JP2012522346A5 - - Google Patents

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Publication number
JP2012522346A5
JP2012522346A5 JP2012502763A JP2012502763A JP2012522346A5 JP 2012522346 A5 JP2012522346 A5 JP 2012522346A5 JP 2012502763 A JP2012502763 A JP 2012502763A JP 2012502763 A JP2012502763 A JP 2012502763A JP 2012522346 A5 JP2012522346 A5 JP 2012522346A5
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JP
Japan
Prior art keywords
milling
milled
depth
dimensional
paths
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Application number
JP2012502763A
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English (en)
Japanese (ja)
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JP5647220B2 (ja
JP2012522346A (ja
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Priority claimed from GBGB0905571.6A external-priority patent/GB0905571D0/en
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Publication of JP2012522346A publication Critical patent/JP2012522346A/ja
Publication of JP2012522346A5 publication Critical patent/JP2012522346A5/ja
Application granted granted Critical
Publication of JP5647220B2 publication Critical patent/JP5647220B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012502763A 2009-03-31 2010-03-29 マイクロ及びナノスケールの３次元構造の製造方法並びに製造装置 Expired - Fee Related JP5647220B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0905571.6 2009-03-31
GBGB0905571.6A GB0905571D0 (en) 2009-03-31 2009-03-31 Method and apparatus for producing three dimensional nano and micro scale structures
PCT/GB2010/000599 WO2010112827A2 (en) 2009-03-31 2010-03-29 Method and apparatus for producing three dimensional nano and micro scale structures

Publications (3)

Publication Number Publication Date
JP2012522346A JP2012522346A (ja) 2012-09-20
JP2012522346A5 true JP2012522346A5 (https=) 2013-05-16
JP5647220B2 JP5647220B2 (ja) 2014-12-24

Family

ID=40672060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012502763A Expired - Fee Related JP5647220B2 (ja) 2009-03-31 2010-03-29 マイクロ及びナノスケールの３次元構造の製造方法並びに製造装置

Country Status (5)

Country Link
US (1) US20120067718A1 (https=)
EP (1) EP2415066B1 (https=)
JP (1) JP5647220B2 (https=)
GB (1) GB0905571D0 (https=)
WO (1) WO2010112827A2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8618518B2 (en) 2011-03-15 2013-12-31 Avago Technologies General Ip (Singapore) Pte. Ltd. Apparatus and method for forming a solid immersion lens using a binary bitmap milling pattern
US8937019B2 (en) 2012-04-03 2015-01-20 Varian Semiconductor Equipment Associates, Inc. Techniques for generating three dimensional structures
US10465293B2 (en) * 2012-08-31 2019-11-05 Fei Company Dose-based end-pointing for low-kV FIB milling TEM sample preparation
WO2014074649A1 (en) 2012-11-06 2014-05-15 Purdue Research Foundation Methods for directed irradiation synthesis with ion and thermal beams
TWI686837B (zh) * 2012-12-31 2020-03-01 美商Fei公司 用於具有一帶電粒子束之傾斜或偏斜研磨操作之基準設計
US9057670B2 (en) * 2013-05-30 2015-06-16 International Business Machines Corporation Transmission electron microscope sample fabrication
US11004656B2 (en) * 2014-10-15 2021-05-11 Gatan, Inc. Methods and apparatus for determining, using, and indicating ion beam working properties

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09283496A (ja) * 1996-04-18 1997-10-31 Hitachi Ltd 荷電粒子ビーム照射によるパターン形成方法及びその装置
US7072267B2 (en) * 2001-11-26 2006-07-04 William Monford Wood Image and data storage by focused ion beam recordation and method thereof
JP4304947B2 (ja) * 2002-09-26 2009-07-29 株式会社日立製作所 磁気記録媒体とそれを用いた磁気メモリ装置、磁気記録方法、信号再生方法
JP2004226079A (ja) * 2003-01-20 2004-08-12 Seiko Instruments Inc 表面あるいは断面加工観察方法及びその装置
CN100415636C (zh) * 2003-02-28 2008-09-03 松井真二 利用fib-cvd制造三维纳米结构的方法及绘制系统
US6838683B1 (en) * 2003-06-18 2005-01-04 Intel Corporation Focused ion beam microlathe
JP2005177878A (ja) * 2003-12-16 2005-07-07 Masao Murakawa 微細３次元凸形状体の作成方法
US7254884B2 (en) * 2004-09-20 2007-08-14 Hitachi Global Storage Technologies Netherlands B.V. Method for fabricating a pole tip in a magnetic transducer using feed-forward and feedback
KR20070093053A (ko) * 2004-11-15 2007-09-17 크레던스 시스템스 코포레이션 집속 이온 빔 데이터 분석에 관한 시스템 및 방법
US7427753B2 (en) * 2005-06-16 2008-09-23 Applied Materials, Israel, Ltd. Method of cross-section milling with focused ion beam (FIB) device
JP2007069329A (ja) * 2005-09-08 2007-03-22 Japan Science & Technology Agency 微小立体構造操作具の作製方法及びそれによって作製される微小立体構造操作具
JP4676339B2 (ja) * 2006-01-10 2011-04-27 株式会社日立ハイテクノロジーズ 荷電ビーム装置及び試料作製・観察方法
GB2438241A (en) 2006-05-16 2007-11-21 Secretary Trade Ind Brit Machining of microstructures
JP4388101B2 (ja) * 2007-06-19 2009-12-24 株式会社日立ハイテクノロジーズ 荷電粒子線加工装置
JP2008270072A (ja) * 2007-04-24 2008-11-06 Sii Nanotechnology Inc 荷電粒子ビーム装置

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