JP2013020792A - 放射線発生装置及びそれを用いた放射線撮影装置 - Google Patents

放射線発生装置及びそれを用いた放射線撮影装置 Download PDF

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Publication number
JP2013020792A
JP2013020792A JP2011152792A JP2011152792A JP2013020792A JP 2013020792 A JP2013020792 A JP 2013020792A JP 2011152792 A JP2011152792 A JP 2011152792A JP 2011152792 A JP2011152792 A JP 2011152792A JP 2013020792 A JP2013020792 A JP 2013020792A
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JP
Japan
Prior art keywords
radiation
window
shielding member
insulating
envelope
Prior art date
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Pending
Application number
JP2011152792A
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English (en)
Japanese (ja)
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JP2013020792A5 (enExample
Inventor
Yoshihiro Yanagisawa
芳浩 柳沢
Kazuyuki Ueda
和幸 上田
Miki Tamura
美樹 田村
Shuji Aoki
修司 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011152792A priority Critical patent/JP2013020792A/ja
Priority to US13/523,119 priority patent/US9076627B2/en
Publication of JP2013020792A publication Critical patent/JP2013020792A/ja
Publication of JP2013020792A5 publication Critical patent/JP2013020792A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/16—Vessels
    • H01J2235/165—Shielding arrangements
    • H01J2235/168—Shielding arrangements against charged particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H01J35/116—Transmissive anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/02—Constructional details
    • H05G1/04—Mounting the X-ray tube within a closed housing
    • H05G1/06—X-ray tube and at least part of the power supply apparatus being mounted within the same housing

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • X-Ray Techniques (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2011152792A 2011-07-11 2011-07-11 放射線発生装置及びそれを用いた放射線撮影装置 Pending JP2013020792A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011152792A JP2013020792A (ja) 2011-07-11 2011-07-11 放射線発生装置及びそれを用いた放射線撮影装置
US13/523,119 US9076627B2 (en) 2011-07-11 2012-06-14 Radiation generating apparatus and radiation imaging apparatus using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011152792A JP2013020792A (ja) 2011-07-11 2011-07-11 放射線発生装置及びそれを用いた放射線撮影装置

Publications (2)

Publication Number Publication Date
JP2013020792A true JP2013020792A (ja) 2013-01-31
JP2013020792A5 JP2013020792A5 (enExample) 2014-07-10

Family

ID=47518920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011152792A Pending JP2013020792A (ja) 2011-07-11 2011-07-11 放射線発生装置及びそれを用いた放射線撮影装置

Country Status (2)

Country Link
US (1) US9076627B2 (enExample)
JP (1) JP2013020792A (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2649634B1 (en) 2010-12-10 2018-07-04 Canon Kabushiki Kaisha Radiation generating apparatus and radiation imaging apparatus
JP5455880B2 (ja) 2010-12-10 2014-03-26 キヤノン株式会社 放射線発生管、放射線発生装置ならびに放射線撮影装置
JP5825892B2 (ja) * 2011-07-11 2015-12-02 キヤノン株式会社 放射線発生装置及びそれを用いた放射線撮影装置
WO2013021794A1 (en) 2011-08-05 2013-02-14 Canon Kabushiki Kaisha Radiation generating apparatus and radiation imaging apparatus
JP6039282B2 (ja) 2011-08-05 2016-12-07 キヤノン株式会社 放射線発生装置及び放射線撮影装置
JP5875297B2 (ja) 2011-08-31 2016-03-02 キヤノン株式会社 放射線発生管及びそれを用いた放射線発生装置、放射線撮影システム
JP5896649B2 (ja) 2011-08-31 2016-03-30 キヤノン株式会社 ターゲット構造体及びｘ線発生装置
JP5984367B2 (ja) 2011-12-02 2016-09-06 キヤノン株式会社 放射線発生装置及びそれを用いた放射線撮影システム
CN102595754B (zh) * 2012-01-06 2015-05-13 同方威视技术股份有限公司 辐射器件安装箱、油冷循环系统以及x射线发生器
JP6253233B2 (ja) * 2013-01-18 2017-12-27 キヤノン株式会社 透過型ｘ線ターゲットおよび、該透過型ｘ線ターゲットを備えた放射線発生管、並びに、該放射線発生管を備えた放射線発生装置、並びに、該放射線発生装置を備えた放射線撮影装置
JP6316019B2 (ja) 2013-03-06 2018-04-25 キヤノン株式会社 Ｘ線発生管、該ｘ線発生管を備えたｘ線発生装置及びｘ線撮影システム
JP6230389B2 (ja) 2013-06-05 2017-11-15 キヤノン株式会社 Ｘ線発生管及びそれを用いたｘ線発生装置とｘ線撮影システム
JP6327802B2 (ja) 2013-06-12 2018-05-23 キヤノン株式会社 放射線発生管及びそれを用いた放射線発生装置と放射線撮影システム
CN105358062B (zh) * 2013-07-03 2018-11-02 筑波科技株式会社 医疗用小型x射线拍摄装置
JP6188470B2 (ja) * 2013-07-24 2017-08-30 キヤノン株式会社 放射線発生装置及びそれを用いた放射線撮影システム
JP2015028879A (ja) * 2013-07-30 2015-02-12 東京エレクトロン株式会社 Ｘ線発生用ターゲット及びｘ線発生装置
JP6272043B2 (ja) * 2014-01-16 2018-01-31 キヤノン株式会社 Ｘ線発生管及びこれを用いたｘ線発生装置、ｘ線撮影システム
JP6598538B2 (ja) 2014-07-18 2019-10-30 キヤノン株式会社 陽極及びこれを用いたｘ線発生管、ｘ線発生装置、ｘ線撮影システム
JP6441015B2 (ja) * 2014-10-06 2018-12-19 キヤノンメディカルシステムズ株式会社 Ｘ線診断装置及びｘ線管制御方法
JP6573380B2 (ja) * 2015-07-27 2019-09-11 キヤノン株式会社 Ｘ線発生装置及びｘ線撮影システム
US10453643B2 (en) * 2016-03-30 2019-10-22 Moxtek, Inc. Shielded, transmission-target, x-ray tube
JP6867224B2 (ja) * 2017-04-28 2021-04-28 浜松ホトニクス株式会社 Ｘ線管及びｘ線発生装置
KR101966794B1 (ko) * 2017-07-12 2019-08-27 (주)선재하이테크 전자 집속 개선용 엑스선관
US12293894B2 (en) * 2022-10-11 2025-05-06 Moxtek, Inc. X-ray source shielding
CN116705579B (zh) * 2023-08-07 2023-09-29 上海超群检测科技股份有限公司 适用于x射线源的内外壳间屏蔽窗组件及x射线源

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002265967A (ja) * 2000-12-20 2002-09-18 Toshiba Corp Ｘ線管浸漬用絶縁油およびｘ線管装置
JP2002343290A (ja) * 2001-05-21 2002-11-29 Medeiekkusutekku Kk Ｘ線管ターゲット、ｘ線発生器、ｘ線検査装置およびｘ線管ターゲットの製造方法
JP2003290204A (ja) * 2002-04-02 2003-10-14 Mitsubishi Heavy Ind Ltd 多線源型ｘ線ｃｔ装置
US20090010393A1 (en) * 2007-07-05 2009-01-08 Newton Scientific, Inc. Compact high voltage x-ray source system and method for x-ray inspection applications
JP2011071120A (ja) * 2001-12-04 2011-04-07 X-Ray Optical Systems Inc 改善された出力安定性を有するｘ線ソースアセンブリ、およびその流体ストリーム分析の適用

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US3334256A (en) * 1964-03-20 1967-08-01 Dunlee Corp Sealed window for x-ray generator with shield for seal
US4543207A (en) * 1982-12-25 1985-09-24 Nippon Petrochemicals Company, Limited Electrical insulating oil and oil-filled electrical appliances
US20050257404A1 (en) * 2004-05-24 2005-11-24 Daza James A Protective covering for footwear
JP2007080568A (ja) 2005-09-12 2007-03-29 Jobu:Kk Ｘ線発生装置
JP4878311B2 (ja) * 2006-03-03 2012-02-15 キヤノン株式会社 マルチｘ線発生装置
JP5641916B2 (ja) * 2010-02-23 2014-12-17 キヤノン株式会社 放射線発生装置および放射線撮像システム

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002265967A (ja) * 2000-12-20 2002-09-18 Toshiba Corp Ｘ線管浸漬用絶縁油およびｘ線管装置
JP2002343290A (ja) * 2001-05-21 2002-11-29 Medeiekkusutekku Kk Ｘ線管ターゲット、ｘ線発生器、ｘ線検査装置およびｘ線管ターゲットの製造方法
JP2011071120A (ja) * 2001-12-04 2011-04-07 X-Ray Optical Systems Inc 改善された出力安定性を有するｘ線ソースアセンブリ、およびその流体ストリーム分析の適用
JP2003290204A (ja) * 2002-04-02 2003-10-14 Mitsubishi Heavy Ind Ltd 多線源型ｘ線ｃｔ装置
US20090010393A1 (en) * 2007-07-05 2009-01-08 Newton Scientific, Inc. Compact high voltage x-ray source system and method for x-ray inspection applications

Also Published As

Publication number Publication date
US9076627B2 (en) 2015-07-07
US20130016812A1 (en) 2013-01-17

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