JP2012094557A - Mounting stage - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a mounting stage capable of performing position and posture control of a target work with extremely high accuracy by means of a simple structure.SOLUTION: A mounting stage 30 controls the position and posture, with respect to a reference plane, of a target work 22 on which exposure light is formed into an image and to be exposed with a predetermined mask pattern. The mounting stage 30 comprises: a base member 31 fixedly provided with respect to the reference plane; first drive mechanisms (32) provided on the base member 31 so as to be movable in a first direction (Y-axis direction) along the reference plane; a first slider (33) supported by the first drive mechanisms; two second drive mechanisms (34) which are provided in a pair on the first slider with a distance therebetween in the first direction so as to be movable in a second direction (X-axis direction) that is along the reference plane and is inclined toward the first direction; two second sliders (35) which are individually supported by the second drive mechanisms; and a flat adjusting plate (36) which is provided along the reference plane and laid over both second sliders in the first direction so that the target work 22 can be mounted thereon.

Description

  The present invention relates to a mounting stage on which a substrate such as a printed circuit board or a liquid crystal substrate is mounted, and an exposure apparatus on which the mounting stage is mounted.

  A photolithography method in which a predetermined mask pattern is exposed to the surface of a target work coated with a photosensitive material such as a photoresist by an exposure apparatus and then formed on the substrate by an etching process is widely applied in various fields. In addition, printed wiring boards, liquid crystal substrates, and the like are also manufactured using an exposure apparatus. Some exposure apparatuses form a predetermined mask pattern on the target work by forming an image of the exposure light transmitted through the mask on which the predetermined pattern is formed on the target work with a projection lens. In this exposure apparatus, in order to form an image at a desired position on the target workpiece, it is known to use a mounting stage that holds the target workpiece movably (see, for example, Patent Document 1).

  The mounting stage of this conventional exposure apparatus is provided with a Y slider movably on each of two Y rails extending in the Y-axis direction, and an X rail is provided so as to bridge both Y sliders. An X slider is provided so as to be freely movable, and the X slider is used as a mounting table. In this placement stage, by controlling the positions of the two Y sliders on the Y rail in synchronization, the position of the X rail in the Y-axis direction, that is, the target workpiece placed on the X slider on the Y rail is controlled. It functions as a Y-axis drive mechanism that determines the position in the Y-axis direction. Further, by individually controlling the positions of the two Y sliders on the Y rail, it functions as a rotation drive mechanism that determines the rotation posture of the X rail on the XY plane, that is, the rotation posture of the target workpiece. Furthermore, by controlling the position of the X slider on the X rail, it functions as an X-axis drive mechanism that determines the position of the target workpiece in the X-axis direction according to the determined position and posture of the X rail. For this reason, in the mounting stage described above, the target workpiece can be in an arbitrary rotational posture at an arbitrary position on the XY plane.

Japanese Patent No. 3947652

  By the way, in the mounting stage described above, an X-axis drive mechanism is provided on two Y sliders and two Y rails that function as a Y-axis drive mechanism and a rotation drive mechanism. For this reason, since the X-axis drive mechanism itself is rotated by the rotation mechanism, in order to determine the position of the target workpiece in the X-axis direction, the position control of the X slider is changed according to the rotation posture of the X rail. Therefore, the position / posture control of the target workpiece becomes complicated, and it becomes difficult to control the position / posture of the target workpiece with high accuracy.

  Further, in the above-described mounting stage, it is possible to set the target work in an arbitrary rotational position at an arbitrary position on the XY plane on the document, but in practice, the X slider is held by the Y slider. Therefore, it is difficult to control the position and orientation of the target workpiece with high accuracy.

  The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a mounting stage that can perform position and orientation control of a target workpiece with extremely high accuracy with a simple configuration.

  The invention according to claim 1 is a mounting stage that controls the position and orientation of a target workpiece on which the exposure light is imaged and a predetermined mask pattern is exposed with respect to the reference plane, and is fixed with respect to the reference plane. A base member provided on the base member, a first drive mechanism provided on the base member movably in a first direction along the reference plane, a first slider supported by the first drive mechanism, Two second drives provided in pairs on the first slider at intervals in the first direction so as to be movable along a reference plane and in a second direction inclined with respect to the first direction. A mechanism, two second sliders individually supported by the respective second drive mechanisms, and both the second sliders across the first direction to place the target work along the reference plane A flat adjustment plate provided. And wherein the Rukoto.

  Invention of Claim 2 is the mounting stage of Claim 1, Comprising: The said flat adjustment plate and one said 2nd slider have one end at the plate side 1st support point in the said flat adjustment plate. And the other end is connected by a first connecting portion extending in a direction perpendicular to the reference plane so as to be connected to one of the second sliders at a slider-side first support point, and the first connecting portion is The plane adjustment around the reference axis including the plate-side first support point and the slider-side first support point without changing the positional relationship between the plate-side first support point and the slider-side first support point. Allowing relative rotation between the plate and one of the second sliders, one end of the plane adjustment plate and the other second slider being connected to the plane adjustment plate at a plate-side second support point; and The other end is connected to the other second slider at the slider side second support point. Connected by a second connecting portion extending in a direction perpendicular to the plane, and the second connecting portion includes the plate-side second support point and the slider-side second support point in a third direction along the reference plane. And a relative rotation of the plane adjusting plate and the other second slider around the direction orthogonal to the reference plane is allowed.

  The invention according to claim 3 is the mounting stage according to claim 1 or 2, wherein the third direction is inclined with respect to each of the first direction and the second direction. It is characterized by.

  A fourth aspect of the present invention is the mounting stage according to any one of the first to third aspects, wherein the first direction and the second direction are orthogonal to each other. .

  A fifth aspect of the present invention is the mounting stage according to the fourth aspect, wherein the plate-side first support point and the plate-side second support point are configured such that the second sliders are in the second direction. It is characterized in that it is positioned on a straight line that is inclined with respect to each of the first direction and the second direction when it is set as a reference position that is a reference for movement to the position.

  The invention according to claim 6 is the mounting stage according to claim 5, wherein the third direction is an extension of a line segment connecting the plate-side first support point and the plate-side second support point. It is characterized by a current direction.

  The invention according to claim 7 is the mounting stage according to claim 5, wherein the third direction is set as a reference position which is a reference for movement of the second sliders in the second direction. It is an extending direction of a line segment connecting the slider-side first support point and the slider-side second support point.

  The invention according to claim 8 is the mounting stage according to any one of claims 5 to 7, wherein the plate-side first support point and the plate-side second support point are When both the second sliders are set to the reference position, the extending direction of the line segment connecting each other is inclined by 45 degrees with respect to each of the first direction and the second direction. And

  Invention of Claim 9 is the mounting stage of any one of Claim 1 thru | or 8, Comprising: The position of the said workpiece | work in the 4th direction orthogonal to the said reference plane, and A fourth direction adjusting plate provided on the plane adjusting plate for changing the inclination with respect to the fourth direction, and the position of the fourth direction adjusting plate in the fourth direction and the inclination with respect to the fourth direction are changed. A fourth direction drive mechanism, and the fourth direction drive mechanism includes at least three support portions that support the fourth direction adjustment plate, and a drive main body portion that moves the support portions in the fourth direction. And the drive main body is provided on the lower side of the plane adjusting plate while at least a part of the drive main body is positioned between the first slider and the second slider. Viewed in the fourth direction, the driving book below the flat adjustment plate As well as connect to the part, characterized in that it supports the fourth direction adjusting plate above said planar adjustment plate.

  A tenth aspect of the present invention is the mounting stage according to the ninth aspect, wherein each of the support portions supports the fourth direction adjustment plate without changing a support position with respect to the fourth direction adjustment plate. A support for the fourth direction adjusting plate and a first support portion that supports an angle changeable and a support position for the fourth direction adjustment plate can be changed in a line segment direction with respect to a support position by the first support portion. A second support part that supports the angle of the fourth direction adjustment plate, and a third support part that supports a change of the support position with respect to the fourth direction adjustment plate and the support angle of the fourth direction adjustment plate. It is characterized by having.

  An exposure apparatus according to an eleventh aspect uses the mounting stage according to any one of the first to tenth aspects.

  According to the mounting stage of the present invention, the rotational posture of the planar adjustment plate can be set by the relative positions of the second sliders in the second direction, and the relative positional relationship between the two sliders can be determined. By driving and controlling both the second sliders while maintaining the same, the plane adjustment plate can be moved in the second direction while maintaining the rotation posture of the plane adjustment plate, and the first slider is moved in the first direction. By moving, the plane adjustment plate can be moved in the first direction while maintaining the rotation posture of the plane adjustment plate regardless of the position in the second direction. Accordingly, the mechanism for adjusting the position of the plane adjustment plate in the first direction (first direction) and the mechanism for adjusting the position of the plane adjustment plate in the second direction (second direction) are configured in two configurations. Thus, it is possible to form a rotation drive mechanism that can set the rotation posture of the plane adjustment plate without affecting the respective position adjustments. As described above, the position in the second direction and the position in the first direction on the plane adjustment plate can be individually adjusted without being affected by the change in the rotation posture of the plane adjustment plate. The position of the plane adjustment plate, that is, the target workpiece can be adjusted by the same control method regardless of the rotation posture.

  In addition to the above-described configuration, one end of the flat adjustment plate and one of the second sliders is connected to the flat adjustment plate at a plate-side first support point, and the other end is connected to the slider-side first support point. In order to connect to the second slider, a first connecting portion extending in a direction orthogonal to the reference plane is connected to the plate-side first support point and the slider-side first support. Without changing the positional relationship with the point, relative rotation between the flat adjustment plate around the reference axis including the plate-side first support point and the slider-side first support point and one of the second sliders is performed. The one end of the plane adjusting plate and the other second slider is connected to the plane adjusting plate at a plate-side second support point, and the other end is connected to the other second slider at the slider-side second support point. A second connecting portion extending in a direction perpendicular to the reference plane to be connected to the slider; The second connecting portion allows a relative position change between the plate-side second support point and the slider-side second support point in a third direction along the reference plane, and the reference side If the relative rotation of the plane adjusting plate and the other second slider around the direction orthogonal to the plane is allowed, the positional relationship between the plate-side second support point and the slider-side second support point with respect to the reference axis And the rotation posture of the flat adjustment plate can be made to correspond one-to-one. For this reason, the rotation posture of the plane adjustment plate, that is, the target workpiece can be set with high accuracy by the relative positional relationship between the second sliders.

  In addition to the above-described configuration, if the third direction is inclined with respect to each of the first direction and the second direction, both the first direction and the second direction can be used regardless of the angular relationship between the first direction and the second direction. The plane adjusting plate can be rotated by moving the second slider relatively in the second direction.

  In addition to the above-described configuration, if the first direction and the second direction are orthogonal to each other, the position of the planar adjustment plate, that is, the target workpiece can be set more efficiently.

  In addition to the above-described configuration, the plate-side first support point and the plate-side second support point are configured such that when both the second sliders are set as a reference position serving as a reference for movement in the second direction, If it is located on a straight line that is inclined with respect to each of the first direction and the second direction, regardless of the rotation direction of the plane adjustment plate, that is, the target workpiece, The second slider can be moved smoothly.

  In addition to the configuration described above, if the third direction is an extending direction of a line connecting the plate-side first support point and the plate-side second support point, the slider-side second moved. The plane adjusting plate can be rotated around the reference axis so that the third direction is located on the support point. For this reason, it is possible to easily set the movement amount of the other second slider with respect to the one second slider when setting the rotation posture of the plane adjustment plate, that is, the target workpiece.

  In addition to the above-described configuration, the third direction includes the slider-side first support point and the slider-side second when the second sliders are set to a reference position that serves as a reference for movement in the second direction. Assuming that the extending direction of the line connecting the support points is the plane adjustment plate as a reference so that the plate-side second support point is positioned in the third direction including the moved slider-side second support point. It can be rotated around the axis. For this reason, it is possible to easily set the movement amount of the other second slider with respect to the one second slider when setting the rotation posture of the plane adjustment plate, that is, the target workpiece.

  In addition to the above-described configuration, the plate-side first support point and the plate-side second support point have an extension direction of a line segment that connects each other when the second sliders are set to the reference position. If the inclination is 45 degrees with respect to each of the first direction and the second direction, the influence due to the difference in the rotation direction of the target workpiece can be made extremely small.

  In addition to the above-described configuration, the fourth direction adjustment provided on the plane adjustment plate for changing the position of the target workpiece in the fourth direction orthogonal to the reference plane and the inclination with respect to the fourth direction. A fourth direction drive mechanism that changes a position of the fourth direction adjustment plate in the fourth direction and an inclination with respect to the fourth direction, and the fourth direction drive mechanism includes the fourth direction adjustment mechanism. At least three support portions for supporting the plate; and a drive main body portion for moving each of the support portions in the fourth direction. At least a part of the drive main body portion includes the first slider and the second slider. Provided on the lower side of the planar adjustment plate while being positioned between the slider and each support portion, as viewed in the fourth direction, is connected to the drive main body portion below the planar adjustment plate, and The fourth direction adjustment plate is supported above the plane adjustment plate. When it to that, it is possible to suppress an increase in height due to the provision of the fourth direction drive mechanism (magnitude dimension as viewed in the direction orthogonal to the reference plane).

  In addition to the above-described configuration, each of the support portions includes a first support portion that supports a support angle with respect to the fourth direction adjustment plate in a changeable manner without changing a support position with respect to the fourth direction adjustment plate, and the first support portion. A second support portion that supports a support position with respect to the four-direction adjustment plate so as to be changeable in a line segment direction with respect to a support position by the first support portion, and a support angle with respect to the fourth direction adjustment plate is changeable; When the fourth direction adjusting plate includes a third support portion that supports the four-direction adjusting plate so that the support position can be changed and the support angle relative to the fourth direction adjusting plate can be changed. It is possible to prevent rotation around a direction orthogonal to the reference plane from the location where the first support portion of the drive mechanism is fixed. Therefore, by appropriately changing the support height position (support position viewed in the fourth direction) by each fourth direction drive mechanism, the position set in the plane adjustment plate and the rotation posture are not changed. The position of the four-direction adjusting plate, that is, the target workpiece in the fourth direction and the inclination with respect to the fourth direction can be set.

  In the exposure apparatus using the mounting stage described above, the position and the rotation posture of the target workpiece are set with extremely high accuracy on the mounting stage, so that the mask pattern image can be appropriately exposed on the target workpiece. .

It is explanatory drawing which shows typically the structure of the exposure apparatus 10 which concerns on this invention. 4 is a perspective view schematically showing a configuration of a mounting stage 30. FIG. It is sectional drawing obtained along the II line of FIG. FIG. 3 is a perspective view similar to FIG. 2 showing the appearance of the base member 31, both Y-axis drive mechanisms 32, Y-axis slider 33, both X-axis drive mechanisms 34, and both X-axis sliders 35 in the mounting stage 30. FIG. 5 is a perspective view similar to FIG. 2 showing a state in which the XY adjustment plate 36 and the connecting portions (51, 52, 53, 54) are added to FIG. It is explanatory drawing for demonstrating the positional relationship of both the X-axis slider 35, the XY adjustment board 36, and each connection part (51, 52, 53, 54). 4 is a perspective view schematically showing a configuration of a first connecting portion 51. FIG. 4 is a perspective view schematically showing a configuration of a second connecting portion 52. FIG. 6 is a perspective view schematically showing a configuration of a third connecting portion 53. FIG. 6 is a perspective view schematically showing a configuration of a fourth connecting portion 54. FIG. FIG. 6 is a perspective view similar to FIG. 2 showing a state in which each Z-axis drive mechanism 37 is added to FIG. 5. FIG. 4 is a cross-sectional view similar to FIG. 3 showing an enlarged view of the periphery of the drive main body for explaining the configuration of the Z-axis drive mechanism 37A. It is explanatory drawing which shows a mode that the schematic diagram with which both X-axis slider 35 and XY adjustment board 36 shown in FIG. 6 were connected by each connection part (51, 52, 53, 54) was seen from the Z-axis direction upper side. . FIG. 14 is an explanatory diagram similar to FIG. 13, in which (a) shows the X-axis slider 35 </ b> B viewed from the front and moved to the left (negative side in the X-axis direction), and (b) shows the X-axis slider 35 </ b> B viewed from the front Then, the state of moving to the right side (positive side in the X-axis direction) is shown. It is explanatory drawing which shows the reference | standard XY adjustment board 36 'on the coordinate which makes the reference | standard axis line Ba the origin O. FIG. 16 is an explanatory view similar to FIG. 15, and (a) shows a state in which the X-axis slider 35 </ b> B is moved to the negative side in the X-axis direction by Xs in order to rotate the reference XY adjustment plate 36 ′ to the positive side by A degrees. (B) shows a state in which the X-axis slider 35B is moved to the positive side in the X-axis direction by Xs in order to rotate the reference XY adjustment plate 36 'by A degrees to the negative side. FIG. 16 is an explanatory diagram similar to FIG. 15, in which (a) shows the movement of the reference XY adjustment plate 36 ′ rotated A degrees to the positive side, and (b) the reference XY adjustment rotated A degrees to the negative side. A state in which the plate 36 'is moved is shown. Coordinate position _(X 0, _{Y 0)} is an explanatory view showing an arbitrary rotation angle θr only rotational movement coordinate position as the center of rotation of the reference origin Ob of _(X 1, _{Y 1).} It is a perspective view which shows typically the structure of 2nd connection part 52 'of another example. FIG. 17 is an explanatory view similar to FIG. 16 in another example, in which (a) moves the X-axis slider 35B to the negative side in the X-axis direction by Xs in order to rotate the reference XY adjustment plate 36 ′ to the positive side by A degrees. (B) shows a state in which the X-axis slider 35B is moved to the positive side in the X-axis direction by Xs in order to rotate the reference XY adjustment plate 36 'to the negative side by A degrees.

  Hereinafter, embodiments of the mounting stage 30 according to the present invention will be described with reference to the drawings.

  First, a schematic configuration of the exposure apparatus 10 using the mounting stage 30 according to the present invention will be described. FIG. 1 is an explanatory view schematically showing a configuration of an exposure apparatus 10 as an example of an exposure apparatus according to the present invention. As shown in FIG. 1, the exposure apparatus 10 includes a light source 11, a cold mirror 12, an exposure shutter 13, an ultraviolet bandpass filter 14, an integrator lens 15, and a collimator in order from the emission side along the optical axis direction. The lens 16, the plane mirror 17, the mask stage 18, the mask blind 19, the projection lens 20, the magnification correction unit 21, and the placement stage 30 (projection exposure stage) are included. The exposure apparatus 10 uses ultraviolet rays as exposure light.

  The light source 11 is provided for irradiation of ultraviolet rays as exposure light used for exposure. In this embodiment, the mercury lamp 11a is arranged at the first focal position of an elliptical reflecting mirror (elliptical mirror) 11b. ing. In the light source 11, the emitted light emitted from the mercury lamp 11 a is reflected by the elliptical reflecting mirror 11 b and proceeds to the cold mirror 12.

  The cold mirror 12 transmits infrared rays of the incident light and reflects light in other wavelength bands, and can separate the infrared rays from the incident light. For this reason, the emitted light from the light source 11 travels to the exposure shutter 13 or the ultraviolet band-pass filter 14 after the heat rays in the infrared region are separated by the cold mirror 12.

  The exposure shutter 13 can be taken in and out of an optical path (irradiation optical path to be described later) from the cold mirror 12 to the ultraviolet bandpass filter 14 so that transmission and blocking of the outgoing light reflected by the cold mirror 12 can be switched. It is said that. When the exposure shutter 13 is retracted from the optical path, the target work 22 can be exposed as described later, and when the exposure shutter 13 is positioned on the optical path, the exposure of the target work 22 is stopped.

  The ultraviolet bandpass filter 14 allows only the ultraviolet light of the incident light to pass through. In this embodiment, the ultraviolet bandpass filter 14 is configured by an i-line bandpass filter that allows the transmission of i-line, which is a spectral line of mercury having a wavelength of 365 nm. ing. For this reason, the outgoing light reflected by the cold mirror 12 is light only in the ultraviolet (i-line) wavelength band by the ultraviolet bandpass filter 14 (actually, light having a high intensity in the vicinity of the i-line wavelength band). Then, the process proceeds to the integrator lens 15.

  The integrator lens 15 cancels out the illuminance unevenness of the incident light to obtain a uniform and bright illuminance distribution up to the peripheral portion on the irradiated surface. For this reason, incident light that has been converted to light in the ultraviolet (i-line) wavelength band through the ultraviolet bandpass filter 14 is made uniform by the integrator lens 15 and travels to the collimator lens 16.

  The collimator lens 16 emits incident light as parallel light (light beam). Therefore, the emitted light having a uniform illuminance distribution through the integrator lens 15 is converted into parallel light by the collimator lens 16 and travels to the plane mirror 17, is reflected by the plane mirror 17 and travels to the mask stage 18.

  The mask stage 18 holds the mask 18a on which the pattern is formed so as to be movable in a direction perpendicular to the optical axis of the optical path while being positioned on the optical path of the emitted light reflected by the plane mirror 17. Although not shown, the mask stage 18 can be removed, and the mask stage 18 can be replaced with a mask having a pattern different from the mask 18a. For this reason, the outgoing light reflected by the plane mirror 17 passes through the mask 18a, is made to correspond to the shape of the pattern formed on the mask 18a, and proceeds to the projection lens 20.

  Therefore, in the exposure apparatus 10, the light path from the light source 11 through the cold mirror 12, the exposure shutter 13, the ultraviolet bandpass filter 14, the integrator lens 15, the collimator lens 16, and the plane mirror 17 causes ultraviolet rays with the mask 18 a as exposure light. It functions as an irradiation optical system for irradiation with (i-line).

  A mask blind 19 is provided between the mask stage 18 and the projection lens 20. The mask blind 19 is provided so as to freely advance and retreat on the optical path of the emitted light that has passed through the mask 18a, and a mask pattern image of only a desired region of the mask pattern of the mask 18a is mounted on the mounting stage 30 to be described later. In order to appropriately form on the target workpiece 22 to be performed, the optical path is appropriately advanced according to the mask pattern of the mask 18a.

  The projection lens 20 is for appropriately exposing a pattern formed on the mask 18a to a target workpiece 22 (to be described later) on the mounting stage 30, and an image of the pattern of the mask 18a held on the mask stage 18 ( (Hereinafter also referred to as a mask pattern image) is appropriately scaled and formed on the surface of a later-described target workpiece 22 placed on the placement stage 30. That is, the projection lens 20 uses the surface of the target workpiece 22 placed on the placement stage 30 as an imaging plane, and the imaging plane and the mask 18a are in an optically conjugate positional relationship. Since the exposure apparatus 10 uses ultraviolet rays (i-line) as exposure light as described above, the projection lens 20 is set by correcting aberrations with high accuracy with respect to ultraviolet rays (i-line) as exposure light. Yes. For this reason, the projection lens 20 appropriately forms the mask pattern image of the mask 18a on the imaging surface (on the target workpiece 22 described later) on the mounting stage 30 when the outgoing light transmitted through the mask 18a is incident. .

  A magnification correction unit 21 is provided between the projection lens 20 and the mounting stage 30. The magnification correction unit 21 deforms a mask pattern image formed on the imaging surface on the mounting stage 30 in accordance with distortion in a target workpiece 22 to be described later that is mounted on the mounting stage 30. The magnification correction unit 21 deforms the mask pattern image on the imaging plane by appropriately changing the magnification in an arbitrary direction when viewed on a plane orthogonal to the optical path. The magnification correction unit 21 can be realized, for example, by arranging a plurality of glass plates in parallel in the optical path direction and appropriately bending or rotating each glass plate.

  As described above, in the exposure apparatus 10, the mask blind 19, the projection lens 20, and the magnification correction unit 21 form an image on the mounting stage 30 with ultraviolet rays as exposure light transmitted through the mask 18 a on which a predetermined pattern is formed. It functions as a projection optical system that forms an image as a mask pattern image on a surface (on a target workpiece 22 described later).

  On the placement stage 30, the target work 22 is placed for exposure of the mask pattern. The mounting stage 30 can hold the target work 22 with the surface of the target work 22 to be placed in line with the imaging plane of the projection lens 20, and the held target work 22 is orthogonal to the projection optical path. It is possible to move along the surface. In this embodiment, the movement of the target workpiece 22 on the placement stage 30 is performed under the control of a drive control unit (not shown) provided inside the placement stage 30. The configuration of the mounting stage 30 will be described in detail later. In addition, the movement of the target workpiece 22 on the mounting stage 30 may be performed manually.

  The target workpiece 22 is formed by applying or pasting a photosensitive material such as a photoresist that photoreacts to ultraviolet rays (i rays) to a silicon wafer, a glass substrate, a printed board, or the like. For this reason, the target workpiece 22 can be exposed by irradiation with ultraviolet rays (i rays).

  In this exposure apparatus 10, the emitted light emitted from the light source 11 reaches the mask stage 18 through the cold mirror 12, the ultraviolet bandpass filter 14, the integrator lens 15, the collimator lens 16 and the plane mirror 17 in the irradiation optical system. As a result, the mask 18a held on the mask stage 18 is uniformly irradiated with ultraviolet rays (i rays). Then, in the exposure apparatus 10, the mask pattern image by ultraviolet rays (i-line) is appropriately formed on the imaging surface on the mounting stage 30 by the functions of the projection optical system, that is, the mask blind 19, the projection lens 20 and the magnification correction unit 21. It is formed. Therefore, the exposure apparatus 10 can appropriately expose the mask pattern image on the target work 22 by setting the target work 22 to an appropriate position (posture) along the imaging plane. The position of the target workpiece 22 with respect to the mask pattern image, that is, the position of the target workpiece 22 with respect to the mask 18a that has optically passed through the projection optical system (mainly the projection lens 20) is connected to the target workpiece 22 held by the mounting stage 30. Adjustment (alignment) can be made by appropriately moving on the image plane.

  As shown in FIGS. 2 and 3, the mounting stage 30 used in the exposure apparatus 10 according to the present invention includes a base member 31, two Y-axis drive mechanisms 32, a Y-axis slider 33, and two X-axis drives. A mechanism 34, two X-axis sliders 35, an XY adjustment plate 36, three Z-axis drive mechanisms 37, a Z-axis adjustment plate 38, a lift mechanism 39, and a chuck plate 40 are included.

  The base member 31 is a plate-like member that extends along a reference plane serving as a reference when setting the positional relationship of the target workpiece 22 (see FIG. 1) with respect to the projection optical system described above. And fixedly provided. The reference plane is a position where a mask pattern image is formed by the projection optical system described above, that is, an image formation plane optically conjugate with the mask 18a by the projection lens 20. In this embodiment, the reference plane is a plane parallel to an XY plane that is a plane orthogonal to the Z axis, where the optical axis direction of the projection optical system is the Z axis direction. The positive side in the Z-axis direction is the side from the mounting stage 30 toward the projection optical system described above (upper side when FIG. 2 is viewed from the front), and is also referred to as the upper side of the mounting stage 30 in this specification. For this reason, the base member 31 extends along the XY plane. Two Y-axis drive mechanisms 32 are provided on the upper surface of the base member 31.

  As shown in FIGS. 2 to 4, the two Y-axis drive mechanisms 32 are provided on both ends of the upper surface of the base member 31 as viewed in the X-axis direction. The two Y-axis drive mechanisms 32 apply a drive force in the Y-axis direction to the base member 31 to the Y-axis slider 33. The Y-axis slider 33 has a plate shape having a through hole 33a in the center, and is provided along a reference plane.

  Each Y-axis drive mechanism 32 has basically the same configuration as an X-axis drive mechanism 34 described later, a Y-axis stator 32a, a pair of base-side Y-axis guide members 32b, and a Y-axis although not shown. A mover and a pair of slider-side Y-axis guide members are provided. The Y-axis stator 32a is formed with a plurality of permanent magnets arranged in the Y-axis direction so that different magnetic poles are adjacent to each other on the upper surface of the base member 31, and constitutes a so-called magnet track. Both base-side Y-axis guide members 32b are provided in pairs on the upper surface of the base member 31 so as to sandwich the Y-axis stator 32a, and extend in the Y-axis direction. Both the base-side Y-axis guide members 32b are slid in a extending direction (Y-axis direction) with a pair of slider-side Y-axis guide members (not shown) provided on the lower surface (back surface) of the Y-axis slider 33. A movable fitting is possible. The Y-axis movable element (not shown) is provided between a pair of slider-side Y-axis guide members (not shown) on the lower surface (back surface) of the Y-axis slider 33, and is Y in the Z-axis direction (vertical direction). It can be opposed to the shaft stator 32a. The Y-axis movable element (not shown) accommodates a coil that can be applied with a current.

  In each Y-axis drive mechanism 32, the Y-axis mover is fixed by appropriately applying an attractive repulsion force by a magnetic force between a Y-axis mover (not shown) and the Y-axis stator 32a. The axis slider 33 can be appropriately moved with respect to the base member 31 in the Y-axis direction. Therefore, in this embodiment, the Y-axis direction functions as a first direction along the reference plane, both Y-axis drive mechanisms 32 function as first drive mechanisms, and the Y-axis slider 33 functions as a first slider. In order to detect the position of the Y-axis slider 33 on the base member 31, a position detection element is provided although not shown. Since both the Y-axis drive mechanisms 32 move a single Y-axis slider 33, both are controlled in synchronization.

  In the mounting stage 30, the drive control unit (not shown) provided inside the stage 30 controls the current applied to both Y-axis movers (not shown) synchronously to move both the Y-axis. The Y-axis slider 33 to which both Y-axis movable elements are fixed is appropriately moved with respect to the base member 31 by appropriately applying an attractive repulsion force due to the magnetic force between the child and both Y-axis stators 32a. At this time, in the above-described drive control unit (not shown), since this movement uses the attractive repulsion force due to the magnetic force, the position detection element (in order to appropriately move to the set movement target position) Servo control is performed based on position information from (not shown). Two X-axis drive mechanisms 34 are provided on the Y-axis slider 33.

  The two X-axis drive mechanisms 34 are provided on the upper surface of the Y-axis slider 33 at both end positions as viewed in the Y-axis direction. Each X-axis drive mechanism 34 applies a driving force in the X-axis direction to the Y-axis slider 33 to the corresponding X-axis slider 35 (35A, 35B). The two X-axis sliders 35 have a plate shape having substantially the same length when viewed in the X-axis direction, and are provided along the reference plane at the same height position (up and down position) when viewed in the Z-axis direction. Yes.

  Each X-axis drive mechanism 34 includes an X-axis stator 34a, a pair of base-side X-axis guide members 34b, an X-axis movable element 34c, and a pair of slider-side X-axis guide members 34d. The X-axis stator 34a is formed with a plurality of permanent magnets arranged in the Y-axis direction so that different magnetic poles are adjacent to each other on the upper surface of the Y-axis slider 33, and constitutes a so-called magnet track. Both base side X-axis guide members 34b are provided in pairs on the upper surface of the Y-axis slider 33 so as to sandwich the X-axis stator 34a, and extend in the X-axis direction. Both the base-side X-axis guide members 34b can be slidably fitted in the extending direction of the corresponding slider-side X-axis guide member 34d. The X-axis movable element 34c is provided on the lower surface (back surface) of the X-axis slider 35, and can be opposed to the X-axis stator 34a in the Z-axis direction (vertical direction) (see FIG. 3). The X-axis movable element 34c accommodates a coil to which current can be applied. A pair of slider-side X-axis guide members 34d are provided on both sides of the X-axis movable element 34c.

  One of these two X-axis drive mechanisms 34 (34A when individually described) is provided corresponding to the X-axis slider 35A, and the other (34B when individually described) is the X-axis. It is provided corresponding to the slider 35B. That is, the X-axis drive mechanism 34A is provided to move one X-axis slider 35A in the X-axis direction, and the X-axis movable element 34c is provided on the lower surface of the X-axis slider 35A. The X-axis drive mechanism 34B is provided to move the other X-axis slider 35B in the X-axis direction, and the X-axis movable element 34c is provided on the lower surface of the X-axis slider 35B.

  In each X-axis drive mechanism 34, the corresponding X-axis slider 35 (35A or 35B) is moved to the Y-axis by appropriately applying an attractive repulsion force due to the magnetic force between the X-axis movable element 34c and the X-axis stator 34a. The slider 33 can be appropriately moved in the X-axis direction. For this reason, in this embodiment, the X-axis direction functions as the second direction along the reference plane and is inclined with respect to the first direction, each X-axis drive mechanism 34 functions as the second drive mechanism, and each X-axis The slider 35 functions as a second slider. In order to detect the position of each X-axis slider 35A, 35B on the Y-axis slider 33, a position detection element is provided although not shown. In this embodiment, the X-axis slider 35A and the X-axis slider 35B are in the center position of the movable range in the X-axis direction, that is, the X-axis slider 35A and the X-axis slider 35B are in the Y-axis slider 33. The state of alignment in the Y-axis direction at the center position in the X-axis direction on the upper surface (see FIG. 4 etc.) is used as the reference position for drive control (movement in the X-axis direction) by both X-axis drive mechanisms 34. .

  In the mounting stage 30, an applied current to each X-axis movable element 34 c is individually controlled by a drive control unit (not shown) provided inside thereof, so that the X-axis movable element 34 c and the X-axis stator are controlled. The X-axis slider 35 (35A or 35B) to which the X-axis movable element 34c is fixed is appropriately or individually integrated with the Y-axis slider 33 by appropriately applying an attractive repulsion force due to the magnetic force with the 34a. Moved to. At this time, in the above-described drive control unit (not shown), since this movement uses the attractive repulsion force due to the magnetic force, the position detection element (in order to appropriately move to the set movement target position) Servo control is performed based on position information from (not shown). An XY adjustment plate 36 is provided so as to bridge the two X-axis sliders 35 (see FIG. 5).

  The XY adjustment plate 36 is provided for setting (adjusting) the position of the target work 22 (see FIG. 1) in the XY direction and the rotational posture along the XY plane. As shown in FIG. 5, the XY adjustment plate 36 has a plate shape and bridges the X-axis slider 35 </ b> A and the X-axis slider 35 </ b> B along the reference plane above both the X-axis sliders 35. Has been extended. The XY adjustment plate 36 is basically connected to the X-axis slider 35 </ b> A by the first connecting portion 51 and is connected to the X-axis slider 35 </ b> B by the second connecting portion 52. In this embodiment, in addition to the first connecting portion 51 and the second connecting portion 52, the third connecting portion 53 is connected to the X-axis slider 35A, and the fourth connecting portion 54 is connected to the X-axis slider 35B. ing. Each connecting portion (51, 52, 53, 54) extends in the Z-axis direction, and is connected to the XY adjustment plate 36 at one upper end and the X-axis slider 35 (35A) at the other lower end. , 35B).

  Here, as shown in FIG. 6, in the XY adjustment plate 36, a portion where the first connecting portion 51 is connected is a plate side first support point Sb <b> 1, and a portion where the second connecting portion 52 is connected is the plate side first. The second support point Sb2 is the plate side third support point Sb3 where the third connecting portion 53 is connected, and the plate side fourth support point Sb4 is the location where the fourth connecting portion 54 is connected. Further, in the X-axis slider 35A, a portion where the first connecting portion 51 is connected is referred to as a slider-side first support point Ss1, and a portion where the third connecting portion 53 is connected is referred to as a slider-side third support point Ss3. Further, in the X-axis slider 35B, a portion where the second connecting portion 52 is connected is a slider-side second support point Ss2, and a portion where the fourth connecting portion 54 is connected is a slider-side fourth support point Ss4. In this embodiment, the support points (Sb1, Sb2, Sb3, Sb4) on the XY adjustment plate 36 are arranged so as to draw a square when viewed from the Z-axis direction.

  The first connecting portion 51 is arranged in a state where the plate-side first support point Sb1 and the slider-side first support point Ss1 are positioned on the same straight line when viewed in the Z-axis direction and the relative positional relationship is fixed. The X-axis slider 35A and the XY adjustment plate 36 are coupled so as to allow the X-axis slider 35A and the XY adjustment plate 36 to rotate relative to each other around the reference axis line Ba including the support points Sb1 and Ss1. In the present embodiment, as shown in FIG. 7, the first connecting portion 51 rotates with respect to a connecting base portion 51a fixed to the X-axis slider 35A and extending in the Z-axis direction, and its extending end portion 51b. A rotating portion 51c provided in a possible manner. The connecting base portion 51a has a cylindrical shape as a whole, and its central axis (Ba) is along the Z-axis direction. The rotating portion 51c has an annular shape surrounding the extending end portion 51b of the connecting base portion 51a, and is rotatable about the central axis (Ba) of the connecting base portion 51a with respect to the extending end portion 51b. In the first connecting portion 51, the rotating portion 51 c is fixedly attached to the XY adjustment plate 36.

  In this 1st connection part 51, since the relative rotation of the connection base part 51a and the rotation part 51c is possible around the central axis (Ba) of the connection base part 51a, the connection base part 51a was provided. The X-axis slider 35A and the XY adjustment plate 36 are connected to each other while allowing relative rotation around the central axis (Ba) of the X-axis slider 35A and the XY adjustment plate 36 provided with the rotating portion 51c. ing. For this reason, in the 1st connection part 51, the center axis line of the connection base part 51a turns into the reference axis line Ba, the center position of the connection base part 51a becomes the slider side 1st support point Ss1, and the center position of the rotation part 51c is plate side 1st. One support point Sb1 is obtained.

  The second connecting portion 52 allows the relative position change of the plate-side second support point Sb2 and the slider-side second support point Ss2 in the third direction along the XY plane, and rotates around the Z-axis direction. The X-axis slider 35B and the XY adjustment plate 36 are coupled so that the X-axis slider 35B and the XY adjustment plate 36 are allowed to rotate relative to each other (see FIG. 6 and the like). In this embodiment, as shown in FIG. 8, the second connecting portion 52 is fixed to the X-axis slider 35B and extended in the Z-axis direction, and rotates with respect to the connecting base portion 52a. The connected rotation part 52b made possible, the rail holding part 52c fixed to the upper end surface thereof, the rail 52d slidably held by the rail holding part 52c, and the mounting part 52e fixed to the rail 52d And having. The connecting base portion 52a has a cylindrical shape as a whole, and its central axis is along the Z-axis direction. The connection rotation part 52b has a cylindrical shape with a smaller diameter than the connection base part 52a, and is provided at a concentric position on the connection base part 52a. The connection rotation portion 52b is rotatable about the central axis of the connection base portion 52a with respect to the connection base portion 52a. The rail holding portion 52c is a direction along the XY plane, and is slidable in a third direction inclined with respect to the X-axis direction (second direction) and the Y-axis direction (first direction). It is possible to hold. The rail 52d has a rod shape extending in the third direction, and is fixed to the attachment portion 52e. The attachment portion 52e has a columnar shape as a whole, and is fixedly attached to the XY adjustment plate 36. For this reason, the rail 52d is fixed to the XY adjustment plate 36 via the attachment portion 52e. In this embodiment, the extending direction of the rail 52d, that is, the third direction coincides with the extending direction of the line connecting the plate-side second support point Sb2 and the plate-side first support point Sb1 on the XY adjustment plate 36. It corresponds to a square diagonal line drawn by each support point (Sb1, Sb2, Sb3, Sb4). For this reason, in the third direction, when both the X-axis drive mechanisms 34 are set as the reference positions for drive control, the inclination is 45 degrees with respect to the X-axis direction (second direction) and the Y-axis direction (first direction). It will have.

  In the second connecting portion 52, the rail 52d and the rail holding portion 52c can move relative to each other in the third direction, and around the central axis of the connecting rotary portion 52b provided with the rail holding portion 52c. The relative rotation of the connection rotation portion 52b and the connection base portion 52a is possible. For this reason, the second connecting portion 52 has a relative relationship in the third direction between the X-axis slider 35B provided with the connecting base portion 52a and the XY adjusting plate 36 provided with the rail 52d (mounting portion 52e). The X-axis slider 35B and the XY adjustment plate 36 allow displacement and allow relative rotation between the X-axis slider 35B and the XY adjustment plate 36 around the central axis of the connection base portion 52a (connection rotation portion 52b). Are linked. For this reason, in the 2nd connection part 52, the center position of the connection base part 52a becomes slider side 2nd support point Ss2, and the center position of the rail 52d (attachment part 52e) becomes plate side 2nd support point Sb2. The second connecting portion 52 connects the plate-side second support point Sb2 and the slider-side second support point Ss2 in the Z-axis direction when the X-axis slider 35A and the X-axis slider 35B are set to the drive control reference positions. The X-axis slider 35B is set so as to be a reference position (the center position of the rail 52d (the center axis of the mounting portion 52e) and the center axis of the coupling base portion 52a coincide). And the XY adjustment plate 36.

  The third connecting portion 53 allows a relative position change between the plate-side third support point Sb3 and the slider-side third support point Ss3 in the direction along the XY plane, and X around the Z-axis direction. The X-axis slider 35A and the XY adjustment plate 36 are coupled so as to allow the shaft slider 35A and the XY adjustment plate 36 to rotate relative to each other (see FIG. 6 and the like). In the present embodiment, as shown in FIG. 9, the third connecting portion 53 includes a first rail 53a fixed to the X-axis slider 35A and a first rail holding portion that slidably holds the first rail 53a. 53b, a fixed plate portion 53c fixed to the first rail holding portion 53b, a second rail holding portion 53d fixed to the fixed plate portion 53c, and slidably held on the second rail holding portion 53d A second rail 53e, a rotary shaft portion 53f fixed to the second rail 53e, and a rotary portion 53g provided to be rotatable with respect to the rotary shaft portion 53f. The first rail 53a has a rod shape extending in the Y-axis direction. The first rail holding portion 53b can hold the first rail 53a so as to be slidable in the extending direction of the first rail 53a. The fixed plate portion 53c has a plate shape, the first rail holding portion 53b is provided on the lower surface side, and the second rail holding portion 53d is provided on the upper surface side, and the first rail holding portion 53b and the second rail are provided. The positional relationship with the holding portion 53d is fixed. The second rail holding portion 53d can hold the second rail 53e so as to be slidable in the X-axis direction. The second rail 53e has a rod shape extending in the X-axis direction, and is held by the second rail holding portion 53d so as to be movable in the extending direction. The rotation shaft portion 53f has a columnar shape as a whole, and is fixed to the second rail 53e so that the center axis is along the Z-axis direction. The rotating portion 53g has an annular shape surrounding the rotating shaft portion 53f, and is rotatable about the central axis of the rotating shaft portion 53f with respect to the rotating shaft portion 53f. In the third connecting portion 53, the rotating portion 53 g is fixedly attached to the XY adjustment plate 36.

  In the third connecting portion 53, relative movement in the Y-axis direction between the first rail 53a and the first rail holding portion 53b (the second rail holding portion 53d that is fixed via the fixing plate portion 53c). And the relative movement of the second rail holding portion 53d and the second rail 53e in the X-axis direction is possible, and the central axis of the rotary shaft portion 53f provided on the second rail 53e Around the rotating shaft portion 53f and the rotating portion 53g, relative rotation is possible. For this reason, the 3rd connection part 53 is relative to the direction along the XY plane of X axis slider 35A provided with the 1st rail 53a, and XY adjustment board 36 provided with rotation part 53g. The X-axis slider 35A and the XY adjustment plate 36 are connected while allowing displacement and allowing relative rotation around the central axis of the rotary shaft portion 53f. For this reason, in the 3rd connection part 53, the center position of the 1st rail 53a becomes the slider side 3rd support point Ss3, and the center position of the rotation part 53g becomes the board side 3rd support point Sb3. The third connecting portion 53 connects the plate-side third support point Sb3 and the slider-side third support point Ss3 in the Z-axis direction when the X-axis slider 35A and the X-axis slider 35B are set to the drive control reference position. The position is set to be a reference position (the center axis of the rotation shaft portion 53f and the straight line along the Z-axis direction including the center position of the first rail 53a coincide with each other). The slider 35A and the XY adjustment plate 36 are provided respectively. That is, the third connecting portion 53 does not change the distance between the plate-side third support point Sb3 and the slider-side third support point Ss3 as viewed in the Z-axis direction (the distance is maintained at a predetermined size). However, it is possible to change the relative positions of the plate-side third support point Sb3 and the slider-side third support point Ss3 in the direction along the XY plane.

  The fourth connecting portion 54 allows the relative position change of the plate-side fourth support point Sb4 and the slider-side fourth support point Ss4 in the direction along the XY plane, and X around the Z-axis direction. The X-axis slider 35B and the XY adjustment plate 36 are coupled so as to allow the shaft slider 35B and the XY adjustment plate 36 to rotate relatively (see FIG. 6 and the like). In the present embodiment, as shown in FIG. 10, the fourth connecting portion 54 includes a first rail 54a fixed to the X-axis slider 35B and a first rail holding portion that slidably holds the first rail 54a. 54b, a fixed plate portion 54c fixed to the first rail holding portion 54b, a second rail holding portion 54d fixed to the fixed plate portion 54c, and slidably held on the second rail holding portion 54d A second rail 54e, a rotary shaft portion 54f fixed to the second rail 54e, and a rotary portion 54g provided to be rotatable with respect to the rotary shaft portion 54f. The first rail 54a has a rod shape extending in the X-axis direction. The first rail holding portion 54b can hold the first rail 54a so as to be slidable in the extending direction of the first rail 54a. The fixed plate portion 54c has a plate shape, the first rail holding portion 54b is provided on the lower surface side, and the second rail holding portion 54d is provided on the upper surface side, and the first rail holding portion 54b and the second rail are provided. The positional relationship with the holding portion 54d is fixed. The second rail holding portion 54d can hold the second rail 54e so as to be slidable in the Y-axis direction. The second rail 54e has a rod shape extending in the Y-axis direction, and is held by the second rail holding portion 54d so as to be movable in the extending direction. The rotating shaft portion 54f has a cylindrical shape as a whole, and is fixed to the second rail 54e so that the center axis line is along the Z-axis direction. The rotating portion 54g has an annular shape surrounding the rotating shaft portion 54f, and is rotatable about the central axis of the rotating shaft portion 54f with respect to the rotating shaft portion 54f. In the fourth connecting portion 54, the rotating portion 54 g is fixedly attached to the XY adjustment plate 36.

  In the fourth connecting portion 54, the relative movement in the X-axis direction between the first rail 54a and the first rail holding portion 54b (the second rail holding portion 54d that is fixed via the fixing plate portion 54c). And the relative movement of the second rail holding portion 54d and the second rail 54e in the Y-axis direction is possible, and the central axis of the rotary shaft portion 54f provided on the second rail 54e. Around the rotating shaft portion 54f and the rotating portion 54g, relative rotation is possible. For this reason, the 4th connection part 54 is relative to the direction along the XY plane of X-axis slider 35B provided with the 1st rail 54a, and XY adjustment board 36 provided with rotation part 54g. The X-axis slider 35B and the XY adjustment plate 36 are connected while allowing displacement and allowing relative rotation around the central axis of the rotary shaft portion 54f. For this reason, in the 4th connection part 54, the center position of the 1st rail 54a becomes slider side 4th support point Ss4, and the center position of the rotation part 54g becomes plate | board side 4th support point Sb4. The fourth connecting portion 54 connects the plate-side fourth support point Sb4 and the slider-side fourth support point Ss4 in the Z-axis direction when the X-axis slider 35A and the X-axis slider 35B are set to the drive control reference positions. The position is set to be a reference position (the center axis of the rotating shaft portion 54f and the straight line along the Z-axis direction including the center position of the first rail 54a coincide with each other). The slider 35B and the XY adjustment plate 36 are provided respectively. In other words, the fourth connecting portion 54 does not change the distance seen in the Z-axis direction between the plate-side fourth support point Sb4 and the slider-side fourth support point Ss4 (the distance is maintained at a predetermined size). However, it is possible to change the relative positions of the plate-side fourth support point Sb4 and the slider-side fourth support point Ss4 in the direction along the XY plane.

  For this reason, the XY adjustment plate 36 can adjust the position in the Y-axis direction by appropriately moving the Y-axis slider 33 on the base member 31 in the Y-axis direction, and both the X-axis sliders 35 (35A, 35A, The position in the X-axis direction can be adjusted by appropriately moving the unit 35B) integrally in the X-axis direction, and can be moved along the XY plane. Further, as shown in FIG. 6, the XY adjustment plate 36 rotates the reference axis Ba on the base member 31 by appropriately moving the X-axis slider 35 </ b> A and the X-axis slider 35 </ b> B individually in the X-axis direction. As shown, it is possible to appropriately adjust the rotation posture viewed around the Z-axis direction (see arrow A1). At this time, in the XY adjustment plate 36, the plate-side second support point Sb2 and the slider-side second support point Ss2 resulting from the rotation with the reference axis Ba as the base point, the plate-side third support point Sb3, and the slider-side third support The variation in the direction along the XY plane of the point Ss3, the plate-side fourth support point Sb4, and the slider-side fourth support point Ss4 is the displacement in the third direction at the second connecting portion 52, and By being absorbed by the displacement in the direction along the XY plane in the third connecting portion 53 and the fourth connecting portion 54, support by both X-axis sliders 35 (35A, 35B) is possible. Further, in the XY adjustment plate 36, since the second connecting portion 52 is configured to allow only displacement in the third direction, the positional relationship of the X-axis slider 35B with respect to the X-axis slider 35A and the XY adjustment plate 36 The rotational attitude around the reference axis Ba can be made to correspond one-to-one. For this reason, in this embodiment, the XY adjustment plate 36 functions as a plane adjustment plate, and both the X-axis drive mechanism 34 and both the X-axis sliders 35 also have a function as a rotation drive mechanism. The control of adjusting the position and the rotation posture in the state along the XY plane in the XY adjustment plate 36 will be described in detail later.

  The XY adjustment plate 36 is provided with three support portion insertion holes 36a, 36b, 36c provided so as to surround the center position, and a central through hole 36d provided in the center thereof. The three support part insertion holes 36 a, 36 b, and 36 c are provided corresponding to the three Z-axis drive mechanisms 37. The central through hole 36d has a size smaller than that of the through hole 33a of the Y-axis slider 33 when viewed from the Z-axis direction, and the X-axis slider 35A and the X-axis slider 35B are used as reference positions for drive control. At this time, the center of the through hole 33a is located.

  The three Z-axis drive mechanisms 37 are provided on the lower side (back side) of the XY adjustment plate 36 (see FIGS. 11 and 12). Each Z-axis drive mechanism 37 is provided for setting (adjusting) the position of the target workpiece 22 (see FIG. 1) in the Z-axis direction and the inclination with respect to the Z-axis direction. In the present embodiment, as shown in FIG. 11, one of these three Z-axis drive mechanisms 37 (37A when individually described) is positioned above the X-axis slider 35A, and the remaining two Z-axis drive mechanisms 37 are two. Two (37B and 37C when individually described) are positioned above the X-axis slider 35B. Since each Z-axis drive mechanism 37 has the same basic configuration, a schematic configuration of the Z-axis drive mechanism 37A will be described, and the others will be omitted.

  As shown in FIG. 12, the Z-axis drive mechanism 37A includes a drive motor 37a, a conversion unit 37b, a transmission shaft 37c, a slide bearing unit 37d, a first moving unit 37e, a first guide unit 37f, 2 guide portion 37g, second guide holding portion 37h, second moving portion 37i, third guide portion 37j, third guide holding portion 37k, ball joint shaft 37l, spherical bearing portion 37m, Z axis And a moving part 37n.

  The drive motor 37a is rotationally controlled by appropriately controlling an applied current by a drive control unit (not shown) provided inside the mounting stage 30. In this embodiment, a stepping motor is used as the drive motor 37a. The output shaft of the drive motor 37a is connected to the conversion unit 37b. A transmission shaft 37c is also connected to the conversion unit 37b, and the rotational movement of the drive motor 37a (its output shaft) is converted into a forward / backward movement of the transmission shaft 37c in the Y-axis direction. The transmission shaft 37c has a rod shape extending in the Y-axis direction, and is held by the slide bearing portion 37d so as to be movable back and forth in the Y-axis direction. The slide bearing portion 37d is fixed to the back surface (lower surface) of the XY adjustment plate 36, and assists the transmission shaft 37c applied with the driving force from the drive motor 37a to move forward and backward in the Y-axis direction. To do.

  The first moving part 37e is fixed to the transmission shaft 37c. The first moving portion 37e has a so-called wedge shape in which the upper surface is along the XY plane and the lower surface is inclined with respect to the XY plane, and the first guide portion 37f is slidably held on the upper surface portion. Yes. The first guide portion 37f has a rod shape extending in the Y-axis direction, and is fixed to the back surface (lower surface) of the XY adjustment plate 36. For this reason, the 1st moving part 37e can be moved forward and backward in the Y-axis direction as the transmission shaft 37c moves forward and backward in the Y-axis direction.

  A second guide portion 37g is fixed along the lower surface of the first moving portion 37e. The second guide portion 37g has a rod shape and extends in a direction along the YZ plane and inclined to the Y axis. The second guide portion 37g is held by the second guide holding portion 37h. The second guide holding portion 37h can hold the second guide portion 37g so as to be slidable in the extending direction, and is fixed to the second moving portion 37i.

  The second moving portion 37i has a columnar shape as a whole and has an arm portion 37o extending in the Y-axis direction. The upper surface of the arm portion 37o is parallel to the lower surface of the first moving part 37e. A second guide holding portion 37h is fixed to the upper surface of the arm portion 37o. A third guide portion 37j is fixed to the second moving portion 37i on the side opposite to the side on which the arm portion 37o is extended when viewed in the Y-axis direction. The third guide portion 37j has a rod shape and extends in the Z-axis direction. The third guide part 37j is held by the third guide holding part 37k. The third guide holding portion 37k can hold the third guide portion 37j so as to be slidable in the extending direction, and is fixed to the extending wall 36e of the XY adjusting plate 36. The extension wall 36e extends downward from the back surface (lower surface) of the XY adjustment plate 36 along the Z-axis direction.

  Therefore, the second moving part 37i is connected to the first moving part 37e via the second guide part 37g and the second guide holding part 37h when the first moving part 37e is moved forward and backward in the Y-axis direction. Thus, the third guide holding portion 37k and the third guide portion 37j are moved back and forth in the Z-axis direction, which is the guide direction. That is, the second moving part 37i moves downward in the Z-axis direction when the transmission shaft 37c is most advanced (the first moving part 37e is separated from the drive motor 37a), and the transmission shaft 37c is most retracted. When the first moving unit 37e approaches the drive motor 37a, the first moving unit 37e moves upward in the Z-axis direction. Therefore, each Z-axis drive mechanism 37 is a so-called wedge mechanism. The second moving portion 37i and the third guide portion 37j moved forward and backward in the Z-axis direction, the extending wall 36e fixed to the XY adjustment plate 36 and the height position in the Z-axis direction fixed, and the third guide The lower portion of the holding portion 37k is located in a space between the X-axis slider 35A and the X-axis slider 35B.

  A ball joint shaft 371 is provided above the second moving portion 37i. The ball joint shaft 37l is provided so as to extend in the Z-axis direction, and its extending end is spherical (37p). The spherical portion 37p of the ball joint shaft 37l is held by a spherical bearing portion 37m. The spherical bearing portion 37m holds the spherical portion 37p of the ball joint shaft 37l slidably along the spherical shape. A Z-axis moving part 37n is provided above the spherical bearing part 37m. The Z-axis moving part 37n has a columnar shape. The Z-axis moving part 37n is swingable around the center position of the spherical part 37p of the ball joint shaft 37l with respect to the second moving part 37i.

  Therefore, in the Z-axis drive mechanism 37A, when the drive motor 37a is appropriately driven to rotate, the first moving part 37e moves forward and backward in the Y-axis direction, and the first moving part 37e moves forward and backward in the Y-axis direction. Accordingly, the second moving portion 37i moves forward and backward in the Z-axis direction, and the Z-axis moving portion 37n attached to the second moving portion 37i via the ball joint shaft 37l and the spherical bearing portion 37m is a slide bearing portion. It moves forward and backward in the Z-axis direction with respect to the XY adjustment plate 36 attached via 37d, the first moving part 37e and the third guide holding part 37k.

  As described above, each Z-axis drive mechanism 37 is provided corresponding to each support portion insertion hole (36a, 36b, 36c) of the XY adjustment plate 36 individually. Specifically, as shown in FIG. 11, the Z-axis moving part 37n of the Z-axis driving mechanism 37A is inserted into the support part insertion hole 36a, and the Z-axis moving part 37n of the Z-axis driving mechanism 37B is supported. The Z-axis moving part 37n of the Z-axis drive mechanism 37C is inserted into the support part insertion hole 36c. In each Z-axis drive mechanism 37, adjustment plate support portions (37q, 37r, 37s) for supporting the Z-axis adjustment plate 38 are provided above the Z-axis moving portion 37n. For this reason, in this embodiment, the Z-axis direction is the fourth direction orthogonal to the reference plane, the Z-axis adjustment plate 38 functions as a fourth direction adjustment plate, and each Z-axis drive mechanism 37 serves as the fourth direction drive mechanism. Function. In each Z-axis drive mechanism 37, a drive motor 37a, a conversion unit 37b, a transmission shaft 37c, a slide bearing unit 37d, a first moving unit 37e, a first guide unit 37f, a second guide unit 37g, and a second guide holding unit. 37h, the second moving portion 37i, the third guide portion 37j, the third guide holding portion 37k, the ball joint shaft 37l, the spherical bearing portion 37m, and the Z-axis moving portion 37n function as a drive main body portion.

  The adjustment plate support portion 37q provided on the Z-axis movement portion 37n of the Z-axis drive mechanism 37A has a cylindrical shape as a whole and is fixed at a predetermined position with respect to the back surface (lower surface) of the Z-axis adjustment plate 38. Is done. That is, since the adjustment plate support portion 37q is provided on the Z-axis movement portion 37n that is swingable by the ball joint shaft 37l and the spherical bearing portion 37m, the XY plane of the Z-axis adjustment plate 38 is provided. A predetermined position of the Z-axis adjusting plate 38 is fixedly supported while allowing a change in inclination with respect to (allowing to change the support angle). For this reason, the adjustment plate support part 37q functions as a first support part in the fourth direction drive mechanism.

  The adjustment plate support portion 37r provided on the Z-axis moving portion 37n of the Z-axis drive mechanism 37B has a long guide rail, and although not shown, a guide rail holding portion provided on the back surface of the Z-axis adjustment plate 38. The guide rail is held so as to be slidable by the movement, so that it is connected to the back surface of the Z-axis adjusting plate 38. This guide rail extends so that the axis of the adjustment plate support portion 37q (Z-axis moving portion 37n) of the Z-axis drive mechanism 37A is positioned on the extension line in the extending direction, in other words, toward the axis. The position is set. Since the adjusting plate support portion 37r is provided on the Z-axis moving portion 37n that can be swung by the ball joint shaft 37l and the spherical bearing portion 37m, the adjusting plate support portion 37r with respect to the XY plane of the Z-axis adjusting plate 38 is provided. The rear surface of the Z-axis adjusting plate 38 is supported so as to be displaceable in the extending direction of the guide rail while allowing the change in inclination (the support angle can be changed freely). For this reason, the adjustment plate support part 37r functions as a second support part in the fourth direction drive mechanism.

  The adjustment plate support portion 37s provided on the Z-axis moving portion 37n of the Z-axis drive mechanism 37C has a cylindrical shape as a whole, and is slidably brought into contact with the back surface of the Z-axis adjustment plate 38. That is, since the adjustment plate support portion 37s is provided on the Z-axis movement portion 37n that is swingable by the ball joint shaft 37l and the spherical bearing portion 37m, the XY plane of the Z-axis adjustment plate 38 is provided. The Z-axis adjusting plate 38 is movably supported while allowing a change in inclination with respect to the angle (the support angle can be freely changed). For this reason, the adjustment plate support portion 37s functions as a third support portion in the fourth direction drive mechanism.

  As shown in FIG. 2, the Z-axis adjusting plate 38 is a plate-like member that enables a fixed placement of the chuck plate 40 that sucks and holds the target workpiece 22 (see FIG. 1). The Z-axis adjusting plate 38 adjusts the height position seen in the Z-axis direction by driving each Z-axis drive mechanism 37 in synchronization. Further, the Z-axis adjusting plate 38 adjusts the inclination with respect to the XY plane by appropriately driving each Z-axis drive mechanism 37 individually. At this time, in the Z-axis adjustment plate 38, a position where the adjustment plate support portion 37q of the Z-axis drive mechanism 37A is fixed becomes a base point, and the adjustment plate support portion 37q, the adjustment plate support portion 37r of the Z-axis drive mechanism 37B, and the Z Variations in the distances due to the difference in height position of the adjustment plate support portion 37s of the shaft drive mechanism 37C are caused by the displacement of the adjustment plate support portion 37r in the extending direction of the guide rail and the adjustment plate support portion 37s. By being absorbed by the displacement, the support by each Z-axis drive mechanism 37 is possible. Further, in the Z-axis adjustment plate 38, the adjustment plate support portion 37r of the Z-axis drive mechanism 37B is configured to permit only displacement in the extending direction of the guide rail, and therefore the adjustment plate of the Z-axis drive mechanism 37A. It is prevented that the support portion 37q is rotated around the Z-axis direction from the location where the support portion 37q is fixed.

  The Z-axis adjusting plate 38 is provided with a tool microscope 41 and an ultrasonic sensor 42 as shown in FIG. Although not shown, the tool microscope 41 and the ultrasonic sensor 42 are fixed to the inner peripheral edge of the central insertion hole 38a. The tool microscope 41 extends downward from the central insertion hole 38a into the central through hole 36d of the XY adjustment plate 36 and the space between the X-axis slider 35A and the X-axis slider 35B. The tool microscope 41 is a microscope used for adjusting the reference position of the Z-axis adjustment plate 38 (XY adjustment plate 36) with respect to the projection optical system of the exposure apparatus 10, and the optical axis direction is fixed through the central insertion hole 38a. In the state where the axis adjustment plate 38 is in the reference posture, it is equal to the Z-axis direction. The reference posture of the Z-axis adjustment plate 38 is a state in which the height positions of the supports by the respective Z-axis drive mechanisms 37 (adjustment plate support portions (37q, 37r, 37s)) are equal, that is, the base member 31 is used as a reference. The state along the XY plane. The tool microscope 41 has a Z-axis adjusting plate 38 (as viewed in the direction along the XY plane with respect to the projection optical system of the exposure apparatus 10 by matching the optical axis with the projection optical axis of the projection optical system of the exposure apparatus 10. The position of the XY adjustment plate 36) is arranged as a reference position. Further, the tool microscope 41 has a Z-axis adjusting plate 38 to which the chuck plate 40 is attached so that the target work 22 is aligned with the reference plane when the target work 22 is sucked and held on the chuck plate 40. It can also be used to adjust the position (height position) viewed in the Z-axis direction.

  The ultrasonic sensor 42 extends downward from the central insertion hole 38a of the Z-axis adjustment plate 38 into the central through hole 36d of the XY adjustment plate 36 and the space between the X-axis slider 35A and the X-axis slider 35B. Yes. The ultrasonic sensor 42 is provided for determining whether or not the flat target workpiece 22 is sucked and held (placed) on the chuck plate 40. The ultrasonic sensor 42 has a detection direction equal to the Z-axis direction when the Z-axis adjustment plate 38 is in the reference posture.

  As shown in FIGS. 2 and 3, a lift mechanism 39 (see FIGS. 2 and 3) is provided below the Z-axis adjusting plate 38. The lift mechanism 39 moves the target workpiece 22 (see FIG. 1) on the chuck plate 40 in the Z-axis direction (more precisely, the height direction including the Z-axis). The lift mechanism 39 includes a lift base 39a and a plurality of lift pins 39b. The lift base 39a is a frame member that is held so as to be displaceable in the Z-axis direction by a vertical drive unit (not shown). The vertical drive unit (not shown) is attached to the back surface (lower surface) of the Z-axis adjustment plate 38. For this reason, the lift base 39a is moved between the Z-axis adjustment plate 38 and the XY adjustment plate 36 by the vertical drive unit (not shown) regardless of the inclination of the Z-axis adjustment plate 38 with respect to the XY plane. A position (a position in the height direction including the Z axis) viewed in a direction orthogonal to the plate surface of the shaft adjusting plate 38 is freely displaceable. Each lift pin 39b is provided on the lift base 39a.

  Each lift pin 39b is a cylindrical member that protrudes upward in the Z-axis direction from the lift base 39a, and is capable of sucking and holding the target workpiece 22 (see FIG. 1) placed on the upper end surface. Each lift pin 39b can project upward from the chuck plate 40 through a pin insertion hole 38b provided in the Z-axis adjusting plate 38 and a pin insertion hole 40a (see FIG. 3) provided in the chuck plate 40. ing. The lift mechanism 39 sucks and holds the target work 22 (see FIG. 1) placed on the upper end surface of each lift pin 39b in a state where each lift pin 39b protrudes above the chuck plate 40, and then lifts By lowering the base 39 a and pulling each lift pin 39 b toward the chuck plate 40, the sucked and held target workpiece 22 is placed on the chuck plate 40.

  The chuck plate 40 has a plurality of suction holes 40b. Each of the suction holes 40b is capable of sucking and holding the mounted target work 22 (see FIG. 1). The suction operation by each suction hole 40b is performed under the control of a drive control unit (not shown) provided inside the mounting stage 30 together with the operation of the lift mechanism 39.

  In the mounting stage 30, the target work 22 (see FIG. 1) placed on the upper end surface of each lift pin 39 b that protrudes upward from the chuck plate 40 is sucked and held, and the target work 22 is held by the lift mechanism 39. With this operation, the operation shifts to suction holding by the chuck plate 40. Thereafter, in the mounting stage 30, the target workpiece 22 is placed at an appropriate position along the imaging plane (reference plane) of the projection optical system of the exposure apparatus 10 according to the state of the target workpiece 22 attracted and held by the chuck plate 40 ( Posture). Specifically, on the base member 31, by moving both Y-axis sliders 33 in the Y-axis direction and both X-axis sliders 35 (35A, 35B) in the X-axis direction as appropriate, the chuck plate 40, Z-axis The position and rotational attitude of the target workpiece 22 provided on the XY adjustment plate 36 along the XY plane are adjusted via the adjustment plate 38 and each Z-axis drive mechanism 37. Further, by appropriately changing the support position by each Z-axis drive mechanism 37, the position (high height) of the target workpiece 22 provided on the XY adjustment plate 36 via the chuck plate 40 and the Z-axis adjustment plate 38 is increased. Position) and tilt relative to the XY plane. As a result, the exposure apparatus 10 can appropriately expose the mask pattern image on the target workpiece 22.

  Next, with respect to the adjustment of the position and the rotation posture of the target workpiece 22 using the both Y-axis sliders 33 and the both X-axis sliders 35, that is, the XY adjustment plate 36 along the XY plane, FIGS. I will explain. FIG. 13 shows a state in which the schematic diagram in which both the X-axis slider 35 and the XY adjustment plate 36 shown in FIG. 6 are connected by the connecting portions (51, 52, 53, 54) is viewed from the upper side in the Z-axis direction. FIG. 14 is an explanatory view similar to FIG. 13, and (a) shows a state in which the X-axis slider 35 </ b> B is viewed from the front and moved to the left side (negative side in the X-axis direction). ) Shows a state in which the X-axis slider 35B is moved to the right side (positive side in the X-axis direction) when viewed from the front.

  First, consider a scene in which only the X-axis slider 35B is moved in the X-axis direction with both the Y-axis slider 33 and the X-axis slider 35A being fixed from the reference position shown in FIG. 13 (see FIG. 14). In this case, the XY adjustment plate 36 is rotated around the reference axis Ba that is the central axis of the first connecting portion 51 by the action of each connecting portion (51, 52, 53, 54) as shown in FIG. This rotational attitude is the connection state in the second connection portion 52 with respect to the connection state in the first connection portion 51, that is, the plate-side second support with respect to the reference axis Ba (the plate-side first support point Sb1 and the slider-side first support point Ss1). It is determined by the positional relationship between the point Sb2 and the slider-side second support point Ss2. This allows the first connecting portion 51 to relatively rotate the X-axis slider 35A and the XY adjusting plate 36 around the reference axis Ba, and the second connecting portion 52 allows the X-axis slider 35B and the XY adjusting plate to rotate. By allowing relative displacement in the third direction with respect to 36 and allowing relative rotation about the central axis of the coupling base portion 52a. Here, in the following description, the XY adjustment plate 36 when the third direction which is a straight line connecting the plate-side first support point Sb1 and the plate-side second support point Sb2 in the XY adjustment plate 36 is viewed on the XY plane. The rotation reference line Rm as a guide for the rotation posture of the X-axis, and the extending direction of the rotation reference line Rm (third direction) when the X-axis slider 35A and the X-axis slider 35B are set as the reference positions for drive control is the rotation reference. Let it be line Rb. In this embodiment, the rotation reference line Rb has an inclination of 45 degrees with respect to the X-axis direction (second direction) and the Y-axis direction (first direction).

  When only the X-axis slider 35B moves in the X-axis direction, the slider-side first support point Ss1 of the X-axis slider 35A moves as seen on the XY plane, as shown in FIGS. 14 (a) and 14 (b). In contrast, the slider-side second support point Ss2 of the X-axis slider 35B moves in the X-axis direction. Then, the 2nd connection part 52 is the 3rd direction on the said XY adjustment board 36 about the board side 2nd support point Sb2 fixed on the XY adjustment board 36 with respect to the slider side 2nd support point Ss2. Since the XY adjustment plate 36 is connected so as to be movable along the rotation guide line Rm, the XY adjustment plate 36 is rotated about the reference axis Ba so that the rotation guide line Rm is positioned on the moved slider-side second support point Ss2. Rotate to.

  Here, in the following description, for easy understanding, as shown in FIG. 15, each support point (Sb1, Sb2, Sb3, Sb4) on the XY adjusting plate 36 by each connecting portion (51, 52, 53, 54). ) Is a reference XY adjustment plate 36 ′. In FIG. 15, the reference axis Ba serving as the rotation center of the reference XY adjustment plate 36 ′ (XY adjustment plate 36) is the origin O, and when viewed from the front, the vertical direction is the Y axis and the upper side is the positive side, and the horizontal direction Is the X axis and the right side is the positive side, and the counterclockwise direction is the rotation direction positive side of the reference XY adjustment plate 36 '(XY adjustment plate 36) (see FIGS. 16A and 17A). Further, in the reference XY adjustment plate 36 ′, Ax is a length dimension of half of the side connecting the plate side first support point Sb1 and the plate side third support point Sb3, and the plate side first support point Sb1 and the plate side Let Ay be the length of half of the side connecting the fourth support point Sb4. Furthermore, the rotation reference angle formed by the rotation reference line Rb with respect to the Y-axis direction is θb, and the angle formed by the rotation reference line Rm with respect to the rotation reference line Rb, that is, the reference of the reference XY adjustment plate 36 ′ (XY adjustment plate 36). A rotation angle around the reference axis Ba from the posture is θr (see FIG. 16). In this embodiment, all angles are indicated in units of “° (degrees)”. Next, the movement amount in the X-axis direction of the X-axis drive mechanism 34A, that is, the X-axis slider 35A is Xm, the movement amount in the X-axis direction of the X-axis drive mechanism 34B, that is, the X-axis slider 35B is Xs, and the reference axis Ba ( The amount of movement in the Y-axis direction of the Y-axis drive mechanism 32 located on the first connecting portion 51) side is Ym, and the amount of movement of the Y-axis drive mechanism 32 located on the opposite side in the Y-axis direction is Ys. In the present embodiment, the two Y-axis drive mechanisms 32 are provided with respect to the single Y-axis slider 33 and are controlled in synchronization with each other, so that the movement amount Ys and the movement amount Ym are equal. It becomes.

  FIG. 16 shows how the X-axis slider 35B is moved from the reference position to the movement amount Xs in order to rotate the reference XY adjustment plate 36 ′ from the reference position to an arbitrary rotation angle θr. In FIG. 16, as described above, when only the X-axis slider 35B is moved in the X-axis direction, the reference XY adjustment plate 36 'is positioned so that the rotation guide line Rm is positioned on the slider-side second support point Ss2. Based on the rotation around the reference axis Ba (slider side first support point Ss1). 16A shows a state in which the X-axis slider 35B is moved to the negative side in the X-axis direction by Xs in order to rotate the reference XY adjustment plate 36 ′ to the positive side by A degrees, and FIG. The state is shown in which the X-axis slider 35B is moved to the positive side in the X-axis direction by Xs in order to rotate the XY adjustment plate 36 ′ to the negative side by A degrees. The amount of movement Xs from the reference position in the X-axis slider 35B can be expressed by the following equation (1). In Expression (1), since only the X-axis slider 35B is moved in the X-axis direction, the movement amount Xm, the movement amount Ys, and the movement amount Ym are all zero.

  By this equation (1), the X-axis slider 35B is moved relative to the X-axis slider 35A by the movement amount Xs, so that the reference XY adjustment plate 36 ′, that is, the XY adjustment plate 36 is in a state along the XY plane. Can be set to any rotation posture (posture rotated by an arbitrary rotation angle θr from the reference posture).

  Next, consider converting the center of rotation to the center position of the reference XY adjustment plate 36 '. This is because the reference XY adjustment plate 36 'moves around the reference axis Ba (slider side first support point Ss1) in a scene where only the X axis slider 35B is moved in the X axis direction. This is because it indicates a value necessary to rotate the rotation angle θr. For this reason, as shown in FIG. 17, the center position of the reference XY adjustment plate 36 ′ rotated by the rotation angle θr around the reference axis line Ba becomes the center position of the reference XY adjustment plate 36 ′ at the reference position. (Refer to arrow A2), the reference XY adjustment plate 36 ′ after rotation is moved while maintaining the rotation posture (see arrow A3). In FIG. 17, (a) shows the movement of the reference XY adjustment plate 36 'rotated A degrees to the positive side, and (b) shows the movement of the reference XY adjustment plate 36' rotated A degrees to the negative side. It shows how to do. In FIG. 17, the reference XY adjustment plate 36 ′ at the reference position is indicated by a one-dot chain line, the rotated reference XY adjustment plate 36 ′ is indicated by a solid line, and the reference XY adjustment plate 36 moved while maintaining the rotation posture. 'Is indicated by a two-dot chain line. Each movement amount Xs, Xm, Ys, Ym at this time can be expressed by the following equation (2). In this equation (2), since the reference XY adjustment plate 36 ′ according to equation (1) is moved while maintaining the rotation posture, the movement amount Xs and the movement amount Xm are equal, and the movement amount Ys is equal to the movement amount Ym.

  From this equation (2), the reference XY adjustment plate 36 ′ having an arbitrary rotation posture in equation (1) is set to the center position of the reference XY adjustment plate 36 ′ having the center position at the reference position (arrow A2), and can be displaced (see the reference XY adjustment plate 36 'indicated by the two-dot chain line and the arrow A3). For this reason, the sum of the movement amounts shown in the equations (1) and (2) is used to rotate the reference XY adjustment plate 36 ′ around the center position of the reference XY adjustment plate 36 ′ at the reference position by the rotation angle θr. Only the movement amounts Xs, Xm, Ys, and Ym necessary to rotate the image are obtained.

Next, consider converting the center of rotation to an arbitrary coordinate position (X ₀ , Y ₀ ). This is because the movement amounts shown in the expressions (1) and (2) are based on the center position of the reference XY adjustment plate 36 ′ at the reference position as the rotation center. Therefore, as shown in FIG. 18, the coordinate position (X _{0, Y 0)} is a rotational movement coordinate position by an arbitrary rotation angle θr on the positive side or negative side reference origin Ob as the center of rotation (X ₁ , Y ₁ ), a movement amount (see arrow A4) for moving from the coordinate position (X ₁ , Y ₁ ) to the coordinate position (X ₀ , Y ₀ ) is obtained. The movement amount in the X-axis direction in this movement amount (see arrow A4) becomes the movement amount Xs and the movement amount Xm, and the movement amount in the Y-axis direction becomes the movement amount Ys and the movement amount Ym. These movement amounts Xs, Xm, Ys, and Ym can be expressed by the following equation (3). In Expression (3), an angle formed by a line segment connecting the reference origin Ob and the coordinate position (X ₀ , Y ₀ ) with respect to the X axis is represented by θ ₀ .

This equation (3) is obtained by maintaining the reference XY adjustment plate 36 ′ rotated by the rotation angle θr about the reference origin Ob while maintaining the reference XY adjustment plate 36 ′ in the rotated reference XY adjustment plate 36 ′. A coordinate position (X ₁ , Y ₁ ) corresponding to an arbitrary coordinate position (X ₀ , Y ₀ ) on the reference XY adjustment plate 36 ′ (before rotation) is moved to the coordinate position (X ₀ , Y ₀ ). Become. In this equation (3), the angle θ ₀ of an arbitrary coordinate position (X ₀ , Y ₀ ) viewed from the reference origin Ob can be expressed under the following conditions.

For this reason, when the center position of the reference XY adjustment plate 36 ′ in the reference posture is regarded as the reference origin Ob, the sum of the movement amounts shown in the expressions (1), (2), and (3) is arbitrary. The movement amounts Xs, Xm, Ys, and Ym necessary for rotating the reference XY adjustment plate 36 ′ by the rotation angle θr around the coordinate position (X ₀ , Y ₀ ) are obtained. When the center position of the reference XY adjustment plate 36 ′ of the reference posture is regarded as the reference origin Ob, the reference origin Ob is the origin (X = 0, Y = 0) and the coordinates (X ₀ , Y ₀ ) and an angle θ _{0 formed} by a line segment connecting the coordinate position (X ₀ , Y ₀ ) and the reference origin Ob with respect to the X axis is obtained.

Further, when the reference axis Ba is regarded as the reference origin Ob, the sum of the movement amounts represented by the equations (1) and (3) is adjusted around the arbitrary coordinate position (X ₀ , Y ₀ ). The movement amounts Xs, Xm, Ys, and Ym necessary for rotating the plate 36 'by the rotation angle θr are obtained.

  As described above, in the mounting stage 30, the XY adjustment plate 36 can be rotated at an arbitrary rotation angle θr by appropriately moving the X-axis slider 35B with respect to the X-axis slider 35A. The rotational attitude of the XY adjustment plate 36 is set only by moving the X-axis slider 35B relative to the X-axis slider 35A by the amount of movement Xs corresponding to the arbitrary rotation angle θr calculated using Expression (1). Can do.

In addition, in the mounting stage 30, the X-axis slider 35 can be arbitrarily rotated by integrally moving both the X-axis sliders 35 in the X-axis direction and appropriately moving the Y-axis slider 33 in the Y-axis direction. 36 can be appropriately moved in the X-axis direction and the Y-axis direction while maintaining the rotation posture. At this time, the X-axis slider 35 and the Y-axis slider 33 are moved by the respective movement amounts Xs, Xm, Ys, and Ym corresponding to the arbitrary rotation angle θr calculated using the expression (2), so that the reference position is reached. A certain XY adjustment plate 36 can be rotated by an arbitrary rotation angle θr around its center position. Further, both the X-axis slider 35 and the Y-axis slider are moved by the respective movement amounts Xs, Xm, Ys, Ym corresponding to the arbitrary rotation angle θr calculated using the expressions (2) and (3) or the expression (3). By moving 33, the XY adjustment plate 36 at the reference position can be rotated about an arbitrary coordinate position (X ₀ , Y ₀ ) by an arbitrary rotation angle θr.

  In the present embodiment, as described above, the support points (Sb1, Sb2, Sb3, Sb4) on the XY adjustment plate 36 are in a positional relationship that forms a square (reference XY adjustment plate 36 '), and the length of one side thereof. The dimension is 430 mm. Therefore, the length dimension Ax = the length dimension Ay = 215 mm, and the rotation reference angle θb = 45 degrees. Therefore, an expression for adjusting the rotational attitude of the XY adjustment plate 36 (reference XY adjustment plate 36 ′) using both the Y-axis slider 33 and the both X-axis sliders 35 in the state along the XY plane ( 1) can be expressed by the following formula (1 ′).

  Moreover, Formula (2) can be represented by following Formula (2 ').

Note that the condition of equation (3) and its angle θ ₀ is as described above because it is indicated by the coordinate position (X ₀ , Y ₀ ) with the rotation center as the origin and its angle θ ₀ .

  Thus, in the mounting stage 30 (exposure apparatus 10) according to the present invention, the Y-axis slider 33 is provided on the base member 31 so as to be movable in the Y-axis direction (first direction) by the Y-axis drive mechanism 32, Two X-axis sliders 35 are provided on the Y-axis slider 33 so as to be movable in the X-axis direction (second direction) by two X-axis drive mechanisms 34B spaced apart in the Y-axis direction. An XY adjustment plate 36 (planar adjustment plate) is provided so as to be bridged in the axial direction. Therefore, the rotational posture of the XY adjustment plate 36 can be set by the relative positions of the X-axis slider 35A and the X-axis slider 35B in the X-axis direction, and the X-axis slider 35A and the X-axis slider 35B By driving and controlling both the X-axis sliders 35 while maintaining the relative positional relationship, the XY adjustment plate 36 can be moved in the X-axis direction while maintaining the rotational posture of the XY adjustment plate 36. By moving the Y-axis slider 33 in the Y-axis direction, the XY adjustment plate 36 can be moved in the Y-axis direction while maintaining the rotational posture of the XY adjustment plate 36 regardless of the position in the X-axis direction. Therefore, a mechanism for adjusting the position of the XY adjustment plate 36 in the Y-axis direction (first direction) and a mechanism for adjusting the position of the XY adjustment plate 36 in the X-axis direction (second direction) are two. With one configuration, it is possible to form a rotation drive mechanism that can set the rotation posture of the XY adjustment plate 36 without affecting the respective position adjustments. As described above, the position in the X-axis direction and the position in the Y-axis direction on the XY adjustment plate 36 can be individually adjusted without being affected by the change in the rotation posture of the XY adjustment plate 36, so that XY Regardless of the rotation posture of the adjustment plate 36, the position of the XY adjustment plate 36, that is, the target workpiece 22 on the XY plane can be adjusted by the same control method. Therefore, despite the simple configuration and simple position / orientation control, the position and rotational attitude of the XY adjustment plate 36, that is, the target workpiece 22 on the XY plane can be set with extremely high accuracy.

  Further, in the mounting stage 30 (exposure apparatus 10), an X-axis drive mechanism is provided above the Y-axis drive mechanism, and the X-axis drive mechanism also functions as a rotational drive mechanism. In addition, an increase in height dimension (size dimension viewed in the Z-axis direction) can be suppressed.

  Further, in the mounting stage 30 (exposure apparatus 10), the X-axis slider 35B is moved relative to the X-axis slider 35A by the movement amount Xs obtained by the equation (1), whereby the XY adjustment plate 36 (reference XY adjustment plate). 36 ') can be set to an arbitrary rotational posture (posture rotated by an arbitrary rotational angle θr from the reference posture) in a state along the XY plane, and thereafter expressed by Equation (2) and Equation (3). As described above, an arbitrary coordinate position can be set as the rotation center of the XY adjustment plate 36 by appropriately moving in the X axis direction and the Y axis direction. For this reason, the XY adjustment plate 36, that is, the target work 22 can be set to an arbitrary rotation posture with an arbitrary coordinate position along the XY plane as a rotation center by simple control.

  In the mounting stage 30 (exposure apparatus 10), the X-axis slider 35A and the XY adjustment plate 36 are coupled by a first coupling portion 51 that allows relative rotation around the reference axis Ba, and also the X-axis slider 35B. And the XY adjustment plate 36 are coupled by the second coupling portion 52 that allows relative displacement in the third direction and allows relative rotation around the central axis of the coupling base portion 52a. The positional relationship between the plate-side second support point Sb2 and the slider-side second support point Ss2 with respect to the reference axis Ba can be made to correspond one-to-one with the rotational posture of the XY adjustment plate 36. Therefore, in spite of a simple configuration, the rotational posture of the XY adjustment plate 36, that is, the target workpiece 22 can be set with high accuracy by appropriately moving the X-axis slider 35B with respect to the X-axis slider 35A. it can.

  In the mounting stage 30 (exposure apparatus 10), the second connecting portion 52 extends along the third direction along the plate-side second support point Sb2 of the XY adjustment plate 36 with respect to the slider-side second support point Ss2 of the X-axis slider 35B. The third direction is a rotation guide line Rm that is a direction from the plate-side second support point Sb2 to the plate-side first support point Sb1 on the XY adjustment plate 36. Therefore, the XY adjustment plate 36 can be rotated around the reference axis Ba so that the rotation guide line Rm is positioned on the moved slider-side second support point Ss2. Therefore, it is possible to easily set the movement amount Xs of the X-axis slider 35B with respect to the X-axis slider 35A when setting the rotation posture of the XY adjustment plate 36, that is, the target workpiece 22.

  In the mounting stage 30 (exposure apparatus 10), the first connecting portion 51 is configured to allow the X-axis slider 35A and the XY adjustment plate 36 to rotate relative to each other around the reference axis Ba, and the second connection. Since the portion 52 allows the relative displacement of the X-axis slider 35B and the XY adjustment plate 36 in the third direction and allows the relative rotation around the central axis of the coupling base portion 52a, the configuration is simple. In spite of the simple configuration, the rotational posture of the XY adjustment plate 36, that is, the target workpiece 22 can be set with extremely high accuracy only by setting the position of the X-axis slider 35B in the X-axis direction relative to the X-axis slider 35A. it can.

  In the mounting stage 30 (exposure apparatus 10), the first direction, which is the moving direction of the Y-axis slider 33, and the second direction, which is the moving direction of both X-axis sliders 35, are orthogonal to each other. The position and rotation posture of the XY adjustment plate 36, that is, the target workpiece 22 can be set well.

  In the mounting stage 30 (exposure apparatus 10), the plate-side first support point Sb1 and the slider-side first support point Ss1 in the first connecting portion 51, and the second X-axis slider 35 are in the reference position. Since the extending direction of the line segment connecting the plate-side second support point Sb2 and the slider-side second support point Ss2 in the connecting portion 52 is inclined in each of the first direction and the second direction, XY adjustment is performed. The X-axis slider 35B can be smoothly moved relative to the X-axis slider 35A regardless of the rotation direction of the plate 36, that is, the target workpiece 22. In particular, in the present embodiment, since the extending direction of the above-described line segment is inclined 45 degrees with respect to each of the first direction and the second direction, the influence due to the difference in the rotation direction of the target workpiece 22 is affected. It can be very small.

  In the mounting stage 30 (exposure apparatus 10), each Z-axis drive mechanism 37 passes above the XY adjustment plate 36 via the support portion insertion holes (36a, 36b, 36c) of the XY adjustment plate 36 (planar adjustment plate). The protruding adjustment plate support portions (37q, 37r, 37s) are configured such that the drive main body portions (37a to 37n) advance and retract in the fourth direction (Z-axis direction) with respect to the XY adjustment plate 36, respectively. The drive main body portions (37a to 37n) are provided on the back surface side of the XY adjustment plate 36, and a part of the lower part is positioned in a space between the X-axis slider 35A and the X-axis slider 35B. For this reason, an increase in the height dimension (size dimension viewed in the Z-axis direction) can be suppressed. This is because each Z-axis drive mechanism 37 has a Z-axis adjustment plate 38 (fourth direction adjustment plate) disposed above the XY adjustment plate 36 in the fourth direction (Z-axis direction) with respect to the XY adjustment plate 36. Since the position and the inclination with respect to the fourth direction (inclination with respect to the XY plane) are changed, it is generally provided above the XY adjustment plate 36. In particular, in this embodiment, the other portions of the drive main body portions (37a to 37n) adjust the position and rotational posture of the XY adjustment plate 36 along the XY plane when viewed in the Z-axis direction (fourth direction). Since each of the connecting portions (51, 52, 53, 54) for connecting the Y-axis slider 33 and the two X-axis sliders 35 is disposed at a position where the Z-axis drive mechanism 37 is provided, The increase in the height dimension (size dimension seen in the Z-axis direction) due to the provision of can be significantly suppressed.

  In the mounting stage 30 (exposure apparatus 10), each Z-axis drive mechanism 37 has a fourth direction relative to the XY adjustment plate 36 of a Z-axis adjustment plate 38 (fourth direction adjustment plate) disposed above the XY adjustment plate 36. The function of setting the position in the (Z-axis direction) and the function of setting the inclination of the Z-axis adjustment plate 38 (fourth direction adjustment plate) with respect to the fourth direction (inclination relative to the XY plane) Therefore, the height dimension (size dimension as viewed in the Z-axis direction) can be significantly suppressed as compared with the case where the configuration for each function is individually provided.

  In the mounting stage 30 (exposure apparatus 10), a mechanism for adjusting the position of the XY adjustment plate 36 in the Y-axis direction (first direction) and a position adjustment of the XY adjustment plate 36 in the X-axis direction (second direction). The function of adjusting the position of the XY adjustment plate 36 in the Y-axis direction (first direction) and the function of adjusting the position of the XY adjustment plate 36 in the X-axis direction (second direction) And the function for setting the rotational attitude of the XY adjustment plate 36, and the Z-axis direction of the Z-axis adjustment plate 38 with respect to the XY adjustment plate 36 in each Z-axis drive mechanism 37 having a single configuration. And the function of setting the inclination of the Z-axis adjusting plate 38 with respect to the fourth direction, and each Z-axis drive mechanism 37 is viewed in the Z-axis direction in the X-axis direction (first It is extremely small because it is configured to overlap with the mechanism for position adjustment in two directions. In configuration (size dimension) can comprise five functions.

  In the mounting stage 30 (exposure apparatus 10), the Z-axis adjustment plate 38 is rotatably supported by the adjustment plate support portion 37q of the Z-axis drive mechanism 37A, and is guided by the adjustment plate support portion 37r of the Z-axis drive mechanism 37B. Since only the displacement in the extending direction of the rail is allowed and supported, and further supported by the adjustment plate support portion 37s of the Z-axis drive mechanism 37C, the adjustment plate support portion 37q of the Z-axis drive mechanism 37A is supported. It is prevented from rotating around the Z-axis direction from the place where the is fixed as a base point. For this reason, the position in the state along the XY plane set in the XY adjustment plate 36 by appropriately changing the support height position (support position seen in the Z-axis direction) by each Z-axis drive mechanism 37 and The position in the fourth direction (Z-axis direction) of the Z-axis adjusting plate 38, that is, the target workpiece 22 and the inclination with respect to the fourth direction (inclination with respect to the XY plane) can be set without causing a change in the rotation posture. .

  In the mounting stage 30 (exposure apparatus 10), the lift base 39a of the lift mechanism 39 is below the Z-axis adjustment plate 38 (fourth direction adjustment plate), and the adjustment plate support portions (37q, 37r, 37s) is disposed in a space between the Z-axis adjusting plate 38 and the XY adjusting plate 36 (planar adjusting plate) and is movable in the Z-axis direction (fourth direction) in the space. Therefore, an increase in height dimension (size dimension seen in the Z-axis direction) due to the provision of the lift mechanism 39 can be significantly suppressed.

  In the mounting stage 30 (exposure apparatus 10), the X-axis drive mechanism 34 and the X-axis slider 35 for setting the position and rotation posture of the target work 22 (XY adjustment plate 36) along the XY plane are arranged in the Y-axis. An XY adjustment plate 36 (planar adjustment plate) is provided on both ends of the upper surface of the slider 33 as viewed in the Y-axis direction and so as to bridge both the X-axis sliders 35 in the Y-axis direction. Therefore, a space having a substantially constant capacity can be formed between the X-axis sliders 35 under the XY adjustment plate 36 regardless of the movement of the X-axis sliders 35. For this reason, since the said space can be utilized as arrangement | positioning space, the increase in a size dimension can be suppressed. For example, in the mounting stage 30 (exposure apparatus 10), since the central insertion hole 38a is provided in the Z-axis adjustment plate 38 and the central through hole 36d is provided in the XY adjustment plate 36, the placement stage 30 (exposure apparatus 10) is mounted on the Z-axis adjustment plate 38. A tool microscope 41 for setting a position in the projection optical system of the exposure apparatus 10 with respect to the chuck plate 40 to be placed, that is, the target workpiece 22 attracted and held therein, is disposed in a space formed between both X-axis sliders 35. Can do. In the mounting stage 30 (exposure apparatus 10), since the central insertion hole 38a is provided in the Z-axis adjustment plate 38 and the central through hole 36d is provided in the XY adjustment plate 36, the placement stage 30 (exposure apparatus 10) is mounted on the Z-axis adjustment plate 38. An ultrasonic sensor 42 for determining whether or not the target workpiece 22 is placed on the chuck plate 40 placed on the chuck plate 40 can be placed in a space formed between both X-axis sliders 35.

  In the mounting stage 30 (exposure apparatus 10), since the ultrasonic sensor 42 is used to determine whether or not the target work 22 is mounted on the chuck plate 40, the height on the chuck plate 40 is high. Regardless of the position (position viewed in the Z-axis direction), the presence or absence of the target workpiece 22 can be detected.

  In the exposure apparatus 10, since the position and rotation posture of the target workpiece 22 are set with extremely high accuracy on the mounting stage 30, the mask pattern image can be appropriately exposed on the target workpiece 22.

  Therefore, with the mounting stage 30 (exposure apparatus 10) according to the present invention, the position and orientation of the target workpiece 22 can be controlled with extremely high accuracy with a simple configuration.

  In the above-described embodiment, the mounting stage 30 as an example of the mounting stage according to the present invention has been described. However, the position of the target workpiece with respect to the reference plane on which the exposure light is imaged and the predetermined mask pattern is exposed. And a mounting stage for controlling the attitude, the base member being fixedly provided with respect to the reference plane, and the first provided on the base member movably in a first direction along the reference plane A drive mechanism; a first slider supported by the first drive mechanism; and the first slider on the first slider so as to be movable in a second direction along the reference plane and inclined with respect to the first direction. Two second drive mechanisms provided in pairs at intervals in the direction, two second sliders individually supported by each of the second drive mechanisms, and the above-described target workpiece to be placed thereon Both second sly A planar adjustment plate disposed along said reference plane spanned the first direction may be a mounting stage provided with, but is not limited to the aforementioned embodiments.

  In the above-described embodiment, the first connecting portion 51 and the second connecting portion 52 are configured as described above. However, the first connecting portion allows the relative rotation around the reference axis Ba to be X. The shaft slider 35A and the XY adjustment plate 36 are connected, and the second connecting portion allows relative displacement in the third direction and allows relative rotation around the central axis of the connecting base portion 52a. What is necessary is just to connect the X-axis slider 35B and the XY adjustment plate 36 while allowing, and is not limited to the above-described embodiment.

  Further, in the above-described embodiment, the third connecting portion 53 and the fourth connecting portion 54 are provided, but these are provided to stably support the XY adjusting plate 36 above both the X-axis sliders 35. Therefore, the X-Y without changing the distance in the Z-axis direction between the support points (Ss3, Ss4) on the X-axis slider 35 side with respect to the support points (Sb3, Sb4) on the XY adjustment plate 36 side. It is only necessary to allow variation of the position in the direction, and is not limited to the above-described embodiment. Therefore, if the first connecting portion 51 and the second connecting portion 52 can stably support the XY adjustment plate 36 above both the X-axis sliders 35, the third connecting portion 53 and the second connecting portion 53 can be used. The four connecting portions 54 may not be provided.

  In the above-described embodiment, the third direction in the second connecting portion 52 is the direction (rotation guideline Rm) from the plate-side second support point Sb2 to the plate-side first support point Sb1 on the XY adjustment plate 36. However, the XY adjustment plate 36 only needs to be able to set the rotational attitude of the XY adjustment plate 36 based on the relative positions of the X-axis slider 35A and the X-axis slider 35B in the X-axis direction. Any direction that does not fluctuate with respect to the positional relationship between the support points (Sb1, Sb2, Sb3, Sb4) in the above, or a certain direction that does not fluctuate on the X-axis slider 35B, and is described above. The present invention is not limited to the examples. An example different from the embodiment will be described below with reference to FIGS. 19 and 20. In this example, in a state where both X-axis drive mechanisms 34 are set to the reference positions for drive control, the slider-side second support point Ss2 of the X-axis slider 35B is changed to the slider-side first support point Ss1 of the X-axis slider 35A. The direction to go is the third direction. In this case, for example, instead of the second connecting portion 52 (see FIG. 8), a second connecting portion 52 ′ shown in FIG. 19 may be used. The second connecting portion 52 'includes a connecting base portion 52a' fixed to the X-axis slider 35B and extending in the Z-axis direction, a rail holding portion 52b 'fixed to the upper end surface thereof, and the rail holding portion 52b. A rail 52c ′ that is slidably held on the rotating shaft portion 52 ′, a rotating shaft portion 52d ′ fixed to the rail 52c ′, and a rotating portion 52e ′ that is rotatably provided to the rotating shaft portion 52d ′. Have The connecting base portion 52a ′ has a stepped cylindrical shape as a whole, and its central axis is along the Z-axis direction. The rail holding portion 52b ′ is a rail that is slidable in a third direction inclined along the X-axis direction (second direction) and the Y-axis direction (first direction) along the XY plane. 52c 'can be held. The rail 52c ′ has a rod shape extending in the third direction, and is fixed to the rotation shaft portion 52d ′. The entire rotation shaft portion 52d ′ has a cylindrical shape, and is fixed to the rail 52c ′ so that the center axis is along the Z-axis direction. The rotating portion 52e ′ has an annular shape surrounding the rotating shaft portion 52d ′, and is rotatable about the central axis of the rotating shaft portion 52d ′ with respect to the rotating shaft portion 52d ′. In the second connecting portion 52 ′, the rotating portion 52 e ′ is fixedly attached to the XY adjustment plate 36. For this reason, the extending direction of the rail 52c ′ is fixed with respect to the X-axis slider 35B. In this example, the extending direction of the rail 52c ′, that is, the third direction is determined from the slider-side second support point Ss2 of the X-axis slider 35B in a state where both the X-axis drive mechanisms 34 are set as the reference positions for drive control. The direction is toward the slider-side first support point Ss1 of the X-axis slider 35A, and is aligned with the square diagonal line drawn by each support point (Ss1, Ss2, Ss3, Ss4). For this reason, according to the setting of the above-described embodiment, the third direction always has an inclination of 45 degrees with respect to the X-axis direction (second direction) and the Y-axis direction (first direction). In the case of such a configuration, it is necessary to change the control expression (1) of the above-described embodiment to the following expression (4).

  In addition, as in the above-described embodiment, each support point (Sb1, Sb2, Sb3, Sb4) on the XY adjustment plate 36 is in a positional relationship that forms a square (reference XY adjustment plate 36 '), and the length of one side Assuming that the height dimension is 430 mm, the length dimension Ax = the length dimension Ay = 215 mm, and the rotation reference angle θb = 45 degrees. Therefore, an expression for adjusting the rotational attitude of the XY adjustment plate 36 (reference XY adjustment plate 36 ′) using both the Y-axis slider 33 and the both X-axis sliders 35 in the state along the XY plane ( 4) can be expressed by the following equation (4 ′).

  Even in the configuration of this example, the configuration is basically the same as that of the mounting stage 30 (exposure apparatus 10) of the above-described embodiment, and thus basically the same effect as that of the above-described embodiment can be obtained. it can.

  In addition, the second connecting portion 52 'connects the plate-side second support point Sb2 of the XY adjustment plate 36 so as to be movable along the third direction with respect to the slider-side second support point Ss2 of the X-axis slider 35B. In the state where the X direction drive mechanism 34 is the reference position for drive control in the third direction, the slider side first support point Ss2 of the X axis slider 35B starts from the slider side first point of the X axis slider 35A. Since the direction is toward the support point Ss1, the XY adjustment plate 36 is used as a reference so that the plate-side second support point Sb2 is positioned in the third direction including the moved slider-side second support point Ss2. It can be rotated around the axis Ba. Therefore, it is possible to easily set the movement amount Xs of the X-axis slider 35B with respect to the X-axis slider 35A when setting the rotation posture of the XY adjustment plate 36, that is, the target workpiece 22.

  As described above, the mounting stage of the present invention and the exposure apparatus using the same have been described based on the embodiments. However, the specific configuration is not limited to the embodiments and is not deviated from the gist of the present invention. Design changes and additions are allowed.

DESCRIPTION OF SYMBOLS 10 Exposure apparatus 22 Target work 30 Placement stage 31 Base member 32 Y-axis drive mechanism 33 (as a 1st drive mechanism) Y-axis slider 34 (as a 1st slider) 34 X-axis drive mechanism (as a 2nd drive mechanism) 35 X-axis slider 36 (as a flat adjustment plate) XY adjustment plate 37 (as a fourth direction drive mechanism) Z-axis drive mechanism 37q (as a first support portion) adjustment plate support portion 37r Adjustment plate support portion 37s (as the third support portion) Adjustment plate support portion 38 (as the third support portion) Z-axis adjustment plate 51 (as the fourth direction adjustment plate) 51 First connecting portion 52, 52 ′ Second Connecting portion Ba Reference axis Sb1 Plate side first support point Sb2 Plate side second support point Ss1 Slider side first support point Ss2 Slider side second support point

Claims (11)

A mounting stage that controls the position and orientation of a target workpiece with which exposure light is imaged and a predetermined mask pattern is exposed with respect to a reference plane;
A base member fixedly provided with respect to the reference plane;
A first drive mechanism provided on the base member so as to be movable in a first direction along the reference plane;
A first slider supported by the first drive mechanism;
Two second lines provided in pairs on the first slider at intervals in the first direction so as to be movable in a second direction inclined along the reference plane and with respect to the first direction. A drive mechanism;
Two second sliders individually supported by each second drive mechanism;
A mounting stage, comprising: a plane adjusting plate that is provided along the reference plane so as to bridge both the second sliders in the first direction so as to mount the target workpiece. One end of the plane adjustment plate and one of the second sliders is connected to the plane adjustment plate at a plate side first support point, and the other end is connected to one of the second sliders at a slider side first support point. Preferably, the first connection part extending in a direction perpendicular to the reference plane is connected,
The first connecting portion includes the plate-side first support point and the slider-side first support point without changing the positional relationship between the plate-side first support point and the slider-side first support point. Allowing relative rotation between the plane adjusting plate and one of the second sliders around an axis;
The flat adjustment plate and the other second slider have one end connected to the flat adjustment plate at a plate-side second support point and the other end connected to the other second slider at a slider-side second support point. Preferably, connected by a second connecting portion extending in a direction perpendicular to the reference plane,
The second connecting portion allows a relative position change between the plate-side second support point and the slider-side second support point in a third direction along the reference plane, and is orthogonal to the reference plane. 2. The mounting stage according to claim 1, wherein relative rotation between the planar adjustment plate and the other second slider around the direction of movement is allowed.   The mounting stage according to claim 1, wherein the third direction is inclined with respect to each of the first direction and the second direction.   The mounting stage according to any one of claims 1 to 3, wherein the first direction and the second direction are orthogonal to each other.   The plate-side first support point and the plate-side second support point are the first direction and the second direction when the second sliders are set to a reference position that is a reference for movement in the second direction. The mounting stage according to claim 4, wherein the mounting stage is positioned on a straight line inclined with respect to each direction.   The mounting stage according to claim 5, wherein the third direction is an extending direction of a line segment connecting the plate-side first support point and the plate-side second support point.   The third direction is a line segment connecting the slider-side first support point and the slider-side second support point when the second sliders are at a reference position serving as a reference for movement in the second direction. The mounting stage according to claim 5, wherein the mounting stage is in the extending direction.   The plate-side first support point and the plate-side second support point are such that, when the second sliders are set to the reference position, the extending direction of the line segment connecting each other is the first direction and the second direction. The mounting stage according to any one of claims 5 to 7, wherein an inclination of 45 degrees is made with respect to each of the directions. The mounting stage according to any one of claims 1 to 8,
A fourth direction adjustment plate provided on the plane adjustment plate for changing the position of the target workpiece in a fourth direction orthogonal to the reference plane and the inclination with respect to the fourth direction;
A fourth direction drive mechanism for changing the position of the fourth direction adjustment plate in the fourth direction and the inclination with respect to the fourth direction;
The fourth direction drive mechanism has at least three support portions that support the fourth direction adjustment plate, and a drive main body portion that moves the support portions in the fourth direction.
The drive main body is provided on the lower side of the plane adjustment plate while at least a part is positioned between the first slider and the second slider,
Each of the support portions is connected to the drive main body portion below the planar adjustment plate as viewed in the fourth direction, and supports the fourth direction adjustment plate above the planar adjustment plate. A characteristic mounting stage. Each of the support portions includes a first support portion that supports a support angle with respect to the fourth direction adjustment plate in a changeable manner without changing a support position with respect to the fourth direction adjustment plate.
A second support portion that supports a support position with respect to the fourth direction adjustment plate so as to be changeable in a line segment direction with respect to a support position by the first support portion, and a support angle with respect to the fourth direction adjustment plate is changeable;
10. The mounting according to claim 9, further comprising: a third support portion that supports a support position with respect to the fourth direction adjustment plate so as to be changeable and a support angle with respect to the fourth direction adjustment plate is changeable. Place stage. An exposure apparatus using the mounting stage according to any one of claims 1 to 10.