JP2013016217A - Glass substrate for hdd, manufacturing method of glass substrate for hdd, and magnetic recording media for hdd - Google Patents

Glass substrate for hdd, manufacturing method of glass substrate for hdd, and magnetic recording media for hdd Download PDF

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JP2013016217A
JP2013016217A JP2011146234A JP2011146234A JP2013016217A JP 2013016217 A JP2013016217 A JP 2013016217A JP 2011146234 A JP2011146234 A JP 2011146234A JP 2011146234 A JP2011146234 A JP 2011146234A JP 2013016217 A JP2013016217 A JP 2013016217A
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glass substrate
hdd
recording medium
inner peripheral
magnetic recording
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JP5869241B2 (en
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Takashi Komatsu
隆史 小松
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Konica Minolta Advanced Layers Inc
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Abstract

PROBLEM TO BE SOLVED: To provide a glass substrate for an HDD by which deformation of a magnetic recording medium can be suppressed when the magnetic recording medium is mounted on a hard disk drive.SOLUTION: A glass substrate 50 for an HDD has a circular hole 50a at a center part. When the radius of the circular hole is r, and the maximum value, minimum value, and average value of the thickness of the glass substrate 50 are tmax, tmin, and tave, respectively, measured along a circle C concentric with the circular hole 50a present between a first circle c1 having a radius of r+0.30 mm and concentric with the circular hole 50a and a second circle c2 having a radius of r+4 mm and concentric with the circular hole 50a, the following relationship is satisfied: tmax≤tave+0.05 μm and tmin≥tave-0.05 μm.

Description

本発明は、HDD用ガラス基板、HDD用ガラス基板の製造方法、及びHDD用磁気記録媒体に関する。   The present invention relates to a glass substrate for HDD, a method for producing a glass substrate for HDD, and a magnetic recording medium for HDD.

従来、情報記憶装置に搭載される情報記録媒体の1つとして、ハードディスクドライブ(HDD)に搭載されるHDD用磁気記録媒体が知られている。近年、HDD用磁気記録媒体は、記録容量の増大が強く要請されている。そのため、記録領域の拡大や、記録密度の増大が急務となっている。記録密度の増大のためには、磁気ヘッドの浮上量の低減や、ヘッドスライダーの位置決め精度の向上が必要となる。   2. Description of the Related Art Conventionally, an HDD magnetic recording medium mounted on a hard disk drive (HDD) is known as one of information recording media mounted on an information storage device. In recent years, magnetic recording media for HDDs are strongly demanded to increase the recording capacity. Therefore, there is an urgent need to expand the recording area and increase the recording density. In order to increase the recording density, it is necessary to reduce the flying height of the magnetic head and improve the positioning accuracy of the head slider.

一般に、磁気記録媒体は、ハードディスクドライブへの搭載時、例えば特許文献1に記載されるように、ハブ及びクランプを用いてスピンドルモータの回転軸に組み付けられる。まず、スピンドルモータの回転軸に一体に設けられたハブに、磁気記録媒体の中心部に形成された円孔が嵌合される。これにより、磁気記録媒体の円孔の周囲の内周端部(以下、基板端面近傍の領域を端部と表現する)の一面側がハブに当接して支持される。次に、ハブの軸心に螺合されるネジによってクランプがハブ及びスピンドルモータの回転軸に一体に締結される。これにより、磁気記録媒体の円孔の周囲の内周端部の他面側がクランプでハブ側に押圧されて支持される。磁気記録媒体の内周端部は、ハードディスクドライブへの搭載時の被クランプ部であり、この部分がハブとクランプとで挟持されることにより、磁気記録媒体がスピンドルモータの回転軸に一体に結合される。   Generally, when a magnetic recording medium is mounted on a hard disk drive, as described in Patent Document 1, for example, the magnetic recording medium is assembled to a rotating shaft of a spindle motor using a hub and a clamp. First, a circular hole formed in the central portion of the magnetic recording medium is fitted into a hub provided integrally with the rotation shaft of the spindle motor. As a result, one surface side of the inner peripheral edge around the circular hole of the magnetic recording medium (hereinafter, the region in the vicinity of the substrate end face is referred to as an end) comes into contact with and is supported by the hub. Next, the clamp is integrally fastened to the rotation shaft of the hub and the spindle motor by a screw screwed into the shaft center of the hub. As a result, the other surface side of the inner peripheral edge around the circular hole of the magnetic recording medium is supported by being pressed to the hub side by the clamp. The inner peripheral edge of the magnetic recording medium is a clamped part when mounted on a hard disk drive, and this part is clamped between the hub and the clamp so that the magnetic recording medium is integrally coupled to the rotation shaft of the spindle motor. Is done.

ところが、このハードディスクドライブへの搭載時に磁気記録媒体が変形することがある。この変形は、磁気ヘッドの浮上量の低減や、ヘッドスライダーの位置決め精度の向上の妨げとなり、記録密度の増大、ひいては記録容量の増大の妨げとなる。   However, the magnetic recording medium may be deformed when mounted on the hard disk drive. This deformation hinders the reduction of the flying height of the magnetic head and the improvement of the positioning accuracy of the head slider, and hinders an increase in recording density and an increase in recording capacity.

そこで、例えば特許文献1に開示されるように、磁気記録媒体を挟持するドライブ側の機械的構造を改良して、ハードディスクドライブへの搭載時の磁気記録媒体の変形を抑制することが提案されている。   Therefore, as disclosed in Patent Document 1, for example, it has been proposed to improve the mechanical structure on the drive side for sandwiching the magnetic recording medium and to suppress deformation of the magnetic recording medium when mounted on a hard disk drive. Yes.

特開2007−66476号公報JP 2007-66476 A

昨今、高密度記録化が益々進行し、将来、例えば2.5インチの記録媒体1枚で、記録容量が500GB、面記録密度が630Gb/平方インチ以上というようなHDD用磁気記録媒体が出現すると予想されている。また、記録媒体のトラックピッチ幅も減少が続き、現に、トラックピッチ幅が250kTPI以上というようなHDD用磁気記録媒体も出現している。このような高密度記録化の進行に伴い、ハードディスクドライブへの搭載時の磁気記録媒体の変形の許容量が益々厳しくなっている。前記のようなドライブ側の機械的構造の改良だけでは対応できない現状である。   In recent years, high-density recording has been increasingly progressed, and in the future, for example, a magnetic recording medium for HDDs having a recording capacity of 500 GB and a surface recording density of 630 Gb / square inch or more with one 2.5-inch recording medium will appear. Expected. In addition, the track pitch width of recording media continues to decrease, and in fact, magnetic recording media for HDDs having a track pitch width of 250 kTPI or more have also appeared. With the progress of such high-density recording, the allowable amount of deformation of the magnetic recording medium when mounted on a hard disk drive has become increasingly severe. The current situation cannot be solved only by improving the mechanical structure on the drive side as described above.

そこで、本発明の目的は、磁気記録媒体の面記録密度が630Gb/平方インチ以上あるいはトラックピッチ幅が250kTPI以上というような高密度記録化にも十分対応可能な程度にハードディスクドライブへの搭載時の磁気記録媒体の変形が抑制され得る、HDD用ガラス基板、HDD用ガラス基板の製造方法、及びHDD用磁気記録媒体を提供することである。   Therefore, an object of the present invention is to provide a hard disk drive with a surface recording density of a magnetic recording medium of 630 Gb / square inch or more or a track pitch width of 250 kTPI or more enough to cope with high density recording. An object of the present invention is to provide an HDD glass substrate, an HDD glass substrate manufacturing method, and an HDD magnetic recording medium, in which deformation of the magnetic recording medium can be suppressed.

ハードディスクドライブへの搭載時に磁気記録媒体が変形する原因として、特許文献1にも記載があるように、被クランプ部である円孔の周囲の内周端部がハブ及びクランプ側から不均一に荷重を受けることが理由の1つであることが知られている。従来は、内周端部に荷重が不均一に作用しないように、例えばハブやクランプの機械的精度を上げる等、ドライブ側の改良を図るものが主であった。   As described in Patent Document 1, the reason why the magnetic recording medium is deformed when mounted on a hard disk drive is that the inner peripheral edge around the circular hole that is the clamped portion is unevenly loaded from the hub and clamp side. Is known to be one of the reasons. Conventionally, in order to prevent the load from acting unevenly on the inner peripheral end portion, for example, the improvement on the drive side, such as increasing the mechanical accuracy of the hub and the clamp, has been mainly performed.

本発明者は、従来行われているドライブ側の改良は、記録媒体側の被クランプ部である内周端部が十分平坦であることを前提としていることに着目した。しかし、磁気記録媒体の内周端部は必ずしも常に十分平坦であるとは限らない。磁気記録媒体の内周端部の厚みがばらついていると、たとえハブとクランプとで内周端部を平行に挟んでも、内周端部に荷重が不均一に作用し、その結果、記録媒体が変形する場合がある。本発明者は、以上のようなことを見出して本発明を完成した。   The inventor of the present invention has focused on the fact that the improvement on the drive side that has been conventionally performed is based on the premise that the inner peripheral end, which is the clamped portion on the recording medium side, is sufficiently flat. However, the inner peripheral edge of the magnetic recording medium is not always sufficiently flat. If the thickness of the inner peripheral edge of the magnetic recording medium varies, even if the inner peripheral edge is sandwiched in parallel by the hub and the clamp, the load acts unevenly on the inner peripheral edge, and as a result, the recording medium May be deformed. The present inventor has found the above and completed the present invention.

すなわち、本発明の一局面は、中心部に円孔を有するHDD用ガラス基板であって、円孔の半径をr、半径がr+0.30mmである、円孔と同心の第1の円と、半径がr+4mmである、円孔と同心の第2の円との間にある、円孔と同心の円に沿って計測したガラス基板の厚みの最大値をtmax、最小値をtmin、平均値をtaveとしたときに、tmax≦tave+0.05μmであり、かつ、tmin≧tave−0.05μmであることを特徴とするHDD用ガラス基板である。   That is, one aspect of the present invention is a glass substrate for HDD having a circular hole in the center, wherein the circular hole has a radius r and a radius r + 0.30 mm, a first circle concentric with the circular hole, The maximum value of the thickness of the glass substrate measured along the concentric circle with the circular hole is tmax, the minimum value is tmin, and the average value is between the circular hole and the second concentric circle having a radius of r + 4 mm. The HDD glass substrate is characterized in that tmax ≦ tave + 0.05 μm and tmin ≧ tave−0.05 μm when tave is set.

このような構成のHDD用ガラス基板によれば、円孔の周囲の内周端部(本発明では円孔の外周を規定するガラス基板の内周端面から半径方向外側に4mmの範囲)におけるガラス基板の厚みのバラツキ(=│(厚みt)−(厚みの平均値tave)│)が極めて小さく(最大で0.05μm)、ガラス基板の内周端部の厚みの差は、最大でも、プラス側の0.05μmとマイナス側の0.05μmとの和で100nmしかないから、被クランプ部であるガラス基板の内周端部は、昨今の高密度記録化にも十分対応可能な程度に平坦である。したがって、本発明のHDD用ガラス基板は、内周端部がハブとクランプとで挟持されたときに、内周端部に荷重が均一に作用し、昨今の高密度記録化にも十分対応可能な程度に記録媒体の変形が抑制され得る、高品質のHDD用ガラス基板である。   According to the glass substrate for HDD of such a configuration, the glass at the inner peripheral end portion around the circular hole (in the present invention, a range of 4 mm radially outward from the inner peripheral end surface of the glass substrate defining the outer periphery of the circular hole). Substrate thickness variation (= | (thickness t) − (average thickness value) |) is extremely small (up to 0.05 μm), and the difference in the thickness of the inner peripheral edge of the glass substrate is at most positive. Since the sum of 0.05 μm on the side and 0.05 μm on the negative side is only 100 nm, the inner peripheral edge of the glass substrate, which is the clamped part, is flat enough to cope with the recent high-density recording It is. Therefore, the glass substrate for HDD of the present invention has a uniform load applied to the inner peripheral end when the inner peripheral end is sandwiched between the hub and the clamp, and can sufficiently cope with the recent high-density recording. This is a high-quality glass substrate for HDD that can suppress deformation of the recording medium to such an extent.

本発明のHDD用ガラス基板においては、面記録密度が630Gb/平方インチ以上のHDD用磁気記録媒体又はトラックピッチ幅が250kTPI以上のHDD用磁気記録媒体の基板に用いられることが好ましい。   The glass substrate for HDD of the present invention is preferably used for a substrate of a magnetic recording medium for HDD having a surface recording density of 630 Gb / square inch or more or a magnetic recording medium for HDD having a track pitch width of 250 kTPI or more.

このような構成のHDD用ガラス基板によれば、将来出現が予想されている高密度記録化されたHDD用磁気記録媒体の実現、あるいは現に出現している高密度記録化されたHDD用磁気記録媒体の安定生産に寄与することができる。   According to the glass substrate for HDD of such a configuration, realization of a high-density magnetic recording medium for HDD that is expected to appear in the future, or high-density magnetic recording for HDD that is currently appearing. This can contribute to stable production of the medium.

本発明の他の一局面は、前記HDD用ガラス基板の製造方法であって、ガラス基板を上定盤と下定盤との間に挟んで研磨する研磨工程と、研磨工程の後、上定盤と下定盤との平行度を矯正する平行度矯正工程とを含むことを特徴とするHDD用ガラス基板の製造方法である。   Another aspect of the present invention is a method for manufacturing the glass substrate for HDD, wherein the polishing step is performed by sandwiching the glass substrate between an upper surface plate and a lower surface plate, and the upper surface plate after the polishing step. And a parallelism correction step of correcting the parallelism between the lower surface plate and the lower surface plate.

このような構成のHDD用ガラス基板の製造方法によれば、研磨工程が終了する度に、研磨工程で用いられる上定盤と下定盤との平行度が矯正されるから、製造されるガラス基板の両主表面間の平行度が常に良好な状態に維持される。そのため、製造されるガラス基板の厚みのバラツキが常に極めて小さくなり、ハードディスクドライブへの搭載時の被クランプ部である内周端部の平坦度が常に良好な状態に維持される。したがって、内周端部がハブとクランプとで挟持されたときに、内周端部に荷重が均一に作用し、昨今の高密度記録化にも十分対応可能な程度に記録媒体の変形が抑制され得る、高品質のHDD用ガラス基板を常に安定生産することができる。   According to the method for manufacturing a glass substrate for HDD having such a configuration, the parallelism between the upper surface plate and the lower surface plate used in the polishing step is corrected every time the polishing step is completed. The parallelism between the two main surfaces is always maintained in a good state. For this reason, the variation in the thickness of the glass substrate to be manufactured is always extremely small, and the flatness of the inner peripheral end that is the clamped portion when mounted on the hard disk drive is always maintained in a good state. Therefore, when the inner peripheral edge is sandwiched between the hub and the clamp, the load is uniformly applied to the inner peripheral edge, and the deformation of the recording medium is suppressed to such an extent that it can sufficiently cope with the recent high-density recording. It is possible to always stably produce a high-quality glass substrate for HDD.

本発明の他の一局面は、前記HDD用ガラス基板の製造方法であって、第1の円と第2の円との間のガラス基板の内周端部を研磨する内周端部研磨工程を含むことを特徴とするHDD用ガラス基板の製造方法である。   Another aspect of the present invention is a method for manufacturing a glass substrate for HDD, wherein an inner peripheral edge polishing step for polishing an inner peripheral edge of a glass substrate between a first circle and a second circle. The manufacturing method of the glass substrate for HDD characterized by including.

このような構成のHDD用ガラス基板の製造方法によれば、半径がr+0.30mmである円孔と同心円(第1の円)と、半径がr+4mmである円孔と同心円(第2の円)との間のガラス基板の内周端部が研磨されるから、ハードディスクドライブへの搭載時の被クランプ部分である内周端部の平坦度が改善される。したがって、内周端部がハブとクランプとで挟持されたときに、内周端部に荷重が均一に作用し、昨今の高密度記録化にも十分対応可能な程度に記録媒体の変形が抑制され得る、高品質のHDD用ガラス基板を安定生産することができる。   According to the method for manufacturing a glass substrate for HDD having such a configuration, a circular hole having a radius of r + 0.30 mm and a concentric circle (first circle), and a circular hole having a radius of r + 4 mm and a concentric circle (second circle). Since the inner peripheral end of the glass substrate between the two is polished, the flatness of the inner peripheral end, which is the clamped portion when mounted on the hard disk drive, is improved. Therefore, when the inner peripheral edge is sandwiched between the hub and the clamp, the load is uniformly applied to the inner peripheral edge, and the deformation of the recording medium is suppressed to such an extent that it can sufficiently cope with the recent high-density recording. It is possible to stably produce a high-quality glass substrate for HDD.

本発明のさらに他の一局面は、前記HDD用ガラス基板の主表面の上に記録層が設けられたことにより製造されたことを特徴とするHDD用磁気記録媒体である。   Yet another aspect of the present invention is an HDD magnetic recording medium manufactured by providing a recording layer on a main surface of the HDD glass substrate.

このような構成のHDD用磁気記録媒体によれば、ハードディスクドライブへの搭載時の被クランプ部分である内周端部が、昨今の高密度記録化にも十分対応可能な程度に平坦であり、内周端部がハブとクランプとで挟持されたときに、内周端部に荷重が均一に作用し、昨今の高密度記録化にも十分対応可能な程度に記録媒体の変形が抑制され得る、高品質のHDD用ガラス基板が基板として用いられているから、ハードディスクドライブへの搭載時の変形が、昨今の高密度記録化にも十分対応可能な程度に抑制され得る、高品質のHDD用磁気記録媒体である。そのため、磁気ヘッドの浮上量の低減や、ヘッドスライダーの位置決め精度の向上が促進され、記録密度の増大、ひいては記憶容量の増大に寄与することができるHDD用磁気記録媒体である。   According to the magnetic recording medium for HDD of such a configuration, the inner peripheral end which is a clamped portion when mounted on a hard disk drive is flat enough to cope with the recent high-density recording, When the inner peripheral edge is sandwiched between the hub and the clamp, the load acts uniformly on the inner peripheral edge, and the deformation of the recording medium can be suppressed to the extent that it can sufficiently cope with the recent high density recording. Because a high-quality glass substrate for HDD is used as a substrate, deformation when mounted on a hard disk drive can be suppressed to a level that can sufficiently cope with the recent high-density recording. It is a magnetic recording medium. Therefore, the magnetic recording medium for HDD is capable of reducing the flying height of the magnetic head and improving the positioning accuracy of the head slider, thereby contributing to an increase in recording density and an increase in storage capacity.

本発明によれば、昨今の高密度記録化にも十分対応可能な、HDD用ガラス基板、HDD用ガラス基板の製造方法、及びHDD用磁気記録媒体が提供されるから、HDD用磁気記録媒体の記録容量の増大に寄与できる。   According to the present invention, an HDD glass substrate, an HDD glass substrate manufacturing method, and an HDD magnetic recording medium that can sufficiently cope with recent high-density recording are provided. This can contribute to an increase in recording capacity.

本発明の実施形態に係るHDD用ガラス基板の斜視図である。It is a perspective view of the glass substrate for HDD which concerns on embodiment of this invention. 従来のHDD用ガラス基板の製造工程図である。It is a manufacturing-process figure of the conventional glass substrate for HDD. 2次研磨工程で用いられる両面研磨機の主要部の構成を示す概略側面図である。It is a schematic side view which shows the structure of the principal part of the double-side polisher used by a secondary polishing process. 本発明の実施形態に係るガラス基板の厚みについて説明するためのガラス基板の部分拡大縦断面図である。It is a partial expanded longitudinal cross-sectional view of the glass substrate for demonstrating the thickness of the glass substrate which concerns on embodiment of this invention. 本発明の実施形態に係るHDD用ガラス基板の製造工程図である。It is a manufacturing-process figure of the glass substrate for HDD which concerns on embodiment of this invention. 本発明の実施形態に係る別のHDD用ガラス基板の製造工程図である。It is a manufacturing-process figure of another glass substrate for HDD which concerns on embodiment of this invention. 内周端部研磨工程で用いられる内周端部研磨機の主要部の構成を示す概略縦断面図である。It is a schematic longitudinal cross-sectional view which shows the structure of the principal part of the inner peripheral edge part grinder used at an inner peripheral edge part grinding | polishing process.

以下、図面を参照して、本発明の実施形態を説明する。ただし、本発明はこの実施形態に限定されるものではない。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. However, the present invention is not limited to this embodiment.

<HDD用ガラス基板の製造方法>
図1に示すガラス基板50及び図2に示す製造工程図を参照して、HDD用ガラス基板の製造方法を説明する。
<Method for producing glass substrate for HDD>
The manufacturing method of the glass substrate for HDD is demonstrated with reference to the glass substrate 50 shown in FIG. 1, and the manufacturing-process figure shown in FIG.

本実施形態においては、HDD用ガラス基板50は、円盤加工工程、ラップ工程、1次研磨(粗研磨)工程、2次研磨(精密研磨)工程、化学強化工程、最終洗浄工程、検査工程等を経て製造される。   In the present embodiment, the HDD glass substrate 50 includes a disk processing step, a lapping step, a primary polishing (rough polishing) step, a secondary polishing (precision polishing) step, a chemical strengthening step, a final cleaning step, an inspection step, and the like. It is manufactured after.

ガラス基板50に用いられるガラス素材は、二酸化ケイ素(SiO)を主成分とするガラス組成物で構成される。ガラス組成物は、マグネシウム、カルシウム及び/又はセリウムを含んでも含まなくてもよい。代表的なガラス組成物は、例えば、SiO、Al、B、LiO、NaO、KO、MgO、CaO、BaO、SrO、ZnO等を含んだものである。 Glass material used for the glass substrate 50 is composed of a glass composition whose main component is silicon dioxide (SiO 2). The glass composition may or may not contain magnesium, calcium and / or cerium. Typical glass compositions include, for example, SiO 2 , Al 2 O 3 , B 2 O 3 , Li 2 O, Na 2 O, K 2 O, MgO, CaO, BaO, SrO, ZnO and the like. is there.

[円盤加工工程]
円盤加工工程では、溶融したガラス素材を金型に流し込んでプレス成形することにより円盤状のガラス基板(ブランクス)を作製する。このときのガラス基板の大きさとしては、例えば、外径が2.5インチ、1.8インチ、1.0インチ、0.8インチ等、板厚が、2mm、1mm、0.8mm、0.63mm等である。得られたガラス基板の中心部に、例えばダイヤモンドコアドリル等を用いて円孔50a(図1参照)を形成し、環状のガラス基板とする。
[Disc machining process]
In the disk processing step, a disk-shaped glass substrate (blanks) is produced by pouring a molten glass material into a mold and press-molding it. As the size of the glass substrate at this time, for example, the outer diameter is 2.5 inches, 1.8 inches, 1.0 inches, 0.8 inches, etc., and the plate thickness is 2 mm, 1 mm, 0.8 mm, 0 .63 mm or the like. A circular hole 50a (see FIG. 1) is formed in the center portion of the obtained glass substrate using, for example, a diamond core drill or the like to obtain an annular glass substrate.

[ラップ工程]
ラップ工程は、第1ラップ工程と第2ラップ工程とを含む。第1ラップ工程では、ガラス基板の表裏両面を研削し、ガラス基板の全体形状、すなわちガラス基板の平行度、平坦度及び厚み等を予備調整する。第2ラップ工程では、第1ラップ工程に続いて、ガラス基板の表裏両面を再び研削し、ガラス基板の全体形状、すなわちガラス基板の平行度、平坦度及び厚み等をさらに微調整する。ラップ工程では、例えばダイヤモンドペレットが貼り付けられた上下定盤を備える両面研削機が用いられる。
[Lapping process]
The lapping process includes a first lapping process and a second lapping process. In the first lapping step, both the front and back surfaces of the glass substrate are ground, and the overall shape of the glass substrate, that is, the parallelism, flatness, thickness and the like of the glass substrate are preliminarily adjusted. In the second lapping step, following the first lapping step, both the front and back surfaces of the glass substrate are ground again to further finely adjust the overall shape of the glass substrate, that is, the parallelism, flatness, thickness and the like of the glass substrate. In the lapping process, for example, a double-side grinding machine including an upper and lower surface plate on which diamond pellets are attached is used.

[1次研磨工程]
1次研磨工程では、次の2次研磨工程で最終的に求められるガラス基板の表面粗さ、平行度、平坦度及び厚み等が効率よく得られるように、ガラス基板の表裏両面を粗研磨する。この1次研磨工程では、例えば研磨パッドとして発泡ウレタンパッドが貼り付けられた上下一対の定盤を備える両面研磨機が用いられ、研磨液として例えば酸化セリウムを研磨砥粒として含む研磨液(スラリー)が用いられる。ただし、これに限定されるものではない。
[Primary polishing process]
In the primary polishing step, the front and back surfaces of the glass substrate are roughly polished so that the surface roughness, parallelism, flatness, thickness, and the like of the glass substrate finally obtained in the next secondary polishing step can be efficiently obtained. . In this primary polishing step, for example, a double-side polishing machine including a pair of upper and lower surface plates to which a foamed urethane pad is attached as a polishing pad is used, and a polishing liquid (slurry) containing, for example, cerium oxide as polishing abrasives Is used. However, it is not limited to this.

[2次研磨工程]
2次研磨工程では、1次研磨工程に続いて、最終的に求められるガラス基板の表面粗さ、平行度、平坦度及び厚み等が得られるように、ガラス基板の表裏両面を精密研磨する。この2次研磨工程では、図3に示すように、ガラス基板50の表裏両面を同時研磨することが可能な両面研磨機10が用いられる。
[Secondary polishing process]
In the secondary polishing step, following the primary polishing step, the front and back surfaces of the glass substrate are precisely polished so that the finally obtained surface roughness, parallelism, flatness, thickness, etc. of the glass substrate are obtained. In the secondary polishing step, as shown in FIG. 3, a double-side polishing machine 10 capable of simultaneously polishing both the front and back surfaces of the glass substrate 50 is used.

両面研磨機10は、相互に平行になるように上下に間隔をおいて配置され、相互に逆方向に回転可能な円盤状の上定盤11と下定盤12とを備えている。この上下一対の定盤11,12の各対向面にガラス基板50の表裏両面を研磨するための研磨パッド(本実施形態ではポリウレタン製のスウェードパッド)Pが貼り付けられている。定盤11,12の間には、回転可能な複数のキャリア13が配置され、各キャリア13には、複数のガラス基板50が嵌め込まれてセットされている。キャリア13は、ガラス基板50を保持した状態で、自転しながら定盤11,12の回転中心に対して公転する。このような動作をしている上下定盤11,12及びキャリア13に対して、砥粒(本実施形態ではコロイダルシリカ)を含む研磨液(スラリー)が上定盤11の研磨パッドPとガラス基板50との間、及び、下定盤12の研磨パッドPとガラス基板50との間にそれぞれ供給され、これにより、ガラス基板50が上定盤11と下定盤12との間に挟まれて表裏両面の精密研磨が実行される。   The double-side polishing machine 10 includes a disk-shaped upper surface plate 11 and a lower surface plate 12 which are arranged at intervals in the vertical direction so as to be parallel to each other and are rotatable in opposite directions. A polishing pad (a polyurethane suede pad in this embodiment) P for polishing the front and back surfaces of the glass substrate 50 is attached to the opposing surfaces of the pair of upper and lower surface plates 11 and 12. A plurality of rotatable carriers 13 are arranged between the surface plates 11 and 12, and a plurality of glass substrates 50 are fitted and set in each carrier 13. The carrier 13 revolves around the rotation center of the surface plates 11 and 12 while rotating while holding the glass substrate 50. A polishing liquid (slurry) containing abrasive grains (colloidal silica in this embodiment) is applied to the upper and lower surface plates 11 and 12 and the carrier 13 that are operating in this manner. 50 and between the polishing pad P of the lower surface plate 12 and the glass substrate 50, whereby the glass substrate 50 is sandwiched between the upper surface plate 11 and the lower surface plate 12, both front and back surfaces. Precision polishing is performed.

なお、図3において、符号14は研磨液回収装置、符号15は研磨液貯留タンク、符号16は研磨液供給管、符号17は潤滑液貯留タンク、符号18は潤滑液供給管である。   In FIG. 3, reference numeral 14 denotes a polishing liquid recovery device, reference numeral 15 denotes a polishing liquid storage tank, reference numeral 16 denotes a polishing liquid supply pipe, reference numeral 17 denotes a lubricating liquid storage tank, and reference numeral 18 denotes a lubricating liquid supply pipe.

[化学強化工程]
化学強化工程では、ガラス基板の表面に化学強化層を形成する。例えば、ガラス基板をナトリウムイオンやカリウムイオンの存在する化学強化処理液に浸漬することにより、ガラス基板の表層に存在するリチウムイオンやナトリウムイオンが化学強化処理液中のナトリウムイオンやカリウムイオンと置換され、ガラス基板の表層が化学強化層となる。化学強化層には圧縮応力がかかっている。このような化学強化層を形成することにより、最終的に得られるガラス基板50の耐衝撃性、耐振動性及び耐熱性等が向上する。
[Chemical strengthening process]
In the chemical strengthening step, a chemical strengthening layer is formed on the surface of the glass substrate. For example, by immersing a glass substrate in a chemical strengthening treatment solution containing sodium ions and potassium ions, lithium ions and sodium ions present on the surface layer of the glass substrate are replaced with sodium ions and potassium ions in the chemical strengthening treatment solution. The surface layer of the glass substrate becomes a chemically strengthened layer. A compressive stress is applied to the chemically strengthened layer. By forming such a chemically strengthened layer, the impact resistance, vibration resistance, heat resistance, and the like of the finally obtained glass substrate 50 are improved.

[最終洗浄工程]
最終洗浄工程では、ガラス基板に付着している異物を、例えば、フィルタリングした純水、イオン交換水、超純水、酸性洗剤、中性洗剤、アルカリ性洗剤、有機溶剤、界面活性剤等を含んだ各種洗浄液を用いて、洗浄し、除去する。その後、ガラス基板を乾燥する。
[Final cleaning process]
In the final cleaning step, foreign substances adhering to the glass substrate include, for example, filtered pure water, ion-exchanged water, ultrapure water, acidic detergent, neutral detergent, alkaline detergent, organic solvent, surfactant and the like. Wash and remove using various cleaning solutions. Thereafter, the glass substrate is dried.

[検査工程]
検査工程では、ガラス基板の平坦度や厚み、あるいは表面粗さや欠陥の有無等を検査する。そして、検査に合格したガラス基板のみが、異物等が表面に付着しないように、清浄な環境の中で、専用収納カセットに収納され、真空パックされた後、HDD用ガラス基板として出荷される。
[Inspection process]
In the inspection process, the flatness and thickness of the glass substrate, the surface roughness, the presence or absence of defects, etc. are inspected. Only the glass substrate that has passed the inspection is stored in a dedicated storage cassette and vacuum packed in a clean environment so that foreign matter or the like does not adhere to the surface, and then shipped as a glass substrate for HDD.

<従来の問題点>
以上のようにして製造されたHDD用ガラス基板50を基板として用いたHDD用磁気記録媒体をハードディスクドライブに搭載したときに磁気記録媒体が変形することがあった。その原因として、磁気記録媒体の被クランプ部である内周端部の平坦度が不十分で、内周端部における記録媒体の厚みがばらついて、内周端部をハブとクランプとで挟持したときに、内周端部に荷重が不均一に作用し、その結果、記録媒体が変形することが見出された。
<Conventional problems>
When an HDD magnetic recording medium using the HDD glass substrate 50 manufactured as described above as a substrate is mounted on a hard disk drive, the magnetic recording medium may be deformed. The cause is that the flatness of the inner peripheral end, which is the clamped portion of the magnetic recording medium, is insufficient, the thickness of the recording medium at the inner peripheral end varies, and the inner peripheral end is sandwiched between the hub and the clamp. Sometimes, it has been found that the load acts unevenly on the inner peripheral edge, resulting in deformation of the recording medium.

<本実施形態の改良点>
そこで、本実施形態においては、図1に示すように、中心部に円孔50aを有するHDD用ガラス基板50であって、円孔50aの半径をr、半径がr+0.30mmである、円孔50aと同心の第1の円c1と、半径がr+4mmである、円孔50aと同心の第2の円c2との間にある、円孔50aと同心の円Cに沿って計測したガラス基板50の厚みの最大値をtmax、最小値をtmin、平均値をtaveとしたときに、tmax≦tave+0.05μmであり、かつ、tmin≧tave−0.05μmであるHDD用ガラス基板50を製造するように改良した。
<Improvements of this embodiment>
Therefore, in the present embodiment, as shown in FIG. 1, the HDD glass substrate 50 has a circular hole 50a in the center, and the circular hole 50a has a radius r and a radius of r + 0.30 mm. A glass substrate 50 measured along a circle C concentric with the circular hole 50a between the first circular c1 concentric with 50a and the circular hole 50a having a radius of r + 4 mm and the second concentric circle c2. An HDD glass substrate 50 in which tmax ≦ tave + 0.05 μm and tmin ≧ tave−0.05 μm and tmin ≦ tave + 0.05 μm, where tmax is the maximum value of thickness, tmin is the minimum value, and tave is the average value. Improved.

なお、図1において、符号Cは、内周端部内にある円孔と同心円、符号c1は、半径がr+0.30mmである円孔と同心円(第1の円)、符号c2は、半径がr+4mmである円孔と同心円(第2の円)、符号c3は、記録領域内にある円孔と同心円である。また、符号Oは、ガラス基板50の中心、符号Rは、前記円Cの半径(つまりr+0.30mm以上、r+4mm以下)、符号r1は、前記第1の円c1の半径(つまりr+0.30mm)、符号r2は、前記第2の円c2の半径(つまりr+4mm)である。   In FIG. 1, symbol C is a concentric circle with a circular hole in the inner peripheral end, symbol c1 is a concentric circle (first circle) having a radius of r + 0.30 mm, and symbol c2 is a radius of r + 4 mm. The concentric circle (second circle) and the symbol c3 are concentric with the circular hole in the recording area. The symbol O is the center of the glass substrate 50, the symbol R is the radius of the circle C (that is, r + 0.30 mm or more and r + 4 mm or less), and the symbol r1 is the radius of the first circle c1 (that is, r + 0.30 mm). , R2 is a radius (that is, r + 4 mm) of the second circle c2.

図4を参照して、本実施形態に係るガラス基板50の厚みtについて説明する。図4において、符号50b、50cは、ガラス基板50の主表面である。本実施形態においては、ガラス基板50の一方の主表面(図例では50b)に基準面Sを定義する。基準面Sとしては、例えば、ハードディスクドライブに搭載されたときにスピンドルモータの回転軸に垂直な面が挙げられる。より具体的には、最小二乗法を用いて算出される、主表面に最もフィットする面である。そして、その基準面Sに対して垂直に計測したときの厚みtを採用する。   With reference to FIG. 4, the thickness t of the glass substrate 50 which concerns on this embodiment is demonstrated. In FIG. 4, reference numerals 50 b and 50 c are main surfaces of the glass substrate 50. In the present embodiment, a reference plane S is defined on one main surface (50b in the illustrated example) of the glass substrate 50. Examples of the reference surface S include a surface perpendicular to the rotation axis of the spindle motor when mounted on a hard disk drive. More specifically, it is a surface that is most fitted to the main surface, calculated using the least square method. And thickness t when measured perpendicularly to the reference plane S is adopted.

このような厚みtは、例えば、被計測物の片面側から被計測物にレーザー光を照射して反射光を解析することにより被計測物の厚みを計測する、キーエンス社製の「SI−F80R」を用いて計測することができる。他にも、被計測物の両面側から被計測物にレーザー光を同時に照射して反射光や散乱光を検出することにより被計測物の厚みを計測する方法を用いてもよい。   Such thickness t is, for example, “SI-F80R manufactured by Keyence Corporation, which measures the thickness of the measurement object by irradiating the measurement object with laser light from one side of the measurement object and analyzing the reflected light. Can be measured. In addition, a method of measuring the thickness of the measurement object by simultaneously irradiating the measurement object with laser light from both sides of the measurement object and detecting reflected light or scattered light may be used.

<改良されたHDD用ガラス基板>
前記のように改良されたHDD用ガラス基板50によれば、図1に示すように、円孔50aの周囲の内周端部(本実施形態では円孔50aの外周を規定するガラス基板50の内周端面から半径方向外側に4mmの範囲)におけるガラス基板50の厚みのバラツキ(=│(厚みt)−(厚みの平均値tave)│)が極めて小さく(最大で0.05μm)、ガラス基板50の内周端部の厚みの差は、最大でも、プラス側の0.05μmとマイナス側の0.05μmとの和で100nmしかないから、被クランプ部であるガラス基板50の内周端部は、昨今の高密度記録化にも十分対応可能な程度に平坦である。したがって、本実施形態に係る改良されたHDD用ガラス基板50は、内周端部がハブとクランプとで挟持されたときに、内周端部に荷重が均一に作用し、昨今の高密度記録化にも十分対応可能な程度に記録媒体の変形が抑制され得る、高品質のHDD用ガラス基板50である。
<Improved glass substrate for HDD>
According to the improved glass substrate 50 for HDD as described above, as shown in FIG. 1, the inner peripheral end portion around the circular hole 50a (in this embodiment, the glass substrate 50 defining the outer periphery of the circular hole 50a). The variation in thickness (= | (thickness t) − (average thickness value) |) of the thickness of the glass substrate 50 in the range of 4 mm radially outward from the inner peripheral end face is extremely small (up to 0.05 μm). The difference in the thickness of the inner peripheral end portion of the glass substrate 50 is at most 100 nm as the sum of 0.05 μm on the positive side and 0.05 μm on the negative side. Is flat enough to cope with the recent high density recording. Therefore, the improved HDD glass substrate 50 according to the present embodiment has a uniform load applied to the inner peripheral end portion when the inner peripheral end portion is sandwiched between the hub and the clamp. This is a high-quality HDD glass substrate 50 in which the deformation of the recording medium can be suppressed to such a degree that it can sufficiently cope with the manufacturing process.

本実施形態に係る改良されたHDD用ガラス基板50においては、面記録密度が630Gb/平方インチ以上のHDD用磁気記録媒体又はトラックピッチ幅が250kTPI以上のHDD用磁気記録媒体の基板に用いられることが好ましい。HDD用ガラス基板50が、将来出現が予想されている高密度記録化されたHDD用磁気記録媒体の実現、あるいは現に出現している高密度記録化されたHDD用磁気記録媒体の安定生産に寄与することができるからである。   The improved HDD glass substrate 50 according to the present embodiment is used as a substrate for an HDD magnetic recording medium having a surface recording density of 630 Gb / in 2 or more or an HDD magnetic recording medium having a track pitch width of 250 kTPI or more. Is preferred. The glass substrate for HDD 50 contributes to the realization of a high-density magnetic recording medium for HDD that is expected to appear in the future, or to the stable production of the magnetic recording medium for high-density recording that is currently appearing. Because it can be done.

なお、前記ガラス基板50の厚みのバラツキ(=│(厚みt)−(厚みの平均値tave)│)が0.05μmを超えると、内周端部の平坦度が不十分となる。好ましくは、tmax≦tave+0.03μmであり、かつ、tmin≧tave−0.03μmである(厚みのバラツキが0.03μm以下である)。より好ましくは、tmax≦tave+0.02μmであり、かつ、tmin≧tave−0.02μmである(厚みのバラツキが0.02μm以下である)。   If the variation in thickness of the glass substrate 50 (= | (thickness t) − (average value of thicknesses) |) exceeds 0.05 μm, the flatness of the inner peripheral end becomes insufficient. Preferably, tmax ≦ tave + 0.03 μm and tmin ≧ tave−0.03 μm (thickness variation is 0.03 μm or less). More preferably, tmax ≦ tave + 0.02 μm and tmin ≧ tave−0.02 μm (thickness variation is 0.02 μm or less).

また、円Cの半径の最大値をr+4mmとしたのは、これを超えて磁気記録媒体がハブとクランプとで挟持されることは稀であるからである。   The reason why the maximum value of the radius of the circle C is r + 4 mm is that it is rare that the magnetic recording medium is sandwiched between the hub and the clamp beyond this value.

<具体的製造方法の1>
図5を参照して、前記のように、内周端部における厚みtのバラツキが極めて小さく、内周端部の平坦度が極めて良好なガラス基板50を製造する具体的方法の1例を説明する。ただし、図2の製造工程図と同じ又は類似の工程は説明を省略し、特徴的な工程のみ説明する。
<Specific manufacturing method 1>
With reference to FIG. 5, as described above, an example of a specific method for manufacturing the glass substrate 50 in which the variation in the thickness t at the inner peripheral end portion is extremely small and the flatness of the inner peripheral end portion is extremely good will be described. To do. However, the description of the same or similar processes as those in the manufacturing process diagram of FIG. 2 is omitted, and only characteristic processes are described.

図5に示すように、この具体的製造方法の1においては、2次研磨工程の後、平行度矯正工程を行う。平行度矯正工程では、2次研磨工程でガラス基板50を間に挟んでガラス基板50の表裏両面を同時研磨する上定盤11と下定盤12との平行度を矯正する。   As shown in FIG. 5, in this specific manufacturing method 1, a parallelism correction step is performed after the secondary polishing step. In the parallelism correction step, the parallelism between the upper surface plate 11 and the lower surface plate 12 that simultaneously polish both the front and back surfaces of the glass substrate 50 with the glass substrate 50 interposed therebetween in the secondary polishing step is corrected.

より詳しくは、感圧紙を用いて荷重分布を確認しつつ、十分な平行度が達成されるまで、ドレッサーによる研磨パッドP表面の切削処理を繰り返す。また、定期的に、研磨パッドPを上定盤11及び下定盤12から剥がし、上定盤11及び下定盤12の表面をドレッサーにより切削し、感圧紙を用いて荷重分布を確認しつつ、十分な平行度が達成されるまで、切削処理を繰り返した後、新たな研磨パッドPを上定盤11及び下定盤12に貼り付ける。このようなことをすることにより、上定盤11と下定盤12との平行度が矯正され、維持される。   More specifically, while the load distribution is confirmed using pressure-sensitive paper, the cutting process of the surface of the polishing pad P by the dresser is repeated until sufficient parallelism is achieved. Further, periodically, the polishing pad P is peeled off from the upper surface plate 11 and the lower surface plate 12, the surfaces of the upper surface plate 11 and the lower surface plate 12 are cut with a dresser, and the load distribution is confirmed using pressure-sensitive paper. After the cutting process is repeated until a high degree of parallelism is achieved, a new polishing pad P is attached to the upper surface plate 11 and the lower surface plate 12. By doing this, the parallelism between the upper surface plate 11 and the lower surface plate 12 is corrected and maintained.

この具体的製造方法の1によれば、2次研磨工程が終了する度に、2次研磨工程で用いられる上定盤11と下定盤12との平行度が矯正されるから、製造されるガラス基板50の両主表面間の平行度が常に良好な状態に維持される。そのため、製造されるガラス基板50の厚みtのバラツキが常に極めて小さくなり、ハードディスクドライブへの搭載時の被クランプ部である内周端部の平坦度が常に良好な状態に維持される。したがって、内周端部がハブとクランプとで挟持されたときに、内周端部に荷重が均一に作用し、昨今の高密度記録化にも十分対応可能な程度に記録媒体の変形が抑制され得る、高品質のHDD用ガラス基板50を常に安定生産することができる。   According to this specific manufacturing method 1, since the parallelism between the upper surface plate 11 and the lower surface plate 12 used in the secondary polishing step is corrected every time the secondary polishing step is completed, the glass to be manufactured The parallelism between both main surfaces of the substrate 50 is always maintained in a good state. Therefore, the variation in the thickness t of the glass substrate 50 to be manufactured is always extremely small, and the flatness of the inner peripheral end that is the clamped portion when mounted on the hard disk drive is always maintained in a good state. Therefore, when the inner peripheral edge is sandwiched between the hub and the clamp, the load is uniformly applied to the inner peripheral edge, and the deformation of the recording medium is suppressed to such an extent that it can sufficiently cope with the recent high-density recording. The high-quality glass substrate 50 for HDD which can be always produced can be stably produced.

<具体的製造方法の2>
図6を参照して、前記のように、内周端部における厚みtのバラツキが極めて小さく、内周端部の平坦度が極めて良好なガラス基板50を製造する具体的方法の別の例を説明する。ただし、図2の製造工程図と同じ又は類似の工程は説明を省略し、特徴的な工程のみ説明する。
<Specific manufacturing method 2>
Referring to FIG. 6, as described above, another example of a specific method for manufacturing glass substrate 50 in which variation in thickness t at the inner peripheral end is extremely small and flatness at the inner peripheral end is extremely good. explain. However, the description of the same or similar processes as those in the manufacturing process diagram of FIG. 2 is omitted, and only characteristic processes are described.

図6に示すように、この具体的製造方法の2においては、2次研磨工程の後、内周端部研磨工程を行う。内周端部研磨工程では、半径がr+0.30mmである、円孔と同心の第1の円c1(図1参照)と、半径がr+4mmである、円孔と同心の第2の円c2(図1参照)との間のガラス基板50の内周端部を研磨する。   As shown in FIG. 6, in this specific manufacturing method 2, an inner peripheral end portion polishing step is performed after the secondary polishing step. In the inner peripheral edge polishing step, a first circle c1 (see FIG. 1) concentric with the circular hole having a radius of r + 0.30 mm and a second circle c2 concentric with the circular hole having a radius of r + 4 mm (see FIG. 1). The inner peripheral end portion of the glass substrate 50 between the glass substrate 50 and the glass substrate 50 is polished.

具体的には、図7に示すような内周端部研磨機20を用いる。この内周端部研磨機20は、相対向する一対の回転体21,22を有する。回転体21,22は、回転軸心が相互に精密に一致するように調整されている。回転体21,22にそれぞれ環状の研磨パッド(本実施形態では、2次研磨工程と同様、ポリウレタン製のスウェードパッド)23,24が取り付けられている。研磨パッド23,24は、少なくとも、第1の円c1と第2の円c2との間のガラス基板50の内周端部を研磨できる大きさに形成されている。ガラス基板50は、外周端部支持装置25で外周端部が支持される。   Specifically, an inner peripheral edge grinder 20 as shown in FIG. 7 is used. The inner peripheral edge polishing machine 20 includes a pair of rotating bodies 21 and 22 that face each other. The rotating bodies 21 and 22 are adjusted so that the rotational axes coincide with each other precisely. Annular polishing pads (in this embodiment, polyurethane suede pads as in the secondary polishing step) 23 and 24 are attached to the rotating bodies 21 and 22, respectively. The polishing pads 23 and 24 are formed to have a size capable of polishing at least the inner peripheral edge of the glass substrate 50 between the first circle c1 and the second circle c2. The glass substrate 50 is supported at the outer peripheral end by the outer peripheral end supporting device 25.

回転体21,22によって回転している研磨パッド23,24と、ガラス基板50の円孔50aの周囲の内周端部の両面との間に、砥粒(本実施形態では、2次研磨工程と同様、コロイダルシリカ)を含む研磨液(スラリー)が供給され、これにより、ガラス基板50の内周端部が相対向する一対の研磨パッド23,24の間に挟まれて表裏両面が研磨される。   Between the polishing pads 23 and 24 rotated by the rotators 21 and 22 and both surfaces of the inner peripheral edge around the circular hole 50a of the glass substrate 50 (in this embodiment, a secondary polishing step). Similarly, a polishing liquid (slurry) containing colloidal silica is supplied, whereby the inner peripheral edge of the glass substrate 50 is sandwiched between a pair of polishing pads 23 and 24 facing each other, and both front and back surfaces are polished. The

この具体的製造方法の2によれば、半径がr+0.30mmである円孔50aと同心円(第1の円)c1と、半径がr+4mmである円孔50aと同心円(第2の円)c2との間のガラス基板50の内周端部が研磨されるから、ハードディスクドライブへの搭載時の被クランプ部分である内周端部の平坦度が改善される。したがって、内周端部がハブとクランプとで挟持されたときに、内周端部に荷重が均一に作用し、昨今の高密度記録化にも十分対応可能な程度に記録媒体の変形が抑制され得る、高品質のHDD用ガラス基板50を安定生産することができる。   According to the second specific manufacturing method, the circular hole 50a having a radius of r + 0.30 mm and a concentric circle (first circle) c1, and the circular hole 50a having a radius of r + 4 mm and a concentric circle (second circle) c2 Since the inner peripheral end portion of the glass substrate 50 is polished, the flatness of the inner peripheral end portion, which is a clamped portion when mounted on the hard disk drive, is improved. Therefore, when the inner peripheral edge is sandwiched between the hub and the clamp, the load is uniformly applied to the inner peripheral edge, and the deformation of the recording medium is suppressed to such an extent that it can sufficiently cope with the recent high-density recording. The high-quality glass substrate 50 for HDD that can be manufactured can be stably produced.

<HDD用磁気記録媒体>
次に、前記HDD用ガラス基板50を用いて製造されたHDD用磁気記録媒体について説明する。本実施形態に係るHDD用磁気記録媒体は、前記HDD用ガラス基板50の主表面の上に記録層としての磁性膜が設けられたことにより製造されたものである。磁性膜は主表面の上に直接に又は間接に形成されてよい。磁性膜はガラス基板50の片面に又は両面に形成されてよい。
<Magnetic recording medium for HDD>
Next, an HDD magnetic recording medium manufactured using the HDD glass substrate 50 will be described. The HDD magnetic recording medium according to this embodiment is manufactured by providing a magnetic film as a recording layer on the main surface of the HDD glass substrate 50. The magnetic film may be formed directly or indirectly on the main surface. The magnetic film may be formed on one side or both sides of the glass substrate 50.

磁性膜の形成方法としては従来公知の方法を用いることができ、例えば磁性粒子を分散させた熱硬化性樹脂をガラス基板50上にスピンコートして形成する方法や、スパッタリングや無電解めっきにより形成する方法等が挙げられる。スピンコート法での膜厚は約0.3μm〜1.2μm程度、スパッタリング法での膜厚は0.04μm〜0.08μm程度、無電解めっき法での膜厚は0.05μm〜0.1μm程度であり、薄膜化及び高密度化の観点からは、スパッタリング法や無電解めっき法による膜形成が好ましい。   As a method for forming the magnetic film, a conventionally known method can be used. For example, a method in which a thermosetting resin in which magnetic particles are dispersed is spin-coated on the glass substrate 50, or a method in which sputtering or electroless plating is used. And the like. The film thickness by spin coating is about 0.3 μm to 1.2 μm, the film thickness by sputtering is about 0.04 μm to 0.08 μm, and the film thickness by electroless plating is 0.05 μm to 0.1 μm. From the viewpoint of thinning and high density, film formation by sputtering or electroless plating is preferable.

磁性膜に用いる磁性材料としては特に限定はなく、従来公知のものが使用できる。なかでも、高い保持力を得るために結晶異方性の高いCoを基本材料とし、残留磁束密度を調整する目的でNiやCrを加えたCo系合金等が好適である。具体的には、Coを主成分とするCoPt、CoCr、CoNi、CoNiCr、CoCrTa、CoPtCr、CoNiPt、CoNiCrPt、CoNiCrTa、CoCrPtTa、CoCrPtB、CoCrPtSiO等が好ましい。   The magnetic material used for the magnetic film is not particularly limited, and conventionally known materials can be used. Among them, a Co-based alloy or the like containing Ni and Cr as the basic material for adjusting the residual magnetic flux density is preferable in order to obtain high coercive force. Specifically, CoPt, CoCr, CoNi, CoNiCr, CoCrTa, CoPtCr, CoNiPt, CoNiCrPt, CoNiCrTa, CoCrPtTa, CoCrPtB, CoCrPtSiO, and the like whose main component is Co are preferable.

磁性膜は、非磁性膜(例えば、Cr、CrMo、CrV等)で分割し、ノイズの低減を図った多層構成(例えば、CoPtCr/CrMo/CoPtCr、CoCrPtTa/CrMo/CoCrPtTa等)としてもよい。   The magnetic film may be divided into a non-magnetic film (for example, Cr, CrMo, CrV, etc.) to have a multilayer structure (for example, CoPtCr / CrMo / CoPtCr, CoCrPtTa / CrMo / CoCrPtTa, etc.) in which noise is reduced.

前記磁性材料の他、フェライト系や鉄−希土類系のものや、SiO、BN等からなる非磁性膜中に、Fe、Co、FeCo、CoNiPt等の磁性粒子を分散させた構造のグラニュラー等でもよい。 The other magnetic material, ferrite or iron - and that of the rare earth, in a non-magnetic film made of SiO 2, BN, etc., Fe, Co, FeCo, in granular or the like of the structure obtained by dispersing magnetic particles such CoNiPt Good.

磁性膜は、内面型及び垂直型のいずれの記録形式であってもよい。   The magnetic film may be either an inner surface type or a vertical type recording format.

磁気ヘッドの滑りをよくするために磁性膜の表面に潤滑剤を薄くコーティングしてもよい。潤滑剤としては、例えば液体潤滑剤であるパーフロロポリエーテル(PFPE)をフレオン系等の溶媒で希釈したもの等が挙げられる。   In order to improve the sliding of the magnetic head, a lubricant may be thinly coated on the surface of the magnetic film. Examples of the lubricant include those obtained by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a freon-based solvent.

本実施形態では、必要に応じて、記録層としての磁性膜の他に、下地層や保護層を設けてもよい。HDD用磁気記録媒体における下地層は磁性膜に応じて選択される。下地層の材料としては、例えば、Cr、Mo、Ta、Ti、W、V、B、Al、Ni等の非磁性金属からなる群より選ばれる少なくとも一種以上の材料が挙げられる。Coを主成分とする磁性膜の場合は、磁気特性の向上等の観点から、Cr単体やCr合金であることが好ましい。下地層は単層とは限らず、同一又は異種の層を積層した複数層構造としても構わない。例えば、Cr/Cr、Cr/CrMo、Cr/CrV、NiAl/Cr、NiAl/CrMo、NiAl/CrV等の多層下地層とすることができる。   In the present embodiment, if necessary, an underlayer or a protective layer may be provided in addition to the magnetic film as the recording layer. The underlayer in the HDD magnetic recording medium is selected according to the magnetic film. Examples of the material for the underlayer include at least one material selected from the group consisting of nonmagnetic metals such as Cr, Mo, Ta, Ti, W, V, B, Al, and Ni. In the case of a magnetic film containing Co as a main component, it is preferable to use Cr alone or a Cr alloy from the viewpoint of improving magnetic characteristics. The underlayer is not limited to a single layer, and may have a multi-layer structure in which the same or different layers are stacked. For example, a multilayer underlayer such as Cr / Cr, Cr / CrMo, Cr / CrV, NiAl / Cr, NiAl / CrMo, or NiAl / CrV can be used.

保護層は、磁性膜の摩耗や腐食を防止するために設けられる。保護層としては、例えば、Cr層、Cr合金層、カーボン層、水素化カーボン層、ジルコニア層、シリカ層等が挙げられる。これらの保護層は、下地層や磁性膜等と共に、インライン型スパッタ装置で連続して形成できる。また、これらの保護層は、単層としてもよく、あるいは、同一又は異種の層からなる多層構造としてもよい。   The protective layer is provided to prevent wear and corrosion of the magnetic film. Examples of the protective layer include a Cr layer, a Cr alloy layer, a carbon layer, a hydrogenated carbon layer, a zirconia layer, and a silica layer. These protective layers can be continuously formed by an in-line sputtering apparatus together with the underlayer and the magnetic film. Further, these protective layers may be a single layer, or may have a multilayer structure composed of the same or different layers.

前記保護層上に、あるいは前記保護層に代えて、他の保護層を形成してもよい。例えば、前記保護層に代えて、Cr層の上にテトラアルコキシシランをアルコール系の溶媒で希釈した中に、コロイダルシリカ微粒子を分散して塗布し、さらに焼成することにより、二酸化ケイ素(SiO)層を形成してもよい。 Another protective layer may be formed on the protective layer or instead of the protective layer. For example, in place of the protective layer, colloidal silica fine particles are dispersed and applied in a tetraalkoxysilane diluted with an alcohol solvent on the Cr layer, and further baked to obtain silicon dioxide (SiO 2 ). A layer may be formed.

以上のように、基板として本実施形態に係るHDD用ガラス基板50を用いて製造されたHDD用磁気記録媒体をHDDに用いることで、HDDの高速回転時の磁気ヘッドの動作を安定にすることができる。   As described above, by using the HDD magnetic recording medium manufactured using the HDD glass substrate 50 according to the present embodiment as the substrate, the operation of the magnetic head at the time of high-speed rotation of the HDD can be stabilized. Can do.

また、本実施形態に係るHDD用磁気記録媒体は、ハードディスクドライブへの搭載時の被クランプ部分である内周端部が、昨今の高密度記録化にも十分対応可能な程度に平坦であり、内周端部がハブとクランプとで挟持されたときに、内周端部に荷重が均一に作用し、昨今の高密度記録化にも十分対応可能な程度に記録媒体の変形が抑制され得る、高品質のHDD用ガラス基板50が基板として用いられているから、ハードディスクドライブへの搭載時の変形が、昨今の高密度記録化にも十分対応可能な程度に抑制され得る、高品質のHDD用磁気記録媒体である。そのため、磁気ヘッドの浮上量の低減や、ヘッドスライダーの位置決め精度の向上が促進され、記録密度の増大、ひいては記憶容量の増大に寄与することができるHDD用磁気記録媒体である。   In addition, the HDD magnetic recording medium according to the present embodiment has an inner peripheral end that is a clamped portion when mounted on a hard disk drive, which is flat enough to cope with recent high-density recording, When the inner peripheral edge is sandwiched between the hub and the clamp, the load acts uniformly on the inner peripheral edge, and the deformation of the recording medium can be suppressed to the extent that it can sufficiently cope with the recent high density recording. Since the high-quality glass substrate 50 for HDD is used as the substrate, the high-quality HDD capable of suppressing deformation when mounted on the hard disk drive to a level that can sufficiently cope with the recent high-density recording. Magnetic recording medium. Therefore, the magnetic recording medium for HDD is capable of reducing the flying height of the magnetic head and improving the positioning accuracy of the head slider, thereby contributing to an increase in recording density and an increase in storage capacity.

なお、本実施形態では、研磨工程は、2回に分けて行ったが、これに限らず、1回のみ行ってもよい。また、化学強化工程を研磨工程の後に行ったが、状況に応じて研磨工程の前に行ってもよい。また、状況に応じて化学強化工程を省略することもできる。   In the present embodiment, the polishing step is performed twice. However, the polishing step is not limited to this and may be performed only once. Moreover, although the chemical strengthening process was performed after the polishing process, it may be performed before the polishing process depending on the situation. Further, the chemical strengthening step can be omitted depending on the situation.

さらに、落下強度対策として、ガラス基板の主表面以外の外周端面や内周端面の強化を行ってもよいし、ガラス基板に生じたキズのエッジ緩和処理として、ガラス基板をHF浸漬処理に供してもよい。   Furthermore, as measures against drop strength, the outer peripheral end face and the inner peripheral end face other than the main surface of the glass substrate may be strengthened, or the glass substrate is subjected to HF immersion treatment as an edge mitigation treatment for scratches generated on the glass substrate. Also good.

本実施形態に係るHDD用ガラス基板は、HDD用磁気記録媒体の製造用途に限定されるものではなく、例えば、光磁気ディスクや光ディスク等の製造用途にも用いることができる。   The glass substrate for HDD according to the present embodiment is not limited to the use for manufacturing a magnetic recording medium for HDD, and can be used for the manufacture of, for example, a magneto-optical disk or an optical disk.

以下、実施例及び比較例を通して、本発明をさらに詳しく説明する。ただし、本発明はこの実施例に限定されるものではない。   Hereinafter, the present invention will be described in more detail through examples and comparative examples. However, the present invention is not limited to this embodiment.

<HDD用ガラス基板の製造>
実施例1は、図6に示した製造工程(図7に示した内周端部研磨機20を用いた)に従い、実施例2は、図5に示した製造工程に従い、比較例1及び2は、図2に示した製造工程に従い、それぞれ、下記の組成(質量%)のガラス素材を用いて、外径が約65mm(2.5インチ)、内径(円孔の径)が20mm、板厚が約0.63mmの環状のアルミノシリケート製ガラス基板を作製した。
<Manufacture of glass substrates for HDD>
Example 1 is according to the manufacturing process shown in FIG. 6 (using the inner peripheral edge polishing machine 20 shown in FIG. 7), and Example 2 is according to the manufacturing process shown in FIG. Is a glass material having the following composition (mass%) according to the manufacturing process shown in FIG. 2, each having an outer diameter of about 65 mm (2.5 inches), an inner diameter (diameter of the circular hole) of 20 mm, a plate An annular aluminosilicate glass substrate having a thickness of about 0.63 mm was produced.

(ガラス素材の組成)
・SiO:50〜70%
・Al:0.1〜20%
・B:0〜5%
ただし、SiO+Al+B=50〜85%であり、また、LiO+NaO+KO=0.1〜20%であり、また、MgO+CaO+BaO+SrO+ZnO=2〜20%である。
(Composition of glass material)
・ SiO 2 : 50 to 70%
· Al 2 O 3: 0.1~20%
・ B 2 O 3 : 0 to 5%
However, SiO 2 + Al 2 O 3 + B 2 O 3 = 50 to 85%, Li 2 O + Na 2 O + K 2 O = 0.1 to 20%, and MgO + CaO + BaO + SrO + ZnO = 2 to 20%.

<HDD用ガラス基板の評価>
[内周端部の板厚の計測]
得られたガラス基板の内周端部の厚みを、キーエンス社製の「SI−F80R」を用いて計測した。厚みを計測した円は、半径が円孔の半径r(10mm)+0.30mmである、円孔と同心の第1の円c1(半径10.30mm)と、半径が円孔の半径r(10mm)+4mmである、円孔と同心の第2の円c2(半径14mm)と、半径が円孔の半径r(10mm)+2mmである、円孔と同心の内周端部内にある円C(半径12mm)との3つの円とした。そして、各円において、板厚バラツキ(=│(厚みt)−(厚みの平均値tave)│)を算出し、その最大値を記録し、平均値を求めた。サンプル数は、実施例1及び2、比較例1及び2において、それぞれ100枚とした。結果を表1に示す。値は100枚の平均値である。
<Evaluation of glass substrate for HDD>
[Measurement of the thickness of the inner peripheral edge]
The thickness of the inner peripheral end of the obtained glass substrate was measured using “SI-F80R” manufactured by Keyence Corporation. The circle whose thickness is measured is a first circle c1 (radius 10.30 mm) concentric with the circular hole having a radius r (10 mm) +0.30 mm of the circular hole, and a radius r (10 mm) of the circular hole. ) +4 mm, a second circle c2 (radius 14 mm) concentric with the circular hole, and a circle C (radius) in the inner peripheral end concentric with the circular hole, the radius being the radius r (10 mm) +2 mm of the circular hole 12 mm) and three circles. And in each circle, thickness variation (= | (thickness t)-(average value of thicknesses) |) was calculated, the maximum value was recorded, and the average value was obtained. The number of samples was 100 in each of Examples 1 and 2 and Comparative Examples 1 and 2. The results are shown in Table 1. The value is an average value of 100 sheets.

<HDD用磁気記録媒体の製造>
得られたガラス基板の主表面の上に磁性膜(記録層)を設けて磁気記録媒体とした。すなわち、ガラス基板側から、Ni−Alからなる下地層(厚み約100nm)、Co−Cr−Ptからなる記録層(厚み20nm)、DLC(Diamond Like Carbon)からなる保護膜(厚み5nm)を順次積層した。
<Manufacture of HDD magnetic recording media>
A magnetic film (recording layer) was provided on the main surface of the obtained glass substrate to obtain a magnetic recording medium. That is, from the glass substrate side, a base layer made of Ni—Al (thickness of about 100 nm), a recording layer made of Co—Cr—Pt (thickness 20 nm), and a protective film made of DLC (Diamond Like Carbon) (thickness 5 nm) are sequentially formed. Laminated.

<HDD用磁気記録媒体の評価>
[ドライブ搭載時の変形量の計測]
得られた磁気記録媒体の内周端部をハブとクランプとで挟持してハードディスクドライブに搭載した。搭載した磁気記録媒体の変形の度合いを調べるため、磁気記録媒体の周方向のTIR(Total Indicated Runout)を計測した。TIRは、表面の平坦度の指標であり、磁気記録媒体の周方向のTIRとは、磁気記録媒体の主表面に最適にフィットした平面を最小二乗法で求め、磁気記録媒体の高さを周方向に計測し、高さが前記平面よりも上方にある最高点(P)と下方にある最低点(V)との差の絶対値(P−V値)をいう。
<Evaluation of HDD magnetic recording media>
[Measure deformation when the drive is mounted]
The inner peripheral edge of the obtained magnetic recording medium was sandwiched between a hub and a clamp and mounted on a hard disk drive. In order to investigate the degree of deformation of the mounted magnetic recording medium, the TIR (Total Indicated Runout) in the circumferential direction of the magnetic recording medium was measured. The TIR is an index of the flatness of the surface. The TIR in the circumferential direction of the magnetic recording medium is a surface that is optimally fitted to the main surface of the magnetic recording medium by a least square method to determine the height of the magnetic recording medium. The absolute value (P-V value) of the difference between the highest point (P) whose height is above the plane and the lowest point (V) below the plane, measured in the direction.

このような周方向のTIRは、例えば、白色光の干渉を利用して表面形状を測定する方式(例えば、Phase Shift Technology社製の「Optiflat」)や、被測定面に対して斜めにレーザー光を入射することで垂直入射方式に比べて高い反射率を得ることができ、粗い面形状においても測定が可能な方式(例えば、TROPEL社製の「Flat Master FM100XRA」)等により計測することができる。   Such TIR in the circumferential direction is, for example, a method of measuring the surface shape using interference of white light (for example, “Optiflat” manufactured by Phase Shift Technology) or laser light obliquely with respect to the surface to be measured. Can be obtained by a method (for example, “Flat Master FM100XRA” manufactured by TROPEL) or the like that can measure even with a rough surface shape. .

周方向のTIRを計測した円は、半径が28mmである、円孔と同心の記録領域内にある円c3(図1参照)とした。サンプル数は、実施例1及び2、比較例1及び2において、それぞれ100枚とした。結果を表1に示す。値は100枚の平均値である。   The circle whose TIR in the circumferential direction was measured was a circle c3 (see FIG. 1) having a radius of 28 mm and in a recording area concentric with the circular hole. The number of samples was 100 in each of Examples 1 and 2 and Comparative Examples 1 and 2. The results are shown in Table 1. The value is an average value of 100 sheets.

[リードライト試験]
得られた磁気記録媒体について、DFH機構を搭載した磁気ヘッドで、リードライト試験を行い、エラーの発生枚数を記録し、下記基準で評価した。サンプル数は、実施例1及び2、比較例1及び2において、それぞれ10000枚とした。結果を表1に示す。
[Read / write test]
The obtained magnetic recording medium was subjected to a read / write test with a magnetic head equipped with a DFH mechanism, and the number of error occurrences was recorded and evaluated according to the following criteria. The number of samples was 10,000 in each of Examples 1 and 2 and Comparative Examples 1 and 2. The results are shown in Table 1.

(評価基準)
◎:エラー発生枚数が0〜5(申し分のない優良品質)
○:エラー発生枚数が6〜10(良品)
△:エラー発生枚数が11〜20(使用できないことはないが品質不良率が高い)
×:エラー発生枚数が21以上(不良品)
(Evaluation criteria)
A: 0 to 5 error occurrences (excellent quality)
○: The number of error occurrences is 6 to 10 (good product)
Δ: The number of error occurrences is 11 to 20 (although it cannot be used, the quality defect rate is high)
×: 21 or more errors occurred (defective product)

Figure 2013016217
Figure 2013016217

<結果の考察>
ガラス基板の内周端部の板厚バラツキが0.05μm以下であった実施例1及び2は、それが0.05μmを超えていた比較例1及び2に比べて、ハードディスクドライブへの搭載時の磁気記録媒体の変形量が少なく、また、リードライトエラー枚数も少なかった。
<Consideration of results>
Examples 1 and 2 in which the thickness variation of the inner peripheral edge of the glass substrate was 0.05 μm or less were compared with Comparative Examples 1 and 2 in which it exceeded 0.05 μm, when mounted on a hard disk drive. The amount of deformation of the magnetic recording medium was small, and the number of read / write errors was also small.

10 研磨機
11 上定盤
12 下定盤
20 内周端部研磨機
21、22 回転体
23、24 研磨パッド
25 外周端部支持装置
50 ガラス基板
50a 円孔
50b、50c 主表面
C 内周端部内の円
c1 半径がr+0.30mmの第1の円
c2 半径がr+4mmの第2の円
c3 記録領域内の円
O ガラス基板中心
P 研磨パッド
R Cの半径
r 円孔の半径
r1 c1の半径
r2 c2の半径
S 基準面
t ガラス基板の厚み
DESCRIPTION OF SYMBOLS 10 Polishing machine 11 Upper surface plate 12 Lower surface plate 20 Inner peripheral edge part polishing machine 21, 22 Rotating body 23, 24 Polishing pad 25 Outer peripheral edge support apparatus 50 Glass substrate 50a Circular hole 50b, 50c Main surface C In inner peripheral edge part Circle c1 First circle c2 with radius r + 0.30 mm Second circle c3 with radius r + 4 mm Circle O in the recording area Glass substrate center P Radius r of polishing pad RC R of radius r1 of circle hole r1 c1 Radius S Reference surface t Glass substrate thickness

Claims (5)

中心部に円孔を有するHDD用ガラス基板であって、
円孔の半径をr、半径がr+0.30mmである、円孔と同心の第1の円と、半径がr+4mmである、円孔と同心の第2の円との間にある、円孔と同心の円に沿って計測したガラス基板の厚みの最大値をtmax、最小値をtmin、平均値をtaveとしたときに、tmax≦tave+0.05μmであり、かつ、tmin≧tave−0.05μmであることを特徴とするHDD用ガラス基板。
A glass substrate for HDD having a circular hole in the center,
A circular hole having a radius of r and a radius of r + 0.30 mm, a first circle concentric with the circular hole and a radius of r + 4 mm between the circular hole and the second concentric circle; When the maximum value of the thickness of the glass substrate measured along the concentric circle is tmax, the minimum value is tmin, and the average value is tave, tmax ≦ tave + 0.05 μm and tmin ≧ tave−0.05 μm. There is a glass substrate for HDD.
面記録密度が630Gb/平方インチ以上のHDD用磁気記録媒体又はトラックピッチ幅が250kTPI以上のHDD用磁気記録媒体の基板に用いられることを特徴とする請求項1に記載のHDD用ガラス基板。   2. The glass substrate for HDD according to claim 1, which is used for a substrate of a magnetic recording medium for HDD having a surface recording density of 630 Gb / square inch or more or a magnetic recording medium for HDD having a track pitch width of 250 kTPI or more. 請求項1に記載のHDD用ガラス基板の製造方法であって、
ガラス基板を上定盤と下定盤との間に挟んで研磨する研磨工程と、
研磨工程の後、上定盤と下定盤との平行度を矯正する平行度矯正工程とを含むことを特徴とするHDD用ガラス基板の製造方法。
It is a manufacturing method of the glass substrate for HDD according to claim 1,
A polishing step of polishing by sandwiching a glass substrate between an upper surface plate and a lower surface plate,
The manufacturing method of the glass substrate for HDD characterized by including the parallelism correction process of correcting the parallelism of an upper surface plate and a lower surface plate after a grinding | polishing process.
請求項1に記載のHDD用ガラス基板の製造方法であって、
第1の円と第2の円との間のガラス基板の内周端部を研磨する内周端部研磨工程を含むことを特徴とするHDD用ガラス基板の製造方法。
It is a manufacturing method of the glass substrate for HDD according to claim 1,
The manufacturing method of the glass substrate for HDD characterized by including the inner peripheral edge part grinding | polishing process of grind | polishing the inner peripheral edge part of the glass substrate between a 1st circle | round | yen and a 2nd circle | round | yen.
請求項1又は2に記載のHDD用ガラス基板の主表面の上に記録層が設けられたことにより製造されたことを特徴とするHDD用磁気記録媒体。   An HDD magnetic recording medium manufactured by providing a recording layer on a main surface of the HDD glass substrate according to claim 1.
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