JP2012172150A5 - - Google Patents
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- Publication number
- JP2012172150A5 JP2012172150A5 JP2012029573A JP2012029573A JP2012172150A5 JP 2012172150 A5 JP2012172150 A5 JP 2012172150A5 JP 2012029573 A JP2012029573 A JP 2012029573A JP 2012029573 A JP2012029573 A JP 2012029573A JP 2012172150 A5 JP2012172150 A5 JP 2012172150A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- gallium
- component
- liquid carrier
- optionally
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims 36
- 229910052733 gallium Inorganic materials 0.000 claims 36
- 239000007788 liquid Substances 0.000 claims 19
- 150000004770 chalcogenides Chemical class 0.000 claims 14
- 125000000217 alkyl group Chemical group 0.000 claims 13
- 229910052738 indium Inorganic materials 0.000 claims 12
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 12
- CAWHJQAVHZEVTJ-UHFFFAOYSA-N methylpyrazine Chemical compound CC1=CN=CC=N1 CAWHJQAVHZEVTJ-UHFFFAOYSA-N 0.000 claims 12
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 claims 9
- 239000011669 selenium Substances 0.000 claims 9
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims 8
- 229910052711 selenium Inorganic materials 0.000 claims 8
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 claims 8
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 claims 7
- 239000000203 mixture Substances 0.000 claims 7
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 claims 6
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 claims 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 6
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical group C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 claims 6
- 239000000463 material Substances 0.000 claims 6
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 claims 6
- 239000000654 additive Substances 0.000 claims 5
- 125000003118 aryl group Chemical group 0.000 claims 5
- 230000000087 stabilizing effect Effects 0.000 claims 5
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 claims 4
- LCZUOKDVTBMCMX-UHFFFAOYSA-N 2,5-Dimethylpyrazine Chemical compound CC1=CN=C(C)C=N1 LCZUOKDVTBMCMX-UHFFFAOYSA-N 0.000 claims 4
- FINHMKGKINIASC-UHFFFAOYSA-N Tetramethylpyrazine Chemical compound CC1=NC(C)=C(C)N=C1C FINHMKGKINIASC-UHFFFAOYSA-N 0.000 claims 4
- 230000000996 additive effect Effects 0.000 claims 4
- 125000001033 ether group Chemical group 0.000 claims 4
- KVFIJIWMDBAGDP-UHFFFAOYSA-N ethylpyrazine Chemical compound CCC1=CN=CC=N1 KVFIJIWMDBAGDP-UHFFFAOYSA-N 0.000 claims 4
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 claims 4
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 claims 4
- 239000003446 ligand Substances 0.000 claims 4
- 125000005358 mercaptoalkyl group Chemical group 0.000 claims 4
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 claims 3
- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 claims 3
- KTZNVZJECQAMBV-UHFFFAOYSA-N 1-(cyclohexen-1-yl)pyrrolidine Chemical group C1CCCN1C1=CCCCC1 KTZNVZJECQAMBV-UHFFFAOYSA-N 0.000 claims 3
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 claims 3
- MCTWTZJPVLRJOU-UHFFFAOYSA-N 1-methyl-1H-imidazole Chemical compound CN1C=CN=C1 MCTWTZJPVLRJOU-UHFFFAOYSA-N 0.000 claims 3
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims 3
- LTHNHFOGQMKPOV-UHFFFAOYSA-N 2-ethylhexan-1-amine Chemical compound CCCCC(CC)CN LTHNHFOGQMKPOV-UHFFFAOYSA-N 0.000 claims 3
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims 3
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 claims 3
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 claims 3
- 239000010949 copper Substances 0.000 claims 3
- SSJXIUAHEKJCMH-UHFFFAOYSA-N cyclohexane-1,2-diamine Chemical compound NC1CCCCC1N SSJXIUAHEKJCMH-UHFFFAOYSA-N 0.000 claims 3
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims 3
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 claims 3
- ZJLMKPKYJBQJNH-UHFFFAOYSA-N propane-1,3-dithiol Chemical compound SCCCS ZJLMKPKYJBQJNH-UHFFFAOYSA-N 0.000 claims 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims 3
- MBYLVOKEDDQJDY-UHFFFAOYSA-N tris(2-aminoethyl)amine Chemical compound NCCN(CCN)CCN MBYLVOKEDDQJDY-UHFFFAOYSA-N 0.000 claims 3
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 claims 3
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 2
- KOFSFYBXUYHNJL-UHFFFAOYSA-N 1-(cyclopenten-1-yl)pyrrolidine Chemical group C1CCCN1C1=CCCC1 KOFSFYBXUYHNJL-UHFFFAOYSA-N 0.000 claims 2
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 claims 2
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical group OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 claims 2
- 239000001934 2,5-dimethylpyrazine Substances 0.000 claims 2
- XKVUYEYANWFIJX-UHFFFAOYSA-N 5-methyl-1h-pyrazole Chemical compound CC1=CC=NN1 XKVUYEYANWFIJX-UHFFFAOYSA-N 0.000 claims 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 claims 2
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 claims 2
- PMSVVUSIPKHUMT-UHFFFAOYSA-N cyanopyrazine Chemical compound N#CC1=CN=CC=N1 PMSVVUSIPKHUMT-UHFFFAOYSA-N 0.000 claims 2
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 125000003916 ethylene diamine group Chemical group 0.000 claims 2
- TWIIRMSFZNYMQE-UHFFFAOYSA-N methyl pyrazine-2-carboxylate Chemical compound COC(=O)C1=CN=CC=N1 TWIIRMSFZNYMQE-UHFFFAOYSA-N 0.000 claims 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 2
- 150000002988 phenazines Chemical group 0.000 claims 2
- -1 praxazine Chemical compound 0.000 claims 2
- XFTQRUTUGRCSGO-UHFFFAOYSA-N pyrazin-2-amine Chemical compound NC1=CN=CC=N1 XFTQRUTUGRCSGO-UHFFFAOYSA-N 0.000 claims 2
- 229960005206 pyrazinamide Drugs 0.000 claims 2
- OTVZGAXESBAAQQ-UHFFFAOYSA-N pyrazine-2,3-dicarbonitrile Chemical group N#CC1=NC=CN=C1C#N OTVZGAXESBAAQQ-UHFFFAOYSA-N 0.000 claims 2
- TZMYZOQDDVSLJU-UHFFFAOYSA-N pyrazine-2,3-dicarboxamide Chemical group NC(=O)C1=NC=CN=C1C(N)=O TZMYZOQDDVSLJU-UHFFFAOYSA-N 0.000 claims 2
- NIPZZXUFJPQHNH-UHFFFAOYSA-N pyrazine-2-carboxylic acid Chemical group OC(=O)C1=CN=CC=N1 NIPZZXUFJPQHNH-UHFFFAOYSA-N 0.000 claims 2
- IPEHBUMCGVEMRF-UHFFFAOYSA-N pyrazinecarboxamide Chemical compound NC(=O)C1=CN=CC=N1 IPEHBUMCGVEMRF-UHFFFAOYSA-N 0.000 claims 2
- 150000003252 quinoxalines Chemical group 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 239000011593 sulfur Substances 0.000 claims 2
- 229910052714 tellurium Inorganic materials 0.000 claims 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims 2
- 150000003536 tetrazoles Chemical group 0.000 claims 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 125000004103 aminoalkyl group Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000006185 dispersion Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 150000002475 indoles Chemical class 0.000 claims 1
- 125000001041 indolyl group Chemical group 0.000 claims 1
- 150000002537 isoquinolines Chemical group 0.000 claims 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 claims 1
- 238000003756 stirring Methods 0.000 claims 1
- 125000003831 tetrazolyl group Chemical group 0.000 claims 1
- 150000003573 thiols Chemical class 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/030,175 | 2011-02-18 | ||
| US13/030,175 US8343267B2 (en) | 2011-02-18 | 2011-02-18 | Gallium formulated ink and methods of making and using same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012172150A JP2012172150A (ja) | 2012-09-10 |
| JP2012172150A5 true JP2012172150A5 (https=) | 2015-03-19 |
| JP5902502B2 JP5902502B2 (ja) | 2016-04-13 |
Family
ID=46605120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012029573A Expired - Fee Related JP5902502B2 (ja) | 2011-02-18 | 2012-02-14 | ガリウム配合インク、並びにその製造方法および使用方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8343267B2 (https=) |
| JP (1) | JP5902502B2 (https=) |
| KR (1) | KR101889765B1 (https=) |
| CN (1) | CN102702841B (https=) |
| DE (1) | DE102012003206A1 (https=) |
| FR (1) | FR2971787A1 (https=) |
| TW (1) | TWI464221B (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011146115A1 (en) | 2010-05-21 | 2011-11-24 | Heliovolt Corporation | Liquid precursor for deposition of copper selenide and method of preparing the same |
| WO2012023973A2 (en) | 2010-08-16 | 2012-02-23 | Heliovolt Corporation | Liquid precursor for deposition of indium selenide and method of preparing the same |
| US8372485B2 (en) * | 2011-02-18 | 2013-02-12 | Rohm And Haas Electronic Materials Llc | Gallium ink and methods of making and using same |
| US9105797B2 (en) * | 2012-05-31 | 2015-08-11 | Alliance For Sustainable Energy, Llc | Liquid precursor inks for deposition of In—Se, Ga—Se and In—Ga—Se |
| JP6080573B2 (ja) * | 2013-01-31 | 2017-02-15 | キヤノン株式会社 | 電子写真感光体、プロセスカートリッジおよび電子写真装置 |
| CN110518084B (zh) * | 2019-08-06 | 2021-03-05 | 苏州腾晖光伏技术有限公司 | 一种镓局域掺杂的perc电池及其制备方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1993004212A1 (en) | 1991-08-26 | 1993-03-04 | Eastman Kodak Company | Preparation of group iii element-group vi element compound films |
| GB9315771D0 (en) | 1993-07-30 | 1993-09-15 | Epichem Ltd | Method of depositing thin metal films |
| US6126740A (en) | 1995-09-29 | 2000-10-03 | Midwest Research Institute | Solution synthesis of mixed-metal chalcogenide nanoparticles and spray deposition of precursor films |
| GB9711799D0 (en) | 1997-06-07 | 1997-08-06 | Vecht Aron | Preparation of sulphides and selenides |
| US7524528B2 (en) | 2001-10-05 | 2009-04-28 | Cabot Corporation | Precursor compositions and methods for the deposition of passive electrical components on a substrate |
| US6875661B2 (en) | 2003-07-10 | 2005-04-05 | International Business Machines Corporation | Solution deposition of chalcogenide films |
| US20060060237A1 (en) * | 2004-09-18 | 2006-03-23 | Nanosolar, Inc. | Formation of solar cells on foil substrates |
| US7663057B2 (en) | 2004-02-19 | 2010-02-16 | Nanosolar, Inc. | Solution-based fabrication of photovoltaic cell |
| US7494841B2 (en) | 2006-05-12 | 2009-02-24 | International Business Machines Corporation | Solution-based deposition process for metal chalcogenides |
| US8617640B2 (en) | 2006-06-12 | 2013-12-31 | Nanosolar, Inc. | Thin-film devices formed from solid group IIIA alloy particles |
| WO2008057119A1 (en) | 2006-11-09 | 2008-05-15 | Midwest Research Institue | Formation of copper-indium-selenide and/or copper-indium-gallium-selenide films from indium selenide and copper selenide precursors |
| EP2944383A3 (en) | 2006-11-09 | 2016-02-10 | Alliance for Sustainable Energy, LLC | Precursors for formation of copper selenide, indium selenide, copper indium diselenide, and/or copper indium gallium diselenide films |
| US20080280030A1 (en) | 2007-01-31 | 2008-11-13 | Van Duren Jeoren K J | Solar cell absorber layer formed from metal ion precursors |
| WO2008129250A2 (en) * | 2007-04-18 | 2008-10-30 | Nanoco Technologies Limited | Fabrication of electrically active films based on multiple layers |
| KR101634405B1 (ko) * | 2007-12-19 | 2016-06-28 | 메르크 파텐트 게엠베하 | 높은 전기전도성의 광변성 안료 |
| US20090260670A1 (en) * | 2008-04-18 | 2009-10-22 | Xiao-Chang Charles Li | Precursor ink for producing IB-IIIA-VIA semiconductors |
| CN101870458B (zh) * | 2009-04-22 | 2012-05-09 | 钟润文 | 多元金属硫族元素化合物和靶材及涂层材料的制备方法 |
| US8277894B2 (en) * | 2009-07-16 | 2012-10-02 | Rohm And Haas Electronic Materials Llc | Selenium ink and methods of making and using same |
| US8308973B2 (en) * | 2009-07-27 | 2012-11-13 | Rohm And Haas Electronic Materials Llc | Dichalcogenide selenium ink and methods of making and using same |
| US8709917B2 (en) * | 2010-05-18 | 2014-04-29 | Rohm And Haas Electronic Materials Llc | Selenium/group 3A ink and methods of making and using same |
| US8282995B2 (en) * | 2010-09-30 | 2012-10-09 | Rohm And Haas Electronic Materials Llc | Selenium/group 1b/group 3a ink and methods of making and using same |
| US8372485B2 (en) * | 2011-02-18 | 2013-02-12 | Rohm And Haas Electronic Materials Llc | Gallium ink and methods of making and using same |
-
2011
- 2011-02-18 US US13/030,175 patent/US8343267B2/en not_active Expired - Fee Related
-
2012
- 2012-02-14 JP JP2012029573A patent/JP5902502B2/ja not_active Expired - Fee Related
- 2012-02-16 TW TW101105027A patent/TWI464221B/zh not_active IP Right Cessation
- 2012-02-17 FR FR1251513A patent/FR2971787A1/fr active Pending
- 2012-02-17 KR KR1020120016522A patent/KR101889765B1/ko not_active Expired - Fee Related
- 2012-02-17 DE DE201210003206 patent/DE102012003206A1/de not_active Ceased
- 2012-02-17 CN CN201210046775.3A patent/CN102702841B/zh not_active Expired - Fee Related
- 2012-11-16 US US13/679,519 patent/US9080068B2/en not_active Expired - Fee Related
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