JP2012517112A - 貫通シリコンビアを用いて改善された光起電電池の効率 - Google Patents
貫通シリコンビアを用いて改善された光起電電池の効率 Download PDFInfo
- Publication number
- JP2012517112A JP2012517112A JP2011548436A JP2011548436A JP2012517112A JP 2012517112 A JP2012517112 A JP 2012517112A JP 2011548436 A JP2011548436 A JP 2011548436A JP 2011548436 A JP2011548436 A JP 2011548436A JP 2012517112 A JP2012517112 A JP 2012517112A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photovoltaic
- conductive layer
- node
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 55
- 239000010703 silicon Substances 0.000 title claims abstract description 55
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 52
- 230000005611 electricity Effects 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 14
- 230000010287 polarization Effects 0.000 claims description 9
- 230000000903 blocking effect Effects 0.000 claims description 4
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 4
- 230000008878 coupling Effects 0.000 claims 4
- 238000010168 coupling process Methods 0.000 claims 4
- 238000005859 coupling reaction Methods 0.000 claims 4
- 229910052751 metal Inorganic materials 0.000 description 35
- 239000002184 metal Substances 0.000 description 34
- 239000000463 material Substances 0.000 description 5
- 239000004020 conductor Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
- H01L31/022475—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers composed of indium tin oxide [ITO]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
322を含む貫通シリコンビア306及び308は、光起電層302及び第一の導電層303から電気的に絶縁される。更に、複数の貫通シリコンビアを光起電層302にわたって配置して、光起電層302の頂面上の電気コンタクトポイントを提供することができる。
302b 底部ノード
303 第一の導電層
304 第二の導電層
306、308 貫通シリコンビア
314 光屈折層
316 光子
318 負荷
320、322 導電経路
Claims (18)
- 第一のノード及び第二のノードを有する光起電層と、
前記光起電層から光をブロックしないように前記光起電層の前記第一のノードに電気的に結合された第一の導電層と、
前記第一の導電層に隣接するが電気的に絶縁された第二の導電層であって、該第二の導電層が前記光起電層から光をブロックしないように配置された第二の導電層と、
前記光起電層の前記第一のノード及び前記第二の導電層の両方に電気的に結合された少なくとも一つの貫通シリコンビアであって、前記光起電層及び前記第一の導電層の少なくとも一部分から電気的に絶縁された貫通シリコンビアとを備えた光起電電池。 - 前記光起電層内に光を偏向させて且つ前記光起電層の前記第一のノードに隣接している光屈折層を更に備えた請求項1に記載の光起電電池。
- 前記光屈折層が、前記光起電層及び前記少なくとも一つの貫通シリコンビアに電気的に結合されている、請求項2に記載の光起電電池。
- 前記貫通シリコンビアが、前記光起電層の前記第一のノードから前記光起電層及び前記第一の導電層を貫通して前記第二の導電層まで延伸していて、前記第一のノードから前記第二の導電層までの導電経路を提供する、請求項1に記載の光起電電池。
- 受光頂部ノード及び底部ノードを有する光起電層と、
前記光起電層の前記受光頂部ノードに隣接して電気的に結合されていて、前記光起電層内に光を偏向させる電極層と、
前記光起電層の前記底部ノードに電気的に結合された第一の導電層と、
光から前記光起電層をブロックしないように前記第一の導電層に隣接するが電気的に絶縁された第二の導電層と、
前記光起電層及び前記第一の導電層を貫通して前記光起電層の前記受光頂部ノードと前記第二の導電層との間で電気的に結合されているが、前記光起電層及び前記第一の導電層から電気的に絶縁されている少なくとも一つの貫通シリコンビアとを備えた太陽電池。 - 前記貫通シリコンビアが、前記受光頂部ノードにおいて露出されていて前記電極層に電気的に結合された第一の端部を更に備える、請求項5に記載の太陽電池。
- 前記貫通シリコンビアが、導電性の関係で他の貫通シリコンビアに対して間隔が空けられていて、貫通シリコンビアアレイを形成している、請求項5に記載の太陽電池。
- 前記電極層がインジウム錫酸化物を更に備える、請求項5に記載の太陽電池。
- 前記電極層が前記少なくとも一つの貫通シリコンビアから反射された光を吸収する、請求項5に記載の太陽電池。
- 前記第一の導電層と前記第二の導電層との間の電流を促進する負荷を更に備えた請求項5に記載の太陽電池。
- 光起電電池に対する光の妨害を低減する装置であって、
光を受光して該光を吸収して分極ノード間に電気を発生させる受光手段と、
前記受光手段から光をブロックせずに、前記受光手段の第一の分極ノードから電気を伝える第一の手段と、
前記受光手段から光をブロックせずに、前記受光手段の第二の分極ノードから電気を伝える第二の手段とを備えた装置。 - 前記電気を伝える第一の手段が、前記受光手段を貫通して前記第一の分極ノードに導電層を電気的に結合する電気結合手段を更に備え、前記電気結合手段が、前記受光手段から電気的に絶縁されている、請求項11に記載の装置。
- 前記電気結合手段が貫通シリコンビアを更に備える、請求項12に記載の装置。
- 前記受光手段内に光を偏向させる手段を更に備えた請求項11に記載の装置。
- 太陽電池に対してブロックされる光を低減する方法であって、
第一のノード及び第二のノードを有する光起電層を配置するステップと、
前記光起電層から光をブロックしないように、前記光起電層の前記第二のノードに隣接して電気的に結合された第一の導電層を配置するステップと、
前記光起電層から光をブロックしないように、前記第一の導電層に隣接するが電気的に絶縁された第二の導電層を配置するステップと、
前記光起電層及び前記第一の導電層を貫通して前記光起電層の前記第一のノードと前記第二の導電層との間に少なくとも一つの貫通シリコンビアを形成するステップとを備え、
前記少なくとも一つの貫通シリコンビアが前記光起電層及び前記第一の導電層から電気的に絶縁される、方法。 - 前記光起電層の前記第一のノードに隣接して電気的に結合されて前記光起電層内に光を偏向させる電極層を配置するステップを更に備えた請求項15に記載の方法。
- 前記第二の導電層を少なくとも前記第一の導電層のサイズにして前記電極層の厚さを減少させるステップを更に備えた請求項16に記載の方法。
- 前記少なくとも一つの貫通シリコンビアを形成するステップが、前記少なくとも一つの貫通シリコンビアを導電性の関係で他の少なくとも一つの貫通シリコンビアに対して間隔を空けて貫通シリコンビアアレイを形成するステップを更に備えた請求項15に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/372,778 | 2009-02-18 | ||
US12/372,778 US20100206370A1 (en) | 2009-02-18 | 2009-02-18 | Photovoltaic Cell Efficiency Using Through Silicon Vias |
PCT/US2010/024610 WO2010096575A2 (en) | 2009-02-18 | 2010-02-18 | Improved photovoltaic cell efficiency using through silicon vias |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014018466A Division JP2014082528A (ja) | 2009-02-18 | 2014-02-03 | 貫通シリコンビアを用いて改善された光起電電池の効率 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2012517112A true JP2012517112A (ja) | 2012-07-26 |
Family
ID=42558848
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011548436A Pending JP2012517112A (ja) | 2009-02-18 | 2010-02-18 | 貫通シリコンビアを用いて改善された光起電電池の効率 |
JP2014018466A Pending JP2014082528A (ja) | 2009-02-18 | 2014-02-03 | 貫通シリコンビアを用いて改善された光起電電池の効率 |
JP2015218601A Pending JP2016026413A (ja) | 2009-02-18 | 2015-11-06 | 光起電電池及びその製造方法 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014018466A Pending JP2014082528A (ja) | 2009-02-18 | 2014-02-03 | 貫通シリコンビアを用いて改善された光起電電池の効率 |
JP2015218601A Pending JP2016026413A (ja) | 2009-02-18 | 2015-11-06 | 光起電電池及びその製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100206370A1 (ja) |
EP (1) | EP2399294A2 (ja) |
JP (3) | JP2012517112A (ja) |
KR (1) | KR101252030B1 (ja) |
CN (1) | CN102308392A (ja) |
TW (1) | TW201101510A (ja) |
WO (1) | WO2010096575A2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112009001438B4 (de) * | 2008-06-09 | 2013-08-08 | Mitsubishi Electric Corp. | Fotoelektrischer Dünnfilm-Wandler und Verfahren zu dessen Herstellung |
US8193039B2 (en) * | 2010-09-24 | 2012-06-05 | Advanced Micro Devices, Inc. | Semiconductor chip with reinforcing through-silicon-vias |
CN102214723B (zh) * | 2011-06-01 | 2013-03-27 | 北京大学 | 半导体辐射敏感装置及其制作方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59150482A (ja) * | 1983-02-08 | 1984-08-28 | Toshiba Corp | 太陽電池 |
JP2007311425A (ja) * | 2006-05-16 | 2007-11-29 | Nippon Telegr & Teleph Corp <Ntt> | 太陽電池の製造方法および太陽電池 |
JP2008034609A (ja) * | 2006-07-28 | 2008-02-14 | Kyocera Corp | 太陽電池素子及びこれを用いた太陽電池モジュール、並びに、これらの製造方法 |
WO2008078741A1 (ja) * | 2006-12-26 | 2008-07-03 | Kyocera Corporation | 太陽電池モジュール |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3903427A (en) * | 1973-12-28 | 1975-09-02 | Hughes Aircraft Co | Solar cell connections |
JPH04282871A (ja) * | 1991-03-12 | 1992-10-07 | Fuji Electric Co Ltd | 薄膜太陽電池 |
JP2898194B2 (ja) * | 1994-03-30 | 1999-05-31 | 三洋電機株式会社 | 光起電力装置及びその製造方法 |
US6331208B1 (en) * | 1998-05-15 | 2001-12-18 | Canon Kabushiki Kaisha | Process for producing solar cell, process for producing thin-film semiconductor, process for separating thin-film semiconductor, and process for forming semiconductor |
US6784361B2 (en) * | 2000-09-20 | 2004-08-31 | Bp Corporation North America Inc. | Amorphous silicon photovoltaic devices |
AU2002308468A1 (en) * | 2001-04-23 | 2002-11-05 | Carmanah Technologies Inc. | Potted domed solar panel capsule and traffic warning lamps incorporating same |
DE10239845C1 (de) * | 2002-08-29 | 2003-12-24 | Day4 Energy Inc | Elektrode für fotovoltaische Zellen, fotovoltaische Zelle und fotovoltaischer Modul |
US6897085B2 (en) * | 2003-01-21 | 2005-05-24 | Spheral Solar Power, Inc. | Method of fabricating an optical concentrator for a photovoltaic solar cell |
JP2004289034A (ja) * | 2003-03-25 | 2004-10-14 | Canon Inc | 酸化亜鉛膜の処理方法、それを用いた光起電力素子の製造方法 |
US7838868B2 (en) * | 2005-01-20 | 2010-11-23 | Nanosolar, Inc. | Optoelectronic architecture having compound conducting substrate |
US20060130891A1 (en) * | 2004-10-29 | 2006-06-22 | Carlson David E | Back-contact photovoltaic cells |
US20070023082A1 (en) * | 2005-07-28 | 2007-02-01 | Venkatesan Manivannan | Compositionally-graded back contact photovoltaic devices and methods of fabricating such devices |
CA2724383A1 (en) * | 2008-06-04 | 2009-12-10 | Solexant Corp. | Thin film solar cells with monolithic integration and backside contact |
-
2009
- 2009-02-18 US US12/372,778 patent/US20100206370A1/en not_active Abandoned
-
2010
- 2010-02-18 JP JP2011548436A patent/JP2012517112A/ja active Pending
- 2010-02-18 KR KR1020117021862A patent/KR101252030B1/ko not_active IP Right Cessation
- 2010-02-18 WO PCT/US2010/024610 patent/WO2010096575A2/en active Application Filing
- 2010-02-18 EP EP10704488A patent/EP2399294A2/en not_active Withdrawn
- 2010-02-18 CN CN201080006662XA patent/CN102308392A/zh active Pending
- 2010-02-22 TW TW099105037A patent/TW201101510A/zh unknown
-
2014
- 2014-02-03 JP JP2014018466A patent/JP2014082528A/ja active Pending
-
2015
- 2015-11-06 JP JP2015218601A patent/JP2016026413A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59150482A (ja) * | 1983-02-08 | 1984-08-28 | Toshiba Corp | 太陽電池 |
JP2007311425A (ja) * | 2006-05-16 | 2007-11-29 | Nippon Telegr & Teleph Corp <Ntt> | 太陽電池の製造方法および太陽電池 |
JP2008034609A (ja) * | 2006-07-28 | 2008-02-14 | Kyocera Corp | 太陽電池素子及びこれを用いた太陽電池モジュール、並びに、これらの製造方法 |
WO2008078741A1 (ja) * | 2006-12-26 | 2008-07-03 | Kyocera Corporation | 太陽電池モジュール |
Also Published As
Publication number | Publication date |
---|---|
CN102308392A (zh) | 2012-01-04 |
TW201101510A (en) | 2011-01-01 |
WO2010096575A3 (en) | 2011-05-12 |
US20100206370A1 (en) | 2010-08-19 |
KR20110118172A (ko) | 2011-10-28 |
KR101252030B1 (ko) | 2013-04-10 |
JP2016026413A (ja) | 2016-02-12 |
JP2014082528A (ja) | 2014-05-08 |
EP2399294A2 (en) | 2011-12-28 |
WO2010096575A2 (en) | 2010-08-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
USRE47484E1 (en) | Solar cell | |
US8569614B2 (en) | Solar cell and method of manufacturing the same | |
KR101002282B1 (ko) | 태양 전지 및 그 제조 방법 | |
US8680392B2 (en) | Solar cell and method of manufacturing the same | |
US8053666B2 (en) | Solar cell and manufacturing method of the solar cell | |
KR101135591B1 (ko) | 태양 전지 및 태양 전지 모듈 | |
US11862745B2 (en) | One-dimensional metallization for solar cells | |
US20120145233A1 (en) | Back contact solar cell and manufacturing method thereof | |
KR20090033096A (ko) | 태양 전지, 태양 전지 모듈 및 태양 전지의 제조 방법 | |
KR101699299B1 (ko) | 양면 수광형 태양전지 | |
KR101699310B1 (ko) | 태양 전지 및 그 제조 방법 | |
US8536447B2 (en) | Electrode of solar cell and fabricating method thereof | |
JP2016026413A (ja) | 光起電電池及びその製造方法 | |
US9929297B2 (en) | Solar cell and method for manufacturing the same | |
KR20180018895A (ko) | 양면 수광형 실리콘 태양전지 | |
KR101382880B1 (ko) | 태양광 발전장치 및 이의 제조방법 | |
KR20110024947A (ko) | 태양 전지 | |
KR101198438B1 (ko) | 양면 수광형 국부화 에미터 태양전지 및 그 제조 방법 | |
US20130025650A1 (en) | Photovoltaic power generation device and manufacturing method thereof | |
KR20180034091A (ko) | 실리콘 태양 전지 및 그 제조 방법 | |
KR20140021125A (ko) | 태양 전지 | |
WO2014026400A1 (zh) | 太阳能电池及其制作方法 | |
KR20110080234A (ko) | 태양 전지 | |
KR20150083390A (ko) | 태양전지 모듈 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20121030 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20121106 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130206 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20131001 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140203 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20140325 |
|
A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20140530 |