JP2012516946A - 真空コーティングロール基板のための高生産性装置 - Google Patents

真空コーティングロール基板のための高生産性装置 Download PDF

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Publication number
JP2012516946A
JP2012516946A JP2011549084A JP2011549084A JP2012516946A JP 2012516946 A JP2012516946 A JP 2012516946A JP 2011549084 A JP2011549084 A JP 2011549084A JP 2011549084 A JP2011549084 A JP 2011549084A JP 2012516946 A JP2012516946 A JP 2012516946A
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JP
Japan
Prior art keywords
substrate
roller
turning roller
cooling
strap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011549084A
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English (en)
Japanese (ja)
Inventor
ヤーディン，エドガーズ
アウスヴァルド，エドゥアードス
ガイドラズダ，アイヴァーズ
Original Assignee
ズィードラーベ インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ズィードラーベ インコーポレイテッド filed Critical ズィードラーベ インコーポレイテッド
Publication of JP2012516946A publication Critical patent/JP2012516946A/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2011549084A 2009-02-03 2010-02-01 真空コーティングロール基板のための高生産性装置 Pending JP2012516946A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
LVP-09-16A LV14196B (lv) 2009-02-03 2009-02-03 Augstražīga ierīce pārklājumu uznešanai vakuumā uz rullī satītas pamatnes
LVP-09-16 2009-02-03
PCT/LV2010/000001 WO2010090504A2 (fr) 2009-02-03 2010-02-01 Appareil hautement productif pour la vaporisation sous vide de substrats en rouleau

Publications (1)

Publication Number Publication Date
JP2012516946A true JP2012516946A (ja) 2012-07-26

Family

ID=42315225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011549084A Pending JP2012516946A (ja) 2009-02-03 2010-02-01 真空コーティングロール基板のための高生産性装置

Country Status (4)

Country Link
EP (1) EP2393958A2 (fr)
JP (1) JP2012516946A (fr)
LV (1) LV14196B (fr)
WO (1) WO2010090504A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9224953B2 (en) 2011-10-19 2015-12-29 Nitto Denko Corporation Method and apparatus for manufacturing organic el device

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013179019A (ja) * 2012-02-02 2013-09-09 Nitto Denko Corp ガイド部材、ガイド機構及び有機ｅｌデバイスの製造方法
JP5284443B2 (ja) * 2011-10-19 2013-09-11 日東電工株式会社 有機ｅｌデバイスの製造方法及び製造装置
WO2013061845A1 (fr) * 2011-10-24 2013-05-02 日東電工株式会社 Procédé de fabrication de dispositifs à électroluminescence organique et appareil de fabrication
JP5269970B2 (ja) * 2011-10-24 2013-08-21 日東電工株式会社 有機ｅｌデバイスの製造方法及び製造装置
DE102012206502B4 (de) 2012-04-19 2019-01-31 VON ARDENNE Asset GmbH & Co. KG Vorrichtung zum frontseitenberührungsfreien Transport von bandförmigem Material

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08246150A (ja) * 1995-03-10 1996-09-24 Fuji Electric Co Ltd 薄膜製造装置
JPH08325731A (ja) 1995-05-25 1996-12-10 Teijin Ltd 真空成膜装置
EP2113585A1 (fr) * 2008-04-29 2009-11-04 Applied Materials, Inc. Dispositif et procédé de revêtement de bandes sous vide par tordre et guider la bande à plusiers reprises le long d'un cylindre devant un région de traitement

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9224953B2 (en) 2011-10-19 2015-12-29 Nitto Denko Corporation Method and apparatus for manufacturing organic el device

Also Published As

Publication number Publication date
WO2010090504A3 (fr) 2010-11-18
LV14196B (lv) 2010-11-20
LV14196A (lv) 2010-08-20
WO2010090504A4 (fr) 2011-01-20
WO2010090504A2 (fr) 2010-08-12
EP2393958A2 (fr) 2011-12-14

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