JP2012227278A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2012227278A5 JP2012227278A5 JP2011092364A JP2011092364A JP2012227278A5 JP 2012227278 A5 JP2012227278 A5 JP 2012227278A5 JP 2011092364 A JP2011092364 A JP 2011092364A JP 2011092364 A JP2011092364 A JP 2011092364A JP 2012227278 A5 JP2012227278 A5 JP 2012227278A5
- Authority
- JP
- Japan
- Prior art keywords
- processed
- holding
- ring
- plasma
- shaped member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011092364A JP5893260B2 (ja) | 2011-04-18 | 2011-04-18 | プラズマ処理装置および処理方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011092364A JP5893260B2 (ja) | 2011-04-18 | 2011-04-18 | プラズマ処理装置および処理方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012227278A JP2012227278A (ja) | 2012-11-15 |
JP2012227278A5 true JP2012227278A5 (fr) | 2014-05-29 |
JP5893260B2 JP5893260B2 (ja) | 2016-03-23 |
Family
ID=47277131
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011092364A Active JP5893260B2 (ja) | 2011-04-18 | 2011-04-18 | プラズマ処理装置および処理方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5893260B2 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6539113B2 (ja) | 2015-05-28 | 2019-07-03 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置およびプラズマ処理方法 |
KR101893035B1 (ko) * | 2017-09-27 | 2018-08-30 | 비씨엔씨 주식회사 | 플라즈마 공정 챔버의 커버링 어셈블리 |
JP7333712B2 (ja) | 2019-06-05 | 2023-08-25 | 東京エレクトロン株式会社 | 静電チャック、支持台及びプラズマ処理装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3260168B2 (ja) * | 1991-07-23 | 2002-02-25 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JPH07135200A (ja) * | 1993-11-11 | 1995-05-23 | Tokyo Electron Ltd | エッチング装置 |
US5942039A (en) * | 1997-05-01 | 1999-08-24 | Applied Materials, Inc. | Self-cleaning focus ring |
JP4686867B2 (ja) * | 2001-02-20 | 2011-05-25 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP3881290B2 (ja) * | 2002-08-20 | 2007-02-14 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
JP2005260011A (ja) * | 2004-03-12 | 2005-09-22 | Hitachi High-Technologies Corp | ウエハ処理装置およびウエハ処理方法 |
JP2007324186A (ja) * | 2006-05-30 | 2007-12-13 | Hitachi High-Technologies Corp | プラズマ処理装置 |
-
2011
- 2011-04-18 JP JP2011092364A patent/JP5893260B2/ja active Active
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI656557B (zh) | 藉由電漿調控之降低邊緣隆起面板 | |
KR20180084647A (ko) | 플라즈마 처리 장치 | |
JP2014017292A5 (fr) | ||
JP2017028111A5 (fr) | ||
WO2009125951A3 (fr) | Appareil de traitement au plasma et procédé de traitement au plasma | |
JP2013140950A5 (fr) | ||
WO2011100109A3 (fr) | Pomme d'arrosoir de distribution de gaz portant une matière de revêtement pour le traitement de semi-conducteur | |
WO2012125560A3 (fr) | Procédé et appareil pour découper au plasma une tranche semi-conductrice | |
MY154832A (en) | Actively heated aluminium baffle component having improved particle performance and methods of use and manufacture thereof | |
JP2017504955A5 (fr) | ||
JP2017501572A5 (fr) | ||
JP2015035607A5 (fr) | ||
JP2011192872A5 (fr) | ||
JP6244518B2 (ja) | プラズマ処理方法及びプラズマ処理装置 | |
WO2014127027A3 (fr) | Procédé et appareil de découpage en dés au plasma d'une plaquette semi-conductrice | |
WO2012057987A3 (fr) | Anneau de dépôt et mandrin électrostatique pour chambre de dépôt physique en phase vapeur | |
SG10201807919UA (en) | Plasma processing apparatus and plasma processing method | |
JP2015528060A5 (fr) | ||
US20130157067A1 (en) | Plasma-resistant member and method for regenerating same | |
WO2014137905A3 (fr) | Procédé et appareil de découpage de puce par plasma d'une tranche de semi-conducteur | |
JP2016127090A5 (fr) | ||
JP2020043221A5 (fr) | ||
JP2013254723A5 (fr) | ||
JP2012227278A5 (fr) | ||
IN2015DN01149A (fr) |