JP2012156485A - Co2Fe基ホイスラー合金とこれを用いたスピントロニクス素子 - Google Patents
Co2Fe基ホイスラー合金とこれを用いたスピントロニクス素子 Download PDFInfo
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- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
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- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
- H01F10/193—Magnetic semiconductor compounds
- H01F10/1936—Half-metallic, e.g. epitaxial CrO2 or NiMnSb films
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- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
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- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/325—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being noble metal
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- Y10T428/00—Stock material or miscellaneous articles
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- Y10T428/1107—Magnetoresistive
- Y10T428/1121—Multilayer
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/11—Magnetic recording head
- Y10T428/1107—Magnetoresistive
- Y10T428/1121—Multilayer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12611—Oxide-containing component
Abstract
【解決手段】 Co2Fe(GaXGeX−1)ホイスラー合金は0.25<X<0.60の領域でPCAR法により測定したスピン偏極率は0.65以上の高い値を示す。また1288Kと高いキュリー点をもつことから、Co2Fe(GaXGeX−1)ホイスラー合金が実用材料として有望である。実際、Co2Fe(GaXGeX−1)ホイスラー合金を電極としたCPP−GMR素子は世界最高のMR比を、STO素子では高い出力を、NLSV素子では高いスピン信号を示した。
【選択図】 図4
Description
さらなるスピントロニクス素子の高性能化にはCo2FeAlSiよりも大きなスピン偏極率を示す材料の開発が望まれている。
Co2FeGaバルク合金:・L21単相での形成が可能。
・キュリー点が1093K。
・スピン偏極率は0.59(59%)。
・計算ではハーフメタルではない。
Co2FeGeバルク合金:・L21単相の形成は困難。
・計算ではハーフメタル性が示されている。
しかしながら、Co2Fe(GaGe)合金に関しては、バルク合金、薄膜合金のいずれについても報告されていない。
(1)Co2Fe(GaxGe1−x)バルク合金の製造及び特性測定
(2)Co2Fe(GaxGe1−x)薄膜合金の製造及び特性測定
(3)高性能スピントロニクス素子の製作
の手順で、実験を進め、高いスピン偏極率を持ち、高いGMR比及び発振特性を示すCo2Fe(GaxGe1−x)薄膜合金を見出し、この薄膜を組み込んだ高性能スピントロニクス素子を開発した。
<第一原理計算>図1と図2にCo2FeGa、Co2FeGe及びCo2Fe(Ga0.5Ge0.5)の第一原理計算による状態密度曲線を示す。計算はクーロンポテンシャルを考慮したGeneralized Gradient Approximation(GGA)法により行い、クーロンポテンシャルは磁化を再現するような値としている。結晶構造はL21とB2の2通りである。L21構造では、Co2FeGeはフェルミ面が少数スピンのバンドギャップ中にありハーフメタル、Co2FeGaはフェルミ面に少数スピンの状態が存在しておりハーフメタルではない。Co2Fe(Ga0.5Ge0.5)ではハーフメタルである。B2構造の場合は、いずれの合金も少数スピンバンドのギャップが狭くなるが、Co2Fe(Ga0.5Ge0.5)ではギャップの中央にフェルミ面が存在しハーフメタルであることがわかる。以上のことより、Co2Fe(Ga0.5Ge0.5)ではB2構造でもハーフメタル性が示されていること、フェルミ面がギャップ中央に位置しており不規則によるスピン偏極率の減少の影響が少ないことから、高いL21規則度が得にくい薄膜においても高いスピン偏極率を示すことが予想される。
Co2Fe(GaxGe1−x)バルク合金は、表1に示す成分配合で99.99%以上の純度の塊を用意し、それらをアーク溶解でボタン状のバルク合金を作製した。このときのバルク合金の重さは15gでこれを450℃で168時間、He雰囲気中での熱処理を行った。誘導結合プラズマ発光(ICP)分析による化学分析の結果より狙い通りの組成が得られていることを確認している。
以上のバルク合金の実験から、Co2Fe(Ga0.5Ge0.5)合金は高いスピン偏極率を持つので、薄膜による実験を行った。薄膜はCo46.56Fe22.65Ga17.92Ge15.63ターゲットを用いたDCマグネトロンスパッタ法により行った。ICP分析による薄膜の組成はCo52Fe22Ga13Ge13である。基板はMgO単結晶基板を用い、下地層としてCr(10)/Ag(100)を成膜した後に、Co52Fe22Ga13Ge13薄膜を20nm堆積した。ここで、Cr(10)/Ag(100)は、それぞれの金属の成膜厚み(nm単位)を示す。
Co52Fe22Ga13Ge13薄膜の実験結果より、500℃の熱処理によりL21構造と高いスピン偏極率が得られることが明らかとなった。そこでCo52Fe22Ga13Ge13を強磁性電極としてCPP−GMR素子を作製し、その伝導特性の評価を行った。
Claims (5)
- スピントロニクスデバイスに用いられるCo2Fe基ホイスラー合金であって、下記式1に示すような成分組成(0.25<X<0.60)であることを特徴とするCo2Fe基ホイスラー合金。
<式1>
Co2Fe(GaXGe1−x)(0.25<X<0.60) - 請求項1のCo2Fe基ホイスラー合金であって、スピン偏極率が0.65以上であることを特徴とするCo2Fe基ホイスラー合金。
- 請求項1のCo2Fe基ホイスラー合金を強磁性電極として使用し、MgO基板/Cr/Ag/ Co2Fe基ホイスラー合金/Ag/Co2Fe基ホイスラー合金/Ag/Ruからなる薄膜積層構造を有することを特徴とするCPP−GMR素子。
- 請求項1のCo2Fe基ホイスラー合金を強磁性電極として使用し、MgO基板/Cr/Ag/ Co2Fe基ホイスラー合金/Ag/Co2Fe基ホイスラー合金/Ag/Ruからなる薄膜積層構造を有することを特徴とするSTO素子。
- 請求項1のCo2Fe基ホイスラー合金を強磁性電極として使用し、MgO基板/Cr/Ag/ Co2Fe基ホイスラー合金からなる2本の強磁性細線とそれを橋渡しするAgの非磁性細線からなる構造を有することを特徴とするNLSV素子。
Priority Applications (3)
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JP2011227488A JP5696990B2 (ja) | 2011-01-07 | 2011-10-14 | Co2Fe基ホイスラー合金とこれを用いたスピントロニクス素子 |
PCT/JP2011/079622 WO2012093587A1 (ja) | 2011-01-07 | 2011-12-21 | Co2Fe基ホイスラー合金とこれを用いたスピントロニクス素子 |
US13/935,095 US9336937B2 (en) | 2011-01-07 | 2013-07-03 | Co2Fe-based heusler alloy and spintronics devices using the same |
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JP2011227488A JP5696990B2 (ja) | 2011-01-07 | 2011-10-14 | Co2Fe基ホイスラー合金とこれを用いたスピントロニクス素子 |
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Cited By (2)
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WO2016017612A1 (ja) * | 2014-08-01 | 2016-02-04 | 国立研究開発法人物質・材料研究機構 | 磁気抵抗素子、当該磁気抵抗素子を用いた磁気ヘッド及び磁気再生装置 |
CN112349831A (zh) * | 2019-08-08 | 2021-02-09 | Tdk株式会社 | 磁阻效应元件以及惠斯勒合金 |
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CN102901940B (zh) | 2012-10-26 | 2015-07-15 | 苏州大学 | 基于磁温差电效应的传感器元件及其实现方法 |
US9230597B2 (en) * | 2013-11-01 | 2016-01-05 | HGST Netherlands B.V. | Magnetic head having a spin torque oscillator (STO) with a hybrid heusler field generation layer (FGL) |
CN107004760B (zh) * | 2014-12-18 | 2020-11-03 | 英特尔公司 | 用于从原位沉积的磁性叠层制造自旋逻辑器件的方法 |
US9728210B2 (en) | 2015-11-25 | 2017-08-08 | Western Digital Technologies, Inc. | Texture-control layer for spin torque oscillator |
JP6754108B2 (ja) | 2015-12-04 | 2020-09-09 | 国立研究開発法人物質・材料研究機構 | 単結晶磁気抵抗素子、その製造方法及びその使用方法 |
US10408896B2 (en) | 2017-03-13 | 2019-09-10 | University Of Utah Research Foundation | Spintronic devices |
US10396123B2 (en) * | 2017-07-26 | 2019-08-27 | International Business Machines Corporation | Templating layers for perpendicularly magnetized Heusler films |
JP2020155564A (ja) * | 2019-03-20 | 2020-09-24 | キオクシア株式会社 | 磁気記憶装置 |
JP6806939B1 (ja) | 2019-08-08 | 2021-01-06 | Tdk株式会社 | 磁気抵抗効果素子およびホイスラー合金 |
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2011
- 2011-10-14 JP JP2011227488A patent/JP5696990B2/ja not_active Expired - Fee Related
- 2011-12-21 WO PCT/JP2011/079622 patent/WO2012093587A1/ja active Application Filing
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WO2016017612A1 (ja) * | 2014-08-01 | 2016-02-04 | 国立研究開発法人物質・材料研究機構 | 磁気抵抗素子、当該磁気抵抗素子を用いた磁気ヘッド及び磁気再生装置 |
JPWO2016017612A1 (ja) * | 2014-08-01 | 2017-05-25 | 国立研究開発法人物質・材料研究機構 | 磁気抵抗素子、当該磁気抵抗素子を用いた磁気ヘッド及び磁気再生装置 |
CN112349831A (zh) * | 2019-08-08 | 2021-02-09 | Tdk株式会社 | 磁阻效应元件以及惠斯勒合金 |
CN112349831B (zh) * | 2019-08-08 | 2023-09-26 | Tdk株式会社 | 磁阻效应元件以及惠斯勒合金 |
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