JP2012192349A - ガス処理システム - Google Patents
ガス処理システム Download PDFInfo
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- JP2012192349A JP2012192349A JP2011058564A JP2011058564A JP2012192349A JP 2012192349 A JP2012192349 A JP 2012192349A JP 2011058564 A JP2011058564 A JP 2011058564A JP 2011058564 A JP2011058564 A JP 2011058564A JP 2012192349 A JP2012192349 A JP 2012192349A
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- gas
- hydrogen
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- hydrogen separation
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- 239000001257 hydrogen Substances 0.000 claims abstract description 105
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 105
- 238000000354 decomposition reaction Methods 0.000 claims abstract description 61
- 150000002431 hydrogen Chemical class 0.000 claims abstract description 60
- 238000000926 separation method Methods 0.000 claims abstract description 55
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 44
- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
- 239000002184 metal Substances 0.000 claims abstract description 33
- 239000012528 membrane Substances 0.000 claims abstract description 25
- 150000001875 compounds Chemical class 0.000 claims abstract description 21
- 239000003792 electrolyte Substances 0.000 claims abstract description 6
- 230000009467 reduction Effects 0.000 abstract description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 29
- 230000002093 peripheral effect Effects 0.000 description 27
- 239000007784 solid electrolyte Substances 0.000 description 25
- 238000000034 method Methods 0.000 description 21
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- 229910052760 oxygen Inorganic materials 0.000 description 21
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 20
- 239000010410 layer Substances 0.000 description 20
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- 229910052759 nickel Inorganic materials 0.000 description 16
- -1 oxygen ions Chemical class 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 10
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- 229910021529 ammonia Inorganic materials 0.000 description 9
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- 238000007254 oxidation reaction Methods 0.000 description 9
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- 238000007747 plating Methods 0.000 description 7
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- 238000006243 chemical reaction Methods 0.000 description 6
- 238000004891 communication Methods 0.000 description 6
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 6
- 230000003197 catalytic effect Effects 0.000 description 5
- 239000000446 fuel Substances 0.000 description 5
- 239000003949 liquefied natural gas Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
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- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 229910002075 lanthanum strontium manganite Inorganic materials 0.000 description 4
- 238000002715 modification method Methods 0.000 description 4
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- 230000008569 process Effects 0.000 description 4
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- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910000990 Ni alloy Inorganic materials 0.000 description 3
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
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- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 2
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- 239000000470 constituent Substances 0.000 description 2
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- 239000010416 ion conductor Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910000480 nickel oxide Inorganic materials 0.000 description 2
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 2
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- 229910052709 silver Inorganic materials 0.000 description 2
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- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
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- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- FVROQKXVYSIMQV-UHFFFAOYSA-N [Sr+2].[La+3].[O-][Mn]([O-])=O Chemical compound [Sr+2].[La+3].[O-][Mn]([O-])=O FVROQKXVYSIMQV-UHFFFAOYSA-N 0.000 description 1
- PACGUUNWTMTWCF-UHFFFAOYSA-N [Sr].[La] Chemical compound [Sr].[La] PACGUUNWTMTWCF-UHFFFAOYSA-N 0.000 description 1
- UNPDDPPIJHUKSG-UHFFFAOYSA-N [Sr].[Sm] Chemical compound [Sr].[Sm] UNPDDPPIJHUKSG-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910021523 barium zirconate Inorganic materials 0.000 description 1
- DQBAOWPVHRWLJC-UHFFFAOYSA-N barium(2+);dioxido(oxo)zirconium Chemical compound [Ba+2].[O-][Zr]([O-])=O DQBAOWPVHRWLJC-UHFFFAOYSA-N 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
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- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
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- 230000005611 electricity Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
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- 230000005291 magnetic effect Effects 0.000 description 1
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- 150000002815 nickel Chemical class 0.000 description 1
- 229910002119 nickel–yttria stabilized zirconia Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
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Images
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- Treating Waste Gases (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
【解決手段】 含水素化合物を含む被処理ガスを処理するガス処理システムであって、電解質11を挟んで一対の電極12、13を対向させたガス分離素子10によって含水素化合物を分解するガス分解装置100と、ガス分解装置100によって生じた水素分子を分離する水素分離装置200とからなる。ガス分解素子10の一方の電極12は、他方の電極13に対向している面とは反対側の面に、多孔質金属体14が密着して取り付けられているのが好ましく、また、水素分離装置200は、多孔質支持体51とその表面に積層された水素分離膜52とからなるのが好ましい。
【選択図】 図1
Description
2NH3→N2+3H2
O2+4e−→2O2−
11 固体電解質
12 第1極
13 第2極
14 多孔質金属体
15 外部集電体
16 供給配管
17 管継手
18 第1引出線
19 第2引出線
20 予熱配管
30 ガス分解素子用ハウジング
31 加熱手段
40 外部回路
50 水素分離素子
51 多孔質支持体
52 水素分離膜
53 蓋部
60 水素分離素子用ハウジング
61 移送配管
100 ガス分解装置
200 水素分離装置
Claims (3)
- 電解質を挟んで一対の電極を対向させたガス分離素子によって被処理ガスに含まれる含水素化合物を分解するガス分解手段と、該ガス分解手段によって生じた水素分子を分離する水素分離手段とからなることを特徴とするガス処理システム。
- 前記ガス分解素子の一方の電極は、他方の電極に対向している面とは反対側の面に、多孔質金属体が密着して取り付けられていることを特徴とする、請求項1に記載のガス処理システム。
- 前記水素分離手段が、多孔質支持体とその表面に積層された水素分離膜とからなることを特徴とする、請求項1又は2に記載のガス処理システム。
Priority Applications (1)
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JP2011058564A JP5845602B2 (ja) | 2011-03-16 | 2011-03-16 | ガス処理システム |
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JP2011058564A JP5845602B2 (ja) | 2011-03-16 | 2011-03-16 | ガス処理システム |
Publications (2)
Publication Number | Publication Date |
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JP2012192349A true JP2012192349A (ja) | 2012-10-11 |
JP5845602B2 JP5845602B2 (ja) | 2016-01-20 |
Family
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JP2011058564A Active JP5845602B2 (ja) | 2011-03-16 | 2011-03-16 | ガス処理システム |
Country Status (1)
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JP (1) | JP5845602B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016178334A1 (ja) * | 2015-05-01 | 2016-11-10 | 株式会社Ihi | 熱処理装置 |
WO2017154582A1 (ja) * | 2016-03-09 | 2017-09-14 | 日本特殊陶業株式会社 | 触媒担持型水素透過膜及びその製造方法、触媒担持型水素透過膜モジュール、水素添加装置、潤滑油再生装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002239351A (ja) * | 2001-02-16 | 2002-08-27 | Sumitomo Electric Ind Ltd | 水素透過構造体およびその製造方法 |
JP2006239663A (ja) * | 2005-03-07 | 2006-09-14 | Noritake Co Ltd | 水素ガス分離膜の製造方法 |
JP2010069462A (ja) * | 2008-09-22 | 2010-04-02 | Nippon Electric Glass Co Ltd | 流体濾過装置 |
JP2010180789A (ja) * | 2009-02-05 | 2010-08-19 | Sumitomo Electric Ind Ltd | ガス分解素子 |
-
2011
- 2011-03-16 JP JP2011058564A patent/JP5845602B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002239351A (ja) * | 2001-02-16 | 2002-08-27 | Sumitomo Electric Ind Ltd | 水素透過構造体およびその製造方法 |
JP2006239663A (ja) * | 2005-03-07 | 2006-09-14 | Noritake Co Ltd | 水素ガス分離膜の製造方法 |
JP2010069462A (ja) * | 2008-09-22 | 2010-04-02 | Nippon Electric Glass Co Ltd | 流体濾過装置 |
JP2010180789A (ja) * | 2009-02-05 | 2010-08-19 | Sumitomo Electric Ind Ltd | ガス分解素子 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016178334A1 (ja) * | 2015-05-01 | 2016-11-10 | 株式会社Ihi | 熱処理装置 |
JPWO2016178334A1 (ja) * | 2015-05-01 | 2017-10-12 | 株式会社Ihi | 熱処理装置 |
US10557180B2 (en) | 2015-05-01 | 2020-02-11 | Ihi Corporation | Heat treating device |
WO2017154582A1 (ja) * | 2016-03-09 | 2017-09-14 | 日本特殊陶業株式会社 | 触媒担持型水素透過膜及びその製造方法、触媒担持型水素透過膜モジュール、水素添加装置、潤滑油再生装置 |
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