pattern 60 are combined. Here, the pattern excluding the pattern of the first connecting portion 59 from the first electrode pattern 58 is the same as the pattern of the first connecting portion 12a to the first electrode pattern 7 in the first transparent electrode layer 3a of the laminated structure 5a. It is the same pattern as the pattern excluding the pattern. Therefore, the pattern excluding the pattern of the first connecting portion 59 from the first electrode pattern 58 is a pattern corresponding to the formation pattern of the electrode pads 11 (11a, 11b).

  Similarly to the second electrode pattern 27 of the multilayer structure 5b, the second electrode pattern 60 in the multilayer structure 5d is connected to the second connecting portion from the second electrode pattern 8 in the first transparent electrode layer 3a of the multilayer structure 5a. 12b, the same pattern as the pattern excluding 12b, and the formation pattern of the second connecting portion 28 forming the connecting portion 12 that forms the second electrode pattern 8 and connects the adjacent electrode pads 11, 11. Pattern.

(Formation pattern of insulating layer 4)
The first insulating layer 4a is patterned in the same pattern as the first insulating layer 4a in the laminated structure 5b described above. The second insulating layer 4b is also patterned in the same pattern as the first insulating layer 4a in the laminated structure 5b described above.

(Area of contact area of insulating layer 4 to glass substrate)
In the laminated structure 5d, the region specified as the region of the insulating layer 4 that is in contact with the glass substrate and the preferable conditions of the area thereof are the same as those in the laminated structure 5b. That is, first, the glass substrate contact region 18 is a region obtained by removing the counter transparent electrode layer contact region 16 from the region 17 of the facing surface 14 of the second insulating layer 4b, and further, a protruding region 29 and a penetration region 19a are formed. In the case of being performed, the protruding area 29 and the entering area 19a are not included. In the case of the laminated structure 5d shown in the example of FIG. 4, the counter-transparent electrode layer contact region 16 is a region where the formation region of the electrode pad 11 and the formation region of the second connecting portion 28 are combined.

  Further, regarding the area of the glass substrate contact region 18, in the laminated structure 5 d, the area of the glass substrate contact region 18 in the second insulating layer 4 b is the facing surface 14 in the plan view of the touch panel member 1. It is preferable to be formed so as to satisfy the condition that it is 1% or more and 15% or less of the area. The reason for this is also the same as in the case of the laminated structure 5b described above.

  As described above, in the touch panel member 1, two layers of the first insulating layer 4a and the second insulating layer 4b may be formed as the insulating layer in the laminated structure 5a. 1 in the position detection region R, so that the area of the glass substrate contact region 18 is not less than 1% and not more than 15% of the area of the facing surface 14 in plan view of the touch panel member 1. It only has to be formed. Further, as shown in the other embodiments 2 and 3, in the touch panel member 1, when the laminated structures 5b and 5d are provided, the first insulating layer 4a and the second insulating layer 4b are used as the insulating layers. In this case, the second insulating layer 4b is formed so that the area of the contact area 18 with respect to the glass substrate in the position detection region R is the area of the facing surface 14 in a plan view of the touch panel member 1. It may be formed so as to be 1% or more and 15% or less. Therefore, the following technical idea can be read. That is, in the touch panel member 1, the laminated structure 5 includes the first insulating layer 4 a and the second insulating layer 4 b as the insulating layer 4, and the first insulating layer 4 a and the second insulating layer 4 are provided in the position detection region. At least one of the insulating layers 4b is in contact with the transparent electrode layer 3 to form a counter transparent electrode layer contact region, and is in direct contact with the glass substrate 2 surface to form a counter glass substrate contact region. In addition, the area of the contact area with the glass substrate is configured to be 1% or more and 15% or less of the area of the facing surface in a plan view of the touch panel member 1.

  When two insulating layers are formed, the number of insulating layers is larger than when there are one insulating layer. Therefore, there is a high possibility that the insulating layer is peeled off from the touch panel member 1. The demand for delamination suppression is high. In particular, when the insulating layers are in direct contact with each other, the adhesiveness of the contact portion between the insulating layers is strong, and it becomes easy to move in conjunction with each other. That is, when one insulating layer is peeled off, the other insulating layers that are in contact with the insulating layer are also easily peeled off, and the insulating layers in contact with each other may be peeled together. For these reasons, the touch panel member 1 of the present application greatly contributes to the case where the insulating layer 4 includes the first insulating layer 4a and the second insulating layer 4b.

[Additional configuration of touch panel member 1]
The touch panel member 1 may be provided with other configurations such as the extraction electrode unit 30 and the pixel group 31 as described below as necessary.

(Extraction electrode part 30)
As shown in FIGS. 1A, 1 </ b> C, and 7, the extraction electrode unit 30 is disposed so as to be electrically connected to the transparent electrode layer 3. In the example of FIG. 1, the extraction electrode unit 30 is patterned so as to be connected to the first transparent electrode layer 3 a. The formation pattern of the extraction electrode part 30 forms a first extraction electrode pattern 33 that is a pattern of the metal wiring 32 connected to the electrode pad 11 that forms the first electrode pattern 7 and a second electrode pattern 8. The pattern is a combination of the second extraction electrode pattern 34 that is a pattern of the metal wiring 32 connected to the electrode pad 11. However, in FIG. 1C, only the metal wiring 32 that forms the second extraction electrode portion pattern 34 is shown for the convenience of showing a cross section corresponding to the cross section at the position of the line I-I in FIG. 1.

  The extraction electrode part 30 is provided by arranging the metal wiring 32 on the glass substrate 2 in a predetermined pattern. At this time, the metal wiring 32 is electrically connected to the transparent electrode layer 3a. In the plan view of the touch panel member 2, the metal wiring 32 is located at the edge position of the transparent electrode layer 3. In the example of FIG. 1, the edge of the electrode pad 11 at the end of the first electrode piece 21 and the second electrode piece 23, respectively. It is formed on the surface of the glass substrate 2 so as to extend from the position toward the outside of the position detection region R, and is arranged in an appropriate pattern according to the formation pattern of the transparent electrode layer 3. The metal wiring 32 extends to the edge position of the glass substrate 2 and forms a terminal 35 at the edge position. The terminal 35 is not limited to the case where the terminal 35 is formed in a predetermined pattern and is formed as a part of the metal wiring 32 by further extending the metal wiring 32, and is formed separately from the metal wiring 32. May be.

  As a material constituting the metal wiring 32, a material containing an ionizable metal element is preferably used from the viewpoint of easy thinning and low resistance, that is, a metal material is preferably used. . Examples of the metal material constituting the metal wiring 32 include a metal simple substance, a metal complex, a metal / metal compound complex, and a metal alloy. Examples of the simple metal include silver, gold, copper, chromium, platinum, and aluminum. Examples of the composite of metal include MAM, and examples of the composite of metal and metal compound include a chromium oxide / chromium laminate. As the metal alloy, a silver alloy or a copper alloy is generally used. Moreover, APC etc. can be illustrated as a metal alloy. MAM indicates a three-layer structure of Mo—Al—Mo, that is, a three-layer structure of molybdenum, aluminum, and molybdenum. APC indicates an alloy of Au, Pd, Cu, that is, silver, palladium, and copper. Show.

  When the extraction electrode portion 30 is provided on the touch panel member 1, it is easy to efficiently transmit electrical information such as voltage and current from the transparent electrode layer 3 to the outside of the touch panel member 1 through the metal wiring 32 and the terminal 35. It becomes.

  As shown in FIG. 7A, the extraction electrode portion 30 may be configured by directly connecting the metal wiring 32 to the transparent electrode layer 3, or formed integrally with the transparent electrode layer 3 as shown in FIG. 7B. The connecting portion 36 may be provided, and the metal wiring 32 may be connected to the transparent electrode layer 3 through the connecting portion 36. The connection portion 36 is formed by using a conductive material constituting the transparent electrode layer 3 and extending a layer of the conductive material from the end of the transparent electrode layer 3 to the outside of the position detection region R. At least a part of the metal wiring 32 is overlaid on the connecting portion 36. Thus, the extraction electrode part 30 is configured to include the metal wiring 32 and the connection part 36, so that the metal wiring 32 is located in the position detection region R while ensuring the connection between the metal wiring 32 and the transparent electrode layer 3. It is possible to effectively restrict entry.

(Pixel group 31)
As shown in FIG. 9, the touch panel member 1 is formed with the transparent electrode layer 3 and the insulating layer 4 on the one surface 56 a side of the glass substrate 2, and from the plurality of pixel pieces 37 on the other surface 56 b side of the glass substrate 2. The pixel group 31 may be formed.

  The pixel piece 37 is formed from a colored layer 39 of a predetermined color having light transparency. The colored layer 39 is formed by patterning in a predetermined shape on the other surface 56b side of the glass substrate 2. The colored layer 39 is patterned into an appropriate shape such as a strip shape. In addition, a large number of colored layers 39 are formed in a predetermined pattern, so that a large number of pixel pieces 37 are formed, and the pixel group 31 is configured by the large number of pixel pieces 37. The color of the colored layer 39 can be set as appropriate. In the example of FIG. 9, three colors of R (Red, G), G (Green, B), and Blue (Blue) are used as colors of the colored layer 39, and the colored layer 39a, the colored layer 39b, and the colored layer 39c are used. As described above, a pattern is formed in a predetermined shape on the other surface 56 b side of the glass substrate 2. At this time, the colored layer 39 is partitioned by a predetermined pattern in a plan view of the touch panel member 1, and a region portion defined by the partitioned one portion of the colored layer 39 forms the pixel piece 37.

  The light-shielding black matrix layer 38 may be applied and formed in a predetermined pattern such as a vertical and horizontal grid pattern on the other surface 56b side of the glass substrate 2. At this time, a non-formation region surrounded by the formation portion of the black matrix layer 38 is formed to form an opening, and a large number of openings are arranged and formed in a lattice shape. Then, the three colored layers 39 (39a, 39b, 39c) may be arranged in a strip shape so as to cover these openings. In this case, a portion formed in a region corresponding to one opening in the colored layer 39 constitutes one pixel piece 37. A large number of openings are formed on the other surface 30 b side of the glass substrate 2, and the colored layer 39 is formed so as to cover these large numbers of openings, so that a large number of pixel pieces 37 are formed and the pixel group 31 is formed. Will be formed.

  When the black matrix layer 38 is formed, the colored layer 39 is formed in a region partitioned by the black matrix in a lattice shape, and color mixing between the colored layers 39 can be suppressed.

  When the touch panel member 1 is formed by forming the pixel group 31, since the colored layer 39 that forms the pixel group 31 is provided, the glass substrate 2 is warped or distorted by the internal stress of the colored layer 39. Prone to occur. Then, in the touch panel member 1, when at least one insulating layer 4 is patterned as an integral layer, the insulating layer 4 formed as an integral layer is warped of the glass substrate 2. It is easier to peel off. As described above, to solve the problem of peeling of the insulating layer 4 when the area of the contact area 18 to the glass substrate satisfies the above-described conditions, the insulating layer 4 is formed as an integral layer as shown in FIG. The touch panel member 1 formed and forming the pixel group 31 brings about a contribution to solving a big problem.

  The touch panel 40 using the touch panel member 1 will be described.

[Touch panel 40]
As shown in FIG. 10, the touch panel 40 includes a panel screen 41 and is electrically connected to the panel screen 41 with a position detection device 42 that detects a coordinate position in a predetermined area in the panel screen 41. The panel screen 41 normally forms a scannable area 41a where the touch position can be detected.

  In FIG. 10, reference numeral 43 indicates a flexible printed circuit (FPC) that electrically connects the panel screen 41 and the position detection device 42. The FPC 43 is bonded to both the panel screen 41 and the position detection device 42. In the touch panel 40, the structure for electrically connecting the panel screen 41 and the position detection device 42 is not limited to the FPC, and may be a wiring.

  The panel screen 41 is formed by laminating a light-transmitting cover substrate 44 on the laminated structure 5 of the touch panel member 1. The cover substrate 44 can include a cover glass in addition to a resin plate.

  The resin plate that can be used as the cover substrate 44 is formed by, for example, forming a transparent resin such as an acrylic resin, an epoxy resin, a polyimide resin, a norbornene resin, an alkyd resin, a polyester resin, a polyether resin, or a polyethersulfone resin into a plate shape. It is obtained by.

  When the cover substrate 44 is a cover glass, it is particularly preferably a tempered glass in terms of strength. Examples of the tempered glass include gorilla glass (gorilla is a trademark) (manufactured by Corning), and dragon trail glass (dragon trail is a trademark) (manufactured by Asahi Glass).

  As the position detection device 42, a device including a known position detection mechanism can be used as appropriate. The position detection device 42 is electrically connected to the terminal 35 of the touch panel member 1 constituting the panel screen 41 and electrically detects the touch position in the position detection region R.

[Display device 50 with touch panel]
As shown in FIGS. 11A and 11B, the display device 50 with a touch panel includes a display panel 51 having a display surface 51a for displaying an image.

[Display panel 51]
As the display panel 51, a display panel capable of displaying visual information, such as a conventionally known liquid crystal panel for a liquid crystal display or an EL panel for an organic EL display, can be used as appropriate.

  Examples of the display surface 51a include a region forming a display screen such as a conventionally known liquid crystal panel or organic EL panel.

  In the display panel 51, a display module forming a display mechanism for displaying visual information such as an image on the display surface 51a is formed. Specific examples of the display module include a liquid crystal display module constituting a conventionally known liquid crystal panel and an organic EL display module constituting an organic EL panel.

  Specifically, in the display panel 51, the first panel substrate 52 and the second panel substrate 53 are bonded to each other via the sealing material 54, and the display is performed between the first panel substrate 52 and the second panel substrate 53. A medium 55 is provided, and a display surface 51 a is formed on the first panel substrate 52.

  Examples of the display medium 55 include liquid crystal and EL elements. For example, when the display medium 55 is a liquid crystal, the display medium 55 is a liquid crystal layer in which liquid crystal is sealed between the first panel substrate 52 and the second panel substrate 53. The liquid crystal alignment is controlled according to the voltage. Further, when the display medium 55 is an EL element, the EL element is disposed between the first panel substrate 52 and the second panel substrate 53.

[Advantages of using touch panel member 1]
The effectiveness of the touch panel member 1 is particularly enhanced when the display device with a touch panel 50 is an organic EL display.

  When the organic EL display is manufactured, the firing process of firing the structure in which the sealing material is applied between the first panel substrate 52 and the second panel substrate 53 is performed, so that the first sealing material is used. The panel substrate 52 and the second panel substrate 53 are bonded together. This firing step is usually performed under extremely high temperature conditions of about 400 ° C. In order to use a touch panel member for the first panel substrate 52, each component such as a transparent electrode layer constituting the touch panel member is required to withstand the firing process. Therefore, in an organic EL display, a layer made of a cured product of a photosensitive resin composition containing a photosensitive compound having a siloxane skeleton is particularly preferably used as the insulating layer of the touch panel member. However, the insulating layer is formed so as to cover at least a part of the transparent electrode layer, while the layer made of a cured product of the photosensitive resin composition containing the photosensitive compound having a siloxane skeleton is transparent. It cannot be said that the adhesion to the electrode layer is excellent. Thus, the problem of peeling of the insulating layer is very serious in an organic EL display incorporating a touch panel member. By the way, the insulating layer 4 is configured such that the area of the contact area 18 to the glass substrate is 1% or more and 15% or less of the area of the facing surface 14 in a plan view of the touch panel member 1. This suppresses the fear that the insulating layer 4 is peeled off from the transparent electrode layer 3. That is, the touch panel member 1 can solve the problem that is extremely serious when it is incorporated in an organic EL display.

  Next, the present invention will be described in more detail using examples.

(Touch panel member)
Example 1
(Preparation of substrate)
A glass substrate (non-alkali glass, manufactured by NH Techno Glass Co., Ltd., NA35) (length 550 mm × width 650 mm) is prepared as a base plate for the touch panel member, and a surfactant (deposited by Environmental Science Center Co., Ltd.) in ultrapure water. The surfactant was immersed in the solution to which L) was added, followed by washing with an ultrasonic washing treatment. In addition, by setting 50 touch panel forming areas for forming each layer such as a transparent electrode layer and an insulating layer constituting the touch panel member on the original plate, and setting so that 50 touch panel members are formed from the original plate. A multi-chamfer design was performed. After designing with multiple surfaces, each layer constituting the touch panel member was prepared as follows.

(Preparation of extraction electrode part)
The metal wiring 32 constituting the extraction electrode portion 30 was formed into a pattern as shown in FIG. 12 as follows. The metal wiring 32 has a terminal 35 formed at one end thereof. APC was used as the metal material, and APC was sputtered over the entire surface of the glass substrate, whereby a wiring forming metal film having a thickness of 30 nm was formed on the glass substrate surface. Next, a positive photosensitive material (manufactured by AZ Materials) is used as a positive resist material, a positive photosensitive material is applied on the surface of the metal film for wiring formation, and a predetermined pattern corresponding to the pattern of the metal wiring formation pattern Exposure and development were carried out using a photomask having formed thereon. Thus, a photosensitive layer was formed in a pattern in which the metal wiring formation pattern was combined with the terminals in a region outside the position detection region on the glass substrate surface, and a laminate was formed. The wiring forming metal film is exposed in the non-formed portion of the photosensitive layer. Furthermore, this laminated body was etched. A mixed solution of phosphoric acid, nitric acid and acetic acid was used as an etching solution. The exposed portion of the wiring forming metal film was removed by etching. Thereafter, the photosensitive layer was peeled off with caustic soda, and as shown in FIG. 12, the metal wiring 32 was patterned together with the terminals 35 to obtain a glass substrate with metal wiring. At this time, the metal wiring 32 is formed to the boundary position of the region R without entering the position detection region R. In FIG. 12, an area corresponding to one touch panel member is extracted and displayed from the substrate original plate designed for multiple imposition. The same applies to FIGS. 13, 15, 16, 18 and 20.

(Preparation of first transparent electrode layer)
A first transparent electrode layer 3a having a pattern as shown in FIGS. 13 and 14 was formed on the surface of the glass substrate with metal wiring as follows. FIG. 14 is a partial enlarged plan view schematically showing a part of the region SE1 in FIG. The first transparent electrode layer 3a was formed on the ground surface as follows, with the surface of the glass substrate surface with metal wiring on which the pattern of the metal wiring 32 was formed as the ground surface. ITO was used as a transparent conductive material constituting the first transparent electrode layer 3a, and ITO was sputtered on the entire surface of the glass substrate with metal wiring to form an ITO film having a thickness of 30 nm as the conductive film. Then, using the same positive photosensitive material as that used when preparing the extraction electrode part, the positive photosensitive material is applied on the ITO film, and a predetermined pattern corresponding to the pattern of the first transparent electrode layer is formed. The exposed photomask was used for exposure and development. Thereby, the photosensitive layer was formed in the predetermined pattern in the area | region inside the position detection area | region R on the glass substrate surface, and the laminated body was formed. The pattern of the photosensitive layer is formed into a pattern in which the first electrode pattern and the pattern obtained by removing the second connecting portion from the second electrode pattern are combined. The ITO film is exposed at the non-formed portion of the photosensitive layer. Furthermore, this laminated body was etched. An oxalic acid-based solution was used as an etching solution. The exposed portion of the ITO film was removed by etching. Thereafter, the photosensitive layer was peeled off with caustic soda, the first transparent electrode layer was patterned, and a first glass substrate with a transparent electrode layer was obtained.

  In the first glass substrate with a transparent electrode layer, the first transparent electrode layer 3a is a layer having a configuration as shown in FIGS. 13 and 14 as described above. In the first transparent electrode layer 3a, a plurality of rhombus-shaped electrode pads 11, 11 are arranged in a line in a predetermined direction (X direction) independently of each other, and at both end positions of the configuration in which the rhombus electrode pads are arranged in alignment, The first electrode unit pattern 9 has a pattern in which triangular electrode pads are further arranged and has a pattern in which adjacent electrode pads 11 and 11 are connected by a linear first connecting portion 12a. The first electrode pattern 7 is formed in a predetermined direction (Y direction) in which a large number of first electrode unit patterns 9 are arranged at intervals. Further, in the first transparent electrode layer 3a, a plurality of rhombus-shaped electrode pads 11, 11 are arranged in a line in a predetermined direction (Y direction) independently of each other, and further, the rhombus electrode pads are arranged at both end positions. The electrode pad rows in which triangular electrode pads are further arranged constitute a group of electrode pads arranged in a predetermined direction (X direction) at intervals. This formation pattern of the electrode pad group is a pattern constituting a part of the second electrode pattern 8, that is, corresponds to a pattern excluding the second connecting portion 12b from the second electrode pattern 8. The formation pattern of the electrode pad row corresponds to a pattern obtained by removing the formation pattern of the second connecting portion 12b from the second electrode unit pattern 10. A gap 13 is formed between the electrode pad 11 constituting the first electrode pattern 7 and the electrode pad 11 constituting the second electrode pattern. In FIG. 13, the description of the connecting portion 12 is omitted for convenience of explanation.

  For Example 1, the width W1 of the gap 13 was set to about 26 μm, and the width W2 of the first connecting portion 12a was set to about 26 μm. The individual electrode pads 11 were set to have a square shape with a side length W3 of about 5000 μm, and the two diagonal lines were arranged along the X and Y directions, respectively. However, the electrode pads arranged at both ends in the first electrode unit pattern are formed in a size corresponding to a triangle formed by dividing the electrode pad into two along one of the diagonal lines of the square electrode pad. The same applies to the second electrode unit pattern.

(Preparation of insulating layer)
On the surface of the first glass substrate with a transparent electrode layer, the first insulating layer 4a was patterned as the insulating layer 4 as shown in FIG. 15 as follows. This insulating layer was formed on the ground surface as follows, with the surface side of the first transparent electrode layer-attached glass substrate surface on which the pattern of the first transparent electrode layer was formed as the ground surface.

  In forming the insulating layer, first, a photosensitive siloxane resin capable of patterning was prepared as a photosensitive compound to prepare a photosensitive resin composition. Here, a radiation curable composition described in Japanese Patent No. 3821165 was prepared as a photosensitive resin composition. More specifically, the radiation curable composition is prepared as follows.

  In a solution obtained by dissolving 317.9 g of tetraethoxysilane and 247.9 g of methyltriethoxysilane in 1116.7 g of diethylene glycol dimethyl ether, 167.5 g of nitric acid prepared to 0.644% by weight was dropped over 30 minutes with stirring. To prepare a reaction solution. After completion of the dropwise addition, the reaction solution is reacted for 3 hours, and then ethanol and a part of diethylene glycol dimethyl ether generated in a warm bath are distilled off under reduced pressure to obtain 1077.0 g of a polysiloxane solution.

  525.1 g of the polysiloxane solution was taken, and 53.0 g of diethylene glycol dimethyl ether and tetramethylammonium nitrate aqueous solution (pH 3.6) prepared to 2.38 wt% and 3.0 g of water were added to the solution. The polysiloxane solution for radiation curable composition is obtained by stirring and dissolving at 25 ° C. for 30 minutes. In addition, it is 830 when the weight average molecular weight of polysiloxane is measured by GPC method (eluent: tetrahydrofuran (THF), measurement temperature: 23 ° C., flow rate: 1.75 mL / min, measurement time: 45 minutes). This polysiloxane is a compound corresponding to the photosensitive compound. Tramethylammonium nitrate is preferably added as a curing accelerator different from the sol-gel reaction catalyst such as the photoacid generator described above.

  A radiation curable composition was prepared by blending 10.093 g of a polysiloxane solution for a radiation curable composition with 0.193 g of a photoacid generator (PAI-1001, manufactured by Midori Chemical Co., Ltd.) as a sol-gel reaction catalyst. . In addition, the usage-amount of the siloxane component used as a photosensitive compound is 15 weight% with respect to the radiation-curable composition total amount, and the usage-amount of a photo-acid generator component is 1.9 weight with respect to a radiation-curable composition total amount. The amount of the curing accelerator component used was 0.075% by weight based on the total amount of the radiation curable composition.

  The photosensitive resin composition was applied onto the lower ground of the glass substrate with the first transparent electrode layer to form a coating film. The coating film was partially formed directly on the first transparent electrode layer surface. A part is formed directly on the glass substrate surface. A spin coating method was used as the coating method. The glass substrate on which the coating film is formed is placed in a vacuum drying apparatus, and the solvent in the coating film is partially removed by reducing the pressure in the vacuum drying apparatus to 27 Pa, and heated (prebaked) on a hot plate. Thus, the solvent component was completely removed to make the coating film a dry film. At this time, the heating conditions were a heating temperature of 90 ° C. and a heating time of 45 seconds. The solvent is diethylene glycol dimethyl ether and water.

After the glass substrate on which the dry film is formed is cooled to room temperature, a photomask having a predetermined pattern corresponding to the formation pattern of the insulating layer is used, and the photomask is applied to a predetermined position on the dry film, and the proxy aligner is used. Light irradiation toward the dry film was performed using an ultraviolet light having a wavelength of 365 nm at an exposure amount of 200 mJ / cm ² .

  As shown in FIG. 15, the formation pattern of the insulating layer 4 (4a) is a hole at a predetermined position facing the electrode pad 11 portion of the second electrode pattern 8 in the predetermined first transparent electrode layer 3a. The pattern forms the part 15. When the second transparent electrode layer 3b is formed later, the transparent conductive material constituting the second transparent electrode layer 3b also enters the hole 15, and the second transparent electrode layer 3b and the first transparent electrode While forming a contact part with the layer 3a, the 2nd connection part 12b which comprises the 2nd electrode pattern 8 is formed.

  The mask pattern of the photomask is formed into a pattern that takes into account the formation pattern of the insulating layer 4 as described above, that is, the portion corresponding to the formation pattern of the hole 15 of the insulating layer 4 is shielded from light transmission. It is formed by setting it as the light shielding part.

  Now, after the dry film was subjected to light irradiation treatment and the progress of the sol-gel reaction was recognized in the film, the dry film was developed. Tetramethylammonium hydroxide 2.38 wt% (TMAH, manufactured by Tokyo Ohka Kogyo Co., Ltd .: NMD-3) is used as the developer, and a dip developing method in which the glass substrate is immersed in the developer is used as the developing method. It was. Thereby, the unexposed part of the dry film was removed, and a patterned film in which a pattern corresponding to the formation pattern of the insulating layer was formed was obtained. Further, the glass substrate on which the patterned film was formed was heated (post-baked) in a heating furnace (FUW210PA, manufactured by Advantest). At this time, with respect to the heating conditions, the heating temperature was 500 ° C. and the heating time was 1 hour in an air atmosphere. By heating in this heating furnace, the polycondensation reaction of the photosensitive compound contained in the patterned film further proceeds to form a cured product having a crosslinked structure, and the patterned film is further cured. Make a layer.

  In this way, the insulating layer 4 patterned into a pattern having the hole 15 as shown in FIG. 15 was formed on the surface on which the first transparent electrode layer 3a was formed, and a glass substrate with an insulating layer was obtained. The prepared insulating layer 4 has a thickness of 1.5 μm, and the shape of each hole 15 is a plane having a side length WH of about 50 μm as shown in FIG. It was formed in a square shape. FIG. 17 is a partial enlarged plan view schematically showing a part of a region SE2 in FIG. 16 to be described later. Further, 168 holes 15 were formed in one position detection region R.

(Preparation of second transparent electrode layer)
The second transparent electrode layer 3b was patterned on the surface of the glass substrate with an insulating layer as follows. The 2nd transparent electrode layer 3b was formed on the base surface by making the surface side in which the insulating layer 4 was formed among the glass substrate surfaces with an insulating layer into a base surface. A point where an ITO film was formed on the surface of the glass substrate with an insulating layer, a point where the thickness of the ITO film was 50 nm, and a photomask having a pattern corresponding to the formation pattern of the second transparent electrode layer 3b were used. Except for the point, the second transparent electrode layer was formed by patterning the ITO film into a predetermined pattern using the same process as the preparation of the first transparent electrode layer. The formation pattern of the 2nd transparent electrode layer is a pattern corresponding to the formation pattern of the 2nd connection part 12b as shown in FIG. 16, FIG. Each of the second connecting portions 12b is connected to the electrode pad 11 of the first transparent electrode layer 3a through the hole 15, and is configured to connect the adjacent electrode pads 11 to each other. Thus, a second glass substrate with a transparent electrode layer is formed.

  By forming the pattern of the first transparent electrode layer 3a and the second transparent electrode layer 3b, the transparent electrode portion 20 having the first electrode portion 22 and the second electrode portion 24 is formed. In this embodiment, the first electrode portion 22 is constituted by a portion corresponding to the first electrode pattern 7 in the first transparent electrode layer 3a. The 2nd electrode part 24 is comprised by the part corresponding to the pattern except the pattern of the 2nd connection part 12b from the 2nd electrode pattern 10 in the 1st transparent electrode layer 3a, and the 2nd transparent electrode layer 3b. Is done. Each of the second connecting portions 12b is formed in a U-shape, bent at two locations, and advanced to the space portion of the hole 15 toward the end of the second connecting portion 12b. The two advancing portions 12b1 and 12b1 are formed in contact with the first transparent electrode layer 3a, and the connecting portion 12b2 that connects the two advancing portions 12b1 and 12b1 is formed. As shown in FIG. 17, the connecting portion 12b2 of the second connecting portion 12b is formed in a linear shape having a width W5 of about 26 μm. However, both ends connected to the advancing portions 12b1 and 12b1 are long on one side. It is formed in a square shape in plan view with a length W4 of about 70 μm.

(Preparation of second insulating layer)
A second insulating layer 4b was formed in a pattern as shown in FIG. 20 on the surface of the second glass substrate with a transparent electrode layer as shown below. The 2nd insulating layer 4b was formed on the base surface by making into a base surface the surface side in which the 2nd transparent electrode layer was formed among the glass substrate surfaces with a 2nd transparent electrode layer. Except for the point that the coating film was formed on the surface of the glass substrate with the second transparent electrode layer and that the pattern corresponding to the formation pattern of the second insulating layer 4b was formed as the photomask, the first The second insulating layer 4b was formed by using the same process as the preparation of the insulating layer 4a to form a cured film obtained by patterning the coating film into a predetermined pattern. As shown in FIG. 20, the formation pattern of the 2nd insulating layer 4b is a pattern which covers the whole area | region except the area in which the terminal 35 was formed on the 2nd glass substrate surface with a transparent electrode layer. Therefore, the second insulating layer 4b is formed so as to cover the formation regions of both the first transparent electrode layer 3a and the second transparent electrode layer 3b, and can function as a surface protective layer. Make. Note that the second insulating layer had a thickness of 1.5 μm.

  The extraction electrode part, the transparent electrode layer, and the insulating layer described above were formed for each of the 50 touch panel formation areas. And the separation for every area for touch panel formation was performed, and the touch panel member was prepared. 50 touch panel members were prepared. One was arbitrarily selected from these, and the touch panel member of Example 1 was obtained.

(Measurement of area of facing surface area and area of glass substrate contact area)
The first insulating layer 4a is in contact with both the first transparent electrode layer 3a and the glass substrate 2 in the position detection region R, and faces the surface region 17, the transparent electrode layer contact region 16, and the pair. The glass substrate contact area 18 is a defined layer. The area of each of these regions was measured for the first insulating layer 4a. First, the area of the position detection region R of the obtained touch panel member was about 4243 mm ² . Here, since the total area of the formation region of the hole 15 in the position detection region R of the touch panel member 1 of Example 1 is calculated to be about 0.4 mm ² , the first in the position detection region R is calculated. The area of the region 17 on the facing surface corresponding to the area of the insulating layer 4 substantially coincides with the area of the position detection region R, and was calculated to be about 4243 mm ² . In addition, the area of the contact region 18 for the glass substrate, which is the region of the first insulating layer in contact with the glass substrate 2 in the position detection region, was 43 mm ² (area ratio 1%). Here, the area ratio indicates the ratio (%) of the area of the glass substrate contact area 18 to the area of the area 17 of the facing surface. The fact that the area of the facing surface region 17 is substantially the same as the area of the position detection region R is the same in the second and third examples and the first and second comparative examples. This is due to the fact that Examples 1, 2, 3 and Comparative Example 1.2 have the same size and number of holes 15 as described later.

  Measurement of each area such as the area of the position detection region and the area of the contact area with the glass substrate was performed as follows. That is, an image in a state where the touch panel member is viewed in plan is taken with a digital camera, and image data regarding the plan view image of the touch panel member is obtained. The image data was input to an image processing system (manufactured by Nireco Corporation: LUZEX AP), and based on the image processing of the image data, the position detection area and the contact area with the glass substrate were measured. Further, the area of the facing surface was also measured based on the image processing of the image data, and coincided with the calculated value.

(Adhesion evaluation of insulating layer in touch panel member)
Using the prepared touch panel member, the adhesion strength of the insulating layer in the touch panel member was evaluated according to the following evaluations 1 and 2. In the evaluation 1, the physical strength of the adhesion is examined, and in the evaluation 2, the durability of the adhesion is examined.

(Evaluation 1)
Evaluation 1 was implemented by evaluating adhesiveness based on the result of a tape peeling test. In the tape peeling test, an adhesive tape (cellophane tape No. 29 (width 15 mm × length 70 mm) manufactured by Nitto Denko Corporation) is pasted on the second insulating layer 4b formed on the surface of the touch panel member, and the adhesive tape is attached. Peel off perpendicularly to the surface of the touch panel member. At this time, a rectangular area of 1 cm in length and 1 cm in width is selected as an evaluation area at the center in the width and length directions of the peeled portion formed by peeling the adhesive tape on the touch panel member, and the rectangle The state of the area was visually confirmed, and the adhesion was evaluated as follows according to the confirmed state.

No peeling of the insulating layer is observed in the rectangular area ... ○ (Good adhesion)
Peeling of the insulating layer is observed in the rectangular area, but the peeled area remains less than 10% of the rectangular area ... △ (Adhesion is normal)
Peeling of the insulating layer is observed in the rectangular area, and the peeled area reaches 10% or more of the rectangular area.

  About the touchscreen member of Example 1, the result of evaluation 1 was evaluated as (circle) (adhesion is favorable).

  In the evaluation 1, the adhesive tape is attached to the second insulating layer 4b. However, the second insulating layer 4b is partially in contact with the first insulating layer 4a, and the first insulating layer 4b Since the adhesiveness between the insulating layer 4a and the second insulating layer 4b is much larger than the adhesiveness between the first insulating layer 4a and the first transparent electrode layer 3a, an adhesive tape is attached to the second insulating layer 4b. Even if attached, the adhesiveness between the first insulating layer 4a and the first transparent electrode layer 3b can be evaluated. That is, when the adhesive tape is peeled off, if the adhesion between the first insulating layer 4a and the first transparent electrode layer 3a is physically weak, the first insulating layer 4a and the second insulating layer 4b are combined together. If the adhesiveness between the first insulating layer 4a and the first transparent electrode layer 3a is physically strong, when the adhesive tape is peeled off, the first insulating layer 4a and the second insulating layer are peeled off. 4b is difficult to peel off.

(Evaluation 2)
Evaluation 2 was carried out by evaluating adhesion based on the result of the pressure cooker test. In the pressure cooker test, the touch panel member was exposed to a pressure of 2 atm, a temperature of 121 ° C. and a humidity of 95% for 50 hours, and then the state of the insulating layer was visually confirmed, and depending on the confirmed state, adhesion was as follows. Sex was evaluated.

No change in the insulation layer ・ ・ ・ ○ (Good adhesion maintenance)
Insulation layer can be lifted △△ (Normal adhesion maintenance)
Insulation layer is peeled off ・ ・ ・ × (Adhesion maintenance power is very weak)

  Note that when the insulating layer is lifted, it means that a gap is partially formed between the substrate and the insulating layer film, but remains on the substrate without peeling off. The case where peeling off is observed indicates a state where at least a part of the insulating layer is peeled off from the substrate.

  About the touchscreen member of Example 1, the result of evaluation 2 was evaluated as (circle) (adhesion is favorable).

Examples 2 and 3
For Examples 2 and 3, the photomasks used for the preparation of the transparent electrode layer and the insulating layer in Example 1 correspond to the formation patterns of the transparent electrode layer and the insulating layer of the touch panel member of Examples 2 and 3, respectively. The touch panel member of Example 2 and 3 was produced by performing the same process as Example 1 except having changed into.

  About the touch panel member of Example 2, the formation pattern of a transparent electrode layer and an insulating layer is as follows. First, regarding the pattern of the transparent electrode layer, as for the formation pattern of the first transparent electrode layer, the number of electrode pads 11 formed and the pattern of the external shape are the same patterns as in the first embodiment. Further, the width W1 of the gap 13 is set to about 220 μm, and the width W2 of the first connecting portion 12a is set to about 26 μm. Each rectangular electrode pad 11 disposed between the triangular electrode pads has a square shape with a side length W3 of about 5000 μm, and its two diagonal lines are along the X and Y directions, respectively. It was set to be a placement.

  About the formation pattern of the 2nd transparent electrode layer, the pattern of the 2nd connection part 12b is a pattern which has the connection part 12b2 and the advancing part 12b1, 12b1 similarly to Example 1. FIG. The connecting portion 12b2 of the second connecting portion 12b is formed in a linear shape having a width W5 of about 26 μm, and the both end portions connected to the advancing portions 12b1 and 12b1 have a square shape in plan view with a side length W4 of about 70 μm. It is formed.

  Regarding the pattern of the insulating layer 4, the number of holes 15 formed and the pattern of the outer shape of the formation pattern of the first insulating layer 4 a were set to the same patterns as in Example 1. The shape of each hole 15 was formed in a square shape in plan view with a side length WH of about 50 μm. The formation pattern of the second insulating layer 4b is the same as that of the first embodiment.

  About the touch panel member of Example 3, the formation pattern of the transparent electrode layer and the insulating layer was formed in the same pattern as the touch panel member of Example 2, except that the width W1 of the gap 13 was set to about 424 μm. Specifically, the width W2 of the first connecting portion 12a, the length W3 of one side of each square electrode pad 11, the width W5 of the connecting portion 12b2 and the advancing portions 12b1 and 12b1 with respect to the second connecting portion 12b. The values of the length W4 on one side of both end portions to be connected and the length WH of one side WH formed in a square shape in plan view were set to the same values as those of the touch panel member of Example 2.

  Using the touch panel members of Examples 2 and 3, the area of the facing area 17 and the area of the glass substrate contact area 18 were measured in the same manner as in Example 1, and evaluated in the same manner as in Example 1. 1 and 2, the adhesion of the insulating layer in the touch panel member was evaluated.

(Measurement of area of facing surface and area of contact area with glass substrate)
The area of the position detection region R of the touch panel member obtained in Example 2 was 4578 mm ² . In addition, the area of the facing surface region 17 substantially coincides with the area of the position detection region R, and was calculated to be 4578 mm ² . In addition, the area of the contact region 18 for the glass substrate, which is the region of the first insulating layer in contact with the glass substrate in the position detection region R, was 378 mm ² (area ratio: 8.3%). .

The area of the position detection region R of the touch panel member obtained in Example 3 was 4943 mm ² . In addition, the area of the facing surface region 17 substantially coincides with the area of the position detection region R, and was calculated to be 4943 mm ² . Moreover, about the area | region 18 for glass substrate contact, the area was 743 mm < ² > (area ratio 15%).

(Adhesion evaluation of insulating layer in touch panel member)
Using the touch panel members of Examples 2 and 3, Evaluations 1 and 2 were performed in the same manner as Example 1. As a result, the touch panel members of Examples 2 and 3 were both good for both Evaluation 1 and Evaluation 2.

Example 4
(Preparation of substrate)
As in Example 1, a glass substrate (non-alkali glass, manufactured by NH Techno Glass, NA35) (length 550 mm × width 650 mm) was prepared as a base plate for the touch panel member, and this was subjected to a surfactant treatment. Washed by ultrasonic washing treatment. Further, similarly to Example 1, 50 touch panel formation areas were set, and multi-panel setting was performed so that 50 touch panel members were formed from the original plate.

(Preparation of extraction electrode part and first connecting part)
The pattern of the metal wiring 32 constituting the extraction electrode part 30 and the pattern of the first connection part 59 constituting the connection part 12 are formed on the surface of the glass substrate 2 as follows in a pattern as shown in FIG. A pattern was formed. Here, the metal wiring 32 forms a terminal 35 at one end thereof. As the conductive metal layer 57 constituting the first connecting portion 59, the same material as that of the metal wiring 32 was used. That is, the pattern which combined the pattern of the metal wiring 32 and the pattern of the 1st connection part 59 which makes the connection part 12 was formed with the same material. Specifically, APC is used as the metal material constituting the metal wiring 32, the terminal 35, and the first connecting portion 59, and APC is sputtered on the entire surface of the glass substrate, thereby forming a wiring forming metal film having a thickness of 30 nm. did. Thereafter, the extraction electrode part 30 of Example 1 is used except that a photomask having a predetermined pattern corresponding to the pattern obtained by combining the metal wiring 32 having the terminal 35 at one end and the pattern of the first connection part 59 is used. As shown in FIG. 18, the metal wiring 32 and the first connecting portion 59 were patterned together with the terminals 35 to obtain a glass substrate with metal wiring, as shown in FIG. As shown in FIG. 19, each of the first connecting portions 59 is formed in a linear shape having a width W6 of 10 μm and a predetermined length. In the formation pattern of the first connecting portions 59, a large number of the first connecting portions 59 are arranged in the position detection region R at predetermined intervals in the vertical and horizontal directions (X direction and Y direction in FIG. 19). It is a pattern formed. FIG. 19 is a partially enlarged schematic plan view schematically showing a part corresponding to the part of region SE1 in FIG. 13 in a state in which a transparent insulating layer described later is formed in forming the touch panel member of Example 4.

(Preparation of the first insulating layer)
On the glass substrate surface with metal wiring, the 1st insulating layer 4a as the insulating layer 4 was pattern-formed as follows. The insulating layer 4 is formed on the ground surface as follows, with the surface of the glass substrate surface with the metal wiring on which the pattern of the metal wiring 32, the terminal 35 and the first connecting portion 59 is formed as the ground surface. It was done.

  In forming the insulating layer, a photosensitive resin composition was prepared in the same manner as in Example 1.

  The photosensitive resin composition was applied on the base surface in the same manner as in Example 1 to form a coating film. Thereafter, the same process as in Example 1 was performed except that a photomask having a pattern corresponding to the formation pattern of the insulating layer 4 as shown below was used, so that the insulating layer 4 was patterned as shown in FIG. As a result, a glass substrate with an insulating layer was obtained.

  As shown in FIGS. 18 and 19, the formation pattern of the first insulating layer 4a partially covers each of the first connecting portions 59 at a predetermined position facing the portion of the first connecting portion 59. It is a pattern to be performed, and is an enclave-like pattern. A portion corresponding to one section of the enclave-like pattern constituting the insulating layer 4 is formed in a linear shape having a width W7 of 20 μm. At this time, each of the first connecting portions 59 is covered with the first insulating layer 4a except for both ends in the longitudinal direction.

  The mask pattern of the photomask is formed in a pattern that takes into account the formation pattern of the first insulating layer 4 as described above, that is, the portion corresponding to the region where the insulating layer is formed can transmit light. It is formed by making it an opening.

(Preparation of transparent electrode layer)
The transparent electrode layer 3 was patterned on the surface of the glass substrate with an insulating layer as follows. The transparent electrode layer 3 was formed on the base surface of the glass substrate surface with an insulating layer, with the surface side on which the insulating layer was formed as the base surface. Except for the point that the ITO film was formed on the surface of the glass substrate with an insulating layer and the use of a photomask formed with a pattern corresponding to the formation pattern of the transparent electrode layer of Example 4, the first example of Example 1 was used. The transparent electrode layer was formed by patterning the ITO film into a predetermined pattern using the same process as the preparation of the transparent electrode layer 1 to obtain a glass substrate with a transparent electrode layer.

  The transparent electrode layer 3 is a layer having a configuration as shown in FIG. 19 and has an appearance as shown in FIG. 13 when one touch panel member is viewed in plan. In the transparent electrode layer 3, a plurality of diamond-shaped electrode pads 11, 11 are arranged in a row in a predetermined direction (X direction) independently of each other, and at the both end positions of the configuration in which the diamond-shaped electrode pads are aligned and arranged, A plurality of electrode pad rows in which electrode pads are further arranged are arranged in a predetermined direction (Y direction) at intervals to form a first electrode pad group. The formation pattern of the first electrode pad group corresponds to a pattern excluding the formation pattern of the first connecting portion 59 from the first electrode pattern 58. Further, in the transparent electrode layer 3, a plurality of diamond-shaped electrode pads 11, 11 are arranged in a row in a predetermined direction (Y direction) independently of each other, and at both end positions of the arrangement in which the diamond-shaped electrode pads are arranged in an array, A second electrode pad group is formed by arranging a plurality of electrode pad rows in which a plurality of electrode pads are arranged at intervals in a predetermined direction (X direction). Further, in the transparent electrode layer 3, the linear second connecting portions 28 that form the connecting portions 12 are formed in a pattern, and in each electrode pad row in the second electrode pad group, adjacent electrode pads are connected to each other. Two connecting portions 28 are connected. A pattern obtained by combining the formation pattern of the second electrode pad group and the second connecting portion 28 corresponds to the second electrode pattern 60.

  The size of each electrode pad 11 was set to be a square with a side length W3 of 5000 μm, and the two diagonal lines arranged along the X and Y directions, respectively. In the first electrode unit pattern, the size of the electrode pads disposed at both ends is a size corresponding to a triangle formed by dividing the electrode pad into two along one of the diagonal lines of the square electrode pad. Yes. The same applies to the second electrode unit pattern.

  Moreover, about the size of the 2nd connection part 28, width W8 was formed in the linear form of 26 micrometers.

  By forming the pattern of the first connecting portion 59 and the transparent electrode layer 3, the transparent electrode portion 20 having the first electrode portion 22 and the second electrode portion 24 is formed as shown in FIG. The first electrode portion 22 includes a first connection portion 59 and a portion corresponding to the first electrode pad group in the transparent electrode layer 3. The second electrode portion 24 is configured by a portion corresponding to the second electrode pattern 60 in the transparent electrode layer 3.

(Preparation of second insulating layer)
A second insulating layer was patterned on the surface of the glass substrate with a transparent electrode layer as follows. The 2nd insulating layer was formed on the base surface by making the surface side in which the transparent electrode layer was formed among the glass substrate surfaces with a transparent electrode layer into a base surface. Example other than the point that the coating film was formed on the glass substrate surface with the transparent electrode layer, and the one that formed the pattern corresponding to the formation pattern of the second insulating layer of Example 4 as the photomask. The second insulating layer of Example 4 was formed using the same process as the preparation of the first second insulating layer. The formation pattern of the second insulating layer 4b in Example 4 is the same pattern as the second insulating layer 4b formed in Example 1, that is, covers the transparent electrode layer 3 as shown in FIG. This pattern is a layer that can function as a surface protective layer. Note that the second insulating layer had a thickness of 1.5 μm.

  The extraction electrode part, the transparent electrode layer, and the insulating layer described above were formed for each of the 50 touch panel formation areas. And the separation for every area for touch panel formation was performed, and the touch panel member was prepared. 50 touch panel members were prepared. One was arbitrarily selected from these, and the touch panel member of Example 4 was obtained.

(Measurement of area of facing surface and area of contact area with glass substrate)
In the touch panel member of Example 4, the second insulating layer 4b is in contact with both the transparent electrode layer 3 and the glass substrate 2 in the position detection region R, and this is the region 17 of the facing surface, the transparent electrode The layer contact area 16 and the glass substrate contact area 18 correspond to the defined layers. The area of each of these regions was measured for the second insulating layer 4b. First, the area of the position detection region R of the obtained touch panel member was 4244 mm ² . The area 17 of the facing surface corresponding to the area of the second insulating layer 4b in the position detection region R was 4244 mm ² . In addition, the area of the contact region 18 to the glass substrate, which is a portion of the second insulating layer 4b in contact with the glass substrate 2 in the position detection region R, was 44 mm ² (area ratio 1%). . In addition, the measurement of each area, such as the area of the position detection region R, the area 17 of the facing surface, the area of the contact area 18 with respect to the glass substrate, was performed by image analysis of image data in the same manner as in Example 1.

(Adhesion evaluation of insulating layer in touch panel member)
Using the touch panel member of Example 4, evaluations 1 and 2 were performed in the same manner as in Example 1. As a result, the touch panel member of Example 4 was “good” in both Evaluation 1 and Evaluation 2.

Examples 5 and 6
For Examples 5 and 6, the photomasks used for the preparation of the transparent electrode layer and the insulating layer in Example 4 were used as the first connection part 59, the transparent electrode layer 3 and the insulating layer of the touch panel member of Examples 5 and 6, respectively. Except having changed into the thing corresponding to the formation pattern of 4, the process similar to Example 4 was implemented and the touch-panel member of Examples 5 and 6 was produced.

  Regarding the touch panel member of Example 5, the formation pattern of the first connecting portion 59, the transparent electrode layer 3, and the insulating layer 4 is as follows. The first connecting portions 59 are formed in the same pattern as in the fourth embodiment with respect to the number and positions of the first connecting portions 59. The individual first connecting portions 59 are formed in a linear shape having a width W6 of 10 μm.

  Regarding the pattern of the transparent electrode layer 3, the number of electrode pads 11 formed and the pattern of the external shape are the same as those in Example 4. In addition, the width W1 of the gap 13 is set to about 220 μm, and the width W8 of the second connection portion 28 is set to about 26 μm. Each rectangular electrode pad 11 disposed between the triangular electrode pads has a square shape with a side length W3 of about 5000 μm, and its two diagonal lines are along the X and Y directions, respectively. It was set to be a placement.

  About the formation pattern of the 1st insulating layer 4a, the pattern which forms in an enclave shape and covers each 1st connection part 59 partially is the same as that of Example 4. FIG. About one division formed in the enclave shape which comprises the 1st insulating layer 4a, width W7 is formed in the linear form about 20 micrometers. The formation pattern of the second insulating layer 4b is the same as that of Example 4.

  About the touch panel member of Example 6, the formation pattern of the transparent electrode layer and the insulating layer was formed in the same pattern as the touch panel member of Example 5 except that the width W1 of the gap 13 was set to about 425 μm. Specifically, each of the square electrode pads 11 has a length W3 of one side, a width W6 of the first connecting portion 59, a width W8 of the second connecting portion 28, and an enclave that forms an insulating layer. About each value of width W7 about one formed linear section, it was set as the same value as the touch panel member of Example 5.

  Using the touch panel members of Examples 5 and 6, the area of the facing surface and the area of the contact area with the glass substrate were measured in the same manner as in Example 4, and the evaluation 1, as in Examples 1 and 4 2 was used to evaluate the adhesion of the insulating layer in the touch panel member.

(Measurement of area of facing surface and area of contact area with glass substrate)
The area of the position detection region R of the touch panel member obtained in Example 5 was 4578 mm ² . The area of the facing region 17 corresponding to the area of the second insulating layer 4b in the position detection region R was 4578 mm ² . Further, in the position detection region R, the area of the contact region 18 to the glass substrate that is a portion of the second insulating layer 4b that is in contact with the glass substrate 2 is 376 mm ² (area ratio: 8.3%). there were.

The area of the position detection region of the touch panel member obtained in Example 6 was 4944 mm ² . The area of the facing surface corresponding to the area of the second insulating layer 4b in the position detection region was 4944 mm ² . In addition, the area of the contact region with respect to the glass substrate, which is the region of the second insulating layer in contact with the glass substrate in the position detection region, was 742 mm ² (area ratio 15%).

(Adhesion evaluation of insulating layer in touch panel member)
Evaluations 1 and 2 were performed in the same manner as in Example 1 using the touch panel members of Examples 5 and 6. As a result, the touch panel members of Examples 5 and 6 were both good for both Evaluation 1 and Evaluation 2.

Comparative Examples 1 and 2
For Comparative Examples 1 and 2, the photomask used in the preparation of the transparent electrode layer and the insulating layer in Example 1 corresponds to the formation pattern of the transparent electrode layer and the insulating layer of the touch panel member of Comparative Examples 1 and 2, respectively. Except having changed, the same process as Example 1 was implemented and the touch panel member of Comparative Examples 1 and 2 was produced.

  Regarding the touch panel member of Comparative Example 1, the formation pattern of the transparent electrode layer and the insulating layer is as follows. First, regarding the pattern of the transparent electrode layer, as for the formation pattern of the first transparent electrode layer, the number of electrode pads 11 formed and the pattern of the external shape are the same patterns as in the first embodiment. Further, the width W1 of the gap 13 is set to about 10 μm, and the width W2 of the first connecting portion 12a is set to about 10 μm. Each rectangular electrode pad 11 disposed between the triangular electrode pads has a square shape with a side length W3 of about 5000 μm, and its two diagonal lines are along the X and Y directions, respectively. It was set to be a placement.

  About the formation pattern of the 2nd transparent electrode layer, it is a pattern of the 2nd connection part 12b, and this pattern is a pattern which has the connection part 12b2 and the advancing part 12b1 and 12b1 similarly to Example 1. FIG. The connecting portion 12b2 of the second connecting portion 12b is formed in a linear shape having a width W5 of about 26 μm, and the both end portions connected to the advancing portions 12b1 and 12b1 have a square shape in plan view with a side length W4 of about 70 μm. It is formed.

  Regarding the pattern of the insulating layer 4, the number of holes 15 formed and the pattern of the outer shape of the formation pattern of the first insulating layer 4 a were set to the same patterns as in Example 1. The shape of each hole 15 was formed in a square shape in plan view with a side length WH of about 50 μm. The formation pattern of the second insulating layer 4b is the same as that of the first embodiment.

  About the touch panel member of Comparative Example 2, the formation pattern of the transparent electrode layer and the insulating layer is such that the width W1 of the gap 13 is set to about 425 μm and the width W2 of the first connection portion 12a is set to about 26 μm. It was formed in the same pattern as the touch panel member of Comparative Example 1. Specifically, the length W3 of one side of each square electrode pad 11, the width W5 of the connecting portion 12b2 with respect to the second connecting portion 12b, and the length W4 of one side with respect to both end portions connected to the advanced portions 12b1 and 12b1. Each value of the length WH of one side of the hole 15 formed in a square shape in plan view was set to the same value as that of the touch panel member of Example 2.

  Using the touch panel members of Comparative Examples 1 and 2, the area of the facing surface area 17 and the area of the glass substrate contact area 18 were measured in the same manner as in Example 1, and evaluated in the same manner as in Example 1. 1 and 2, the adhesion of the insulating layer in the touch panel member was evaluated.

(Measurement of area of facing surface and area of contact area with glass substrate)
The area of the position detection region of the touch panel member obtained in Comparative Example 1 was 4217 mm ² . Further, the area of the facing surface substantially coincided with the area of the position detection region, and was calculated to be 4217 mm ² . In addition, the area of the contact region with respect to the glass substrate, which is the region of the first insulating layer in contact with the glass substrate in the position detection region, was 17 mm ² (area ratio 0.4%).

The area of the position detection region of the touch panel member obtained in Comparative Example 2 was 5008 mm ² . Further, the area of the facing surface substantially coincided with the area of the position detection region, and was calculated to be 5008 mm ² . In addition, the area of the contact region for the glass substrate, which is the region of the first insulating layer in contact with the glass substrate in the position detection region, was 808 mm ² (area ratio 16.1%).

(Adhesion evaluation of insulating layer in touch panel member)
Evaluations 1 and 2 were performed in the same manner as in Example 1 using the touch panel members of Comparative Examples 1 and 2, respectively. As a result, the touch panel member of Comparative Example 1 was x for both Evaluation 1 and Evaluation 2. The touch panel member of Comparative Example 2 was Δ for both Evaluation 1 and Evaluation 2.

Comparative Examples 3 and 4
For Comparative Examples 3 and 4, the photomasks used in the preparation of the transparent electrode layer and the insulating layer in Example 4 were used as the first connection part 59, the transparent electrode layer 3 and the insulating layer of the touch panel member of Comparative Examples 3 and 4, respectively. Except having changed into the thing corresponding to the formation pattern of 4, the process similar to Example 4 was implemented and the touch-panel member of the comparative examples 3 and 4 was produced.

  Regarding the touch panel member of Comparative Example 3, the formation pattern of the first connecting portion 59, the transparent electrode layer 3, and the insulating layer 4 is as follows. The first connecting portions 59 are formed in the same pattern as in the fourth embodiment with respect to the number and positions of the first connecting portions 59. The individual first connecting portions 59 are formed in a linear shape having a width W6 of 10 μm.

  Regarding the pattern of the transparent electrode layer 3, the number of electrode pads 11 formed and the pattern of the external shape are the same as those in Example 4. The width W1 of the gap 13 is set to about 10 μm, and the width W8 of the second connection portion 28 is set to about 26 μm. Each rectangular electrode pad 11 disposed between the triangular electrode pads has a square shape with a side length W3 of about 5000 μm, and its two diagonal lines are along the X and Y directions, respectively. It was set to be a placement.

  About the formation pattern of the 1st insulating layer, the pattern which forms in an enclave shape and covers each 1st connection part 59 partially is the same as that of Example 4. FIG. About one division formed in the enclave shape which comprises a 1st insulating layer, width W7 is formed in the linear form about 20 micrometers. The formation pattern of the second insulating layer 4b is the same as that of Example 4.

  About the touch panel member of the comparative example 4, the formation pattern of the transparent electrode layer and the insulating layer was formed in the same pattern as the touch panel member of the comparative example 3 except that the width W1 of the gap 13 was set to about 460 μm. Specifically, each of the square electrode pads 11 has a length W3 of one side, a width W6 of the first connecting portion 59, a width W8 of the second connecting portion 28, and an enclave that forms an insulating layer. Each value of the width W7 for the formed linear section was set to the same value as that of the touch panel member of Comparative Example 4.

  Using the touch panel members of Comparative Examples 3 and 4, the area of the facing surface and the area of the contact area with the glass substrate were measured in the same manner as in Example 4 and evaluated in the same manner as in Examples 1 and 4. , 2 was used to evaluate the adhesion of the insulating layer in the touch panel member.

(Measurement of area of facing surface and area of contact area with glass substrate)
The area of the position detection region of the touch panel member obtained in Comparative Example 3 was 4217 mm ² . The area of the facing surface corresponding to the area of the second insulating layer in the position detection region was 4217 mm ² . In addition, the area of the contact region with respect to the glass substrate, which is a portion of the second insulating layer in contact with the glass substrate in the position detection region, was 17 mm ² (area ratio 0.4%).

The area of the position detection region of the touch panel member obtained in Comparative Example 4 was 5008 mm ² . The area of the facing surface corresponding to the area of the second insulating layer in the position detection region was 5008 mm ² . In addition, the area of the contact region for the glass substrate, which is the region of the second insulating layer in contact with the glass substrate in the position detection region, was 806 mm ² (area ratio 16.1%).

(Adhesion evaluation of insulating layer in touch panel member)
Evaluations 1 and 2 were performed in the same manner as in Example 1 using the touch panel members of Comparative Examples 3 and 4, respectively. As a result, the touch panel member of Comparative Example 3 was x for both Evaluation 1 and Evaluation 2. The touch panel member of Comparative Example 4 was Δ in both Evaluation 1 and Evaluation 2.

Reference example 1
A touch panel member having the same configuration as the touch panel member of Example 1 was produced except that ITO used for the first transparent electrode layer in Example 1 was changed to IZO. That is, a touch panel member was manufactured by carrying out the same process as in Example 1 except that IZO was used as the transparent conductive material used in carrying out the first transparent electrode layer formation pattern. Using this touch panel member, the area of the facing surface and the area of the contact area with the glass substrate are measured in the same manner as in Example 1, and in the touch panel member using Evaluations 1 and 2 as in Example 1. The adhesion of the insulating layer was evaluated.

(Measurement of area of facing surface and area of contact area with glass substrate)
The area of the position detection region of the obtained touch panel member was 4243 mm ² . Further, the area of the facing surface substantially coincided with the area of the position detection region, and was 4243 mm ² . In addition, the area of the contact region for the glass substrate, which is the region of the first insulating layer in contact with the glass substrate in the position detection region, was 43 mm ² (area ratio 1%).

(Adhesion evaluation of insulating layer in touch panel member)
Using the touch panel member of Reference Example 1, evaluations 1 and 2 were performed in the same manner as in Example 1. As a result, the touch panel member of Reference Example 1 was “good” in both Evaluation 1 and Evaluation 2.

(Touch panel member with colored layer)
Example 7
Using the touch panel member of Example 1, a pixel group was formed by laminating a colored layer as follows on the surface of the glass substrate surface opposite to the surface on which the transparent electrode and the insulating layer were formed. In the touch panel member, the pixel group is partitioned into each pixel piece by a black matrix. Note that three colored layers of red (R), green (G), and blue (B) were formed as the colored layers.

(Preparation of colored layer)
In preparing the colored layer, for each colored layer, a colored material dispersion used for forming the colored layer was prepared.

(Preparation of coloring material dispersion)
A pigment-dispersed photoresist was used as a coloring material dispersion for forming black matrix (BM) and red (R), green (G), and blue (B) colored layers. A pigment dispersion type photoresist uses a pigment as a coloring material, adds beads to a dispersion composition (containing a pigment, a dispersant, and a solvent), disperses for 3 hours with a disperser, and then removes the beads. It was obtained by mixing with a clear resist composition (containing polymer, monomer, additive, initiator and solvent). A paint shaker (manufactured by Asada Tekko Co., Ltd.) was used as the disperser. In the following, the pigment-dispersed photoresist for forming the black matrix (BM) and the red (R), green (G), and blue (B) colored layers are respectively a black matrix composition and a red colored layer composition. Product, green colored layer composition, blue colored layer composition.

(Composition for black matrix)
-61 parts by weight of carbon black-39 parts by weight of photosensitive resin composition for pixel formation-300 parts by weight of methoxybutyl acetate

  The above-described photosensitive resin composition for forming a pixel has the following composition. The same applies to the pixel-forming photosensitive resin composition used below.

(Photosensitive resin composition for pixel formation)
Acrylic resin 32 parts by weight Dipentaerythritol hexaacrylate 42 parts by weight Epicoat 180S70 (manufactured by Mitsubishi Yuka Shell Co., Ltd.) 18 parts by weight Irg. 907 (Ciba Specialty Chemicals Co., Ltd.) 8 parts by weight

(Composition of composition for red colored layer)
-PR254 dispersion 33 parts by weight-Pixel forming photosensitive resin composition 67 parts by weight-Propylene glycol monomethyl ether acetate 400 parts by weight

(Composition of green colored layer composition)
PG36 / PY150 dispersion 34 parts by weight Photosensitive resin composition for pixel formation 66 parts by weight Propylene glycol monomethyl ether acetate 400 parts by weight

(Composition of composition for blue colored layer)
-17 parts by weight of PB15: 6 / PV23 dispersion-83 parts by weight of photosensitive resin composition for pixel formation-400 parts by weight of propylene glycol monomethyl acetate

(Black matrix pattern formation)
Using the touch panel member of Example 1, the black matrix composition was applied by spin coating on the surface of the glass substrate opposite to the surface on which the transparent electrode and the insulating layer were formed, at 90 ° C. for 3 minutes. The film was pre-baked (pre-baked) under the conditions, exposed to ultraviolet rays (100 mJ / cm ² ) using a mask formed in a predetermined pattern, and then spray development using a 0.05% aqueous KOH solution was performed for 60 seconds. Thereafter, the substrate was post-baked (baked) at 200 ° C. for 30 minutes to produce a BM substrate which is a glass substrate on which a black matrix having a thickness of 1.2 μm was formed. The black matrix was formed in a lattice pattern, and a large number of openings surrounded by the black matrix were formed to form an opening group.

(Colored layer pattern formation)
Next, the composition for red colored layer is applied on the BM forming surface side of the BM substrate by a spin coating method, and pre-baked at 80 ° C. for 3 minutes to correspond to a predetermined pattern of forming a red colored layer. It exposed with the ultraviolet-ray (200mJ / cm < ² >) using the photomask which has a pattern. Further, spray development using a 0.1% KOH aqueous solution was performed for 60 seconds, followed by post-baking (baking) at 200 ° C. for 30 minutes, and red on a BM formation surface at a predetermined position with respect to the BM formation pattern. The colored layer was patterned. The red colored layer was formed so as to cover a predetermined opening in the opening group. The red colored layer was formed to a thickness of 1.2 μm.

  Subsequently, using a method similar to the method for forming the red colored layer, each of the green colored layer and the blue colored layer was formed in a predetermined pattern. At this time, a colored layer was laminated on each opening to form a pixel piece. Thus, a touch panel member was obtained in which a transparent electrode layer and an insulating layer were formed on one side of a glass substrate, and a pixel group composed of a plurality of pixel pieces was formed on the other side of the substrate. The touch panel member thus obtained is referred to as a colored layer touch panel member.

(Evaluation of adhesion of insulating layer in touch panel member with colored layer)
Using the touch panel member of Example 7, evaluations 1 and 2 were performed in the same manner as in Example 1. As a result, the touch panel member of Example 7 was “good” in both Evaluation 1 and Evaluation 2.

Example 8
A touch panel with a colored layer was produced in the same manner as in Example 7 except that the touch panel member of Example 2 was used. When the adhesiveness of the insulating layer was evaluated in the same manner as in Example 7, both Evaluation 1 and Evaluation 2 were good.

Example 9
A touch panel with a colored layer was produced in the same manner as in Example 7 except that the touch panel member of Example 3 was used. When the adhesiveness of the insulating layer was evaluated in the same manner as in Example 7, both Evaluation 1 and Evaluation 2 were good.

Example 10
A touch panel with a colored layer was produced in the same manner as in Example 7 except that the touch panel member of Example 4 was used. When the adhesiveness of the insulating layer was evaluated in the same manner as in Example 7, both Evaluation 1 and Evaluation 2 were good.

Comparative Example 5
A touch panel with a colored layer was produced in the same manner as in Example 7 except that the touch panel member of Comparative Example 1 was used. When the adhesiveness of the insulating layer was evaluated in the same manner as in Example 7, both Evaluation 1 and Evaluation 2 were x.

Comparative Example 6
A touch panel with a colored layer was produced in the same manner as in Example 7 except that the touch panel member of Comparative Example 2 was used. When the adhesion of the insulating layer was evaluated in the same manner as in Example 7, both Evaluation 1 and Evaluation 2 were Δ.

Comparative Example 7
A touch panel with a colored layer was produced in the same manner as in Example 7 except that the touch panel member of Comparative Example 3 was used. When the adhesiveness of the insulating layer was evaluated in the same manner as in Example 7, both Evaluation 1 and Evaluation 2 were x.

Comparative Example 8
A touch panel with a colored layer was produced in the same manner as in Example 7 except that the touch panel member of Comparative Example 4 was used. When the adhesion of the insulating layer was evaluated in the same manner as in Example 7, both Evaluation 1 and Evaluation 2 were Δ.

(Display device with touch panel)
Example 11
(Assembly of liquid crystal display device)
Using the touch panel member with a colored layer produced in Example 7, a display device was assembled as follows. A transmissive liquid crystal display device was employed as the display device. The liquid crystal display device includes a display panel having a display surface for displaying an image. In the display panel, the first panel substrate and the second panel substrate are attached to each other via a sealant, and a display medium is provided between the first panel substrate and the second panel substrate. A display surface is formed on the panel substrate. Therefore, a display panel constituting a liquid crystal display device was prepared.

(Preparation of display panel)
First, a first panel substrate was prepared as follows.

(Preparation of the first panel substrate)
Using the touch panel member with a colored layer, a transparent electrode layer for a display device was formed so as to cover the pixel group, and an optical element was obtained. As a transparent electrode layer for a display device, a layer made of ITO was used. The transparent electrode layer for the display device was formed by using a direct current (DC) magnetron sputtering method. The DC magnetron sputtering method was performed under the conditions of a glass substrate temperature of 200 ° C., argon and oxygen as discharge gases, and ITO as a target.

  Using the optical element obtained above, columns and alignment films were formed as follows. Here, the pillar functions as a member for maintaining a gap (cell gap) between the first panel substrate and the second panel substrate in the liquid crystal display device. In forming the pillar, a pillar resist having the following composition was prepared.

(Preparation of pillar resist)
-Polymer (P) ... 13.5 parts by weight (however, polymer (P) is a copolymer of methacrylic acid and benzyl methacrylate [methacrylic acid: benzyl methacrylate = 30:70 (Molar ratio), acid value = 113 mgKOH / g, polystyrene-converted weight average molecular weight = 30000] was used.)
-Multifunctional monomer: 12.0 parts by weight (The polyfunctional monomer used was SR399, manufactured by Sartomer Co., Ltd.)
Photopolymerization initiator 1 1.5 parts by weight (Photopolymerization initiator 1 uses Irgacure 907 manufactured by Ciba Geigy)
・ Solvent: 70.0 parts by weight (solvent: propylene glycol monomethyl ether acetate)
-Epoxy resin: 3.0 parts by weight (Epoxide resin manufactured by Daicel Chemical Industries, Ltd., Epolide GT401)

(Formation of pillars)
A column was formed at a predetermined position of the touch panel member with a colored layer using the prepared column resist. That is, a column resist is applied to a predetermined region with respect to the optical element by spin coating, and further pre-baked at 80 ° C. for 3 minutes, and a photomask having a predetermined pattern corresponding to the column formation pattern is used. Then, UV exposure (200 mJ / cm ² ) was performed. Further, spray development using a 0.1% KOH aqueous solution was performed for 60 seconds, followed by post-baking (baking) at 230 ° C. for 30 minutes, and a large number of columns were formed at predetermined positions with respect to the BM formation pattern. It was. Each column was formed in a circular cross section having a height of 3.2 μm. Specifically, the pillars were patterned at predetermined positions that overlap with the BM formation portion in plan view of the optical element.

(Formation of alignment film)
Applying an alignment film forming composition to the entire surface of the optical element on the side where the pillars are formed to form a coating film, solidifying the coating film, and rubbing the surface of the solidified film An alignment film was obtained. As the alignment film forming composition, an alignment film forming composition containing polyimide (SE-7511 manufactured by Nissan Chemical Industries, Ltd.) was used.

  Thus, the first panel substrate was prepared.

  In addition, the flexible printed circuit board (Flexible Printed Circuits; FPC) was previously joined to the 1st panel board | substrate as follows. In the FPC, an electric circuit for exchanging electric signals between the transparent electrode portion of the touch panel member and the position detection device is formed. In the FPC, terminals that can be connected to the touch panel member and terminals that can be connected to the position detection device are formed, and these are connected to an electric circuit.

(FPC joining)
The touch panel member in the first panel substrate is formed by connecting an FPC terminal to a terminal connected at an end of a metal wiring, and connecting an anisotropic conductive film in a predetermined region including a portion where the terminals face each other. The FPC was bonded to the first panel substrate by thermocompression bonding of the FPC to the touch panel member.

(Preparation of second panel substrate)
Next, a second panel substrate was prepared. In the second panel substrate, a plurality of thin film transistors (TFTs) are formed in a predetermined pattern on the glass substrate surface prepared for the second panel substrate, and further on the TFT forming surface side of the glass substrate surface. A film formed with an alignment film was used. That is, an array substrate produced by the method described in Japanese Patent No. 4216092 was used as the second panel substrate. The alignment film in the second panel substrate is rubbed.

(Assembly of display panel)
On the TFT forming surface of the second panel substrate surface, 15 mL of TN (Twisted Nematic) liquid crystal (ZLI-4792 manufactured by Merck & Co., Inc .; refractive index anisotropy Δn = 0.088) is dropped as a driving liquid crystal, and the first panel is dropped. The first panel substrate and the second panel substrate were overlaid so that the TN liquid crystal was sandwiched while the alignment film formation surface side was directed to the TN liquid crystal dropping surface. At this time, a sealing material is applied along the edge portions of the first panel substrate and the second panel substrate so that the TN liquid crystal does not leak outside from between the first panel substrate and the second panel substrate. Then, exposure was performed at a dose of 400 mJ / cm ² while applying a pressure of 0.3 kg / cm ^{2 in} the thickness direction of the laminate of the first panel substrate and the second panel substrate at room temperature (23 ° C.). An ultraviolet curable resin was used as the sealing material. As a result, the first panel substrate and the second panel substrate are joined, and a liquid crystal layer is formed between the first panel substrate and the second panel substrate, and the first panel substrate is sealed with the sealing material. Liquid crystal was enclosed in a space between the first panel substrate and the second panel substrate to form a liquid crystal cell for display panel. With respect to the liquid crystal cell for display panel, a polarizing plate was disposed on the outer surface side of the first panel substrate so that the transmission axis thereof coincided with the rubbing direction of the alignment film of the first panel substrate. In addition, a polarizing plate was disposed on the outer surface of the second panel substrate so that the transmission axis thereof coincided with the rubbing direction of the alignment film of the second panel substrate. A display panel was thus obtained.

  An FPC joined to a touch panel member incorporated in a display panel is connected to a position detection device and a drive circuit, and a backlight is provided at a predetermined position to assemble a liquid crystal display device as a display device with a touch panel. It was. Note that the state in which the FPC is connected to the position detection device and the drive circuit is performed by connecting a terminal connectable to the position detection device to the position detection device. The position detection device includes a printed circuit board on which a position detection IC chip and a drive IC chip are grounded, and terminals of the FPC are electrically connected to the position detection IC chip. At this time, the touch panel member is connected to the position detection device via the FPC to form the position detection mechanism, and the touch panel is formed.

(Evaluation of display device with touch panel)
Using the prepared display device with a touch panel, the performance of the display device with a touch panel was evaluated by Evaluation 3 shown below. Evaluation 3 verifies whether the touch panel of the display device with a touch panel has cracks suppressed even in a harsh environment and a disconnection has not occurred in the connecting portion in the second electrode. In addition, a crack is related with the adhesiveness of an insulating layer at the point that an incidence rate is raised by the adhesiveness deterioration of an insulating layer by a severe environment.

(Evaluation 3)
Evaluation 3 was carried out by evaluating the change in wiring resistance based on the results of the high-temperature, high-humidity energization test. That is, the liquid crystal display device manufactured as described above is placed in an environment of a temperature of 60 ° C. and a humidity of 85%, and a rectangular AC voltage of ± 5 V is applied to the transparent electrode portion of the touch panel of the liquid crystal display device at a cycle of 60 Hz. Applied for hours. Then, before and after the test, that is, before and after the application of the rectangular AC voltage, the presence or absence of a change in the wiring resistance of the second electrode of the touch panel was observed using a tester.

  As a result of conducting the high-temperature and high-humidity energization test using the liquid crystal display device of Example 11, the wiring resistance of the second electrode was 10 KΩ before and after the test, and a change was observed in the wiring resistance of the second electrode before and after the test. There wasn't. In addition, it was confirmed that no deterioration or change of the insulating layer such as crack expansion was observed in the insulating layer, and therefore no disconnection occurred at the connecting portion in the second electrode.

Example 12
A liquid crystal display device as a display device with a touch panel was produced in the same manner as in Example 7 except that the touch panel member produced in Example 10 was used.

  Using the liquid crystal display device of Example 12, evaluation 3 was performed in the same manner as Example 11. As a result, the wiring resistance of the second electrode was 8 KΩ before and after the test, and no change was observed in the wiring resistance of the second electrode. In addition, it was confirmed that no deterioration or change of the insulating layer such as crack expansion was observed in the insulating layer, and therefore no disconnection occurred at the connecting portion in the second electrode.

Comparative Example 9
A liquid crystal display device as a display device with a touch panel was produced in the same manner as in Example 7 except that the touch panel member produced in Comparative Example 5 was used.

  Evaluation 3 was performed in the same manner as Example 11 using the liquid crystal display device of Comparative Example 9. As a result, the wiring resistance of the second electrode before the test was 10 KΩ, whereas the wiring resistance of the second electrode after the test was the OVER display (indicating the disconnection state) of the tester resistance value display. It was impossible to measure. Regarding the touch panel member after the test, when the second connecting part connecting the electrode pads in the second electrode was observed with an optical microscope, a crack was generated in the insulating layer around the second connecting part. It was confirmed that the connecting portion of was cut.

Comparative Example 10
A liquid crystal display device was produced in the same manner as in Example 7 except that the touch panel member produced in Comparative Example 8 was used.

  Evaluation 3 was performed in the same manner as Example 11 using the liquid crystal display device of Comparative Example 10. As a result, the wiring resistance of the second electrode before the test was 8 KΩ, whereas the wiring resistance of the second electrode after the test was 20 KΩ, and a change in the wiring resistance was recognized. Regarding the touch panel member after the test, when the second connecting part connecting the electrode pads in the second electrode was observed with an optical microscope, a crack was generated in the insulating layer around the second connecting part. It was confirmed that there was a crack in a part of the connecting part.

(Display device with touch panel with cover substrate)
Example 13
Using the display device with a touch panel of Example 11, a cover substrate was attached to the surface of the touch panel member incorporated in the first panel substrate as follows. As the cover substrate, tempered glass (Corning Gorilla Glass) was prepared. And the optical adhesive sheet OCA (Optically Clear Adhesive) was affixed on the surface of the touch panel member integrated in the 1st panel board | substrate of the display apparatus with a touch panel of Example 11, and also the cover board | substrate was affixed on OCA. Thus, a display device with a touch panel and a touch panel was produced.

(Evaluation 4)
A test was performed in the same manner as in Evaluation 3 in Example 11 except that the rectangular AC voltage application time in Evaluation 3 was extended to 1000 hours using a display device with a touch panel with a cover substrate, and wiring was performed in the same manner as in Evaluation 3 in Example 11. The resistance change was evaluated. This evaluation is referred to as evaluation 4. As a result of performing the evaluation based on this evaluation 4 for the display device with a touch panel with the cover substrate of Example 13, no change was observed in the wiring resistance before and after the test, and neither cracking nor disconnection occurred in the second electrode. Not recognized.

Example 14
A display device with a touch panel with a cover substrate was produced in the same manner as in Example 13 except that the display device with a touch panel of Example 12 was used.

  Evaluation 4 was performed in the same manner as in Example 13 using the display device with a touch panel with cover substrate of Example 14. As a result, there was no change in the wiring resistance before and after the test, and it was recognized that neither cracks nor disconnection occurred in the second electrode.

Comparative Example 11
A display device with a touch panel with a cover substrate was produced in the same manner as in Example 13 except that the display device with a touch panel of Comparative Example 9 was used.

  Evaluation 4 was performed in the same manner as in Example 13 using the display device with a touch panel with a cover substrate of Comparative Example 11. As a result, the wiring resistance of the first electrode before the test was 10 KΩ, whereas the wiring resistance of the second electrode after the test was not measurable, and a change in the wiring resistance was recognized. In addition, after the test, in the touch panel of the liquid crystal display device, a crack occurs in the insulating layer around the second connection portion of the second electrode, and disconnection occurs in the second connection portion of the second electrode. Was recognized.

Comparative Example 12
A display device with a touch panel with a cover substrate was produced in the same manner as in Example 13 except that the display device with a touch panel of Comparative Example 10 was used.

  Evaluation 4 was performed in the same manner as in Example 13 using the display device with a touch panel with a cover substrate of Comparative Example 12. As a result, the wiring resistance of the first electrode before the test was 8 KΩ, whereas the wiring resistance of the first electrode after the test was 20 KΩ, and a change in the wiring resistance was recognized. In addition, after the test, in the touch panel of the liquid crystal display device, a crack occurs in the portion of the insulating layer around the second connection portion of the second electrode, and a part of the second connection portion of the second electrode is formed. Cracks were observed.

DESCRIPTION OF SYMBOLS 1 Touch panel member 2 Glass substrate 3 Transparent electrode layer 3a, 3b
4 Insulating layer 4a, 4b
5 Laminated structure 5a, 5b
6 position detection area forming portion 7 first electrode pattern 8 second electrode pattern 9 first electrode unit pattern 10 second electrode unit pattern 11, 11a, 11b, 11c, 11d electrode pad 12 connecting portion 12a first Connecting part 12b Second connecting part 13 Gap 14 Opposing surface 15 Hole part 16 Transparent electrode layer contact area 17 Opposing surface area 18 Glass substrate contact area 19 Metal wiring formation area 19a Intrusion area 20 Transparent electrode part 21 1st electrode piece 22 1st electrode 23 2nd electrode piece 24 2nd electrode 25 Metal layer 26 1st electrode pattern 27 2nd electrode pattern 28 2nd connection part 29 Overhang | projection area | region 30 Extraction electrode part 31 Pixel group 32 Metal Wiring 33 First extraction electrode pattern 34 Second extraction electrode pattern 35 Terminal 36 Connection portion 37 Pixel piece 38 Black Layer 39 colored layer 40 touch panel of Torikusu 41 panel screen 41a scannable area 42 the position detecting device 43 FPC
44 cover substrate 50 display device with touch panel 50a display surface 56, 56a, 56b surface 57 conductive metal layer 58 first electrode pattern 59 first connecting portion 60 second electrode pattern

Claims (5)

A glass substrate is provided, and a transparent electrode layer formed in a predetermined pattern and an insulating layer formed in a predetermined pattern including a cured product of a photosensitive resin composition having a siloxane skeleton are formed on the glass substrate surface. A touch panel member having a laminated structure formed and having a position detection region capable of detecting a touch position formed in a predetermined region overlapping at least a part of the region where the transparent electrode layer is formed,
In the laminated structure, at least one transparent electrode layer is formed on the glass substrate surface, and at least one insulating layer is provided so as to cover at least a part of the transparent electrode layer in a plan view of the touch panel member. It is formed on the glass substrate surface,
In the position detection area,
At least one insulating layer forms a counter-transparent electrode layer contact region in which a part of the surface of the insulating layer on the facing surface facing the glass substrate surface directly contacts the transparent electrode layer. And at least a part of the region excluding the counter transparent electrode layer contact region on the facing surface is patterned so as to form a counter glass substrate contact region in direct contact with the glass substrate surface, and A touch panel member, wherein an area of a contact area with a glass substrate is 1% or more and 15% or less of an area of the facing surface in a plan view of the touch panel member. The laminated structure includes a first insulating layer and a second insulating layer as insulating layers,
In the position detection area,
At least one of the first insulating layer and the second insulating layer is in contact with at least a part of the transparent electrode layer to form a counter transparent electrode layer contact region, and is in direct contact with the glass substrate surface. A glass-to-glass substrate contact area is formed, and the area of the glass-to-glass substrate contact area is configured to be 1% to 15% of the area of the facing surface in a plan view of the touch panel member. The touch panel member according to claim 1.   The laminated structure formed by forming a transparent electrode layer and an insulating layer on one side of a glass substrate, and a pixel group composed of a plurality of pixel pieces is formed on the other side of the glass substrate. 2. The touch panel member according to 2. A display panel having a display surface capable of displaying an image is provided. In the display panel, the first panel substrate and the second panel substrate are bonded to each other through a sealing material. A display medium having a display surface formed on the first panel substrate, wherein
A display device with a touch panel, wherein the touch panel member according to claim 1 is incorporated in a first panel substrate. A touch panel comprising a panel screen and electrically connecting a position detection device for detecting a coordinate position in a predetermined area in the panel screen to the panel screen,
The panel screen is formed by further laminating a light-transmitting cover substrate on the laminated structure of the touch panel member according to any one of claims 1 to 3.