JP2012527782A5 - - Google Patents

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Publication number
JP2012527782A5
JP2012527782A5 JP2012512033A JP2012512033A JP2012527782A5 JP 2012527782 A5 JP2012527782 A5 JP 2012527782A5 JP 2012512033 A JP2012512033 A JP 2012512033A JP 2012512033 A JP2012512033 A JP 2012512033A JP 2012527782 A5 JP2012527782 A5 JP 2012527782A5
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JP
Japan
Prior art keywords
metal paste
inorganic
finger lines
glass frit
paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012512033A
Other languages
English (en)
Japanese (ja)
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JP2012527782A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2010/035579 external-priority patent/WO2010135535A1/en
Publication of JP2012527782A publication Critical patent/JP2012527782A/ja
Publication of JP2012527782A5 publication Critical patent/JP2012527782A5/ja
Pending legal-status Critical Current

Links

JP2012512033A 2009-05-20 2010-05-20 シリコンウエハの前面にグリッド電極を形成する方法 Pending JP2012527782A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17989109P 2009-05-20 2009-05-20
US61/179,891 2009-05-20
PCT/US2010/035579 WO2010135535A1 (en) 2009-05-20 2010-05-20 Process of forming a grid electrode on the front-side of a silicon wafer

Publications (2)

Publication Number Publication Date
JP2012527782A JP2012527782A (ja) 2012-11-08
JP2012527782A5 true JP2012527782A5 (https=) 2013-07-04

Family

ID=42271962

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012512033A Pending JP2012527782A (ja) 2009-05-20 2010-05-20 シリコンウエハの前面にグリッド電極を形成する方法

Country Status (7)

Country Link
US (1) US8372679B2 (https=)
EP (1) EP2433306A1 (https=)
JP (1) JP2012527782A (https=)
KR (1) KR101322142B1 (https=)
CN (1) CN102428568A (https=)
TW (1) TWI504010B (https=)
WO (1) WO2010135535A1 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010117788A1 (en) * 2009-03-30 2010-10-14 E. I. Du Pont De Nemours And Company Metal pastes and use thereof in the production of silicon solar cells
CN102479883A (zh) * 2009-11-27 2012-05-30 无锡尚德太阳能电力有限公司 太阳电池正面电极的形成方法
US20110240124A1 (en) * 2010-03-30 2011-10-06 E.I. Du Pont De Nemours And Company Metal pastes and use thereof in the production of silicon solar cells
CN102947942B (zh) * 2010-06-18 2015-12-16 弗劳恩霍弗实用研究促进协会 制造光伏太阳能电池的金属接触结构的方法
CN102655030B (zh) * 2011-03-02 2015-07-15 韩国电子通信研究院 导电组合物、含其的硅太阳能电池、及其制造方法
US20130061918A1 (en) * 2011-03-03 2013-03-14 E. I. Dupont De Nemours And Company Process for the formation of a silver back electrode of a passivated emitter and rear contact silicon solar cell
KR101103501B1 (ko) * 2011-05-30 2012-01-09 한화케미칼 주식회사 태양전지 및 이의 제조방법
DE102011056632A1 (de) 2011-12-19 2013-06-20 Schott Solar Ag Verfahren zum Ausbilden einer Frontseitenmetallisierung einer Solarzelle sowie Solarzelle
WO2013105750A1 (ko) * 2012-01-10 2013-07-18 주식회사 젠스엔지니어링 전도성 페이스트를 전극으로 사용하는 실리콘 태양전지 모듈 및 그 제조 방법
KR101363344B1 (ko) 2012-01-10 2014-02-19 주식회사 젠스엔지니어링 전도성 페이스트를 전극으로 사용하는 실리콘 태양전지 모듈 및 그 제조 방법.
US20130183795A1 (en) * 2012-01-16 2013-07-18 E I Du Pont De Nemours And Company Solar cell back side electrode
JP5977540B2 (ja) * 2012-03-05 2016-08-24 シャープ株式会社 太陽電池の製造方法、製造装置及び太陽電池
US9722104B2 (en) 2014-11-28 2017-08-01 Lg Electronics Inc. Solar cell and method for manufacturing the same
CN114464690B (zh) * 2020-08-28 2023-02-07 晶科能源股份有限公司 太阳能电池栅线结构和光伏组件
CN114628252B (zh) * 2022-03-09 2024-10-25 通威太阳能（安徽）有限公司 硅片的碱抛光方法、perc电池及其制备方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03502627A (ja) * 1988-06-10 1991-06-13 エイエスイー・アメリカス・インコーポレーテッド 太陽電池用接点製作の改良された方法
WO1992022928A1 (en) 1991-06-11 1992-12-23 Mobil Solar Energy Corporation Improved solar cell and method of making same
US5178685A (en) 1991-06-11 1993-01-12 Mobil Solar Energy Corporation Method for forming solar cell contacts and interconnecting solar cells
JP4121928B2 (ja) 2003-10-08 2008-07-23 シャープ株式会社 太陽電池の製造方法
US7462304B2 (en) * 2005-04-14 2008-12-09 E.I. Du Pont De Nemours And Company Conductive compositions used in the manufacture of semiconductor device
EP2058865B1 (en) * 2006-08-31 2016-12-14 Shin-Etsu Handotai Co., Ltd. Semiconductor substrate, electrode forming method, and solar cell fabricating method
JP5091161B2 (ja) * 2006-12-26 2012-12-05 京セラ株式会社 太陽電池素子及び太陽電池素子の製造方法
US8236598B2 (en) * 2007-08-31 2012-08-07 Ferro Corporation Layered contact structure for solar cells
TW200926210A (en) * 2007-09-27 2009-06-16 Murata Manufacturing Co Ag electrode paste, solar battery cell, and process for producing the solar battery cell
WO2009059302A1 (en) * 2007-11-02 2009-05-07 Alliance For Sustainable Energy, Llc Fabrication of contacts for silicon solar cells including printing burn through layers

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