JP2012134667A - 高周波スイッチ - Google Patents
高周波スイッチ Download PDFInfo
- Publication number
- JP2012134667A JP2012134667A JP2010283714A JP2010283714A JP2012134667A JP 2012134667 A JP2012134667 A JP 2012134667A JP 2010283714 A JP2010283714 A JP 2010283714A JP 2010283714 A JP2010283714 A JP 2010283714A JP 2012134667 A JP2012134667 A JP 2012134667A
- Authority
- JP
- Japan
- Prior art keywords
- switch
- mosfets
- frequency switch
- port
- transmission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005540 biological transmission Effects 0.000 claims abstract description 41
- 239000000758 substrate Substances 0.000 claims abstract description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 7
- 239000010703 silicon Substances 0.000 claims abstract description 7
- 230000000903 blocking effect Effects 0.000 claims description 2
- 238000003780 insertion Methods 0.000 abstract description 14
- 230000037431 insertion Effects 0.000 abstract description 14
- 238000000034 method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000004891 communication Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 101100079340 Rattus norvegicus Nalcn gene Proteins 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 210000000746 body region Anatomy 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000005405 multipole Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/687—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
- H03K17/693—Switching arrangements with several input- or output-terminals, e.g. multiplexers, distributors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0642—Isolation within the component, i.e. internal isolation
- H01L29/0649—Dielectric regions, e.g. SiO2 regions, air gaps
- H01L29/0653—Dielectric regions, e.g. SiO2 regions, air gaps adjoining the input or output region of a field-effect device, e.g. the source or drain region
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/687—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
- H03K17/6871—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors the output circuit comprising more than one controlled field-effect transistor
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B1/00—Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
- H04B1/38—Transceivers, i.e. devices in which transmitter and receiver form a structural unit and in which at least one part is used for functions of transmitting and receiving
- H04B1/40—Circuits
- H04B1/44—Transmit/receive switching
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Computer Networks & Wireless Communication (AREA)
- Signal Processing (AREA)
- Electronic Switches (AREA)
- Thin Film Transistor (AREA)
Abstract
【解決手段】アンテナへ送信信号が出力される共通ポートと、送信信号が入力される送信ポートと、複数の前記送信ポートと前記共通ポートとの間にそれぞれ接続され、各送信ポートと前記共通ポートとを導通または遮断する複数のスイッチ部と、を有し、前記スイッチ部は、シリコン基板に形成され直列に接続された複数のMOSFETを有し、前記複数のMOSFETはボディコンタクト型FETおよびフローティングボディ型FETのいずれかであって、各スイッチ部はボディコンタクト型FETおよびフローティングボディ型FETの両方を含む。
【選択図】図1
Description
100A、100B スイッチ部、
110 アンテナ。
Claims (3)
- アンテナへ送信信号が出力される共通ポートと、
前記送信信号が入力される送信ポートと、
複数の前記送信ポートと前記共通ポートとの間にそれぞれ接続され、各送信ポートから前記共通ポートへの前記送信信号を導通または遮断する複数のスイッチ部と、を有し、
前記スイッチ部は、シリコン基板に形成され直列に接続された複数のMOSFETを有し、前記複数のMOSFETはボディコンタクト型FETおよびフローティングボディ型FETのいずれかであって、各スイッチ部はボディコンタクト型FETおよびフローティングボディ型FETの両方を含むことを特徴とする高周波スイッチ。 - 各スイッチ部において、前記ボディコンタクト型FETは前記フローティングボディ型FETよりも前記共通ポートに近い位置に接続されたことを特徴とする請求項1に記載の高周波スイッチ。
- 前記シリコン基板はSOI基板であることを特徴とする請求項1または2に記載の高周波スイッチ。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010283714A JP5714886B2 (ja) | 2010-12-20 | 2010-12-20 | 高周波スイッチ |
KR1020110087273A KR101309445B1 (ko) | 2010-12-20 | 2011-08-30 | 고주파 스위치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010283714A JP5714886B2 (ja) | 2010-12-20 | 2010-12-20 | 高周波スイッチ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012134667A true JP2012134667A (ja) | 2012-07-12 |
JP5714886B2 JP5714886B2 (ja) | 2015-05-07 |
Family
ID=46649761
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010283714A Expired - Fee Related JP5714886B2 (ja) | 2010-12-20 | 2010-12-20 | 高周波スイッチ |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5714886B2 (ja) |
KR (1) | KR101309445B1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101378866B1 (ko) * | 2012-08-23 | 2014-03-27 | 주식회사 하이딥 | 저전력 rf 스위치 |
KR101952857B1 (ko) * | 2013-12-20 | 2019-02-27 | 삼성전기주식회사 | 스위칭 회로 및 이를 포함하는 고주파 스위치 |
CN116192112A (zh) | 2021-11-29 | 2023-05-30 | 株式会社东芝 | 半导体装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008011120A (ja) * | 2006-06-28 | 2008-01-17 | Toshiba Corp | 半導体スイッチ回路 |
US20080079653A1 (en) * | 2006-10-03 | 2008-04-03 | Minsik Ahn | Systems, Methods, and Apparatuses for Complementary Metal Oxide Semiconductor (CMOS) Antenna Switches Using Body Switching in Multistacking Structure |
JP2009158671A (ja) * | 2007-12-26 | 2009-07-16 | Toshiba Corp | 高周波スイッチ |
JP2009194891A (ja) * | 2008-01-15 | 2009-08-27 | Toshiba Corp | 高周波スイッチ回路 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5041154B2 (ja) * | 2007-11-19 | 2012-10-03 | ルネサスエレクトロニクス株式会社 | 高周波スイッチ回路 |
-
2010
- 2010-12-20 JP JP2010283714A patent/JP5714886B2/ja not_active Expired - Fee Related
-
2011
- 2011-08-30 KR KR1020110087273A patent/KR101309445B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008011120A (ja) * | 2006-06-28 | 2008-01-17 | Toshiba Corp | 半導体スイッチ回路 |
US20080079653A1 (en) * | 2006-10-03 | 2008-04-03 | Minsik Ahn | Systems, Methods, and Apparatuses for Complementary Metal Oxide Semiconductor (CMOS) Antenna Switches Using Body Switching in Multistacking Structure |
JP2009158671A (ja) * | 2007-12-26 | 2009-07-16 | Toshiba Corp | 高周波スイッチ |
JP2009194891A (ja) * | 2008-01-15 | 2009-08-27 | Toshiba Corp | 高周波スイッチ回路 |
Also Published As
Publication number | Publication date |
---|---|
JP5714886B2 (ja) | 2015-05-07 |
KR101309445B1 (ko) | 2013-09-23 |
KR20120069526A (ko) | 2012-06-28 |
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