JP2012251182A - Chemical treatment apparatus, plating apparatus, and plating method employing the same - Google Patents

Chemical treatment apparatus, plating apparatus, and plating method employing the same Download PDF

Info

Publication number
JP2012251182A
JP2012251182A JP2011122767A JP2011122767A JP2012251182A JP 2012251182 A JP2012251182 A JP 2012251182A JP 2011122767 A JP2011122767 A JP 2011122767A JP 2011122767 A JP2011122767 A JP 2011122767A JP 2012251182 A JP2012251182 A JP 2012251182A
Authority
JP
Japan
Prior art keywords
workpiece
tank
plating
chemical
chemical treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011122767A
Other languages
Japanese (ja)
Other versions
JP5630658B2 (en
Inventor
Yoshihide Nishiyama
芳英 西山
Shinsaku Nagano
晋作 長野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP2011122767A priority Critical patent/JP5630658B2/en
Publication of JP2012251182A publication Critical patent/JP2012251182A/en
Application granted granted Critical
Publication of JP5630658B2 publication Critical patent/JP5630658B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Electroplating Methods And Accessories (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a chemical treatment apparatus that can efficiently be installed and has improved productivity.SOLUTION: The chemical treatment apparatus chemically treats a workpiece of a long-sheet shape by continuously feeding the same into a chemical treatment tank, and is provided with a workpiece feeder for continuously feeding the workpiece of a long-sheet shape wound on a reel and a workpiece winder for continuously winding the chemically treated workpiece onto the reel. The structure of the apparatus is characterized in that: the workpiece feeder and the workpiece winder are disposed on the side of one of a pair of endless belts each comprising a plurality of upper and lower end transfer clamps for clamping the upper end or the lower end of the workpiece respectively upon feeding the same into the chemical treatment tank; and a pretreatment tank and a post treatment tank in the plating process are disposed on the side of the same endless belt in a manner of sandwiching the workpiece feeder and the workpiece winder, and the chemical treatment tank is disposed on the side of the opposite endless belt.

Description

本発明はCOF(Chip On Flexible)等に用いられるフレキシブル回路基板のような長尺のシート状に連続的にめっきなどの化学処理を施す化学処理装置及びその装置を用いためっき処理方法に関するものである。   The present invention relates to a chemical processing apparatus for continuously performing chemical processing such as plating on a long sheet like a flexible circuit board used for COF (Chip On Flexible) and the like, and a plating processing method using the apparatus. is there.

近年、液晶テレビ、携帯電話等の電子機器には可撓性のある絶縁性基板上に配線回路を形成したいわゆるフレキシブル回路基板が用いられることが多くなってきている。
そのようなフレキシブル回路基板の製造に用いられる従来のめっき装置は、例えば特許文献1に記載されるような装置が用いられてきている。
In recent years, so-called flexible circuit boards in which a wiring circuit is formed on a flexible insulating substrate are increasingly used in electronic devices such as liquid crystal televisions and mobile phones.
As a conventional plating apparatus used for manufacturing such a flexible circuit board, for example, an apparatus described in Patent Document 1 has been used.

図6に示す従来から用いられてきためっき装置は、リールに巻かれたワーク(長尺シート状の被めっき材料)を供給するためのワーク供給装置1と、そのワーク10をリールに巻き取るワーク巻取装置2との間に、ワーク10にめっきを施すための前処理槽3、めっき槽4、後処理槽5を、直線状に配置、構成した装置で、前処理槽3、めっき槽4、後処理槽5の各槽上部にワーク10の上端を挟持して給電し、ワーク10の面を垂直方向としてワーク供給装置1からワーク巻取装置2へワーク10を連続的に搬送しながらめっきを行うめっき装置40が開示されている。   A conventional plating apparatus shown in FIG. 6 includes a workpiece supply device 1 for supplying a workpiece wound on a reel (long sheet-like material to be plated), and a workpiece for winding the workpiece 10 on a reel. A pretreatment tank 3, a plating tank 4, and a posttreatment tank 5 for plating the workpiece 10 between the winding device 2 and a linear arrangement of the pretreatment tank 3 and the plating tank 4. Then, the upper end of the work 10 is sandwiched between the upper parts of the post-treatment tanks 5 to supply power, and plating is performed while the work 10 is continuously conveyed from the work supply device 1 to the work take-up device 2 with the surface of the work 10 being the vertical direction. A plating apparatus 40 for performing the above is disclosed.

従来、図6に示す構成のめっき装置40を用いることにより、ワークの電流密度を均一、且つ高くすることによって、めっき槽を一槽とすることができ、ワークに大きな張力をかけることなく長尺シートにめっきを施すことを可能にしている。
しかしながら、このような装置であっても、さらに生産性を向上させようとした場合、電流密度は既に高電流密度となっていることから、さらに高くすることも限界があるため、各処理槽の大型化によって対応することが考えられる。しかしながら、各処理槽が直線状に配置されている構成であり、装置の設置スペースに制約を抱える場合、その大型化も限度があり、そのため生産性の更なる向上を図るには、図6のような装置構成では問題があった。
Conventionally, by using the plating apparatus 40 having the configuration shown in FIG. 6, the current density of the workpiece can be made uniform and high, so that the plating tank can be made into one tank and long without applying a large tension to the workpiece. The sheet can be plated.
However, even in such an apparatus, when the productivity is further improved, the current density is already high, so there is a limit to further increase the current density. It may be possible to cope with the increase in size. However, when each processing tank is arranged in a straight line and there is a restriction on the installation space of the apparatus, there is a limit to the increase in size, and in order to further improve the productivity, FIG. There was a problem with such an apparatus configuration.

そこで、このような問題を解決するために本発明者らは特許文献2において開示される化学処理装置を提案している。
特許文献2に開示される化学処理装置は、長尺シート状のワークをその幅方向を上下方向にして連続的に供給するワーク供給装置と、そのワークの幅方向を上下方向にしてワークを連続的にリールに巻き取るワーク巻取装置と、そのワーク供給装置とワーク巻取装置との間に配置され、かつその幅方向を上下方向にしてエンドレスベルトに設けられたクランプにより搬送されるワークに対し化学処理を行う化学処理槽を、そのエンドレスベルトの両側に備える構成の化学処理装置で、特許文献1記載のめっき装置40よりも装置の小型化を可能にしている。
In order to solve such problems, the present inventors have proposed a chemical processing apparatus disclosed in Patent Document 2.
The chemical processing apparatus disclosed in Patent Document 2 is a workpiece supply device that continuously supplies a long sheet-like workpiece with its width direction set to the vertical direction, and the workpiece is continuously set with the width direction of the workpiece set to the vertical direction. A work take-up device that is wound around a reel, and a work that is disposed between the work supply device and the work take-up device and that is conveyed by a clamp provided on an endless belt with the width direction set to the vertical direction. In contrast, the chemical treatment apparatus is configured to include chemical treatment tanks for performing chemical treatment on both sides of the endless belt, and the apparatus can be made smaller than the plating apparatus 40 described in Patent Document 1.

しかし、一般的なめっき装置のような化学処理装置は、化学処理槽の前後に前処理槽と後処理槽を配置するため、エンドレスベルトの両側に化学処理槽を備える特許文献2に示される装置構成であっても、図5に示す化学処理装置30のようにエンドレスベルト8の片側に化学処理槽4と併せて前処理槽3か、後処理槽5を設置することになるため、化学処理槽4を大型化しようとすると装置長が長くってしまうという問題が生じていた。
図5、図6において、符号6、7はエンドレスベルト8の折り返し用プーリーで駆動用プーリーを兼ねている。
However, in a chemical processing apparatus such as a general plating apparatus, a pretreatment tank and a posttreatment tank are arranged before and after the chemical treatment tank, and therefore, an apparatus shown in Patent Document 2 including chemical treatment tanks on both sides of an endless belt. Even if it is a structure, since the pretreatment tank 3 or the post-treatment tank 5 will be installed together with the chemical treatment tank 4 on one side of the endless belt 8 as in the chemical treatment apparatus 30 shown in FIG. When the tank 4 is increased in size, there is a problem that the apparatus length becomes longer.
5 and 6, reference numerals 6 and 7 denote folding pulleys for the endless belt 8, which also serve as driving pulleys.

また図5、図6に示されるめっき装置では、ワークを給電装置に接続されたクランプにより把持しながらめっきを行うことで、めっき槽中でワークに印加される電流が均一になることにより、電流密度を上げ、めっき速度を向上させてめっき形成することが可能になったが、上記構成により電流密度を上げてめっきを形成した場合、めっき表面にディンプル状の微細な凹部が形成されてしまい、その表面の平滑性を損なう問題を抱えていた。   Further, in the plating apparatus shown in FIGS. 5 and 6, the current applied to the work in the plating tank is made uniform by performing plating while holding the work with the clamp connected to the power supply device. It became possible to form a plating by increasing the density and improving the plating speed, but when forming the plating by increasing the current density by the above configuration, a dimple-like fine recess was formed on the plating surface, It had the problem of impairing the smoothness of its surface.

さらに、図5、図6に示される装置共に、ワーク上端(図5の装置は下端も)をクランプでチャック(把持)して搬送する方法のめっき装置であるために低張力でワークを搬送することができるが、後処理後の巻き取りもワークは、幅方向を鉛直方向にした状態で巻き取られるので、処理量が増大する(すなわち、ワークが長尺化する)と巻き取り後のワークの自重により巻き乱れが発生し、めっき面やワーク表面に擦り傷やシワなどの欠陥を発生させてしまうため300m長のワークを処理することが限界で処理量の増大に対応できなかった。
そのため、処理量を増やそうとすると巻き乱れ防止のため、ワークへのめっき処理時のワークに掛ける張力を上げることが行われたが、ワークが伸縮状態であることによるめっき不良の発生を招き易くなり生産性の低下を招く結果となっている。
Further, both the apparatuses shown in FIGS. 5 and 6 are the plating apparatus in which the work upper end (the lower end of the apparatus in FIG. 5 is also the lower end) is chucked (clamped) and conveyed so that the work is conveyed with low tension. However, since the workpiece is wound with the width direction set to the vertical direction, the workpiece after winding is increased when the processing amount increases (that is, the workpiece becomes longer). Due to its own weight, winding disturbance occurs, and defects such as scratches and wrinkles are generated on the plated surface and workpiece surface. Therefore, it was impossible to handle a 300 m long workpiece because of its limit.
Therefore, to increase the amount of treatment, the tension applied to the workpiece during the plating process was increased in order to prevent turbulence, but it is easy to cause plating defects due to the workpiece being in a stretched state. The result is a decrease in productivity.

また図5の装置を用いた場合、ワーク10を折り返しプーリー7で折り返すことにより装置の小型化を実現していたが、折り返し側搬送プーリー7に巻きまわされたエンドレスベルト8に支持されたクランプは折り返し搬送プーリー7の外周に沿って円弧を描いて移動する。この時に隣り合うクランプの直線距離が短くなるため、クランプ9に挟持されたワーク10が波打ち状態で撓むことにより、ワーク表面に「しわ」が発生するという問題があった。   Further, when the apparatus of FIG. 5 is used, the apparatus 10 is reduced in size by folding the workpiece 10 with the folding pulley 7, but the clamp supported by the endless belt 8 wound around the folding-side transport pulley 7 is An arc is drawn along the outer periphery of the return conveying pulley 7 to move. At this time, since the linear distance between adjacent clamps is shortened, there is a problem that “wrinkles” are generated on the workpiece surface when the workpiece 10 held between the clamps 9 bends in a wavy state.

特開2006−193794号公報JP 2006-193794 A 特開2009−120889号公報JP 2009-120889 A

本発明は、上記の問題点を解決するためになされたものであり、小型で、生産性向上に優れた化学処理装置、めっき装置およびその装置を用いためっき処理方法を提供することを目的とする。   The present invention has been made to solve the above-described problems, and has an object to provide a chemical processing apparatus, a plating apparatus, and a plating processing method using the apparatus that are small in size and excellent in productivity. To do.

このような課題を解決する本発明の第1の発明は、長尺シート状のワークを連続して化学処理槽に搬入して化学処理する化学処理装置において、リールに巻かれた長尺シート状のワークを連続的に供給するワーク供給装置と、化学処理されたワークを連続的にリールに巻き取るワーク巻取装置を、ワークの化学処理槽搬入時にワークの少なくとも上端をクランプする上端搬送クランプ群を有する一対のエンドレスベルトの片側に配置し、化学処理における前処理槽と後処理槽を、ワーク供給装置及びワーク巻取装置の両者を挟み込む配置で、かつ同じエンドレスベルト側の位置に前処理槽、ワーク供給装置、ワーク巻取装置、及び後処理槽を配置し、対向するエンドレスベルト側に化学処理槽を設けた構造を特徴とするものである。   The first invention of the present invention that solves such problems is a long sheet-like shape wound around a reel in a chemical processing apparatus for continuously carrying a long sheet-like workpiece into a chemical treatment tank and chemically treating it. A workpiece feeding device that continuously feeds workpieces and a workpiece winding device that continuously winds chemically treated workpieces on a reel, and an upper end conveying clamp group that clamps at least the upper end of the workpiece when the workpiece is loaded into the chemical treatment tank Are arranged on one side of a pair of endless belts, and a pretreatment tank and a posttreatment tank in chemical processing are arranged so as to sandwich both the workpiece supply device and the workpiece winding device, and the pretreatment vessel is located at the same endless belt side position. , A workpiece supply device, a workpiece winding device, and a post-treatment tank are disposed, and a chemical treatment tank is provided on the opposite endless belt side.

本発明の第2の発明は、長尺シート状のワークを連続して化学処理槽に搬入して化学処理する化学処理装置において、ワークの化学処理槽搬入時にワークの少なくとも上端をクランプする上端搬送クランプ群を有する一対のエンドレスベルトを備え、そのエンドレスベルトの片側に化学処理槽を配し、対向するエンドレスベルト側に化学処理の前処理を行う前処理槽と後処理を行う後処理槽を配して、ワークが連続的に前処理槽に搬入される位置に配置されるワーク供給装置と、後処理槽を搬出されたワークが連続的にリールに巻き取られる位置に配置されるワーク巻取装置を有することを特徴とするものである。   According to a second aspect of the present invention, in a chemical processing apparatus for continuously carrying a long sheet-like work into a chemical treatment tank and performing chemical treatment, upper end conveyance for clamping at least the upper end of the work when the work is carried into the chemical treatment tank. A pair of endless belts having a clamp group is provided, a chemical treatment tank is arranged on one side of the endless belt, and a pretreatment tank for pretreatment of chemical treatment and a posttreatment tank for posttreatment are arranged on the opposite endless belt side. Then, the workpiece supply device arranged at a position where the workpiece is continuously carried into the pretreatment tank, and the workpiece winding arranged at a position where the workpiece carried out of the post-treatment tank is continuously wound around the reel It has the apparatus.

本発明の第3の発明は、第1及び第2の発明における化学処理装置の化学処理槽がワークを搬入してめっき処理する際に、少なくともワーク上端を搬送クランプ群により把持して鉛直状態としたワークのワーク面に化学処理を施す化学処理槽であり、ワーク巻取装置が、ワークを巻き取る際に、化学処理されたワークを水平状態とした後に巻き取りを行う巻取装置であることを特徴とするものである。   When the chemical processing tank of the chemical processing apparatus according to the first and second aspects of the present invention carries the workpiece and carries out the plating process, at least the upper end of the workpiece is gripped by the transport clamp group and is in a vertical state. It is a chemical treatment tank that performs chemical treatment on the workpiece surface of the workpiece, and when the workpiece winding device winds up the workpiece, it is a winding device that performs winding after the chemically treated workpiece is leveled. It is characterized by.

本発明の第4の発明は、第1から第3の発明おける化学処理装置の折り返しプーリーに、エンドレスベルトの移動に伴い、エンドレスベルトに備えられた搬送クランプ群のクランプが着脱自在に嵌合するクランプ脱着部位を備えることを特徴とするものである。なお、ここでの「嵌合」は、密接に嵌めあうことのみならず、クランプ脱着部位が大となる緩い嵌合の方が良い。   According to a fourth aspect of the present invention, the clamp of the conveyance clamp group provided in the endless belt is detachably fitted to the folding pulley of the chemical processing apparatus according to the first to third aspects of the invention as the endless belt moves. A clamp removing / attaching portion is provided. Note that the “fitting” here is not only a close fitting, but a loose fitting with a large clamp attaching / detaching portion is better.

本発明の第5の発明は、第1から第4の発明の化学処理装置において、後処理槽とワーク巻取装置の間に、低張力熱処理装置を備えることを特徴とするものである。   According to a fifth aspect of the present invention, in the chemical treatment apparatus according to the first to fourth aspects, a low-tension heat treatment apparatus is provided between the post-treatment tank and the workpiece winding apparatus.

本発明の第6の発明は、ワークを化学処理槽に搬入してめっき処理する際に、少なくとも上端を搬送クランプ群により把持してワークを鉛直状態としてワーク面にめっきを施し、後処理槽での後処理を施したワークを巻き取る前に、そのワークに低張力熱処理を施し、その低張力熱処理を施したワークを水平状態とした後にワーク巻取装置により巻き取ることを特徴とするめっき処理方法で、第5の発明によるめっき装置を用い行われるものである。   According to a sixth aspect of the present invention, when a workpiece is carried into a chemical treatment tank and plated, the workpiece surface is plated with at least the upper end held by a conveying clamp group, and the workpiece surface is plated. The plating process is characterized in that before the work after the post-treatment is taken up, the work is subjected to a low-tension heat treatment, and the work subjected to the low-tension heat treatment is placed in a horizontal state and then taken up by a work take-up device. The method is performed using the plating apparatus according to the fifth invention.

本発明の第7の発明は、第6の発明における低張力熱処理が、めっきを施されたワークを5N以下の低張力状態で、そのめっきが再結晶する熱処理であることを特徴とするめっき処理方法である。   In a seventh aspect of the present invention, the low-tension heat treatment according to the sixth aspect is a heat treatment for recrystallizing the plated workpiece in a low-tensile state of 5 N or less. Is the method.

本発明によれば、従来と同等の生産能力を有する化学処理装置を、設置効率に優れた敷設形状で、かつ生産能力の向上にも柔軟に対応可能である化学処理などに用いられる化学処理装置が提供できるため、工業上顕著な効果を奏するものである。
さらに本発明によれば、水平な巻取軸でワークを巻き取ることで巻き乱れによるワーク表面不良の発生を防ぐことができ、その低張力熱処理により、巻取時におけるめっき皮膜の再結晶の進展により生じるめっき面のディンプル状凹みの発生を防ぎ、搬送中のワークの伸びとめっきの再結晶の完了によるウェーブ(波目模様)発生を防止する。さらに、本発明の非接触搬送構造の上下のクランプにより折り返し時に生じるワークの弛みが防止でき、ワークを弛ませずに搬送することを可能とするものである。
According to the present invention, a chemical processing apparatus having a production capacity equivalent to that of a conventional chemical processing apparatus used for chemical processing or the like that has a laying shape excellent in installation efficiency and can flexibly cope with an improvement in production capacity. Therefore, the present invention has a remarkable industrial effect.
Furthermore, according to the present invention, it is possible to prevent the occurrence of a work surface defect due to turbulence by winding the work with a horizontal winding shaft, and the low-tension heat treatment allows the progress of recrystallization of the plating film during winding. The generation of dimple-like dents on the plating surface caused by the above is prevented, and the generation of waves (wave pattern) due to the elongation of the workpiece being conveyed and the completion of recrystallization of the plating is prevented. Furthermore, the upper and lower clamps of the non-contact conveyance structure of the present invention can prevent the workpiece from loosening when folded, and can convey the workpiece without loosening.

本発明の化学処理装置の一実施例を示す外観斜視図である。It is an external appearance perspective view which shows one Example of the chemical processing apparatus of this invention. 本発明の化学処理装置を説明するための図で、(a)は図1の化学処理装置の配置模式図で、(b)は他の実施例における配置模式図ある。It is a figure for demonstrating the chemical processing apparatus of this invention, (a) is the arrangement | positioning schematic diagram of the chemical processing apparatus of FIG. 1, (b) is the arrangement | positioning schematic diagram in another Example. 本発明の低張力熱処理装置の実施例の一例を説明する模式図である。It is a schematic diagram explaining an example of the Example of the low tension heat processing apparatus of this invention. 本発明の折り返しプーリーの構造を示す図で、(a)は外観斜視図、(b)はクランプ脱着部位の外観斜視図である。It is a figure which shows the structure of the folding pulley of this invention, (a) is an external appearance perspective view, (b) is an external appearance perspective view of a clamp removal | desorption site | part. 従来の化学処理装置の形態を示す配置模式図である。It is the arrangement schematic diagram which shows the form of the conventional chemical processing apparatus. 従来のめっき装置の形態を示す配置模式図である。It is an arrangement schematic diagram showing the form of a conventional plating apparatus.

本発明に係る化学処理装置は、図1、図2に示す構造を有している。
図1は、本発明の化学処理装置の全景を表す外観斜視図で、20は化学処理装置を表し、1はワーク供給装置、2はワーク巻取装置、3は前処理槽、4は化学処理槽、5は後処理槽、6はエンドレスベルトの折り返し用プーリー、8はエンドレスベルト、8aは上下端搬送クランプ群、9はめっき剥離槽、10はワーク、11は低張力熱処理装置、12は搬送方向変更ローラー、13は水平ローラー、20は化学処理装置である。
The chemical processing apparatus according to the present invention has the structure shown in FIGS.
FIG. 1 is an external perspective view showing a whole view of a chemical processing apparatus of the present invention, 20 represents a chemical processing apparatus, 1 represents a work supply device, 2 represents a work winding device, 3 represents a pretreatment tank, and 4 represents chemical treatment. Tanks, 5 are post-treatment tanks, 6 are endless belt folding pulleys, 8 are endless belts, 8a is an upper / lower end conveying clamp group, 9 is a plating stripping tank, 10 is a workpiece, 11 is a low-tension heat treatment apparatus, and 12 is conveyed. A direction change roller, 13 is a horizontal roller, and 20 is a chemical processing apparatus.

図2(a)は、図1に示す本発明の化学処理装置20の構造を説明するために簡素化した配置模式図である。図1のエンドレスベルト8の折り返し用プーリー6を、一対の折り返し用プーリー(駆動用プーリーを兼ねる)6、7で表したものである。
図2(b)は、他の実施例における配置模式図で、ワーク供給装置1、ワーク巻取装置2をエンドレスベルト8の内側、若しくは上方に配置した場合を表すものである。
FIG. 2A is a schematic arrangement diagram simplified for explaining the structure of the chemical treatment apparatus 20 of the present invention shown in FIG. The folding pulley 6 of the endless belt 8 in FIG. 1 is represented by a pair of folding pulleys 6 (also serving as driving pulleys).
FIG. 2B is an arrangement schematic diagram in another embodiment, and shows a case where the workpiece supply device 1 and the workpiece winding device 2 are arranged inside or above the endless belt 8.

図1、2に示すように、リール(図示せず)に巻かれた長尺シート状のワーク10を連続的に供給するワーク供給装置1と、その長尺状のワーク10を連続的にリール(図示せず)に巻き取るワーク巻取装置2は、ワーク10の化学処理時に、少なくともワーク10の上端をクランプ(把持)する上下搬送クランプ群8a(図1では上端側のクランプのみで把持しているが、下端側にもクランプを設け、上下端で把持しても良い)を有するエンドレスベルト8の片側(図1、2(a)の[Aサイド])、若しくは図2(b)ではエンドレスベルト8の内側或いは上方に集中して配置されている。   As shown in FIGS. 1 and 2, a workpiece supply device 1 that continuously supplies a long sheet-like workpiece 10 wound on a reel (not shown), and the elongated workpiece 10 is continuously reeled. The workpiece take-up device 2 to be wound around (not shown) grips at least the upper transfer clamp group 8a (in FIG. 1, the upper end clamp only) at the time of chemical treatment of the workpiece 10. However, one end of the endless belt 8 having a clamp on the lower end side and may be gripped by the upper and lower ends ([A side] in FIGS. 1 and 2), or in FIG. The endless belt 8 is concentrated inside or above the endless belt 8.

さらに化学処理を行う際の前処理槽3と後処理槽5も、図1、2に見られるようにワーク供給装置1及びワーク巻取装置2の両者を挟み込む形、すなわちワーク供給装置とワーク巻取装置の両サイドに分かれて配置されている。
一方、化学処理槽4は、ワーク供給装置1、前処理槽3、後処理槽5、ワーク巻取装置2が配置されるエンドレスベルト側(図1、2の[Aサイド側])と対向する向きのエンドレスベルト側(図1、2の[Bサイド側])に配置された構造となっている。
なお、9のめっき剥離槽は、エンドレスベルト8や上下搬送クランプ群8aに付着した「めっき」を取り除くものである。
Further, as shown in FIGS. 1 and 2, the pretreatment tank 3 and the posttreatment tank 5 when performing the chemical treatment also sandwich both the workpiece supply device 1 and the workpiece winding device 2, that is, the workpiece supply device and the workpiece winding. It is arranged separately on both sides of the picking device.
On the other hand, the chemical treatment tank 4 faces the endless belt side ([A side side in FIGS. 1 and 2)] on which the workpiece supply apparatus 1, the pretreatment tank 3, the post-treatment tank 5, and the workpiece winding apparatus 2 are arranged. The structure is arranged on the endless belt side ([B side side in FIGS. 1 and 2)].
In addition, the plating peeling tank 9 removes “plating” adhering to the endless belt 8 and the vertical conveyance clamp group 8a.

図1、2により説明したように、化学処理装置の各構成要素を、エンドレスベルト8の折り返し用プーリー6間(図2では、折り返し用プーリー6と7間)に配置することによって、本発明では、化学処理装置の全長を短縮することを可能とし、敷設形状(装置の設置スペース)の縦横比(以下、アスペクト比と称す)を1.0に近づけることができ、めっき装置の敷設に際する敷地面積の効率を高めるものである。
すなわち、従来の装置では、アスペクト比が大きく、敷設形状(設置スペース)は長辺が大きな長方形敷地を必要としたために、設置場所の選定に制約を受けていたが、本発明ではアスペクト比が1.0に近くなるため、その設置スペースは正方形に近い長方形となり、従来の装置に比べて設置場所の制約を受けにくく、その自由度が大きいと言える。
As described with reference to FIGS. 1 and 2, the components of the chemical treatment apparatus are disposed between the folding pulleys 6 of the endless belt 8 (between the folding pulleys 6 and 7 in FIG. 2). The overall length of the chemical treatment apparatus can be shortened, and the aspect ratio (hereinafter referred to as the aspect ratio) of the laying shape (installation space of the apparatus) can be made close to 1.0. It increases the efficiency of the site area.
That is, in the conventional apparatus, since the aspect ratio is large and the laying shape (installation space) requires a rectangular site with a long side, the selection of the installation location is restricted. However, in the present invention, the aspect ratio is 1 Since it is close to 0.0, the installation space is a rectangle close to a square, which is less subject to installation location restrictions than conventional devices and can be said to have a high degree of freedom.

次に、本発明で使用する前処理槽3、化学処理槽4、後処理槽5は、ワーク10を搬入して化学処理する際に、少なくとも上端を上下搬送クランプ群8aにより把持して鉛直状態としたワーク10のワーク面に化学処理を施す処理槽であり、各処理槽によって化学処理されたワーク10は、後処理槽5を搬出された後に、ワーク巻取装置2で巻き取られるが、その巻取の際に、搬送方向変更ローラー12によって搬送の向きを変更され、その後水平ローラー13を経由して、水平方向、すなわち水平方向にワーク10を巻き取るリール(図示せず)の巻取軸を設定したワーク巻取装置2に巻き取られる。
このように、水平な巻取軸でワークを巻き取ることで、その巻き取る量が多くなっても、すなわち巻径が大きく、ワークのコイル自重が増大しても巻き乱れによるワーク表面不良の発生を防ぐことができる。
Next, the pretreatment tank 3, the chemical treatment tank 4, and the posttreatment tank 5 used in the present invention, when carrying the workpiece 10 and carrying out chemical treatment, hold at least the upper end by the vertical conveying clamp group 8a and are in a vertical state. The workpiece 10 is subjected to chemical treatment on the workpiece surface, and the workpiece 10 chemically treated by each treatment vessel is taken up by the workpiece winding device 2 after being unloaded from the post-treatment vessel 5. At the time of winding, the direction of conveyance is changed by the conveyance direction changing roller 12, and then the winding of a reel (not shown) for winding the workpiece 10 in the horizontal direction, that is, in the horizontal direction via the horizontal roller 13. The workpiece is wound around the workpiece winding device 2 having a set axis.
In this way, by winding the workpiece with a horizontal winding shaft, even if the amount of winding is increased, that is, even if the winding diameter is large and the coil weight of the workpiece increases, the surface of the workpiece will be defective due to winding disturbance. Can be prevented.

さらにワーク巻取装置2にワーク10を巻き取る前に、低張力下で、めっきが再結晶する条件における熱処理(以下、低張力熱処理と称す)を図1の低張力熱処理装置11により行う。
この低張力熱処理は、巻取時におけるめっき皮膜の再結晶の進展により生じるめっき面のディンプル状凹みの発生を防ぎ、搬送中のワークの伸びとめっきの再結晶の完了によるウェーブ(波目模様)発生を防止するために行うもので、張力5N以下で、めっきが再結晶する条件で行う。
Further, before the workpiece 10 is wound around the workpiece winding device 2, heat treatment (hereinafter referred to as “low tension heat treatment”) under conditions where the plating is recrystallized under low tension is performed by the low tension heat treatment device 11 of FIG. 1.
This low-tension heat treatment prevents dimple-like dents on the plating surface due to the progress of recrystallization of the plating film during winding, and the wave (wave pattern) due to the elongation of the workpiece being transferred and the completion of recrystallization of the plating This is performed in order to prevent the occurrence, and is performed under conditions where the tension is 5 N or less and the plating is recrystallized.

用いる低張力熱処理装置としては、図3に示すような構造の低張力熱処理装置を用いると良い。この低張力熱処理装置11を用いて低張力熱処理を説明すると、後処理槽(図1、符号5)などの最終処理槽を搬出されたワーク10は、低張力熱処理装置11の吸着ロール14に吸着されながら導入され、熱風加熱装置16により、めっき表面の再結晶を目指して加熱されると同時に、エアーフローターン部15に導かれてエアーフローにより非接触状態となり、その張力を5N以下に制御される。張力が5N以下の状態でさらに熱風加熱装置16によってめっき面の再結晶化が行われることで、健全な平滑性を有するワークが装置外に導出されて処理が終了する。なお、図1の低張力熱処理装置11では、水平ローラー13が吸着ロールを兼ねているものを示している。   As a low tension heat treatment apparatus to be used, a low tension heat treatment apparatus having a structure as shown in FIG. 3 is preferably used. When the low-tension heat treatment apparatus 11 is used to explain the low-tension heat treatment, the work 10 carried out from the final treatment tank such as the post-treatment tank (FIG. 1, reference numeral 5) is adsorbed to the suction roll 14 of the low-tension heat treatment apparatus 11. At the same time, it is heated by the hot air heating device 16 to recrystallize the plating surface, and at the same time, it is led to the air flow turn section 15 and brought into a non-contact state by air flow, and its tension is controlled to 5 N or less. The When the plating surface is recrystallized by the hot air heating device 16 in a state where the tension is 5 N or less, a work having a healthy smoothness is led out of the device and the processing is completed. In the low-tension heat treatment apparatus 11 shown in FIG. 1, the horizontal roller 13 also serves as an adsorption roll.

その張力が5Nより大きい場合には、この熱処理時においてワークにウェーブが発生しやすくなり、品質低下の原因となってしまう。   If the tension is greater than 5N, the workpiece is likely to be waved during this heat treatment, causing a reduction in quality.

さらに本発明では、折り返し用プーリー6に、エンドレスベルトの移動に伴いエンドレスベルトに備えられた上下搬送クランプ群8aの上端クランプ8b、下端クランプ8cが着脱自在に嵌合するクランプ脱着部位6bを備えている(図4(a)、(b)参照)。
そしてクランプ脱着部位6bの間は円弧状を形成し、その円弧状部分に、ワークの上端面および下端面が接した状態で搬送される。
このような機構により、折り返し時に上下のクランプ8b、8cがクランプ脱着部位6bに、はめ込まれことで折り返し時に生じるワークの弛みが防止でき、ワークを弛ませずに搬送することを可能とする。なお、クランプ脱着部位6bの一例は、図4(a)に見られるように上下の折り返しプーリー6間にクランプリード円板6aを設け、その全周に設ける形態としても良く、クランプ8b、8c間に連続した円柱状部材の上下端にクランプ脱着部位を設けても良い。
そして、上下の折り返しプーリー6間にそれぞれクランプリード円板6aを設けることにより、ワーク10と円弧状部分の接触面積が減少するので、ワークに傷や汚れの付着が防止できるためより好ましい。
Further, according to the present invention, the folding pulley 6 is provided with a clamp attaching / detaching portion 6b in which the upper end clamp 8b and the lower end clamp 8c of the upper and lower conveying clamp group 8a provided on the endless belt are detachably fitted as the endless belt moves. (See FIGS. 4A and 4B).
An arc shape is formed between the clamp attachment / detachment portions 6b, and the workpiece is transported in a state where the upper end surface and the lower end surface of the workpiece are in contact with the arc-shaped portion.
With such a mechanism, the upper and lower clamps 8b and 8c are fitted into the clamp attachment / detachment portion 6b at the time of folding, so that the workpiece can be prevented from being loosened, and the workpiece can be conveyed without being loosened. In addition, as an example of the clamp attaching / detaching portion 6b, as shown in FIG. 4 (a), the clamp lead disk 6a may be provided between the upper and lower folding pulleys 6 and may be provided on the entire circumference thereof, between the clamps 8b and 8c. Alternatively, clamp attachment / detachment portions may be provided at the upper and lower ends of the cylindrical member that is continuous with the cylinder.
Further, by providing the clamp lead disks 6a between the upper and lower folding pulleys 6 respectively, the contact area between the workpiece 10 and the arc-shaped portion is reduced, and therefore, it is more preferable because the workpiece can be prevented from being scratched or soiled.

以下に、実施例を用いて本発明を説明する。   Hereinafter, the present invention will be described using examples.

設計製造能力を90km/月とし、装置全周に処理工程を設けることで基板搬送が2回Uターンする図2(a)に示す本発明に係る「全周型」の化学処理装置を作製した。
表1に、装置の敷設形状、性能などを纏めて示す。
The design and manufacturing capacity was 90 km / month, and the “all-round type” chemical processing apparatus according to the present invention shown in FIG. .
Table 1 summarizes the laying shape and performance of the device.

(比較例1)
装置片側のみに処理工程を設けることで基板搬送のUターンがなく直線のみである図5に示す「直線型」の化学処理装置を作製した。設計製造能力は、実施例1の化学処理装置と同様に90km/月とした。
表1に、その敷設形状、性能などを実施例1と併せて示す。
(Comparative Example 1)
By providing a processing step only on one side of the apparatus, a “straight-line” chemical processing apparatus shown in FIG. The design and manufacturing capacity was 90 km / month as in the chemical processing apparatus of Example 1.
Table 1 shows the laying shape, performance, and the like together with Example 1.

Figure 2012251182
Figure 2012251182

表1から明らかなように、装置コスト以下のメンテナンス性、操作性、搬送機構の難易度などに優劣は見られないが、装置1台の設置面積に関しては、実施例1(全周型:図2(a)参照)も比較例1(直線型:図5参照)も大差ないが、全長で2/3、また装置の敷設形状のアスペクト比は直線型と比べて1/2以下であり、単位面積当たりの設置密度(表1の50×50m敷地における設置台数)に優れていることがわかる。   As can be seen from Table 1, superiority or inferiority is not seen in maintainability below the device cost, operability, difficulty of the transport mechanism, etc., but with respect to the installation area of one device, Example 1 (all-round type: figure 2 (a)) and Comparative Example 1 (linear type: see FIG. 5) are not much different, but the overall length is 2/3, and the aspect ratio of the laying shape of the apparatus is 1/2 or less compared to the linear type, It can be seen that the installation density per unit area (the number of installations in the 50 × 50 m site in Table 1) is excellent.

ポリイミドフィルム上に導電性金属が形成された、幅524mm、厚み75μm、長さ1500mの材料をワーク10として図2(a)に示すワーク供給装置1に取り付け、本発明に係る「全周型」の化学処理装置を用いてワークの上下端部を把持し、搬送張力を50N、搬送速度でワークを搬送しながら、化学処理槽4にて電流密度3A/cmでめっき処理を行い、後処理槽5にて洗浄処理後にワークの搬送方向を搬送方向変更ローラー12(図1に表示)によって搬送方向を変更し、水平ローラーを通してワーク巻き取り装置2で巻取りを行った結果、ワークの巻き乱れによるしわの発生も無く長尺ワークのめっき処理を行う事が出来た。 A material having a width of 524 mm, a thickness of 75 μm, and a length of 1500 m, on which a conductive metal is formed on a polyimide film, is attached to the workpiece supply apparatus 1 shown in FIG. The upper and lower ends of the workpiece are gripped using a chemical processing apparatus, and a plating treatment is performed at a current density of 3 A / cm 2 in the chemical treatment tank 4 while conveying the workpiece at a conveyance tension of 50 N and a conveyance speed, and post-processing As a result of changing the conveyance direction of the workpiece by the conveyance direction changing roller 12 (shown in FIG. 1) after the cleaning process in the tank 5 and winding the workpiece with the workpiece winding device 2 through the horizontal roller, the workpiece is disturbed. It was possible to perform plating of long workpieces without the occurrence of wrinkles.

(比較例2)
ワークを垂直で巻取るワーク巻取装置を備えた図5に示す「直線型」の化学処理装置を用いた以外は、実施例2と同じ条件でワークにめっきを施した。ワークの処理長が300mを越えると巻き乱れが発生しはじめたため、その後、ワークの搬送張力を100Nに上げ1500mのめっき処理を行った。
(Comparative Example 2)
The workpiece was plated under the same conditions as in Example 2 except that a “straight-line” chemical treatment device shown in FIG. 5 equipped with a workpiece winding device for winding the workpiece vertically was used. When the workpiece processing length exceeded 300 m, winding disturbance began to occur. Thereafter, the workpiece conveyance tension was increased to 100 N, and a plating treatment of 1500 m was performed.

ポリイミドフィルム上に導電性金属層を形成した幅524mm、長さ300m、その厚みが125μm、100μm、75μm、50μm、38μm、25μm、12.5μmの7種類のワーク10を、図2に示すワーク供給装置1に取り付け、本発明に係る化学処理装置を用いてワークの上下端部を把持し、搬送張力を50N、搬送速度0.5m/minでワークを搬送しながら、化学処理槽4にて電流密度3A/cmでめっき処理を行った。 Two types of workpieces 10 having a width of 524 mm, a length of 300 m, and a thickness of 125 μm, 100 μm, 75 μm, 50 μm, 38 μm, 25 μm, and 12.5 μm formed by forming a conductive metal layer on a polyimide film are shown in FIG. Attached to the apparatus 1 and grips the upper and lower ends of the workpiece using the chemical treatment apparatus according to the present invention, while conveying the workpiece at a conveyance tension of 50 N and a conveyance speed of 0.5 m / min, Plating was performed at a density of 3 A / cm 2 .

使用したクランプリード円板6aは、図4に見られるような直径70cm、板厚12mmの円盤状部材に、クランプ脱着部位6bを形成したもので、ワークの鉛直面両端の幅10mmを支持するように調整した。またクランプは、ワーク鉛直面両端の幅15mmを把持するように調整した。その結果めっき後のワークにしわも無く良好なめっき処理を行う事ができた。   The clamp lead disc 6a used is a disc-shaped member having a diameter of 70 cm and a plate thickness of 12 mm as shown in FIG. 4, and is formed with clamp attachment / detachment portions 6b so as to support a width of 10 mm at both ends of the vertical surface of the workpiece. Adjusted. The clamp was adjusted so as to hold a width of 15 mm at both ends of the workpiece vertical surface. As a result, it was possible to perform good plating without wrinkles on the workpiece after plating.

使用したクランプリード円板として、直径70cm、高さ550mmの円柱状部材の上下端にクランプ位置規制凹部を形成したものを用いた以外は、実施例1と同じ条件でめっき処理を行った。
その結果めっき後のワークにしわは生じなかったが、所々、めっき表面に傷状の不良が発生したが、不良部分を取り除くことで製品として用いる事ができた。
The plating treatment was performed under the same conditions as in Example 1 except that the clamp lead disc used was a cylindrical member having a diameter of 70 cm and a height of 550 mm, in which clamp position regulating recesses were formed on the upper and lower ends.
As a result, wrinkles did not occur on the workpiece after plating, but scratched defects occurred on the plating surface in some places, but they could be used as products by removing the defective portions.

(比較例3)
図6に記載した従来の化学処理装置を用いた以外は、実施例1と同じ条件でめっき処理を行った。
その結果、ワークの厚みが薄くなるほど、めっき後のワークにしわが生じており、ワーク厚みが50μm以下では、しわがワーク全体に多数発生しており、製品として供する事ができなかった。
(Comparative Example 3)
Plating treatment was performed under the same conditions as in Example 1 except that the conventional chemical treatment apparatus described in FIG. 6 was used.
As a result, the thinner the workpiece was, the more wrinkles were formed on the workpiece after plating. When the workpiece thickness was 50 μm or less, many wrinkles were generated on the entire workpiece, and could not be used as a product.

ポリイミドフィルム上に導電性金属層を形成した幅524mm、長さ300m、その厚みが25μmのワーク10を、図1に示すワーク供給装置1に取り付け、本発明に係るめっき処理装置を用いて、搬送張力を50N、搬送速度0.5m/minでワークを搬送しながら、化学処理槽4にて電流密度6A/cmでめっき処理を行った。 A workpiece 10 having a width of 524 mm, a length of 300 m, and a thickness of 25 μm, on which a conductive metal layer is formed on a polyimide film, is attached to the workpiece supply apparatus 1 shown in FIG. 1, and conveyed using the plating apparatus according to the present invention. Plating was performed at a current density of 6 A / cm 2 in the chemical treatment tank 4 while conveying the workpiece at a tension of 50 N and a conveyance speed of 0.5 m / min.

両面に8μmのCuめっきを形成した後に、熱処理時間を36秒に固定し、熱処理温度を、25℃、50℃、75℃、100℃、120℃、140℃、150℃として熱処理を施してめっき部材を作成し、作成後のディンプル状凹みを観察した。   After 8 μm Cu plating is formed on both sides, the heat treatment time is fixed at 36 seconds and the heat treatment temperature is 25 ° C., 50 ° C., 75 ° C., 100 ° C., 120 ° C., 140 ° C., 150 ° C. Members were created and the dimple-like dents after the creation were observed.

その結果、熱処理温度が50℃を越えるところからディンプル状凹みが減少し、140℃以上では、めっき部材にディンプル状凹みは観察できず、平滑性に優れためっき部材を得る事が出来た。   As a result, the dimple-like dents decreased when the heat treatment temperature exceeded 50 ° C., and at 140 ° C. or higher, no dimple-like dents could be observed in the plated member, and a plated member having excellent smoothness could be obtained.

めっき処理後の熱処理温度150℃、36秒と固定し、図3に示す低張力熱処理装置11を用いて、熱処理(加熱)中のワーク10の搬送張力を0N、5N、10N、15N、20N、25N、50Nとして熱処理を施した以外は、実施例1と同一条件にてめっき部材を作成し、作成後のディンプル状凹みとワークのウェーブを観察した。   The heat treatment temperature after the plating treatment is fixed at 150 ° C. and 36 seconds, and the conveyance tension of the workpiece 10 during heat treatment (heating) is set to 0N, 5N, 10N, 15N, 20N using the low tension heat treatment apparatus 11 shown in FIG. A plated member was prepared under the same conditions as in Example 1 except that heat treatment was performed at 25N and 50N, and the dimple-like dents and the wave of the workpiece after observation were observed.

その結果、いずれの搬送張力においても、ディンプル状凹みの個数に変化は無かったが、搬送張力が5Nを超えるとワーク10が顕著にウェーブ状になることが判った。   As a result, there was no change in the number of dimple-shaped dents at any conveyance tension, but it was found that the workpiece 10 was remarkably wave-shaped when the conveyance tension exceeded 5N.

1 ワーク供給装置
2 ワーク巻取装置
3 前処理槽
4 めっき槽(化学処理槽)
5 後処理槽
6、7 エンドレスベルトの折り返し用プーリー
6a クランプリード円板
6b クランプ脱着部位
8 エンドレスベルト
8a 上下端搬送クランプ群
8b 上端クランプ
8c 下端クランプ
9 めっき剥離槽
10 ワーク
11 低張力熱処理装置
12 搬送方向変更ローラー
13 水平ローラー
14 吸着ロール
15 エアーフローターン部
16 熱風加熱装置
20 本発明の化学処理装置
30 従来のめっき装置
40 従来の化学処理装置(めっき装置)
DESCRIPTION OF SYMBOLS 1 Work supply apparatus 2 Work winding apparatus 3 Pretreatment tank 4 Plating tank (chemical treatment tank)
5 Post-treatment tanks 6 and 7 Endless belt folding pulley 6a Clamp lead disk 6b Clamp detachment part 8 Endless belt 8a Upper and lower end conveyance clamp group 8b Upper end clamp 8c Lower end clamp 9 Plating peeling tank 10 Workpiece 11 Low tension heat treatment apparatus 12 Direction changing roller 13 Horizontal roller 14 Adsorption roll 15 Air flow turn unit 16 Hot air heating device 20 Chemical processing device 30 of the present invention Conventional plating device 40 Conventional chemical processing device (plating device)

Claims (7)

長尺シート状のワークを連続して化学処理槽に搬入して化学処理する化学処理装置において、
リールに巻かれた長尺シート状のワークを連続的に供給するワーク供給装置と化学処理されたワークを連続的にリールに巻き取るワーク巻取装置を、ワークの化学処理槽搬入時にワークの少なくとも上端をクランプする搬送クランプ群を有し、かつ一対の折り返しプーリーを備えてエンドレスループを構成するエンドレスベルトの片側に配置し、
めっき処理における前処理槽と後処理槽とにより、前記ワーク供給装置及びワーク巻取装置の両者を挟み込む位置で、かつ同じエンドレスベルト側の位置に、前記前処理槽、ワーク供給装置、ワーク巻取装置、及び後処理槽を配置し、
対向するエンドレスベルト側に化学処理槽を設けた構造を特徴とする化学処理装置。
In a chemical processing apparatus that continuously carries long sheets of workpieces into a chemical processing tank for chemical processing,
A workpiece supply device for continuously supplying a long sheet-shaped workpiece wound on a reel and a workpiece winding device for continuously winding a chemically-treated workpiece on a reel at least when the workpiece is loaded into a chemical treatment tank. It has a conveyance clamp group that clamps the upper end, and is arranged on one side of an endless belt that comprises a pair of folding pulleys to form an endless loop
The pretreatment tank, the work supply apparatus, and the work take-up apparatus are disposed at a position where both the work supply apparatus and the work take-up apparatus are sandwiched between the pretreatment tank and the post-treatment tank in the plating process and on the same endless belt side. Arrange the equipment and post-treatment tank,
A chemical processing apparatus characterized in that a chemical processing tank is provided on the opposite endless belt side.
長尺シート状のワークを連続して化学処理槽に搬入して化学処理する化学処理装置において、
前記ワークの化学処理槽搬入時にワークの少なくとも上端をクランプする搬送クランプ群を有する一対のエンドレスベルトを備え、
前記エンドレスベルトの片側に化学処理槽を配し、対向するエンドレスベルト側に化学処理の前処理を行う前処理槽と後処理を行う後処理槽を配して、
前記ワークが連続的に前処理槽に搬入される位置に配置されるワーク供給装置と、後処理槽を搬出されたワークが連続的にリールに巻き取られる位置に配置されるワーク巻取装置を有することを特徴とする化学処理装置。
In a chemical processing apparatus that continuously carries long sheets of workpieces into a chemical processing tank for chemical processing,
A pair of endless belts having a conveying clamp group that clamps at least the upper end of the workpiece when the workpiece is brought into the chemical treatment tank;
A chemical treatment tank is arranged on one side of the endless belt, a pretreatment tank for performing a pretreatment for chemical treatment and a posttreatment tank for performing a posttreatment are arranged on the opposite endless belt side,
A workpiece supply device disposed at a position where the workpiece is continuously carried into a pretreatment tank; and a workpiece winding device disposed at a position where the workpiece unloaded from the posttreatment tank is continuously wound around a reel. A chemical processing apparatus comprising:
前記化学処理槽が、ワークを搬入してめっき処理する際に、少なくとも上端を前記搬送クランプ群により把持して鉛直状態としたワークのワーク面に化学処理を施す化学処理槽であり、
前記ワーク巻取装置が、ワークを巻き取る際に、前記ワークを水平状態とした後に巻き取る巻取装置であることを特徴とする請求項1又は2記載の化学処理装置。
The chemical treatment tank is a chemical treatment tank for performing chemical treatment on a workpiece surface of a workpiece which is brought into a vertical state by gripping at least the upper end by the transport clamp group when carrying the workpiece and plating.
3. The chemical treatment apparatus according to claim 1, wherein the workpiece winding device is a winding device that winds the workpiece after setting the workpiece in a horizontal state when winding the workpiece. 4.
前記折り返しプーリーに、エンドレスベルトの移動に伴い前記エンドレスベルトに備えられた搬送クランプ群のクランプが着脱自在に嵌合するクランプ脱着部位を備えることを特徴とする請求項1から3のいずれか1項に記載の化学処理装置。   The clamp | pulling removal | desorption site | part with which the clamp of the conveyance clamp group with which the said endless belt was equipped was attached to the said folding pulley removably with the movement of an endless belt is provided. A chemical processing apparatus according to 1. 請求項1から4のいずれか1項に記載の化学処理装置の、前記後処理槽と前記ワーク巻取装置の間に、低張力熱処理装置を備えることを特徴とするめっき装置。   5. A plating apparatus comprising a low-tension heat treatment apparatus between the post-treatment tank and the work winding apparatus of the chemical treatment apparatus according to claim 1. ワークを化学処理槽に搬入してめっき処理する際に、少なくとも上端を端搬送クランプ群により把持してワークを鉛直状態としてワーク面にめっきを施し、
後処理槽での後処理を施したワークを巻き取る前に、前記ワークに低張力熱処理を施し、
低張力熱処理を施したワークを水平状態とした後にワーク巻取装置により巻き取ることを特徴とする請求項5に記載のめっき装置を用いためっき処理方法。
When the workpiece is carried into the chemical treatment tank and plated, at least the upper end is gripped by the end conveyance clamp group and the workpiece surface is plated in a vertical state,
Before winding the work that has been post-treated in the post-treatment tank, the work is subjected to low-tension heat treatment,
The plating method using the plating apparatus according to claim 5, wherein the workpiece subjected to the low-tension heat treatment is wound by a workpiece winding device after the workpiece is leveled.
前記低張力熱処理が、めっきを施されたワークを5N以下の低張力状態で、前記めっきが再結晶する熱処理であることを特徴とする請求項6記載のめっき処理方法。   The plating treatment method according to claim 6, wherein the low-tension heat treatment is a heat treatment in which the plating is recrystallized in a low-tensile state of 5 N or less on a workpiece subjected to plating.
JP2011122767A 2011-05-31 2011-05-31 Chemical treatment apparatus, plating apparatus, and plating treatment method using the apparatus Active JP5630658B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011122767A JP5630658B2 (en) 2011-05-31 2011-05-31 Chemical treatment apparatus, plating apparatus, and plating treatment method using the apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011122767A JP5630658B2 (en) 2011-05-31 2011-05-31 Chemical treatment apparatus, plating apparatus, and plating treatment method using the apparatus

Publications (2)

Publication Number Publication Date
JP2012251182A true JP2012251182A (en) 2012-12-20
JP5630658B2 JP5630658B2 (en) 2014-11-26

Family

ID=47524267

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011122767A Active JP5630658B2 (en) 2011-05-31 2011-05-31 Chemical treatment apparatus, plating apparatus, and plating treatment method using the apparatus

Country Status (1)

Country Link
JP (1) JP5630658B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014227572A (en) * 2013-05-22 2014-12-08 住友金属鉱山株式会社 Chemical treatment apparatus
JP2016102240A (en) * 2014-11-28 2016-06-02 住友金属鉱山株式会社 Holding mechanism and chemical treatment apparatus of sheet-like work-piece
JP2017095799A (en) * 2015-11-19 2017-06-01 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC Method of electroplating copper-precipitate having low internal stress onto a thin film substrate for suppressing strain
CN107119309A (en) * 2017-06-15 2017-09-01 临安金奥科技有限公司 A kind of device that one side continuous processing is carried out to plate surface
JP2017172009A (en) * 2016-03-24 2017-09-28 住友金属鉱山株式会社 Chemical treatment device
JP2020050911A (en) * 2018-09-27 2020-04-02 Dowaメタルテック株式会社 Plating apparatus and plating method using the same

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60252554A (en) * 1984-05-28 1985-12-13 Hirano Giken Kogyo Kk Conveying method of continuous, lengthy metal thin plate and metal plate suspending/conveying device used in said method
JPS63213693A (en) * 1987-03-02 1988-09-06 Sonitsukusu:Kk High-speed plating method and apparatus
JPH0215194A (en) * 1988-06-30 1990-01-18 Chuo Seisakusho Ltd Plating device and its hanger transfer mechanism
JP2005256131A (en) * 2004-03-15 2005-09-22 Ykk Corp Surface treatment device
JP2006193794A (en) * 2005-01-14 2006-07-27 Chuo Seisakusho Ltd Plating device for long sheet
JP2007217763A (en) * 2006-02-17 2007-08-30 Fujikura Ltd Method for producing electronic circuit board and device therefor
WO2008041720A1 (en) * 2006-10-03 2008-04-10 The Furukawa Electric Co., Ltd. Process for producing metal clad laminate
JP2009062582A (en) * 2007-09-06 2009-03-26 Sumitomo Metal Mining Co Ltd Device for carrying hoop material and method for controlling the same
JP2009120889A (en) * 2007-11-13 2009-06-04 Sumitomo Metal Mining Co Ltd Chemical treatment apparatus

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60252554A (en) * 1984-05-28 1985-12-13 Hirano Giken Kogyo Kk Conveying method of continuous, lengthy metal thin plate and metal plate suspending/conveying device used in said method
JPS63213693A (en) * 1987-03-02 1988-09-06 Sonitsukusu:Kk High-speed plating method and apparatus
JPH0215194A (en) * 1988-06-30 1990-01-18 Chuo Seisakusho Ltd Plating device and its hanger transfer mechanism
JP2005256131A (en) * 2004-03-15 2005-09-22 Ykk Corp Surface treatment device
JP2006193794A (en) * 2005-01-14 2006-07-27 Chuo Seisakusho Ltd Plating device for long sheet
JP2007217763A (en) * 2006-02-17 2007-08-30 Fujikura Ltd Method for producing electronic circuit board and device therefor
WO2008041720A1 (en) * 2006-10-03 2008-04-10 The Furukawa Electric Co., Ltd. Process for producing metal clad laminate
JP2009062582A (en) * 2007-09-06 2009-03-26 Sumitomo Metal Mining Co Ltd Device for carrying hoop material and method for controlling the same
JP2009120889A (en) * 2007-11-13 2009-06-04 Sumitomo Metal Mining Co Ltd Chemical treatment apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014227572A (en) * 2013-05-22 2014-12-08 住友金属鉱山株式会社 Chemical treatment apparatus
JP2016102240A (en) * 2014-11-28 2016-06-02 住友金属鉱山株式会社 Holding mechanism and chemical treatment apparatus of sheet-like work-piece
JP2017095799A (en) * 2015-11-19 2017-06-01 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC Method of electroplating copper-precipitate having low internal stress onto a thin film substrate for suppressing strain
JP2017172009A (en) * 2016-03-24 2017-09-28 住友金属鉱山株式会社 Chemical treatment device
CN107119309A (en) * 2017-06-15 2017-09-01 临安金奥科技有限公司 A kind of device that one side continuous processing is carried out to plate surface
JP2020050911A (en) * 2018-09-27 2020-04-02 Dowaメタルテック株式会社 Plating apparatus and plating method using the same
JP7165006B2 (en) 2018-09-27 2022-11-02 Dowaメタルテック株式会社 Plating equipment and plating method using it

Also Published As

Publication number Publication date
JP5630658B2 (en) 2014-11-26

Similar Documents

Publication Publication Date Title
JP5630658B2 (en) Chemical treatment apparatus, plating apparatus, and plating treatment method using the apparatus
US9358587B2 (en) Substrate treating apparatus
KR101079121B1 (en) Fine-wire cutting apparutus of metal pipe
JP2005235971A (en) Solder device of tab lead for solar battery containing flux coating function
JP2006193794A (en) Plating device for long sheet
JP2008266016A (en) Non-tension roll-to-roll device and material transfer method using this device
JP2012528058A5 (en)
JP2014105084A (en) Heat treatment equipment and method for manufacturing sheet-like base material
JP5720424B2 (en) Chemical processing equipment
JP2006283044A (en) Continuous plating equipment and method for film
JP5682859B2 (en) Plating apparatus and method for manufacturing plated substrate
JP5488191B2 (en) Chemical processing equipment
TW200845270A (en) Device to transport support elements for electronic circuits, in particular photovoltaic cells, along a working line
KR101288579B1 (en) sheet peeling apparatus
JP5630657B2 (en) Chemical processing equipment
JP2007211294A (en) Method for producing electronic circuit board and device therefor
KR101220868B1 (en) Perpendicular continuous type plating apparatus
KR101533768B1 (en) Microfiber cleaning device for small panels with cleaner
US10165716B2 (en) Substrate conveyance mechanism and component mounting method
TWI687360B (en) Vertical roll-to-roll wet process transmission equipment
CN213266750U (en) Plating apparatus
JP6471714B2 (en) Chemical processing equipment
TWM606113U (en) Plating device
KR20110072500A (en) Apparatus of annealing
KR20130111103A (en) Pattern forming device of roll to roll type

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130529

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140212

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140613

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140801

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140911

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140924

R150 Certificate of patent or registration of utility model

Ref document number: 5630658

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150