JP2012061424A - Automatic liquid supply mechanism and coating equipment including the same - Google Patents

Automatic liquid supply mechanism and coating equipment including the same Download PDF

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JP2012061424A
JP2012061424A JP2010207775A JP2010207775A JP2012061424A JP 2012061424 A JP2012061424 A JP 2012061424A JP 2010207775 A JP2010207775 A JP 2010207775A JP 2010207775 A JP2010207775 A JP 2010207775A JP 2012061424 A JP2012061424 A JP 2012061424A
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liquid
supply
liquid material
receiving
unit
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JP5566829B2 (en
JP2012061424A5 (en
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Kazumasa Ikushima
和正 生島
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Musashi Engineering Co Ltd
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Musashi Engineering Co Ltd
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Priority to JP2010207775A priority Critical patent/JP5566829B2/en
Priority to PCT/JP2011/070920 priority patent/WO2012036179A1/en
Priority to CN201180042922.3A priority patent/CN103118802B/en
Priority to KR1020137006402A priority patent/KR101795612B1/en
Priority to TW100133333A priority patent/TWI573628B/en
Publication of JP2012061424A publication Critical patent/JP2012061424A/en
Publication of JP2012061424A5 publication Critical patent/JP2012061424A5/ja
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D19/00Degasification of liquids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1341Filling or closing of cells

Abstract

PROBLEM TO BE SOLVED: To provide an automatic liquid supply mechanism eliminating the need to make a liquid material storage portion and a discharging device physically connect with each other and capable of effectively preventing generation and mixing of particles, and coating equipment including the automatic liquid supply mechanism.SOLUTION: The automatic liquid supply mechanism includes: the liquid storage portion storing a liquid material; a supply portion having a supply port supplying the liquid material stored in the liquid storage portion; a receiving portion having a receiving port receiving the liquid material discharged from the supply portion and a bubble removing mechanism; and a receiving portion driving device driving the receiving portion. The receiving portion moves to a receiving position in which the receiving port is located immediately below the supply port, receives the liquid material supplied in drops from the supply port, and supplies the liquid material from which bubbles have been removed by the bubble removing mechanism to the discharging device. The coating equipment includes the automatic liquid supply mechanism.

Description

液体中に気泡やパーティクルが混入することを防止することができる液体自動供給機構およびこれを備える塗布装置に関する。   The present invention relates to an automatic liquid supply mechanism that can prevent bubbles and particles from being mixed in a liquid, and a coating apparatus including the same.

液晶ディスプレイを製造する工程の中に、二枚の対向する基板を貼り合わせてその間に液晶層を形成するパネル工程(セル工程ともいう)がある。特に、大型のパネルを製造するに際して、貼り合わせる前の一方の基板に液晶を滴下してから貼り合わせる滴下注入法が行われている。
滴下注入法では、液晶を基板に滴下するのに、液晶を貯留する容器を有し、この容器に設けられたノズルから気体圧力または機械的圧力の作用により所定量ずつ吐出を行うディスペンサという装置が用いられている。
Among the processes for manufacturing a liquid crystal display, there is a panel process (also referred to as a cell process) in which two opposing substrates are bonded together to form a liquid crystal layer therebetween. In particular, when manufacturing a large panel, a dropping injection method in which a liquid crystal is dropped on one substrate before being bonded and then bonded is performed.
In the dropping injection method, there is a device called a dispenser that has a container for storing liquid crystal and that discharges liquid crystal by a predetermined amount from a nozzle provided in the container by the action of gas pressure or mechanical pressure. It is used.

近年、液晶ディスプレイが大型化するのに伴い、その元となる基板も大型化している。基板が大型化すると、液晶の使用量も増加するため、従来からディスペンサで用いられているような小さな貯留容器(シリンジ)では対応が難しくなってきている。なぜならば、小さな貯留容器ではすぐに液晶が無くなってしまい、容器等の交換が頻繁になるために、生産性、作業性の面で効率が低下してしまうためである。また、貯留容器を交換する際には、気泡や異物(以下、パーティクルという)が混入するおそれもある。
これに対し、装置外に大型のタンクを設置し、そこから液体材料を供給することで、これらの問題を解決しようとする試みが種々なされている。
In recent years, as liquid crystal displays have become larger, the substrates that serve as the basis have also become larger. As the size of the substrate increases, the amount of liquid crystal used also increases, making it difficult to deal with small storage containers (syringes) conventionally used in dispensers. This is because the liquid crystal is quickly lost in a small storage container, and the container and the like are frequently replaced, so that the efficiency is lowered in terms of productivity and workability. Further, when the storage container is replaced, there is a possibility that bubbles or foreign substances (hereinafter referred to as particles) may be mixed.
On the other hand, various attempts have been made to solve these problems by installing a large tank outside the apparatus and supplying a liquid material therefrom.

例えば、特許文献1では、装置本体と、ワークを載置可能な載置部と、ワークに対して液滴を吐出する複数の液滴吐出ヘッドを有するヘッドユニットと、ヘッドユニットを支持するヘッドユニット支持体と、ワーク載置部とヘッドユニット支持体とを相対的に移動させる移動機構と、各液滴吐出ヘッドから吐出する吐出液を貯留し、交換および/または吐出液の補充が可能な少なくとも1つの一次タンクを有する一次タンク系と、ヘッドユニット支持体に対し固定的に設置され、一次タンクから吐出液が流入する二次タンクと、一次タンク系と二次タンクとを接続し、一次タンク系から二次タンクに吐出液を供給する一次流路と、二次タンクとヘッドユニットとを接続し、二次タンクから各液滴吐出ヘッドにそれぞれ吐出液を供給する複数本の二次流路とを備え、一次流路の本数が二次流路の本数より少ないことを特徴とする液滴吐出装置、が開示されている。   For example, in Patent Literature 1, an apparatus main body, a placement unit on which a workpiece can be placed, a head unit having a plurality of droplet ejection heads that eject droplets onto the workpiece, and a head unit that supports the head unit A support mechanism, a moving mechanism that relatively moves the workpiece placement unit and the head unit support body, and a discharge liquid discharged from each droplet discharge head is stored, and can be exchanged and / or replenished with the discharge liquid. A primary tank system having one primary tank, a secondary tank that is fixedly attached to the head unit support, and in which discharge liquid flows from the primary tank, and the primary tank system and the secondary tank are connected to each other. A primary flow path for supplying discharge liquid from the system to the secondary tank, and a plurality of pipes for connecting the secondary tank and the head unit and supplying discharge liquid from the secondary tank to each droplet discharge head, respectively. And a secondary channel, the droplet discharge device, wherein, there is disclosed that the number of the primary flow path is less than the number of the secondary flow path.

また、特許文献2では、基板が位置されるステージと、基板に液晶を滴下または塗布できるようにシリンジ及びノズルが備えられたディスペンサーヘッドと、ステージの周辺に備わってディスペンサーヘッドを支持するヘッド支持部材と、ディスペンサーヘッドのシリンジに基板に滴下または塗布する液晶を供給する供給ラインと、ディスペンサーヘッドのシリンジに連結される需給ラインと、供給ラインと需給ラインとの接続部で何れか一方側に備わって、それらラインが互いに連結または分離される時に異質物が流入することを防止する異質物防止キャップと、を含んで、ヘッド支持部材及びディスペンサーヘッドがステージの上部から離れて供給ラインが位置する側に移動することによって、需給ラインが供給ラインに連結されて液晶供給器からシリンジに液晶を充填できるように構成されたことを特徴とする液晶滴下装置、が開示されている。   In Patent Document 2, a stage on which a substrate is positioned, a dispenser head provided with a syringe and a nozzle so that liquid crystal can be dropped or applied to the substrate, and a head support member provided around the stage to support the dispenser head A supply line for supplying liquid crystal to be dropped or applied to the substrate on the syringe of the dispenser head, a supply / demand line connected to the syringe of the dispenser head, and a connection part between the supply line and the supply / demand line. A foreign matter prevention cap for preventing foreign matters from flowing in when the lines are connected to or separated from each other, and the head support member and the dispenser head are separated from the upper part of the stage on the side where the supply line is located. By moving, the supply and demand line is connected to the supply line and the liquid crystal Liquid crystal dispensing apparatus characterized by being configured to fill the liquid crystal into the syringe from the sheet unit, is disclosed.

特開2004−167430号公報JP 2004-167430 A 特開2009−172585号公報JP 2009-172585 A

しかしながら、文献1の装置では、液体供給流路(チューブ)がタンクからヘッドまでつながっているので、液体中に気泡やパーティクルは混入しにくい反面、ヘッドが相対移動する際にチューブも一緒に動くので、移動範囲を見越してチューブを長くし、余裕を持たせて配設してやらなければならなかった。また、ヘッドが相対移動する際にチューブも一緒に動くことは、チューブの劣化が早まる原因にもなっていた。   However, in the apparatus of Document 1, since the liquid supply flow path (tube) is connected from the tank to the head, bubbles and particles are not likely to be mixed in the liquid, but the tube moves together when the head moves relatively. In view of the moving range, the tube must be lengthened and arranged with a margin. In addition, the movement of the tube together with the relative movement of the head has also caused a rapid deterioration of the tube.

また、文献2の装置では、配管の途中で分離・連結できるように構成されているので、液体供給流路(チューブ)に関する上記の問題がない反面、連結部で接触する機構となっているために、この部分で擦れてパーティクル発生の原因となるという課題があった。加えて、異質物防止キャップを構成しているヒンジやカムなどの部品自体が動作部分で擦れることもパーティクル発生の原因となっていた。
さらに、文献2の装置では、連結部において、液体を上から直接シリンジに注入する機構となっているので、上から注がれる液体が下にたまっている液体の液面を叩き、このとき気泡が混入してしまうという課題があった。
In addition, since the apparatus of Document 2 is configured so that it can be separated and connected in the middle of the piping, there is no problem with the liquid supply flow path (tube), but it is a mechanism that makes contact at the connecting portion. In addition, there is a problem that it is rubbed at this portion and causes generation of particles. In addition, the parts such as hinges and cams constituting the foreign matter prevention cap are rubbed by the moving parts, which causes the generation of particles.
Furthermore, in the apparatus of Document 2, since the liquid is poured directly from above into the syringe at the connecting portion, the liquid poured from above is tapped against the liquid surface, and at this time, the bubbles There was a problem of mixing.

そこで本発明は、上記課題を解決する液体自動供給機構およびこれを備える塗布装置を提供することを目的とする。   Then, an object of this invention is to provide the liquid automatic supply mechanism which solves the said subject, and a coating device provided with the same.

発明者は、液体材料貯留部と吐出装置を一時的または常時物理的に接続することよる弊害を解消すべく、液体材料貯留部と吐出装置を常時分離させる構成を採用した。さらに、液体材料貯留部と吐出装置を常時分離させることにより生じる気泡の弊害を解消する気泡除去機構を設けることにより、吐出装置へ気泡が流入することがない液体自動供給機構およびこれを備える塗布装置を提供することを可能とした。   The inventor has adopted a configuration in which the liquid material storage unit and the discharge device are always separated in order to eliminate the adverse effects of temporarily or constantly physically connecting the liquid material storage unit and the discharge device. Furthermore, an automatic liquid supply mechanism that prevents bubbles from flowing into the discharge device by providing a bubble removal mechanism that eliminates the adverse effects of bubbles caused by always separating the liquid material storage unit and the discharge device, and a coating apparatus including the same Made it possible to provide.

すなわち、第1の発明は、液体材料を貯留する液体貯留部と、液体貯留部に貯留された液体材料を供給する供給口を有する供給部と、供給部から排出される液体材料を受ける受給口および気泡除去機構を有する受給部と、受給部を移動させる受給部駆動装置とを備え、受給部が受給口が供給口の直下に位置する受給位置に移動して供給口から液体材料の滴下供給を受け、気泡除去機構により気泡が除去された液体材料を吐出装置に供給することを特徴とする液体自動供給機構に関する。
第2の発明は、第1の発明において、気泡除去機構が、液体材料を貯留する気泡除去用容器と、一端が気泡除去用容器に貯留された液体内に浸漬され、他端が受給口と連通される流入管と、一端が気泡除去用容器に貯留された液体内に浸漬され、他端が吐出装置と連通される流出管とを備えてなることを特徴とする。
第3の発明は、第2の発明において、気泡除去機構が、気泡除去用容器を減圧するポンプ装置と、一端がポンプ装置に接続され、他端が気泡除去用容器内の空間に配置される作動気体供給管とを備えてなることを特徴とする。
第4の発明は、第2または3の発明において、液体貯留部および/または気泡除去用容器内の液体材料の量を検知する検知装置を備えることを特徴とする。
第5の発明は、第1ないし4のいずれかの発明において、受給口が、拡径された開口を有し、一定量の液体材料を一時的に貯留できる形状であることを特徴とする。
第6の発明は、第1ないし5のいずれかの発明において、供給口の直下である第1の位置と、第1の位置と異なる第2の位置を進退動する液体材料受け部材を備えることを特徴とする。
第7の発明は、第1ないし6のいずれかの発明において、液体貯留部から供給部への液体材料の供給量を制御するピンチバルブおよび/または受給部から吐出装置への液体材料の供給量を制御するピンチバルブを備えることを特徴とする。
That is, the first invention is a liquid storage unit that stores liquid material, a supply unit that has a supply port that supplies the liquid material stored in the liquid storage unit, and a receiving port that receives the liquid material discharged from the supply unit And a receiving unit having a bubble removing mechanism, and a receiving unit driving device for moving the receiving unit, and the receiving unit moves to a receiving position where the receiving port is located immediately below the supplying port, so that the liquid material is dropped from the supplying port. The present invention relates to an automatic liquid supply mechanism that supplies a liquid material from which bubbles have been removed by a bubble removal mechanism to a discharge device.
According to a second invention, in the first invention, the bubble removal mechanism includes a bubble removal container that stores the liquid material, one end immersed in the liquid stored in the bubble removal container, and the other end that is a receiving port. It is characterized by comprising an inflow pipe communicated with and an outflow pipe having one end immersed in a liquid stored in a bubble removing container and the other end communicated with a discharge device.
According to a third invention, in the second invention, the bubble removing mechanism has a pump device that depressurizes the bubble removing container, one end connected to the pump device, and the other end arranged in a space in the bubble removing container. And a working gas supply pipe.
According to a fourth invention, in the second or third invention, a detection device for detecting the amount of the liquid material in the liquid storage section and / or the bubble removing container is provided.
A fifth invention is characterized in that, in any one of the first to fourth inventions, the receiving port has an opening having an enlarged diameter and is capable of temporarily storing a certain amount of liquid material.
According to a sixth invention, in any one of the first to fifth inventions, a liquid material receiving member that moves forward and backward between a first position immediately below the supply port and a second position different from the first position is provided. It is characterized by.
According to a seventh invention, in any one of the first to sixth inventions, a pinch valve for controlling a supply amount of the liquid material from the liquid storage unit to the supply unit and / or a supply amount of the liquid material from the receiving unit to the discharge device It is characterized by comprising a pinch valve for controlling the above.

第8の発明は、ワークを保持するテーブルが配設された架台と、液体材料を吐出するノズルを有する吐出装置と、吐出装置とテーブルとを相対移動させる駆動装置と、第1ないし7のいずれかの発明に係る液体自動供給機構とを備える塗布装置に関する。
第9の発明は、第8の発明において、複数の吐出装置が配設されるビームと、各吐出装置をビームの延設方向に沿って移動自在とする吐出部駆動装置とを備え、前記受給部が、吐出装置と同数設けられることを特徴とする。
第10の発明は、第9の発明において、前記供給部が、複数配設されることを特徴とする。
第11の発明は、第8ないし10のいずれかの発明において、テーブルおよび吐出装置を覆うカバーを備えることを特徴とする。
第12の発明は、第11の発明において、前記液体貯留部が、前記カバーの外側に配設されることを特徴とする。
According to an eighth aspect of the present invention, there is provided a gantry having a table for holding a workpiece, a discharge device having a nozzle for discharging a liquid material, a drive device for relatively moving the discharge device and the table, and any one of the first to seventh items. The present invention relates to a coating apparatus including the automatic liquid supply mechanism according to the invention.
A ninth invention comprises the beam according to the eighth invention, comprising: a beam on which a plurality of discharge devices are disposed; and a discharge unit driving device that allows each discharge device to move along the extending direction of the beam. The number of the parts is the same as that of the discharge device.
A tenth invention is characterized in that, in the ninth invention, a plurality of the supply sections are arranged.
An eleventh invention is characterized in that in any of the eighth to tenth inventions, a cover for covering the table and the discharge device is provided.
In a twelfth aspect based on the eleventh aspect, the liquid storage section is disposed outside the cover.

本発明によれば、液体材料貯留部と吐出装置を物理的に接続する必要がなく、吐出装置の移動に伴い形状可変となる液体供給流路(チューブ)が配設されないので、液体供給流路を配設する際のスペースの問題や液体供給流路の劣化の問題を解消することができる。
また、液体材料貯留部側と吐出装置側とを接触させることなく液体材料を供給するので、パーティクルの発生および混入を効果的に防止することができる。
さらに、気泡除去機構を設けているので、吐出装置へ気泡が流入することを防止できる。
According to the present invention, there is no need to physically connect the liquid material storage unit and the discharge device, and no liquid supply flow channel (tube) whose shape is variable with the movement of the discharge device is provided. It is possible to solve the problem of the space when arranging the liquid and the problem of the deterioration of the liquid supply flow path.
Further, since the liquid material is supplied without bringing the liquid material storage unit side and the discharge device side into contact with each other, generation and mixing of particles can be effectively prevented.
Furthermore, since the bubble removing mechanism is provided, it is possible to prevent bubbles from flowing into the discharge device.

本発明に係る液体自動供給機構を説明する模式図である。It is a schematic diagram explaining the liquid automatic supply mechanism which concerns on this invention. 実施例に係る液体自動供給機構を備える塗布装置の概略斜視図である。It is a schematic perspective view of the coating device provided with the liquid automatic supply mechanism which concerns on an Example. 実施例に係る液体自動供給機構の主要部分を拡大した拡大図である。It is the enlarged view to which the principal part of the liquid automatic supply mechanism which concerns on an Example was expanded. 実施例に係る気泡除去機構の他の態様を示す側面図である。It is a side view which shows the other aspect of the bubble removal mechanism which concerns on an Example.

以下に、本発明を実施するための一形態を説明する。
図1に本発明に係る液体自動供給機構を説明する模式図を示す。同図中、黒塗りの矢印は液体の流れ、白抜きの矢印は気体の流れを表す。
Hereinafter, an embodiment for carrying out the present invention will be described.
FIG. 1 is a schematic diagram for explaining an automatic liquid supply mechanism according to the present invention. In the figure, a black arrow indicates a liquid flow, and a white arrow indicates a gas flow.

液体自動供給機構1は、液体材料26を貯留する容量の大きいタンク(液体材料貯留部)4と、タンク4から送出される液体材料26を排出する供給口12を備える供給部2と、吐出装置24上部に吐出装置24と一体に設けられ、供給部2から排出される液体材料26を受ける受給部3と、受給部3を移動させる受給部駆動装置とを主要な構成要素とする。これらのうち、タンク4から供給部2までは配管8Aでつながれ、受給部3から吐出装置24までは配管8B、8Cでつながれている。供給部2と受給部3との間は、シャッター15が自由に通過できる程度に離間している。また、タンク4と供給部2との途中の配管8Aには供給部2への流れを制御するバルブA9が供給部2近くに設けられ、タンク4にはタンク4内の液体材料26の残量を検知するための検知装置7が設けられる。検知装置7を設けることで、液体材料26が所定量を下回ったときに検知装置7からの信号に基づき警報を発することができる。ここで、検知装置7としては、例えば、重さで検知を行うロードセルなどを用いることができる。これ以外にも、超音波で液面を検知する超音波センサ、光量の違いで液体の有無を検知する光センサなどを用いることもできる。   The automatic liquid supply mechanism 1 includes a tank (liquid material storage unit) 4 having a large capacity for storing a liquid material 26, a supply unit 2 including a supply port 12 for discharging the liquid material 26 delivered from the tank 4, and a discharge device. The receiving unit 3 that is provided integrally with the discharge device 24 at the upper portion 24 and receives the liquid material 26 discharged from the supplying unit 2 and the receiving unit driving device that moves the receiving unit 3 are main components. Among these, the tank 4 to the supply unit 2 are connected by a pipe 8A, and the receiving unit 3 to the discharge device 24 are connected by pipes 8B and 8C. The supply unit 2 and the receiving unit 3 are separated to such an extent that the shutter 15 can pass freely. Further, a valve A9 for controlling the flow to the supply unit 2 is provided near the supply unit 2 in the pipe 8A on the way between the tank 4 and the supply unit 2, and the remaining amount of the liquid material 26 in the tank 4 is provided in the tank 4. Is provided. By providing the detection device 7, an alarm can be issued based on a signal from the detection device 7 when the liquid material 26 falls below a predetermined amount. Here, as the detection device 7, for example, a load cell that performs detection by weight can be used. In addition to this, an ultrasonic sensor that detects the liquid level with ultrasonic waves, an optical sensor that detects the presence or absence of liquid by the difference in the amount of light, and the like can also be used.

供給部2には、タンク4から送られてきた液体材料26を排出する供給口12を備えた供給管13が設置されている。供給管13は、排出側端で下向きに曲げられ、受給部3へと液体材料26を垂らして供給(滴下供給)する。供給部2と受給部3は配管でつながれておらず、供給部2が下降したり、受給部3が上昇したりすることもない。すなわち、供給口12を受給口16を接続することなく、離れた位置から非接触状態で液体材料を供給することで、パーティクルの発生自体を防止し、パーティクルが液体材料26に混入することを防いでいる。また、供給管13下方には、供給口12から余分な液体材料26が垂れてきたときにこれを受けるためのシャッター15を備えている。シャッター15は上面が開口した貯留用凹部を有しており、水平方向にスライド動作をして、供給時以外は供給口12の真下に位置するようになっている。また、シャッター15は供給口12および受給口16には接触しないようになっている。これも前述と同様、パーティクルを発生させないためである。   A supply pipe 13 having a supply port 12 for discharging the liquid material 26 sent from the tank 4 is installed in the supply unit 2. The supply pipe 13 is bent downward at the discharge side end, and supplies the liquid material 26 to the receiving unit 3 by dropping (supply supply). The supply part 2 and the receiving part 3 are not connected by piping, and the supply part 2 does not descend or the receiving part 3 does not rise. That is, by supplying the liquid material in a non-contact state from a remote position without connecting the supply port 12 to the receiving port 16, the generation of particles is prevented and the particles are prevented from being mixed into the liquid material 26. It is out. In addition, a shutter 15 is provided below the supply pipe 13 to receive excess liquid material 26 from the supply port 12 when it drops. The shutter 15 has a storage concave portion whose upper surface is open, slides in the horizontal direction, and is positioned directly below the supply port 12 except during supply. The shutter 15 is not in contact with the supply port 12 and the receiving port 16. This is also because no particles are generated as described above.

受給部3は、供給部2から供給される液体材料26を受ける受給口16を有する漏斗17、供給された液体材料26を一時的に溜め込み、気泡除去を行う気泡除去用ボトル18、液体の流れを制御するバルブB10およびバルブC11が配設され、それぞれ配管8でつながれている。バルブA〜Cには、メンテナンス性を考慮に入れて、配管を挟み込むことにより配管を弾性変形させて流路の開閉を行うピンチバルブを用いるのが好ましい。ピンチバルブは、バルブ自体が液体に触れないので、配管の交換などを行うときは作業が容易になる。また、バルブ動作で発生することがあるパーティクルが混入することもない。ここでは、バルブB10がボトル18への流入、バルブC11がボトル18からの流出を制御する。漏斗17からボトル18への液体材料26の流入は流入管19を経て行い、ボトル18から吐出装置24への液体材料26の送出は流出管20を経て行われる。また、漏斗17をボトル18より高い位置に配設しているので、液体材料26は圧力等の助けを借りずとも自然に流下し、タンク4よりも容量の小さいボトル(気泡除去用容器)18に溜め込むことができる。   The receiving unit 3 includes a funnel 17 having a receiving port 16 for receiving the liquid material 26 supplied from the supplying unit 2, a bubble removing bottle 18 for temporarily storing the supplied liquid material 26 and removing bubbles, and a flow of liquid. A valve B10 and a valve C11 that control the above are disposed, and each is connected by a pipe 8. For the valves A to C, it is preferable to use a pinch valve that opens and closes the flow path by elastically deforming the pipe by sandwiching the pipe in consideration of maintainability. Since the valve itself does not touch the liquid, the pinch valve is easy to work when replacing the piping. Further, particles that may be generated by the valve operation are not mixed. Here, the valve B10 controls the inflow into the bottle 18, and the valve C11 controls the outflow from the bottle 18. The liquid material 26 flows from the funnel 17 into the bottle 18 through the inflow pipe 19, and the liquid material 26 is delivered from the bottle 18 to the discharge device 24 through the outflow pipe 20. Further, since the funnel 17 is arranged at a position higher than the bottle 18, the liquid material 26 flows down naturally without the aid of pressure or the like, and the bottle (bubble removing container) 18 having a smaller capacity than the tank 4. Can be stored.

気泡除去用のボトル18は、作動気体供給管21に接続された加減圧ポンプ(図示せず)とともに気泡除去機構41を構成する。加減圧ポンプは、ボトル18から吐出装置24へと液体材料26を送出する際に作用する圧縮気体、およびボトル18内の液体材料26の気泡を除去する際に作用する真空を供給する。加減圧ポンプは、テーブル上にワークを吸着するための真空源として併用することも可能である。また、吐出装置側の吸引手段(例えば、プランジャ)によりボトル18内の液体材料を吸引することができる場合には、加減圧ポンプに代えて減圧ポンプを用いてもよい。ボトル18は、ガラスや硬質の樹脂等の透明な材質により作製されており、内部に満たされた液材材料の液面位置の確認や気泡混入状況を確認することができる。また、ボトル18の外側面近傍には、ボトル18内の液面を検知するセンサが上限位置(符号22)および下限位置(符号23)に設けられている。ここで、センサとしては、光量の違いで液体の有無を検知する光センサなどを用いることができる。後述するように、ボトル18に接続されている各種の管の関係上、液面の位置が正確に捉えられるものであることが好ましい。   The bubble-removing bottle 18 constitutes a bubble-removing mechanism 41 together with a pressure-reducing pump (not shown) connected to the working gas supply pipe 21. The pressure-reducing pump supplies a compressed gas that acts when the liquid material 26 is delivered from the bottle 18 to the discharge device 24 and a vacuum that acts when the bubbles of the liquid material 26 in the bottle 18 are removed. The pressure increasing / decreasing pump can be used in combination as a vacuum source for adsorbing the work on the table. Further, when the liquid material in the bottle 18 can be sucked by the suction means (for example, plunger) on the discharge device side, a pressure reducing pump may be used instead of the pressure increasing / decreasing pump. The bottle 18 is made of a transparent material such as glass or hard resin, and can confirm the liquid surface position of the liquid material filled inside and the state of air bubble mixing. Further, in the vicinity of the outer surface of the bottle 18, sensors for detecting the liquid level in the bottle 18 are provided at the upper limit position (reference numeral 22) and the lower limit position (reference numeral 23). Here, as the sensor, an optical sensor that detects the presence or absence of a liquid based on a difference in the amount of light can be used. As will be described later, it is preferable that the position of the liquid level be accurately captured because of various pipes connected to the bottle 18.

受給部3は、受給部駆動装置により水平方向に移動することができ、供給口12の直下に受給口16の中央が位置する供給位置をとることができる。受給部3の下方には、吐出装置24が配設され、受給部3と配管8Cでつながれている。吐出装置24は、受給部3にて気泡が除去された液体材料26を供給され、ノズル38より液体材料26の吐出を行う。   The receiving unit 3 can be moved in the horizontal direction by the receiving unit driving device, and can take a supply position in which the center of the receiving port 16 is located immediately below the supply port 12. A discharge device 24 is disposed below the receiving unit 3, and is connected to the receiving unit 3 by a pipe 8C. The discharge device 24 is supplied with the liquid material 26 from which bubbles are removed by the receiving unit 3, and discharges the liquid material 26 from the nozzle 38.

続いて、上述までの液体自動供給機構1がどのように動作するのかについて説明する。
まず、タンク4に液体材料26を充填し、圧縮気体供給管5および液体送出管6を接続する(STEP1)。タンク4へ液体材料26を直接充填するのではなく、液体材料26を充填済みのタンク4を設置することでもよい。ついで、タンク4に圧縮気体を供給して加圧する(STEP2)。このとき、バルブA9は閉じておく。そして、受給部3および吐出装置24を供給部2の下の供給位置へ移動させる(STEP3)。移動後、シャッター15を後退させ、バルブA9を開く(STEP4)。すると、供給口12から液体材料26が排出され、受給部3の受給口16を経て漏斗17へ注がれる(STEP5)。このとき、バルブB10およびバルブC11は開いておく。その後、液体材料26はバルブB10を通り、流入管19からボトル18へ流入する(STEP6)。ここで、前述のように、液体材料26は自然に流下するが、バルブC11を閉じておき、ボトル18内を真空引きすると供給スピードを速めることができる。次に、ボトル18内の液体材料26が上限センサ22位置まで達したら、バルブA9、バルブB10およびバルブC11を閉じ、シャッター15を進出させ、タンク4への加圧をオフにする(STEP7)。そして、作動気体供給管21より真空引きを行い、ボトル18内の液体材料26の気泡除去を行う(STEP8)。気泡除去終了後、今度は作動気体供給管21より圧縮気体を供給して加圧する(STEP9)。ついで、バルブC11を開き、流出管20からボトル18内の液体材料26を吐出装置24へ送出する(STEP10)。吐出装置24での液体材料26の充填が完了したら、バルブC11を閉じ、ボトル18への加圧をオフにする(STEP11)。そして、吐出装置24にて吐出実行をする(STEP12)。このとき、ボトル18内の液体材料26が下限センサ23位置に達するまでは、吐出装置24内の液体材料26が少なくなる度に上記STEP9からSTEP11を繰り返し、吐出装置24へ液体材料26を充填する。また、ボトル18内の液体材料26が下限センサ23位置に達したら、上記STEP2からSTEP8を再び実行し、液体材料26を受給部3へ供給する(STEP13)。タンク4内の液体残量の管理は検知装置7で行う。タンク4の液体材料26の補充は、供給動作時以外であれば可能である。
Next, how the automatic liquid supply mechanism 1 described above operates will be described.
First, the tank 4 is filled with the liquid material 26, and the compressed gas supply pipe 5 and the liquid delivery pipe 6 are connected (STEP 1). Instead of filling the tank 4 with the liquid material 26 directly, the tank 4 filled with the liquid material 26 may be installed. Next, compressed air is supplied to the tank 4 and pressurized (STEP 2). At this time, the valve A9 is closed. And the receiving part 3 and the discharge apparatus 24 are moved to the supply position under the supply part 2 (STEP3). After the movement, the shutter 15 is retracted and the valve A9 is opened (STEP 4). Then, the liquid material 26 is discharged from the supply port 12 and poured into the funnel 17 through the receiving port 16 of the receiving unit 3 (STEP 5). At this time, the valve B10 and the valve C11 are kept open. Thereafter, the liquid material 26 passes through the valve B10 and flows into the bottle 18 from the inflow pipe 19 (STEP 6). Here, as described above, the liquid material 26 flows down naturally, but if the valve C11 is closed and the bottle 18 is evacuated, the supply speed can be increased. Next, when the liquid material 26 in the bottle 18 reaches the position of the upper limit sensor 22, the valve A9, the valve B10, and the valve C11 are closed, the shutter 15 is advanced, and the pressurization to the tank 4 is turned off (STEP 7). Then, evacuation is performed from the working gas supply pipe 21, and bubbles of the liquid material 26 in the bottle 18 are removed (STEP 8). After the bubble removal is finished, this time, compressed gas is supplied from the working gas supply pipe 21 and pressurized (STEP 9). Next, the valve C11 is opened, and the liquid material 26 in the bottle 18 is sent from the outflow pipe 20 to the discharge device 24 (STEP 10). When the filling of the liquid material 26 in the discharge device 24 is completed, the valve C11 is closed and the pressurization to the bottle 18 is turned off (STEP 11). Then, the discharge is performed by the discharge device 24 (STEP 12). At this time, until the liquid material 26 in the bottle 18 reaches the lower limit sensor 23 position, the above STEP 9 to STEP 11 are repeated each time the liquid material 26 in the discharge device 24 decreases, and the discharge device 24 is filled with the liquid material 26. . When the liquid material 26 in the bottle 18 reaches the lower limit sensor 23 position, the above STEP2 to STEP8 are executed again to supply the liquid material 26 to the receiving unit 3 (STEP13). The remaining amount of liquid in the tank 4 is managed by the detection device 7. The liquid material 26 in the tank 4 can be replenished except during the supply operation.

以上のように、配管8をつなぐことなく、上から垂らすように供給していたとしても、一旦、受給部3のボトル18にて気泡除去を行ってから吐出装置24へ供給するようにしているので、吐出装置24に気泡が流入することはない。また、配管8をつなぐことなく、上から垂らすように供給することで、供給する際に接触や擦れ等がなくなり、パーティクルが発生することがない。これにより、気泡やパーティクルが混入していない液体を用いることができるので、精密な量の吐出や正確な位置への塗布が行える。   As described above, even if the pipe 8 is supplied without being connected, it is temporarily removed from the bottle 18 of the receiving unit 3 and then supplied to the discharge device 24. Therefore, bubbles do not flow into the discharge device 24. Further, by supplying the pipe 8 so as to hang from the top without connecting, there is no contact or rubbing during the supply, and no particles are generated. Thereby, since a liquid in which bubbles and particles are not mixed can be used, a precise amount can be ejected and applied to a precise position.

本発明は、液晶、インク、有機EL材料、溶剤(アルコール、アセトンなど)、紫外線硬化樹脂などの粘度が10000cps以下の液体材料に適用することができ、特に粘度が1000cps以下の液体材料に好適である。気泡除去機構においては、液体材料の種類に応じて、約50〜90kPaの負圧を約1〜5分印加する。   The present invention can be applied to a liquid material having a viscosity of 10,000 cps or less, such as a liquid crystal, ink, organic EL material, solvent (alcohol, acetone, etc.), ultraviolet curable resin, etc., and particularly suitable for a liquid material having a viscosity of 1000 cps or less. is there. In the bubble removal mechanism, a negative pressure of about 50 to 90 kPa is applied for about 1 to 5 minutes depending on the type of liquid material.

以下では、本発明の詳細を実施例により説明するが、本発明は何ら実施例により限定されるものではない。   Hereinafter, details of the present invention will be described with reference to examples, but the present invention is not limited to the examples.

実施例は、吐出装置とワークを保持するテーブルとを相対移動しながら液晶をワークに塗布する塗布装置であって、テーブル上をビームが移動するいわゆるガントリ型と呼ばれる塗布装置に関する。
図2に実施例に係る液体自動供給機構を備える塗布装置の概略斜視図、図3に実施例に係る自動供給機構の主要部分を拡大した図を示す。以下では、図2を説明する際に、タンク4が設けられている側を「左」その反対側(符号9側)を「右」、吐出装置24が設けられている側を「前」、その反対側を「後」ということがある。また、左右方向を「X方向」、前後方向を「Y方向」とする。
The embodiment relates to a coating apparatus that applies liquid crystal to a work while relatively moving a discharge device and a table that holds the work, and relates to a so-called gantry type coating apparatus in which a beam moves on the table.
FIG. 2 is a schematic perspective view of a coating apparatus including an automatic liquid supply mechanism according to the embodiment, and FIG. 3 is an enlarged view of a main part of the automatic supply mechanism according to the embodiment. In the following, when FIG. 2 is described, the side on which the tank 4 is provided is “left”, the opposite side (reference numeral 9 side) is “right”, and the side on which the discharge device 24 is provided is “front”. The other side is sometimes called “rear”. The left-right direction is the “X direction” and the front-back direction is the “Y direction”.

塗布装置25は、図2に示すように、液体材料26を塗布する塗布対象物27(以下、ワークという)を載置するテーブル28を架台29上に備え、液体材料26を吐出する吐出装置24をテーブル28に対して相対移動させるビーム駆動装置(Y駆動装置)44および受給部駆動装置(X駆動装置)43を備える。Y駆動装置44は、ビーム30を支持するスライダーと架台29上に配設されたスライドベースを有し、テーブル28上でビーム30を前後方向(符号31)に移動可能とする。吐出装置24は、ビーム30に設置されたX駆動装置43によりビーム30上を左右方向(符号32)に移動可能とされる。吐出装置24は同じものを複数備えており、全ての吐出装置がビームに沿って移動可能とされる。なお、吐出装置24の数は、ワーク27への塗布の仕方により決まるものであり、図2に示す数に限定されるものではない。   As shown in FIG. 2, the coating device 25 includes a table 28 on which a coating object 27 (hereinafter referred to as a workpiece) for coating the liquid material 26 is placed on a gantry 29, and the ejection device 24 that ejects the liquid material 26. Are provided with a beam drive device (Y drive device) 44 and a receiving portion drive device (X drive device) 43 that move the lens relative to the table 28. The Y drive device 44 has a slider that supports the beam 30 and a slide base disposed on the mount 29, and allows the beam 30 to move in the front-rear direction (reference numeral 31) on the table 28. The ejection device 24 can be moved in the left-right direction (reference numeral 32) on the beam 30 by an X driving device 43 installed on the beam 30. The ejection device 24 includes a plurality of the same devices, and all the ejection devices are movable along the beam. Note that the number of the ejection devices 24 is determined by the method of application to the workpiece 27, and is not limited to the number shown in FIG.

さらに塗布装置25は、これら各装置の外周を覆うカバー33を備える。点線で図示したカバー33には、作業者が内部に進入するための扉(図示せず)が前面側に設けられており、吐出装置24などのメンテナンス作業を行う際に用いられる。また、カバー33の天井部分に設置され、パーティクルを除去した空気をカバー33内へ供給する空気清浄装置34とを備える。ここで、空気清浄装置34としては、例えば、ファンフィルタユニット、すなわちHEPA、ULPAフィルタなどを備える小型送風機などを用いることができる。これにより、カバー33内、特に、テーブル28より上の空間は、クリーン度が保たれる。ただし、塗布装置25がクリーンルーム内に設置されるような場合、あるいはそれと同等に清浄な空間に設置されるような場合には、空気清浄装置34を設けずに天井を大きく開口あるいは撤去し、クリーン度の保たれた空気を取り入れることでもよい。なお、カバー33と架台29とを一体的に構成し、架台29上の各要素を覆うようにしてもよい。   Furthermore, the coating device 25 includes a cover 33 that covers the outer periphery of each of these devices. The cover 33 shown by a dotted line is provided with a door (not shown) on the front side for an operator to enter inside, and is used when maintenance work for the discharge device 24 and the like is performed. An air cleaning device 34 is provided on the ceiling portion of the cover 33 and supplies air from which particles have been removed to the cover 33. Here, as the air cleaning device 34, for example, a fan filter unit, that is, a small blower including a HEPA, a ULPA filter, or the like can be used. Thereby, the cleanliness is maintained in the cover 33, particularly in the space above the table 28. However, when the coating device 25 is installed in a clean room, or when installed in a clean space equivalent to the coating device 25, the ceiling is greatly opened or removed without providing the air cleaning device 34, and the It is also possible to take in air that has been maintained. Note that the cover 33 and the gantry 29 may be integrally configured so as to cover each element on the gantry 29.

液体自動供給機構1は、前述の図1の構成を有するものであり、液体材料26を収納するタンク4と、タンク4から送出される液体材料26を排出する供給口12を備える供給部2と、吐出装置24上部に吐出装置24と一体に設けられ、供給部2から排出される液体材料26を受ける受給部3と、受給部3および吐出装置24を相対移動させるX駆動装置43およびY駆動装置44とを主要な構成要素とする。液体自動供給機構1のうち、液体材料26を収納するタンク4がカバー33の外側に取り外し可能に固設され、液体材料26を排出する供給口12を備える供給部2がカバー33の内側に固設される。また、図3に示すように、吐出装置24の上方には、供給部2から排出される液体材料26を受ける受給部3が吐出装置24と一体に設けられ、X駆動装置43により一体に移動される。Y駆動装置44によりビーム30が受給部3の近くまで移動され、X駆動装置43により吐出装置24と一体になった受給部3が供給部2の下方まで移動される供給位置において、受給部3は供給部2から液体材料26の供給を受ける。図2のように吐出装置24が複数設けられている場合は、吐出装置24毎に受給部3を設ける。   The automatic liquid supply mechanism 1 has the above-described configuration of FIG. 1, and includes a tank 4 that stores the liquid material 26, and a supply unit 2 that includes a supply port 12 that discharges the liquid material 26 delivered from the tank 4. The receiving unit 3 that is provided integrally with the discharging unit 24 on the upper side of the discharging unit 24 and receives the liquid material 26 discharged from the supplying unit 2, and the X driving unit 43 and the Y driving unit that move the receiving unit 3 and the discharging unit 24 relative to each other. The apparatus 44 is a main component. In the automatic liquid supply mechanism 1, the tank 4 for storing the liquid material 26 is detachably fixed to the outside of the cover 33, and the supply unit 2 including the supply port 12 for discharging the liquid material 26 is fixed to the inside of the cover 33. Established. As shown in FIG. 3, the receiving unit 3 that receives the liquid material 26 discharged from the supply unit 2 is provided integrally with the discharging device 24 above the discharging device 24, and is moved integrally by the X driving device 43. Is done. In the supply position where the beam 30 is moved to the vicinity of the receiving unit 3 by the Y driving device 44 and the receiving unit 3 integrated with the discharge device 24 is moved to the lower part of the supplying unit 2 by the X driving device 43, the receiving unit 3. Receives the supply of the liquid material 26 from the supply unit 2. When a plurality of ejection devices 24 are provided as shown in FIG. 2, the receiving unit 3 is provided for each ejection device 24.

タンク4から供給部2までは配管8Aでつながれ、受給部3から吐出装置24までは配管8B、8Cでつながれており、供給部2と受給部3との間は離間している。タンク4と供給部2との間には、供給部2への流れを制御するバルブA9がカバー33内側の対応する供給部2近くに固設される。タンク4の下にはタンク4内の液体材料26の残量を検知するための検知装置7が設けられる。タンク4から供給部2へ向かう配管8は、タンク4のすぐ近くでカバー33を貫通し、カバー33内へ入る。すなわち、タンク4及び検知装置7のみがカバー33の外に設置されることになる。たびたび充填或いは交換などの作業が行われるタンク4をカバー33の外に設置することで、カバー33内へパーティクルを持ち込むことを極力減らすことができる。加えて、塗布装置25が塗布動作中でもタンク4への作業が可能となる。   The tank 4 and the supply unit 2 are connected by a pipe 8A, and the receiving unit 3 and the discharge device 24 are connected by pipes 8B and 8C, and the supply unit 2 and the receiving unit 3 are separated from each other. A valve A9 for controlling the flow to the supply unit 2 is fixed between the tank 4 and the supply unit 2 near the corresponding supply unit 2 inside the cover 33. Below the tank 4, a detection device 7 for detecting the remaining amount of the liquid material 26 in the tank 4 is provided. The pipe 8 from the tank 4 to the supply unit 2 passes through the cover 33 in the immediate vicinity of the tank 4 and enters the cover 33. That is, only the tank 4 and the detection device 7 are installed outside the cover 33. By installing the tank 4, which is frequently filled or replaced, outside the cover 33, it is possible to reduce the number of particles brought into the cover 33 as much as possible. In addition, the work on the tank 4 can be performed even when the coating device 25 is performing the coating operation.

液体自動供給機構1における供給口12の数は、吐出装置24の数に応じて変更することが好ましい。なぜならば、複数の吐出装置24をビーム30の一方の側につめて並べたときの合計幅が、左右方向のストローク長さの半分を超えるときは、ビーム上の1カ所に供給口12を設けたとしても、すべての吐出装置24をこの供給口12に移動できないためである。この場合は、供給口12を2カ所以上設けて、複数の吐出装置24が何れかの供給口12に移動できるようにする。   The number of supply ports 12 in the automatic liquid supply mechanism 1 is preferably changed according to the number of ejection devices 24. This is because when the total width when a plurality of ejection devices 24 are arranged on one side of the beam 30 exceeds half of the stroke length in the left-right direction, the supply port 12 is provided at one position on the beam. This is because not all of the discharge devices 24 can be moved to the supply port 12. In this case, two or more supply ports 12 are provided so that the plurality of ejection devices 24 can move to any one of the supply ports 12.

以上のように、実施例の塗布装置25では、供給部2と受給部3との間が離間しているので、配管8が吐出装置24や吐出部駆動装置と一緒に動くことがない。したがって、円滑な駆動のため配管を長めに配設したり、配管が動くことにより劣化が早まったりするといった問題が生じない。   As described above, in the coating apparatus 25 according to the embodiment, the supply unit 2 and the receiving unit 3 are separated from each other, so that the pipe 8 does not move together with the discharge device 24 and the discharge unit driving device. Therefore, there is no problem that the piping is arranged longer for smooth driving or that the deterioration is accelerated by moving the piping.

次に、図3を参照しながら、液体自動供給機構1の詳細について説明する。同図中、黒塗りの矢印は液体の流れ、白抜きの矢印は気体の流れを表す。
供給部2には、タンク4から送られてきた液体材料26を排出する供給口12を備えた供給管13が設置されている。供給管13は、途中で支持部材14に支えられ、供給口12近傍で下向きに曲げられる。ここで供給口12から支持部材14までの部分は、金属などの形状を保てる材料で作られている。供給管14の下方には、供給口12から余分な液体材料26が垂れてきたときに受けるためのシャッター15を備えている。シャッター15は上面が開口した柄杓状(柄がついた器状)をしており、スライド動作をして、供給時以外は供給口12の真下に位置するようになっている。
Next, the details of the automatic liquid supply mechanism 1 will be described with reference to FIG. In the figure, a black arrow indicates a liquid flow, and a white arrow indicates a gas flow.
A supply pipe 13 having a supply port 12 for discharging the liquid material 26 sent from the tank 4 is installed in the supply unit 2. The supply pipe 13 is supported by the support member 14 in the middle, and is bent downward in the vicinity of the supply port 12. Here, the portion from the supply port 12 to the support member 14 is made of a material that can maintain a shape such as metal. Below the supply pipe 14, there is provided a shutter 15 for receiving excess liquid material 26 from the supply port 12. The shutter 15 is shaped like a handle with an open upper surface (a container with a handle), and is slid so as to be positioned directly below the supply port 12 except during supply.

受給部3は、3つの箇所から構成されており、一番高い位置に、供給部3から供給される液体材料26を受ける受給口16を有する漏斗17、一番低い位置には供給された液体材料26を一時的に溜め込み、気泡除去を行うボトル18が配設されている。そして、漏斗17とボトル18の中間の位置に液体の流れを制御するバルブB10およびバルブC11が並んで配設されている。漏斗17は上端が受給口16となるよう開口しており、液体材料26が供給口12から滴下供給される。ここで、カバー33内はクリーン度が保たれているので、受給口16が上部に向かって開口していてもパーティクルが混入するおそれはない。   The receiving unit 3 is composed of three locations, the funnel 17 having the receiving port 16 for receiving the liquid material 26 supplied from the supply unit 3 at the highest position, and the liquid supplied at the lowest position. A bottle 18 for temporarily storing the material 26 and removing bubbles is provided. A valve B10 and a valve C11 that control the flow of the liquid are arranged side by side at a position intermediate between the funnel 17 and the bottle 18. The funnel 17 is opened so that the upper end becomes the receiving port 16, and the liquid material 26 is supplied dropwise from the supply port 12. Here, since the degree of cleanliness is maintained in the cover 33, there is no possibility that particles are mixed even if the receiving port 16 is opened upward.

気泡除去用のボトル18は、作動気体供給管21に接続された加減圧ポンプ(図示せず)とともに気泡除去機構41を構成する。加減圧ポンプは、ボトル18から吐出装置24へと液体材料26を送出する際に作用する圧縮気体、およびボトル18内の液体材料26の気泡を除去する際に作用する真空を供給する。
また、ボトル18の外側面近傍には、ボトル18内の液面を検知するセンサが上限位置(符号22)および下限位置(符号23)に設けられている。上限センサ22は、作動気体供給管21の出口より下の位置に、下限センサ23は、流出管20の入口より上の位置に配置する。そうすることで、作動気体供給管21から液体材料26を吸い込んだり、流出管20から気体を吸い込んだりすることを防ぐことができる。
The bubble-removing bottle 18 constitutes a bubble-removing mechanism 41 together with a pressure-reducing pump (not shown) connected to the working gas supply pipe 21. The pressure-reducing pump supplies a compressed gas that acts when the liquid material 26 is delivered from the bottle 18 to the discharge device 24 and a vacuum that acts when the bubbles of the liquid material 26 in the bottle 18 are removed.
Further, in the vicinity of the outer surface of the bottle 18, sensors for detecting the liquid level in the bottle 18 are provided at the upper limit position (reference numeral 22) and the lower limit position (reference numeral 23). The upper limit sensor 22 is disposed at a position below the outlet of the working gas supply pipe 21, and the lower limit sensor 23 is disposed at a position above the inlet of the outflow pipe 20. By doing so, it is possible to prevent the liquid material 26 from being sucked from the working gas supply pipe 21 and the gas from being sucked from the outflow pipe 20.

受給部3は、供給部2より低い位置で、かつ、供給部2が受給部3の下方に移動してきたときに供給部2と接触しない位置に設けられる。受給部3の下方には、吐出装置24が一体的に配設されている。吐出装置24には、受給部3にて気泡を除去された液体材料26が供給され、ワーク27への吐出を行う。本実施例では、吐出装置24としてプランジャ式の吐出装置を図示しているが、プランジャ式吐出装置以外の吐出装置を用いることができるのは言うまでもない。適用可能な吐出装置としては、先端にノズルを有するシリンジ内の液体材料に調圧されたエアを所望時間だけ印加するエア式、フラットチュービング機構またはロータリーチュービング機構を有するチュービング式、スクリューの回転により液体材料を吐出するスクリュー式、所望圧力が印加された液体材料をバルブの開閉により吐出制御するバルブ式などが例示される。   The receiving unit 3 is provided at a position that is lower than the supply unit 2 and that does not come into contact with the supply unit 2 when the supply unit 2 moves below the receiving unit 3. A discharge device 24 is integrally provided below the receiving unit 3. The discharge device 24 is supplied with the liquid material 26 from which bubbles are removed by the receiving unit 3, and discharges the work 27. In this embodiment, a plunger-type discharge device is illustrated as the discharge device 24, but it is needless to say that a discharge device other than the plunger-type discharge device can be used. Applicable discharge devices include air type that applies a regulated air to a liquid material in a syringe having a nozzle at the tip for a desired time, a tubing type that has a flat tubing mechanism or a rotary tubing mechanism, and a liquid by rotating a screw. Examples include a screw type that discharges a material and a valve type that controls discharge of a liquid material to which a desired pressure is applied by opening and closing a valve.

本実施例のプランジャ式吐出装置24は、管形状の計量部36と、計量部36に内接するプランジャ35と、吐出口39を備えるノズル38と、計量部36とノズル38及び計量部36と流入口40の連通を切り換える切換弁37とを備える。そして、計量部36内を密接して進退移動するプランジャ35を高速に進出移動させて液体材料26を吐出口39より飛翔吐出させる。   The plunger-type discharge device 24 according to the present embodiment includes a pipe-shaped measuring unit 36, a plunger 35 that is inscribed in the measuring unit 36, a nozzle 38 that includes a discharge port 39, a measuring unit 36, a nozzle 38, and a measuring unit 36. And a switching valve 37 for switching the communication of the inlet 40. Then, the plunger 35 that moves forward and backward in close contact with the inside of the measuring unit 36 is advanced and moved at a high speed, and the liquid material 26 is ejected and ejected from the ejection port 39.

気泡除去機構41を複数設けることにより確実に気泡の混入を防止するようにしてもよい。
また、本実施例の気泡除去機構41に代えて或いは併用して、図4に示す加減圧ポンプを有しない簡易の気泡除去機構を備えるようにしてもよい。流出管20の入口を気泡除去用容器18の底面から離間した上方に設けることにより、底面に堆積したり底面付近を浮揚するパーティクル42が吸入されることを防ぐことができる。かかる簡易の気泡除去機構は、受給部3の小型化をはかる必要がある場合に効果的である。
A plurality of bubble removal mechanisms 41 may be provided to reliably prevent bubbles from being mixed.
Moreover, it may replace with or use together with the bubble removal mechanism 41 of a present Example, and you may make it provide the simple bubble removal mechanism which does not have the pressurization / decompression pump shown in FIG. Providing the inlet of the outflow pipe 20 at an upper position away from the bottom surface of the bubble removing container 18 can prevent inhalation of particles 42 that accumulate on the bottom surface or float near the bottom surface. Such a simple bubble removal mechanism is effective when it is necessary to reduce the size of the receiving unit 3.

1:液体自動供給機構、2:供給部、3:受給部、4:タンク(液体材料貯留部)、5:圧縮気体供給管、6:液体送出管、7:検知装置、8:配管、9:バルブA、10:バルブB、11:バルブC、12:供給口、13:供給管、14:支持部材、15:シャッター、16:受給口、17:漏斗、18:ボトル(気泡除去用容器)、19:流入管、20:流出管、21:作動気体供給管、22:上限センサ、23:下限センサ、24:吐出装置、25:塗布装置、26:液体材料、27:塗布対象物(ワーク)、28:テーブル、29:架台、30:ビーム、31:ビーム移動方向、32:吐出装置移動方向、33:カバー、34:空気清浄装置、35:プランジャ、36:計量部、37:切換弁、38:ノズル、39:吐出口、40:流入口、41:気泡除去機構、42:パーティクル、43:受給部駆動装置(X駆動装置)、44:ビーム駆動装置(Y駆動装置) 1: liquid automatic supply mechanism, 2: supply unit, 3: receiving unit, 4: tank (liquid material storage unit), 5: compressed gas supply pipe, 6: liquid delivery pipe, 7: detection device, 8: piping, 9 : Valve A, 10: Valve B, 11: Valve C, 12: Supply port, 13: Supply pipe, 14: Support member, 15: Shutter, 16: Receiving port, 17: Funnel, 18: Bottle (Bubble removal container ), 19: Inflow pipe, 20: Outflow pipe, 21: Working gas supply pipe, 22: Upper limit sensor, 23: Lower limit sensor, 24: Discharge device, 25: Application device, 26: Liquid material, 27: Application object ( Work), 28: table, 29: mount, 30: beam, 31: beam moving direction, 32: discharge device moving direction, 33: cover, 34: air purifier, 35: plunger, 36: measuring unit, 37: switching Valve, 38: nozzle, 39: discharge port, 40: Inlet, 41: bubble removal mechanism, 42: particle, 43: receiving section drive unit (X drive), 44: beam driving device (Y drive)

Claims (12)

液体材料を貯留する液体貯留部と、
液体貯留部に貯留された液体材料を供給する供給口を有する供給部と、
供給部から排出される液体材料を受ける受給口および気泡除去機構を有する受給部と、
受給部を移動させる受給部駆動装置とを備え、
受給部が受給口が供給口の直下に位置する受給位置に移動して供給口から液体材料の滴下供給を受け、気泡除去機構により気泡が除去された液体材料を吐出装置に供給することを特徴とする液体自動供給機構。
A liquid reservoir for storing liquid material;
A supply unit having a supply port for supplying the liquid material stored in the liquid storage unit;
A receiving port having a receiving port for receiving the liquid material discharged from the supplying unit and a bubble removing mechanism;
A receiving unit driving device for moving the receiving unit;
The receiving unit moves to a receiving position where the receiving port is located immediately below the supplying port, receives a drop supply of the liquid material from the supplying port, and supplies the liquid material from which bubbles are removed by the bubble removing mechanism to the discharge device. Automatic liquid supply mechanism.
気泡除去機構が、液体材料を貯留する気泡除去用容器と、一端が気泡除去用容器に貯留された液体内に浸漬され、他端が受給口と連通される流入管と、一端が気泡除去用容器に貯留された液体内に浸漬され、他端が吐出装置と連通される流出管とを備えてなることを特徴とする請求項1に記載の液体自動供給機構。   The bubble removing mechanism includes a bubble removing container for storing a liquid material, an inflow pipe having one end immersed in the liquid stored in the bubble removing container and the other end communicating with the receiving port, and one end for removing the bubble. 2. The automatic liquid supply mechanism according to claim 1, further comprising an outflow pipe immersed in the liquid stored in the container and having the other end communicated with the discharge device. 気泡除去機構が、気泡除去用容器を減圧するポンプ装置と、一端がポンプ装置に接続され、他端が気泡除去用容器内の空間に配置される作動気体供給管とを備えてなることを特徴とする請求項2に記載の液体自動供給機構。   The bubble removing mechanism includes a pump device that depressurizes the bubble removing container, and a working gas supply pipe having one end connected to the pump device and the other end disposed in a space in the bubble removing container. The automatic liquid supply mechanism according to claim 2. 液体貯留部および/または気泡除去用容器内の液体材料の量を検知する検知装置を備えることを特徴とする請求項2または3に記載の液体自動供給機構。   4. The automatic liquid supply mechanism according to claim 2, further comprising a detection device that detects the amount of the liquid material in the liquid storage section and / or the bubble removing container. 受給口が、拡径された開口を有し、一定量の液体材料を一時的に貯留できる形状であることを特徴とする請求項1ないし4のいずれかに記載の液体自動供給機構。   The automatic liquid supply mechanism according to any one of claims 1 to 4, wherein the receiving port has an opening having an enlarged diameter and is capable of temporarily storing a certain amount of liquid material. 供給口の直下である第1の位置と、第1の位置と異なる第2の位置を進退動する液体材料受け部材を備えることを特徴とする請求項1ないし5いずれかに記載の液体自動供給機構。   The automatic liquid supply according to any one of claims 1 to 5, further comprising a liquid material receiving member that moves forward and backward between a first position directly below the supply port and a second position different from the first position. mechanism. 液体貯留部から供給部への液体材料の供給量を制御するピンチバルブおよび/または受給部から吐出装置への液体材料の供給量を制御するピンチバルブを備えることを特徴とする請求項1ないし6いずれかに記載の液体自動供給機構。   7. A pinch valve for controlling a supply amount of the liquid material from the liquid storage unit to the supply unit and / or a pinch valve for controlling a supply amount of the liquid material from the receiving unit to the discharge device. The liquid automatic supply mechanism according to any one of the above. ワークを保持するテーブルが配設された架台と、
液体材料を吐出するノズルを有する吐出装置と、
吐出装置とテーブルとを相対移動させる駆動装置と、
請求項1ないし7のいずれかに記載の液体自動供給機構とを備える塗布装置。
A gantry with a table for holding the workpiece;
A discharge device having a nozzle for discharging a liquid material;
A drive device for relatively moving the discharge device and the table;
A coating apparatus comprising the liquid automatic supply mechanism according to claim 1.
複数の吐出装置が配設されるビームと、
各吐出装置をビームの延設方向に沿って移動自在とする吐出部駆動装置とを備え、
前記受給部が、吐出装置と同数設けられることを特徴とする請求項8の塗布装置。
A beam provided with a plurality of ejection devices;
An ejection unit driving device that enables each ejection device to move along the extending direction of the beam;
The coating apparatus according to claim 8, wherein the number of the receiving units is the same as the number of ejection apparatuses.
前記供給部が、複数配設されることを特徴とする請求項9の塗布装置。   The coating apparatus according to claim 9, wherein a plurality of the supply units are provided. テーブルおよび吐出装置を覆うカバーを備えることを特徴とする請求項8ないし10のいずれかの塗布装置。   The coating apparatus according to claim 8, further comprising a cover that covers the table and the discharge device. 前記液体貯留部が、前記カバーの外側に配設されることを特徴とする請求項11に記載の塗布装置。
The coating apparatus according to claim 11, wherein the liquid storage unit is disposed outside the cover.
JP2010207775A 2010-09-16 2010-09-16 Liquid automatic supply mechanism and coating apparatus provided with the same Active JP5566829B2 (en)

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CN201180042922.3A CN103118802B (en) 2010-09-16 2011-09-14 Automated liquid supply mechanism and coater provided with same
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