JP2012529750A5 - - Google Patents

Download PDF

Info

Publication number
JP2012529750A5
JP2012529750A5 JP2012515098A JP2012515098A JP2012529750A5 JP 2012529750 A5 JP2012529750 A5 JP 2012529750A5 JP 2012515098 A JP2012515098 A JP 2012515098A JP 2012515098 A JP2012515098 A JP 2012515098A JP 2012529750 A5 JP2012529750 A5 JP 2012529750A5
Authority
JP
Japan
Prior art keywords
coil
current
application example
processing system
inductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012515098A
Other languages
English (en)
Japanese (ja)
Other versions
JP5643301B2 (ja
JP2012529750A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2010/037942 external-priority patent/WO2010144555A2/en
Publication of JP2012529750A publication Critical patent/JP2012529750A/ja
Publication of JP2012529750A5 publication Critical patent/JP2012529750A5/ja
Application granted granted Critical
Publication of JP5643301B2 publication Critical patent/JP5643301B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2012515098A 2009-06-12 2010-06-09 プラズマ処理システム及び電力分配器 Active JP5643301B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18671009P 2009-06-12 2009-06-12
US61/186,710 2009-06-12
PCT/US2010/037942 WO2010144555A2 (en) 2009-06-12 2010-06-09 Adjusting current ratios in inductively coupled plasma processing systems

Publications (3)

Publication Number Publication Date
JP2012529750A JP2012529750A (ja) 2012-11-22
JP2012529750A5 true JP2012529750A5 (https=) 2013-07-25
JP5643301B2 JP5643301B2 (ja) 2014-12-17

Family

ID=43305377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012515098A Active JP5643301B2 (ja) 2009-06-12 2010-06-09 プラズマ処理システム及び電力分配器

Country Status (7)

Country Link
US (1) US9305750B2 (https=)
JP (1) JP5643301B2 (https=)
KR (1) KR101708075B1 (https=)
CN (1) CN102804930A (https=)
SG (2) SG10201402467SA (https=)
TW (1) TW201127224A (https=)
WO (1) WO2010144555A2 (https=)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8501631B2 (en) * 2009-11-19 2013-08-06 Lam Research Corporation Plasma processing system control based on RF voltage
WO2011102083A1 (ja) * 2010-02-19 2011-08-25 株式会社アルバック プラズマ処理装置及びプラズマ処理方法
JP5781349B2 (ja) * 2011-03-30 2015-09-24 東京エレクトロン株式会社 プラズマ処理装置
US10056231B2 (en) * 2011-04-28 2018-08-21 Lam Research Corporation TCCT match circuit for plasma etch chambers
US9462672B2 (en) 2012-02-22 2016-10-04 Lam Research Corporation Adjustment of power and frequency based on three or more states
US10157729B2 (en) 2012-02-22 2018-12-18 Lam Research Corporation Soft pulsing
US9114666B2 (en) 2012-02-22 2015-08-25 Lam Research Corporation Methods and apparatus for controlling plasma in a plasma processing system
US9842725B2 (en) 2013-01-31 2017-12-12 Lam Research Corporation Using modeling to determine ion energy associated with a plasma system
US10128090B2 (en) 2012-02-22 2018-11-13 Lam Research Corporation RF impedance model based fault detection
US9320126B2 (en) 2012-12-17 2016-04-19 Lam Research Corporation Determining a value of a variable on an RF transmission model
US9197196B2 (en) 2012-02-22 2015-11-24 Lam Research Corporation State-based adjustment of power and frequency
CN103060778B (zh) * 2013-01-23 2015-03-11 深圳市劲拓自动化设备股份有限公司 平板式pecvd装置
KR20140122548A (ko) * 2013-04-10 2014-10-20 피에스케이 주식회사 전력 공급 장치, 전력 공급 방법, 그리고 그를 이용한 기판 처리 장치
KR102175081B1 (ko) * 2013-12-27 2020-11-06 세메스 주식회사 플라즈마 발생 장치 및 그를 포함하는 기판 처리 장치
US9594105B2 (en) 2014-01-10 2017-03-14 Lam Research Corporation Cable power loss determination for virtual metrology
US10950421B2 (en) 2014-04-21 2021-03-16 Lam Research Corporation Using modeling for identifying a location of a fault in an RF transmission system for a plasma system
CN104332379B (zh) * 2014-09-02 2017-12-19 清华大学 等离子体放电装置
US9515633B1 (en) * 2016-01-11 2016-12-06 Lam Research Corporation Transformer coupled capacitive tuning circuit with fast impedance switching for plasma etch chambers
US9839109B1 (en) * 2016-05-30 2017-12-05 Applied Materials, Inc. Dynamic control band for RF plasma current ratio control
US10553465B2 (en) * 2016-07-25 2020-02-04 Lam Research Corporation Control of water bow in multiple stations
CN108271307B (zh) * 2016-12-30 2019-11-05 中微半导体设备(上海)股份有限公司 电感耦合等离子体处理装置与等离子体产生装置
CN108882494B (zh) * 2017-05-08 2022-06-17 北京北方华创微电子装备有限公司 等离子体装置
KR102644960B1 (ko) 2017-11-29 2024-03-07 코멧 테크놀로지스 유에스에이, 인크. 임피던스 매칭 네트워크 제어를 위한 리튜닝
CN111192752B (zh) * 2018-11-14 2021-08-31 江苏鲁汶仪器有限公司 一种功率分配电感耦合线圈及具有其的等离子体处理装置
CN111199860A (zh) * 2018-11-20 2020-05-26 江苏鲁汶仪器有限公司 一种刻蚀均匀性调节装置及方法
US11114279B2 (en) 2019-06-28 2021-09-07 COMET Technologies USA, Inc. Arc suppression device for plasma processing equipment
US11107661B2 (en) 2019-07-09 2021-08-31 COMET Technologies USA, Inc. Hybrid matching network topology
EP4022656A4 (en) 2019-08-28 2023-10-04 Comet Technologies USA, Inc HIGH POWER LOW FREQUENCY COILS
US11342887B2 (en) * 2019-12-18 2022-05-24 Nxp Usa, Inc. Wideband RF power splitters and amplifiers including wideband RF power splitters
KR102147877B1 (ko) * 2020-04-01 2020-08-25 주식회사 기가레인 플라즈마 안테나 모듈
CN113496863B (zh) * 2020-04-01 2022-04-12 吉佳蓝科技股份有限公司 等离子体天线模块
KR20230071629A (ko) * 2021-11-16 2023-05-23 삼성전자주식회사 플라즈마 처리 장치 및 이를 이용한 반도체 소자 제조 방법
US12087549B2 (en) 2021-12-30 2024-09-10 Mks Instruments, Inc. Demagnetizing coils for linearity improvement of current ratio of plasma processing systems
JP2024007812A (ja) * 2022-07-06 2024-01-19 パナソニックＩｐマネジメント株式会社 プラズマ処理装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW296534B (https=) * 1993-12-17 1997-01-21 Tokyo Electron Co Ltd
US5907221A (en) * 1995-08-16 1999-05-25 Applied Materials, Inc. Inductively coupled plasma reactor with an inductive coil antenna having independent loops
US6054013A (en) 1996-02-02 2000-04-25 Applied Materials, Inc. Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density
EP1039569B1 (en) 1997-11-10 2009-01-14 Nippon Zeon Co., Ltd. Binder containing vinyl alcohol polymer, slurry, electrode, and secondary battery with nonaqueous electrolyte
US6326597B1 (en) * 1999-04-15 2001-12-04 Applied Materials, Inc. Temperature control system for process chamber
KR100338057B1 (ko) * 1999-08-26 2002-05-24 황 철 주 유도 결합형 플라즈마 발생용 안테나 장치
US6507155B1 (en) 2000-04-06 2003-01-14 Applied Materials Inc. Inductively coupled plasma source with controllable power deposition
JP2003100723A (ja) 2001-09-27 2003-04-04 Tokyo Electron Ltd 誘導結合プラズマ処理装置
US6876155B2 (en) * 2002-12-31 2005-04-05 Lam Research Corporation Plasma processor apparatus and method, and antenna
KR101144018B1 (ko) * 2004-05-28 2012-05-09 램 리써치 코포레이션 복수 ｒｆ 주파수에 반응하는 전극을 갖는 플라즈마 처리기
JP2006032954A (ja) * 2004-07-12 2006-02-02 Applied Materials Inc 低インダクタンスプラズマチャンバーのための装置及び方法
JP4884901B2 (ja) 2006-09-21 2012-02-29 三菱重工業株式会社 薄膜製造装置及び太陽電池の製造方法
KR100898165B1 (ko) 2006-11-24 2009-05-19 엘지전자 주식회사 플라즈마 발생장치 및 방법
KR20080102615A (ko) * 2007-05-21 2008-11-26 네스트 주식회사 멀티-모드 플라즈마 생성 방법 및 장치
JP5329167B2 (ja) 2007-11-21 2013-10-30 東京エレクトロン株式会社 誘導結合プラズマ処理装置、誘導結合プラズマ処理方法および記憶媒体

Similar Documents

Publication Publication Date Title
JP2012529750A5 (https=)
KR20110058699A (ko) 플라즈마 처리 장치
KR101196309B1 (ko) 플라즈마 발생 장치
US10573493B2 (en) Inductively coupled plasma apparatus
KR101708075B1 (ko) 유도 결합 플라즈마 처리 시스템에서의 전류 비율 조정
US20110097901A1 (en) Dual mode inductively coupled plasma reactor with adjustable phase coil assembly
KR102070471B1 (ko) 플라즈마 처리 장치 및 필터 유닛
JP2006524422A (ja) プラズマ発生装置、方法、および調整可能デューティサイクルを有するｒｆ駆動回路
KR20120112184A (ko) 플라즈마 처리 장치 및 플라즈마 처리 방법
CN110800377B (zh) 等离子体处理装置
JP2011103346A (ja) プラズマ処理装置
US20130062311A1 (en) Inductively coupled plasma processing apparatus and method for processing substrate with the same
CN110800378A (zh) 等离子体处理装置
TWI852088B (zh) 用於電感耦合電漿系統的去磁電路及其射頻電力發生器
TW200302682A (en) Plasma processing apparatus capable of performing uniform plasma treatment by preventing drift in plasma discharge current
KR102610976B1 (ko) 고전력 rf 나선 코일 필터
CN106920732B (zh) 一种电极结构及icp刻蚀机
KR101986744B1 (ko) 플라즈마 처리 장치 및 방법
CN109659217A (zh) 用于多等离子处理腔的射频系统
KR20110046256A (ko) 조정가능한 위상 코일 어셈블리를 갖는 듀얼 모드 유도 결합 플라즈마 반응기
JP5595136B2 (ja) 誘導結合プラズマ発生装置
KR101918357B1 (ko) Radio-Frequency 전력 유도결합 플라즈마 발생장치
TW201436652A (zh) 電漿處理裝置
KR20110134217A (ko) 다중 분할 전극 세트를 위한 급전장치를 구비한 플라즈마 챔버
KR20160068252A (ko) 플라즈마 발생모듈 및 이를 포함하는 플라즈마 처리장치