JP2012117123A - Rolled copper foil - Google Patents

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JP2012117123A
JP2012117123A JP2010268944A JP2010268944A JP2012117123A JP 2012117123 A JP2012117123 A JP 2012117123A JP 2010268944 A JP2010268944 A JP 2010268944A JP 2010268944 A JP2010268944 A JP 2010268944A JP 2012117123 A JP2012117123 A JP 2012117123A
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copper foil
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oxygen
rolled copper
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JP5562217B2 (en
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Takemi Muroga
岳海 室賀
Soshi Seki
聡至 関
Noboru Hagiwara
登 萩原
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Hitachi Cable Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a rolled copper foil which can exert stable, excellent properties for a bending fatigue life even after application of heat treatment in the range of wide temperature conditions.SOLUTION: The rolled copper foil includes: copper (Cu) as the main component with inevitable impurities; boron (B); silver (Ag); and one or more kinds of additive elements selected from an elemental group excluding copper (Cu) and silver (Ag), which has a face-centered cubic crystal structure and also has the value of stacking fault energy higher than that of copper (Cu).

Description

本発明は、圧延銅箔に係わり、特に、フレキシブルプリント配線板等に好適に用いられる圧延銅箔に関する。   The present invention relates to a rolled copper foil, and more particularly to a rolled copper foil suitably used for a flexible printed wiring board and the like.

フレキシブルプリント配線板(Flexible Printed Circuit:FPC)は、厚さが薄く可撓性に優れることから、電子機器等への実装形態における自由度が高い。そのため、折り畳み式携帯電話の折り曲げ部、デジタルカメラ、プリンターヘッド等の可動部、及びHard Disk Drive(HDD)、Digital Versatile Disc(DVD)、Compact Disk(CD)等、ディスク関連機器の可動部の配線等にFPCが用いられている。   A flexible printed circuit (FPC) is thin and excellent in flexibility, and thus has a high degree of freedom in a mounting form on an electronic device or the like. Therefore, folding parts of folding cellular phones, movable parts such as digital cameras and printer heads, and wiring of movable parts of disk-related equipment such as Hard Disk Drive (HDD), Digital Versatile Disc (DVD), Compact Disk (CD), etc. For example, FPC is used.

近年、装置の小型化や高水準化に伴い、優れた屈曲疲労寿命特性を持つFPCが要求されている。FPCの屈曲疲労寿命特性を高めるためには、その素材となる圧延銅箔の屈曲疲労寿命特性を高めることが有効である。   In recent years, an FPC having excellent bending fatigue life characteristics has been demanded with downsizing and higher standardization of devices. In order to increase the bending fatigue life characteristics of the FPC, it is effective to increase the bending fatigue life characteristics of the rolled copper foil as the material.

FPCに使用される銅箔の素材には、主にタフピッチ銅(酸素含有量100〜500mass ppm)が用いられている。また、FPCの屈曲疲労寿命特性を高めるため、タフピッチ銅に合金元素を添加する発明がなされている。   Tough pitch copper (oxygen content of 100 to 500 mass ppm) is mainly used as the material of the copper foil used for FPC. Moreover, in order to improve the bending fatigue life characteristic of FPC, invention which adds an alloy element to tough pitch copper is made | formed.

例えば、特許文献1では、タフピッチ銅にAg、Au、Pd、Pt、Rh、Ir、Ru、Osの内の1種以上を、次式で定義したTが100〜400になる範囲で含有し、T=[Ag]+0.6[Au]+0.6[Pd]+0.4[Rh]+0.3[Ir]+0.3[Ru]+0.3[Os]、 S、As、Sb、Bi、Se及びTeの合計量が0.003重量%以下(30ppm以下)であり、厚さが5〜50μmであり、200℃で30分間の焼鈍後の圧延面のX線回折で求めた200面の強度(I)が微粉末銅のX線回折で求めた200面の強度(I)に対し、I/I>20であり、120〜150℃の半軟化温度を有し、室温において継続して300N/mm以上の引張り強さを保持しているフレキシブルプリント回路基板用圧延銅箔が記載されている。 For example, in Patent Document 1, the tough pitch copper contains one or more of Ag, Au, Pd, Pt, Rh, Ir, Ru, and Os in a range where T defined by the following formula is 100 to 400, T = [Ag] +0.6 [Au] +0.6 [Pd] +0.4 [Rh] +0.3 [Ir] +0.3 [Ru] +0.3 [Os], S, As, Sb, Bi, The total amount of Se and Te is 0.003% by weight or less (30 ppm or less), the thickness is 5 to 50 μm, and the 200 surfaces obtained by X-ray diffraction of the rolled surface after annealing at 200 ° C. for 30 minutes. The strength (I) is I / I 0 > 20 with respect to the strength (I 0 ) of 200 planes determined by X-ray diffraction of fine powder copper, has a semi-softening temperature of 120 to 150 ° C., and continues at room temperature for a flexible printed circuit board holding the 300N / mm 2 or more tensile strength and Nobedohaku have been described.

特開2002−167632号公報JP 2002-167632 A

特許文献1に記載のフレキシブルプリント回路基板用圧延銅箔は、上記構成を備えるので、優れた屈曲疲労寿命特性を発揮する。しかしながら、当該銅箔に含有されている酸素から酸化物が生成されると、当該酸化物が疲労破壊の起点になる場合があり、屈曲疲労寿命特性の向上には限界がある。   Since the rolled copper foil for flexible printed circuit boards described in Patent Document 1 has the above-described configuration, it exhibits excellent bending fatigue life characteristics. However, when an oxide is generated from oxygen contained in the copper foil, the oxide may be a starting point for fatigue failure, and there is a limit to improving the bending fatigue life characteristics.

また、酸化物をほとんど含まない無酸素銅を用いた場合、無酸素銅自身が酸素を含有する(100〜500ppm含有)銅より軟化温度が高いため、使用できる軟化温度の最低条件が高くなってしまう。さらに、無酸素銅に特許文献1のような添加元素を用いると、さらに銅の軟化温度が高くなってしまい、高温の条件においては好都合であるが、低温側の条件では全く使用できない。   In addition, when oxygen-free copper containing almost no oxide is used, since the oxygen-free copper itself has a higher softening temperature than copper containing oxygen (containing 100 to 500 ppm), the minimum condition of the usable softening temperature is increased. End up. Furthermore, when an additive element such as Patent Document 1 is used for oxygen-free copper, the softening temperature of copper is further increased, which is convenient under high temperature conditions, but cannot be used under low temperature conditions.

さらに、無酸素銅に何も添加しない状態では、酸化物の影響が無いので低温の条件(低温条件といっても、酸素を含有する銅を用いた場合よりは高い温度になってしまう。)では、銅箔中で再結晶の進行が適正に進み良好な屈曲疲労寿命特性が得られるが、高温の条件では、銅箔中で再結晶が過剰に進行することにより屈曲疲労寿命特性が低下する場合があり、広い温度範囲の熱処理に対応できない。   Further, in the state where nothing is added to the oxygen-free copper, there is no influence of the oxide, so the temperature is low (even if the temperature is low, the temperature is higher than when oxygen-containing copper is used). In, the progress of recrystallization properly proceeds in copper foil, and good bending fatigue life characteristics are obtained. In some cases, heat treatment over a wide temperature range is not possible.

そこで、本発明は、広い温度範囲の熱処理を施した後でも優れた屈曲疲労寿命特性を発揮する圧延銅箔を提供することを目的とする。   Accordingly, an object of the present invention is to provide a rolled copper foil that exhibits excellent bending fatigue life characteristics even after heat treatment in a wide temperature range.

上記課題を解決するため、本発明は、主成分としての銅(Cu)及び不可避的不純物と、ホウ素(B)と、銀(Ag)と、銅(Cu)及び銀(Ag)以外で結晶構造が面心立方で、かつ積層欠陥エネルギーの値が銅(Cu)より大きい値を有する元素群の中から選択される1種以上の添加元素と、を含むことを特徴とする圧延銅箔を提供する。   In order to solve the above problems, the present invention has a crystal structure other than copper (Cu) and inevitable impurities as main components, boron (B), silver (Ag), copper (Cu) and silver (Ag). A rolled copper foil characterized by comprising one or more additional elements selected from the group of elements having a face-centered cubic and stacking fault energy value greater than copper (Cu) To do.

また、前記圧延銅箔において、酸素を0.002重量%以下(20ppm以下)含んでもよい。   Further, the rolled copper foil may contain 0.002% by weight or less (20 ppm or less) of oxygen.

また、前記圧延銅箔において、厚さが20μm以下であることが好ましい。   In the rolled copper foil, the thickness is preferably 20 μm or less.

また、前記ホウ素(B)を0.003重量%以上0.05重量%以下(30ppm以上500ppm以下)、並びに前記銀(Ag)を0.002重量%以上0.025重量%以下(20ppm以上250ppm以下)含有することが好ましい。   Further, the boron (B) is 0.003% to 0.05% by weight (30 ppm to 500 ppm), and the silver (Ag) is 0.002% to 0.025% by weight (20 ppm to 250 ppm). The following are preferable:

さらに、前記添加元素が、ニッケル(Ni)及び/又はアルミニウム(Al)であることが好ましい。   Furthermore, the additive element is preferably nickel (Ni) and / or aluminum (Al).

また、前記ニッケル(Ni)及び/又はアルミニウム(Al)が少なくとも一方の総量で0.003重量%以上0.03重量%以下(30ppm以上300ppm以下)含有することが好ましい。   Further, the nickel (Ni) and / or aluminum (Al) is preferably contained in a total amount of at least one of 0.003% by weight or more and 0.03% by weight or less (30 ppm or more and 300 ppm or less).

本発明の圧延銅箔は、広い温度条件の範囲で熱処理を施した後でも、安定して優れた屈曲疲労寿命特性を発揮することができる。   The rolled copper foil of the present invention can stably exhibit excellent bending fatigue life characteristics even after heat treatment in a wide temperature range.

本発明の実施の形態に係る圧延銅箔の製造の流れを示す図である。It is a figure which shows the flow of manufacture of the rolled copper foil which concerns on embodiment of this invention. 屈曲疲労寿命試験(摺動屈曲試験)の試験方法の概要を示す図である。It is a figure which shows the outline | summary of the test method of a bending fatigue life test (sliding bending test).

(圧延銅箔の概要)
本実施の形態に係る圧延銅箔は、例えばフレキシブルプリント配線板等の可撓性配線部材に用いられる圧延銅箔である。具体的に、本実施の形態に係る圧延銅箔は、主成分としての銅(Cu)及び不可避的不純物と、ホウ素(B)と、銀(Ag)と、銅(Cu)及び銀(Ag)以外で結晶構造が面心立方で、かつ積層欠陥エネルギーの値が銅(Cu)より大きい値を有する元素群の中から選択される1種以上の添加元素と元素、とを含んで構成される。そして、一例として、本実施の形態に係る圧延銅箔は、後述する圧延銅箔の製造工程の最終冷間圧延工程を経た後であって再結晶焼鈍を経る前に得られる圧延銅箔であり、例えばFPC用の圧延銅箔に用いることを目的として、50μm以下、好ましくは20μm以下の厚さを有して形成される。
(Outline of rolled copper foil)
The rolled copper foil which concerns on this Embodiment is a rolled copper foil used for flexible wiring members, such as a flexible printed wiring board, for example. Specifically, the rolled copper foil according to the present embodiment includes copper (Cu) and inevitable impurities as main components, boron (B), silver (Ag), copper (Cu), and silver (Ag). Other than the above, it is configured to include one or more additive elements and elements selected from the group of elements having a crystal structure of face-centered cubic and a stacking fault energy value larger than copper (Cu). . And as an example, the rolled copper foil which concerns on this Embodiment is the rolled copper foil obtained after passing through the final cold rolling process of the manufacturing process of the rolled copper foil mentioned later, and before going through recrystallization annealing. For example, it is formed to have a thickness of 50 μm or less, preferably 20 μm or less for the purpose of use in a rolled copper foil for FPC.

(銅(Cu))
本実施の形態に係る圧延銅箔は、例えば無酸素銅又は無酸素銅に準ずる銅材を母材にして形成される。ここで、本実施の形態に係る「無酸素銅」とは、例えばJIS C1020で規定される無酸素銅で99.96%以上の純度であるが、酸素含有量は完全にゼロであるわけではなく、数ppm(0.000数%)程度の酸素が、無酸素銅に含まれることは排除されない。従って、本実施の形態に係る圧延銅箔は、一例として0.002重量%以下(すなわち、20ppm以下)の酸素を含んで形成される。なお、圧延銅箔中において酸化物が生成することを抑制すべく、酸素含有量を更に低減させることが好ましい。
(Copper (Cu))
The rolled copper foil according to the present embodiment is formed using, for example, oxygen-free copper or a copper material equivalent to oxygen-free copper as a base material. Here, “oxygen-free copper” according to the present embodiment is, for example, oxygen-free copper specified by JIS C1020 and having a purity of 99.96% or more, but the oxygen content is not completely zero. It is not excluded that oxygen of several ppm (0.000 several percent) is contained in oxygen-free copper. Therefore, the rolled copper foil according to the present embodiment is formed by containing 0.002% by weight or less (that is, 20 ppm or less) of oxygen as an example. In addition, in order to suppress that an oxide produces | generates in rolled copper foil, it is preferable to further reduce oxygen content.

また、無酸素銅に不可避的不純物、例えば硫黄(S)等が固溶することにより無酸素銅の軟化温度は上昇する傾向がある。一方、不可避的不純物(例えばS等)が所定の添加元素と反応して化合物を生成することで無酸素銅中への固溶がなくなれば、当該無酸素銅の軟化温度は低下する傾向にある。   Further, the inevitable impurities such as sulfur (S) are dissolved in the oxygen-free copper, so that the softening temperature of the oxygen-free copper tends to increase. On the other hand, if the inevitable impurities (for example, S) react with a predetermined additive element to form a compound to eliminate the solid solution in the oxygen-free copper, the softening temperature of the oxygen-free copper tends to decrease. .

(ホウ素(B))
ホウ素(B)は、製造される圧延銅箔の軟化温度を低下、すなわち、再結晶を低い温度から開始させる役割をする。ここで、ホウ素(B)の添加量の上限を0.05重量%(500ppm)に設定した理由は、本実施の形態に係る圧延銅箔の製造設備において、母材としての銅へのホウ素(B)の固溶量の最大が0.05重量%程度であることによる。また、ホウ素(B)の添加量の下限を0.003重量%(30ppm)に設定した理由は、実用上の観点から製造される圧延銅箔の軟化温度を適切な温度まで低下させることと、量産での制御可能な最低量のためである。
(Boron (B))
Boron (B) serves to lower the softening temperature of the produced rolled copper foil, that is, to start recrystallization from a lower temperature. Here, the reason why the upper limit of the addition amount of boron (B) is set to 0.05 wt% (500 ppm) is that boron in copper as a base material in the manufacturing equipment for rolled copper foil according to the present embodiment ( This is because the maximum solid solution amount of B) is about 0.05% by weight. Moreover, the reason for setting the lower limit of the addition amount of boron (B) to 0.003% by weight (30 ppm) is to reduce the softening temperature of the rolled copper foil produced from a practical viewpoint to an appropriate temperature, This is because of the minimum amount that can be controlled in mass production.

また、ホウ素(B)に関して、発明者が得た知見は以下のとおりである。
本実施の形態に係る圧延銅箔は、無酸素銅又は無酸素銅に準ずる銅を母材として形成される。先ず、ホウ素(B)は、不可避的不純物、例えば硫黄(S)等との間で化合物を生成する。ここで、S等が母材に固溶すると、母材の軟化温度が上昇することが考えられるが、S等とホウ素が化合物を生成することで、S等の母材への固溶を抑制できる。これにより、母材の軟化温度が上昇することを抑制できる。通常の無酸素銅の軟化温度が高い理由は、不可避的不純物であるS等が母材に固溶していることが大きな要因の一つであると考えられている。しかしながら、通常の無酸素銅の軟化温度が高い理由は、これだけでは完全には説明がつかない。つまり、他にも大きな要因があると考えられるが、具体的には現在明らかではない。ただ、Bを添加した無酸素銅の軟化温度は、Bを添加しない通常の無酸素銅より低下することは実験事実である。
Moreover, the knowledge which the inventor acquired regarding boron (B) is as follows.
The rolled copper foil according to the present embodiment is formed using oxygen-free copper or copper equivalent to oxygen-free copper as a base material. First, boron (B) forms a compound with inevitable impurities such as sulfur (S). Here, when S or the like is dissolved in the base material, the softening temperature of the base material may be increased. However, S or the like and boron generate a compound to suppress the solid solution of S or the like in the base material. it can. Thereby, it can suppress that the softening temperature of a base material rises. The reason why the softening temperature of ordinary oxygen-free copper is high is considered that one of the major factors is that S, which is an inevitable impurity, is dissolved in the base material. However, the reason why the softening temperature of ordinary oxygen-free copper is high cannot be completely explained. In other words, there are other major factors, but it is not clear at present. However, it is an experimental fact that the softening temperature of oxygen-free copper to which B is added is lower than that of normal oxygen-free copper to which B is not added.

(銀(Ag))
銀(Ag)は、製造される圧延銅箔の再結晶における結晶粒の成長速度を抑制する効果がある。
(Silver (Ag))
Silver (Ag) has an effect of suppressing the growth rate of crystal grains in recrystallization of a rolled copper foil to be produced.

(ニッケル(Ni)及び/又はアルミニウム(Al))
銅(Cu)及び銀(Ag)以外で結晶構造が面心立方で、かつ積層欠陥エネルギーの値がCuより大きい値を有する元素として、ニッケル(Ni)及び/又はアルミニウム(Al)が考えられる。
(Nickel (Ni) and / or Aluminum (Al))
Other than copper (Cu) and silver (Ag), nickel (Ni) and / or aluminum (Al) can be considered as an element having a crystal structure of face-centered cubic and a stacking fault energy value larger than Cu.

表1は、積層欠陥エネルギーの値を示した表である(木村宏 著、「材料強度の考え方」、(株)アグネ技術センター、2004年2月10日改訂版第2刷発行、p.134より)。   Table 1 shows the value of stacking fault energy (Hiroshi Kimura, “Concept of Material Strength”, Agne Technology Center Co., Ltd., February 10, 2004, revised edition 2nd edition, p.134) Than).

Figure 2012117123
Figure 2012117123

ここで、積層欠陥エネルギーと屈曲寿命特性について、発明者は金属材料の見地とこれまでの実験による知見から次のように考察した。積層欠陥エネルギーが大きい銅箔ほど、屈曲動作において銅結晶中の転位は移動がし易くなる(転位が銅の結晶粒界を飛び越えることができるようになる)ため、結晶粒界への転位の蓄積、すなわち金属疲労の蓄積が遅延される。すなわち、積層欠陥エネルギーが低下した銅合金を用いて製造される銅合金箔の屈曲寿命特性は、低下してしまうと考えられる。従って、銅を合金化した場合、屈曲寿命特性のために積層欠陥エネルギーを低下させてはならない。   Here, the inventors considered the stacking fault energy and the bending life characteristics as follows from the viewpoint of the metal material and the knowledge obtained through experiments so far. The copper foil with higher stacking fault energy, the easier it is for dislocations in the copper crystal to move during the bending operation (dislocations can jump over the crystal grain boundaries of copper), so the accumulation of dislocations at the crystal grain boundaries That is, the accumulation of metal fatigue is delayed. That is, it is considered that the bending life characteristics of a copper alloy foil manufactured using a copper alloy having a reduced stacking fault energy will be reduced. Therefore, when copper is alloyed, the stacking fault energy must not be reduced due to the flex life characteristics.

一般に、積層欠陥エネルギーが大きいほど、転位の拡張は小さいことが知られているが、本実施の形態の合金元素(添加元素)として用いるニッケル(Ni)やアルミニウム(Al)は、表1に示したようにそれぞれ積層欠陥エネルギーが大きいので、転位の拡張は非常に小さい。また、Cuは合金化することで積層欠陥エネルギーが低下することも一般に知られている。従って、積層欠陥エネルギーが大きい合金元素をCuへ添加して固溶させることで、積層欠陥エネルギーの低下が抑制でき転位の拡張を抑制できるのではないかと考えて実施した結果、後述の実施例での結果のように優れた屈曲寿命特性が得られ、本発明に至った。後述の実施例で得られた銅合金の積層欠陥エネルギーについては、測定が非常に難しいので未測定であるが、優れた屈曲寿命特性が得られていることから、積層欠陥エネルギーの低下は抑制されたものと発明者は考えている。   In general, it is known that the larger the stacking fault energy, the smaller the expansion of dislocations. Nickel (Ni) and aluminum (Al) used as alloy elements (additive elements) of the present embodiment are shown in Table 1. Since each stacking fault energy is large, the extension of dislocations is very small. It is also generally known that stacking fault energy is reduced by alloying Cu. Therefore, by adding an alloying element with a large stacking fault energy to Cu and dissolving it, it was thought that the decrease in stacking fault energy could be suppressed and the expansion of dislocations could be suppressed. As a result, excellent bending life characteristics were obtained, and the present invention was achieved. The stacking fault energy of the copper alloy obtained in the examples described later has not been measured because it is very difficult to measure, but since excellent flex life characteristics have been obtained, the decrease in stacking fault energy is suppressed. The inventor believes that

ここで、ニッケル(Ni)やアルミニウム(Al)は、積層欠陥エネルギーに関与するだけでなく、製造されるCu合金の再結晶における結晶粒の成長速度にも関与する。しかし、AlやNiのみでの、後述のように多種多様の温度条件(150℃〜400℃、1分〜120分)を有するCCL工程には汎用的に適用することができないため、Agも添加して固溶させることで広い温度条件で汎用的に適用できるようになる。なお、再結晶時の結晶粒の成長速度を抑制する効果は、Agの方がNiやAlよりも高い。   Here, nickel (Ni) and aluminum (Al) are involved not only in stacking fault energy but also in the growth rate of crystal grains in recrystallization of the manufactured Cu alloy. However, since it cannot be applied universally to CCL processes with various temperature conditions (150 ° C. to 400 ° C., 1 minute to 120 minutes) using only Al and Ni as described later, Ag is also added. Then, it can be applied universally under a wide range of temperature conditions. Note that the effect of suppressing the growth rate of crystal grains during recrystallization is higher for Ag than for Ni or Al.

(圧延銅箔の製造方法)
図1は、本発明の実施の形態に係る圧延銅箔の製造の流れを示すフローチャートである。以下、図1に示すフローチャートを参照しつつ、圧延銅箔の製造方法を説明する。
(Method for producing rolled copper foil)
FIG. 1 is a flowchart showing a flow of manufacturing a rolled copper foil according to an embodiment of the present invention. Hereinafter, the manufacturing method of rolled copper foil is demonstrated, referring the flowchart shown in FIG.

まず、原材料として、銅合金材の鋳塊(すなわち、インゴット)を準備する(鋳塊準備工程:ステップ10、以下、ステップを「S」と表記する)。例えば、酸素(O)含有量が2ppm以下の無酸素銅(例えば、JIS H3100、JIS C1020等)を母材として、合計で所定量のニッケル(Ni)及び/又はアルミニウム(Al)と、所定量のホウ素(B)と、所定量の銀(Ag)とを含む銅合金材の鋳塊(インゴット)を準備する。   First, an ingot (that is, an ingot) of a copper alloy material is prepared as a raw material (ingot preparation step: step 10, hereinafter, “step” is expressed as “S”). For example, oxygen-free copper (for example, JIS H3100, JIS C1020, etc.) having an oxygen (O) content of 2 ppm or less as a base material, and a predetermined amount of nickel (Ni) and / or aluminum (Al) in total An ingot of copper alloy material containing boron (B) and a predetermined amount of silver (Ag) is prepared.

次に、鋳塊(インゴット)に熱間圧延を施して板材を製造する(熱間圧延工程:S20)。熱間圧延工程に続き、板材に冷間圧延を施す工程(冷間圧延工程:S32)と、冷間圧延された板材に焼鈍処理を施す工程(中間焼鈍工程:S34)とを所定回数、繰り返し実施する(S30:ループ)。なお、中間焼鈍工程(S34)は、冷間圧延が施された板材の加工硬化を緩和する工程である。これにより、「生地」と称される銅条(以下、「最終冷間圧延工程前の銅条」という場合がある)が製造される。   Next, the ingot is hot rolled to produce a plate material (hot rolling step: S20). Subsequent to the hot rolling step, a step of cold rolling the plate material (cold rolling step: S32) and a step of annealing the cold rolled plate material (intermediate annealing step: S34) are repeated a predetermined number of times. Implement (S30: Loop). In addition, an intermediate annealing process (S34) is a process of relieving work hardening of the board | plate material in which cold rolling was given. Thereby, a copper strip called “dough” (hereinafter, sometimes referred to as “copper strip before the final cold rolling process”) is manufactured.

続いて、この銅条に所定の焼鈍処理を施す(生地焼鈍工程:S40)。生地焼鈍工程においては、生地焼鈍工程を経る前の各工程に起因する加工歪を十分に緩和することのできる熱処理、例えば、略完全焼鈍処理を実施することが好ましい。続いて、焼鈍処理を施した「生地」(以下、「焼鈍生地」と称する)に対して冷間圧延を施す(最終冷間圧延工程(仕上げ圧延工程という場合もある):S50)。これにより、本実施の形態に係る所定の厚さを有する圧延銅箔が製造される。   Subsequently, the copper strip is subjected to a predetermined annealing treatment (dough annealing step: S40). In the dough annealing step, it is preferable to carry out a heat treatment that can sufficiently relieve the processing strain caused by each step before the dough annealing step, for example, a substantially complete annealing treatment. Subsequently, the “fabric” subjected to the annealing treatment (hereinafter referred to as “annealed fabric”) is subjected to cold rolling (final cold rolling step (also referred to as finish rolling step): S50). Thereby, the rolled copper foil which has the predetermined thickness which concerns on this Embodiment is manufactured.

なお、上述のようにして得られた本実施の形態に係る圧延銅箔をFPCの製造に用いる場合は、引き続いて、本実施の形態に係る圧延銅箔を、後述するFPCの製造工程に投入することができる。この場合、まず、最終冷間圧延工程を経た圧延銅箔に対して、表面処理等を施す(表面処理等工程:S60)。次に、表面処理等が施された圧延銅箔は、FPCの製造工程に供給される(FPC製造工程:S70)。FPC製造工程(S70)を経ることにより、本実施の形態に係る圧延銅箔に表面処理等を施すことによって得られた表面処理圧延銅箔を備えるFPCを製造することができる。   In addition, when using the rolled copper foil which concerns on this Embodiment obtained as mentioned above for manufacture of FPC, the rolled copper foil which concerns on this Embodiment is thrown into the manufacturing process of FPC mentioned later continuously can do. In this case, first, surface treatment etc. are performed with respect to the rolled copper foil which passed through the last cold rolling process (surface treatment etc. process: S60). Next, the rolled copper foil subjected to the surface treatment or the like is supplied to the FPC manufacturing process (FPC manufacturing process: S70). By passing through the FPC manufacturing process (S70), it is possible to manufacture an FPC including the surface-treated rolled copper foil obtained by subjecting the rolled copper foil according to the present embodiment to a surface treatment.

(FPC製造工程)
以下、FPC製造工程についてその概略を説明する。FPC製造工程は、例えば、FPC用の銅箔と、ポリイミド等の樹脂からなるベースフィルム(基材)とを貼り合わせてCopper Claded Laminate(CCL)を形成する工程(CCL工程)と、CCLにエッチング等の手法により回路配線を形成する工程(配線形成工程)と、回路配線上に配線を保護することを目的として、表面処理を施す工程(表面処理工程)とを含む。CCL工程としては、接着剤を介して銅箔と基材とを積層した後、熱処理により接着剤を硬化・密着させて積層構造体(銅箔/接着剤/ベースフィルム: 3層CCL)を形成する方法と、接着剤を介さずに表面処理が施された銅箔を基材に直接張り合わせた後、加熱・加圧することにより一体化して積層構造体(銅箔/ベースフィルム:2層CCL)を形成する方法との2種類の方法を挙げることができ、そのいずれも用いることができる。
(FPC manufacturing process)
The outline of the FPC manufacturing process will be described below. The FPC manufacturing process includes, for example, a process of forming a copper clad laminate (CCL) by bonding a copper foil for FPC and a base film (base material) made of a resin such as polyimide, and etching into the CCL. A step of forming circuit wiring by a technique such as the above (wiring forming step) and a step of performing surface treatment (surface treatment step) for the purpose of protecting the wiring on the circuit wiring. As a CCL process, after laminating a copper foil and a substrate via an adhesive, the adhesive is cured and adhered by heat treatment to form a laminated structure (copper foil / adhesive / base film: 3-layer CCL). And a laminated structure (copper foil / base film: two-layer CCL) by directly bonding the surface-treated copper foil directly to the base material without using an adhesive, followed by heating and pressing There are two types of methods, and a method of forming each of which can be used.

ここで、FPC製造工程においては、製造の容易性の観点から冷間圧延加工が施された銅箔、すなわち、加工硬化した硬質な状態の銅箔を用いることがある。これは、焼鈍されることにより軟化した銅箔は、この銅箔を裁断した場合、又は基材に積層させた場合に変形(例えば、伸び、しわ、折れ等の変形)が生じやすく、製品不良が発生する場合があるからである。   Here, in the FPC manufacturing process, a copper foil that has been cold-rolled from the viewpoint of ease of manufacture, that is, a work-hardened copper foil may be used. This is because the copper foil softened by annealing is likely to be deformed (for example, deformation such as elongation, wrinkle, fold, etc.) when the copper foil is cut or laminated on a base material, resulting in a defective product. This is because there are cases in which

一方、銅箔の屈曲疲労寿命特性は、銅箔に再結晶焼鈍を施すと、銅箔に圧延加工を施した場合よりも著しく向上する。そこで、上述のCCL工程における基材と銅箔とを密着・一体化させる熱処理においては、銅箔の再結晶焼鈍を兼ねる製造方法を採用することが好ましい。   On the other hand, when the copper foil is subjected to recrystallization annealing, the bending fatigue life characteristics of the copper foil are remarkably improved as compared with the case where the copper foil is rolled. Therefore, it is preferable to employ a manufacturing method that also serves as recrystallization annealing of the copper foil in the heat treatment for closely attaching and integrating the base material and the copper foil in the CCL process described above.

なお、再結晶焼鈍の熱処理条件は、CCL工程の内容に応じて変化させることができるものの、一例として、150℃以上400℃以下の温度で、1分間以上120分間以下の時間の熱処理を実施する。また、再結晶焼鈍は、CCL工程において実施される熱処理ではなく、別工程にて実施することもできる。このような温度条件の範囲内の熱処理によって、再結晶組織を有する銅箔を製造することができる。ここで、FPCにおいては、ポリイミド等の樹脂からなるベースフィルムの屈曲疲労寿命が銅箔の屈曲疲労寿命に比較して著しく長い。従って、FPC全体の屈曲疲労寿命は、銅箔の屈曲疲労寿命に大きく依存することになる。   In addition, although the heat treatment conditions for the recrystallization annealing can be changed according to the contents of the CCL process, as an example, the heat treatment is performed at a temperature of 150 ° C. or higher and 400 ° C. or lower for a time of 1 minute or longer and 120 minutes or shorter. . Further, the recrystallization annealing can be performed in a separate process instead of the heat treatment performed in the CCL process. A copper foil having a recrystallized structure can be produced by heat treatment within the range of such temperature conditions. Here, in FPC, the bending fatigue life of a base film made of a resin such as polyimide is remarkably longer than the bending fatigue life of a copper foil. Therefore, the bending fatigue life of the entire FPC greatly depends on the bending fatigue life of the copper foil.

(実施の形態の効果)
本発明の実施の形態に係る圧延銅箔は、母材としての無酸素銅に、所定量のホウ素(B)と、所定量の銀(Ag)と、所定量のニッケル(Ni)及び/又はアルミニウム(Al)とを含有させることで、軟化温度(再結晶温度)を低下させることができるとともに、再結晶後の結晶粒の成長速度を緩やかにすることができる。従って、この銅箔は、低温の条件(例えば、150℃×120分)のCCL製造工程から高温の条件(例えば、400℃×5分)のCCL製造工程までの広い温度条件範囲で、適正な再結晶を得ることができ、かつ優れた屈曲疲労寿命特性を発揮することができる。これにより、本実施の形態に係る圧延銅箔は、例えば、CCL製造工程(FPC製造工程)における様々な条件の熱処理に対応することができる。
(Effect of embodiment)
The rolled copper foil according to the embodiment of the present invention includes a predetermined amount of boron (B), a predetermined amount of silver (Ag), a predetermined amount of nickel (Ni), and / or oxygen-free copper as a base material. By containing aluminum (Al), the softening temperature (recrystallization temperature) can be lowered, and the growth rate of crystal grains after recrystallization can be moderated. Therefore, this copper foil is suitable in a wide temperature condition range from a CCL manufacturing process under low temperature conditions (for example, 150 ° C. × 120 minutes) to a CCL manufacturing process under high temperature conditions (for example, 400 ° C. × 5 minutes). Recrystallization can be obtained and excellent bending fatigue life characteristics can be exhibited. Thereby, the rolled copper foil which concerns on this Embodiment can respond | correspond to the heat processing of various conditions in a CCL manufacturing process (FPC manufacturing process), for example.

以下、本発明の圧延銅箔を、実施例を用いてさらに具体的に説明する。なお、本発明は、以下の実施例によって、いかなる制限を受けるものではない。   Hereinafter, the rolled copper foil of this invention is demonstrated more concretely using an Example. Note that the present invention is not limited in any way by the following examples.

先ず、各実施例における成分組成は、一元素ずつ濃度を振り、他の元素は濃度を固定した形で製造した。ただし、銅合金の製造の場合、製造しようとする濃度(目標濃度)に対して、製造工程のスケールによって大小のばらつきが発生する。それぞれの固定濃度は、Ni及び/又はAlの固定組成の目標値は120ppm、Bの固定組成の目標値は120ppm、Agの固定組成の目標値は100ppmである。後述の表2〜表4において太字で示した数値が固定組成の分析結果であるが、このようにばらつきが発生するのは避けられない。また、酸素は、通常の無酸素銅では2〜3ppmで安定して製造されるので、実施例19,20,21,40,41,42,61,62,63及び比較例7,8,15,16,23,24ではあえて酸素濃度を高くして製造した。ここで、酸素濃度を高くする場合の製造方法は、通常の無酸素銅の製造設備において、鋳造途中で溶解炉の蓋を開けて大気を入れ鋳造中の酸素濃度を高くすることで製造した。従って、酸素濃度を通常の2〜3ppm以外にしたものについては、酸素の目標濃度はなく、出来たものについて酸素濃度を測定してその結果で実施例や比較例に相当する濃度部分を採取した。   First, the component composition in each example was manufactured in such a manner that the concentration of each element was varied and the other elements were fixed in concentration. However, in the case of manufacturing a copper alloy, large and small variations occur depending on the scale of the manufacturing process with respect to the concentration to be manufactured (target concentration). As for the fixed concentrations, the target value of the fixed composition of Ni and / or Al is 120 ppm, the target value of the fixed composition of B is 120 ppm, and the target value of the fixed composition of Ag is 100 ppm. The numerical values shown in bold in Tables 2 to 4 described later are the analysis results of the fixed composition, but such variations are unavoidable. Moreover, since oxygen is stably produced at 2 to 3 ppm with normal oxygen-free copper, Examples 19, 20, 21, 40, 41, 42, 61, 62, 63 and Comparative Examples 7, 8, 15 , 16, 23, and 24 were manufactured with an increased oxygen concentration. Here, the manufacturing method in the case of increasing the oxygen concentration was manufactured by opening the lid of the melting furnace in the middle of casting and increasing the oxygen concentration during casting in a normal oxygen-free copper manufacturing facility. Therefore, there was no target concentration of oxygen for the oxygen concentration other than the usual 2-3 ppm, and the oxygen concentration was measured for the resulting product, and the concentration portion corresponding to the examples and comparative examples was collected as a result. .

(実施例1〜6)
まず、無酸素銅を母材にした主原料を溶解炉にて溶解した後、この溶解物中に、ニッケル(Ni)、ホウ素(B)、銀(Ag)を添加して、厚さ150mm、幅500mmの鋳塊(インゴット)を製造した(鋳塊準備工程)。ここで、Niは30〜300ppmの間で濃度を6条件振り、B、Ag、酸素は濃度を固定した。
(Examples 1-6)
First, after the main raw material having oxygen-free copper as a base material was melted in a melting furnace, nickel (Ni), boron (B), silver (Ag) was added to the melt, and the thickness was 150 mm, An ingot having a width of 500 mm was produced (ingot preparation step). Here, the concentration of Ni was varied between 30 to 300 ppm for 6 conditions, and the concentrations of B, Ag, and oxygen were fixed.

次に、実施の形態に係る圧延銅箔の製造方法に従って、鋳塊に熱間圧延を施して10mmの板材を製造した(熱間圧延工程)。続いて、板材に冷間圧延(冷間圧延工程)及び焼鈍処理(中間焼鈍工程)を繰り返して「生地」を製造した。そして、「生地」に焼鈍処理を施した(生地焼鈍工程)。なお、生地焼鈍工程における焼鈍処理は、約750℃の温度で約1分間保持することにより実施した。次に、生地焼鈍工程を経た焼鈍生地に冷間圧延を施した(最終冷間圧延工程)。これにより、厚さが0.012mm(12μm)の実施例1〜6に係る圧延銅箔を作製した。   Next, according to the rolled copper foil manufacturing method according to the embodiment, the ingot was hot-rolled to produce a 10 mm plate (hot rolling step). Subsequently, cold rolling (cold rolling process) and annealing treatment (intermediate annealing process) were repeated on the plate material to produce a “dough”. Then, the “fabric” was subjected to an annealing treatment (fabric annealing step). The annealing treatment in the dough annealing process was carried out by holding at a temperature of about 750 ° C. for about 1 minute. Next, the cold-rolled fabric subjected to the fabric annealing step was cold-rolled (final cold-rolling step). Thereby, the rolled copper foil which concerns on Examples 1-6 whose thickness is 0.012 mm (12 micrometers) was produced.

(実施例7〜12)
まず、無酸素銅を母材にした主原料を溶解炉にて溶解した後、この溶解物中に、ニッケル(Ni)、ホウ素(B)、銀(Ag)を添加して、厚さ150mm、幅500mmの鋳塊(インゴット)を製造した(鋳塊準備工程)。ここで、Bは30〜480ppmの間で濃度を6条件振り、Ni、Ag、酸素は濃度を固定した。
(Examples 7 to 12)
First, after the main raw material having oxygen-free copper as a base material was melted in a melting furnace, nickel (Ni), boron (B), silver (Ag) was added to the melt, and the thickness was 150 mm, An ingot having a width of 500 mm was produced (ingot preparation step). Here, the concentration of B was varied between 30 to 480 ppm for 6 conditions, and the concentrations of Ni, Ag and oxygen were fixed.

次に、上記と同様に実施の形態に係る圧延銅箔の製造方法に従って、厚さが0.012mmの実施例7〜12に係る圧延銅箔を作製した。   Next, the rolled copper foil which concerns on Examples 7-12 whose thickness is 0.012 mm was produced according to the manufacturing method of the rolled copper foil which concerns on embodiment similarly to the above.

(実施例13〜18)
まず、無酸素銅を母材にした主原料を溶解炉にて溶解した後、この溶解物中に、ニッケル(Ni)、ホウ素(B)、銀(Ag)を添加して、厚さ150mm、幅500mmの鋳塊(インゴット)を製造した(鋳塊準備工程)。ここで、Agは20〜250ppmの間で濃度を6条件振り、Ni、B、酸素は濃度を固定した。
(Examples 13 to 18)
First, after the main raw material having oxygen-free copper as a base material was melted in a melting furnace, nickel (Ni), boron (B), silver (Ag) was added to the melt, and the thickness was 150 mm, An ingot having a width of 500 mm was produced (ingot preparation step). Here, the concentration of Ag was varied between 20 to 250 ppm for 6 conditions, and the concentrations of Ni, B, and oxygen were fixed.

次に、上記と同様に実施の形態に係る圧延銅箔の製造方法に従って、厚さが0.012mmの実施例13〜18に係る圧延銅箔を作製した。   Next, the rolled copper foil which concerns on Examples 13-18 whose thickness is 0.012 mm was produced according to the manufacturing method of the rolled copper foil which concerns on embodiment similarly to the above.

(実施例19〜21および比較例7,8)
まず、無酸素銅を母材にした主原料を溶解炉にて溶解した後、この溶解物中に、ニッケル(Ni)、ホウ素(B)、銀(Ag)を添加して、厚さ150mm、幅500mmの鋳塊(インゴット)を製造した(鋳塊準備工程)。ここでは、前記のように鋳造途中で溶解炉の蓋を開けることで大気を混入させて酸素濃度を高くした。従って、製造した鋳塊の酸素濃度は溶解炉の蓋を開けところから濃度勾配が生じた。この濃度勾配の中で、本発明の酸素濃度範囲である20ppm以下の部分を採取して実施例19〜21とした。同様に比較例7〜8を20ppm以上の部分から採取した。比較例7と比較例8の酸素濃度は、本発明の酸素濃度範囲の上限である20ppmよりかなり高く、それぞれ38ppm、68ppmであるが、これは上記のような方法で製造したので、20ppmを超えた部分の濃度勾配が急になっており、比較的安定した材料長さが取れる部分から採取したためである。
(Examples 19 to 21 and Comparative Examples 7 and 8)
First, after the main raw material having oxygen-free copper as a base material was melted in a melting furnace, nickel (Ni), boron (B), silver (Ag) was added to the melt, and the thickness was 150 mm, An ingot having a width of 500 mm was produced (ingot preparation step). Here, as described above, the oxygen concentration was increased by opening the lid of the melting furnace in the middle of casting to mix air. Therefore, the oxygen concentration of the manufactured ingot produced a concentration gradient when the melting furnace was opened. In this concentration gradient, the portion of 20 ppm or less which is the oxygen concentration range of the present invention was sampled and used as Examples 19-21. Similarly, Comparative Examples 7 to 8 were collected from 20 ppm or more. The oxygen concentrations of Comparative Example 7 and Comparative Example 8 are considerably higher than 20 ppm, which is the upper limit of the oxygen concentration range of the present invention, and are 38 ppm and 68 ppm, respectively. This is because the concentration gradient of the portion was steep, and the sample was taken from a portion where a relatively stable material length could be obtained.

次に、前記の実施例と同様に、実施の形態に係る圧延銅箔の製造方法に従って、厚さが0.012mmの実施例19〜21、比較例7,8に係る圧延銅箔を作製した。   Next, according to the rolled copper foil manufacturing method according to the embodiment, the rolled copper foils according to Examples 19 to 21 and Comparative Examples 7 and 8 having a thickness of 0.012 mm were produced in the same manner as in the above Examples. .

(比較例1〜6)
比較例1と比較例2では、Ni濃度を30ppm未満、300ppm超として、B,Ag,酸素濃度を固定した。また、比較例3と比較例4では、B濃度を30ppm未満、500ppm超として、Ni,Ag,酸素濃度を固定した。比較例5と比較例6では、Ag濃度を20ppm未満、250ppm超として、Ni,B,酸素濃度を固定した。
(Comparative Examples 1-6)
In Comparative Example 1 and Comparative Example 2, the Ni concentration was less than 30 ppm and more than 300 ppm, and the B, Ag, and oxygen concentrations were fixed. Further, in Comparative Example 3 and Comparative Example 4, the B concentration was less than 30 ppm and more than 500 ppm, and Ni, Ag, and oxygen concentrations were fixed. In Comparative Example 5 and Comparative Example 6, the concentration of Ni, B, and oxygen was fixed by setting the Ag concentration to less than 20 ppm and more than 250 ppm.

比較例1〜6の鋳塊は、実施の形態に係る圧延銅箔の製造方法と同条件で厚さ0.012mmの比較例1〜6に係る圧延銅箔を作製した。   The ingots of Comparative Examples 1 to 6 produced rolled copper foils according to Comparative Examples 1 to 6 having a thickness of 0.012 mm under the same conditions as the rolled copper foil manufacturing method according to the embodiment.

表2は、上記実施例および比較例の成分濃度(分析濃度)を示した表である。成分濃度はICP発光分光分析を用いて定量した。













Table 2 is a table showing the component concentrations (analytical concentrations) of the above Examples and Comparative Examples. Component concentrations were quantified using ICP emission spectroscopy.













Figure 2012117123
Figure 2012117123

ここで、表中の数値は、5ppm単位で表示している。但し、酸素は1ppm単位(1ppm=0.0001%)で表示している。また、表中の太字の成分組成は、値を固定したものである。Ni及び/又はAlの固定組成の目標値は120ppmであり、Bの固定組成の目標値は120ppm、Agの固定組成の目標値は100ppm、酸素の固定組成の目標値は、無酸素銅の通常濃度である2〜3ppmである。次に示す表3、表4においても同様の単位で表示し、各元素の固定組成の目標値も同様である。   Here, the numerical values in the table are displayed in units of 5 ppm. However, oxygen is expressed in units of 1 ppm (1 ppm = 0.0001%). The component composition in bold in the table is a fixed value. The target value of the fixed composition of Ni and / or Al is 120 ppm, the target value of the fixed composition of B is 120 ppm, the target value of the fixed composition of Ag is 100 ppm, and the target value of the fixed composition of oxygen is that of oxygen-free copper. The concentration is 2-3 ppm. Tables 3 and 4 below are also displayed in the same units, and the target values of the fixed composition of each element are the same.

銅合金の製造では、酸素は別として、合金元素のNi、Al、B、Agは固定組成を上記のようにしたが、実際には表2に示した程度はバラツキが発生する。本発明の実験は、研究所スケールで実施したので、表2に示した程度のばらつきで抑えられたが、量産工程を実施した場合は、さらにばらつきで大きくなることもあることを付け加えておきたい。   In the manufacture of copper alloys, apart from oxygen, the alloy elements Ni, Al, B, and Ag have the same fixed composition as described above, but actually, the degree shown in Table 2 varies. Since the experiment of the present invention was performed on a laboratory scale, it was suppressed with the variation of the degree shown in Table 2, but it should be added that when the mass production process is performed, the variation may become larger. .

(実施例22〜42および比較例9〜16)
実施例22〜42および比較例9〜16では、実施例1〜21および比較例1〜8におけるNi部分をAlにして同様な条件で製造した。NiをAlにした以外、製造方法、製造条件は全て同様である。
(Examples 22 to 42 and Comparative Examples 9 to 16)
In Examples 22-42 and Comparative Examples 9-16, the Ni part in Examples 1-21 and Comparative Examples 1-8 was made into Al, and it manufactured on the same conditions. The manufacturing method and manufacturing conditions are the same except that Ni is changed to Al.

表3は、上記実施例および比較例の成分濃度(分析濃度)を示した表である。   Table 3 is a table showing the component concentrations (analytical concentrations) of the above Examples and Comparative Examples.

Figure 2012117123
Figure 2012117123

(実施例43〜63および比較例17〜24)
実施例43〜63および比較例17〜24では、実施例1〜21および比較例1〜8におけるNi部分をNi+Alにして同様な条件で製造した。NiをNi+Alにした以外、製造方法、製造条件は全て同様である。
(Examples 43 to 63 and Comparative Examples 17 to 24)
In Examples 43 to 63 and Comparative Examples 17 to 24, the Ni portion in Examples 1 to 21 and Comparative Examples 1 to 8 was made Ni + Al and manufactured under the same conditions. The manufacturing method and manufacturing conditions are the same except that Ni is changed to Ni + Al.

表4は、上記実施例および比較例の成分濃度(分析濃度)を示した表である。



Table 4 is a table showing the component concentrations (analytical concentrations) of the above Examples and Comparative Examples.



Figure 2012117123
Figure 2012117123

(屈曲疲労寿命試験)
屈曲疲労寿命試験は、信越エンジニアリング株式会社製の摺動屈曲試験装置(型式:SEK−31B2S)を用い、IPC規格に準拠して実施した。
(Bending fatigue life test)
The bending fatigue life test was performed in accordance with the IPC standard using a sliding bending test apparatus (model: SEK-31B2S) manufactured by Shin-Etsu Engineering Co., Ltd.

図2に示すように、摺動屈曲試験装置2は、圧延銅箔10を保持する試料固定板20と、圧延銅箔10を試料固定板20に固定するネジ20aと、圧延銅箔10に接触して圧延銅箔10に振動を伝達する振動伝達部30と、振動伝達部30を上下方向に振動させる発振駆動体40とを備える。   As shown in FIG. 2, the sliding bending test apparatus 2 is in contact with the sample fixing plate 20 that holds the rolled copper foil 10, the screw 20 a that fixes the rolled copper foil 10 to the sample fixing plate 20, and the rolled copper foil 10. The vibration transmission unit 30 that transmits vibration to the rolled copper foil 10 and the oscillation driver 40 that vibrates the vibration transmission unit 30 in the vertical direction are provided.

具体的には、実施例1〜63及び比較例1〜24に係る圧延銅箔(厚さ0.012mm、すなわち12μm)のそれぞれから、幅12.5mm、長さ220mmの試験片を作製した後、この試験片に、160℃、120分間で再結晶焼鈍を施した。その後、屈曲疲労寿命試験を実施した。   Specifically, after producing a test piece having a width of 12.5 mm and a length of 220 mm from each of the rolled copper foils (thickness 0.012 mm, ie, 12 μm) according to Examples 1 to 63 and Comparative Examples 1 to 24 The test piece was subjected to recrystallization annealing at 160 ° C. for 120 minutes. Thereafter, a bending fatigue life test was performed.

また、実施例1〜63及び比較例1〜24に係る圧延銅箔(厚さ0.012mm、すなわち12μm)のそれぞれから、幅12.5mm、長さ220mmの試験片を作製した後、この試験片に、400℃、5分間の再結晶焼鈍を施した。その後、同様にして、屈曲疲労寿命試験を実施した。   Moreover, after producing the test piece of width 12.5mm and length 220mm from each of the rolled copper foil (thickness 0.012mm, ie, 12 micrometers) which concerns on Examples 1-63 and Comparative Examples 1-24, this test The piece was subjected to recrystallization annealing at 400 ° C. for 5 minutes. Thereafter, a bending fatigue life test was conducted in the same manner.

屈曲疲労寿命試験の試験条件としては、圧延銅箔の曲率Rが1.5mm、振動伝達部30の振幅ストロークが10mm、発振駆動体40の周波数が25Hz(すなわち、振幅速度が1500回/分)を用いた。また、試験片の長さ220mmの方向、すなわち、圧延銅箔10の長手方向が圧延方向になるようにした。測定は、各試料について5回ずつ実施して、5回の実施結果の平均値(下3桁を四捨五入)を互いに比較した。その結果を表5、表6にそれぞれ示す。   The test conditions of the bending fatigue life test are as follows: the curvature R of the rolled copper foil is 1.5 mm, the amplitude stroke of the vibration transmitting unit 30 is 10 mm, and the frequency of the oscillation driver 40 is 25 Hz (that is, the amplitude speed is 1500 times / minute). Was used. Further, the direction of the test piece length of 220 mm, that is, the longitudinal direction of the rolled copper foil 10 was set to be the rolling direction. The measurement was performed five times for each sample, and the average values (rounded off to the last three digits) of the five execution results were compared with each other. The results are shown in Table 5 and Table 6, respectively.

表5は、160℃、120分間で熱処理したサンプルの結果であり、表6は、400℃、5分間で熱処理したサンプルの結果である。

































Table 5 shows the results of samples heat-treated at 160 ° C. for 120 minutes, and Table 6 shows the results of samples heat-treated at 400 ° C. for 5 minutes.

































Figure 2012117123
Figure 2012117123

Figure 2012117123
Figure 2012117123

表5及び表6を参照すると、実施例1〜63に係る圧延銅箔の場合はいずれも、低い温度条件の160℃×120分と高い温度条件400℃×5分との双方の条件において、非常に優れた屈曲疲労寿命回数が得られ、低い温度条件から高い温度条件までの広い範囲に対応している圧延銅箔であることが示された。   Referring to Table 5 and Table 6, in the case of the rolled copper foils according to Examples 1 to 63, in both conditions of 160 ° C. × 120 minutes of low temperature conditions and 400 ° C. × 5 minutes of high temperature conditions, It was shown that the rolled copper foil has a very excellent flexion fatigue life, and is compatible with a wide range from a low temperature condition to a high temperature condition.

一方、比較例では、比較例3,6,11,14,19,22を除いてはいずれも、低い温度条件の160℃×120分と高い温度条件400℃×5分との双方の条件において、屈曲寿命回数が実施例の約半分かそれ以下であった。これは、各合金元素のいずれかが所定量範囲から外れているためである。   On the other hand, in the comparative example, except for Comparative Examples 3, 6, 11, 14, 19, and 22, both the low temperature condition of 160 ° C. × 120 minutes and the high temperature condition of 400 ° C. × 5 minutes were used. The flex life was about half or less than that of the example. This is because one of the alloy elements is out of the predetermined amount range.

また、比較例3,6,11,14,19,22では、低い温度条件の160℃×120分では屈曲寿命回数は他の比較例よりもさらに短いが、高い温度条件の400℃×5分では実施例と同程度に屈曲寿命特性が良好である。この理由は、先ず、比較例3,11,19ではホウ素(B)が所定量より少ないため、銅箔の再結晶温度があまり下がらなかったため、再結晶温度が160℃(×120分)よりも高くなったことにより、再結晶が進行しなかったので屈曲寿命特性が発揮されなかったためである。   In Comparative Examples 3, 6, 11, 14, 19, and 22, the number of flexing lives is 160 ° C. × 120 minutes under a low temperature condition, which is even shorter than the other comparative examples, but 400 ° C. × 5 minutes under a high temperature condition. Then, the bending life characteristics are as good as those of the examples. The reason for this is that, in Comparative Examples 3, 11, and 19, since boron (B) is less than a predetermined amount, the recrystallization temperature of the copper foil did not drop so much, so the recrystallization temperature was higher than 160 ° C. (× 120 minutes). This is because, since the recrystallization did not proceed due to the increase, the flex life characteristics were not exhibited.

一方、比較例6,14,22は、銀(Ag)が所定量よりも多いため、銅箔の再結晶温度が上昇してしまい、160℃(×120分)で再結晶が進行しなかったので屈曲寿命特性が発揮されなかった。ホウ素(B)が所定量より少ない比較例3,11,19及び銀(Ag)が所定量より多い比較例6,14,22はいずれも低い温度条件160℃(×120分)では、再結晶が進行しないために屈曲寿命特性が低かったが、一方、高い温度条件の400℃×5分では、再結晶が適正に行われているため、実施例と同程度の優れた屈曲寿命特性が得られた。ただし、適用できる温度範囲が狭い。   On the other hand, in Comparative Examples 6, 14, and 22, since the amount of silver (Ag) was larger than a predetermined amount, the recrystallization temperature of the copper foil increased, and recrystallization did not proceed at 160 ° C. (× 120 minutes). Therefore, the bending life characteristic was not exhibited. In Comparative Examples 3, 11, and 19 in which boron (B) is less than a predetermined amount and in Comparative Examples 6, 14, and 22 in which silver (Ag) is more than a predetermined amount, recrystallization occurs under low temperature conditions of 160 ° C. (× 120 minutes). However, the flex life characteristics were low because the recrystallization was performed properly at a high temperature condition of 400 ° C. for 5 minutes. It was. However, the applicable temperature range is narrow.

また、比較例7,8,15,16,23,24は、低い温度条件の160℃×120分と高い温度条件400℃×5分との双方の条件において、再結晶の進行は適正に行われているが、酸素含有量が20ppmより高いため酸化物が形成して銅中に介在し、この酸化物が金属疲労の原因となって屈曲寿命特性が低下した。   Further, in Comparative Examples 7, 8, 15, 16, 23, and 24, the recrystallization progresses appropriately in both the low temperature condition of 160 ° C. × 120 minutes and the high temperature condition of 400 ° C. × 5 minutes. However, since the oxygen content was higher than 20 ppm, an oxide was formed and interposed in the copper, and this oxide caused metal fatigue, resulting in a decrease in flex life characteristics.

(最適条件についての根拠)
酸素については、その量が少ないほど酸化物生成が少なくなる。つまり、屈曲疲労寿命回数を短くする要因が少なくなる。本発明では、実施例の結果より20ppmm未満であれば問題がないという結果が得られているが、10ppm以下であることが好ましく、さらには5ppm以下であることが好ましい。ただし、前記のように、本発明における実施例・比較例の製造方法では、酸素濃度が20ppmよりかなり高くなっている(38〜77ppm)ので、酸素濃度が20ppm〜37ppmについては不明である。
(Grounds for optimal conditions)
For oxygen, the smaller the amount, the less oxide is produced. That is, there are fewer factors that shorten the number of flexural fatigue lives. In the present invention, a result that there is no problem as long as it is less than 20 ppmm is obtained from the results of Examples, but it is preferably 10 ppm or less, and more preferably 5 ppm or less. However, as described above, in the production methods of Examples and Comparative Examples in the present invention, the oxygen concentration is considerably higher than 20 ppm (38 to 77 ppm), and therefore the oxygen concentration is unknown from 20 ppm to 37 ppm.

ホウ素(B)については、30ppm以上500ppm以下としたが、本発明の効果を安定させるためには、下限値は40ppm以上が好ましく、さらには50ppm以上の方が好ましい。また、上限値は400ppm以下の方が好ましく、さらには300ppm以下の方が好ましい。   About boron (B), although 30 ppm or more and 500 ppm or less were used, in order to stabilize the effect of the present invention, the lower limit is preferably 40 ppm or more, and more preferably 50 ppm or more. The upper limit is preferably 400 ppm or less, and more preferably 300 ppm or less.

Agについては、20ppm以上250ppm以下の範囲に設定したが、本発明の効果
を安定して得るためには、下限値は35ppm以上が好ましく、さらには50ppm以上である方が好ましい。また、上限値は225ppm以下の方が好ましく、さらには200ppm以下である方が好ましい。
About Ag, although it set to the range of 20 ppm or more and 250 ppm or less, in order to acquire the effect of this invention stably, 35 ppm or more is preferable and the lower limit is more preferable that it is 50 ppm or more. The upper limit is preferably 225 ppm or less, and more preferably 200 ppm or less.

Ni及び/又はAlについては、総量で30ppm以上300ppm以下の範囲に設定したが、本発明の効果を安定して得るためには、下限値は40ppm以上の方が好ましく、さらには50ppm以上が好ましい。また、上限値は250ppm以下である方が好ましく、さらには200ppm以下である方が好ましい。   About Ni and / or Al, the total amount was set in the range of 30 ppm or more and 300 ppm or less, but in order to stably obtain the effects of the present invention, the lower limit is preferably 40 ppm or more, and more preferably 50 ppm or more. . Further, the upper limit is preferably 250 ppm or less, and more preferably 200 ppm or less.

以上、本発明の実施の形態及び実施例を説明したが、上記に記載した実施の形態及び実施例は、本発明を何ら制限するものではない。また、実施の形態及び実施例の中で説明した特徴の組合せの全てが発明の課題を解決するための手段に必須であるとは限らない点に留意すべきである。   Although the embodiments and examples of the present invention have been described above, the embodiments and examples described above do not limit the present invention in any way. It should be noted that not all combinations of features described in the embodiments and examples are necessarily essential to the means for solving the problems of the invention.

また、本実施の形態に係る圧延銅箔は、上述のとおり広い温度条件の範囲で熱処理を施した後でも、安定して優れた屈曲疲労寿命特性を発揮することができるので、この圧延銅箔を用いてフレキシブルプリント配線板、その他の導電部材の可撓性配線に好適に用いることができる。   Moreover, since the rolled copper foil according to the present embodiment can stably exhibit excellent bending fatigue life characteristics even after being subjected to heat treatment in a wide temperature range as described above, this rolled copper foil Can be used suitably for flexible wiring of flexible printed wiring boards and other conductive members.

さらに、本実施の形態に係る圧延銅箔は、無荷重における耐振動性や、固定されていない状態における耐振動性等と屈曲疲労寿命特性との間である程度の相関性があると考えられている特性が要求される導電部材に適用することもできる。   Furthermore, the rolled copper foil according to the present embodiment is considered to have a certain degree of correlation between vibration resistance under no load, vibration resistance in an unfixed state, and bending fatigue life characteristics. It can also be applied to conductive members that require certain characteristics.

2…摺動屈曲試験装置、10…圧延銅箔、20…試料固定板、20a…ねじ、30…振動伝達部、40…発振駆動体。   DESCRIPTION OF SYMBOLS 2 ... Sliding bending test apparatus, 10 ... Rolled copper foil, 20 ... Sample fixing plate, 20a ... Screw, 30 ... Vibration transmission part, 40 ... Oscillation drive body.

Claims (6)

主成分としての銅(Cu)及び不可避的不純物と、ホウ素(B)と、銀(Ag)と、銅(Cu)及び銀(Ag)以外で結晶構造が面心立方で、かつ積層欠陥エネルギーの値が銅(Cu)より大きい値を有する元素群の中から選択される1種以上の添加元素と、を含むこと
を特徴とする圧延銅箔。
Other than copper (Cu) and inevitable impurities as main components, boron (B), silver (Ag), copper (Cu) and silver (Ag), the crystal structure is face-centered cubic, and stacking fault energy One or more additional elements selected from the group of elements having a value greater than copper (Cu).
請求項1に記載の圧延銅箔において、酸素が0.002重量%以下(20ppm以下)含まれること
を特徴とする圧延銅箔。
The rolled copper foil according to claim 1, wherein oxygen is contained in an amount of 0.002% by weight or less (20 ppm or less).
請求項1または請求項2に記載の圧延銅箔において、厚さが20μm以下であること
を特徴とする圧延銅箔。
The rolled copper foil according to claim 1 or 2, wherein the rolled copper foil has a thickness of 20 µm or less.
前記ホウ素(B)を0.003重量%以上0.05重量%以下(30ppm以上500ppm以下)、並びに前記銀(Ag)を0.002重量%以上0.025重量%以下(20ppm以上250ppm以下)含有すること
を特徴とする請求項1〜請求項3のいずれかに記載の圧延銅箔。
The boron (B) is 0.003% to 0.05% by weight (30 ppm to 500 ppm) and the silver (Ag) is 0.002% to 0.025% by weight (20 ppm to 250 ppm). It contains. The rolled copper foil in any one of Claims 1-3 characterized by the above-mentioned.
前記添加元素が、ニッケル(Ni)及び/又はアルミニウム(Al)であること
を特徴とする請求項1〜請求項4のいずれかに記載の圧延銅箔。
The rolled copper foil according to any one of claims 1 to 4, wherein the additive element is nickel (Ni) and / or aluminum (Al).
前記ニッケル(Ni)及び/又はアルミニウム(Al)が少なくとも一方の総量で0.003重量%以上0.03重量%以下(30ppm以上300ppm以下)含有すること を特徴とする請求項5に記載の圧延銅箔。   The rolling according to claim 5, wherein the nickel (Ni) and / or aluminum (Al) is contained in a total amount of at least one of 0.003% to 0.03% by weight (30 ppm to 300 ppm). Copper foil.
JP2010268944A 2010-12-02 2010-12-02 Rolled copper foil Expired - Fee Related JP5562217B2 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014139335A (en) * 2013-01-21 2014-07-31 Sh Copper Products Corp Copper plating layer-clad rolled copper foil

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000212660A (en) * 1999-01-18 2000-08-02 Nippon Mining & Metals Co Ltd Rolled copper foil for flexible printed circuit board and its production
JP2001011550A (en) * 1999-06-30 2001-01-16 Kobe Steel Ltd Copper alloy rolled foil
JP2010150598A (en) * 2008-12-25 2010-07-08 Hitachi Cable Ltd Rolled copper foil

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000212660A (en) * 1999-01-18 2000-08-02 Nippon Mining & Metals Co Ltd Rolled copper foil for flexible printed circuit board and its production
JP2001011550A (en) * 1999-06-30 2001-01-16 Kobe Steel Ltd Copper alloy rolled foil
JP2010150598A (en) * 2008-12-25 2010-07-08 Hitachi Cable Ltd Rolled copper foil

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014139335A (en) * 2013-01-21 2014-07-31 Sh Copper Products Corp Copper plating layer-clad rolled copper foil

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