JP2012500716A - 微粒子コーティングの方法 - Google Patents
微粒子コーティングの方法 Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 323
- 239000010419 fine particle Substances 0.000 title claims description 8
- 239000011248 coating agent Substances 0.000 claims abstract description 298
- 239000007788 liquid Substances 0.000 claims abstract description 269
- 239000000758 substrate Substances 0.000 claims abstract description 198
- 239000002245 particle Substances 0.000 claims abstract description 191
- 239000003607 modifier Substances 0.000 claims abstract description 57
- 239000011247 coating layer Substances 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims description 76
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 16
- 230000002209 hydrophobic effect Effects 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 7
- 229910000077 silane Inorganic materials 0.000 claims description 7
- 125000001424 substituent group Chemical group 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- 229910052809 inorganic oxide Inorganic materials 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 239000000243 solution Substances 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 25
- 239000002356 single layer Substances 0.000 description 19
- 239000002904 solvent Substances 0.000 description 19
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 17
- 239000010410 layer Substances 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 230000008901 benefit Effects 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 230000008859 change Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 239000002923 metal particle Substances 0.000 description 5
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 5
- 150000004756 silanes Chemical class 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 150000002433 hydrophilic molecules Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 238000000527 sonication Methods 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000011437 continuous method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000013528 metallic particle Substances 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- 150000001282 organosilanes Chemical class 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 150000003573 thiols Chemical class 0.000 description 2
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 2
- 239000013598 vector Substances 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- -1 conditions Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000004320 controlled atmosphere Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910001502 inorganic halide Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002572 peristaltic effect Effects 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000004416 surface enhanced Raman spectroscopy Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/22—Processes for applying liquids or other fluent materials performed by dipping using fluidised-bed technique
- B05D1/24—Applying particulate materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/20—Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2401/00—Form of the coating product, e.g. solution, water dispersion, powders or the like
- B05D2401/30—Form of the coating product, e.g. solution, water dispersion, powders or the like the coating being applied in other forms than involving eliminable solvent, diluent or dispersant
- B05D2401/32—Form of the coating product, e.g. solution, water dispersion, powders or the like the coating being applied in other forms than involving eliminable solvent, diluent or dispersant applied as powders
Abstract
Description
この例示的計算のための既知のパラメータは:コーティング液のポンプ流量(Vpump=0.5mL/分);コーティング液におけるシリカ粒子の質量による濃度(Cmass=8mg/mL);シリカ粒子の平均直径(dp=2.5μm);シリカ粒子の密度(ρSiO2=2.196g/cm3);および基板の幅(W=25mm)である。
シリカ微小球体の200mgの乾燥粉末(2.5μmからの平均直径;Bangs Laboratories社(米国インディアナ州フィッシャーズ所在))を超音波分解し、20mLの200プルーフエタノール中に分散した。0.2mLの29%の水酸化アンモニウム(NH4OH)、69μLのオクタデシルトリメトキシシラン(OTMS)および2mLのクロロホルムを分散液に加えた。次に、溶液を室温で12〜24時間攪拌し、OTMSがシリカ粒子のヒドロキシル基に化学的にグラフトできるようにした。次いで、グラフトしたシリカ粒子を5,000RPMで約30分間遠心分離することによって液体から分離し、エタノールで洗浄した。グラフトした粒子をIPA中に8mg/mLの濃度まで分散した。
Claims (5)
- 微粒子のコーティング方法であって、
少なくとも1つの改質粒子と液状担体とを含むコーティング液を形成し、ここで、前記改質粒子が、改質剤を粒子に共有結合させることによって形成され、
下相液の表面に前記コーティング液のコーティング層を形成し、ここで、前記下相液が容器内にあり、基板が、前記下相液に少なくとも部分的に浸漬され、前記コーティング液が、前記容器内において実質的に単一方向の流れを有し、
前記基板を前記容器から分離して、前記コーティング層の少なくとも一部を前記基板に移し、微粒子コーティングを形成する、
各工程を有してなる方法。 - 前記少なくとも1つの改質剤が疎水性であり、
前記下相液が有極性であり、
前記少なくとも1つの粒子が親水性の無機酸化物であり、
前記改質剤が、C8−C24アルキル基を有する1つ以上の置換基を有するシランであり、
前記改質粒子が約2nm〜約20μmの直径を有する
ことを特徴とする請求項1記載の方法。 - 前記液状担体が、アルコール、エーテル、またはそれらの混合液のうち少なくとも1つを含み、
前記改質粒子が、前記コーティング液中、約0.05〜約20mg/mLの濃度を有し、
前記コーティング層の形成が、前記コーティング液を前記下相液の表面に注入することを含む
ことを特徴とする請求項1記載の方法。 - 前記基板の短軸が、前記容器内において前記コーティング液の流れの方向に対して垂直に方向付けられるか、前記基板の短軸が、前記容器内において前記コーティング液の流れの方向に平行に方向付けられるか、またはそれらの組合せであることを特徴とする請求項1記載の方法。
- 微粒子のコーティング方法であって、
少なくとも1つの改質粒子と液状担体とを含むコーティング液を形成し、ここで、前記改質粒子が、疎水性の改質剤を粒子に共有結合させることによって形成されており、
前記コーティング液を、下相液およびその中に少なくとも部分的に浸漬された基板を有する容器内に流し込み、ここで、前記コーティング液が、容器内において実質的に単一方向の流れを有し、前記下相液の表面にコーティング層を形成し、
前記基板を前記容器から分離して、前記基板上に微粒子コーティングを形成する、
各工程を有してなる方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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US9101508P | 2008-08-22 | 2008-08-22 | |
US61/091,015 | 2008-08-22 | ||
US12/486,807 | 2009-06-18 | ||
US12/486,807 US8425985B2 (en) | 2008-08-22 | 2009-06-18 | Method for particulate coating |
PCT/US2009/054405 WO2010022205A2 (en) | 2008-08-22 | 2009-08-20 | Method for particulate coating |
Publications (1)
Publication Number | Publication Date |
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JP2012500716A true JP2012500716A (ja) | 2012-01-12 |
Family
ID=41696622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2011523978A Pending JP2012500716A (ja) | 2008-08-22 | 2009-08-20 | 微粒子コーティングの方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US8425985B2 (ja) |
EP (1) | EP2318152B1 (ja) |
JP (1) | JP2012500716A (ja) |
KR (1) | KR101646288B1 (ja) |
CN (1) | CN102131594A (ja) |
AU (1) | AU2009282894A1 (ja) |
TW (1) | TWI402107B (ja) |
WO (1) | WO2010022205A2 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI421209B (zh) * | 2010-08-12 | 2014-01-01 | Academia Sinica | 大面積單層微粒膜及其製備方法 |
US9346709B2 (en) | 2011-05-05 | 2016-05-24 | Corning Incorporated | Glass with high frictive damage resistance |
WO2015142837A1 (en) | 2014-03-21 | 2015-09-24 | Corning Incorporated | Articles with patterned coatings |
CN109689329B (zh) * | 2016-06-10 | 2021-10-19 | 迈克尔·波珀 | 产生溶液分散的纳米材料的大面积单层膜的方法和装置 |
KR101879585B1 (ko) * | 2016-10-06 | 2018-07-18 | 경희대학교 산학협력단 | 하이드로겔 입자의 자동 코팅 장치 및 방법 |
KR101984985B1 (ko) * | 2017-08-11 | 2019-05-31 | 한국기계연구원 | 입자 코팅 장치 및 방법 |
CN114420008B (zh) * | 2022-02-10 | 2023-11-03 | 深圳市飞帆泰科技有限公司 | 带有低辐射玻璃的电子显示屏 |
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- 2009-06-18 US US12/486,807 patent/US8425985B2/en not_active Expired - Fee Related
- 2009-08-20 CN CN2009801336801A patent/CN102131594A/zh active Pending
- 2009-08-20 WO PCT/US2009/054405 patent/WO2010022205A2/en active Application Filing
- 2009-08-20 EP EP09791705.8A patent/EP2318152B1/en not_active Not-in-force
- 2009-08-20 AU AU2009282894A patent/AU2009282894A1/en not_active Abandoned
- 2009-08-20 KR KR1020117006184A patent/KR101646288B1/ko active IP Right Grant
- 2009-08-20 JP JP2011523978A patent/JP2012500716A/ja active Pending
- 2009-08-21 TW TW098128323A patent/TWI402107B/zh not_active IP Right Cessation
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Also Published As
Publication number | Publication date |
---|---|
US8425985B2 (en) | 2013-04-23 |
CN102131594A (zh) | 2011-07-20 |
EP2318152A2 (en) | 2011-05-11 |
KR20110048556A (ko) | 2011-05-11 |
WO2010022205A3 (en) | 2010-07-15 |
KR101646288B1 (ko) | 2016-08-05 |
TW201029755A (en) | 2010-08-16 |
TWI402107B (zh) | 2013-07-21 |
US20100047466A1 (en) | 2010-02-25 |
EP2318152B1 (en) | 2015-04-15 |
WO2010022205A2 (en) | 2010-02-25 |
AU2009282894A1 (en) | 2010-02-25 |
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