JP2012056071A - Device and method for supporting - Google Patents

Device and method for supporting Download PDF

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JP2012056071A
JP2012056071A JP2010204475A JP2010204475A JP2012056071A JP 2012056071 A JP2012056071 A JP 2012056071A JP 2010204475 A JP2010204475 A JP 2010204475A JP 2010204475 A JP2010204475 A JP 2010204475A JP 2012056071 A JP2012056071 A JP 2012056071A
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contact
convex portion
contact surface
suction
wafer
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JP5596475B2 (en
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Miki Nakada
幹 中田
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Lintec Corp
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Abstract

PROBLEM TO BE SOLVED: To attain stabilization of support of a plate member such as a semiconductor wafer having a projecting part when the plate member is conveyed and to easily separate a contact surface in contact with the projecting part from the projecting part.SOLUTION: The supporting device 12 of a semiconductor wafer W having a projecting part W1 includes a contact body 26 which can come in contact with the tip of the projecting part W1 and a suction means 30 giving suction force to the semiconductor wafer W. The contact body 26 is constituted of a material provided with a suction port 40 penetrating on a contact surface 26A side and having self-viscosity. When the contact body 26 is viewed in sectional view in a non-load state, the contact surface 26A has a shape tapering toward the suction port 40. The contact surface 26A is provided to be deformable matched with the tip surface shape of the projecting part W1 when supporting the semiconductor wafer W.

Description

本発明は、支持装置及び支持方法に係り、特に、外周部に閉ループ状の凸部を備えた半導体ウエハ等の板状部材を搬送することに適した支持装置及び支持方法に関する。   The present invention relates to a support device and a support method, and more particularly, to a support device and a support method suitable for transporting a plate-shaped member such as a semiconductor wafer having a closed loop-shaped convex portion on an outer peripheral portion.

近時の半導体ウエハ(以下、「ウエハ」と称する場合もある)は、各種デバイス形成後のダイシングによって電子部品として利用可能としたときの小型、軽量化を達成するために、50μm前後にまで研削が行われるようになっている。そのため、ウエハの脆質性は益々高まることとなり、各種処理工程間の搬送時に、ウエハを損傷させることのない慎重な配慮が要求されるに至っている。
そこで、搬送時のウエハ損傷を防止するために、ウエハの外周側に、相対的に厚肉となる閉ループ状の凸部を形成し、当該凸部を利用してウエハを搬送することのできる保持装置が提案されている(例えば、特許文献1参照)。
Recent semiconductor wafers (hereinafter sometimes referred to as “wafers”) are ground to around 50 μm in order to achieve miniaturization and weight reduction when they can be used as electronic parts by dicing after forming various devices. Is to be done. For this reason, the brittleness of the wafer is increasingly increased, and careful consideration that does not damage the wafer is required during transfer between various processing steps.
Therefore, in order to prevent wafer damage during transport, a relatively loop-shaped convex portion is formed on the outer peripheral side of the wafer, and the wafer can be transported using the convex portion. An apparatus has been proposed (see, for example, Patent Document 1).

特許文献1の支持装置は、ウエハの凸部先端面に接触可能な接触体を備え、この接触体は、自粘性を有する材料により形成され、また、凸部との接触面に吸引口を備えている。同装置では、吸引口を通じた吸引力に加え、接触体の接触面が凸部の先端面全面に接触し、接触体の粘性が働くことで支持力を発揮するようになっている。   The support device of Patent Document 1 includes a contact body that can contact a front end surface of a convex portion of a wafer. The contact body is formed of a self-viscous material, and includes a suction port on a contact surface with the convex portion. ing. In this apparatus, in addition to the suction force through the suction port, the contact surface of the contact body comes into contact with the entire tip surface of the convex portion, and the support body exerts its supporting force by the viscosity of the contact body.

特開2010−56341号公報JP 2010-56341 A

しかしながら、特許文献1の支持装置にあっては、接触体が自粘性を有するため接触面と凸部先端面との接着力が強くなり過ぎ、それらを切り離すため、別の支持装置によってウエハを保持する工程が必要となり、工程数が増加するという不都合を招来する。ここで、特許文献1では、接触面と凸部先端面との切り離しを行うべく、吸引口から圧縮空気を吐出させているが、前記接着力が強くなると、接触面における吸引口近傍だけが部分的に凸部先端面から離れてしまうだけで、切り離しが不十分となる不都合が生じる。そこで、このような不都合を解消するために接触面の幅を狭くすると、凸部先端面との接着力が弱くなり、ウエハを脱落させてしまうといった不都合を生じる。   However, in the support device of Patent Document 1, since the contact body has self-viscosity, the adhesive force between the contact surface and the tip of the convex portion becomes too strong, and the wafer is held by another support device to separate them. This requires a process to be performed, resulting in an inconvenience that the number of processes increases. Here, in Patent Document 1, compressed air is discharged from the suction port in order to separate the contact surface and the tip end surface of the convex portion. However, when the adhesive force is increased, only the vicinity of the suction port on the contact surface is a part. Therefore, there is an inconvenience that the separation is insufficient just by moving away from the tip surface of the convex portion. Therefore, if the width of the contact surface is narrowed in order to eliminate such an inconvenience, the adhesive force with the tip end surface of the convex portion becomes weak, and there arises an inconvenience that the wafer is dropped off.

[発明の目的]
本発明は、凸部を利用して支持する構成において、板状部材を安定して支持でき、凸部と、これに接触する接触面とを簡単に切り離すことができる支持装置及び支持方法を提供することにある。
[Object of invention]
The present invention provides a support device and a support method that can stably support a plate-like member and can easily separate a convex portion from a contact surface that contacts the convex member in a configuration in which the convex portion is supported. There is to do.

前記目的を達成するため、本発明は、平面内に凸部が設けられた板状部材の支持装置であって、
前記凸部における凸部先端面に当接可能な第1当接面を有するとともに、当該第1当接面に貫通する吸引口が設けられた自粘性の接触体と、前記吸引口に連通する吸引手段とを備え、
前記接触体は、前記第1当接面に連設し当該第1当接面から離れるにしたがって幅広となるとともに、前記吸引手段によって前記凸部先端面を吸引したときに、当該凸部先端面に当接可能な第2当接面を有する、という構成を採っている。
In order to achieve the above object, the present invention is a support device for a plate-like member provided with a convex portion in a plane,
A self-viscous contact body having a first contact surface that can contact the tip end surface of the convex portion of the convex portion and provided with a suction port penetrating the first contact surface is communicated with the suction port. A suction means,
The contact body is connected to the first contact surface and becomes wider as the distance from the first contact surface increases, and when the protrusion tip surface is sucked by the suction means, the protrusion tip surface It has the structure of having the 2nd contact surface which can contact | abut.

本発明において、前記第1当接面の幅は、前記吸引口の幅と同一又は前記吸引口の幅以上であって略同一幅に設けられるとよい。   In the present invention, the width of the first contact surface may be the same as the width of the suction port or greater than or equal to the width of the suction port.

更に、前記第2当接面は、外側に膨出する湾曲形状に設けられる、という構成を採ることが好ましい。   Furthermore, it is preferable that the second contact surface is provided in a curved shape that bulges outward.

また、前記接触体に支持された板状部材を当該接触体から切り離す切離手段を更に含む構成を採用することができる。   Further, it is possible to adopt a configuration that further includes a separating means for separating the plate-like member supported by the contact body from the contact body.

更に、本発明の支持方法は、平面内に凸部が設けられた板状部材の支持方法であって、
第1当接面を前記凸部における凸部先端面に当接させる工程と、
前記第1当接面に貫通する吸引口を介して前記凸部先端面を吸引する工程と、
前記吸引によって前記第1当接面に連設した第2当接面を前記凸部先端面に当接させる工程とを備える、という方法を採っている。
Furthermore, the support method of the present invention is a support method of a plate-like member provided with a convex portion in a plane,
Contacting the first abutting surface with the convex portion tip surface of the convex portion;
Sucking the tip end surface of the convex portion through a suction port penetrating the first contact surface;
And a step of abutting a second abutting surface provided continuously with the first abutting surface by the suction against the tip end surface of the convex portion.

本発明によれば、接触体の第1当接面側が先細りとなる形状になるので、接触体と凸部先端面との接触面積を縮小でき、当該第1当接面と凸部先端面との切り離しを行い易くすることができる上、吸引手段による吸引によって第2当接面が凸部先端面に当接するので、接触体の凸部先端面との接着力が弱くなることを防止することができる。   According to the present invention, since the first contact surface side of the contact body is tapered, the contact area between the contact body and the protrusion tip surface can be reduced, and the first contact surface and the protrusion tip surface can be reduced. Can be easily separated, and the second contact surface comes into contact with the front end surface of the convex portion by suction by the suction means, thereby preventing the adhesive force with the front end surface of the convex portion of the contact body from being weakened. Can do.

また、第2当接面を湾曲形状に形成した場合、当該第2当接面を凸部先端面に当接させ易くなる。   In addition, when the second contact surface is formed in a curved shape, the second contact surface can be easily brought into contact with the convex portion tip surface.

更に、切離手段を含む構成では、接触体が自粘性を有していても、当該接触体と板状部材との分離を確実に行うことができる。   Further, in the configuration including the separating means, the contact body and the plate-like member can be reliably separated even if the contact body has self-viscosity.

搬送装置に支持装置が適用された実施形態を示す概略正面図。The schematic front view which shows embodiment by which the support apparatus was applied to the conveying apparatus. 支持装置を下面側から見た概略斜視図。The schematic perspective view which looked at the support apparatus from the lower surface side. 支持装置の動作説明図。Operation | movement explanatory drawing of a support apparatus. (A)及び(B)は、支持装置の動作説明図。(A) And (B) is operation | movement explanatory drawing of a support apparatus. 変形例を示す要部正面図。The principal part front view which shows a modification.

以下、本発明の好ましい実施の形態について図面を参照しながら説明する。
なお、本明細書において、特に明示しない限り、「上」、「下」は、図1を基準として用いる。
Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.
In this specification, “upper” and “lower” are used with reference to FIG. 1 unless otherwise specified.

図1、図2において、実施形態に係る搬送装置10は、板状部材としてのウエハWが載置される第1テーブルT1と、第2テーブルT2との上部間を跨ぐように配置された移動手段11と、この移動手段11に固定された支持装置12とを備えて構成されている。ここで、ウエハWは、平面視略円形をなし、その回路面の反対面(上面)の外周側にリング状の凸部W1を有する形状に設けられ、回路面側(下面側)には、保護用の接着シートSが貼付されている。   1 and 2, the transfer apparatus 10 according to the embodiment is moved so as to straddle the upper part of the first table T1 on which the wafer W as a plate-like member is placed and the second table T2. Means 11 and a support device 12 fixed to the moving means 11 are provided. Here, the wafer W has a substantially circular shape in plan view and is provided in a shape having a ring-shaped convex portion W1 on the outer peripheral side of the opposite surface (upper surface) of the circuit surface, and on the circuit surface side (lower surface side), A protective adhesive sheet S is affixed.

第1、第2テーブルT1、T2の上面は、図示しない多数の吸着孔を備えた吸着面とされ、これにより、ウエハWが移載された後の当該ウエハWを固定的に支持できるようになっている。第1テーブルT1は、例えば、ウエハWの裏面を研削する研削用テーブルが例示できる一方、第2テーブルT2は、例えば、接着シートSを剥離するための図示しない剥離手段に、接着シートSが上側となるようにウエハWを載置する移載用のテーブルが例示できる。   The upper surfaces of the first and second tables T1, T2 are suction surfaces having a number of suction holes (not shown) so that the wafer W after the wafer W is transferred can be fixedly supported. It has become. The first table T1 can be exemplified by a grinding table that grinds the back surface of the wafer W, while the second table T2 is, for example, a peeling means (not shown) for peeling the adhesive sheet S, and the adhesive sheet S on the upper side. A transfer table for mounting the wafer W can be exemplified.

前記移動手段11は、第1、第2テーブルT1、T2の上部間に延びる駆動機器としての単軸ロボット20と、当該単軸ロボット20のスライダ21に支持された駆動機器としての直動モータ22により構成され、直動モータ22の出力軸23が支持装置12に取り付けられている。   The moving means 11 includes a single-axis robot 20 as a drive device extending between the upper portions of the first and second tables T1 and T2, and a linear motion motor 22 as a drive device supported by the slider 21 of the single-axis robot 20. The output shaft 23 of the linear motor 22 is attached to the support device 12.

前記支持装置12は、直動モータ22の出力軸23に支持された保持体25と、この保持体25に保持された接触体26と、ウエハWに吸引力を付与する吸引手段30と、接触体26を介して支持されたウエハWを当該接触体26から切り離す切離手段31とを含む。   The support device 12 includes a holding body 25 supported by the output shaft 23 of the linear motor 22, a contact body 26 held by the holding body 25, and a suction unit 30 that applies a suction force to the wafer W. And a separation means 31 for separating the wafer W supported via the body 26 from the contact body 26.

前記保持体25は、図2に示されるように、平面視略方形の板状をなし、下面側に、接触体26を受容する円形状の第1溝33が設けられている。この第1溝33の底面には、当該第1溝33の延出方向に沿って形成された第2溝35が形成され、この第2溝35と保持体25の上面との間における少なくとも1箇所に設けられた通気孔37を介して配管39が接続されている。   As shown in FIG. 2, the holding body 25 has a substantially square plate shape in plan view, and a circular first groove 33 for receiving the contact body 26 is provided on the lower surface side. A second groove 35 formed along the extending direction of the first groove 33 is formed on the bottom surface of the first groove 33, and at least one between the second groove 35 and the upper surface of the holding body 25. A pipe 39 is connected through a vent hole 37 provided at a location.

前記接触体26は、自粘性(粘着性)を有し、可撓性、耐熱性、弾性等に優れたシリコーン系、ウレタン系、アクリル系、フッ素系のエラストマを素材とし、特に感圧、感熱粘着剤等を介さなくても、その濡れ性によってウエハWに粘着できるものである。接触体26は、凸部W1の凸部先端面W2に対応したリング状をなす平面形状に設けられ、凸部先端面W2に当接可能な第1当接面26Aを有し、当該第1当接面26Aに貫通する吸引口40が、周方向に沿って所定間隔を隔てて多数形成され、これら各吸引口40の上端が第2溝35に連通するようになっている。また、接触体26は、第1当接面26Aに連設し当該第1当接面26Aから離れるにしたがって(上方に向かうにしたがって)幅広となるとともに、吸引手段30によって凸部先端面W2を吸引したときに、凸部先端面W2に当接可能な第2当接面26Bを有している(図4参照)。これにより、接触体26の凸部先端面W2との接着力が弱くなることを防止することができる。更に、第1当接面26Aの幅は、吸引口40の幅と同一又は吸引口40の幅以上であって略同一幅に設けられ、これにより、接触体26と凸部先端面W2との接触面積を縮小し、第1当接面26Aと凸部先端面W2との切り離しを行い易くなっている。なお、接触面26Aと第1溝33との間には空間Cが形成され、ウエハWを吸引したときに、接触体26の圧縮変形を許容し、第1溝33内にウエハWの凸部W1を引き込むときの変形許容領域として作用するようになっている。   The contact body 26 is made of a silicone-based, urethane-based, acrylic-based, or fluorine-based elastomer having self-viscosity (adhesiveness) and excellent flexibility, heat resistance, elasticity, etc., and particularly pressure-sensitive and heat-sensitive. Even without the use of an adhesive or the like, it can adhere to the wafer W due to its wettability. The contact body 26 is provided in a planar shape that forms a ring shape corresponding to the convex tip end surface W2 of the convex portion W1, and has a first abutting surface 26A that can abut on the convex tip end surface W2. A number of suction ports 40 penetrating the contact surface 26A are formed at predetermined intervals along the circumferential direction, and the upper ends of the suction ports 40 communicate with the second groove 35. Further, the contact body 26 is connected to the first contact surface 26A and becomes wider as it moves away from the first contact surface 26A (upward), and the protrusion tip surface W2 is formed by the suction means 30. It has the 2nd contact surface 26B which can contact | abut to convex part front end surface W2 when attracting | sucking (refer FIG. 4). Thereby, it can prevent that the adhesive force with the convex part front end surface W2 of the contact body 26 becomes weak. Furthermore, the width of the first contact surface 26A is the same as the width of the suction port 40 or larger than the width of the suction port 40 and is substantially the same width, whereby the contact body 26 and the convex end surface W2 are formed. The contact area is reduced, and it is easy to separate the first contact surface 26A and the convex portion front end surface W2. A space C is formed between the contact surface 26 </ b> A and the first groove 33. When the wafer W is sucked, the contact body 26 is allowed to be compressed and deformed, and the convex portion of the wafer W is placed in the first groove 33. It acts as a deformation permissible region when retracting W1.

前記吸引手段30は、切換バルブ41を介して配管39に接続された減圧ポンプP1により構成され、また、前記切離手段31は、切換バルブ41を介して配管39に接続された加圧ポンプP2により構成されている。   The suction means 30 is constituted by a decompression pump P1 connected to a pipe 39 via a switching valve 41, and the disconnecting means 31 is a pressure pump P2 connected to the pipe 39 via a switching valve 41. It is comprised by.

次に、前記支持装置12を用いたウエハWの搬送動作について、図3、4をも参照しながら説明する。   Next, the transfer operation of the wafer W using the support device 12 will be described with reference to FIGS.

図1に示されるように、第1テーブルT1に支持されたウエハWを第2テーブルT2に搬送する場合、凸部W1に相対する位置に接触体26が位置するように、単軸ロボット20が支持装置12を移動する。   As shown in FIG. 1, when the wafer W supported by the first table T1 is transferred to the second table T2, the single-axis robot 20 is positioned so that the contact body 26 is positioned at a position opposite to the convex portion W1. The support device 12 is moved.

この状態で、直動モータ22を作動し、図3に示されるように、接触体26の第1当接面26Aを凸部先端面W2に当接させる。凸部先端面W2と第1当接面26Aとが当接すると、第1テーブルT1による吸引が解除される。このとき、接触体26が柔軟性を有するため、当該接触体26がウエハWに接触することによる衝撃は緩和される。そして、切換バルブ41のポート切り換えが行われ、減圧ポンプP1を介して凸部先端面W2を吸引する。この吸引により、図4(A)に示されるように、接触体26は、隙間Cを変形許容領域とし、凸部W1の先端部が第1溝33内に所定深さ引き込まれるとともに、第2当接面26Bも凸部先端面W2に当接するように変形する。これにより、吸引開始前より接触体26と凸部先端面W2との接触面積が拡大され、ウエハWを確実に保持することができる。   In this state, the linear motor 22 is operated to bring the first contact surface 26A of the contact body 26 into contact with the convex end surface W2 as shown in FIG. When the convex tip surface W2 and the first contact surface 26A come into contact with each other, the suction by the first table T1 is released. At this time, since the contact body 26 has flexibility, the impact caused by the contact body 26 coming into contact with the wafer W is reduced. Then, the port of the switching valve 41 is switched, and the convex tip surface W2 is sucked through the pressure reducing pump P1. By this suction, as shown in FIG. 4A, the contact body 26 uses the gap C as a deformation allowable region, the tip of the convex portion W1 is drawn into the first groove 33 by a predetermined depth, and the second The abutting surface 26B is also deformed so as to abut on the convex end surface W2. As a result, the contact area between the contact body 26 and the tip end surface W2 of the protrusion is expanded before the suction starts, and the wafer W can be reliably held.

ここで、図4(B)に示されるように、凸部先端面W2に微細な凹凸が形成されていても、第2当接面26Bが次第に接触面積を拡大して凸部先端面W2の形状に合わせて変形するので、同図のような凸部先端面W2形状であっても、接触体26自体の粘性と吸引力で確実にウエハWを支持することが可能となる。   Here, as shown in FIG. 4B, even if fine irregularities are formed on the convex leading end surface W2, the second contact surface 26B gradually expands the contact area and the convex leading end surface W2 Since the shape is deformed according to the shape, the wafer W can be surely supported by the viscosity and suction force of the contact body 26 itself even if the shape of the convex tip end surface W2 is as shown in FIG.

次いで、直動モータ22を作動し、ウエハWを上昇させた後、単軸ロボット20が駆動して支持装置12が第2テーブルT2の上部所定位置に移動する。このとき、図4(A)に示されるように、ウエハWは、第2テーブルT2に対して接触体26の後退変位分上方で停止される。   Next, the linear motor 22 is operated to raise the wafer W, and then the single-axis robot 20 is driven to move the support device 12 to a predetermined position on the second table T2. At this time, as shown in FIG. 4A, the wafer W is stopped above the second table T2 by the backward displacement of the contact body 26.

その後、切換バルブ41のポート切り換えが行われ、徐々に大気開放されると、図3に示されるように、接触体26の弾性復元力によって、第2当接面26Bが徐々に凸部先端面W2から離れるように変形し、ウエハWが第2テーブルT2に当接される。これにより、脆弱なウエハWが載置による衝撃によって損傷することを防止することができる。そして、第2テーブルT2がウエハWを吸引するとともに、切換バルブ41のポート切り換えが行われ、加圧ポンプP2を介して圧縮空気が吸引口40から吐出され、第1当接面26Aに粘着している凸部先端面W2を当該第1当接面26Aから切り離し、ウエハWを第2テーブルT2に受け渡す。なお、圧縮空気を吐出するときは、支持装置12が第2テーブルT2から微量離間するように制御してもよい。   After that, when the port of the switching valve 41 is switched and gradually released to the atmosphere, the second contact surface 26B is gradually moved forward by the elastic restoring force of the contact body 26 as shown in FIG. The wafer W is deformed away from W2, and the wafer W is brought into contact with the second table T2. Thereby, it is possible to prevent the fragile wafer W from being damaged by the impact caused by the placement. Then, the second table T2 sucks the wafer W, and the port of the switching valve 41 is switched. The compressed air is discharged from the suction port 40 via the pressure pump P2, and adheres to the first contact surface 26A. The protruding front end surface W2 is cut off from the first contact surface 26A, and the wafer W is transferred to the second table T2. Note that when the compressed air is discharged, the support device 12 may be controlled so as to be slightly separated from the second table T2.

従って、このような実施形態によれば、第2当接面26Bを第1当接面26Aから離れるにしたがって幅広となるように構成したので、ウエハWの支持安定性とウエハWからの切り離し容易性の両方を兼ね備えた支持装置及び支持方法を提供することができる。   Therefore, according to such an embodiment, since the second contact surface 26B is configured to become wider as it is away from the first contact surface 26A, the support stability of the wafer W and the separation from the wafer W are easy. It is possible to provide a support device and a support method that combine both sexiness.

本発明を実施するための最良の構成、方法などは、以上の記載で開示されているが、本発明は、これに限定されるものではない。
すなわち、本発明は、主に特定の実施の形態に関して特に図示し、且つ、説明されているが、本発明の技術的思想及び目的の範囲から逸脱することなく、以上に述べた実施の形態に対し、形状、数量、その他の詳細な構成において、当業者が様々な変形を加えることができるものである。
従って、上記に開示した形状などを限定した記載は、本発明の理解を容易にするために例示的に記載したものであり、本発明を限定するものではないから、それらの形状などの限定の一部若しくは全部の限定を外した部材の名称での記載は、本発明に含まれるものである。
The best configuration, method and the like for carrying out the present invention have been disclosed in the above description, but the present invention is not limited to this.
That is, the invention has been illustrated and described with particular reference to particular embodiments, but it should be understood that the above-described embodiments are not deviated from the technical idea and scope of the invention. On the other hand, various modifications can be made by those skilled in the art in shape, quantity, and other detailed configurations.
Therefore, the description limited to the shape disclosed above is an example for easy understanding of the present invention, and does not limit the present invention. The description by the name of the member which remove | excluded one part or all part is included in this invention.

例えば、前記接触体26における接触面26Aの形状は、図5に示されるように、第2当接面26Bを外側に膨出する湾曲形状に設けてもよい。これによれば、吸引手段30による接触体26の圧縮変形によって、第2当接面26Bを凸部先端面W2に当接させ易くなる。   For example, the shape of the contact surface 26A in the contact body 26 may be provided in a curved shape in which the second contact surface 26B bulges outward as shown in FIG. According to this, it becomes easy to make the 2nd contact surface 26B contact | abut to the convex part front end surface W2 by the compressive deformation of the contact body 26 by the suction means 30. FIG.

また、前記実施形態では、ウエハWを支持対象としたが、凸部を有するガラス板、鋼板、陶器、木板または樹脂板等、その他の板状部材も対象とすることができ、半導体ウエハは、シリコーン半導体ウエハや化合物半導体ウエハであってもよい。更に、凸部W1は、閉ループ状のものに限らず、断続的なものであってもよく、これに対応して接触体26を断続的に設ければよい。   Further, in the above embodiment, the wafer W is a support target, but other plate-like members such as a glass plate having a convex portion, a steel plate, a pottery, a wooden plate, or a resin plate can also be targeted. It may be a silicone semiconductor wafer or a compound semiconductor wafer. Furthermore, the convex portion W1 is not limited to a closed loop shape, and may be intermittent, and the contact body 26 may be provided intermittently corresponding to this.

更に、支持装置12を移動させる移動手段11として単軸ロボット20を用いたが、支持装置12は、直交三軸方向に移動可能なロボットアームに支持させる構成としてもよい。
また、前記実施形態における駆動機器は、回動モータ、直動モータ、リニアモータ、単軸ロボット、多関節ロボット等の電動機器、エアシリンダ、油圧シリンダ、ロッドレスシリンダ及びロータリシリンダ等のアクチュエータ等を採用することができる上、それらを直接的又は間接的に組み合せたものを採用することもできる(実施形態で例示したものと重複するものもある)。
Furthermore, although the single-axis robot 20 is used as the moving means 11 for moving the support device 12, the support device 12 may be configured to be supported by a robot arm that can move in three orthogonal axes.
The drive device in the embodiment includes an electric device such as a rotation motor, a linear motion motor, a linear motor, a single-axis robot, and an articulated robot, an actuator such as an air cylinder, a hydraulic cylinder, a rodless cylinder, and a rotary cylinder. In addition to these, a combination of them directly or indirectly may be employed (some of them overlap with those exemplified in the embodiment).

12 支持装置
26 接触体
26A 第1当接面
26B 第2当接面
30 吸引手段
31 切離手段
40 吸引口
W 半導体ウエハ(板状部材)
W1 凸部
W2 凸部先端面
DESCRIPTION OF SYMBOLS 12 Support apparatus 26 Contact body 26A 1st contact surface 26B 2nd contact surface 30 Suction means 31 Cutting means 40 Suction port W Semiconductor wafer (plate-shaped member)
W1 Convex W2 Convex tip

Claims (5)

平面内に凸部が設けられた板状部材の支持装置であって、
前記凸部における凸部先端面に当接可能な第1当接面を有するとともに、当該第1当接面に貫通する吸引口が設けられた自粘性の接触体と、前記吸引口に連通する吸引手段とを備え、
前記接触体は、前記第1当接面に連設し当該第1当接面から離れるにしたがって幅広となるとともに、前記吸引手段によって前記凸部先端面を吸引したときに、当該凸部先端面に当接可能な第2当接面を有することを特徴とする支持装置。
A support device for a plate-like member provided with a convex portion in a plane,
A self-viscous contact body having a first contact surface that can contact the tip end surface of the convex portion of the convex portion and provided with a suction port penetrating the first contact surface is communicated with the suction port. A suction means,
The contact body is connected to the first contact surface and becomes wider as the distance from the first contact surface increases, and when the protrusion tip surface is sucked by the suction means, the protrusion tip surface A support device having a second abutting surface capable of abutting on the surface.
前記第1当接面の幅は、前記吸引口の幅と同一又は前記吸引口の幅以上であって略同一幅に設けられていることを特徴とする請求項1記載の支持装置。   The support device according to claim 1, wherein a width of the first contact surface is equal to or greater than a width of the suction port and is substantially the same width. 前記第2当接面は、外側に膨出する湾曲形状に設けられていることを特徴とする請求項1又は2記載の支持装置。   The support device according to claim 1, wherein the second contact surface is provided in a curved shape that bulges outward. 前記接触体に支持された板状部材を当該接触体から切り離す切離手段を更に含むことを特徴とする請求項1、2又は3記載の支持装置。   4. The support device according to claim 1, further comprising a separating means for separating the plate-like member supported by the contact body from the contact body. 平面内に凸部が設けられた板状部材の支持方法であって、
第1当接面を前記凸部における凸部先端面に当接させる工程と、
前記第1当接面に貫通する吸引口を介して前記凸部先端面を吸引する工程と、
前記吸引によって前記第1当接面に連設した第2当接面を前記凸部先端面に当接させる工程とを備えていることを特徴とする支持方法。
A method of supporting a plate-like member provided with a convex portion in a plane,
Contacting the first abutting surface with the convex portion tip surface of the convex portion;
Sucking the tip end surface of the convex portion through a suction port penetrating the first contact surface;
And a step of abutting a second abutting surface provided continuously with the first abutting surface by the suction on the tip end surface of the convex portion.
JP2010204475A 2010-09-13 2010-09-13 Support device Expired - Fee Related JP5596475B2 (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007258206A (en) * 2006-03-20 2007-10-04 Disco Abrasive Syst Ltd Wafer holding pad
JP2007276065A (en) * 2006-04-07 2007-10-25 Dainippon Printing Co Ltd Substrate adsorption holding device and manufacturing device of wiring substrate unit
JP2010056341A (en) * 2008-08-28 2010-03-11 Lintec Corp Supporting device
JP2010103286A (en) * 2008-10-23 2010-05-06 Lintec Corp Support device
JP2010165883A (en) * 2009-01-16 2010-07-29 Lintec Corp Carrying device for semiconductor wafer, and carrying method therefor

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007258206A (en) * 2006-03-20 2007-10-04 Disco Abrasive Syst Ltd Wafer holding pad
JP2007276065A (en) * 2006-04-07 2007-10-25 Dainippon Printing Co Ltd Substrate adsorption holding device and manufacturing device of wiring substrate unit
JP2010056341A (en) * 2008-08-28 2010-03-11 Lintec Corp Supporting device
JP2010103286A (en) * 2008-10-23 2010-05-06 Lintec Corp Support device
JP2010165883A (en) * 2009-01-16 2010-07-29 Lintec Corp Carrying device for semiconductor wafer, and carrying method therefor

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