JP2012056093A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2012056093A5 JP2012056093A5 JP2010198432A JP2010198432A JP2012056093A5 JP 2012056093 A5 JP2012056093 A5 JP 2012056093A5 JP 2010198432 A JP2010198432 A JP 2010198432A JP 2010198432 A JP2010198432 A JP 2010198432A JP 2012056093 A5 JP2012056093 A5 JP 2012056093A5
- Authority
- JP
- Japan
- Prior art keywords
- original plate
- pattern
- original
- plate according
- ratio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 229910052906 cristobalite Inorganic materials 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010198432A JP5637785B2 (ja) | 2010-09-06 | 2010-09-06 | 原版、及びそれを用いた物品の製造方法 |
| US13/223,415 US8603383B2 (en) | 2010-09-06 | 2011-09-01 | Original and article manufacturing method using same |
| US14/069,958 US8734702B2 (en) | 2010-09-06 | 2013-11-01 | Original and article manufacturing method using same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010198432A JP5637785B2 (ja) | 2010-09-06 | 2010-09-06 | 原版、及びそれを用いた物品の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012056093A JP2012056093A (ja) | 2012-03-22 |
| JP2012056093A5 true JP2012056093A5 (enExample) | 2013-10-03 |
| JP5637785B2 JP5637785B2 (ja) | 2014-12-10 |
Family
ID=45770121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010198432A Active JP5637785B2 (ja) | 2010-09-06 | 2010-09-06 | 原版、及びそれを用いた物品の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US8603383B2 (enExample) |
| JP (1) | JP5637785B2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7976740B2 (en) * | 2008-12-16 | 2011-07-12 | Microsoft Corporation | Fabrication of optically smooth light guide |
| EP2469339B1 (en) * | 2010-12-21 | 2017-08-30 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP6060796B2 (ja) * | 2013-04-22 | 2017-01-18 | 大日本印刷株式会社 | インプリントモールド及びダミーパターン設計方法 |
| US10499704B2 (en) * | 2013-09-18 | 2019-12-10 | Nike, Inc. | Sole for an article of footwear having regionally varied Auxetic structures |
| EP2949937B1 (en) * | 2014-05-28 | 2016-12-21 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Convertor |
| JP6343094B2 (ja) * | 2015-03-24 | 2018-06-13 | 帝人株式会社 | 樹脂製構造体及び車両用部品 |
| CN108000758B (zh) * | 2017-12-01 | 2019-11-08 | 东华大学 | 一种负泊松比纺织复合材料成型模具和方法 |
| CN109707284B (zh) * | 2019-01-10 | 2024-07-02 | 五邑大学 | 一种负泊松比蜂窝夹层结构及夹层板 |
| KR102156263B1 (ko) * | 2019-02-27 | 2020-09-16 | 서울대학교산학협력단 | 전사장치 |
| JP6985341B2 (ja) * | 2019-08-05 | 2021-12-22 | エルジー ディスプレイ カンパニー リミテッド | 伸縮基板及び伸縮表示装置 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4668557A (en) * | 1986-07-18 | 1987-05-26 | The University Of Iowa Research Foundation | Polyhedron cell structure and method of making same |
| US7150622B2 (en) * | 2003-07-09 | 2006-12-19 | Molecular Imprints, Inc. | Systems for magnification and distortion correction for imprint lithography processes |
| US7140861B2 (en) * | 2004-04-27 | 2006-11-28 | Molecular Imprints, Inc. | Compliant hard template for UV imprinting |
| US20050270516A1 (en) * | 2004-06-03 | 2005-12-08 | Molecular Imprints, Inc. | System for magnification and distortion correction during nano-scale manufacturing |
| JP4996488B2 (ja) * | 2007-03-08 | 2012-08-08 | 東芝機械株式会社 | 微細パターン形成方法 |
| US8899957B2 (en) * | 2009-09-25 | 2014-12-02 | HGST Netherlands B.V. | System, method and apparatus for manufacturing magnetic recording media |
-
2010
- 2010-09-06 JP JP2010198432A patent/JP5637785B2/ja active Active
-
2011
- 2011-09-01 US US13/223,415 patent/US8603383B2/en active Active
-
2013
- 2013-11-01 US US14/069,958 patent/US8734702B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2012056093A5 (enExample) | ||
| US10632726B2 (en) | Selective continuous transferring apparatus based on adhesion-controlled film | |
| JP5214683B2 (ja) | インプリントレシピ作成装置及び方法並びにインプリント装置及び方法 | |
| JP2009060084A5 (enExample) | ||
| JP2016213458A5 (enExample) | ||
| JP2013138183A5 (enExample) | ||
| US9423700B2 (en) | Lithography apparatus, lithography method, lithography system, storage medium, and article manufacturing method | |
| JP2012142065A5 (enExample) | ||
| USRE47456E1 (en) | Pattern transfer apparatus and method for fabricating semiconductor device | |
| SG159441A1 (en) | Electrically conductive structure on a semiconductor substrate formed from printing | |
| CN105301894B (zh) | 压印装置及物品制造方法 | |
| JP6356798B2 (ja) | パターン化されたスタンプの製造方法、パターン化されたスタンプのインプリント方法及びインプリントされた物 | |
| JP2013004744A5 (enExample) | ||
| US20190146334A1 (en) | Template substrate, manufacturing method, and pattern forming method | |
| TWI811579B (zh) | 用於晶圓處理的設備 | |
| JP2014203860A5 (ja) | ホルダ、ステージ装置、リソグラフィ装置及び物品の製造方法 | |
| JP2018101780A5 (enExample) | ||
| CN102183875B (zh) | 滚轮式紫外线软压印方法 | |
| RU2701780C2 (ru) | Способ переноса, а также устройство и компьютерный программный продукт для его осуществления | |
| US20120090489A1 (en) | Nanoimprint method | |
| JP2018101779A5 (enExample) | ||
| JP2018078258A5 (ja) | 装置、方法、及び物品製造方法 | |
| WO2015043321A1 (zh) | 一种纳米压印光刻装置及其方法 | |
| TW202030145A (zh) | 用於凸印一奈米結構之方法及裝置 | |
| JP2013041947A (ja) | リソグラフィ装置及び物品の製造方法 |